CN114657518A - Insoluble metal deposition equipment with multistage controllable composite magnetic field arc ion source - Google Patents
Insoluble metal deposition equipment with multistage controllable composite magnetic field arc ion source Download PDFInfo
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- CN114657518A CN114657518A CN202210177566.6A CN202210177566A CN114657518A CN 114657518 A CN114657518 A CN 114657518A CN 202210177566 A CN202210177566 A CN 202210177566A CN 114657518 A CN114657518 A CN 114657518A
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- 238000001465 metallisation Methods 0.000 title claims abstract description 19
- 239000002131 composite material Substances 0.000 title claims abstract description 17
- 229910000889 permalloy Inorganic materials 0.000 claims abstract description 26
- 238000000151 deposition Methods 0.000 claims description 15
- 230000008021 deposition Effects 0.000 claims description 15
- 239000003870 refractory metal Substances 0.000 claims description 15
- 238000003466 welding Methods 0.000 claims description 8
- 238000010030 laminating Methods 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 4
- 238000010884 ion-beam technique Methods 0.000 abstract description 16
- 150000002500 ions Chemical class 0.000 description 17
- 238000003825 pressing Methods 0.000 description 10
- 238000010891 electric arc Methods 0.000 description 6
- 230000005284 excitation Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 238000000429 assembly Methods 0.000 description 3
- 230000000712 assembly Effects 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000001883 metal evaporation Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007737 ion beam deposition Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses insoluble metal deposition equipment with a multistage controllable composite magnetic field arc ion source, which relates to the field of insoluble metal deposition equipment and comprises annular magnets, wherein a plurality of groups of annular magnets are arranged, the annular magnets are distributed up and down, an adjusting component for adjusting the distance between the adjacent annular magnets is arranged below the annular magnets, the annular magnets are also provided with composite magnetic field components, a first magnetic pole, a second magnetic pole, a third magnetic pole, a fourth magnetic pole, a fifth magnetic pole and a sixth magnetic pole which are arranged on the side surfaces of a total six permalloy magnetic poles in each stage are distributed along the circumferential direction of the annular magnets, each cylindrical magnet is provided with a horizontal exciting coil, the first magnetic pole of the first stage and the first magnetic pole of the second stage are mutually separated by ninety degrees in machinery so as to generate magnetic fields which are mutually perpendicular and used for changing the moving direction of an ion beam, the purpose of scanning the workpiece is achieved.
Description
Technical Field
The invention relates to the field of insoluble metal deposition equipment, in particular to insoluble metal deposition equipment with a multistage controllable composite magnetic field arc ion source.
Background
The main defects of the existing arc ion beam deposition device are that the beam cross section area bombarded to a target is uncontrollable, the deposition rate is generally low, and a functional film is difficult to be uniformly plated on the inner surface of a tubular workpiece with a complex function curved surface, especially a part with micropores such as an aerospace engine and the like. And the ions are dispersed a lot in the deposition process, so that the waste is serious. For the deposition of precious metals such as rhenium (Re), iridium (Ir), etc., the equipment operating costs are extremely high due to the generally unacceptable price factors. Therefore, it is desirable to solve the above problems by devising a refractory metal deposition apparatus with a multi-stage controllable combined magnetic field arc ion source.
Disclosure of Invention
The invention aims to provide a refractory metal deposition device with a multistage controllable composite magnetic field arc ion source, so as to solve the problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme: indissolvable metal deposition equipment with multistage controllable compound magnetic field electric arc ion source, including the ring magnet, the ring magnet is provided with the multiunit, and multiunit ring magnet distributes from top to bottom, and the below of multiunit ring magnet is provided with the adjusting part who adjusts distance between the adjacent ring magnet, still be provided with compound magnetic field subassembly on the ring magnet, adjusting part is including setting up the mount pad in multiunit ring magnet below, the fixed pressurizing unit that is provided with on the mount pad, be provided with the connecting rod subassembly on the pressurizing unit, the both sides of connecting rod subassembly all are provided with and prop up fixed subassembly with the ring magnet from inner circle department.
Preferably, the connecting rod subassembly includes spliced pole and connecting rod, the spliced pole is cylindrical structure, and the inside of spliced pole is provided with flexible groove, the connecting rod is shaft-like structure, the interval is provided with the multiunit about connecting rod and the spliced pole, and the fixed welding in the bottom surface of spliced pole in the upper end of a set of connecting rod in below, the lower extreme activity of a set of connecting rod in top stretches into the inside in flexible groove.
In this embodiment, the basic principle of arc ion plating is to use a metal evaporation source (target) as a cathode arc source, energize the cathode arc source to generate a negative voltage, and then an arc striking mechanism operates to form an arc discharge between the cathode arc source and an anode casing, so that the target is evaporated and ionized, target vapor particles are ionized in plasma to form positive ions, and the positive ions are attracted to a workpiece (substrate) to perform deposition plating under the action of a negative high-voltage electric field.
The arc ion plating has the following outstanding characteristics: the film has strong binding force and high quality; the material which can be plated is wide; the ionization rate is high and can reach 60 to 80 percent generally; the deposition efficiency is high, and the plating winding performance is good; the process is simple to operate, the film forming speed is high, and thick films can be plated.
In fig. 1, the ring-shaped magnets distributed from top to bottom are divided into a first stage, a second stage, a third stage, and so on, and the first magnetic pole, the second magnetic pole, the third magnetic pole, the fourth magnetic pole, the fifth magnetic pole, and the sixth magnetic pole of the total six permalloy magnetic pole sides in each stage are distributed along the circumferential direction of the ring-shaped magnet, each cylindrical magnet is provided with a horizontal exciting coil, and the first magnetic pole of the first stage and the first magnetic pole of the second stage are mechanically separated by ninety degrees to generate mutually perpendicular magnetic fields for changing the moving direction of the ion beam and achieving the purpose of scanning the workpiece.
Each ring magnet is also provided with a magnetic field which is formed by a vertical magnetic pole exciting coil and is vertical to the horizontal magnetic field, an independent power supply is arranged on the vertical magnetic pole exciting coil, the vertical magnetic field is used for focusing ion beams, and the diameter of the ion beams is changed by adjusting the exciting current so as to meet the requirements of coating films with different diameters on the same workpiece, so that the thickness of the film layer is uniform.
Preferably, the one end that the connecting rod stretches into flexible inslot portion is provided with spacing push pedal, and spacing push pedal slides and sets up in flexible groove.
It should be noted that the pressurizing unit can use devices such as an air pump, and when the pressurizing unit is started, air can be conveyed into the telescopic groove, so that the air in the telescopic groove pushes the limiting push plate to ascend, and the distance between two adjacent groups of annular magnets is changed.
Preferably, an air channel penetrating from top to bottom is arranged inside the connecting rod, and the upper end and the lower end of the air channel are respectively communicated with the telescopic grooves at the upper position and the lower position.
Furthermore, when the control unit at the corresponding position is closed and the electromagnetic valves at other positions are opened, the gas generated by the pressurizing unit can sequentially pass through the telescopic grooves and the gas channel to enter the corresponding telescopic grooves so as to push the limiting push plates in different telescopic grooves to ascend, and the purpose of changing the distance between adjacent annular magnets at different positions is achieved.
Preferably, the upper end of spliced pole is provided with the flexible hole that supplies the connecting rod activity to stretch out and draw back, the fixed welding in bottom in flexible groove has the spring of lengthening in spacing push pedal bottom.
Specifically, the spring plays the purpose of pulling and holding the limit push plate to reset, and when the pressurizing unit draws air out of the telescopic groove, the spring can pull and hold the limit push plate to reset.
Preferably, a control unit is arranged inside the lower end of the gas channel.
The control unit can use devices such as an electromagnetic valve and the like, and the purpose of communicating the two adjacent groups of telescopic grooves is achieved when the control unit is opened.
Preferably, prop up fixed subassembly and include that fixed welding holds the unit at the pressure of spliced pole outer lane department, the end fixing welding who holds the unit is pressed and is had the arc kicker of laminating in annular magnet inner circle department, the arc kicker is circular array form in annular magnet's inner circle department and is provided with the multiunit, and the arc kicker laminating is fixed in one side of annular magnet inner circle department and is provided with the rubber pad.
In the device, the pressing and holding unit can use a device such as an air cylinder or an electric push rod, and when the pressing and holding unit is started, the pressing and holding unit can be tightly supported and fixed on the inner wall of the annular magnet by using the arc-shaped supporting block, so that the annular magnet is distributed above the pressurizing unit from top to bottom.
Preferably, permalloy magnetic poles are fixedly welded on the outer ring of one end of the annular magnet, six groups of permalloy magnetic poles are distributed on the outer ring of the annular magnet in a circular array, and the side faces of the six groups of permalloy magnetic poles are respectively a first magnetic pole, a second magnetic pole, a third magnetic pole, a fourth magnetic pole, a fifth magnetic pole and a sixth magnetic pole.
In this embodiment, be provided with the screw hole that runs through from top to bottom on the mount pad, the screw hole distributes and has the multiunit, and multiunit screw hole is circular array form along a week of mount pad and distributes, passes the screw hole through the screw and can be with mount pad monolithic stationary mechanical equipment outside on, be convenient for use whole in indissolvable metal deposition equipment.
Preferably, one surface of the permalloy magnetic pole, which is far away from the annular magnet, is fixedly provided with a cylindrical magnet, the outer ring of the cylindrical magnet is wound with a horizontal exciting coil, and the outer ring of one end of the annular magnet, which is far away from the permalloy magnetic pole, is wound with a vertical magnetic pole exciting coil.
It should be noted that the working principle of the programmable composite magnetic field assembly is as follows:
the first magnetic pole and the fourth magnetic pole can be respectively adjusted into an N-level magnetic pole and an S-level magnetic pole, the purpose can be achieved by changing the polarity of the corresponding excitation power supply, the second magnetic pole, the fifth magnetic pole, the third magnetic pole and the sixth magnetic pole are all adjusted into the N-level magnetic pole and the S-level magnetic pole in the same way, if a rotating magnetic field needs to be generated, the first magnetic pole and the fourth magnetic pole can be electrified and then switched into the second magnetic pole and the fifth magnetic pole, and the third magnetic pole and the sixth magnetic pole can be electrified, and the rotating magnetic field can be generated by analogy.
The rotating magnetic field near the target can effectively and forcibly drag the electric arc to move on the target platform, thereby reducing the generation of large particles, and meanwhile, the diameter of the ion beam current can be adjusted by loading current on the vertical magnetic pole exciting coil on the vertical magnetic field, thereby meeting the process requirements.
Preferably, the annular magnet is of a ring structure, the permalloy magnetic pole is of a trapezoid structure, and the cylindrical magnet is of a cylindrical structure.
The invention has the technical effects and advantages that:
1. the invention relates to a refractory metal deposition device with a multistage controllable composite magnetic field arc ion source, which comprises an annular magnet, the annular magnets are provided with a plurality of groups of annular magnets which are distributed up and down, an adjusting component for adjusting the distance between the adjacent annular magnets is arranged below the plurality of groups of annular magnets, the annular magnets are also provided with a composite magnetic field component, the first magnetic pole, the second magnetic pole, the third magnetic pole, the fourth magnetic pole, the fifth magnetic pole and the sixth magnetic pole which are arranged on the side surfaces of the total six permalloy magnetic poles in each stage are distributed along the circumferential direction of the annular magnet, each cylindrical magnet is provided with a horizontal exciting coil, the first magnetic pole of the first stage and the first magnetic pole of the second stage are separated by ninety degrees in machinery, the magnetic field generator is used for generating mutually vertical magnetic fields and changing the moving direction of the ion beam so as to achieve the aim of scanning a workpiece;
2. the invention has indissolvable metal deposition equipment of multi-stage controllable compound magnetic field arc ion source, still have one with vertical magnetic pole that magnetic coil form with horizontal magnetic field phase perpendicular magnetic field on each ring magnet, the said vertical magnetic pole is furnished with the independent power on the magnetic coil, this perpendicular magnetic field is used for focusing the ion beam, change the size of the diameter of the ion beam through regulating the size of the exciting current, in order to meet the requirement of the coating film of different diameter size on the same work piece, make the thickness of the membranous layer uniform;
3. according to the insoluble metal deposition equipment with the multistage controllable composite magnetic field arc ion source, when the pressurizing unit is started, gas can be conveyed into the telescopic groove, so that the gas in the telescopic groove pushes the limiting push plate to ascend, and therefore the distance between two adjacent groups of annular magnets is changed;
4. according to the insoluble metal deposition equipment with the multistage controllable composite magnetic field arc ion source, when the control unit at the corresponding position is closed and the electromagnetic valves at other positions are opened, gas generated by the pressurizing unit can enter the corresponding telescopic grooves through the telescopic grooves and the gas channels in sequence, so that the limiting push plates in different telescopic grooves are pushed to rise, and the purpose of changing the distance between adjacent annular magnets at different positions is achieved;
5. according to the insoluble metal deposition equipment with the multistage controllable composite magnetic field arc ion source, when the pressing unit is started, the arc-shaped supporting block can be used for tightly supporting and fixing the pressing unit on the inner wall of the annular magnet, so that the annular magnet is distributed above the pressing unit from top to bottom;
6. the invention relates to a refractory metal deposition device with a multistage controllable composite magnetic field arc ion source, which can respectively adjust a first magnetic pole and a fourth magnetic pole into N level and S level, and can achieve the purpose by changing the polarity of a corresponding excitation power supply, and can adjust a second magnetic pole, a fifth magnetic pole, a third magnetic pole and a sixth magnetic pole into N level and S level by the same principle, if a rotating magnetic field is generated, the first magnetic pole and the fourth magnetic pole can be electrified and then switched into the second magnetic pole and the fifth magnetic pole, the third magnetic pole and the sixth magnetic pole can be electrified, and the like, the rotating magnetic field can be generated, the rotating magnetic field near a target can effectively and forcibly drag the movement of an electric arc on a target platform, thereby reducing the generation of large particles, and simultaneously, the diameter of an ion beam can be adjusted by loading current on a vertical magnetic pole excitation coil on the vertical magnetic field, the process requirements are met.
Drawings
FIG. 1 is a schematic view of the structure of the present invention.
Fig. 2 is a schematic view of the ring magnet structure of the present invention.
FIG. 3 is a front view of a permalloy pole of the present invention.
In the figure: 1. a first magnetic pole; 2. a second magnetic pole; 3. magnetic pole number three; 4. magnetic pole number four; 5. magnetic pole number five; 6. magnetic pole number six; 7. a ring magnet; 8. a cylindrical magnet; 9. permalloy magnetic poles; 10. a horizontal excitation coil; 11. a vertical magnetic pole exciting coil; 12. connecting columns; 13. a mounting seat; 14. a pressurizing unit; 15. a telescopic hole; 16. a limiting push plate; 17. a connecting rod; 18. a telescopic groove; 19. a pressing unit; 20. an arc-shaped supporting block; 21. a spring; 22. a gas channel; 23. a control unit.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The invention provides refractory metal deposition equipment with a multistage controllable composite magnetic field arc ion source, which comprises annular magnets 7, wherein the annular magnets 7 are provided with a plurality of groups, the plurality of groups of annular magnets 7 are distributed up and down, an adjusting assembly for adjusting the distance between the adjacent annular magnets 7 is arranged below the plurality of groups of annular magnets 7, the annular magnets 7 are also provided with composite magnetic field assemblies, the adjusting assembly comprises mounting seats 13 arranged below the plurality of groups of annular magnets 7, pressurizing units 14 are fixedly arranged on the mounting seats 13, connecting rod assemblies are arranged on the pressurizing units 14, and tightening fixing assemblies for tightening and fixing the annular magnets 7 from the inner ring are arranged on two sides of each connecting rod assembly.
The connecting rod assembly comprises a connecting column 12 and a connecting rod 17, the connecting column 12 is of a cylindrical structure, a telescopic groove 18 is formed in the connecting column 12, the connecting rod 17 is of a rod-shaped structure, a plurality of groups are arranged on the connecting rod 17 and the connecting column 12 at an upper position and a lower position at intervals, the upper end of a group of connecting rods 17 below is fixedly welded on the bottom surface of the connecting column 12, and the lower end of a group of connecting rods 17 above movably extends into the telescopic groove 18.
In this embodiment, the basic principle of arc ion plating is to use a metal evaporation source (target) as a cathode arc source, energize the cathode arc source to generate a negative voltage, and then an arc striking mechanism operates to form an arc discharge between the cathode arc source and an anode casing, so that the target is evaporated and ionized, target vapor particles are ionized in plasma to form positive ions, and the positive ions are attracted to a workpiece (substrate) to perform deposition plating under the action of a negative high-voltage electric field.
The arc ion plating has the following outstanding characteristics: the film has strong binding force and high quality; the material which can be plated is wide; the ionization rate is high and can reach 60 to 80 percent generally; the deposition efficiency is high, and the plating winding performance is good; the process is simple to operate, the film forming speed is high, and thick films can be plated.
In fig. 1, the ring magnet 7 distributed from top to bottom is divided into a first stage, a second stage, a third stage, and so on, in each stage, a first magnetic pole 1, a second magnetic pole 2, a third magnetic pole 3, a fourth magnetic pole 4, a fifth magnetic pole 5, and a sixth magnetic pole 6 on the side of a total of six permalloy magnetic poles 9 are distributed along the circumferential direction of the ring magnet 7, each cylindrical magnet 8 is provided with a horizontal exciting coil 10, and the first magnetic pole 1 of the first stage and the first magnetic pole 1 of the second stage are separated by ninety degrees mechanically to generate magnetic fields perpendicular to each other for changing the moving direction of the ion beam and achieving the purpose of scanning the workpiece.
Each annular magnet 7 is also provided with a magnetic field which is formed by a vertical magnetic pole exciting coil 11 and is vertical to the horizontal magnetic field, the vertical magnetic pole exciting coil 11 is provided with an independent power supply, the vertical magnetic field is used for focusing ion beams, and the diameter of the ion beams is changed by adjusting the size of exciting current so as to meet the requirements of coating films with different diameters on the same workpiece, so that the thickness of the film layer is uniform.
One end of the connecting rod 17 extending into the telescopic groove 18 is provided with a limiting push plate 16, and the limiting push plate 16 is arranged in the telescopic groove 18 in a sliding manner.
It should be noted that the pressurizing unit 14 may use a device such as an air pump, and when the pressurizing unit 14 is activated, air may be delivered into the telescopic groove 18, so that the air in the telescopic groove 18 pushes the limit push plate 16 to rise, thereby changing the distance between two adjacent sets of ring magnets 7.
An air channel 22 which penetrates through the connecting rod 17 from top to bottom is arranged inside the connecting rod, and the upper end and the lower end of the air channel 22 are respectively communicated with the telescopic grooves 18 at the upper position and the lower position.
Furthermore, when the control unit 23 at the corresponding position is closed and the electromagnetic valves at other positions are opened, the gas generated by the pressurizing unit 14 can sequentially enter the corresponding telescopic grooves 18 through the telescopic grooves 18 and the gas channel 22 to push the limiting push plates 16 in different telescopic grooves 18 to ascend, so that the purpose of changing the distance between adjacent annular magnets 7 at different positions is achieved.
The upper end of the connecting column 12 is provided with a telescopic hole 15 for the connecting rod 17 to movably extend and retract, and the bottom of the telescopic groove 18 is fixedly welded with a spring 21 which is stretched at the bottom of the limiting push plate 16.
Specifically, the spring 21 plays a role in pulling and holding the limit push plate 16 to reset, and when the pressurizing unit 14 draws air out of the telescopic groove 18, the spring 21 can pull and hold the limit push plate 16 to reset.
A control unit 23 is provided inside the lower end of the gas passage 22.
The control unit 23 may use a solenoid valve or the like, and when the control unit 23 is opened, the purpose of communicating the two adjacent groups of telescopic slots 18 is achieved.
Prop tight fixed subassembly and hold unit 19 including the pressure of fixed welding in spliced pole 12 outer lane department, the fixed welding of tip that holds unit 19 has the arc bracer 20 of laminating in annular magnet 7 inner circle department, and arc bracer 20 is circular array form in annular magnet 7 inner circle department and is provided with the multiunit, and the fixed rubber pad that is provided with in one side of annular magnet 7 inner circle department of laminating of arc bracer 20.
In the device, the pressing unit 19 can use a device such as an air cylinder or an electric push rod, and when the pressing unit 19 is started, the pressing unit can be tightly fixed on the inner wall of the ring magnet 7 by using the arc-shaped supporting block 20, so that the ring magnet 7 is distributed above the pressurizing unit 14 from top to bottom.
The permalloy magnetic poles 9 are fixedly welded at the outer ring of one end of the annular magnet 7, six groups of permalloy magnetic poles 9 are distributed at the outer ring of the annular magnet 7 in a circular array mode, and the side faces of the six groups of permalloy magnetic poles 9 are respectively a first magnetic pole 1, a second magnetic pole 2, a third magnetic pole 3, a fourth magnetic pole 4, a fifth magnetic pole 5 and a sixth magnetic pole 6.
In this embodiment, be provided with the screw hole that runs through from top to bottom on the mount pad 13, the screw hole distributes and has the multiunit, and multiunit screw hole is circular array form along a week of mount pad 13 and distributes, passes the screw hole through the screw and can be with mount pad 13 monolithic stationary mechanical equipment outside on, be convenient for use whole in indissolvable metal deposition equipment.
One surface of the permalloy magnetic pole 9, which is far away from the annular magnet 7, is fixedly provided with a cylindrical magnet 8, the outer ring of the cylindrical magnet 8 is wound with a horizontal exciting coil 10, and the outer ring of one end of the annular magnet 7, which is far away from the permalloy magnetic pole 9, is wound with a vertical magnetic pole exciting coil 11.
It should be noted that the programmable composite magnetic field assembly works according to the following principle:
the first magnetic pole 1 and the fourth magnetic pole 4 can be respectively adjusted into N-level and S-level, the purpose can be achieved by changing the polarity of corresponding excitation power supplies, the second magnetic pole 2, the fifth magnetic pole 5, the third magnetic pole 3 and the sixth magnetic pole 6 are all adjusted into N-level and S-level by the same principle, if a rotating magnetic field needs to be generated, the first magnetic pole 1 and the fourth magnetic pole 4 can be electrified and then switched into the second magnetic pole 2 and the fifth magnetic pole 5, the third magnetic pole 3 and the sixth magnetic pole 6 are electrified, and the rotating magnetic field can be generated by analogy.
The rotating magnetic field near the target can effectively and forcibly drag the electric arc to move on the target platform so as to reduce the generation of large particles, and the diameter of the ion beam current can be adjusted by loading current on the vertical magnetic pole exciting coil 11 on the vertical magnetic field, thereby meeting the process requirements.
The annular magnet 7 is of a ring structure, the permalloy magnetic pole 9 is of a trapezoidal structure, and the cylindrical magnet 8 is of a cylindrical structure.
The working principle is as follows: in fig. 1, the ring magnet 7 distributed from top to bottom is divided into a first stage, a second stage, a third stage, and so on, in each stage, a first magnetic pole 1, a second magnetic pole 2, a third magnetic pole 3, a fourth magnetic pole 4, a fifth magnetic pole 5, and a sixth magnetic pole 6 on the side of a total of six permalloy magnetic poles 9 are distributed along the circumferential direction of the ring magnet 7, each cylindrical magnet 8 is provided with a horizontal exciting coil 10, and the first magnetic pole 1 of the first stage and the first magnetic pole 1 of the second stage are mutually separated by ninety degrees mechanically to generate magnetic fields perpendicular to each other for changing the moving direction of the ion beam and achieving the purpose of scanning the workpiece.
Each annular magnet 7 is also provided with a magnetic field which is formed by a vertical magnetic pole exciting coil 11 and is vertical to the horizontal magnetic field, the vertical magnetic pole exciting coil 11 is provided with an independent power supply, the vertical magnetic field is used for focusing ion beams, and the diameter of the ion beams is changed by adjusting the size of exciting current so as to meet the requirements of coating films with different diameters on the same workpiece, so that the thickness of the film layer is uniform.
Claims (10)
1. Refractory metal deposition equipment with multistage controllable composite magnetic field arc ion source, including ring magnet (7), its characterized in that: annular magnet (7) are provided with the multiunit, and multiunit annular magnet (7) distribute from top to bottom, and the below of multiunit annular magnet (7) is provided with the adjusting part who adjusts distance between adjacent annular magnet (7), still be provided with compound magnetic field subassembly on annular magnet (7), adjusting part is including setting up mount pad (13) in multiunit annular magnet (7) below, fixed pressurizing unit (14) that is provided with on mount pad (13), be provided with the connecting rod subassembly on pressurizing unit (14), the both sides of connecting rod subassembly all are provided with and prop up fixed subassembly with annular magnet (7) from inner circle department.
2. The apparatus of claim 1 for the deposition of refractory metals with a multi-stage controllable combined magnetic field arc ion source, wherein: the connecting rod subassembly includes spliced pole (12) and connecting rod (17), spliced pole (12) are cylindrical structure, and the inside of spliced pole (12) is provided with flexible groove (18), connecting rod (17) are shaft-like structure, the interval is provided with the multiunit about connecting rod (17) and spliced pole (12), and the upper end fixed welding of a set of connecting rod (17) in below is in the bottom surface of spliced pole (12), and the lower extreme activity of a set of connecting rod (17) in top stretches into the inside in flexible groove (18).
3. The apparatus of claim 2 with a multi-stage controllable combined field arc ion source for deposition of refractory metals, wherein: the connecting rod (17) stretches into the inside one end in flexible groove (18) and is provided with spacing push pedal (16), and spacing push pedal (16) slide to set up in flexible groove (18).
4. The apparatus of claim 3 for the deposition of refractory metals with a multi-stage controllable combined magnetic field arc ion source, wherein: the connecting rod (17) is internally provided with an air channel (22) which penetrates through from top to bottom, and the upper end and the lower end of the air channel (22) are respectively communicated with the telescopic grooves (18) at the upper position and the lower position.
5. The apparatus of claim 4 with a multistage controllable combined magnetic field arc ion source for deposition of refractory metals, wherein: the upper end of the connecting column (12) is provided with a telescopic hole (15) for the connecting rod (17) to movably stretch, and the bottom of the telescopic groove (18) is fixedly welded with a spring (21) which is stretched at the bottom of the limiting push plate (16).
6. The apparatus of claim 5 with a multi-stage controllable combined field arc ion source for the deposition of refractory metals, wherein: and a control unit (23) is arranged in the lower end of the gas channel (22).
7. The apparatus of claim 1 for the deposition of refractory metals with a multi-stage controllable combined magnetic field arc ion source, wherein: prop tight fixed subassembly and hold unit (19) including the pressure of fixed welding in spliced pole (12) outer lane department, the end fixing weld who holds unit (19) is pressed and is had arc kicker (20) of laminating in ring magnet (7) inner circle department, arc kicker (20) are circular array form in the inner circle department of ring magnet (7) and are provided with the multiunit, and arc kicker (20) laminate in one side of ring magnet (7) inner circle department is fixed and is provided with the rubber pad.
8. The apparatus of claim 7 for the deposition of refractory metals with a multi-stage controllable combined magnetic field arc ion source, wherein: the permalloy magnetic pole structure is characterized in that permalloy magnetic poles (9) are fixedly welded at the outer ring of one end of the annular magnet (7), six groups of permalloy magnetic poles (9) are distributed at the outer ring of the annular magnet (7) in a circular array shape, and the side faces of the six groups of permalloy magnetic poles (9) are respectively a first magnetic pole (1), a second magnetic pole (2), a third magnetic pole (3), a fourth magnetic pole (4), a fifth magnetic pole (5) and a sixth magnetic pole (6).
9. The apparatus of claim 8 for the deposition of refractory metals with a multi-stage controllable combined magnetic field arc ion source, wherein: the permalloy magnetic pole (9) is fixedly provided with a cylindrical magnet (8) on the side far away from the annular magnet (7), a horizontal exciting coil (10) is wound on the outer ring of the cylindrical magnet (8), and a vertical magnetic pole exciting coil (11) is wound on the outer ring of the end, far away from the permalloy magnetic pole (9), of the annular magnet (7).
10. The apparatus of claim 9 for the deposition of refractory metals with a multi-stage controllable combined magnetic field arc ion source, wherein: the annular magnet (7) is of a ring structure, the permalloy magnetic pole (9) is of a trapezoidal structure, and the cylindrical magnet (8) is of a cylindrical structure.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210177566.6A CN114657518A (en) | 2022-02-24 | 2022-02-24 | Insoluble metal deposition equipment with multistage controllable composite magnetic field arc ion source |
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| CN202210177566.6A CN114657518A (en) | 2022-02-24 | 2022-02-24 | Insoluble metal deposition equipment with multistage controllable composite magnetic field arc ion source |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105632859A (en) * | 2007-04-17 | 2016-06-01 | 欧瑞康梅塔普拉斯有限责任公司 | Vacuum arc vaporization source, and an arc vaporization chamber with a vacuum arc vaporization source |
| CN109468598A (en) * | 2018-11-15 | 2019-03-15 | 温州职业技术学院 | A kind of rotating excitation field cathode arc source |
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- 2022-02-24 CN CN202210177566.6A patent/CN114657518A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105632859A (en) * | 2007-04-17 | 2016-06-01 | 欧瑞康梅塔普拉斯有限责任公司 | Vacuum arc vaporization source, and an arc vaporization chamber with a vacuum arc vaporization source |
| CN109468598A (en) * | 2018-11-15 | 2019-03-15 | 温州职业技术学院 | A kind of rotating excitation field cathode arc source |
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