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CN114539847B - Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix - Google Patents

Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix Download PDF

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Publication number
CN114539847B
CN114539847B CN202111299836.2A CN202111299836A CN114539847B CN 114539847 B CN114539847 B CN 114539847B CN 202111299836 A CN202111299836 A CN 202111299836A CN 114539847 B CN114539847 B CN 114539847B
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black matrix
black
pigment dispersion
dispersion composition
mass
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CN114539847A (en
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辻康人
灰藤哲
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Sakata Inx Corp
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Sakata Inx Corp
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00Pigment pastes, e.g. for mixing in paints
    • C09D17/004Pigment pastes, e.g. for mixing in paints containing an inorganic pigment
    • C09D17/005Carbon black
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/04Carbon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0091Complexes with metal-heteroatom-bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/15Heterocyclic compounds having oxygen in the ring
    • C08K5/151Heterocyclic compounds having oxygen in the ring having one oxygen atom in the ring
    • C08K5/1515Three-membered rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/17Amines; Quaternary ammonium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/17Amines; Quaternary ammonium compounds
    • C08K5/18Amines; Quaternary ammonium compounds with aromatically bound amino groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/36Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/41Compounds containing sulfur bound to oxygen
    • C08K5/42Sulfonic acids; Derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/44Carbon
    • C09C1/48Carbon black
    • C09C1/56Treatment of carbon black ; Purification
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/10Treatment with macromolecular organic compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00Pigment pastes, e.g. for mixing in paints
    • C09D17/003Pigment pastes, e.g. for mixing in paints containing an organic pigment
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/86Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K50/865Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers

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  • Chemical & Material Sciences (AREA)
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  • Physics & Mathematics (AREA)
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  • Health & Medical Sciences (AREA)
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  • Engineering & Computer Science (AREA)
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  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
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  • Architecture (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)

Abstract

本发明提供一种黑矩阵用颜料分散组合物,由其能够形成即使进行高温且长时间的后烘烤也不降低表面电阻值的黑矩阵,并且能够得到断点不随保存时间而变化的黑矩阵用抗蚀剂组合物。一种黑矩阵用颜料分散组合物,其包含黑色着色剂、酞菁铜的磺化物和环氧化合物。The present invention provides a pigment dispersion composition for a black matrix, which can form a black matrix whose surface resistance value does not decrease even after high-temperature and long-term post-baking, and can obtain a black matrix resist composition whose breakpoint does not change with storage time. A pigment dispersion composition for a black matrix, which contains a black colorant, a sulfonate of copper phthalocyanine, and an epoxy compound.

Description

Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix
Cross reference to related applications
The present application claims priority to the application patent application "Japanese patent application 2020-195212" filed in Japanese patent application No. 11/25/2020, and the disclosure of this application is incorporated herein in its entirety into the present specification.
Technical Field
The present invention relates to a pigment dispersion composition for a black matrix, a resist composition for a black matrix, and a black matrix.
Background
A light shielding film (black matrix, also called "black matrix") is provided at a gap of a coloring pattern in a screen display region and an edge of a peripheral portion of the display region in an image display device using liquid crystal, plasma, or the like, and also at an external light side of a TFT in a liquid crystal display using the TFT.
In addition, the liquid crystal display device is mainly used for preventing leakage from backlight and reflection on a screen, and the plasma display device is mainly used for preventing bleeding and reflection on a screen due to confusion of light of each color, thereby contributing to improvement of display characteristics (contrast and color purity).
For example, color filters for converting white light of a backlight of a liquid crystal display device into color light are generally manufactured by a method of sequentially forming pixels of different hues of red, green, and blue on a surface of a transparent substrate such as glass or plastic sheet on which a black matrix is formed in a stripe shape, a mosaic shape, or the like.
In addition, even in a touch panel in which an image display device is aligned with a position input device, a color filter (color filter) in which a black matrix is formed as a light shielding film is used similarly, and has been conventionally formed on the side opposite to a sensor substrate via a glass cover plate (protective sheet). However, as the demand for weight reduction of touch panels increases, in order to achieve further weight reduction, development of a technology for simultaneously forming a light shielding film and a touch sensor on the same side as a glass cover plate has been advanced.
As a method for forming such a black matrix, for example, photolithography using a pigment (pigment method) is used.
In this pigment method, a sulfonic acid derivative of copper phthalocyanine may be used in order to improve dispersibility of the pigment.
For example, patent document 1 discloses a pigment dispersion composition for a black matrix, which is characterized in that carbon black having an oil absorption of 10 to 150ml/100g and a pH value of more than 9, a urethane-based polymer pigment dispersant having a polyester chain and containing a basic group, and a phthalocyanine derivative having a sulfonic acid group as a pigment derivative having an acid group are dispersed in a solvent.
In recent years, image display devices are applied to various situations such as mobile applications.
As the use of such an image display device expands, the demand for a more robust black matrix increases.
As a method for making the black matrix stronger, a method of performing post baking at a high temperature for a long time is sometimes used.
However, in patent document 1, there is still room for further improvement in that reduction of the surface resistance value by the post-baking at high temperature for a long time has not been sufficiently studied.
On the other hand, in the pigment dispersion resist composition for a black matrix, it is required to have a property that the break point (the time at which the unexposed portion is dissolved and peeled off in the developing step and the developed pattern starts to appear) does not change with the storage time.
Accordingly, there is a need for a pigment dispersion composition for a black matrix, which can provide such a pigment dispersion resist composition for a black matrix, but there is room for further improvement because the studies are not fully made in patent document 1.
Prior art literature
Patent literature
Patent document 1 International publication No. 2008/066100
Disclosure of Invention
Technical problem to be solved by the invention
Accordingly, an object of the present invention is to provide a pigment dispersion composition for a black matrix, which is a resist composition for a black matrix capable of forming a black matrix which does not reduce the surface resistance value even when subjected to a post-baking at a high temperature for a long period of time and which is capable of obtaining a resist composition for a black matrix in which the break point does not change with the storage time.
Means for solving the problems
The present inventors have found that a pigment dispersion composition for a black matrix, which contains a black colorant, a sulfonate of copper phthalocyanine and an epoxy compound, does not lower the surface resistance value even when subjected to post baking at high temperature for a long period of time, and can obtain a resist composition for a black matrix whose break point does not change with the storage time, has completed the present invention.
That is, the present invention is a pigment dispersion composition for a black matrix comprising a black colorant, a sulfonate of copper phthalocyanine and an epoxy compound.
The epoxy compound preferably has a bisphenol skeleton.
The pigment dispersion composition for a black matrix of the present invention preferably further comprises an amine compound having a molecular weight of 300 or less, wherein the amine compound has two or more carbon atoms within 3 atoms after the nitrogen atom of the amino group is started and/or the amino group is connected to one or more aromatic rings through a hydrocarbon group having 3 or less carbon atoms.
The amine compound having a molecular weight of 300 or less is preferably at least one selected from the group consisting of 3-amphetamine, 1, 3-tetramethylbutylamine and triisobutylamine.
Further, the sulfonate of copper phthalocyanine preferably has 0.5 to 3 sulfonic acid groups in the molecule, more preferably 0.5 to 1.5 sulfonic acid groups.
In addition, it is preferable that the black colorant contains carbon black.
In addition, it is preferable that the carbon black is an acidic carbon black.
The present invention also relates to a resist composition for a black matrix obtained by using the pigment dispersion composition for a black matrix.
The present invention also relates to a black matrix formed by the resist composition for a black matrix.
Effects of the invention
The present invention can provide a pigment dispersion composition for a black matrix, which is a resist composition for a black matrix that can form a black matrix that does not reduce the surface resistance value even when subjected to a post-baking at high temperature for a long period of time and can obtain a black matrix with a break point that does not change with the storage time.
Detailed Description
< Pigment Dispersion composition for Black matrix >
The pigment-dispersion composition for a black matrix of the present invention contains a black colorant, a sulfonate of copper phthalocyanine, and an epoxy compound, and satisfies the following condition (a) or (B):
(A) Does not contain an amine compound having a molecular weight of 300 or less;
(B) The aromatic compound further comprises an amine compound having a molecular weight of 300 or less, wherein the amine compound having a molecular weight of 300 or less is an amine compound having a secondary or more carbon atom within 3 atoms from the nitrogen atom of the amino group and/or an amine compound in which the amino group is linked to one or more aromatic rings through a hydrocarbon group having 3 or less carbon atoms.
The following describes each component.
(Black colorant)
The pigment-dispersion composition for a black matrix of the present invention contains a black colorant.
The black colorant preferably contains carbon black, and more preferably the carbon black is an acidic carbon black.
The carbon black is preferably neutral carbon black having an average primary particle diameter of 20 to 60nm, and/or acidic carbon black having an average primary particle diameter of 20 to 60nm is more preferably used.
When the primary particle diameter of the black colorant is less than 20nm or more than 60nm, the black colorant may not have sufficient light-shielding properties and may have poor storage stability.
The average primary particle diameter is a value of an arithmetic average particle diameter obtained by observation with an electron microscope.
From the viewpoint of appropriately imparting a surface resistance value, it is preferable that the black colorant contains only acidic carbon black.
On the other hand, in the case of using the neutral carbon black and the acid carbon black in combination, the neutral carbon black is preferably 85 mass% or less, more preferably 75 mass% or less, relative to the total mass of the neutral carbon black and the acid carbon black.
When the content of the neutral carbon black in the carbon black is more than 85 mass%, the seal strength may be lowered.
The acidic carbon black and the neutral carbon black are described.
Carbon black can be broadly classified into acid carbon black and neutral carbon black according to the surface structure. Acidic carbon black refers to a carbonaceous material that has been oxidized or artificially oxidized and exhibits acidity when boiled in combination with distilled water. On the other hand, neutral carbon black is known to exhibit a neutral or higher pH when boiled in combination with distilled water.
The neutral carbon black preferably has a pH in the range of 8.0 to 10.0, and specifically, PRINTEX parts (average primary particle size: 56nm, pH 9.5), PRINTEX (average primary particle size: 31nm, pH 9.5), PRINTEX (average primary particle size: 21nm, pH 9.5), MA#20 (average primary particle size: 40nm, pH 8.0), MA#40 (average primary particle size: 40nm, pH 8.0), MA#30 (average primary particle size: 30nm, pH 8.0) and the like, which are manufactured by European technology charcoal corporation (Orion Engineered Carbons).
The pH of the acidic carbon black is preferably in the range of 2.0 to 4.0, and specific examples thereof include Raven 10 8 (average primary particle diameter of 28nm, pH 2.4) and Raven 1100 (average primary particle diameter of 32nm, pH 2.9) manufactured by Columbia chemical Co., ltd.), MA-8 (average primary particle diameter of 24nm, pH 3.0) and MA-100 (average primary particle diameter of 22nm, pH 3.5) manufactured by Mitsubishi chemical Co., ltd., specialBlack250 (average primary particle diameter of 56nm, pH 3.0) and SpecialBlack (average primary particle diameter of 31nm, pH 3.0) and SpecialBlack550 (average primary particle diameter of 25nm, pH 4.0) and NEROX (average primary particle diameter of about 28nm, pH about 2.8) manufactured by Euron engineering carbon Co., ltd.
As the black colorant, specialBlack250 or NEROX305 is preferable from the viewpoint of appropriately imparting pigment dispersibility or surface resistance value.
Alternatively, the pH can be determined by adding 1g of carbon black to 20ml of distilled water (pH 7.0) from which carbonic acid has been removed, mixing with a magnetic stirrer, preparing an aqueous suspension and measuring at 25℃using a glass electrode (German industrial standard specification DIN ISO 787/9).
The content of the black colorant is preferably 3 to 70% by mass, more preferably 10 to 50% by mass, based on the mass fraction of the total solid content of the pigment dispersion composition for a black matrix of the present invention.
In the case where the content of the black coloring agent is less than 3% by mass, the light-shielding property when forming a black matrix may be lowered, and in the case where the content exceeds 70% by mass, pigment dispersion may be difficult.
(Sulfonate of copper phthalocyanine)
The pigment dispersion composition for a black matrix of the present invention contains a sulfonate of copper phthalocyanine.
The copper phthalocyanine sulfonate has an effect of improving the micronization of the black colorant at the time of dispersion, the dispersion stability after dispersion, and the like by improving the affinity between the sulfonic acid group and the organic solvent or the pigment dispersant by adsorbing a part of the basic skeleton to the pigment surface in the step of micronization or dispersion of the black colorant.
The copper phthalocyanine in the sulfonated product of copper phthalocyanine is not particularly limited as long as it has a copper phthalocyanine skeleton, and may have a known substituent such as an alkyl group or a halogen atom on the copper phthalocyanine skeleton, but a structure having no substituent is preferable from the viewpoint of easy introduction of a sulfonic acid group.
The sulfonate of copper phthalocyanine preferably has 0.5 to 3 sulfonic acid groups in the molecule.
Thus, a composition for a black matrix, which can obtain a coating film having an excellent surface resistance value, can be formed by having 0.5 to 3 sulfonic acid groups in the molecule.
The sulfonate of copper phthalocyanine preferably has 0.5 to 1.5 sulfonic acid groups in the molecule, more preferably 0.7 to 1.5 sulfonic acid groups.
The number of sulfonic acid groups in the molecule can be determined from the ratio of sulfur atoms to copper atoms obtained by elemental analysis.
As the sulfonated copper phthalocyanine, commercially available products can be used, and examples thereof include Solsperse 12000 (manufactured by Lubrizol Co., ltd. (The Lubrizol Corporation) of Japan) and sodium-removed products of VALIFAST BLUE 1605.
The content of the sulfonated copper phthalocyanine is preferably 0.1 to 20 parts by mass, more preferably 1 to 15 parts by mass, per 100 parts by mass of the black colorant.
(Epoxy Compound)
The pigment-dispersion composition for a black matrix of the present invention contains an epoxy compound.
By including the epoxy compound, the multifunctional epoxy resin and the functional groups present on the surface of the carbon black appropriately interact with each other, and thus it is estimated that a black matrix can be formed which does not lower the surface resistance value even when post-baking is performed at high temperature for a long period of time.
The invention is not limited to the use of the above mechanism.
Examples of the epoxy compound include Epoligo (d) and Epolite 4000,Eopolite 3002 (manufactured by Mitsubishi chemical Co., ltd., ),Denacor(デナコール)DLC-101,Denacor DLC-202,Denacor EX-141;Denacor EX-142,Denacor EX-145,Denacor EX-146,Denacor EX-147(, nagase ChemteX Corporation, ),GAN、GOT、NC2000-L,NC3000,NC3000-L,NC3000-H,NC3000-FH-75M,NC3100,CER3000-L,XD1000,NC7000L,NC7300L、EPPN-201、EPPN-501H、EPPN-501HY、EPPN502H、EOCN-1020、EOCN-102S、EOCN-103S、EOCN-104S、CER-1020、RE303S-L、RE310S(, kyowa industrial Co., ltd.), jER157S70, jER828, jER1002, jER1032H60, jER1750, jER1007, YX8100-BH30, E1256, E4250, E4275 (manufactured by Mitsubishi chemical Co., ltd.), epicron EXA-9583, epicron N695, HP4032, HP5000, HP7200L (manufactured by DIC Co., ltd.), 3101 (manufactured by Mitsubishi chemical Co., ltd.), EPOTOHTO (manufactured by Etrek) YH-434L (manufactured by Kyowa chemical Co., ltd.), VG 1L (AIR Shui Zhushi Co., ltd.), and the like.
The epoxy compound is preferably at least one selected from the group consisting of the following formulas (1) to (7).
Among the above epoxy compounds, the bisphenol skeleton is more preferable from the viewpoint of forming a black matrix particularly excellent in surface resistance value and sealing strength, and the following structure (formula 2) is further preferable.
[ In formula 1, R 1 is independently hydrogen or a hydrocarbon group having 1 to 6 carbon atoms, and n is 0 to 20]
[ In formula 3, n is 1 to 20] and [ in formula 4, R 1~R6 is independently a saturated hydrocarbon group having 1 to 6 carbon atoms, n is 1 to 20]
[ In formula 5, n is 1 to 20] and [ in formula 6, R 1~R2 is independently hydrogen or a saturated hydrocarbon group having 1 to 6 carbon atoms, n is 1 to 20]
[ In formula 7, n is 1 to 20].
The content of the epoxy compound is preferably 1% by mass or more, more preferably 2% by mass or more, and still more preferably 3% by mass or more, based on the total solid content of the pigment dispersion composition for a black matrix of the present invention. The content of the epoxy resin is preferably 12.0 mass% or less, more preferably 10.0 mass% or less, and even more preferably 9.0 mass% or less, based on the mass of the total solid content of the pigment dispersion composition for a black matrix according to the present invention.
(Amine Compound having a molecular weight of 300 or less)
The pigment dispersion composition for a black matrix of the present invention preferably further contains an amine compound having a molecular weight of 300 or less and having two or more carbon atoms within 3 atoms after the nitrogen atom of the amino group and/or an amine compound in which the amino group is linked to one or more aromatic rings through a hydrocarbon group having 3 or less carbon atoms, from the viewpoint of forming a black matrix having a high surface resistance value and capable of maintaining the surface resistance value even when subjected to post baking at high temperature for a long period of time.
The amine compound having a molecular weight of 300 or less is an amine compound having a secondary or more carbon atom within 3 atoms after the nitrogen atom of the amino group and/or an amine compound in which the amino group is linked to one or more aromatic rings through a hydrocarbon group having 3 or less carbon atoms.
By containing such an amine compound, the electron pair on the nitrogen atom is buried by the bulky substituent, and as a result, the ionic nature is gentle during the neutralization of the amine compound and the copper phthalocyanine sulfonate, and therefore, energization due to the ionic nature can be suppressed. In addition, the proximity between pigment particles is suppressed due to steric hindrance caused by bulky substituents.
The invention is not limited to the use of the above mechanism.
The amine compound having a carbon atom of two or more atoms within 3 atoms from the nitrogen atom of the above amino group is preferably an amine compound having a carbon atom of two or more atoms within 3 atoms from the nitrogen atom of all amino groups present in the amine compound, and specifically, 1, 3-tetramethylbutylamine, diisopropylamine, triisopropylamine, diisobutylamine, triisobutylamine, diisopentylamine, triisopentylamine, tris (2-ethylhexyl) amine, and the like can be mentioned.
Note that the term "within 3 atoms after the start of the nitrogen atom of the amino group" means that the number of atoms adjacent to the nitrogen atom of the amino group is 1, the number of atoms adjacent to the nitrogen atom is 2, and the number of atoms adjacent to the nitrogen atom is 3.
Examples of the amine compound in which the amino group is linked to one or more aromatic rings through a hydrocarbon group having 3 or less carbon atoms include 3-phenylpropylamine, 2-phenylpropylamine, 1-phenylpropylamine, 2-phenylethylamine, 1-phenylethylamine, phenylmethylamine, and triphenylmethylamine.
The amine compound having a molecular weight of 300 or less is preferably at least one selected from the group consisting of 3-amphetamine, 1, 3-tetramethylbutylamine and triisobutylamine, from the viewpoint of appropriately improving the surface resistance value.
The amine compound having a molecular weight of 300 or less is preferably 5 to 100 parts by mass, more preferably 20 to 60 parts by mass, per 100 parts by mass of the copper phthalocyanine sulfonate.
(Organic solvent)
The pigment-dispersion composition for a black matrix of the present invention preferably contains an organic solvent.
As the organic solvent, an organic solvent conventionally used in the field of liquid crystal black matrix resists can be preferably used.
Specifically, the organic solvent is an ester organic solvent, an ether ester organic solvent, a ketone organic solvent, an aromatic hydrocarbon organic solvent, a nitrogen-containing organic solvent, or the like having a boiling point of 100to 250 ℃ under normal pressure (1.013X10 2 kPa).
When the organic solvent having a boiling point of more than 250 ℃ is contained in a large amount, the organic solvent may not be sufficiently evaporated and remain in the dried coating film when the coating film formed by applying the black matrix resist composition obtained from the pigment dispersion composition for a black matrix of the present invention is prebaked, and the heat resistance of the dried coating film may be lowered.
In addition, when the organic solvent having a boiling point of less than 100 ℃ is contained in a large amount, it is difficult to uniformly coat the film without any deviation, and a coating film having excellent surface smoothness may not be obtained.
Specific examples of the organic solvent include ether-type organic solvents such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol methylethyl ether, etc., ether-type organic solvents such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, etc., ketone-type organic solvents such as methyl isobutyl ketone, cyclohexanone, 2-heptanone, delta-butyrolactone, etc., ester-type organic solvents such as methyl isobutyl ketone, methyl 2-hydroxy propionate, ethyl 2-hydroxy-2-methylpropionate, 3-methyl-3-methoxybutyl propionate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, ethyl glycolate, N-amyl formate, etc., solvents such as methanol, ethanol, isopropanol, etc., alcohols such as N-methylpyrrolidone, N-dimethylformamide, N-dimethylacetamide, etc. These may be used singly or in combination of two or more.
Among the above organic solvents, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, 2-heptanone, ethyl 2-hydroxypropionate, 3-methyl-3-methoxybutyl propionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, n-pentyl formate and the like are preferable from the viewpoints of solubility, dispersibility, coatability and the like, and propylene glycol monomethyl ether acetate are more preferable.
(Pigment dispersant)
The pigment-dispersion composition for a black matrix of the present invention preferably contains a pigment dispersant.
As the pigment dispersant, an anionic surfactant, a polyester pigment dispersant containing an alkali group, an acrylic pigment dispersant containing an alkali group, a polyurethane pigment dispersant containing an alkali group, a carbodiimide pigment dispersant containing an alkali group, a polymer pigment dispersant containing an acid group, and the like can be used.
These basic group-containing pigment dispersants may be used alone, or a combination of two or more thereof may be used. Among them, a polymer pigment dispersant containing a basic group is preferable from the viewpoint of obtaining good pigment dispersibility.
Specific examples of the basic group-containing polymer pigment dispersant include:
(1) A reaction product of an amino group and/or an imino group of a polyamine compound (for example, a poly (lower) alkylene amine such as polyallylamine, polyvinylamine, and polyethyleneimine (polyethylene polyimine)) with at least one selected from the group consisting of a polyester having a free carboxyl group, a polyamide, and a polyesteramide (Japanese patent application laid-open No. 2001-59906);
(2) Reaction products of low molecular amine compounds such as poly (lower) alkylene imines and methyliminodipropylamine with polyesters having free carboxyl groups (Japanese patent application laid-open No. 54-37082, japanese patent application laid-open No. 01-311177);
(3) A reaction product obtained by sequentially reacting an alcohol such as methoxypolyethylene glycol, a polyester having 1 hydroxyl group such as caprolactone polyester, a compound having 2 to 3 isocyanate group-reactive functional groups, an aliphatic or heterocyclic compound having an isocyanate group-reactive functional group and a tertiary amino group with an isocyanate group of a polyisocyanate compound (JP-A02-612);
(4) A compound obtained by reacting a polyisocyanate compound, a hydrocarbon compound having an amino group, and a polymer of an acrylic ester having an alcoholic hydroxyl group;
(5) A reaction product obtained by adding a polyether chain to a low-molecular amine compound;
(6) A reaction product obtained by reacting a compound having an amino group with a compound having an isocyanate group (Japanese patent application laid-open No. 04-210220);
(7) A reaction product obtained by reacting a linear polymer having a free carboxyl group, an organic amine compound having 1 secondary amine group, and a polyepoxide compound (Japanese patent application laid-open No. 09-87537);
(8) A reaction product of a polycarbonate compound having a functional group capable of reacting with an amino group at one end with a polyamine compound (Japanese patent application laid-open No. 09-194585);
(9) Copolymers of at least one of methacrylates or acrylates selected from the group consisting of methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, octadecyl methacrylate, benzyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, octadecyl acrylate, benzyl acrylate and at least one of polymerizable monomers having a basic group such as acrylamide, methacrylamide, N-methylolamide, vinylimidazole, vinylpyridine, monomers having an amino group and polycaprolactone skeleton and at least one of monomers having a basic group selected from the group consisting of styrene, styrene derivatives and other polymerizable monomers (japanese patent application laid-open No. 01-164429);
(10) A carbodiimide pigment dispersant containing a basic group (International publication WO 04/000950);
(11) A block copolymer comprising a block having a basic group such as a tertiary amino group or a quaternary ammonium base and a block having no functional group (see Japanese patent application laid-open No. 2005-55814);
(12) Pigment dispersants obtained by subjecting a polycarbonate compound to a Michael addition reaction with a polyallylamine (Japanese patent application laid-open No. 09-194585);
(13) Carbodiimide compounds each having at least one polybutadiene chain and a basic nitrogen-containing group (Japanese patent application laid-open No. 2006-257243);
(14) Carbodiimide compounds each having at least one side chain having an amide group and a basic nitrogen-containing group in the molecule (Japanese patent application laid-open No. 2006-17657);
(15) A polyurethane compound having a structural unit having an ethylene oxide chain and a propylene oxide chain and having an amino group quaternized with a quaternizing agent (japanese patent application laid-open No. 2009-175613);
(16) A compound obtained by reacting an isocyanate group of an isocyanate compound having an isocyanurate ring in a molecule with an active hydrogen group of a compound having an active hydrogen group in a molecule and a carbazole ring and/or an azobenzene skeleton, wherein the number of carbazole rings and azobenzene skeletons in the molecule of the compound is 15 to 85% relative to the total of isocyanate groups derived from the isocyanate compound having an isocyanurate ring, urethane bonds and urea bonds generated by the reaction of the isocyanate group and the active hydrogen group (japanese patent application 2009-220836);
(17) Graft copolymers in which polyether or polyester side chains are introduced into an acrylic polymer having amino groups.
Among the above-mentioned basic group-containing polymer pigment dispersants, the basic group-containing polyurethane pigment-based polymer pigment dispersant, the basic group-containing polyester-based polymer pigment dispersant and the basic group-containing acrylic polymer pigment dispersant are more preferable, and the amino group-containing polyurethane pigment-based polymer pigment dispersant, the amino group-containing polyester-based polymer pigment dispersant and the amino group-containing acrylic polymer pigment dispersant are more preferable. Among the above-mentioned basic group-containing polymer pigment dispersants, a polymer pigment dispersant having a basic group (amino group) selected from at least one of a polyester chain, a polyether chain, and a polycarbonate chain is particularly preferable.
The content of the pigment dispersant is preferably 1 to 200 parts by mass, more preferably 5 to 100 parts by mass, based on 100 parts by mass of the black colorant.
(Adhesive resin)
The pigment-dispersion composition for a black matrix of the present invention preferably contains a binder resin.
The binder resin may be a thermosetting resin, a thermoplastic resin, a photopolymerizable compound, an alkali-soluble resin, or the like. These may be used alone or in combination of two or more.
Examples of the thermosetting resin or thermoplastic resin include butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, polyurethane resin, phenol resin, polyester resin, acrylic resin, alkyd resin, styrene resin, polyamide resin, rubber resin, cyclized rubber, epoxy resin, cellulose, polybutadiene, polyimide resin, benzoguanamine resin, melamine resin, urea resin (urea resin), and the like.
Examples of the photopolymerizable compound include monomers having one or more photopolymerizable unsaturated bonds in the molecule, and oligomers having photopolymerizable unsaturated bonds.
As the monomer having one photopolymerizable unsaturated bond in the molecule, there may be used methacrylic acid alkyl esters or acrylic acid esters such as methyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, methyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, etc., methacrylic acid aralkyl esters or acrylic acid esters such as benzyl methacrylate, benzyl acrylate, etc., methacrylic acid alkoxyalkyl esters or acrylic acid esters such as butoxyethyl methacrylate, butoxyethyl acrylate, etc., methacrylic acid aminoalkyl esters or acrylic acid esters such as N, N-dimethylaminoethyl methacrylate, N-dimethylaminoethyl acrylate, etc., methacrylic acid esters or acrylic acid esters of polyalkylene glycol monoalkyl ethers such as diethylene glycol monoethyl ether, triethylene glycol monobutyl ether, dipropylene glycol monomethyl ether, etc., polyalkylene glycol monoaryl ether methacrylic acid esters or acrylic acid esters such as hexaglycol monophenyl ether, etc., isobornyl methacrylate or acrylic acid esters, glycerol methacrylate or acrylic acid esters, 2-hydroxyethyl methacrylate, etc.
As the monomer having two or more photopolymerizable unsaturated bonds in the molecule, bisphenol A dimethacrylate, 1, 4-butanediol dimethacrylate, 1, 3-butanediol dimethacrylate, diethylene glycol dimethacrylate, glycerol dimethacrylate, neopentyl glycol dimethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol hexamethylacrylate, dipentaerythritol pentamethacrylate, epoxymethacrylate, bisphenol A diacrylate, 1, 4-butanediol diacrylate, 1, 3-butanediol diacrylate, diethylene glycol diacrylate, glycerol diacrylate, neopentyl glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, epoxyacrylate and the like can be used.
As the oligomer having a photopolymerizable unsaturated bond, an oligomer obtained by appropriately polymerizing the monomer can be used.
The binder resin may be used alone or in combination of two or more.
As the binder resin, an epoxy acrylate resin is preferable from the viewpoints of heat resistance and developability.
The alkali-soluble resin will be described later.
The content of the binder resin is preferably 3 to 50% by mass based on the total solid content of the pigment dispersion composition for a black matrix of the present invention.
(Method for producing pigment-dispersed composition for Black matrix)
The method for producing the pigment-dispersion composition for a black matrix of the present invention can be obtained by adding the above-described various components, mixing and grinding the components.
The method for performing the ink grinding treatment is not particularly limited, and for example, a bead Mill, a preliminary Mill (readymill), an ultrasonic homogenizer, a high-pressure homogenizer, a paint mixer (PAINT SHAKER), a ball Mill, a roller Mill, a sand Mill (sand Mill), a sand Mill (SAND GRINDER), a Dyno Mill (Dyno-Mill), a high-speed Disperser (DISPERMAT), an SC Mill, a high-pressure homogenizer (Nanomizer) and the like may be used, and the ink grinding treatment may be performed by a known method.
< Resist composition for Black matrix >
The present invention also relates to a resist composition for a black matrix obtained from the pigment dispersion composition for a black matrix of the present invention.
(Pigment-dispersed composition for black matrix)
The resist composition for a black matrix of the present invention contains the pigment dispersion composition for a black matrix of the present invention described above.
The content of the pigment dispersion composition for a black matrix is preferably 30 to 80% by mass, more preferably 40 to 75% by mass, based on the total mass of the resist composition for a black matrix of the present invention.
(Photopolymerization initiator)
The resist composition for a black matrix of the present invention preferably contains a photopolymerization initiator.
Examples of the photopolymerization initiator include, but are not limited to, photopolymerization initiators such as 1- [ 9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl ] -1- (O-acetyl oxime) ethanone, benzophenone, N ' -tetraethyl-4, 4' -diaminobenzophenone, 4-methoxy-4 ' -dimethylaminobenzophenone, 2-diethoxyacetophenone, benzoin methyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, α -hydroxyisobutyl benzophenone, thioxanthone, 2-chlorothioxanthone, 1-hydroxycyclohexyl phenyl ketone, t-butyl anthraquinone, 1-chloroanthraquinone, 2, 3-dichloroanthraquinone, 3-chloro-2-methyl anthraquinone, 2-ethylanthraquinone, 1, 4-naphthoquinone, 1, 2-benzanthraquinone, 1, 4-dimethyl anthraquinone, 2-phenyl, 2-methyl-1- (4-thiophenyl) -2-thioxanthone, and 1-triazinone.
The photopolymerization initiator may be used alone or in combination of two or more.
The content of the photopolymerization initiator is preferably 1 to 20% by mass based on the total solid content of the resist composition for a black matrix of the present invention.
(Photopolymerizable Compound)
The resist composition for a black matrix of the present invention preferably contains a photopolymerizable compound.
As the photopolymerizable compound, those described for the pigment dispersion composition for a black matrix can be appropriately selected and used.
The content of the photopolymerizable compound is preferably 0.1 to 50 mass% based on the mass fraction of the total solid content of the resist composition for a black matrix of the present invention.
(Alkali-soluble resin)
The resist composition for a black matrix of the present invention preferably contains an alkali-soluble resin.
As the alkali-soluble resin, a resin which functions as a binder for the black colorant and which is soluble in a developer (particularly an alkali developer) used in the development treatment step when manufacturing a black matrix is preferable.
The alkali-soluble resin may be a block copolymer. By using a block copolymer, pigment dispersibility improves as compared with other copolymers, and solubility to PGMEA or an alkaline developer can be imparted.
Among the block copolymers, a block copolymer having a block composed of an ethylenically unsaturated monomer having one or more carboxyl groups and a block composed of another copolymerizable ethylenically unsaturated monomer is preferable.
The block copolymer is not particularly limited, and a block copolymer generally used can be used. Specifically, there may be mentioned a copolymer of a carboxyl group-containing ethylenically unsaturated monomer such as acrylic acid or methacrylic acid and at least one ethylenically unsaturated monomer selected from the group consisting of styrene, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, glycerol monoacrylate, glycerol methacrylate, N-phenylmaleimide, polystyrene macromonomer and polymethyl methacrylate macromonomer, which can be copolymerized with the carboxyl group-containing ethylenically unsaturated monomer.
However, it is preferable not to use N-vinylpyrrolidone or a monomer containing a sulfur element.
As the block copolymer, a block resin synthesized by living radical polymerization and anionic polymerization can be used.
A part of the block portion of the block copolymer may be constituted of a random copolymer.
As the alkali-soluble resin, an alkali-soluble Cardo resin (Cardo resin) may be used.
Examples of the alkali-soluble Cardo resin include an epoxy (meth) acrylate acid adduct having a fluorene skeleton, which is an adduct of a fluorene epoxy (meth) acrylic acid derivative and a dicarboxylic anhydride and/or a tetracarboxylic dianhydride.
In addition, the alkali-soluble resin may have a photopolymerizable functional group.
The acid value of the alkali-soluble resin is preferably 5 to 300mgKOH/g, more preferably 5 to 250mgKOH/g, still more preferably 10 to 200mgKOH/g, particularly preferably 60 to 150mgKOH/g, from the viewpoint of development characteristics.
In the present specification, the acid value is a theoretical acid value, and is obtained by calculation based on the ethylenically unsaturated monomer having a carboxyl group and the content thereof.
The weight average molecular weight of the alkali-soluble resin is preferably 1000 to 100000, more preferably 3000 to 50000, and even more preferably 5000 to 30000, from the viewpoints of development characteristics and solubility in an organic solvent.
In the present invention, the weight average molecular weight is a polystyrene-equivalent weight average molecular weight obtained by GPC.
In the present specification, water2690 (manufactured by Waters) was used as a device for measuring the weight average molecular weight, and PLgel 5 μm MIXED-D (manufactured by Agilent Technologies) was used as a column.
The content of the alkali-soluble resin is preferably 1 to 200 parts by mass, more preferably 10 to 150 parts by mass, per 100 parts by mass of the black colorant.
In this case, if the content of the alkali-soluble resin is less than 1 part by mass, the development characteristics may be degraded, and if the content of the alkali-soluble resin exceeds 200 parts by mass, the concentration of the black colorant is relatively reduced, so that it may be difficult to achieve a target color concentration as a thin film.
The alkali-soluble resin preferably contains no primary amino group, no secondary amino group, or no tertiary amino group, and more preferably contains no quaternary ammonium group. Further, it is more preferable that the alkali group is not contained.
In addition, an alkali-soluble resin having a structure other than the block copolymer may be mixed within a range that does not impair the effects of the present invention.
(Organic solvent)
As the above organic solvent, those organic solvents which have been described for the pigment-dispersion composition for a black matrix described above can be appropriately selected and used.
The content of the organic solvent is preferably 1 to 40 mass%, more preferably 5 to 35 mass%, based on the total mass of the resist composition for a black matrix of the present invention.
(Other additives)
The resist composition for a black matrix of the present invention may appropriately use various additives such as a heat-blocking agent (heat-polymerization inhibitor), an ultraviolet absorber, and an antioxidant, as needed.
(Breakpoint)
The break point change after the production and after 1 week of storage at 60 ℃ of the pigment dispersion resist composition for a black matrix of the present invention is preferably within ±3 seconds, more preferably within ±2 seconds, still more preferably within ±1.5 seconds, particularly preferably within ±1.0 seconds, and most preferably within ±0.5 seconds.
If the break point change is within ±3 seconds, it can be determined that the break point has sufficient properties not to change with the storage time.
In addition, the breakpoint change can be measured as follows.
The pigment dispersion resist composition for a black matrix was coated on a glass substrate (EAGLE XG) using a spin coater and the film thickness was made 1 μm, and pre-baked at 100 ℃ for 2 minutes.
Then, a resist film containing an exposed portion (cured portion) was produced by exposing the resist film to light of 50mJ/cm 2 UV cumulative light quantity by a high-pressure mercury lamp using a photomask having a line pattern of 5 μm, 8 μm, 10 μm, 15 μm, 20 μm, 30 μm.
Next, a time point at which the developed pattern started to appear was measured using a 0.05% potassium hydroxide aqueous solution (developer) under a spray pressure of 1.0kgf/cm 2 at 23 ℃.
By measuring the breakpoint (BP 1) immediately after production and the breakpoint (BP 2) after 1 week of storage at 60 ℃, Δbp (breakpoint change) can be obtained by the following formula.
ΔBP=BP2-BP1
(Method for producing resist composition for Black matrix)
The method for producing the black matrix resist composition of the present invention can be produced, for example, by preparing the black matrix pigment dispersion composition of the present invention, adding the remaining materials, and stirring and mixing the materials using a stirring device or the like.
The method of stirring and mixing is not particularly limited, and known methods such as an ultrasonic disperser, a high-pressure emulsifying machine, a bead mill, a triple roll (triple roll), a sand mill, and a kneader may be used.
Further, the above-mentioned stirring and mixing may be followed by filtration with a filter.
In the production of the resist composition for a black matrix of the present invention, the black colorant, the epoxy resin, the oxazine compound, and the like described above for the pigment dispersion composition for a black matrix of the present invention may be added as needed.
< Black matrix >
The black matrix of the present invention is formed by the resist composition for a black matrix of the present invention.
The method for forming a black matrix of the present invention is not particularly limited, and the black matrix may be formed, for example, by applying the resist composition for a black matrix of the present invention on a transparent substrate, drying the composition to form a coating film, then placing a photomask on the coating film, exposing and developing an image using the photomask, and optionally, photo-curing the coating film.
The method of coating, drying, exposing, developing the resist composition for a black matrix of the present invention may be appropriately selected from known methods.
As the transparent substrate, a known transparent substrate such as a glass substrate or a plastic substrate can be appropriately selected and used.
The thickness of the coating film is preferably 0.2 to 10 μm, more preferably 0.5 to 6 μm, and even more preferably 1 to 4 μm in terms of the film thickness after drying.
By setting the thickness in the above range, a predetermined pattern can be properly developed and a predetermined optical density can be properly given.
In the black matrix of the present invention, a black resist pattern formed only in the solid portion is formed by coating the black matrix on a glass substrate (EAGLE XG) with a spin coater so that the film thickness is 1 μm and prebaking the glass substrate at 100 ℃ for 2 minutes, exposing the glass substrate to light with a high-pressure mercury lamp (UV cumulative light amount of 50mJ/cm 2), and further post baking the glass substrate at 230 ℃ for 3 hours, and the surface resistance value at this time is preferably 1.0×10 14 Ω/∈and more preferably 3.0×10 14 Ω/∈and more preferably 5.0×10 14 Ω/∈and more preferably 9.0×10 14 Ω/∈and most preferably 1.0×10 15 Ω/∈.
When the surface resistance value is 1.0x 14 Ω/≡or more, short-circuiting or current leakage can be appropriately prevented.
The surface resistance value may be measured by using a main body "minute ammeter R8340", and an optional item "shielded box R12702a" (manufactured by ADVANCE-SYA inc., all of the companies).
In the black matrix of the present invention, a black resist pattern formed only in a solid portion is formed by coating a glass substrate (EAGLE XG) with a spin coater so that the film thickness is 1 μm and prebaking it at 100 ℃ for 2 minutes, then exposing it to light with a high-pressure mercury lamp (UV cumulative light amount is 50mJ/cm 2) and further performing it at 230 ℃ for 3 hours and then performing post baking at 250 ℃ for 1 hour, and the surface resistance value at this time is preferably 1.0×10 14 Ω/∈and more preferably 2.0×10 14 Ω/∈and more preferably 5.0×10 14 Ω/∈and more preferably 9.0×10 14 Ω/∈and most preferably 1.0×10 15 Ω/∈and more.
When the surface resistance value is 1.0X10 14 Ω/≡or more, the surface resistance value can be excellent even when the post-baking is performed at high temperature for a long time.
The pigment dispersion composition for a black matrix, the resist composition for a black matrix and the black matrix of the present invention have the above-described characteristics, and thus can be preferably used as a black matrix for an image display device, a touch panel or the like.
Examples
The present invention will be specifically described with reference to examples, but the present invention is not limited to these examples unless departing from the spirit and scope of application. In this example, "part" and "%" each represent "part by mass" and "% by mass" unless otherwise specified.
The following examples and comparative examples use the following materials.
< Black colorant >
Carbon black (trade name "NEROX" 305, average primary particle size of about 28nm, pH about 2.8, manufactured by European Union engineering charcoal (Orion Engineered Carbons))
< Pigment dispersant >
LPN22102 (Block type pigment dispersant having an amino group, solid content 40% by mass, manufactured by Pick chemistry (BYK-Chemie), co., ltd.)
< Epoxy Compound >
VG 3101L (epoxy compound of the above-mentioned structure (formula 2): trade name is "TECHMORE VG 3101L", manufactured by ordinary Lin Teke (PRINTEC))
< Amine Compound >
3-Amphetamine (Tokyo chemical industry Co., ltd.)
1, 3-Tetramethylbutylamine (Tokyo chemical industry Co., ltd.)
Triisobutylamine (Tokyo chemical industry Co., ltd.)
< Binder resin >
ZCR-1569H (epoxy acrylate resin, solid content 70% by mass, manufactured by Nippon Kagaku Co., ltd.)
< Organic solvent >
PM (propylene glycol monomethyl ether)
PGMEA (propylene glycol monomethyl ether acetate)
< Photopolymerization initiator >
OXE02 (trade name "Irgacure OxiE 02",1- [ 9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl ] -1- (O-acetoxime) ethanone, manufactured by BASF corporation)
< Photopolymerizable Compound >
DPHA (dipentaerythritol hexaacrylate)
< Alkali-soluble resin >
WR-301 (product name "WR-301", cardo resin, acid value 100mgKOH/g, solid content 45%, manufactured by ADEKA Co., ltd.)
< Preparation of composition for Dispersion >
(Composition for Dispersion 1)
Solsperse 12000 (a sulfonate of copper phthalocyanine (having about 0.9 sulfonic acid groups in one molecule), manufactured by Lubrizol Co., ltd., japan) (The Lubrizol Corporation) was mixed with 3-amphetamine at a mass ratio of 25:8 to obtain composition 1 for dispersion.
(Composition for Dispersion 2)
Solsperse12000 (a sulfonate of copper phthalocyanine (having about 0.9 sulfonic acid groups in one molecule), manufactured by Lubrizol Co., ltd., japan (The Lubrizol Corporation)) was mixed with 1, 3-tetramethylbutylamine at a mass ratio of 10:3 to obtain composition 2 for dispersion.
(Composition for Dispersion 3)
Solsperse 12000 (a sulfonate of copper phthalocyanine (having about 0.9 sulfonic acid groups in one molecule), manufactured by Lubrizol Co., ltd., japan (The Lubrizol Corporation)) and triisobutylamine were mixed at a mass ratio of 25:11 to obtain a composition 3 for dispersion.
< Dispersing Material >
Solsperse 12000 (sulfonate of copper phthalocyanine (having about 0.9 sulfonic acid groups in one molecule), manufactured by Lubrizol Co., ltd., the Lubrizol Corporation)
Solsperse 5000 (quaternary ammonium salt of copper phthalocyanine sulfonate (containing about 0.9 sulfonic acid groups in one molecule), manufactured by Lubrizol Co., ltd., japan)
VALIFAST BLUE 1605 (VB 1605, sodium-neutralized product of copper phthalocyanine, ORIENT chemical Co., ltd.)
< Preparation of pigment-dispersion composition for Black matrix >
The respective materials were mixed to form the compositions shown in table 1, and kneaded with a bead mill for one day and night to prepare pigment-dispersion compositions for black matrices.
TABLE 1
< Preparation of resist composition for Black matrix >
The pigment dispersion composition for a black matrix and other materials (photopolymerizable compound, alkali-soluble resin, photopolymerization initiator and organic solvent) were uniformly mixed using a high-speed mixer so as to form the composition of table 2, and then filtered through a filter having a pore size of 3 μm, to obtain resist compositions for black matrices of examples and comparative examples.
< Evaluation test >
(Surface resistance value 1)
The pigment dispersion resist compositions for black matrices of examples and comparative examples were applied on a glass substrate (EAGLE XG) by a spin coater so that the film thickness became 1 μm, prebaked at 100 ℃ for 2 minutes, exposed to light by a high-pressure mercury lamp (UV cumulative light amount 50mJ/cm 2), and post-baked at 230 ℃ for 3 hours, to prepare a black resist pattern (black matrix) formed only in the land portion.
The surface resistance values of the black resist patterns were measured using a minute ammeter R8340 as a main body and a "shielding box R12702a" (manufactured by ADVANCE, all of the company, inc.) as an option (option). The results are shown in Table 2.
(Surface resistance value 2)
The pigment dispersion resist compositions for black matrices of examples and comparative examples were coated on a glass substrate (EAGLE XG) with a spin coater so that the film thickness became 1 μm, pre-baked at 100 ℃ for 2 minutes, exposed to light by a high-pressure mercury lamp (UV cumulative light amount 50mJ/cm 2), post-baked at 230 ℃ for 3 hours, and post-baked at 250 ℃ for 1 hour, to produce a black resist pattern (black matrix) formed only by the solid portion.
The surface resistance values of the black resist patterns were measured using a minute ammeter R8340 as a main body and a "shielding box R12702a" (manufactured by ADVANCE, all of the company, inc.) as an option (option). The results are shown in Table 2.
(Breakpoint change)
For each of the pigment dispersion resist compositions for black matrix of examples and comparative examples, break points immediately after production and after 1 week of storage at 60 ℃ were measured by the following methods.
The pigment-dispersed resist composition for each black matrix was coated on a glass substrate (EAGLE XG) with a spin coater and the film thickness was 1 μm, and pre-baked at 100 ℃ for 2 minutes.
Then, a resist film containing an exposed portion (cured portion) was produced by exposing the resist film to light of 50mJ/cm 2 UV cumulative light quantity by a high-pressure mercury lamp using a photomask having a line pattern of 5 μm, 8 μm, 10 μm, 15 μm, 20 μm, 30 μm.
Next, a time point at which the developed pattern started to appear was measured using a 0.05% potassium hydroxide aqueous solution (developer) under a spray pressure of 1.0kgf/cm 2 at 23 ℃.
Δbp (breakpoint change) was obtained by setting a breakpoint (BP 1) immediately after production and a breakpoint (BP 2) after 1 week of storage at 60 ℃. The results are shown in Table 2.
ΔBP=BP2-BP1
TABLE 2
In the examples using the pigment dispersion composition for a black matrix containing a black colorant, a sulfonate of copper phthalocyanine and an epoxy compound, it was confirmed that a black matrix having a surface resistance value not lowered even when post-baking was performed at high temperature for a long period of time was formed, and a resist composition for a black matrix having a break point not changed with the storage time was obtained.
Further, it was confirmed that a black matrix having a high surface resistance value and not decreasing the surface resistance value even when post-baking is performed at high temperature for a long time can be formed by satisfying the above condition (B).
Industrial applicability
The present invention can provide a pigment dispersion composition for a black matrix, which is a resist composition for a black matrix that can form a black matrix that does not reduce the surface resistance value even when subjected to a post-baking at high temperature for a long period of time and can obtain a black matrix with a break point that does not change with the storage time.

Claims (9)

1.一种黑矩阵用颜料分散组合物,其包含黑色着色剂、酞菁铜的磺化物和环氧化合物,并且还包含分子量为300以下的胺化合物,1. A pigment dispersion composition for a black matrix, comprising a black colorant, a sulfonate of copper phthalocyanine and an epoxy compound, and further comprising an amine compound having a molecular weight of 300 or less, 所述分子量为300以下的胺化合物是在从氨基的氮原子出发后3个原子以内具有二级以上的碳原子的胺化合物和/或氨基通过碳原子数为3以下的烃基与一个以上的芳环连接的胺化合物,The amine compound with a molecular weight of 300 or less is an amine compound having secondary or higher carbon atoms within 3 atoms from the nitrogen atom of the amino group and/or an amine compound in which the amino group is connected to one or more aromatic rings via a hydrocarbon group having 3 or less carbon atoms. 所述从氨基的氮原子出发后3个原子以内具有二级以上的碳原子的胺化合物是选自由1,1,3,3-四甲基丁胺、二异丙胺、三异丙胺、二异丁胺、三异丁胺、二异戊胺、三异戊胺以及三(2-乙基己基)胺所组成的组中的至少一种,The amine compound having secondary or higher carbon atoms within 3 atoms from the nitrogen atom of the amino group is at least one selected from the group consisting of 1,1,3,3-tetramethylbutylamine, diisopropylamine, triisopropylamine, diisobutylamine, triisobutylamine, diisoamylamine, triisoamylamine and tri(2-ethylhexyl)amine, 所述氨基通过碳原子数为3以下的烃基与一个以上的芳环连接的胺化合物是选自由3-苯丙胺、2-苯丙胺、1-苯丙胺、2-苯基乙胺、1-苯基乙胺、苯基甲胺以及三苯基甲胺所组成的组中的至少一种;The amine compound in which the amino group is connected to one or more aromatic rings via a hydrocarbon group having a carbon number of 3 or less is at least one selected from the group consisting of 3-amphetamine, 2-amphetamine, 1-amphetamine, 2-phenylethylamine, 1-phenylethylamine, phenylmethylamine and triphenylmethylamine; 所述黑色着色剂的含量,以相对于所述黑矩阵用颜料分散组合物的全部固体成分的质量分数计为3~70质量%,The content of the black colorant is 3 to 70% by mass based on the mass fraction of the total solid content of the pigment dispersion composition for black matrix. 所述酞菁铜的磺化物的含量,相对于100质量份的所述黑色着色剂为0.1~20质量份,The content of the sulfonated copper phthalocyanine is 0.1 to 20 parts by mass relative to 100 parts by mass of the black colorant. 所述环氧化合物的含量,以相对于所述黑矩阵用颜料分散组合物的全部固体含量的质量分数计为12.0质量%以下,The content of the epoxy compound is 12.0% by mass or less in terms of mass fraction relative to the total solid content of the pigment dispersion composition for black matrix. 所述分子量为300以下的胺化合物的含量,相对于100质量份的所述酞菁铜的磺化物为5~100质量份。The content of the amine compound having a molecular weight of 300 or less is 5 to 100 parts by mass based on 100 parts by mass of the sulfonated copper phthalocyanine. 2.如权利要求1所述的黑矩阵用颜料分散组合物,其中,所述环氧化合物具有双酚骨架。2 . The pigment dispersion composition for a black matrix according to claim 1 , wherein the epoxy compound has a bisphenol skeleton. 3.如权利要求1或2所述的黑矩阵用颜料分散组合物,其中,所述分子量为300以下的胺化合物是选自3-苯丙胺、1,1,3,3-四甲基丁胺和三异丁胺中的至少一种。3. The pigment dispersion composition for a black matrix according to claim 1 or 2, wherein the amine compound having a molecular weight of 300 or less is at least one selected from 3-amphetamine, 1,1,3,3-tetramethylbutylamine and triisobutylamine. 4.如权利要求1或2所述的黑矩阵用颜料分散组合物,其中,所述酞菁铜的磺化物在分子中具有0.5个~3个磺酸基。4 . The pigment dispersion composition for a black matrix according to claim 1 , wherein the sulfonated copper phthalocyanine has 0.5 to 3 sulfonic acid groups in a molecule. 5.如权利要求4所述的黑矩阵用颜料分散组合物,其中,所述酞菁铜的磺化物在分子中具有0.5个~1.5个磺酸基。5 . The pigment dispersion composition for a black matrix according to claim 4 , wherein the sulfonated copper phthalocyanine has 0.5 to 1.5 sulfonic acid groups in a molecule. 6.如权利要求1或2所述的黑矩阵用颜料分散组合物,其中,所述黑色着色剂包含炭黑。6 . The pigment dispersion composition for a black matrix according to claim 1 , wherein the black colorant contains carbon black. 7.如权利要求6所述的黑矩阵用颜料分散组合物,其中,所述炭黑是酸性炭黑。7 . The pigment dispersion composition for a black matrix according to claim 6 , wherein the carbon black is acidic carbon black. 8.一种黑矩阵用抗蚀剂组合物,其由权利要求1至7中任一项所述的黑矩阵用颜料分散组合物来得到。8 . A resist composition for a black matrix, obtained from the pigment dispersion composition for a black matrix according to claim 1 . 9.一种黑矩阵,其由权利要求8所述的黑矩阵用抗蚀剂组合物来形成。9 . A black matrix formed from the resist composition for a black matrix according to claim 8 .
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