CN114537009A - Optical anti-counterfeiting transfer film and preparation method and application thereof - Google Patents
Optical anti-counterfeiting transfer film and preparation method and application thereof Download PDFInfo
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- CN114537009A CN114537009A CN202011342913.3A CN202011342913A CN114537009A CN 114537009 A CN114537009 A CN 114537009A CN 202011342913 A CN202011342913 A CN 202011342913A CN 114537009 A CN114537009 A CN 114537009A
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- photoinitiator
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- counterfeiting
- photocuring
- aqueous
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
- B41M3/14—Security printing
Landscapes
- Laminated Bodies (AREA)
Abstract
The invention relates to the field of optical anti-counterfeiting and discloses an optical anti-counterfeiting transfer film and a preparation method and application thereof. The optical anti-counterfeiting transfer film provided by the invention solves the problem of plate adhesion during UV mould pressing of fine microstructures, can adapt to UV mould pressing of various types of fine microstructures, meets the wide adaptability of UV mould pressing to fine microstructures, ensures subsequent hot stamping transfer, and is beneficial to improving the optical anti-counterfeiting effect in the fields of bank notes and identification cards.
Description
Technical Field
The invention relates to the field of optical anti-counterfeiting, in particular to an optical anti-counterfeiting transfer film and a preparation method and application thereof.
Background
The optical anti-counterfeiting transfer film is widely applied to the anti-counterfeiting fields of bank notes, high-end identification cards (such as union pay cards) and the like, and an optical anti-counterfeiting structure is transferred to the surface of a target base material such as a bank card, paper money and the like in a hot stamping and heat transfer mode. Currently, as disclosed in CN203937262A, the general structure of the anti-counterfeiting thermal transfer film used in the field of packaging, regardless of the functional layer for realizing a special purpose, is generally: PET film, release layer, hot-pressing layer or ink layer, cladding and hot melt adhesive layer.
However, in the field of high-end certificate cards and banknote anti-counterfeiting, the processing difficulty of the imaging layer of the optical anti-counterfeiting transfer film is very high, and the fine optical anti-counterfeiting transfer film such as a micro-mirror disclosed in CN105313529A, a micro-lens disclosed in CN1552589A and US4892336, a mirror disclosed in CN103832114A, a blazed grating disclosed in CN103847289A, CN103448411A, a sub-wavelength relief structure disclosed in CN104385800 and CN102514443A, a surface relief structure disclosed in CN103576216A and CN102903298A, a diffraction microstructure disclosed in CN104249584A and the like is more complex in replication structure, the replication fineness requirement is high, the replication depth-width ratio is large, and a method needs to be found to meet the replication requirements of all different types of microstructures. The hot embossing cannot satisfy the replication of the above structure due to the limitation of the replication depth and the replication loss.
For this reason, CN102344704A realizes the processing of the above fine security structure by means of UV molding. However, the prior art is mainly applied to non-transfer film products, and has very difficult problems in preparing anti-counterfeiting transfer films. The fine microstructures described above need to have good adhesion to the substrate during UV molding to meet the requirements for transfer of the molded replication.
However, the release layer of the current anti-counterfeiting heat transfer film does not provide good adhesion fastness in the UV molding process. Therefore, because the stripping value of a common hot stamping film is very low, the bonding force between a cured UV coating and a template during UV mould pressing is often large, and the problem of plate sticking exists, so that the UV mould pressing procedure cannot be smoothly completed on the release film.
CN105313516A adopts a release layer with a softening point of 95-120 ℃, has large bonding force with the UV mould pressing layer when the temperature is less than 95 ℃, and is easy to peel off from the release layer when the thermoprinting temperature is more than 120 ℃. However, this method is primarily directed to cat-eye films for use in the packaging field. In the fields of identification cards and banknotes, the fine anti-counterfeiting microstructure is more complex in type, large in copy depth-to-width ratio and high in copy precision requirement, and is more difficult to copy, so that better adhesion fastness is required during UV copy, and the scheme of CN105313516A cannot meet the requirement of UV mould pressing of the fine structure. Meanwhile, in the fields of identification cards and bank notes, the used hot stamping base materials are of a heat-sensitive type, such as paper, BOPP, PVC and the like, and lower hot stamping temperature is needed, and when the hot stamping temperature is lower than 120 ℃, the CN105313516A scheme has the problems of difficulty in complete stripping and incomplete hot stamping stripping, and cannot be applied in the fields of identification cards and bank notes.
Therefore, anti-counterfeiting transfer film products meeting the requirements in the fields of identification cards and bank notes need to be developed.
Disclosure of Invention
The invention aims to overcome the defects that an optical anti-counterfeiting transfer film in the prior art is easy to adhere to a plate during UV (ultraviolet) die pressing replication and incomplete in hot stamping stripping during subsequent hot stamping transfer when used for anti-counterfeiting in the field of bank notes and high-end identification cards, and provides an optical anti-counterfeiting transfer film and a preparation method and application thereof.
In order to achieve the above object, a first aspect of the present invention provides an optical anti-counterfeiting transfer film, which includes a substrate layer, and a peeling layer, an imaging layer, a plating layer and a hot melt adhesive layer sequentially stacked on the substrate layer, wherein the imaging layer contains an anti-counterfeiting pattern having an optical anti-counterfeiting structure;
the peeling layer is a coating formed by sequentially drying and carrying out first photocuring on a first photocuring coating system, wherein the first photocuring coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375 nm;
the imaging layer is a coating formed by sequentially carrying out UV mould pressing and second photocuring on a second photocuring coating system, wherein the second photocuring coating system contains an acrylate oligomer, an acrylate diluent monomer and a second photoinitiator, and the photoinitiation wavelength of the second photoinitiator is 375nm-425 nm;
and the first photocuring is performed after the second photocuring.
The invention provides a method for preparing an optical anti-counterfeiting transfer film, which comprises the following steps:
(1) performing first covering by tying a first photocureable coating body on a substrate, and then performing first drying to form a variable layer on the substrate; the first photo-curing coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375 nm;
and, optionally, second overlaying a water-borne coating system on the variable layer followed by second drying to form a spacing layer on the variable layer;
(2) a second photocuring coating is tied on the variable layer or the spacing layer for third covering, then UV mould pressing and second photocuring are carried out in sequence, an imaging layer is formed on the variable layer or the spacing layer, and the imaging layer contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure obtained through the UV mould pressing; the second photo-curing coating system contains acrylate oligomer, acrylate diluent monomer and a second photoinitiator, the photoinitiation wavelength of the second photoinitiator comprises 375nm-425nm, the second photo-curing is carried out under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425 nm;
(3) evaporating the imaging layer to form a coating;
(4) fourthly, covering the hot melt adhesive on the coating to form a hot melt adhesive layer;
the method further comprises the following steps: and (3) performing first photocuring on the variable layer to form the stripping layer, wherein the first photocuring is performed after the step (2), the step (3) or the step (4), and the first photocuring is performed under the irradiation condition of a first light source which emits light with the wavelength of less than 375 nm.
The third aspect of the invention provides an optical anti-counterfeiting transfer film prepared by the method of the second aspect.
The fourth aspect of the present invention provides the application of the optical anti-counterfeiting transfer film described in the first or third aspect in the optical anti-counterfeiting field.
Compared with the prior art, the invention has at least the following advantages:
the method provided by the invention solves the problem that the plate is easy to adhere when the UV of the fine microstructure is molded, can be suitable for the UV molding of various types of fine microstructures, and meets the wide adaptability of the UV molding to the fine microstructure; in addition, the optical anti-counterfeiting transfer film provided by the invention solves the problem of incomplete hot stamping stripping in hot stamping transfer of the conventional optical anti-counterfeiting transfer film, improves the optical anti-counterfeiting effect in the field of bank notes and identification cards, and has wide application prospect.
Additional features and advantages of the invention will be described in detail in the detailed description which follows.
Drawings
FIG. 1 is a schematic structural diagram of an optical anti-counterfeiting transfer film L1 prepared in example 1;
fig. 2 is a schematic structural diagram of an optical anti-counterfeiting transfer film L2 prepared in example 2.
Description of the reference numerals
1. Base material layer 2, peeling layer 3, image forming layer
4. Plating layer 5, hot melt adhesive layer 6 and spacing layer
Detailed Description
The following detailed description of embodiments of the invention refers to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating the present invention, are given by way of illustration and explanation only, not limitation.
As described above, the first aspect of the present invention provides an optical anti-counterfeiting transfer film, which includes a substrate layer, and a peeling layer, an imaging layer, a plating layer and a hot melt adhesive layer sequentially stacked on the substrate layer, wherein the imaging layer contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure;
the peeling layer is a coating formed by sequentially drying and carrying out first photocuring on a first photocuring coating system, wherein the first photocuring coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375 nm;
the imaging layer is a coating formed by sequentially carrying out UV mould pressing and second photocuring on a second photocuring coating system, wherein the second photocuring coating system contains an acrylate oligomer, an acrylate diluent monomer and a second photoinitiator, and the photoinitiation wavelength of the second photoinitiator is 375nm-425 nm;
and the first photocuring is performed after the second photocuring.
The invention has no special limitation on the specific types of the anti-counterfeiting patterns with the optical anti-counterfeiting structures, and can be various existing fine optical anti-counterfeiting microstructures in the field, particularly in the anti-counterfeiting field of bank notes and high-end identification cards, such as anti-counterfeiting patterns with three-dimensional relief effects in CN103576216A, and such as anti-counterfeiting patterns with fine dynamic effects in CN 103832114A.
In the invention, the photoinitiation wavelength of the first photoinitiator is less than 375nm, which means that the first photoinitiator can be initiated by light with the wavelength of less than 375 nm; the photoinitiation wavelength of the second photoinitiator comprises 375nm to 425nm, meaning that the second photoinitiator is capable of being initiated by light having a wavelength of 375nm to 425 nm.
Preferred embodiments of the release layer are described below.
Preferably, the first photoinitiator is selected from at least one of a first free radical photoinitiator and a first cationic photoinitiator.
According to the present invention, preferably, the first radical photoinitiator is at least one selected from the group consisting of α -hydroxy ketone photoinitiators, benzoyl formate photoinitiators and benzophenone photoinitiators. The α -hydroxyketone photoinitiator is, for example, 2-hydroxy-2-methyl-1-phenylpropanone, 1-hydroxycyclohexyl-phenyl ketone; the methyl benzoylformate photoinitiator is, for example, methyl benzoylformate MBF; the benzophenone photoinitiator is benzophenone and derivatives thereof.
Preferably, the first cationic initiator is at least one selected from the group consisting of ferrocenium salts, sulfonium salts, and iodonium salts, and more preferably at least one selected from the group consisting of iodonium salts and sulfonium salts. Such as diaryliodonium salts; the sulfonium salt is, for example, a triarylsulfonium salt.
According to a preferred embodiment of the present invention, the first photoinitiator is a first free radical photoinitiator.
More preferably, the first photoinitiator is selected from at least one of alpha-hydroxy ketone photoinitiators, benzoyl formate photoinitiators and benzophenone photoinitiators.
Still more preferably, the first photoinitiator is selected from at least one of 2-hydroxy-2-methyl-1-phenylacetone 1173, 1-hydroxycyclohexyl-phenyl ketone 184, benzophenone BP, methyl benzoylformate MBF, 4-p-tolylmercapto benzophenone BMS, polytetramethylene glycol 250-bis- (2-carboxymethoxybenzophenone).
Preferably, the glass transition temperature of the acrylic resin is higher than 30 ℃.
Preferably, the adhesion fastness of the acrylate resin coated on the PET substrate is not lower than 4B grade.
In the invention, the adhesion fastness is determined by referring to an ASTM D3359 adhesion fastness determination standard, and the rating is from 0B to 5B, wherein 5B is the best; 0B worst.
According to the invention, the acrylate resin is present in the form of a waterborne acrylic resin and/or a solvent-borne acrylic resin, wherein the waterborne acrylic resin is, for example, Zhan-Mi 7230, 7718, 7210, 2384, 7655, Jettida UV-370, UV-372, etc.; the solvent-type acrylate resin is, for example, Jetta's JS-113, JS-116, JS-126, etc.
Preferably, the solids content of the first photocurable coating system is from 5 to 55% by weight. According to the present invention, the solid content of the first photocurable coating system refers to the total content of the acrylic resin and the first photoinitiator contained in the first photocurable coating system. According to the invention, the solids content of the first photocurable coating system can be adjusted by means of water or the solvent of the solvent acrylic acid. The solvent of the solvent-soluble acrylic resin is not particularly limited, and may be any solvent conventionally used in the art, such as ketone, ester, or alcohol solvents.
Preferably, the content of the first photoinitiator is 1-6 wt% and the content of the acrylic resin is 94-99 wt% based on the dry weight of the first photocurable coating system, wherein the dry weight refers to the total weight of the first photoinitiator and the acrylic resin contained in the first photocurable coating system.
According to the present invention, the first light curing is performed under the irradiation of a first light source which emits light having a wavelength of less than 375nm, including but not limited to conventional UV light sources and UV-LED light sources including those having an emission wavelength of 365 nm. The conventional UV light source refers to an existing polar lamp and/or an electrodeless lamp which are used in the field of UV curing and have emission wavelength less than 375nm, and the polar lamp comprises a mercury lamp, an iron lamp and a gallium lamp; the electrodeless lamp comprises a D lamp, an H lamp and a V lamp.
Preferred embodiments of the imaging layer are described below.
Preferably, the second photoinitiator is selected from at least one of a sensitizer-second cationic photoinitiator complex initiator, a second free radical photoinitiator-second cationic photoinitiator complex system, a second cationic photoinitiator and a second free radical photoinitiator.
According to the invention, the second cationic photoinitiator is preferably an iron arylenidate photoinitiator.
According to the present invention, the second radical photoinitiator is preferably at least one selected from the group consisting of benzoin photoinitiators, benzil photoinitiators, acetophenone photoinitiators, α -aminoketone photoinitiators, acylphosphine oxide photoinitiators, thioxanthone photoinitiators and anthraquinone photoinitiators.
According to the invention, the benzoin-based photoinitiator, such as benzoin and derivatives; the benzil-based photoinitiator such as dimethylbenzyl ketal; such acetophenone photoinitiators as diethoxyacetophenone; the alpha-aminoketone photoinitiator is 2-methyl 1- (4-methylthiophenyl) -2-morpholine-1-acetone; such as 2,4, 6-trimethylbenzoyl-ethoxy-phenylphosphine oxide, 2,4, 6-trimethylbenzoyl-diphenylphosphine oxide, bis (2,4, 6-trimethylbenzoyl) phenylphosphine oxide; such thioxanthone photoinitiators as 2-isopropyl thioxanthone, 4-diethyl thioxanthone; such as 2-ethylanthraquinone, etc.
According to the present invention, in the second radical photoinitiator-second cationic photoinitiator complex system, the second radical photoinitiator can sensitize the second cationic photoinitiator so that the second cationic photoinitiator can be initiated in a larger spectral range. For example, the sensitization of diaryliodonium salts (second cationic photoinitiators) by thioxanthone photoinitiators (second free radical photoinitiators) allows for the self-initiated iodonium salts with short wavelengths to achieve long wavelength photoinitiation properties, e.g., 405 nm.
According to the invention, in the sensitizer-second cationic photoinitiator composite system, the sensitizer can sensitize the second cationic initiator to realize long-wavelength initiation of the second cationic initiator. The sensitizer is preferably at least one of coumarin ketone sensitizers.
According to a preferred embodiment of the present invention, the second photoinitiator is a second free radical photoinitiator.
More preferably, the second photoinitiator is selected from at least one of α -aminoketone photoinitiators, acylphosphine oxide initiators, and thioxanthone photoinitiators.
Still further preferably, the second photoinitiator is selected from at least one of 2-methyl 1- (4-methylthiophenyl) -2-morpholine-1-one, 2,4, 6-trimethylbenzoyl-ethoxy-phenylphosphine oxide, 2,4, 6-trimethylbenzoyl-diphenylphosphine oxide, bis (2,4, 6-trimethylbenzoyl) phenylphosphine oxide, 2-isopropylthioxanthone and 4-diethylthioxanthone.
According to the present invention, the absorption spectra of the first photoinitiator and the second photoinitiator are disclosed in standard textbooks and handbooks, and can be obtained from photopolymerization technology and applications and photocurable material performance and application handbooks published by chemical industry publishers.
According to the invention, the second photocuring is carried out under irradiation by a second light source which emits light having a wavelength of 375nm to 425nm, for example ultraviolet light having a wavelength of 375nm to 405 nm. The second light source includes but is not limited to a conventional UV light source with an added filter and UV-LED light sources including 385nm, 395nm and 405 nm. The conventional UV light source refers to an existing polar lamp and an electrodeless lamp in the field of UV curing, and the polar lamp comprises a mercury lamp, an iron lamp and a gallium lamp; the electrodeless lamp comprises a D lamp, an H lamp and a V lamp.
The present invention is not particularly limited in time, light intensity, etc. of the first photocuring and the second photocuring as long as the respective coatings can be completely cross-linked and cured.
According to the present invention, it is preferable that the pencil hardness of the acrylate oligomer after photocuring is not higher than 2H.
Preferably, the acrylate oligomer is selected from at least one of epoxy acrylate, polyester acrylate and urethane acrylate.
According to the invention, the epoxy acrylates are exemplified by EB3700, EB3708, EB3710, EB 3720; UVE-151 of Saedoma, and the like.
According to the invention, the polyester acrylates are as in American PS1000, PS420, PS460, PS2500, PS2522, etc.; sandomad CN2203, CN2283, CN3108, CN704, CN736, CN738, etc.; and can be used for preparing new EB80, EB84, EB525, EB546, EB505, EB586, etc.
According to the invention, the urethane acrylates are, for example, CN8003, CN890, CN8000, CN8001, CN968, etc. of sartomer; EB210, EB230, EB285, EB8808, EB8402, etc. which are new; american PU210, PU2064, PU3603, PU3702, UA5216, SC2404 and the like; polyurethane acrylate 6150-100 from Changxing company, and the like.
Preferably, the acrylate diluent monomer is selected from at least one of acrylate monomers having a functionality of 1 to 6.
More preferably, the acrylate diluent monomer is selected from the group consisting of 1, 6-hexanediol diacrylate monomer (HDDA), 1, 6-hexanediol methoxy monoacrylate monomer (EOTMPTA), neopentyl glycol diacrylate monomer (NPGDA), propoxylated neopentyl glycol diacrylate monomer (PONPGDA), tripropylene glycol diacrylate monomer (TPGDA), dipropylene glycol diacrylate monomer (DPGDA), 2-phenoxyethyl acrylate monomer (PHEA), ethoxylated phenoxyacrylate monomer (PH3EOA), tetrahydrofurfuryl acrylate monomer (THFA), isobornyl acrylate monomer (IBOA), benzyl acrylate monomer (BA), 4-tert-butylcyclohexyl acrylate monomer (TBCHA), trimethylolpropane triacrylate (TMPTA), ethoxylated trimethylolpropane triacrylate (EOTMPTA), propoxylated trimethylolpropane triacrylate (POTMPTA), At least one of pentaerythritol triacrylate (PET3A), pentaerythritol tetraacrylate (PET4A), ditrimethylolpropane tetraacrylate, dipentaerythritol hexaacrylate (DPHA), and caprolactone-modified dipentaerythritol hexaacrylate.
Preferably, the acrylate oligomer is present in an amount of 25 to 65 wt%, the acrylate diluent monomer is present in an amount of 30 to 70 wt%, and the second photoinitiator is present in an amount of 1 to 6 wt%, based on the total weight of the second photocurable coating system.
According to a preferred embodiment of the present invention, a spacer layer is further disposed between the imaging layer and the release layer, the spacer layer being a coating layer formed by drying a water-based paint system. The inventor unexpectedly finds that the optical anti-counterfeiting transfer film obtained by arranging the spacing layer can be more beneficial to UV mould pressing and subsequent hot stamping transfer of a fine optical anti-counterfeiting microstructure.
Preferably, the solid content of the aqueous coating system is 5 to 55 wt%, which means the content of the resin contained in the aqueous coating system.
Preferably, the aqueous resin in the aqueous coating system is at least one selected from the group consisting of an aqueous polyether resin-aqueous polyester resin composite resin, an aqueous polycarbonate resin, an aqueous polyether resin, an aqueous polyester resin, an aqueous acrylic resin, an aqueous polyurethane resin, and an aqueous polyvinyl butyral resin. For example, the waterborne polyurethane resin WATERSOL-WG-204 available from DIC corporation.
Preferably, the glass transition temperature of the resin in the aqueous coating system is above 30 ℃.
According to the invention, the water-based paint system can also contain various additives conventionally used in the field, such as water, cosolvent, auxiliary agent and the like, and the water, the cosolvent and the auxiliary agent are used in such an amount that the solid content of the water-based paint system is 5-55 wt%.
In order to obtain the optical anti-counterfeiting transfer film with better performance, the average thickness of the spacing layer is preferably 100nm-3 μm, and more preferably, the average thickness of the spacing layer is 50nm-3 μm.
Preferably, the average thickness of the substrate layer is 12 μm to 30 μm.
Preferably, the release layer has an average thickness of 100nm to 3 μm.
Preferably, the imaging layer has an average thickness of 1 μm to 20 μm.
Preferably, the average thickness of the plating layer is 3nm to 3 μm.
Preferably, the hot melt adhesive layer has an average thickness of 2 μm to 10 μm.
Preferably, the substrate layer contains at least one selected from the group consisting of polyethylene terephthalate, polypropylene, and polyamide, and more preferably polyethylene terephthalate (PET film).
Preferably, the plating is a metallic aluminum plating and/or an interference plating, wherein the interference plating may be, for example, a multilayer interference plating as disclosed in US4779898A, CN102501500A, CN 11001234A.
The invention has no special limitation on the composition of the hot melt adhesive layer, and can be the existing hot melt adhesive material which can realize the adhesion and transfer of heat sensitive substrates in the fields of identification cards and bank notes through hot stamping.
The optical anti-counterfeiting transfer film of the invention is further described with reference to fig. 1 and fig. 2.
According to a preferred embodiment of the invention, the optical anti-counterfeiting transfer film comprises a substrate layer 1, and a stripping layer 2, an imaging layer 3, a plating layer 4 and a hot melt adhesive layer 5 which are sequentially stacked on the substrate layer 1, wherein the imaging layer 3 contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure;
the stripping layer 2 is a coating formed by drying and first photocuring a first photocuring coating system in sequence, wherein the first photocuring coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375 nm;
the imaging layer 3 is a coating formed by sequentially carrying out UV mould pressing and second photocuring on a second photocuring coating system, wherein the second photocuring coating system contains an acrylate oligomer, an acrylate diluent monomer and a second photoinitiator, and the photoinitiation wavelength of the second photoinitiator is 375nm-425 nm; the first photocuring is performed after the second photocuring.
According to another preferred embodiment of the invention, the optical anti-counterfeiting transfer film comprises a substrate layer 1, and a peeling layer 2, an imaging layer 3, a plating layer 4, a hot melt adhesive layer 5 and a spacing layer 6 which are sequentially stacked on the substrate layer 1, wherein the spacing layer 6 is arranged between the imaging layer 3 and the peeling layer 2, and the imaging layer 3 contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure;
the stripping layer 2 is a coating formed by drying and first photocuring a first photocuring coating system in sequence, wherein the first photocuring coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375 nm;
the imaging layer 3 is a coating formed by sequentially carrying out UV mould pressing and second photocuring on a second photocuring coating system, wherein the second photocuring coating system contains an acrylate oligomer, an acrylate diluent monomer and a second photoinitiator, and the photoinitiation wavelength of the second photoinitiator is 375nm-425 nm; the spacing layer 6 is a coating formed by drying a water-based paint system; the first photocuring is performed after the second photocuring.
The optical anti-counterfeiting transfer film provided by the invention solves the problem of plate adhesion during UV mold pressing of the fine microstructure, can be suitable for various types of UV mold pressing of the fine microstructure, and meets the wide adaptability of the UV mold pressing to the fine microstructure.
Meanwhile, the optical anti-counterfeiting transfer film provided by the invention adopts the UV light source which is matched with the first photoinitiator and has the emission wavelength less than 375nm for reaction, the variable layer which has the bonding effect during UV mould pressing is converted into the peeling layer which is easy to peel off by using the cross-linking reaction, and the hot stamping peeling is complete during the subsequent hot stamping transfer, so that the hot stamping transfer of the heat-sensitive base material in the anti-counterfeiting field of bank notes and cards can be met, and the optical anti-counterfeiting effect in the anti-counterfeiting field of bank notes and cards can be improved.
As previously mentioned, a second aspect of the present invention provides a method for preparing an optical anti-counterfeiting transfer film, the method comprising:
(1) performing first covering by tying a first photocureable coating body on a substrate, and then performing first drying to form a variable layer on the substrate; the first photo-curing coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375 nm;
and, optionally, second overlaying a water-borne coating system on the variable layer followed by second drying to form a spacing layer on the variable layer;
(2) a second photocuring coating is tied on the variable layer or the spacing layer for third covering, then UV mould pressing and second photocuring are carried out in sequence, an imaging layer is formed on the variable layer or the spacing layer, and the imaging layer contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure obtained through the UV mould pressing; the second photo-curing coating system contains acrylate oligomer, acrylate diluent monomer and a second photoinitiator, the photoinitiation wavelength of the second photoinitiator comprises 375nm-425nm, the second photo-curing is carried out under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425 nm;
(3) evaporating the imaging layer to form a coating;
(4) fourthly, covering the hot melt adhesive on the coating to form a hot melt adhesive layer;
the method further comprises the following steps: and (3) performing first photocuring on the variable layer to form the stripping layer, wherein the first photocuring is performed after the step (2), the step (3) or the step (4), and the first photocuring is performed under the irradiation condition of a first light source, and the first light source emits light with the wavelength of less than 375 nm.
Preferably, the first photocuring is performed after the step (4).
In the method according to the second aspect of the present invention, the properties, such as composition, solid content, optional component types, and the like, of the first photocurable coating system, the second photocurable coating system, and the aqueous coating system are the same as those of the first aspect, and the properties, such as optional types, of the first photoinitiator and the second photoinitiator are the same as those of the first photoinitiator and the second photoinitiator, respectively, described in the first aspect, and therefore the description of the present invention is omitted, and a person skilled in the art should not be construed as limiting the present invention.
According to the method of the second aspect of the invention, the first photocurable coating system, the second photocurable coating system and the aqueous coating system are used in amounts such that a variable layer, an imaging layer and a spacer layer of a specific thickness are obtained, respectively.
According to the method of the second aspect of the present invention, preferably, the substrate has an average thickness of 10 μm to 30 μm.
According to the method of the second aspect of the present invention, preferably, the variable layer has an average thickness of 100nm to 3 um.
According to the method of the second aspect of the present invention, preferably, the release layer has an average thickness of 100nm to 3 μm.
According to the method of the second aspect of the present invention, preferably, the imaging layer has an average thickness of 1 μm to 20 μm.
According to the method of the second aspect of the present invention, preferably, the spacer layer has an average thickness of 100nm to 3 μm, more preferably 50nm to 3 μm.
According to the method of the second aspect of the present invention, preferably, the average thickness of the plating layer is 3nm to 3 μm.
According to the method of the second aspect of the present invention, preferably, the hot melt adhesive layer has an average thickness of 2 μm to 10 μm.
Preferably, in step (1), the conditions of the first drying include: the temperature is 60-200 ℃.
Preferably, in step (1), the conditions of the second drying include: the temperature is 60-200 ℃.
According to a preferred embodiment of the present invention, the first drying and the second drying are performed by drying in a drying tunnel. The drying speed of the drying tunnel is not particularly limited, and can be reasonably adjusted according to actual needs.
According to the invention, the imaging layer is provided with a security image having an optical security structure by UV embossing. The UV-embossing process comprises applying an embossing plate, and embossing to form a security device having an optical security structure in the imaging layer, the present invention is particularly limited to the UV-embossing operation, and can be performed by the UV-embossing operation known in the art, such as the operation disclosed in CN104312414A, preferably, in step (2), the conditions of the UV-embossing include: the temperature is 0-100 ℃.
According to the present invention, the conditions and equipment for performing the deposition are not particularly limited, and the deposition can be performed by using the conditions and equipment for performing the deposition of a plating layer, which are conventionally used in the art.
According to the present invention, in the step (4), the operation conditions and equipment for coating the hot melt adhesive are not particularly limited, and the operation and equipment for coating the hot melt adhesive, which are known in the art, can be adopted. Preferably, in step (4), the fourth covered condition includes: the temperature is 60-200 ℃. The invention also has no special limitation on the composition of the hot melt adhesive layer, and can be the existing hot melt adhesive material which can realize the adhesion and transfer of heat sensitive substrates in the fields of identification cards and bank notes through hot stamping in the field.
Preferably, the first cover, the second cover, the third cover and the fourth cover are each independently selected from at least one of coating, printing, more preferably coating.
The apparatus for performing the first, second, third and fourth coverages is not particularly limited, and may be, for example, a coater conventionally used in the art.
According to the method of the second aspect of the present invention, the first photo-curing is performed under irradiation by a first light source which emits light having a wavelength of less than 375nm, including but not limited to conventional UV light sources and UV-LED light sources having an emission wavelength of 365 nm. The conventional UV light source refers to an existing polar lamp and/or an electrodeless lamp which are used in the field of UV curing and have emission wavelength less than 375nm, and the polar lamp comprises a mercury lamp, an iron lamp and a gallium lamp; the electrodeless lamp comprises a D lamp, an H lamp and a V lamp.
According to the method of the second aspect of the present invention, the second photocuring is performed under irradiation by a second light source which emits light having a wavelength of 375nm to 425nm, for example, ultraviolet light having a wavelength of 375nm to 405 nm. The second light source includes but is not limited to a conventional UV light source with an added filter and UV-LED light sources including 385nm, 395nm and 405 nm. The conventional UV light source refers to an existing polar lamp and an electrodeless lamp in the field of UV curing, and the polar lamp comprises a mercury lamp, an iron lamp and a gallium lamp; the electrodeless lamp comprises a D lamp, an H lamp and a V lamp.
In the present invention, the irradiation direction of the first photocuring and the second photocuring is not particularly limited, and the irradiation may be performed in a direction perpendicular to the substrate or in a direction from both sides of the substrate.
Two preferred embodiments of the method according to the second aspect of the invention are provided below.
Embodiment mode 1:
the method comprises the following steps:
(1) performing first covering by tying a first photocureable coating body on a substrate, and then performing first drying to form a variable layer on the substrate; the first photo-curing coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375 nm;
(2) a second photocuring coating system is attached to the variable layer for third covering, and then under the irradiation condition of a second light source, UV mould pressing and second photocuring are carried out, and an imaging layer is formed on the variable layer; the second photocuring coating system contains an acrylate oligomer, an acrylate diluent monomer and a second photoinitiator, the photoinitiation wavelength of the second photoinitiator is 375nm-425nm, the imaging layer contains a security pattern with an optical security structure obtained by UV mould pressing, the second photocuring is carried out under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425 nm;
(3) evaporating the imaging layer to form a coating;
(4) fourthly, covering the hot melt adhesive on the coating to form a hot melt adhesive layer on the coating;
the method further comprises the following steps: subjecting the variable layer to a first photocuring under a first light source irradiation condition to form a release layer, the first photocuring being performed after step (2), step (3) or step (4), the first photocuring being performed under the first light source irradiation condition, the first light source emitting light containing a wavelength of less than 375 nm;
preferably, the first photocuring is performed after the step (4).
Embodiment mode 2:
the method comprises the following steps:
(1) performing first covering by tying a first photocureable coating body on a substrate, and then performing first drying to form a variable layer on the substrate; the first photo-curing coating system contains a first photoinitiator and acrylic resin, wherein the acrylic resin is water-based acrylic resin or solvent-based acrylic resin, and the first photoinitiator absorbs ultraviolet light with the wavelength of less than 375 nm;
(2) second overlaying and then second drying the aqueous coating system on the variable layer to form a spacing layer on the release layer;
(3) attaching a second photocuring coating system on the spacing layer for third covering, and then carrying out UV mould pressing and second photocuring under the irradiation condition of a second light source to form an imaging layer on the spacing layer; the second photocuring coating system contains an acrylate oligomer, an acrylate diluent monomer and a second photoinitiator, the photoinitiation wavelength of the second photoinitiator is 375nm-425nm, the imaging layer contains a security pattern with an optical security structure obtained by mould pressing, the second photocuring is carried out under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425 nm;
(4) evaporating the imaging layer to form a coating;
(5) fourthly, covering the hot melt adhesive on the coating to form a hot melt adhesive layer on the coating;
the method further comprises the following steps: and (3) performing first photocuring on the variable layer under the irradiation of a first light source to form the release layer, wherein the first photocuring is performed after the step (2), the step (3) or the step (4), the first photocuring is performed under the irradiation of the first light source, and the first light source emits light with the wavelength of less than 375 nm.
Preferably, the first photocuring is performed after the step (4).
The method provided by the invention introduces the stripping layer into the production process of the optical anti-counterfeiting transfer film, and utilizes the photo-crosslinking reaction to convert the variable layer with the bonding effect into the stripping layer easy to strip, so that the problem of plate adhesion during UV mould pressing of the fine microstructure is solved, the method can be suitable for various types of UV mould pressing of the fine microstructure, the wide adaptability of the UV mould pressing to the fine microstructure is met, the subsequent hot stamping transfer is ensured, and the optical anti-counterfeiting effect in the fields of bank notes and cards is favorably improved.
As mentioned above, the third aspect of the present invention provides the optical anti-counterfeiting transfer film prepared by the method of the second aspect.
The optical anti-counterfeiting transfer film prepared by the method has the same advantages as the optical anti-counterfeiting transfer film prepared by the first aspect, not only solves the problem of plate adhesion during UV mold pressing of fine microstructures, but also can adapt to various types of UV mold pressing of fine microstructures, and meets the wide adaptability of the UV mold pressing to the fine microstructures. Meanwhile, when in subsequent hot stamping transfer, hot stamping stripping is complete, so that hot stamping transfer of heat-sensitive base materials in the anti-counterfeiting field of bank notes and certificates is met, and the optical anti-counterfeiting effect in the anti-counterfeiting field of bank notes and certificates is favorably improved.
As mentioned above, the fourth aspect of the present invention provides the application of the optical anti-counterfeiting transfer film of the first or third aspect in the optical anti-counterfeiting field.
Preferably, the application is the application of the optical anti-counterfeiting transfer film in the field of transfer type optical anti-counterfeiting, and particularly preferably, the application is the application of the optical anti-counterfeiting transfer film in the optical anti-counterfeiting of high-end identification cards such as bank notes, bank cards, passports and the like.
The present invention will be described in detail below by way of examples.
In the following examples, the raw materials are all commercially available unless otherwise specified.
Example 1
This example is used to illustrate the preparation of the optical anti-counterfeiting transfer film of the present invention.
The specific components used in this example are as follows:
the substrate is a PET substrate with the average thickness of 10 μm;
first photo-curable coating System (Photocurable coating for Release layer, solid content 20% by weight)
First photoinitiator: 2-hydroxy-2-methyl-1-phenylpropanone 1173 produced by IGM corporation;
water-based acrylic resin: a designation 7230 (20% by weight of solid content, the remainder being water, the glass transition temperature Tg of the resin being 65 ℃ and the adhesion fastness to PET substrates being grade 4B) produced by Zhanxin;
the first photoinitiator was present in an amount of 1 wt% based on the dry weight of the first photocurable coating system.
Second Photocurable coating System (Photocurable coating for image Forming layer)
A second photoinitiator: 2,4, 6-trimethylbenzoyl-diphenylphosphine oxide TPO from IGM;
acrylate oligomer: epoxy acrylate EB3700 (pencil hardness H) from a novice company;
acrylate diluent monomer: 1, 6-hexanediol diacrylate HDDA from BASF corporation;
in the second photo-curing coating system, the content weight ratio of the second photoinitiator, the acrylate oligomer and the acrylate diluent monomer is 3: 27: 70;
the preparation process comprises the following steps:
(1) coating the first photocuring coating system on a PET film in a full-page manner by using a coating machine, and then drying the PET film through a drying tunnel at the temperature of 150 ℃ at the speed of 200m/min to form a variable layer on the PET film, wherein the average thickness of the variable layer is 100 nm;
(2) coating a second photocuring coating system on the variable layer, attaching a mould pressing plate by using a UV mould pressing machine, carrying out UV mould pressing at the temperature of 50 ℃, and then carrying out second photocuring to obtain an imaging layer containing a UV mould pressing pattern (an anti-counterfeiting pattern with an optical anti-counterfeiting effect), wherein the second photocuring adopts a 405nm UV-LED;
(3) evaporating a metal reflection layer aluminum on the UV mould pressing layer by using a vacuum coating machine to form a coating;
(4) coating a hot melt adhesive on the metal coating by using a coating machine, wherein the coating temperature is 150 ℃, and forming a hot melt adhesive layer to obtain rewinding;
(5) and (3) rewinding by using a winding device with a UV light source and adopting a mercury lamp (emitting UV light with an emission wavelength less than 375 nm) for illumination, and performing first photocuring on the variable layer to form a stripping layer to obtain the transfer film L1 with the optical anti-counterfeiting effect.
The structure schematic diagram of the optical anti-counterfeiting transfer film L1 is shown in FIG. 1, wherein the L1 comprises a substrate layer, and a stripping layer, an imaging layer, a plating layer and a hot melt adhesive layer which are sequentially superposed on the substrate layer; the average thickness of the release layer was 100nm and the average thickness of the imaging layer was 1 μm; the average thickness of the plating layer is 20nm, and the average thickness of the thermosol layer is 6 mu m; the optical anti-counterfeiting pattern of the optical anti-counterfeiting transfer film is an anti-counterfeiting pattern with a three-dimensional relief effect, and the optical effect of the three-dimensional relief is CN 103576216A.
Example 2
This example is used to illustrate the preparation of the optical anti-counterfeiting transfer film of the present invention.
The specific components used in this example are as follows:
the used substrate is a BOPP substrate with the average thickness of 25 mu m;
first photo-curable coating System (Photocurable coating for Release layer, solid content 10% by weight)
First photoinitiator: 1-hydroxycyclohexyl-phenyl ketone 184 from IGM;
water-based acrylic resin: 7655 (20% by weight solid content, balance water, glass transition temperature Tg of 50 ℃ for resin, 4B grade adhesion on PET substrate);
the first photoinitiator was present in an amount of 3 wt% based on the dry weight of the first photocurable coating system.
Aqueous coating system(photo-curable coating for spacer layer)
The aqueous polyurethane resin from DIC is WATERSOL-WG-204 (solid content 30 wt%, water for the rest, glass transition temperature Tg of resin 65 ℃);
second photocureable coating system (photocureable coating of imaging layer)
A second photoinitiator: 2-isopropylthioxanthone ITX produced by IGM;
acrylate oligomer: polyurethane acrylate 6150-;
acrylate diluent monomer: tripropylene glycol diacrylate monomer TPGDA from BASF corporation;
in the second photo-curing coating system, the content weight ratio of the second photoinitiator, the acrylate oligomer and the acrylate diluent monomer is 4: 46: 50;
the preparation process comprises the following steps:
(1) coating the first photocuring coating system on a PET film in a full-page manner by using a coating machine, and then drying at 80 ℃ and 100m/min by using a drying tunnel to form a variable layer on the PET film, wherein the average thickness of the variable layer is 200 nm;
(2) coating a water-based paint system on the variable layer, and then drying at 100 ℃ and 150m/min by adopting a drying tunnel to form a spacing layer on the variable layer;
(3) coating a second photocuring coating system (photocuring coating) on the spacing layer by using a UV mould press, attaching a mould pressing plate, carrying out UV mould pressing at the temperature of 60 ℃, and then carrying out second photocuring to obtain an imaging layer containing a UV mould pressing pattern (an anti-counterfeiting pattern with an optical anti-counterfeiting effect), wherein the second photocuring adopts a 395nm UV-LED;
(4) evaporating a metal reflection layer aluminum on the UV mould pressing layer by using a vacuum coating machine to form a coating;
(5) coating the metal coating layer by a coating machine at 160 ℃ to form a thermosol layer to obtain rewinding;
(6) and (3) rewinding by using a winding device with a UV light source and adopting a mercury lamp (containing UV light with an emission wavelength less than 375 nm) for illumination, and performing first photocuring on the variable layer to form a stripping layer so as to obtain the transfer film L2 with the optical anti-counterfeiting effect.
The structure schematic diagram of the optical anti-counterfeiting transfer film L2 is shown in FIG. 2, wherein L2 comprises a substrate layer, and a stripping layer, a spacing layer, an imaging layer, a plating layer and a hot melt adhesive layer which are sequentially stacked on the substrate layer, the average thickness of the stripping layer is 200nm, the average thickness of the spacing layer is 2 μm, and the average thickness of the imaging layer is 10 μm; the average thickness of the plating layer is 300nm, and the average thickness of the thermosol layer is 6 mu m; the optical anti-counterfeiting pattern of the optical anti-counterfeiting transfer film is an anti-counterfeiting pattern with fine dynamic effect, and the fine dynamic optical effect is the same as CN 103832114A.
Example 3
A transferable optical security transfer film was prepared in a similar manner as in example 1, except that: a spacing layer is added, specifically: before the step (2), coating the variable layer with a water-based coating system (30 wt% solid content, the rest being water, the waterborne polyurethane resin of DIC corporation being WATERSOL-WG-204, the glass transition temperature Tg of the resin being 65 ℃), and then drying at 100 ℃ and 150m/min by using a drying tunnel to form a spacer layer on the variable layer, the spacer layer having an average thickness of 2 μm; then, the subsequent steps were carried out, and the rest was the same as in example 1, to obtain an optical anti-counterfeiting transfer film L3.
Comparative example 1
An optical forgery-preventing transfer film was produced in a similar manner to example 1 except that the transfer film contained no peeling layer, that is, the steps (1) and (5) were not performed, and a second photocurable coating system was directly applied to the substrate, and the rest was the same as example 1, to obtain an optical forgery-preventing transfer film DL 1.
Comparative example 2
An optical forgery-preventing transfer film was produced in a similar manner to example 1 except that in step (1), the raw material for forming the peeling layer was different;
specifically, a primer layer having an average thickness of 100nm was formed by coating a PET film using Toyo Fang 1200 aqueous resin instead of the first photocurable coating system in example 1, and the process (5) was not performed, and the rest was the same as in example 1, to obtain an optical forgery-preventing transfer film DL 2.
Comparative example 3
An optical anti-counterfeiting transfer film was prepared in a similar manner to example 1, except that the variable layer was UV-cured to form a peeling layer before the step (2), and the rest was the same as example 1, to obtain an optical anti-counterfeiting transfer film DL 3.
Comparative example 4
An optical forgery-preventing transfer film was produced in a similar manner to example 1 except that in step (1), the kind of the photoinitiator forming the peeling layer was different;
specifically, the first photoinitiator uses 2,4, 6-trimethylbenzoyl-diphenylphosphine oxide TPO produced by IGM to replace 2-hydroxy-2-methyl-1-phenylpropanone 1173 produced by IGM company; the rest is the same as the example 1, and the optical anti-counterfeiting transfer film DL4 is obtained.
Test example
The UV mold-pressing replication condition and the hot stamping peeling condition of the optical anti-counterfeiting transfer film prepared in the above examples and comparative examples were observed, and the specific results are shown in table 1:
TABLE 1
Remarking: "-" indicates that the subsequent hot stamping stripping process cannot be carried out due to poor UV mould pressing effect.
In table 1, the copy yield represents the yield of the embossed copy, and is obtained by the following equation:
copy yield/% (total area coated-area used for UV die coating)/total area coated × 100
From the results, the optical anti-counterfeiting transfer film provided by the invention solves the problem of plate adhesion during UV mold pressing of the fine microstructure, can be suitable for various types of UV mold pressing of the fine microstructure, and meets the wide adaptability of the UV mold pressing to the fine microstructure. Meanwhile, the optical anti-counterfeiting transfer film provided by the invention is easy to peel off during hot stamping transfer, and the subsequent hot stamping transfer is ensured.
In particular, as can be seen by comparing example 1 with example 3, the reproduction yield of the optical anti-counterfeiting transfer film containing the spacer layer is higher;
particularly, as can be seen from comparison between examples 1-3 and comparative examples 1-4, the invention changes the variable layer with the bonding effect before UV mould pressing into the peeling layer easy to peel off by skillfully introducing the peeling layer and utilizing the photo-crosslinking reaction, thereby not only solving the problem of plate sticking during UV mould pressing of fine microstructures, but also ensuring subsequent hot stamping transfer.
In conclusion, the optical anti-counterfeiting transfer film provided by the invention solves the problems of plate adhesion during fine microstructure UV mould pressing and incomplete stripping during subsequent thermoprinting transfer, is beneficial to improving the optical anti-counterfeiting effect in the field of bank notes and identification cards, and has wide application prospect.
The preferred embodiments of the present invention have been described in detail above with reference to the accompanying drawings, but the present invention is not limited thereto. Within the scope of the technical idea of the invention, numerous simple modifications can be made to the technical solution of the invention, including combinations of the specific features in any suitable way, and the invention will not be further described in relation to the various possible combinations in order to avoid unnecessary repetition. Such simple modifications and combinations should be considered within the scope of the present disclosure as well.
Claims (14)
1. An optical anti-counterfeiting transfer film is characterized by comprising a substrate layer, and a stripping layer, an imaging layer, a plating layer and a hot melt adhesive layer which are sequentially stacked on the substrate layer, wherein the imaging layer contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure;
the peeling layer is a coating formed by sequentially drying and carrying out first photocuring on a first photocuring coating system, wherein the first photocuring coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375 nm;
the imaging layer is a coating formed by sequentially carrying out UV mould pressing and second photocuring on a second photocuring coating system, wherein the second photocuring coating system contains an acrylate oligomer, an acrylate diluent monomer and a second photoinitiator, and the photoinitiation wavelength of the second photoinitiator is 375nm-425 nm;
and the first photocuring is performed after the second photocuring.
2. The optical anti-counterfeiting transfer film according to claim 1, wherein the first photoinitiator is selected from at least one of a first cationic photoinitiator and a first free radical photoinitiator;
preferably, the first photoinitiator is a first free radical photoinitiator;
more preferably, the first photoinitiator is selected from at least one of alpha-hydroxy ketone photoinitiators, benzoyl formate photoinitiators and benzophenone photoinitiators.
3. The optical anti-counterfeiting transfer film according to claim 1 or 2, wherein the acrylic resin has a glass transition temperature higher than 30 ℃;
preferably, the solids content of the first photocurable coating system is from 5 to 55% by weight.
4. The optical anti-counterfeiting transfer film according to any one of claims 1 to 3, wherein the second photoinitiator is selected from at least one of a sensitizer-second cationic photoinitiator complex initiator, a second free radical photoinitiator-second cationic photoinitiator complex initiator, a second cationic photoinitiator, and a second free radical photoinitiator;
preferably, the second photoinitiator is a second free radical photoinitiator;
more preferably, the second photoinitiator is selected from at least one of α -aminoketone photoinitiators, acylphosphine oxide initiators, and thioxanthone photoinitiators.
5. The optical anti-counterfeiting transfer film according to any one of claims 1 to 4, wherein the acrylate oligomer in the second photo-curable coating system is at least one selected from epoxy acrylate, polyester acrylate and urethane acrylate;
preferably, the acrylate oligomer has a pencil hardness after photocuring of not higher than 2H;
preferably, the acrylate diluent monomer is selected from at least one of acrylate monomers having a functionality of 1 to 6.
6. The optical anti-counterfeiting transfer film according to any one of claims 1 to 5, wherein a spacer layer is further arranged between the imaging layer and the release layer, and the spacer layer is a coating layer formed by drying a water-based paint system;
preferably, the aqueous resin in the aqueous coating system is at least one selected from the group consisting of an aqueous polyether resin-aqueous polyester resin composite resin, an aqueous polycarbonate resin, an aqueous polyether resin, an aqueous polyester resin, an aqueous acrylic resin, an aqueous polyurethane resin, and an aqueous polyvinyl butyral resin;
preferably, the aqueous coating system has a solids content of 5 to 55 wt.%;
preferably, the glass transition temperature of the resin in the aqueous coating system is above 30 ℃.
7. The optical anti-counterfeiting transfer film according to any one of claims 1 to 6, wherein the average thickness of the peeling layer is 100nm to 3 μm;
preferably, the imaging layer has an average thickness of 1 μm to 20 μm;
preferably, the spacer layer has an average thickness of 50nm to 3 μm.
8. A method of making an optical anti-counterfeiting transfer film, the method comprising:
(1) performing first covering by tying a first photocureable coating body on a substrate, and then performing first drying to form a variable layer on the substrate; the first photo-curing coating system contains a first photoinitiator and acrylate resin, and the photoinitiation wavelength of the first photoinitiator is less than 375 nm;
and, optionally, second overlaying a water-borne coating system on the variable layer followed by second drying to form a spacing layer on the variable layer;
(2) a second photocuring coating is tied on the variable layer or the spacing layer for third covering, then UV mould pressing and second photocuring are carried out in sequence, an imaging layer is formed on the variable layer or the spacing layer, and the imaging layer contains an anti-counterfeiting pattern with an optical anti-counterfeiting structure obtained through the UV mould pressing; the second photo-curing coating system contains acrylate oligomer, acrylate diluent monomer and a second photoinitiator, the photoinitiation wavelength of the second photoinitiator comprises 375nm-425nm, the second photo-curing is carried out under the irradiation condition of a second light source, and the second light source emits light with the wavelength of 375nm-425 nm;
(3) evaporating the imaging layer to form a coating;
(4) fourthly, covering the hot melt adhesive on the coating to form a hot melt adhesive layer;
the method further comprises the following steps: subjecting the variable layer to a first photocuring to form a release layer, the first photocuring being carried out after step (2), step (3) or step (4), the first photocuring being carried out under irradiation with a first light source that emits light having a wavelength of less than 375 nm;
preferably, the first photocuring is performed after the step (4).
9. The method of claim 8, wherein the first photoinitiator is selected from at least one of a first cationic photoinitiator and a first free radical photoinitiator;
preferably, the first photoinitiator is a first free radical photoinitiator;
more preferably, the first photoinitiator is selected from at least one of alpha-hydroxy ketone photoinitiators, benzoyl formate photoinitiators and benzophenone photoinitiators;
preferably, the acrylic resin has a glass transition temperature higher than 30 ℃;
preferably, the solids content of the first photocurable coating system is from 5 to 55% by weight.
10. The method according to claim 8 or 9, wherein the second photoinitiator is selected from at least one of a sensitizer-second cationic photoinitiator complex initiator, a second free radical photoinitiator-second cationic photoinitiator complex initiator, a second cationic photoinitiator, a second free radical photoinitiator;
preferably, the second photoinitiator is a second free radical photoinitiator;
more preferably, the second photoinitiator is selected from at least one of α -aminoketone photoinitiators, acylphosphine oxide initiators, and thioxanthone photoinitiators.
11. The method of any one of claims 8-10, wherein the acrylate oligomer is selected from at least one of epoxy acrylate, polyester acrylate, and urethane acrylate;
preferably, the acrylate oligomer has a pencil hardness after photocuring of not higher than 2H;
preferably, the acrylate diluent monomer is selected from at least one of acrylate monomers having a functionality of 1 to 6.
12. The method according to any one of claims 8 to 11, wherein the aqueous resin in the aqueous coating system is preferably at least one selected from the group consisting of an aqueous polyether resin-aqueous polyester resin composite resin, an aqueous polycarbonate resin, an aqueous polyether resin, an aqueous polyester resin, an aqueous acrylic resin, an aqueous polyurethane resin, and an aqueous polyvinyl butyral resin;
preferably, the aqueous coating system has a solids content of 5 to 55 wt.%;
preferably, the glass transition temperature of the resin in the aqueous coating system is above 30 ℃.
13. An optical anti-counterfeiting transfer film prepared by the method of any one of claims 8 to 12.
14. Use of the optical anti-counterfeiting transfer film according to any one of claims 1 to 7 and 13 in the field of optical anti-counterfeiting;
preferably, the optical anti-counterfeiting field is the anti-counterfeiting field of bank notes and/or identification cards.
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