CN114477768A - A kind of lead-free low melting point sealing glass doped with fusible metal alloy and preparation method thereof - Google Patents
A kind of lead-free low melting point sealing glass doped with fusible metal alloy and preparation method thereof Download PDFInfo
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- 239000005394 sealing glass Substances 0.000 title claims abstract description 61
- 229910001092 metal group alloy Inorganic materials 0.000 title claims abstract description 46
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- 238000002844 melting Methods 0.000 title claims description 58
- 230000008018 melting Effects 0.000 title claims description 37
- 239000011521 glass Substances 0.000 claims abstract description 88
- 239000000945 filler Substances 0.000 claims abstract description 25
- 239000000843 powder Substances 0.000 claims description 56
- 239000002131 composite material Substances 0.000 claims description 22
- 239000006121 base glass Substances 0.000 claims description 18
- JWVAUCBYEDDGAD-UHFFFAOYSA-N bismuth tin Chemical compound [Sn].[Bi] JWVAUCBYEDDGAD-UHFFFAOYSA-N 0.000 claims description 15
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 10
- 238000002156 mixing Methods 0.000 claims description 10
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- 238000000498 ball milling Methods 0.000 claims description 8
- 229910052797 bismuth Inorganic materials 0.000 claims description 8
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 8
- GALOTNBSUVEISR-UHFFFAOYSA-N molybdenum;silicon Chemical compound [Mo]#[Si] GALOTNBSUVEISR-UHFFFAOYSA-N 0.000 claims description 8
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 7
- 239000002994 raw material Substances 0.000 claims description 7
- 239000003607 modifier Substances 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 4
- 229910052593 corundum Inorganic materials 0.000 claims description 4
- 239000010431 corundum Substances 0.000 claims description 4
- 239000006060 molten glass Substances 0.000 claims description 4
- 229910000505 Al2TiO5 Inorganic materials 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 239000004110 Zinc silicate Substances 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- 229910052878 cordierite Inorganic materials 0.000 claims description 3
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910000174 eucryptite Inorganic materials 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- AABBHSMFGKYLKE-SNAWJCMRSA-N propan-2-yl (e)-but-2-enoate Chemical group C\C=C\C(=O)OC(C)C AABBHSMFGKYLKE-SNAWJCMRSA-N 0.000 claims description 3
- XSMMCTCMFDWXIX-UHFFFAOYSA-N zinc silicate Chemical compound [Zn+2].[O-][Si]([O-])=O XSMMCTCMFDWXIX-UHFFFAOYSA-N 0.000 claims description 3
- 235000019352 zinc silicate Nutrition 0.000 claims description 3
- 229910052845 zircon Inorganic materials 0.000 claims description 3
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims description 3
- 238000007789 sealing Methods 0.000 abstract description 38
- 239000000126 substance Substances 0.000 abstract description 18
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000003566 sealing material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012827 research and development Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- -1 B 2 O 3 Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 239000003673 groundwater Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Inorganic materials [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C12/00—Powdered glass; Bead compositions
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
Description
技术领域technical field
本发明涉及玻璃材料制备技术领域,特别是涉及一种掺杂易熔金属合金的无铅低熔点封接玻璃及制备方法。The invention relates to the technical field of glass material preparation, in particular to a lead-free low melting point sealing glass doped with a fusible metal alloy and a preparation method.
背景技术Background technique
低熔点封接玻璃作为封接材料的一种,由于其在气密性和耐热性方面优于有机高分子材料,在电绝缘性能方面又优于金属材料,因而低熔点封接玻璃具有广泛的应用领域。随着现代科学技术的发展,尤其是真空电子技术、光电子技术、微电子半导体技术、激光和红外技术、电光源、工业测试等领域的飞速进步,器件的小型化、结构元件的精密化程度不断提高,电子元器件的种类越来越多,制品的形状也越来越复杂,对封接制品的气密性和可靠性的要求越来越高,对工作环境的要求也越来越高,由此导致对低熔点封接玻璃的要求越来越苛刻,要求具有广泛的应用领域,同时又有很强的针对性及特殊的指标要求。As a kind of sealing material, low melting point sealing glass has a wide field of application. With the development of modern science and technology, especially the rapid progress of vacuum electronics technology, optoelectronic technology, microelectronic semiconductor technology, laser and infrared technology, electric light source, industrial testing and other fields, the miniaturization of devices and the precision of structural components have continued to With the improvement of electronic components, there are more and more types of electronic components, and the shapes of products are becoming more and more complex. As a result, the requirements for low melting point sealing glass are becoming more and more stringent, requiring a wide range of application fields, and at the same time, it has strong pertinence and special index requirements.
在低熔点封接玻璃中,含铅封接玻璃具有软化温度低、电学性能稳定、化学稳定性较好等一系列特性。在多种电子元器件封接方面有着广泛的用途。国内外制备含铅封接玻璃常选用PbO-B2O3-ZnO-SiO2玻璃系统,但是大多数商用封接玻璃中的PbO含量甚至高达70%以上,这类产品中含有的重金属会对环境和人体造成严重危害。同时,大量废弃的电子元器件无法无害化处理,遇到雨水及大气等的侵蚀,铅离子就会逐渐溶出,导致土壤及地下水质的严重污染,对人类居住环境带来严重的威胁。因此,目前世界范围内对含铅材料的应用,越发受到严格的限制。虽然含铅低熔点封接玻璃的应用受到严格限制,但含铅的低熔点封接玻璃除了对环境不友好外,几乎所有的理化性能皆优于无铅低熔点封接玻璃。对于低熔点封接玻璃领域来讲,紧迫的研发任务是低熔点封接玻璃的无铅化,替代含铅低熔点封接玻璃。目前,低熔点封接玻璃的研发趋势转变为无铅化、低温化、实用化,无铅低熔点封接玻璃若要完全替代含铅低熔点封接玻璃,那么必须同时满足这“三化”的苛刻要求。目前对无铅低熔点封接玻璃的研究主要集中在磷酸盐玻璃系统、钒酸盐玻璃系统、铋酸盐玻璃系统、硼硅酸盐玻璃系统等。其中铋酸盐玻璃因为可以在低温封接,封接强度高,并具有较好的化学稳定性而受到关注,国内外研发机构在上述研究领域已发布了相关专利。Among the low melting point sealing glass, the lead-containing sealing glass has a series of characteristics such as low softening temperature, stable electrical properties and good chemical stability. It has a wide range of uses in the sealing of various electronic components. The PbO-B 2 O 3 -ZnO-SiO 2 glass system is often used in the preparation of lead-containing sealing glass at home and abroad, but the PbO content in most commercial sealing glasses is even as high as 70% or more. Serious harm to the environment and humans. At the same time, a large number of discarded electronic components cannot be disposed of harmlessly, and lead ions will gradually dissolve when eroded by rainwater and the atmosphere, resulting in serious pollution of soil and groundwater quality, and a serious threat to the human living environment. Therefore, the application of lead-containing materials in the world is more and more strictly restricted. Although the application of lead-containing low-melting sealing glass is strictly limited, in addition to being unfriendly to the environment, lead-containing low-melting sealing glass has almost all physical and chemical properties superior to lead-free low-melting sealing glass. For the low melting point sealing glass field, the urgent research and development task is to make the low melting point sealing glass lead-free and replace the lead-containing low melting point sealing glass. At present, the research and development trend of low-melting sealing glass has changed to lead-free, low-temperature, and practical. If lead-free low-melting sealing glass is to completely replace lead-containing low-melting sealing glass, it must meet these "three modernizations" at the same time. harsh requirements. At present, the research on lead-free low melting point sealing glass mainly focuses on phosphate glass system, vanadate glass system, bismuth glass system, borosilicate glass system and so on. Among them, bismuthate glass has attracted attention because it can be sealed at low temperature, has high sealing strength, and has good chemical stability. R&D institutions at home and abroad have issued relevant patents in the above research fields.
美国发明专利US2006/01058981公开了一种低熔点封接玻璃组分,以质量百分比计其玻璃组分为70%~90%的Bi2O3、10%~35%的ZnO、10%~35%的B2O3、0.1%~5%的Al2O3、0.1%~5%的CeO2、0%~5%的CuO、0%~0.2%的Fe2O3,其中CuO+Fe2O3含量为0.05%~5%,该组分玻璃在封接温度时不析晶,该体系玻璃的缺点在于由于玻璃中添加了大量的Al2O3成分,使玻璃的封接温度明显提高。The US patent for invention US2006/01058981 discloses a low melting point sealing glass component, in terms of mass percentage, the glass components are 70%-90% Bi 2 O 3 , 10%-35% ZnO, 10%-35% % of B 2 O 3 , 0.1% to 5% of Al 2 O 3 , 0.1% to 5% of CeO 2 , 0% to 5% of CuO, 0% to 0.2% of Fe 2 O 3 , of which CuO+Fe The content of 2 O 3 is 0.05% to 5%, and the glass of this component does not crystallize at the sealing temperature. The disadvantage of this system glass is that the sealing temperature of the glass is obvious due to the addition of a large amount of Al 2 O 3 to the glass. improve.
日本发明专利特开2006143480公开了一种Bi2O3-B2O3系玻璃组分及采用该组分的封接材料,基本不含铅,以摩尔百分比计其组分为:35%~60%的Bi2O3、10%~35%的B2O3、0.1%~5%的WO3。采用该组分的封接材料含有体积百分数为40%~90%的基础玻璃组分和60%~10%的低膨胀耐火性填料。该体系玻璃的缺点在于其热膨胀系数过高,在未加低膨胀耐火性填料之前,其值都在110×10-7/℃之上,且封接过程中易析晶。Japanese Patent Laid-Open No. 2006143480 discloses a Bi 2 O 3 -B 2 O 3 series glass component and a sealing material using the component, which is basically free of lead, and its components in terms of mole percentage are: 35%~ 60% Bi 2 O 3 , 10%-35% B 2 O 3 , 0.1%-5% WO 3 . The sealing material using this component contains 40% to 90% by volume of the base glass component and 60% to 10% of the low-expansion refractory filler. The disadvantage of this system glass is that its thermal expansion coefficient is too high. Before adding low-expansion refractory filler, its value is above 110×10 -7 /℃, and it is easy to crystallize during the sealing process.
中国计量学院发明专利CN 101602573A公开了一种铋酸盐低熔点封接玻璃材料,采用-Bi2O3-ZnO--B2O3--Sb2O3玻璃系统,其中质量百分含量为:71%~91%的Bi2O3、2%~20%的ZnO、5%~25%的B2O3、0.5%~5%的Sb2O3。还包括0%~3%的BaO的、0%~3%的SrO、0%~3%的CuO、0%~3%的TeO2友。所制备的无铅铋酸盐玻璃膨胀系数为(95.6~104.9)×10-7/℃,用于480~500℃的封接,该种玻璃的封接温度偏高,导致其实际使用受限。Invention patent CN 101602573A of China Institute of Jiliang discloses a bismuthate low melting point sealing glass material, which adopts -Bi 2 O 3 -ZnO--B 2 O 3 -Sb 2 O 3 glass system, wherein the mass percentage is : 71% to 91% of Bi 2 O 3 , 2% to 20% of ZnO, 5% to 25% of B 2 O 3 , and 0.5% to 5% of Sb 2 O 3 . It also includes 0% to 3% of BaO, 0% to 3% of SrO, 0% to 3% of CuO, and 0% to 3 % of TeO. The prepared lead-free bismuthate glass has an expansion coefficient of (95.6~104.9)×10 -7 /°C, which is used for sealing at 480~500°C. The sealing temperature of this kind of glass is too high, which limits its practical use. .
现有的无铅低熔点封接玻璃,都存在不同程度的性能缺陷,例如封接温度偏高、玻璃易析晶、化学稳定性差、实际应用领域范围窄等。The existing lead-free low-melting glass sealing glass has various performance defects, such as high sealing temperature, easy crystallization of glass, poor chemical stability, and narrow scope of practical application.
发明内容SUMMARY OF THE INVENTION
本发明的主要目的在于,提供一种膨胀系数与铂组玻璃匹配,封接温度≤420℃,化学稳定性好,封接强度高,易于制备的掺杂易熔金属合金的无铅低熔点封接玻璃。The main purpose of the present invention is to provide a lead-free low-melting-point seal doped with fusible metal alloys, which is easy to prepare and has an expansion coefficient matched with platinum group glass, a sealing temperature ≤ 420° C., good chemical stability, high sealing strength, and easy preparation. Connect the glass.
为实现上述目的,本发明采用的技术方案如下:For achieving the above object, the technical scheme adopted in the present invention is as follows:
本发明提供了一种掺杂易熔金属合金的无铅低熔点封接玻璃,其包括以下重量百分含量组分:无铅低熔点封接玻璃60%~85%;低膨胀填料8%~20%;易熔金属合金7%~20%。The invention provides a lead-free low melting point sealing glass doped with a fusible metal alloy, which comprises the following components by weight: 60% to 85% of the lead-free low melting point sealing glass; 8% to 85% of the low expansion filler 20%; fusible metal alloys 7% to 20%.
本发明还提供掺杂易熔金属合金的无铅低熔点封接玻璃粉的制备方法:The invention also provides a preparation method of lead-free low melting point sealing glass powder doped with fusible metal alloy:
包括如下步骤:It includes the following steps:
步骤一:按照各组分的重量百分含量,称取各原料,充分混合后,成为配合料,原料为氧化物或对应的化合物;Step 1: According to the weight percentage of each component, weigh each raw material, and after fully mixing, it becomes a batch material, and the raw material is an oxide or a corresponding compound;
步骤二:预先将硅钼棒电炉升温至900~1100℃;Step 2: preheat the silicon molybdenum rod electric furnace to 900-1100°C;
步骤三:将步骤一的配合料放入刚玉坩埚中,然后放入炉温为200℃-250℃的电阻炉中预热;Step 3: Put the batch material of Step 1 into a corundum crucible, and then put it into a resistance furnace with a furnace temperature of 200°C-250°C for preheating;
步骤四:将步骤三预热后的配合料放入硅钼棒电炉中进行玻璃熔制1~3小时;Step 4: put the preheated batch in step 3 into a silicon molybdenum rod electric furnace for glass melting for 1 to 3 hours;
步骤五:步骤四熔化后的玻璃液倒入压片机压成薄玻璃片,冷却后收纳;Step 5: The molten glass in step 4 is poured into a tablet press to be pressed into thin glass sheets, and stored after cooling;
步骤六:将步骤五制备的片状玻璃放入球磨罐中球磨;Step 6: Put the flake glass prepared in Step 5 into a ball-milling jar for ball-milling;
步骤七:将步骤六球磨后的玻璃粉用需求的筛网过筛并收纳,得到无铅基础玻璃粉;Step 7: sieve and store the ball-milled glass powder in step 6 with the required screen to obtain lead-free basic glass powder;
步骤八:将无铅基础玻璃粉、低膨胀填料粉、铋-锡金属合金粉分别进行独立筛分,用200目~240目筛网过筛,将通过筛网的粉体按照配比,在高速混料机中按照80~95转/分钟,混料时间80~90分钟进行充分均化混合,均化混合后的粉体,即为一种掺杂易熔金属合金的无铅低熔点封接玻璃复合体。Step 8: Separately sieve the lead-free basic glass powder, low-expansion filler powder, and bismuth-tin metal alloy powder, and sieve them with a 200-mesh to 240-mesh sieve. The high-speed mixer is fully homogenized and mixed at 80-95 r/min and the mixing time is 80-90 minutes. Glass composite.
借由上述技术方案,本发明至少具有下列优点:By the above-mentioned technical scheme, the present invention has at least the following advantages:
1、.原有的无铅低熔点封接玻璃皆存在下面的性能缺陷的一项或多项(1)玻璃易析晶,(2)封接温度偏高,(3)封接强度偏低,(4)化学稳定性差,(5)封接气密性低等。若无铅低熔点封接玻璃占据某一项或多项,将会限制其应用范围。本发明制备的无铅低熔点封接玻璃,作为复合体中的基础玻璃,通过组分优化设计,基本兼顾各项性能指标,在无铅条件下,低熔点封接玻璃结构稳定、玻璃形成范围宽、封接温度低、封接强度高、化学稳定性好、保证封接元器件气密性。1. The original lead-free low melting point sealing glass has one or more of the following performance defects (1) the glass is easy to crystallize, (2) the sealing temperature is high, (3) the sealing strength is low , (4) poor chemical stability, (5) low sealing air tightness. If lead-free low melting point sealing glass occupies one or more items, its application scope will be limited. The lead-free low-melting-point sealing glass prepared by the present invention is used as the basic glass in the composite body. Through the optimized design of components, various performance indicators are basically taken into account. Under lead-free conditions, the low-melting point sealing glass has stable structure and glass forming Wide, low sealing temperature, high sealing strength, good chemical stability, to ensure the air tightness of sealing components.
2.在本发明中,作为复合体中的低膨胀填料粉体,铌酸铋填料低膨胀性能优异,将其掺入基础玻璃粉中,不显著提高复合粉的封接温度,同时大幅度降低复合粉的膨胀系数、也显著提高复合粉的化学稳定性。2. In the present invention, as the low-expansion filler powder in the composite body, the bismuth niobate filler has excellent low-expansion performance. When it is mixed into the base glass powder, the sealing temperature of the composite powder is not significantly increased, and at the same time, it is greatly reduced. The expansion coefficient of the composite powder also significantly improves the chemical stability of the composite powder.
3.在本发明中,作为复合体中的易熔铋-锡金属合金粉体,其作用是将其均匀掺入基础玻璃粉和低膨胀填料粉体中后,不显著提高复合粉体的膨胀系数,同时大幅度降低复合粉体的封接温度,控制玻璃的封接温度≤420℃,能够释放器件封接后的残余应力,保证封接元器件的封接气密性。3. In the present invention, as the fusible bismuth-tin metal alloy powder in the composite, its function is to not significantly increase the expansion of the composite powder after it is uniformly mixed into the base glass powder and the low-expansion filler powder At the same time, the sealing temperature of the composite powder is greatly reduced, and the sealing temperature of the glass is controlled to be less than or equal to 420 °C, which can release the residual stress after the sealing of the device and ensure the sealing air tightness of the sealing components.
上述说明仅是本发明技术方案的概述,为了能够更清楚了解本发明的技术手段,并可依照说明书的内容予以实施,以下以本发明的较佳实施例详细说明如后。The above description is only an overview of the technical solution of the present invention. In order to understand the technical means of the present invention more clearly, and to implement according to the content of the description, the preferred embodiments of the present invention are described in detail below.
具体实施方式Detailed ways
为更进一步阐述本发明为达成预定发明目的所采取的技术手段及功效,以下较佳实施例,对本发明的具体实施方式、结构、特征及其功效,详细说明如后。在下述说明中,不同的“一实施例”或“实施例”指的不一定是同一实施例。此外,一或多个实施例中的特定特征、结构、或特点可由任何合适形式组合。In order to further illustrate the technical means and effects adopted by the present invention to achieve the predetermined purpose of the invention, the following preferred embodiments, the specific embodiments, structures, features and effects of the present invention, are described in detail as follows. In the following description, different "an embodiment" or "embodiments" do not necessarily refer to the same embodiment. Furthermore, the particular features, structures, or characteristics in one or more embodiments may be combined in any suitable form.
本发明提供一种掺杂易熔金属合金的无铅低熔点封接玻璃,其包括以下重量百分含量组分:无铅低熔点封接玻璃60%~85%;低膨胀填料8%~20%;易熔金属合金7%~20%。The invention provides a lead-free low-melting-point sealing glass doped with a fusible metal alloy, which comprises the following components by weight: 60%-85% of the lead-free low-melting point sealing glass; 8%-20% of the low-expansion filler %; 7% to 20% of fusible metal alloys.
本发明由三部分混合均化组成。第一部分由无铅低熔点基础玻璃组成,其作用是优选出综合性能指标优异的基础玻璃粉。第二部分由低膨胀填料粉组成,其作用是将其掺入基础玻璃粉中,不显著提高复合粉体的封接温度,同时大幅度降低复合粉体的膨胀系数。第三部分由易熔金属合金组成,其作用是将其掺入上述两种粉体中,不显著提高复合粉体的膨胀系数,同时大幅度降低复合粉体的封接温度,能够释放器件封接后的残余应力,保证元器件的封接气密性。The present invention consists of three parts mixing and homogenizing. The first part is composed of lead-free low-melting base glass, and its function is to select the base glass powder with excellent comprehensive performance indicators. The second part is composed of low-expansion filler powder, and its function is to mix it into the base glass powder, without significantly increasing the sealing temperature of the composite powder, and at the same time greatly reducing the expansion coefficient of the composite powder. The third part is composed of a fusible metal alloy, and its function is to mix it into the above two powders, without significantly increasing the expansion coefficient of the composite powder, and at the same time greatly reducing the sealing temperature of the composite powder, which can release the device seal. The residual stress after the connection ensures the airtightness of the components.
本发明无铅低熔点封接玻璃的膨胀系数与铂组玻璃匹配,封接温度≤420℃,化学稳定性好,封接强度高,易于制备。本发明可以根据不同的特性指标要求,灵活调整各项组分的配比,优化玻璃配方,满足市场对无铅低熔点封接玻璃的特定要求。The expansion coefficient of the lead-free low melting point sealing glass of the invention matches that of the platinum group glass, the sealing temperature is less than or equal to 420 DEG C, the chemical stability is good, the sealing strength is high, and the preparation is easy. The invention can flexibly adjust the ratio of each component according to different characteristic index requirements, optimize the glass formula, and meet the specific requirements of the market for lead-free and low melting point sealing glass.
进一步地,所述无铅低熔点基础玻璃是以Bi2O3-ZnO-B2O3-P2O5玻璃系统为基础,制备的无铅低熔点封接玻璃做为基础玻璃,其中无铅低熔点封接玻璃包括以下重量百分含量的组分:55%~87%的Bi2O3,5%~20%的B2O3,5%~20%的ZnO,1%~10%的P2O5。Further, the lead-free low-melting base glass is based on the Bi 2 O 3 -ZnO-B 2 O 3 -P 2 O 5 glass system, and the lead-free low-melting sealing glass is prepared as the base glass, wherein no The lead low melting point sealing glass includes the following components by weight: 55%-87% Bi 2 O 3 , 5%-20% B 2 O 3 , 5%-20% ZnO, 1%-10% % P 2 O 5 .
在本发明玻璃系统中,Bi2O3、B2O3、ZnO、P2O5作为玻璃网络形成剂起到玻璃网络基础骨架作用。高Bi2O3含量保证玻璃的低软化温度,适量的P2O5含量有助于降低玻璃的软化温度,降低玻璃析晶倾向,同时不显著降低玻璃的化学稳定性。适量的B2O3起到稳固玻璃网络的作用,在玻璃熔制过程中,保持粘度稳定。ZnO虽然是中间体氧化物,但在游离氧充分的条件下,形成锌氧四面体进入玻璃网络。In the glass system of the present invention, Bi 2 O 3 , B 2 O 3 , ZnO, and P 2 O 5 are used as glass network formers to function as the basic framework of the glass network. The high content of Bi 2 O 3 ensures the low softening temperature of the glass, and the moderate content of P 2 O 5 helps to lower the softening temperature of the glass and reduce the tendency of the glass to crystallize without significantly reducing the chemical stability of the glass. An appropriate amount of B 2 O 3 can stabilize the glass network and keep the viscosity stable during the glass melting process. Although ZnO is an intermediate oxide, under the condition of sufficient free oxygen, zinc-oxygen tetrahedron is formed into the glass network.
进一步地,所述无铅低熔点基础玻璃还含有下述重量百分含量的玻璃性能调整剂:0.5%~6%的SiO2,0.1%~6%的Al2O3,0.1%~5%的BaO,0.1%~5%的SrO。Further, the lead-free low-melting base glass further contains the following glass performance modifiers by weight: 0.5%-6% SiO 2 , 0.1%-6% Al 2 O 3 , 0.1%-5% BaO, 0.1% to 5% SrO.
在本发明玻璃系统中,SiO2、Al2O3、BaO、SrO是玻璃结构调整剂。BaO、SrO不仅能加固玻璃网络,而且作为中间体氧化物还能够提供游离氧,为SiO2、Al2O3修补玻璃系统的断网,提供帮助。In the glass system of the present invention, SiO 2 , Al 2 O 3 , BaO, and SrO are glass structure modifiers. BaO and SrO can not only strengthen the glass network, but also provide free oxygen as intermediate oxides to help SiO 2 and Al 2 O 3 repair the broken network of the glass system.
进一步地,所述无铅低熔点基础玻璃还含有下述重量百分含量的玻璃性能调整剂:0.5%~8%的Sb2O3,0.1%~6%的CuO,0.1%~6%的Fe2O3,0.1%~6%的Co2O3,0.1%~6%的MnO2,0.2%~6%的La2O3,0.2%~6%的CeO2。Further, the lead-free low-melting base glass also contains the following glass performance modifiers by weight: 0.5%-8% Sb 2 O 3 , 0.1%-6% CuO, 0.1%-6% Fe 2 O 3 , 0.1% to 6% of Co 2 O 3 , 0.1% to 6% of MnO 2 , 0.2% to 6% of La 2 O 3 , and 0.2% to 6% of CeO 2 .
在本发明玻璃系统中,CuO、Fe2O3、Sb2O3、Co2O3、MnO2、La2O3、CeO2是玻璃性能调整剂,CuO、Fe2O3、Co2O3不仅能调整玻璃的颜色,而且还能够提高封接材料的浸润性,基础玻璃的化学稳定性,有利于封接工艺。MnO2、Sb2O3、La2O3、CeO2,能够提升玻璃的电性能,特别是体积电阻和表面电阻。In the glass system of the present invention, CuO, Fe 2 O 3 , Sb 2 O 3 , Co 2 O 3 , MnO 2 , La 2 O 3 and CeO 2 are glass performance modifiers, and CuO, Fe 2 O 3 , Co 2 O 3 It can not only adjust the color of the glass, but also improve the wettability of the sealing material and the chemical stability of the base glass, which is beneficial to the sealing process. MnO 2 , Sb 2 O 3 , La 2 O 3 , CeO 2 can improve the electrical properties of the glass, especially the volume resistance and surface resistance.
优选地,所述无铅低熔点基础玻璃含有下述重量百分含量的组分:70%~85%的Bi2O3,5%~15%的B2O3,5%~15%的ZnO,1%~6%的P2O5,0.5%~4%的SiO2,0.1%~4%的Al2O3,0.1%~4.5%的BaO,0.1%~3%的SrO,0.5%~5%的Sb2O3,0.1%~5%的CuO,0.1%~4%的Fe2O3,0.1%~2%的Co2O3,0.1%~2%的MnO2,0.2%~3%的La2O3,0.2%~3%的CeO2。Preferably, the lead-free low-melting base glass contains the following components by weight: 70%-85% Bi 2 O 3 , 5%-15% B 2 O 3 , 5%-15% ZnO, 1%-6% P 2 O 5 , 0.5%-4% SiO 2 , 0.1%-4% Al 2 O 3 , 0.1%-4.5% BaO, 0.1%-3% SrO, 0.5% %~5% of Sb 2 O 3 , 0.1% to 5% of CuO, 0.1% to 4% of Fe 2 O 3 , 0.1% to 2% of Co 2 O 3 , 0.1% to 2% of MnO 2 , 0.2 %~3% La 2 O 3 , 0.2%~3% CeO 2 .
进一步地,所述低膨胀填料选自钛酸铝、锂霞石、堇青石、锆英石、铌酸铋、硅酸锌和石英玻璃中的至少一种,所述低膨胀填料的膨胀系数范围在(-110~60)×10-7/℃。Further, the low-expansion filler is selected from at least one of aluminum titanate, eucryptite, cordierite, zircon, bismuth niobate, zinc silicate and quartz glass, and the expansion coefficient of the low-expansion filler ranges from At (-110~60)×10 -7 /°C.
本发明制备的无铅基础玻璃粉本身具备较低的封接温度,较好的化学稳定性,适宜的膨胀系数。但是为了能够拓展其应用范围,获得更优异的理化性能,本发明在无铅玻璃粉中掺入低膨胀系数的填料粉体,填料粉体必须全部通过200目~240目筛网。填料在掺杂易熔金属合金的无铅低熔点封接玻璃复合体中,其重量百分含量范围优选在8%~20%。The lead-free basic glass powder prepared by the invention has lower sealing temperature, better chemical stability and suitable expansion coefficient. However, in order to expand its application range and obtain more excellent physical and chemical properties, the present invention mixes filler powder with low expansion coefficient into the lead-free glass powder, and the filler powder must all pass through 200-240 mesh screens. In the lead-free low melting point sealing glass composite doped with fusible metal alloy, the weight percentage of the filler is preferably in the range of 8% to 20%.
进一步地,所述易熔金属合金为铋-锡金属合金。Further, the fusible metal alloy is a bismuth-tin metal alloy.
所述铋-锡金属合金中铋的质量百分数为20%~80%,锡的质量百分数为80%~20%。The mass percentage of bismuth in the bismuth-tin metal alloy is 20%-80%, and the mass percentage of tin is 80%-20%.
本发明在制备一种掺杂易熔金属合金的无铅低熔点封接玻璃复合体中,于复合体中还包括铋-锡金属合金粉,铋-锡金属合金粉必须全部通过200~240目目筛网,其掺入后,不显著提高复合粉体的膨胀系数,同时大幅度降低复合粉体的封接温度。铋-锡金属合金粉在掺杂易熔金属合金的无铅低熔点封接玻璃复合体中,其重量百分含量范围优选在7%~20%。In the present invention, in preparing a lead-free low melting point sealing glass composite doped with fusible metal alloy, the composite body also includes bismuth-tin metal alloy powder, and the bismuth-tin metal alloy powder must pass through 200-240 mesh The mesh sieve does not significantly increase the expansion coefficient of the composite powder after it is incorporated, and at the same time greatly reduces the sealing temperature of the composite powder. The bismuth-tin metal alloy powder preferably ranges from 7% to 20% by weight in the lead-free low melting point sealing glass composite doped with the fusible metal alloy.
本发明还提供一种上述的掺杂易熔金属合金的无铅低熔点封接玻璃的制备方法,包括如下步骤:The present invention also provides a preparation method of the above-mentioned lead-free low melting point sealing glass doped with fusible metal alloy, comprising the following steps:
步骤一:按照各组分的重量百分含量,称取各原料,充分混合后,成为配合料,原料为氧化物或对应的化合物;Step 1: According to the weight percentage of each component, weigh each raw material, and after fully mixing, it becomes a batch material, and the raw material is an oxide or a corresponding compound;
步骤二:预先将硅钼棒电炉升温至900~1100℃;Step 2: preheat the silicon molybdenum rod electric furnace to 900-1100°C;
步骤三:将步骤一的配合料放入刚玉坩埚中,然后放入炉温为200℃~250℃的电阻炉中预热30~60分钟;Step 3: put the batching material in step 1 into a corundum crucible, and then put it into a resistance furnace with a furnace temperature of 200°C to 250°C for preheating for 30 to 60 minutes;
步骤四:将步骤三预热后的配合料放入硅钼棒电炉中进行玻璃熔制1~3小时;Step 4: put the preheated batch in step 3 into a silicon molybdenum rod electric furnace for glass melting for 1 to 3 hours;
步骤五:步骤四熔化后的玻璃液倒入压片机压成薄玻璃片,冷却后收纳;Step 5: The molten glass in step 4 is poured into a tablet press to be pressed into thin glass sheets, and stored after cooling;
步骤六:将步骤五制备的片状玻璃放入球磨罐中球磨;Step 6: Put the flake glass prepared in Step 5 into a ball-milling jar for ball-milling;
步骤七:将步骤六球磨后的玻璃粉用需求的筛网过筛并收纳,得到无铅基础玻璃粉;Step 7: sieve and store the ball-milled glass powder in step 6 with the required screen to obtain lead-free basic glass powder;
步骤八:将无铅基础玻璃粉、低膨胀填料粉、铋-锡金属合金粉分别进行独立筛分,用200目~240目筛网过筛,将通过筛网的粉体按照配比,在高速混料机中按照80~95转/分钟,混料时间80~90分钟进行充分均化混合,均化混合后的粉体,即为一种掺杂易熔金属合金的无铅低熔点封接玻璃复合体。Step 8: Separately sieve the lead-free basic glass powder, low-expansion filler powder, and bismuth-tin metal alloy powder, and sieve them with a 200-mesh to 240-mesh sieve. The high-speed mixer is fully homogenized and mixed at 80-95 r/min and the mixing time is 80-90 minutes. Glass composite.
本发明提供的制备方法,不仅工艺简单、实用,而且能够制备出绿色环保、规模化生产、各项性能指标优异的一种掺杂易熔金属合金的无铅低熔点封接玻璃。该方法不仅使玻璃粉的制造过程简单易行,而且整体工艺制造过程对环境没有污染。The preparation method provided by the invention not only has a simple and practical process, but also can prepare a lead-free low-melting point sealing glass doped with a fusible metal alloy, which is environmentally friendly, large-scale production, and excellent in various performance indicators. The method not only makes the manufacturing process of the glass powder simple and feasible, but also does not pollute the environment in the manufacturing process of the whole process.
下面结合具体的实施例对本发明作进一步详细说明。The present invention will be described in further detail below in conjunction with specific embodiments.
实施例1~7是制备本发明一种掺杂易熔金属合金的无铅低熔点封接玻璃的具体实施例。每个实施例根据各组分重量百分含量称取相对应的原料共计约150克,即无铅低熔点封接玻璃共计约150克,各实施例的实施结果和性能数据见表1。Examples 1 to 7 are specific examples of preparing a lead-free low melting point sealing glass doped with a fusible metal alloy of the present invention. Each example weighs a total of about 150 grams of corresponding raw materials according to the weight percentage of each component, that is, about 150 grams of lead-free low-melting sealing glass in total. The implementation results and performance data of each example are shown in Table 1.
本发明制备的一种掺杂易熔金属合金的无铅低熔点封接玻璃的工艺过程是按以下步骤进行的:The technological process of a kind of lead-free low melting point sealing glass doped with fusible metal alloy prepared by the present invention is carried out according to the following steps:
步骤一:按照以下无铅低熔点封接玻璃的化学成分及重量百分含量,准确称量氧化物或对应的化合物,充分混合:70%~90%的Bi2O3,5%~15%的B2O3,5%~15%的ZnO,1%~6%的P2O5,0.5%~4%的SiO2,0.1%~4%的Al2O3,0.1%~4.5%的BaO,0.1%~3%的SrO,0.5%~5%的Sb2O3,0.1%~5%的CuO,0.1%~4%的Fe2O3,0.1%~2%的Co2O3,0.1%~2%的MnO2,0.2%~3%的La2O3,0.2%~3%的CeO2。Step 1: Accurately weigh the oxide or the corresponding compound according to the chemical composition and weight percentage of the lead-free low melting point sealing glass, and mix thoroughly: 70%-90% Bi 2 O 3 , 5%-15% B 2 O 3 , 5%~15% ZnO, 1%~6% P 2 O 5 , 0.5%~4% SiO 2 , 0.1%~4% Al 2 O 3 , 0.1%~4.5% BaO, 0.1%~3% SrO, 0.5%~5% Sb 2 O 3 , 0.1%~5% CuO, 0.1%~4% Fe 2 O 3 , 0.1%~2% Co 2 O 3 , 0.1%-2% MnO 2 , 0.2%-3% La 2 O 3 , 0.2%-3% CeO 2 .
步骤二:预先将硅钼棒电炉升温至900~1100℃。Step 2: preheat the silicon molybdenum rod electric furnace to 900-1100°C.
步骤三:将步骤一的配合料放入刚玉坩埚中,然后放入炉温为200℃~250℃的电阻炉中预热30-60分钟。Step 3: Put the batch material of Step 1 into a corundum crucible, and then put it into a resistance furnace with a furnace temperature of 200°C to 250°C for preheating for 30-60 minutes.
步骤四:将步骤三预热后的配合料放入硅钼棒电炉中进行玻璃熔制1~3小时。Step 4: Put the preheated batch in step 3 into a silicon molybdenum rod electric furnace for glass melting for 1 to 3 hours.
步骤五:步骤四熔化后的玻璃液倒入压片机压成薄玻璃片,冷却后收纳。Step 5: The molten glass in step 4 is poured into a tablet press to be pressed into thin glass sheets, and stored after cooling.
步骤六:将步骤五制备的片状玻璃放入球磨罐中球磨。Step 6: Put the flake glass prepared in Step 5 into a ball-milling jar for ball-milling.
步骤七:将步骤六球磨后的玻璃粉用200目~240目筛网过筛,过筛后的玻璃粉收纳。Step 7: Sieve the ball-milled glass powder in Step 6 with a 200-mesh to 240-mesh sieve, and store the sieved glass powder.
步骤八:选取下述通过200目~240目筛网的低膨胀填料粉的一种或几种组合,所述填料为钛酸铝、锂霞石、堇青石、锆英石、铌酸铋、硅酸锌、石英玻璃中的一种或几种组合,所述填料膨胀系数范围在(-110~60)×10-7/℃。Step 8: Select one or more combinations of the following low-expansion filler powders that pass through 200-mesh to 240-mesh sieves, and the fillers are aluminum titanate, eucryptite, cordierite, zircon, bismuth niobate, One or more combinations of zinc silicate and quartz glass, and the expansion coefficient of the filler is in the range of (-110 to 60)×10-7/°C.
步骤九:选取下述通过200目~240目筛网的易熔铋-锡金属合金粉体,其重量百分含量是铋20%~80%,锡80%~20%。Step 9: Select the following fusible bismuth-tin metal alloy powder that passes through a 200-mesh-240-mesh sieve, and its weight percentages are 20% to 80% of bismuth and 80% to 20% of tin.
步骤十:将步骤七制备的无铅基础玻璃粉、步骤八选取的低膨胀填料粉、步骤九选取的易熔铋-锡金属合金粉,按照无铅基础玻璃粉重量百分含量60%~85%,低膨胀填料粉重量百分含量8%~20%,易熔铋-锡金属合金粉重量百分含量7%~20%的配比,准确称量并混合,放入高速混料机中按照80~95转/分钟,混料时间80~90分钟进行充分均化混合。均化混合后的粉体,即为一种掺杂易熔金属合金的无铅低熔点封接玻璃复合体。Step 10: The lead-free basic glass powder prepared in step 7, the low-expansion filler powder selected in step 8, and the fusible bismuth-tin metal alloy powder selected in step 9 are 60% to 85% by weight of the lead-free basic glass powder. %, the weight percentage of low-expansion filler powder is 8% to 20%, and the weight percentage of fusible bismuth-tin metal alloy powder is 7% to 20%, accurately weighed and mixed, and put into a high-speed mixer Fully homogenized and mixed at a mixing time of 80 to 95 rpm and a mixing time of 80 to 90 minutes. The powder after homogenization and mixing is a lead-free low melting point sealing glass composite doped with a fusible metal alloy.
实施例1~7的玻璃样品,其性能测试方法如下:For the glass samples of Examples 1 to 7, the performance testing methods are as follows:
1、膨胀系数:采用中国电子行业标准SJ/T 11036-96进行;1. Expansion coefficient: adopt Chinese electronics industry standard SJ/T 11036-96;
2、软化温度:采用中国电子行业标准SJ/T11038-96进行;2. Softening temperature: adopt Chinese electronics industry standard SJ/T11038-96;
3、封接温度:采用中国电子行业标准SJ/T11038-96进行;3. Sealing temperature: adopt Chinese electronic industry standard SJ/T11038-96;
4、流动柱直径:采用中国机械电子工业部标准SJ-3232.3-89进行;4. The diameter of the flow column: adopt the standard SJ-3232.3-89 of the Ministry of Machinery and Electronics Industry of China;
5、耐水化学稳定性实验:玻璃的耐水性测试在90℃的蒸馏水中进行,将磨成10×10×10mm的玻璃试样放在90℃的蒸馏水中水浴24小时,烘干后称量其每平方厘米的失重克数。5. Water resistance chemical stability test: The water resistance test of glass was carried out in distilled water at 90°C, and the glass sample ground to 10×10×10mm was placed in a water bath at 90°C in distilled water for 24 hours, and weighed after drying. Weight loss in grams per square centimeter.
本发明能够通过调整玻璃粉的组分、填料的种类和含量、铋-锡合金的配比,实现膨胀系数、封接温度的调整,从而适应多种玻璃、陶瓷、金属及合金之间的封接与焊接。The invention can adjust the expansion coefficient and the sealing temperature by adjusting the components of the glass powder, the type and content of the filler, and the ratio of the bismuth-tin alloy, so as to adapt to the sealing between various glasses, ceramics, metals and alloys. Connection and welding.
表1各实施例的化学组成和性能数据Table 1 Chemical composition and performance data of each embodiment
如表1所示,本发明的一种掺杂易熔金属合金的无铅低熔点封接玻璃,其玻璃转变温度为335℃~375℃,25℃~300℃的平均热膨胀系数在(83.38~95.34)×10-7/℃,封接过程不析晶,可在420℃~460℃范围内进行封接。本发明解决了无铅条件下,低熔点封接玻璃结构稳定、玻璃形成范围宽、封接温度低、封接强度高、化学稳定性好、保证封接元器件气密性等问题。As shown in Table 1, a lead-free low melting point sealing glass doped with a fusible metal alloy of the present invention has a glass transition temperature of 335°C to 375°C, and an average thermal expansion coefficient of 25°C to 300°C in (83.38~ 95.34)×10 -7 /℃, no crystallization during the sealing process, it can be sealed in the range of 420℃~460℃. The invention solves the problems of low melting point sealing glass with stable structure, wide glass formation range, low sealing temperature, high sealing strength, good chemical stability and ensuring the airtightness of sealing components under lead-free conditions.
以上所述,仅是本发明的较佳实施例而已,并非对本发明作任何形式上的限制,虽然本发明已以较佳实施例揭露如上,然而并非用以限定本发明,任何熟悉本专业的技术人员,在不脱离本发明技术方案范围内,当可利用上述揭示的技术内容作出些许更动或修饰为等同变化的等效实施例,但凡是未脱离本发明技术方案的内容,依据本发明的技术实质对以上实施例所作的任何简单修改、等同变化与修饰,均仍属于本发明技术方案的范围内。The above are only preferred embodiments of the present invention, and are not intended to limit the present invention in any form. Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Technical personnel, within the scope of the technical solution of the present invention, can make some changes or modifications to equivalent embodiments of equivalent changes by using the technical content disclosed above, but any content that does not depart from the technical solution of the present invention, according to the present invention Any simple modifications, equivalent changes and modifications made to the above embodiments still fall within the scope of the technical solutions of the present invention.
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115572072A (en) * | 2022-10-08 | 2023-01-06 | 中建材玻璃新材料研究院集团有限公司 | Sealing glass powder and preparation method thereof |
CN115925436A (en) * | 2022-12-26 | 2023-04-07 | 哈尔滨工业大学 | Method for connecting ferrite and microwave dielectric ceramic by using low-melting-point glass soldering paste |
CN116253511A (en) * | 2023-02-23 | 2023-06-13 | 上海太洋科技有限公司 | Phosphate glass with high hardness, high Young modulus and high refractive index and preparation method thereof |
CN116462411A (en) * | 2023-04-26 | 2023-07-21 | 华东理工大学 | A composite powder potting material of lead-free multi-component bismuth-based low melting point glass and ceramic powder, its preparation method and application |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003095697A (en) * | 2001-09-18 | 2003-04-03 | Nihon Yamamura Glass Co Ltd | Sealing composition |
CN1772676A (en) * | 2004-11-12 | 2006-05-17 | 旭技术玻璃株式会社 | Low melting glass, sealing composition and sealing paste |
CN101723589A (en) * | 2008-10-29 | 2010-06-09 | 珠海彩珠实业有限公司 | Lead-free low-melting-point glass powder for PDP sealing and preparation method thereof |
WO2012001824A1 (en) * | 2010-07-02 | 2012-01-05 | 有限会社ソフィアプロダクト | Bonding material |
JP2013136470A (en) * | 2011-12-28 | 2013-07-11 | Asahi Glass Co Ltd | Sealing composition, method for producing sealing composition and sealed structure |
CN107010837A (en) * | 2017-04-06 | 2017-08-04 | 蚌埠玻璃工业设计研究院 | A kind of rare earth doped element leadless and low-melting point sealing glass powder and its manufacture method |
-
2022
- 2022-03-01 CN CN202210196815.6A patent/CN114477768A/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003095697A (en) * | 2001-09-18 | 2003-04-03 | Nihon Yamamura Glass Co Ltd | Sealing composition |
CN1772676A (en) * | 2004-11-12 | 2006-05-17 | 旭技术玻璃株式会社 | Low melting glass, sealing composition and sealing paste |
CN101723589A (en) * | 2008-10-29 | 2010-06-09 | 珠海彩珠实业有限公司 | Lead-free low-melting-point glass powder for PDP sealing and preparation method thereof |
WO2012001824A1 (en) * | 2010-07-02 | 2012-01-05 | 有限会社ソフィアプロダクト | Bonding material |
CN103025676A (en) * | 2010-07-02 | 2013-04-03 | 有限会社苏菲亚制造 | Bonding material |
JP2013136470A (en) * | 2011-12-28 | 2013-07-11 | Asahi Glass Co Ltd | Sealing composition, method for producing sealing composition and sealed structure |
CN107010837A (en) * | 2017-04-06 | 2017-08-04 | 蚌埠玻璃工业设计研究院 | A kind of rare earth doped element leadless and low-melting point sealing glass powder and its manufacture method |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115572072A (en) * | 2022-10-08 | 2023-01-06 | 中建材玻璃新材料研究院集团有限公司 | Sealing glass powder and preparation method thereof |
CN115925436A (en) * | 2022-12-26 | 2023-04-07 | 哈尔滨工业大学 | Method for connecting ferrite and microwave dielectric ceramic by using low-melting-point glass soldering paste |
CN115925436B (en) * | 2022-12-26 | 2023-09-22 | 哈尔滨工业大学 | Method for connecting ferrite and microwave dielectric ceramic by using low-melting glass soldering paste |
CN116253511A (en) * | 2023-02-23 | 2023-06-13 | 上海太洋科技有限公司 | Phosphate glass with high hardness, high Young modulus and high refractive index and preparation method thereof |
CN116253511B (en) * | 2023-02-23 | 2023-09-22 | 上海太洋科技有限公司 | Phosphate glass with high hardness, high Young modulus and high refractive index and preparation method thereof |
CN116462411A (en) * | 2023-04-26 | 2023-07-21 | 华东理工大学 | A composite powder potting material of lead-free multi-component bismuth-based low melting point glass and ceramic powder, its preparation method and application |
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