CN114231183A - Nano cerium oxide suspension for grinding and polishing glass and preparation method thereof - Google Patents
Nano cerium oxide suspension for grinding and polishing glass and preparation method thereof Download PDFInfo
- Publication number
- CN114231183A CN114231183A CN202210025917.1A CN202210025917A CN114231183A CN 114231183 A CN114231183 A CN 114231183A CN 202210025917 A CN202210025917 A CN 202210025917A CN 114231183 A CN114231183 A CN 114231183A
- Authority
- CN
- China
- Prior art keywords
- cerium oxide
- nano cerium
- grinding
- suspension
- oxide suspension
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000725 suspension Substances 0.000 title claims abstract description 64
- 229910000420 cerium oxide Inorganic materials 0.000 title claims abstract description 60
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 title claims abstract description 60
- 238000005498 polishing Methods 0.000 title claims abstract description 44
- 239000011521 glass Substances 0.000 title claims abstract description 39
- 238000000227 grinding Methods 0.000 title claims abstract description 21
- 238000002360 preparation method Methods 0.000 title abstract description 15
- 239000002270 dispersing agent Substances 0.000 claims abstract description 23
- 239000000843 powder Substances 0.000 claims abstract description 21
- 239000004094 surface-active agent Substances 0.000 claims abstract description 20
- 239000003755 preservative agent Substances 0.000 claims abstract description 17
- 230000002335 preservative effect Effects 0.000 claims abstract description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000008367 deionised water Substances 0.000 claims abstract description 10
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 8
- LXCFILQKKLGQFO-UHFFFAOYSA-N methylparaben Chemical compound COC(=O)C1=CC=C(O)C=C1 LXCFILQKKLGQFO-UHFFFAOYSA-N 0.000 claims description 7
- QFOHBWFCKVYLES-UHFFFAOYSA-N Butylparaben Chemical compound CCCCOC(=O)C1=CC=C(O)C=C1 QFOHBWFCKVYLES-UHFFFAOYSA-N 0.000 claims description 6
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- QELSKZZBTMNZEB-UHFFFAOYSA-N propylparaben Chemical compound CCCOC(=O)C1=CC=C(O)C=C1 QELSKZZBTMNZEB-UHFFFAOYSA-N 0.000 claims description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 6
- 229940051841 polyoxyethylene ether Drugs 0.000 claims description 5
- 229920000056 polyoxyethylene ether Polymers 0.000 claims description 5
- 239000002202 Polyethylene glycol Substances 0.000 claims description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 4
- 239000004283 Sodium sorbate Substances 0.000 claims description 4
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 4
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 claims description 4
- 235000010270 methyl p-hydroxybenzoate Nutrition 0.000 claims description 4
- 239000004292 methyl p-hydroxybenzoate Substances 0.000 claims description 4
- 229920002401 polyacrylamide Polymers 0.000 claims description 4
- 229920001223 polyethylene glycol Polymers 0.000 claims description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 4
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 4
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 4
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 4
- WXMKPNITSTVMEF-UHFFFAOYSA-M sodium benzoate Chemical compound [Na+].[O-]C(=O)C1=CC=CC=C1 WXMKPNITSTVMEF-UHFFFAOYSA-M 0.000 claims description 4
- 235000010234 sodium benzoate Nutrition 0.000 claims description 4
- 239000004299 sodium benzoate Substances 0.000 claims description 4
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 claims description 4
- LROWVYNUWKVTCU-STWYSWDKSA-M sodium sorbate Chemical compound [Na+].C\C=C\C=C\C([O-])=O LROWVYNUWKVTCU-STWYSWDKSA-M 0.000 claims description 4
- 235000019250 sodium sorbate Nutrition 0.000 claims description 4
- 239000005711 Benzoic acid Substances 0.000 claims description 3
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 claims description 3
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 3
- 239000003945 anionic surfactant Substances 0.000 claims description 3
- 235000010233 benzoic acid Nutrition 0.000 claims description 3
- 229940067596 butylparaben Drugs 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 229960002887 deanol Drugs 0.000 claims description 3
- 239000012972 dimethylethanolamine Substances 0.000 claims description 3
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 claims description 3
- 229960001617 ethyl hydroxybenzoate Drugs 0.000 claims description 3
- 235000010228 ethyl p-hydroxybenzoate Nutrition 0.000 claims description 3
- 239000004403 ethyl p-hydroxybenzoate Substances 0.000 claims description 3
- NUVBSKCKDOMJSU-UHFFFAOYSA-N ethylparaben Chemical compound CCOC(=O)C1=CC=C(O)C=C1 NUVBSKCKDOMJSU-UHFFFAOYSA-N 0.000 claims description 3
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 claims description 3
- 229960002216 methylparaben Drugs 0.000 claims description 3
- 239000002736 nonionic surfactant Substances 0.000 claims description 3
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 claims description 3
- 229940113115 polyethylene glycol 200 Drugs 0.000 claims description 3
- 229940068918 polyethylene glycol 400 Drugs 0.000 claims description 3
- 229940057847 polyethylene glycol 600 Drugs 0.000 claims description 3
- 235000010232 propyl p-hydroxybenzoate Nutrition 0.000 claims description 3
- 239000004405 propyl p-hydroxybenzoate Substances 0.000 claims description 3
- 229960003415 propylparaben Drugs 0.000 claims description 3
- 229940083575 sodium dodecyl sulfate Drugs 0.000 claims description 3
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 claims description 3
- 235000010199 sorbic acid Nutrition 0.000 claims description 3
- 239000004334 sorbic acid Substances 0.000 claims description 3
- 229940075582 sorbic acid Drugs 0.000 claims description 3
- 238000001132 ultrasonic dispersion Methods 0.000 claims description 3
- 230000008569 process Effects 0.000 abstract description 8
- 239000007788 liquid Substances 0.000 abstract description 3
- 238000006748 scratching Methods 0.000 abstract description 3
- 230000002393 scratching effect Effects 0.000 abstract description 3
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 239000006185 dispersion Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 7
- 230000009471 action Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 238000002604 ultrasonography Methods 0.000 description 3
- 241000894006 Bacteria Species 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- 239000003440 toxic substance Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- RCEAADKTGXTDOA-UHFFFAOYSA-N OS(O)(=O)=O.CCCCCCCCCCCC[Na] Chemical compound OS(O)(=O)=O.CCCCCCCCCCCC[Na] RCEAADKTGXTDOA-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 230000002421 anti-septic effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- -1 polyoxyethylene Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention provides a nano cerium oxide suspension for grinding and polishing glass and a preparation method thereof, wherein the nano cerium oxide suspension comprises the following components in percentage by mass: 10-55% of nano cerium oxide powder, 0.1-5% of surfactant, 0.1-10% of dispersant, 0.01-3% of preservative, 0.01-5% of pH regulator and the balance of deionized water. According to the invention, through the mutual matching of the components, the suspension dispersibility of the nano cerium oxide is good, and the layering condition of the powder and the liquid can be kept basically unchanged under long-time standing, so that the problems of scratching and corrosion on the surface of glass are avoided in the processing process, and the yield of the polished product is high.
Description
Technical Field
The invention relates to the technical field of chemical mechanical polishing, in particular to a nano cerium oxide suspension for glass grinding and polishing and a preparation method thereof.
Background
With the development of modern electronics industry, ultra-precision polishing technology is more and more used in modern electronics industry, and the ultra-precision polishing technology is not only used for planarizing different materials, but also for planarizing multiple layers of materials. Glass wafers are widely used only in the electronic industry, the surface processing precision and the surface integrity of the glass wafers are required to be higher and higher in the electronic industry at present, the glass surfaces are required not to be scratched or corroded in the processing process, and meanwhile the requirement of high polishing efficiency is met. The key of the ultra-precision polishing technology is the preparation of suspension polishing solution. The nano polishing material suspension, especially the cerium oxide nano material polishing solution with moderate hardness, rubs the surface of the glass on a polishing machine, so that the glass is smooth and beautiful. Is widely applied to the processing of manufacturing precision polished glass, mirror surfaces, lenses and artworks. The polishing performance of the nano cerium oxide suspension depends on the powder dispersion state, but the nano cerium oxide suspension has high specific gravity and small particle size, is influenced by acting forces such as electrostatic attraction, van der waals force, particle capillary force and the like in water, is not easy to be uniformly dispersed in the water, and is very easy to generate secondary agglomeration.
Disclosure of Invention
The invention aims to provide a nano cerium oxide suspension for glass grinding and polishing and a preparation method thereof, so as to solve the technical problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme:
a nanometer cerium oxide suspension for grinding and polishing glass comprises the following components in percentage by mass: 10-55% of nano cerium oxide powder, 0.1-5% of surfactant, 0.1-10% of dispersant, 0.01-3% of preservative, 0.01-5% of pH regulator and the balance of deionized water.
Further, the diameter of the nano cerium oxide powder is 20-1000 nm.
Further, the diameter of the nano cerium oxide powder is 100 nm.
Further, the surfactant is a compound of a nonionic surfactant and an anionic surfactant, and the surfactant comprises one or more of alkylphenol ethoxylates, fatty alcohol-polyoxyethylene ether, sodium dodecyl benzene sulfonate, sodium dodecyl sulfate and polyvinylpyrrolidone.
Further, the dispersing agent is a polymer dispersing agent, and the dispersing agent contains one or more of polyethylene glycol 200, polyethylene glycol 400, polyethylene glycol 600, polyethylene glycol 2000, sodium polyacrylate, polyacrylamide and polyvinyl alcohol.
Further, the preservative comprises one or more of benzoic acid, sodium benzoate, sorbic acid, sodium sorbate, methyl paraben, ethyl paraben, propyl paraben and butyl paraben.
Further, the pH regulator comprises one or more of ethanolamine, dimethylethanolamine, methyldiethanolamine, triethanolamine, tetramethylammonium hydroxide, sodium hydroxide and potassium hydroxide.
Further, the pH value is in the range of 9-12.
A method for preparing a nano cerium oxide suspension for grinding and polishing glass comprises the following steps:
step one, mixing a surfactant and a dispersant according to the mass percentage of the components, and dissolving the mixture in deionized water;
adding a preservative, and adjusting the pH value to be 9-12 by using a pH regulator;
and step three, adding the nano cerium oxide powder, and performing ultrasonic dispersion for 20min until the suspension is uniformly dispersed to obtain the required nano cerium oxide suspension.
The invention has the beneficial effects that:
the invention is used for grinding and polishing the surface of glass, and can generate chemical action with the glass of a silicon substrate by utilizing the oxidability of the nano cerium oxide, thereby achieving the effect of synergistic action of the chemical action and the mechanical action and meeting the requirement of high polishing efficiency. The surfactant and the dispersant are added in the invention, which can prevent the suspension from agglomerating and settling and ensure that the prepared suspension is in a homogeneous stable dispersion state; the addition of the preservative can prevent the suspension from generating bacteria and influence the high polishing performance of the suspension; the pH regulator is added to better disperse the nano cerium oxide, so that the suspension is in a homogeneous stable dispersion state. By adopting the components to be matched with each other, the nano cerium oxide has good suspension dispersibility, and the layering condition of powder and liquid can be kept basically unchanged under long-time standing, so that the problems of scratching and corroding the surface of glass are avoided in the processing process, the glass and a processing machine table are not polluted, and the yield of polished products is high.
In addition, compared with the prior art, the preparation method of the nano cerium oxide suspension for glass grinding and polishing has the following advantages and effects:
1) the price of the required raw materials is low, and chemicals used in the preparation process of the nano cerium oxide suspension are low in price and easy to obtain, so that the preparation cost is greatly reduced;
2) the process flow is simple, the prepared suspension has good dispersion effect, the polishing efficiency is high in the using process, and the glass surface cannot be scratched;
3) the preparation process needs less energy consumption, does not generate toxic substances, meets the requirements of green production safety and large-scale quantitative production.
Detailed Description
A nanometer cerium oxide suspension for grinding and polishing glass comprises the following components in percentage by mass: 10-55% of nano cerium oxide powder, 0.1-5% of surfactant, 0.1-10% of dispersant, 0.01-3% of preservative, 0.01-5% of pH regulator and the balance of deionized water. The diameter of the nano cerium oxide powder is 20-1000 nm, wherein the diameter of the preferable nano cerium oxide powder is 100 nm. The surfactant is a compound of a nonionic surfactant and an anionic surfactant, and comprises one or more of alkylphenol ethoxylates, fatty alcohol-polyoxyethylene ether, sodium dodecyl benzene sulfonate, sodium dodecyl sulfate and polyvinylpyrrolidone. The dispersing agent is a polymer dispersing agent, and comprises one or more of polyethylene glycol 200, polyethylene glycol 400, polyethylene glycol 600, polyethylene glycol 2000, sodium polyacrylate, polyacrylamide and polyvinyl alcohol. Wherein the antiseptic comprises one or more of benzoic acid, sodium benzoate, sorbic acid, sodium sorbate, methyl paraben, ethyl paraben, propyl paraben, and butyl paraben. Wherein the pH regulator comprises one or more of ethanolamine, dimethylethanolamine, methyldiethanolamine, triethanolamine, tetramethylammonium hydroxide, sodium hydroxide and potassium hydroxide. The pH of the suspension is in the range of 9 to 12.
The preparation method of the nano cerium oxide suspension comprises the following steps:
step one, mixing a surfactant and a dispersant according to the mass percentage of the components, and dissolving the mixture in deionized water;
adding a preservative, and adjusting the pH value to be 9-12 by using a pH regulator;
adding nano cerium oxide powder, and performing ultrasonic dispersion for 20min until the suspension is uniformly dispersed to obtain the required nano cerium oxide suspension
The present invention will be further described with reference to the following examples, but the embodiments of the present invention are not limited thereto.
Example 1:
mixing a surfactant and a dispersant according to the mass percentage of the components, wherein the surfactant is 0.5 percent of sodium dodecyl benzene sulfonate and 0.5 percent of alkylphenol polyoxyethylene, and the dispersant is polyethylene glycol 4003 percent, and dissolving the mixture in deionized water;
step two, adding a preservative into the step one, wherein the preservative is 0.1% of sodium benzoate, then adding a pH regulator, the pH regulator is 1% of triethanolamine, and regulating the pH value to 10;
and step three, adding 20% of nano cerium oxide powder into the step two, wherein the diameter of the nano cerium oxide powder is 100nm, and dispersing the obtained suspension in ultrasound for 20min until the suspension is uniformly dispersed to obtain the required nano cerium oxide suspension.
The mixing modes in the steps are all mixed by adopting a stirrer, so that the components are fully mixed.
The nano cerium oxide suspension is produced by actual polishing, the surface of the polished glass is not damaged, the polishing efficiency is high, and the suspension is in a homogeneous stable dispersion state.
Example 2:
mixing a surfactant and a dispersant according to the mass percentage of the components, wherein the surfactant is 0.3 percent of lauryl sodium sulfate and 2 percent of polyvinylpyrrolidone, and the dispersant is 3 percent of polyvinyl alcohol, and dissolving the mixture in deionized water;
step two, adding a preservative into the step one, wherein the preservative is 0.5 percent of sodium sorbate, then adding a pH regulator which is 0.01 percent of sodium hydroxide, and regulating the pH value to be 11;
and step three, adding 10% of nano cerium oxide powder with the diameter of 50nm into the mixture obtained in the step two, and dispersing the obtained suspension in ultrasound for 20min until the suspension is uniformly dispersed to obtain the required nano cerium oxide suspension.
The mixing modes in the steps are all mixed by adopting a stirrer, so that the components are fully mixed.
The nano cerium oxide suspension is produced by actual polishing, the surface of the polished glass is not damaged, the polishing efficiency is high, and the suspension is in a homogeneous stable dispersion state.
Example 3:
mixing a surfactant and a dispersing agent according to the mass percentage of the components, wherein the surfactant is 0.3 percent of fatty alcohol-polyoxyethylene ether and 0.5 percent of alkylphenol polyoxyethylene ether, and the dispersing agent is 3 percent of polyacrylamide, and dissolving the surfactant and the dispersing agent in deionized water;
step two, adding a preservative into the step one, wherein the preservative is 0.1% of methyl p-hydroxybenzoate, then adding a pH regulator which is 0.5% of ethanolamine, and regulating the pH value to 9.5;
and step three, adding 50% of nano cerium oxide powder with the diameter of 130nm into the step two, and dispersing the obtained suspension in ultrasound for 20min until the suspension is uniformly dispersed to obtain the required nano cerium oxide suspension.
The mixing modes in the steps are all mixed by adopting a stirrer, so that the components are fully mixed.
The nano cerium oxide suspension is produced by actual polishing, the surface of the polished glass is not damaged, the polishing efficiency is high, and the suspension is in a homogeneous stable dispersion state.
In conclusion, the nano cerium oxide polishing solution is used for grinding and polishing the surface of glass, can generate chemical action with glass of a silicon substrate by utilizing the oxidizability of the nano cerium oxide, achieves the effect of synergistic action of the chemical action and the mechanical action, and meets the requirement of high polishing efficiency. The surfactant and the dispersant are added in the invention, which can prevent the suspension from agglomerating and settling and ensure that the prepared suspension is in a homogeneous stable dispersion state; the addition of the preservative can prevent the suspension from generating bacteria and influence the high polishing performance of the suspension; the pH regulator is added to better disperse the nano cerium oxide, so that the suspension is in a homogeneous stable dispersion state.
By adopting the components to be matched with each other, the nano cerium oxide has good suspension dispersibility, and the layering condition of powder and liquid can be kept basically unchanged under long-time standing, so that the problems of scratching and corroding the surface of glass are avoided in the processing process, the glass and a processing machine table are not polluted, and the yield of polished products is high.
In addition, compared with the prior art, the preparation method of the nano cerium oxide suspension for glass grinding and polishing has the following advantages and effects:
1) the price of the required raw materials is low, and chemicals used in the preparation process of the nano cerium oxide suspension are low in price and easy to obtain, so that the preparation cost is greatly reduced;
2) the process flow is simple, the prepared suspension has good dispersion effect, the polishing efficiency is high in the using process, and the glass surface cannot be scratched;
3) the preparation process needs less energy consumption, does not generate toxic substances, meets the requirements of green production safety and large-scale quantitative production.
The above description is not intended to limit the technical scope of the present invention, and any modification, equivalent change and modification made to the above embodiments according to the technical spirit of the present invention still fall within the technical scope of the present invention.
Claims (9)
1. The nano cerium oxide suspension for grinding and polishing glass is characterized by comprising the following components in percentage by mass: 10-55% of nano cerium oxide powder, 0.1-5% of surfactant, 0.1-10% of dispersant, 0.01-3% of preservative, 0.01-5% of pH regulator and the balance of deionized water.
2. The nano cerium oxide suspension for grinding and polishing glass according to claim 1, wherein: the diameter of the nano cerium oxide powder is 20-1000 nanometers.
3. The nano cerium oxide suspension for grinding and polishing glass according to claim 2, wherein: the diameter of the nano cerium oxide powder is 100 nanometers.
4. The nano cerium oxide suspension for grinding and polishing glass according to claim 1, wherein: the surfactant is a compound of a nonionic surfactant and an anionic surfactant, and comprises one or more of alkylphenol ethoxylates, fatty alcohol-polyoxyethylene ether, sodium dodecyl benzene sulfonate, sodium dodecyl sulfate and polyvinylpyrrolidone.
5. The nano cerium oxide suspension for grinding and polishing glass according to claim 1, wherein: the dispersing agent is a high-molecular dispersing agent and comprises one or more of polyethylene glycol 200, polyethylene glycol 400, polyethylene glycol 600, polyethylene glycol 2000, sodium polyacrylate, polyacrylamide and polyvinyl alcohol.
6. The nano cerium oxide suspension for grinding and polishing glass according to claim 1, wherein: the preservative comprises one or more of benzoic acid, sodium benzoate, sorbic acid, sodium sorbate, methyl paraben, ethyl paraben, propyl paraben and butyl paraben.
7. The nano cerium oxide suspension for grinding and polishing glass according to claim 1, wherein: the pH regulator comprises one or more of ethanolamine, dimethylethanolamine, methyldiethanolamine, triethanolamine, tetramethylammonium hydroxide, sodium hydroxide and potassium hydroxide.
8. The nano cerium oxide suspension for grinding and polishing glass according to claim 1, wherein: the pH value is in the range of 9-12.
9. The method for preparing the nano cerium oxide suspension for grinding and polishing glass according to claims 1 to 8, wherein the method comprises the following steps:
step one, mixing a surfactant and a dispersant according to the mass percentage of the components, and dissolving the mixture in deionized water;
adding a preservative, and adjusting the pH value to be 9-12 by using a pH regulator;
and step three, adding the nano cerium oxide powder, and performing ultrasonic dispersion for 20min until the suspension is uniformly dispersed to obtain the required nano cerium oxide suspension.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210025917.1A CN114231183A (en) | 2022-01-11 | 2022-01-11 | Nano cerium oxide suspension for grinding and polishing glass and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210025917.1A CN114231183A (en) | 2022-01-11 | 2022-01-11 | Nano cerium oxide suspension for grinding and polishing glass and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114231183A true CN114231183A (en) | 2022-03-25 |
Family
ID=80746123
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210025917.1A Pending CN114231183A (en) | 2022-01-11 | 2022-01-11 | Nano cerium oxide suspension for grinding and polishing glass and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114231183A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116355537A (en) * | 2023-04-04 | 2023-06-30 | 蘅东光通讯技术(深圳)股份有限公司 | Optical fiber polishing grinding liquid, preparation method and optical fiber polishing grinding process |
| CN118256159A (en) * | 2024-05-30 | 2024-06-28 | 中国科学院长春光学精密机械与物理研究所 | Polishing solution for polishing fused silica glass and preparation method and application thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108841328A (en) * | 2018-05-28 | 2018-11-20 | 广东富行洗涤剂科技有限公司 | A kind of 3D glass clears off liquid |
| CN109929460A (en) * | 2017-12-19 | 2019-06-25 | 蓝思科技（长沙）有限公司 | A kind of glass polishing water base cerium oxide polishing slurry and preparation method thereof |
| CN110041831A (en) * | 2019-05-23 | 2019-07-23 | 北京利研科技有限公司 | A kind of nano-cerium oxide polishing fluid and preparation method thereof |
| CN110358453A (en) * | 2018-04-10 | 2019-10-22 | 蓝思科技（长沙）有限公司 | A kind of glass polishing nano-cerium oxide polishing fluid and preparation method thereof |
-
2022
- 2022-01-11 CN CN202210025917.1A patent/CN114231183A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109929460A (en) * | 2017-12-19 | 2019-06-25 | 蓝思科技（长沙）有限公司 | A kind of glass polishing water base cerium oxide polishing slurry and preparation method thereof |
| CN110358453A (en) * | 2018-04-10 | 2019-10-22 | 蓝思科技（长沙）有限公司 | A kind of glass polishing nano-cerium oxide polishing fluid and preparation method thereof |
| CN108841328A (en) * | 2018-05-28 | 2018-11-20 | 广东富行洗涤剂科技有限公司 | A kind of 3D glass clears off liquid |
| CN110041831A (en) * | 2019-05-23 | 2019-07-23 | 北京利研科技有限公司 | A kind of nano-cerium oxide polishing fluid and preparation method thereof |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116355537A (en) * | 2023-04-04 | 2023-06-30 | 蘅东光通讯技术(深圳)股份有限公司 | Optical fiber polishing grinding liquid, preparation method and optical fiber polishing grinding process |
| CN118256159A (en) * | 2024-05-30 | 2024-06-28 | 中国科学院长春光学精密机械与物理研究所 | Polishing solution for polishing fused silica glass and preparation method and application thereof |
| CN118256159B (en) * | 2024-05-30 | 2024-09-20 | 中国科学院长春光学精密机械与物理研究所 | Polishing solution for polishing fused silica glass and preparation method and application thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN114231183A (en) | Nano cerium oxide suspension for grinding and polishing glass and preparation method thereof | |
| CN100535070C (en) | Diamond polishing paste in high purity, and preparation method | |
| CN103030151B (en) | Neutral large-particle-size high-concentration and high-purity silica solution, and preparation and use of the same | |
| CN102010669B (en) | Method for preparing CMP (Chemically Mechanical Polishing) solution for sapphire substrate material | |
| KR100561994B1 (en) | Aqueous Dispersion for Chemical Mechanical Polishing | |
| JP3437900B2 (en) | Abrasive | |
| KR100807165B1 (en) | Use of 2,3-dihydroxynaphthalene-6-sulfonic acid salts as dispersants | |
| CN101368070A (en) | Nano-silicon dioxide abrasive material polishing solution for processing crystallizing glass | |
| CN1063205C (en) | Nanometer silicon dioxide polishing agent and its preparing method | |
| CN111040640A (en) | Composite abrasive chemical mechanical polishing slurry for silicon wafer substrate and preparation method thereof | |
| CN101307211A (en) | Method for preparing nanometer silicon dioxide abradant polishing solution | |
| CN114479676A (en) | Low-abrasive-content and weakly acidic polishing solution for ultraprecise processing of optical glass and preparation method thereof | |
| CN1858132A (en) | Polishing liquid for grinding and polishing micro crystal glass | |
| Wu et al. | Fused silica with sub‐angstrom roughness and minimal surface defects polished by ultrafine nano‐CeO2 | |
| JP2016524326A (en) | Chemical mechanical polishing composition comprising N, N, N ', N'-tetrakis- (2-hydroxypropyl) -ethylenediamine or methanesulfonic acid | |
| CN103880296B (en) | A kind of preparation method of soft material matter optical glass zirconio polishing fluid | |
| CN112010318A (en) | Preparation method of nano water-based silica sol for semiconductor polishing | |
| CN110790236A (en) | Method for coating nano ammonium perchlorate by graphene wet process | |
| CN101121520A (en) | Acidic silicon dioxide sol and its preparation method and use | |
| CN101050338A (en) | Polishing fluid of Nano silicon dioxide grinding material in use for processing microcrystalline glass, and preparation method | |
| CN104017501B (en) | A kind of ultrasonic atomizatio type polishing fluid being applicable to TFT-LCD glass substrate | |
| CN114163931A (en) | Aluminum alloy liquid fine polishing wax and preparation method thereof | |
| CN108300330A (en) | A kind of ceramic wafers surface polishing slurries and preparation method thereof | |
| CN116948600A (en) | High-suspension grinding fluid suitable for large-size silicon wafer, and preparation method and application thereof | |
| CN115785822A (en) | Polishing solution and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20220325 |
|
| RJ01 | Rejection of invention patent application after publication |