CN114105257A - Wastewater treatment method based on high-voltage plasma discharge and control system thereof - Google Patents
Wastewater treatment method based on high-voltage plasma discharge and control system thereof Download PDFInfo
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- 238000004065 wastewater treatment Methods 0.000 title claims abstract description 59
- 239000002351 wastewater Substances 0.000 claims abstract description 80
- 238000006243 chemical reaction Methods 0.000 claims abstract description 76
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 66
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- 238000005265 energy consumption Methods 0.000 abstract description 7
- 239000000126 substance Substances 0.000 description 10
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- 150000002500 ions Chemical class 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
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- 238000010170 biological method Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
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- 239000003574 free electron Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010842 industrial wastewater Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
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- 238000002360 preparation method Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
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Abstract
The invention provides a high-pressure plasma discharge-based wastewater treatment method and a control system thereof, and relates to the technical field of wastewater treatment, wherein the method comprises the following steps: acquiring a first parameter in the reaction cavity, wherein the first parameter comprises the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet; determining a target strategy matched with the first parameter according to the first parameter; and performing target treatment on the wastewater to be treated based on the target high-voltage discharge plasma generated under the action of a target strategy. The invention not only realizes the purpose of treating wastewater with various concentrations and various pollution components, has simple structure, easy realization and high safety, but also can realize the purposes of short-circuit protection, emergency switch, flow control of wastewater to be treated and voltage control of a high-voltage power supply, thereby greatly improving the treatment efficiency of the wastewater, reducing the energy consumption and prolonging the service life of the wastewater treatment equipment based on high-voltage plasma discharge.
Description
Technical Field
The invention relates to the technical field of waste gas treatment, and relates to but is not limited to a high-pressure plasma discharge-based wastewater treatment method and a control system thereof.
Background
With the rapid development of social economy, the production technology level of various industries is gradually improved, and the problem of environmental pollution is brought, wherein the problem of wastewater and odor pollution is more and more concerned by people.
In the traditional technology, a plasma discharge reactor is arranged in a gas collecting hood of a power supply system, high-voltage electrodes of the plasma discharge reactor are used for carrying out plasma discharge on oxygen in the gas collecting hood to form ozone, and finally the ozone is used for treating wastewater.
However, the wastewater treatment scheme adopted in the conventional technology has high energy consumption, high cost and inconvenient later maintenance, resulting in low wastewater treatment efficiency.
Disclosure of Invention
The invention aims to provide a wastewater treatment method based on high-pressure plasma discharge and a control system thereof aiming at the defects of a wastewater treatment device in the prior art in the wastewater treatment process, so as to solve the problem of low wastewater treatment efficiency caused by high energy consumption, high cost and inconvenient later maintenance of the wastewater treatment device in the prior art.
In order to achieve the above purpose, the embodiment of the present invention adopts the following technical solutions:
in a first aspect, the present invention provides a high-pressure plasma discharge-based wastewater treatment method applied to a high-pressure plasma discharge-based wastewater treatment facility, the method comprising:
acquiring a first parameter in a reaction cavity; wherein the first parameter comprises the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet;
determining a target strategy matched with the first parameter according to the first parameter;
and performing target treatment on the wastewater to be treated based on the target high-voltage discharge plasma generated under the action of the target strategy.
Optionally, the determining, according to the first parameter, a target policy matched with the first parameter includes:
judging whether the voltage polarities between the adjacent high-voltage electrodes are the same or not based on the first parameter;
when the voltage polarities between the adjacent high-voltage electrodes are determined to be the same, determining a target adjustment strategy comprising adjusting the connection relation between the high-voltage electrodes and the corresponding high-voltage power supply;
and when the voltage polarities between the adjacent high-voltage electrodes are different, determining a target strategy which comprises keeping the connection relation between the current high-voltage electrode and the corresponding high-voltage power supply unchanged.
Optionally, the determining, according to the first parameter, a target policy matched with the first parameter includes:
acquiring a first size relation between the current flow of the wastewater to be treated entering the reaction cavity and a preset reference flow according to the first parameter;
and determining a target strategy corresponding to the first size relation.
Optionally, the determining the target policy corresponding to the first size relationship includes:
when the first size relationship comprises that the current flow is larger than the preset reference flow, determining a target adjustment strategy comprising reducing the current flow;
and when the first size relationship comprises that the current flow is smaller than the preset reference flow, determining a target adjustment strategy comprising increasing the current flow.
Optionally, the determining, according to the first parameter, a target policy matched with the first parameter includes:
judging a second size relation between the current liquid concentration and a preset liquid concentration according to the first parameter;
and determining a target strategy corresponding to the second size relation.
Optionally, the determining the target policy corresponding to the second size relationship includes:
when the second size relationship comprises that the current concentration is greater than the preset liquid concentration, determining a target adjustment strategy for performing target processing on the liquid corresponding to the current concentration again;
and when the second magnitude relation comprises that the current concentration is less than or equal to the preset liquid concentration, determining a target strategy which comprises that the target treatment is not carried out on the liquid corresponding to the current concentration again.
Optionally, the method further includes:
and executing an operation instruction for closing the equipment when the first parameter in the reaction cavity is not obtained within the preset time.
In a second aspect, the invention also discloses a wastewater treatment control system based on high-voltage plasma discharge, comprising: the device comprises a reaction cavity, a high-voltage power supply, an insulating layer, a water inlet, a water tank, a pump, a water passing plate, a high-voltage electrode, a water outlet and a controller;
wherein, the insulating layer set up in the side of reaction chamber, high voltage power supply sets up the outside of reaction chamber, the water inlet with the delivery port sets up respectively on the water tank, the bottom of reaction chamber is connected the one end of water tank, the other end of water tank with the one end of pump is connected, the other end of pump with cross the water board and connect, cross the water board with high-voltage electrode all sets up the inside of reaction chamber, the controller sets up on the reaction chamber.
In a third aspect, the invention also discloses a wastewater treatment device based on high-pressure plasma discharge, which comprises: the device comprises an acquisition module, a determination module and a processing module, wherein:
the acquisition module is used for acquiring a first parameter in the reaction cavity; wherein the first parameter comprises the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet;
the determining module is used for determining a target strategy matched with the first parameter according to the first parameter;
and the treatment module is used for performing target treatment on the wastewater to be treated based on the target high-voltage discharge plasma generated under the action of the target strategy.
In a fourth aspect, the present invention also discloses an exhaust gas treatment control device based on high-voltage plasma discharge, the control device comprising: a processor and a memory, the memory being configured to store instructions, the processor being configured to execute the instructions stored in the memory to cause the apparatus to perform the method for high pressure plasma discharge based wastewater treatment according to the first aspect.
The invention has the beneficial effects that: the invention relates to a high-pressure plasma discharge-based wastewater treatment method and a control system thereof, wherein the method is applied to high-pressure plasma discharge-based wastewater treatment equipment and comprises the following steps: acquiring a first parameter in a reaction cavity; wherein the first parameter comprises the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet; determining a target strategy matched with the first parameter according to the first parameter; and performing target treatment on the wastewater to be treated based on the target high-voltage discharge plasma generated under the action of the target strategy. That is to say, when a target strategy matched with a first parameter in the reaction cavity is determined, the wastewater to be treated entering the reaction cavity is treated according to the high-voltage discharge plasma generated under the action of the high-voltage electrode and the high-voltage power supply, so that the purpose of treating wastewater with various concentrations and various pollution components is realized, the structure is simple and easy to realize, the safety is high, and the purposes of short-circuit protection, emergency switching, flow control of the wastewater to be treated and voltage control of the high-voltage power supply can be realized, so that the wastewater treatment efficiency is greatly improved, the energy consumption is reduced, and the service life of the wastewater treatment equipment based on high-voltage plasma discharge is prolonged.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
FIG. 1 is a schematic flow chart of a wastewater treatment method based on high-pressure plasma discharge according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a wastewater treatment control system based on high-pressure plasma discharge according to another embodiment of the present invention;
FIG. 3 is a schematic view of a wastewater treatment apparatus based on high-pressure plasma discharge according to another embodiment of the present invention;
fig. 4 is a schematic diagram of another exhaust gas treatment control device based on high-pressure plasma discharge according to another embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or the orientations or positional relationships that the products of the present invention are conventionally placed in use, and are only used for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.
Furthermore, the terms "horizontal", "vertical" and the like do not imply that the components are required to be absolutely horizontal or pendant, but rather may be slightly inclined. For example, "horizontal" merely means that the direction is more horizontal than "vertical" and does not mean that the structure must be perfectly horizontal, but may be slightly inclined.
In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The terms to which the present invention relates will be explained first:
plasma, a fourth state of matter different from solid, liquid and gas. A substance is composed of molecules, which are composed of atoms, which are composed of a positively charged nucleus and negatively charged electrons surrounding it. When heated to a sufficiently high temperature or for other reasons, the outer electrons become free electrons free of the nuclei, leaving the nuclei, a process known as "ionization". At this time, the substance becomes a uniform mass of "paste" consisting of positively charged nuclei and negatively charged electrons, so it is called ion paste by chance, and the total amount of positive and negative charges in these ion pastes is equal, so it is nearly electrically neutral, so it is called plasma; the gas is ionized gas-like substance consisting of positive and negative ions generated after atoms and atomic groups are ionized after partial electrons are deprived, and the movement of the macroscopic electroneutral ionized gas with the dimension larger than the Debye length is mainly governed by electromagnetic force and shows remarkable collective behavior. It is widely present in the universe and is often considered to be the fourth state in which substances exist in addition to solids, liquids and gases.
Wastewater treatment: the method is to treat the wastewater by physical, chemical and biological methods, purify the wastewater and reduce pollution, so as to achieve the purposes of wastewater recovery and reuse and fully utilize water resources.
Fig. 1 is a schematic flow chart of a wastewater treatment method based on high-pressure plasma discharge according to an embodiment of the present invention, fig. 2 is a schematic structural view of a wastewater treatment control system based on high-pressure plasma discharge according to another embodiment of the present invention, fig. 3 is a schematic view of a wastewater treatment device based on high-pressure plasma discharge according to yet another embodiment of the present invention, and fig. 4 is a schematic view of an exhaust gas treatment control device based on high-pressure plasma discharge according to yet another embodiment of the present invention. The method for treating wastewater by high-pressure plasma discharge according to the embodiment of the present invention will be described in detail with reference to fig. 1 to 4.
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention.
It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
An embodiment of the present invention provides a wastewater treatment method based on high-pressure plasma discharge, which is applied to a wastewater treatment device based on high-pressure plasma discharge, and as shown in fig. 1, a schematic flow chart of the wastewater treatment method based on high-pressure plasma discharge according to an embodiment of the present invention is provided, and the steps included in the method are specifically described below with reference to fig. 1.
Step S101: a first parameter is obtained within the reaction chamber.
The first parameter comprises the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet, and the current liquid concentration comprises the concentration of liquid obtained after the wastewater to be treated is treated.
In the embodiment of the invention, the wastewater to be treated can comprise wastewater with various concentrations and various pollutant components. For example, the wastewater to be treated can be a general term of water and runoff rainwater discharged in the process of activities of residents, including domestic sewage, industrial wastewater and other useless water such as a primary rainwater runoff inflow drainage pipe canal, and generally refers to water which can not be recycled after certain technical treatment or can not reach a certain standard after primary pollution in the preparation of pure water.
For example, sensors may be provided on the high-voltage plasma discharge-based wastewater treatment device, such as a reaction chamber, which may be used to detect the current voltage of the high-voltage electrode, the current flow rate of the wastewater to be treated, and/or the current liquid concentration at the water outlet in real time.
Step S102: and determining a target strategy matched with the first parameter according to the first parameter.
For example, a plurality of layers can be arranged in the reaction chamber of the high-voltage plasma discharge-based wastewater treatment device, a plurality of high-voltage electrodes can be transversely arranged on each layer, each layer can be respectively connected with a high-voltage power supply, and the voltage polarity of the adjacent high-voltage electrodes in the adjacent layers is different between the adjacent high-voltage electrodes in each layer. For example, the first high voltage electrode of the first layer is a high voltage positive electrode, the second high voltage electrode of the first layer is a high voltage negative electrode, the first high voltage electrode of the second layer is a high voltage negative electrode, … …, and so on.
Specifically, the controller of the high-voltage plasma discharge-based wastewater treatment equipment can acquire the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet in real time through a sensor, and judge whether to start short-circuit protection, adjust the voltage of the high-voltage power supply and/or adjust the flow of the wastewater to be treated entering the reaction chamber at the moment according to the current voltage, the current flow and/or the current liquid concentration, the voltage polarity requirement of the preset high-voltage electrode, the preset reference flow and/or the preset liquid concentration. The voltage polarity requirements of the high voltage electrodes can include that the voltage polarities of the adjacent high voltage electrodes in each layer in the reaction cavity are different from each other.
In the actual process, step S102 may include:
step S1021: and judging whether the voltage polarities between the adjacent high-voltage electrodes are the same or not based on the first parameter.
Specifically, the controller may obtain two voltages of adjacent high voltage electrodes in the reaction chamber based on the first parameter, and determine whether the polarities of the adjacent high voltage electrodes are the same by analyzing the voltage polarities of the two voltages; the adjacent high voltage electrodes can comprise two adjacent high voltage electrodes of a certain layer in the reaction cavity and/or adjacent high voltage electrodes of adjacent layers.
Step S1022: and when the voltage polarities between the adjacent high-voltage electrodes are determined to be the same, determining a target adjustment strategy comprising adjusting the connection relation between the high-voltage electrodes and the corresponding high-voltage power supply.
Specifically, when the controller determines that the voltage polarities of the adjacent high-voltage electrodes are the same according to the two voltages of the adjacent high-voltage electrodes in the reaction cavity, for example, both the high-voltage electrodes are high-voltage anodes or both the high-voltage cathodes, it may be considered that the device is short-circuited at this time, and a short-circuit protection measure needs to be started, that is, a target adjustment strategy including adjusting the connection relationship between the high-voltage electrodes and the corresponding high-voltage power supply is determined, so that the target adjustment strategy including adjusting the connection relationship between the high-voltage electrodes and the corresponding high-voltage power supply is output, and it is ensured that the voltage polarities of the adjacent high-voltage electrodes are opposite.
Step S1023: and when the voltage polarities between the adjacent high-voltage electrodes are different, determining a target strategy which comprises keeping the connection relation between the current high-voltage electrode and the corresponding high-voltage power supply unchanged.
Specifically, when the controller determines that the voltage polarities between the adjacent high-voltage electrodes are different according to the two voltages of the adjacent high-voltage electrodes in the reaction cavity, the device is considered to have no short circuit abnormality at the moment, and a short circuit protection measure is not required to be started, namely, a target strategy for keeping the connection relation between the current high-voltage electrode and the corresponding high-voltage power supply unchanged is determined, so that the purpose of wastewater treatment on the premise that the voltage polarities between the adjacent high-voltage electrodes are opposite is achieved.
In the actual processing procedure, step S102 may also include:
step S21: and acquiring a first size relation between the current flow of the wastewater to be treated entering the reaction cavity and a preset reference flow according to the first parameter.
Specifically, the controller may obtain a current flow rate of the wastewater to be treated entering the reaction chamber according to the first parameter, and compare the current flow rate with a preset reference flow rate to determine whether the current flow rate meets a preset wastewater treatment capacity requirement. Wherein the preset reference flow rate can be used to characterize the amount of wastewater entering the reaction chamber sufficient to be fully treated.
Step S22: and determining a target strategy corresponding to the first size relation.
Wherein, the step S22 may include:
step S221: and when the first size relationship comprises that the current flow is larger than the preset reference flow, determining a target adjustment strategy comprising reducing the current flow.
Specifically, when the controller determines that the current flow of the wastewater to be treated entering the reaction chamber is greater than the preset reference flow, the current flow of the wastewater to be treated entering the reaction chamber can be considered to be too large, and in order to ensure that the wastewater to be treated entering the reaction chamber is treated, the flow of the wastewater to be treated entering the reaction chamber can be reduced, that is, a target adjustment strategy for reducing the current flow is determined, so that the flow of the wastewater to be treated entering the reaction chamber is consistent with the preset reference flow.
Step S222: and when the first size relationship comprises that the current flow is smaller than the preset reference flow, determining a target adjustment strategy comprising increasing the current flow.
Specifically, when the controller determines that the current flow of the wastewater to be treated entering the reaction chamber is smaller than the preset reference flow, the current flow of the wastewater to be treated entering the reaction chamber can be considered to be too small, and in order to make full use of the high-voltage discharge plasma for treating the wastewater in the reaction chamber, the flow of the wastewater to be treated entering the reaction chamber can be increased, that is, a target adjustment strategy including increasing the current flow is determined, so that the flow of the wastewater to be treated entering the reaction chamber is consistent with the preset reference flow.
In the actual processing procedure, step S102 may also include:
step S31: and judging a second size relation between the current liquid concentration and a preset liquid concentration according to the first parameter.
Specifically, the controller can obtain the current liquid concentration at the water outlet according to the first parameter, and compare the current liquid concentration with a preset liquid concentration to determine whether the current liquid concentration meets the preset wastewater treatment efficiency requirement. Wherein the preset liquid concentration can be used for representing that the component information contained in the treated liquid is enough to indicate that the liquid is harmless liquid.
Step S32: and determining a target strategy corresponding to the second size relation.
Wherein, the step S32 may include:
step S321: and when the second size relationship comprises that the current concentration is greater than the preset liquid concentration, determining a target adjustment strategy for performing target processing on the liquid corresponding to the current concentration again.
Specifically, when the controller determines that the current liquid concentration at the water outlet is greater than the preset liquid concentration, the current treated liquid still contains harmful substances, and in order to completely remove the harmful substances in the wastewater to be treated, the treated liquid can enter the reaction cavity through the pump to be treated, that is, a target adjustment strategy for performing target treatment on the liquid corresponding to the current concentration again is determined, so that the concentration of the treated liquid is lower than the preset liquid concentration.
Step S322: and when the second magnitude relation comprises that the current concentration is less than or equal to the preset liquid concentration, determining a target strategy which comprises that the target treatment is not carried out on the liquid corresponding to the current concentration again.
Specifically, when the controller determines that the current liquid concentration at the water outlet is less than or equal to the preset liquid concentration, it may be considered that no harmful substance is present in the processed liquid, and the processed liquid may not be processed again, that is, a target strategy including that the liquid corresponding to the current concentration is not processed again is determined, so as to obtain a harmless liquid meeting the preset wastewater treatment efficiency requirement.
Step S103: and performing target treatment on the wastewater to be treated based on the target high-voltage discharge plasma generated under the action of the target strategy.
Wherein the target treatment may include performing harmful substance removal treatment on the wastewater to be treated using the target high-voltage discharge plasma or performing harmful substance removal treatment again on the treated liquid using the target high-voltage discharge plasma.
Specifically, a target high-voltage discharge plasma is generated under the action of the target strategy, for example, the flow rate of the wastewater to be treated entering the reaction chamber is increased or the treated liquid enters the reaction chamber through a pump, and then the wastewater to be treated after the flow rate is adjusted is treated or the treated liquid is treated again by using the target high-voltage discharge plasma.
Optionally, the method further includes:
and executing an operation instruction for closing the equipment when the first parameter in the reaction cavity is not obtained within the preset time.
Specifically, when the controller does not acquire the first parameter in the reaction chamber within the preset time period, it may be considered that there is no processable wastewater temporarily or the wastewater to be processed is processed completely, and at this time, the device shutdown operation may be started, that is, the operation instruction for shutting down the device is executed, so as to protect the device and prolong the service life of the device.
In an actual processing process, when the current voltage of the high-voltage power supply obtained by the controller reaches a preset voltage value and/or the current of the high-voltage power supply reaches a preset current value, an emergency switch may be started, for example, the switch of the high-voltage power supply is turned off, so as to protect the equipment and prolong the service life of the equipment. The preset voltage value can be used for representing that the voltage of the high-voltage power supply is enough to damage the harmless components in the equipment or the liquid, and the preset current value can be used for representing that the current of the high-voltage power supply is enough to damage the harmless components in the equipment or the liquid.
In the embodiment of the invention, when a controller in the high-voltage plasma discharge-based wastewater treatment equipment determines that the current flow of wastewater to be treated entering a reaction cavity is not equal to a preset reference flow, the voltage polarity between adjacent high-voltage electrodes is different and/or the current liquid concentration at a water outlet is greater than the preset liquid concentration, a target adjustment strategy for increasing the current flow, a target adjustment strategy for reducing the current flow, a target adjustment strategy for performing target treatment on the liquid corresponding to the current concentration again and/or a target adjustment strategy for adjusting the connection relationship between the high-voltage electrodes and corresponding high-voltage power supplies are determined, so that the target treatment is performed on the wastewater to be treated by the target high-voltage discharge plasma generated under the action of the target strategy, and the aim of treating the wastewater with various concentrations and various pollution components is fulfilled, simple structure easily realizes, and the security is high, but also can realize short-circuit protection, emergency switch, control pending flow of processing waste water, the purpose of control high voltage power supply's voltage current to improve the treatment effeciency of waste water greatly, reduced the energy consumption, improved the life based on the waste water treatment equipment that high-pressure plasma discharges.
In an embodiment of the present invention, a high-pressure plasma discharge-based wastewater treatment method and a control system thereof are provided, where the method is applied to a high-pressure plasma discharge-based wastewater treatment apparatus, and the method includes: acquiring a first parameter in a reaction cavity; wherein the first parameter comprises the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet; determining a target strategy matched with the first parameter according to the first parameter; and performing target treatment on the wastewater to be treated based on the target high-voltage discharge plasma generated under the action of the target strategy. That is to say, when a target strategy matched with a first parameter in the reaction cavity is determined, the wastewater to be treated entering the reaction cavity is treated according to the high-voltage discharge plasma generated under the action of the high-voltage electrode and the high-voltage power supply, so that the purpose of treating wastewater with various concentrations and various pollution components is realized, the structure is simple and easy to realize, the safety is high, and the purposes of short-circuit protection, emergency switching, control of the flow of the wastewater to be treated and control of the voltage current of the high-voltage power supply can be realized, so that the wastewater treatment efficiency is greatly improved, the energy consumption is reduced, and the service life of the wastewater treatment equipment based on high-voltage plasma discharge is prolonged.
In another possible embodiment, the present invention further provides a high-pressure plasma discharge-based wastewater treatment control system, as shown in fig. 2, comprising: the method comprises the following steps: the device comprises a reaction cavity, a high-voltage power supply, an insulating layer, a water inlet, a water tank, a pump, a water passing plate, a high-voltage electrode, a water outlet and a controller;
wherein, the insulating layer set up in the side of reaction chamber, high voltage power supply sets up the outside of reaction chamber, the water inlet with the delivery port sets up respectively on the water tank, the bottom of reaction chamber is connected the one end of water tank, the other end of water tank with the one end of pump is connected, the other end of pump with cross the water board and connect, cross the water board with high-voltage electrode all sets up the inside of reaction chamber, the controller sets up on the reaction chamber.
Optionally, the reaction chamber includes a plurality of layers, each layer is laterally provided with high voltage electrodes, and each layer is connected to a high voltage power supply.
Optionally, the number of the high voltage power supplies is the same as the number of the layers in the reaction chamber, and each high voltage power supply is a DDBD plasma discharge power supply.
Optionally, the polarities between adjacent high voltage electrodes are different.
Optionally, the positive electrode of the high voltage power supply is connected to one central line of the insulating layer, and the negative electrode of the high voltage power supply is connected to the other central line of the insulating layer.
Optionally, the water tank is used for storing wastewater to be treated.
Optionally, the pump is used for conveying the wastewater to be treated in the water tank into the reaction chamber.
Optionally, the insulating layer is made of one of glass, ceramic, plastic and rubber.
Optionally, the insulating layer is made of a water-tight and electricity-tight material.
Optionally, the water passing plate includes a plurality of holes for dividing the wastewater to be treated, which is fed into the reaction chamber under the action of the pump.
Optionally, the number of the high voltage power supplies is the same as the number of the layers in the reaction chamber, and each high voltage power supply is a DDBD plasma discharge power supply.
It should be noted that, for the descriptions of the same steps and the same contents in this embodiment as those in other embodiments, reference may be made to the descriptions in other embodiments, which are not described herein again.
In an embodiment of the present invention, the high-pressure plasma discharge-based wastewater treatment control system provided by the present invention includes: the device comprises a reaction cavity, an insulating layer, a water inlet, a water tank, a pump, a water passing plate, a high-voltage electrode, a water outlet and a controller; the insulating layer set up in the side of reaction chamber, the water inlet with the delivery port sets up respectively on the water tank, the bottom of reaction chamber is connected the one end of water tank, the other end of water tank is connected with the one end of pump, the other end of pump with cross the water board and be connected, cross the water board with high voltage electrode all sets up the inside of reaction chamber. That is to say, the wastewater treatment device based on high-voltage plasma discharge in the invention firstly conveys wastewater to be treated in a water tank into a reaction cavity under the action of a pump, then the wastewater to be treated uniformly flows into a treatment area formed by high-voltage electrodes under the action of a water passing plate of the reaction cavity, and simultaneously the high-voltage electrodes generate high-voltage discharge plasma under the action of a high-voltage power supply, and the wastewater to be treated is treated by using the high-voltage discharge plasma.
Fig. 3 is a schematic view of a wastewater treatment apparatus based on high-pressure plasma discharge according to another embodiment of the present invention. This waste water treatment device based on high pressure plasma discharges includes: an acquisition module 301, a determination module 302 and a processing module 303,
an obtaining module 301, configured to obtain a first parameter in a reaction chamber; wherein the first parameter comprises the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet;
a determining module 302, configured to determine, according to the first parameter, a target policy that matches the first parameter;
and the treatment module 303 is used for performing target treatment on the wastewater to be treated based on the target high-voltage discharge plasma generated under the action of the target strategy.
It should be noted that, for the descriptions of the same steps and the same contents in this embodiment as those in other embodiments, reference may be made to the descriptions in other embodiments, which are not described herein again.
In an embodiment of the present invention, a high-pressure plasma discharge-based wastewater treatment apparatus includes: the acquisition module is used for acquiring a first parameter in the reaction cavity; wherein the first parameter comprises the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet; the determining module is used for determining a target strategy matched with the first parameter according to the first parameter; and the treatment module is used for performing target treatment on the wastewater to be treated based on the target high-voltage discharge plasma generated under the action of the target strategy. That is to say, when a target strategy matched with a first parameter in the reaction cavity is determined, the wastewater to be treated entering the reaction cavity is treated according to the high-voltage discharge plasma generated under the action of the high-voltage electrode and the high-voltage power supply, so that the purpose of treating wastewater with various concentrations and various pollution components is achieved, the structure is simple and easy to achieve, the safety is high, and the purposes of short-circuit protection, emergency switching, flow control of the wastewater to be treated and voltage current control of the high-voltage power supply can be achieved, so that the wastewater treatment efficiency is greatly improved, the energy consumption is reduced, and the service life of the wastewater treatment equipment based on high-voltage plasma discharge is prolonged.
Fig. 4 is a schematic diagram of another exhaust treatment control device based on high-voltage plasma discharge according to another embodiment of the present invention, which may be integrated in a terminal device or a chip of the terminal device.
The device includes: memory 401, processor 402.
The memory 401 is used for storing programs, and the processor 402 calls the programs stored in the memory 401 to execute the above-mentioned method embodiments. The specific implementation and technical effects are similar, and are not described herein again.
Preferably, the invention also provides a program product, such as a computer-readable storage medium, comprising a program which, when being executed by a processor, is adapted to carry out the above-mentioned method embodiments.
In the embodiments provided in the present invention, it should be understood that the disclosed apparatus and method may be implemented in other ways. For example, the above-described apparatus embodiments are merely illustrative, and for example, a division of a unit is merely a logical division, and an actual implementation may have another division, for example, a plurality of units or components may be combined or integrated into another system, or some features may be omitted, or not executed. In addition, the shown or discussed mutual coupling or direct coupling or communication connection may be an indirect coupling or communication connection through some interfaces, devices or units, and may be in an electrical, mechanical or other form.
Units described as separate parts may or may not be physically separate, and parts displayed as units may or may not be physical units, may be located in one place, or may be distributed on a plurality of network units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of the embodiment.
In addition, functional units in the embodiments of the present invention may be integrated into one processing unit, or each unit may exist alone physically, or two or more units are integrated into one unit. The integrated unit can be realized in a form of hardware, or in a form of hardware plus a software functional unit.
The integrated unit implemented in the form of a software functional unit may be stored in a computer readable storage medium. The software functional unit is stored in a storage medium and includes several instructions to enable a computer device (which may be a personal computer, a server, or a network device) or a processor (processor) to execute some steps of the methods according to the embodiments of the present invention. And the aforementioned storage medium includes: a U disk, a removable hard disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk or an optical disk, and other various media capable of storing program codes.
Claims (10)
1. A high-pressure plasma discharge-based wastewater treatment method applied to a high-pressure plasma discharge-based wastewater treatment facility, characterized by comprising:
acquiring a first parameter in a reaction cavity; wherein the first parameter comprises the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet;
determining a target strategy matched with the first parameter according to the first parameter;
and performing target treatment on the wastewater to be treated based on the target high-voltage discharge plasma generated under the action of the target strategy.
2. The method for treating wastewater based on high-pressure plasma discharge according to claim 1, wherein the determining a target strategy matched with the first parameter according to the first parameter comprises:
judging whether the voltage polarities between the adjacent high-voltage electrodes are the same or not based on the first parameter;
when the voltage polarities between the adjacent high-voltage electrodes are determined to be the same, determining a target adjustment strategy comprising adjusting the connection relation between the high-voltage electrodes and the corresponding high-voltage power supply;
and when the voltage polarities between the adjacent high-voltage electrodes are different, determining a target strategy which comprises keeping the connection relation between the current high-voltage electrode and the corresponding high-voltage power supply unchanged.
3. The method for treating wastewater based on high-pressure plasma discharge according to claim 1, wherein the determining a target strategy matched with the first parameter according to the first parameter comprises:
acquiring a first size relation between the current flow of the wastewater to be treated entering the reaction cavity and a preset reference flow according to the first parameter;
and determining a target strategy corresponding to the first size relation.
4. The method of claim 3, wherein the determining the target strategy corresponding to the first magnitude relationship comprises:
when the first size relationship comprises that the current flow is larger than the preset reference flow, determining a target adjustment strategy comprising reducing the current flow;
and when the first size relationship comprises that the current flow is smaller than the preset reference flow, determining a target adjustment strategy comprising increasing the current flow.
5. The method for treating wastewater based on high-pressure plasma discharge according to claim 1, wherein the determining a target strategy matched with the first parameter according to the first parameter comprises:
judging a second size relation between the current liquid concentration and a preset liquid concentration according to the first parameter;
and determining a target strategy corresponding to the second size relation.
6. The method of claim 5, wherein the determining the target strategy corresponding to the second magnitude relationship comprises:
when the second size relationship comprises that the current concentration is greater than the preset liquid concentration, determining a target adjustment strategy for performing target processing on the liquid corresponding to the current concentration again;
and when the second magnitude relation comprises that the current concentration is less than or equal to the preset liquid concentration, determining a target strategy which comprises that the target treatment is not carried out on the liquid corresponding to the current concentration again.
7. The high-pressure plasma discharge-based wastewater treatment method according to claim 1, further comprising:
and executing an operation instruction for closing the equipment when the first parameter in the reaction cavity is not obtained within the preset time.
8. A high pressure plasma discharge based wastewater treatment control system, the control system comprising: the device comprises a reaction cavity, a high-voltage power supply, an insulating layer, a water inlet, a water tank, a pump, a water passing plate, a high-voltage electrode, a water outlet and a controller;
wherein, the insulating layer set up in the side of reaction chamber, high voltage power supply sets up the outside of reaction chamber, the water inlet with the delivery port sets up respectively on the water tank, the bottom of reaction chamber is connected the one end of water tank, the other end of water tank with the one end of pump is connected, the other end of pump with cross the water board and connect, cross the water board with high-voltage electrode all sets up the inside of reaction chamber, the controller sets up on the reaction chamber.
9. A high-pressure plasma discharge-based wastewater treatment apparatus, comprising: the device comprises an acquisition module, a determination module and a processing module, wherein:
the acquisition module is used for acquiring a first parameter in the reaction cavity; wherein the first parameter comprises the current voltage of the high-voltage electrode, the current flow of the wastewater to be treated and/or the current liquid concentration at the water outlet;
the determining module is used for determining a target strategy matched with the first parameter according to the first parameter;
and the treatment module is used for performing target treatment on the wastewater to be treated based on the target high-voltage discharge plasma generated under the action of the target strategy.
10. An exhaust gas treatment control device based on high-pressure plasma discharge, characterized by comprising: a processor and a memory, the memory for storing instructions, the processor for executing the instructions stored in the memory to cause the apparatus to perform the high pressure plasma discharge-based wastewater treatment method of any one of claims 1 to 7.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118672191A (en) * | 2024-08-21 | 2024-09-20 | 浙江晶立捷智能科技有限公司 | Industrial wastewater treatment control method and system based on data analysis |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101565228A (en) * | 2009-06-04 | 2009-10-28 | 复旦大学 | Device for treating refractory organic sewage with nanosecond pulse discharge plasma |
| CN104321656A (en) * | 2012-05-22 | 2015-01-28 | 迪尔公司 | Method and controller for an electric motor with fault detection |
| CN106395995A (en) * | 2016-06-08 | 2017-02-15 | 黄立维 | Method and apparatus for purifying waste water by using discharge plasma |
| CN208660764U (en) * | 2018-05-11 | 2019-03-29 | 江苏师范大学 | Exhaust gas treatment system |
| CN110482645A (en) * | 2019-09-18 | 2019-11-22 | 大连民族大学 | A kind of sewage treatment method |
| CN111494760A (en) * | 2020-04-14 | 2020-08-07 | 西安交通大学 | Plasma Active Water Atomizer |
-
2020
- 2020-08-28 CN CN202010882009.5A patent/CN114105257A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101565228A (en) * | 2009-06-04 | 2009-10-28 | 复旦大学 | Device for treating refractory organic sewage with nanosecond pulse discharge plasma |
| CN104321656A (en) * | 2012-05-22 | 2015-01-28 | 迪尔公司 | Method and controller for an electric motor with fault detection |
| CN106395995A (en) * | 2016-06-08 | 2017-02-15 | 黄立维 | Method and apparatus for purifying waste water by using discharge plasma |
| CN208660764U (en) * | 2018-05-11 | 2019-03-29 | 江苏师范大学 | Exhaust gas treatment system |
| CN110482645A (en) * | 2019-09-18 | 2019-11-22 | 大连民族大学 | A kind of sewage treatment method |
| CN111494760A (en) * | 2020-04-14 | 2020-08-07 | 西安交通大学 | Plasma Active Water Atomizer |
Non-Patent Citations (1)
| Title |
|---|
| 杨启洪等: "《电子工艺基础与实践》", 华南理工大学出版社, pages: 174 - 175 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118672191A (en) * | 2024-08-21 | 2024-09-20 | 浙江晶立捷智能科技有限公司 | Industrial wastewater treatment control method and system based on data analysis |
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