CN103675348B - Z axis capacitance type micromechanical accelerometer - Google Patents
Z axis capacitance type micromechanical accelerometer Download PDFInfo
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Abstract
本发明公开了Z轴电容式微机械加速度计,属于微机械电子系统中的惯性传感器的技术领域,包括:玻璃基座,键合在玻璃基座上的扭转结构层,溅射在玻璃基座上的金电极层,扭转结构层包括结构相同四个子单元,任意三个子单元相当于另一个子单元按照顺时针方向或者逆时针方向分别旋转九十度、一百八十度、二百七十度得到。本发明通过减小检测电容极板正对面积与极板间距的比值来增大微机械加速度计的灵敏度,完全对称的扭转结构层使得结构共模抑制比大,减小了输出信号的零点偏移。
The invention discloses a Z-axis capacitive micromachine accelerometer, belonging to the technical field of inertial sensors in micromechanical electronic systems, comprising: a glass base, a torsion structure layer bonded on the glass base, and sputtered on the glass base The twisted structure layer includes four subunits with the same structure, and any three subunits are equivalent to another subunit rotated 90 degrees, 180 degrees, and 270 degrees clockwise or counterclockwise, respectively. get. The present invention increases the sensitivity of the micromechanical accelerometer by reducing the ratio of the detection capacitor polar plate facing area to the polar plate spacing, and the fully symmetrical torsional structure layer makes the common mode rejection ratio of the structure large and reduces the zero point deviation of the output signal. shift.
Description
技术领域technical field
本发明公开了Z轴电容式微机械加速度计,属于微机械电子系统中的惯性传感器的技术领域。The invention discloses a Z-axis capacitive micro-machine accelerometer, which belongs to the technical field of inertial sensors in micro-machine electronic systems.
背景技术Background technique
微机械加速度计是微机电系统中最为成功的器件之一,在军事与民用领域有广泛的应用前景,孕育着巨大的社会效益和经济效益,提高性能指标是目前微机械加速度计领域的研究重点。Micromachined accelerometers are one of the most successful devices in microelectromechanical systems. They have broad application prospects in the military and civilian fields, and have huge social and economic benefits. Improving performance indicators is currently the research focus in the field of micromachined accelerometers. .
Z轴电容式微机械加速度计是通过Z轴方向的加速度作用在质量块上,质量块带动支撑梁的活动,而质量块上的梳齿或平板也相应发生位置移动,当梳齿或平板与固定平板构成的电容对的间隔距离或极板间隔距离发生变化时,意味着对应的电容发生变化,电容变化的大小与Z轴方向的加速度大小有关。Z轴电容式微机械加速度计正是通过检测电容变化的大小来感测Z轴方向加速度的。The Z-axis capacitive micromachined accelerometer acts on the mass block through the acceleration in the Z-axis direction. The mass block drives the movement of the support beam, and the comb teeth or flat plate on the mass block also move correspondingly. When the comb tooth or flat plate and the fixed When the distance between the capacitance pairs formed by the plates or the distance between the pole plates changes, it means that the corresponding capacitance changes, and the magnitude of the capacitance change is related to the acceleration in the Z-axis direction. The Z-axis capacitive micromachined accelerometer senses the acceleration in the Z-axis direction by detecting the magnitude of the capacitance change.
Z轴电容式微机械加速度计一般有两种,一种是上下平动式,当Z轴方向加速度变化时,支撑梁支撑的质量块在Z轴方向上近似上下平行移动,固定的电容极板在质量块的正上方和正下方来形成差分电容,整个结构是一种“三明治”面包结构,这种方案的加速度计层数多,制造困难,且活动质量块上下平行移动距离小,加速度计灵敏度小。另外一种是扭转式,质量块通过梁来支撑,当Z轴方向加速度变化时,支撑梁支撑的质量块左右两部分就会相对支撑梁对应的轴线发生扭转,一边质量块位置上升,另一边质量块位置下降,对应的左右两边电容由于极板正对面积与极板间距的比值的变化而大小发生变化。在这种方式中,固定电容极板与质量块及支撑梁水平布置,加工比较容易。北京大学的杨振川、刘雪松、郝一龙等介绍了一种梳齿电容式Z轴加速度计及其制备方法(CN 1605871A),包括玻璃基座、可动电极和固定电极、支撑梁和锚点,可动电极以支撑梁为轴,其两侧具有质量差,属于扭转式Z轴电容式微机械加速度计,但由于检测电容的变化只取决于支撑梁的扭转角度,而与固定电极无关,所以加速度计灵敏度比较小。There are generally two types of Z-axis capacitive micromachined accelerometers. One is the up-and-down translation type. When the acceleration in the Z-axis direction changes, the mass block supported by the support beam moves in parallel up and down in the Z-axis direction. Differential capacitors are formed directly above and below the mass block. The whole structure is a "sandwich" bread structure. This solution has many layers of accelerometers, which is difficult to manufacture, and the movable mass block moves up and down in parallel. The distance is small, and the sensitivity of the accelerometer is small. . The other is torsion type. The mass block is supported by the beam. When the acceleration in the Z-axis direction changes, the left and right parts of the mass block supported by the support beam will twist relative to the axis corresponding to the support beam. The position of the mass block on one side rises, and the other side The position of the mass block decreases, and the corresponding left and right capacitances change due to the change in the ratio of the polar plate facing area to the polar plate spacing. In this way, the fixed capacitance plate is arranged horizontally with the mass block and the support beam, and the processing is relatively easy. Yang Zhenchuan, Liu Xuesong, Hao Yilong, etc. from Peking University introduced a comb-tooth capacitive Z-axis accelerometer and its preparation method (CN 1605871A), including a glass base, movable electrodes and fixed electrodes, support beams and anchor points, movable The electrode takes the support beam as the axis, and its two sides have poor quality. It belongs to the torsion Z-axis capacitive micromachined accelerometer, but because the change of the detection capacitance only depends on the torsion angle of the support beam, and has nothing to do with the fixed electrode, so the sensitivity of the accelerometer smaller.
发明内容Contents of the invention
本发明所要解决的技术问题是针对上述背景技术的不足,提出了Z轴电容式微机械加速度计。The technical problem to be solved by the present invention is to propose a Z-axis capacitive micro-mechanical accelerometer in view of the deficiencies of the above-mentioned background technology.
本发明为实现上述发明目的采用如下技术方案:The present invention adopts following technical scheme for realizing above-mentioned purpose of the invention:
Z轴电容式微机械加速度计,包括:玻璃基座,键合在玻璃基座上的扭转结构层,溅射在玻璃基座上的金电极层,扭转结构层包括结构相同四个子单元,任意三个子单元相当于另一个子单元按照顺时针方向或者逆时针方向分别旋转九十度、一百八十度、二百七十度得到;Z-axis capacitive micromachined accelerometer, including: a glass base, a torsion structure layer bonded on the glass base, a gold electrode layer sputtered on the glass base, the torsion structure layer includes four subunits with the same structure, any three A subunit is equivalent to another subunit rotated clockwise or counterclockwise by 90 degrees, 180 degrees, and 270 degrees respectively;
其中,所述每个子单元包括:对称结构的四边形质量块,与所述四边形质量块连接的支撑梁,在四边形质量块对称轴一侧的局部质量块上留有镂空区域,在所述四边形质量块对称的第一侧边、第二侧边上均附着有梳齿,附着在四边形质量块第一侧边上的水平梳齿与所属子单元的垂直方向夹角为九十度,附着在四边形质量块第二侧边上的垂直梳齿与所属子单元的水平方向夹角为九十度,每个子单元的水平梳齿与相邻子单元的垂直梳齿交叠在一起形成梳齿电容对。Wherein, each of the subunits includes: a quadrilateral mass of symmetrical structure, a support beam connected to the quadrilateral mass, a hollowed-out area is left on the local mass on one side of the symmetric axis of the quadrilateral mass, and the quadrilateral mass There are comb teeth attached to the symmetrical first side and the second side of the block, and the horizontal comb teeth attached to the first side of the quadrilateral mass block have an included angle of 90 degrees with the vertical direction of the subunit attached to the quadrilateral mass block. The angle between the vertical comb teeth on the second side of the mass block and the horizontal direction of the associated subunit is 90 degrees, and the horizontal comb teeth of each subunit overlap with the vertical comb teeth of adjacent subunits to form a comb capacitor pair .
作为Z轴电容式微机械加速度计的进一步优化方案,所述四边形质量块为等腰梯形的质量块,所述四边形质量块相互对称的第一侧边、第二侧边即为等腰梯形的两斜边。As a further optimization scheme of the Z-axis capacitive micromachined accelerometer, the quadrilateral mass block is an isosceles trapezoidal mass block, and the mutually symmetrical first and second sides of the quadrilateral mass block are two sides of an isosceles trapezoid. hypotenuse.
作为Z轴电容式微机械加速度计的进一步优化方案,所述镂空区域为三角形区域。As a further optimization solution for the Z-axis capacitive micromachined accelerometer, the hollowed-out area is a triangular area.
本发明采用上述技术方案,具有以下有益效果:The present invention adopts the above-mentioned technical scheme, and has the following beneficial effects:
(1)通过减小检测电容极板正对面积与极板间距的比值来增大微机械加速度计的灵敏度;(1) Increase the sensitivity of the micromechanical accelerometer by reducing the ratio of the detection capacitor polar plate facing area to the polar plate spacing;
(2)结构层每个单元全相同,结构共模抑制比大,能减小输出信号的零点偏移;(2) Each unit of the structural layer is identical, and the common mode rejection ratio of the structure is large, which can reduce the zero offset of the output signal;
(3)电极布局隔离距离大,输出信号交叉耦合小:由于电极布局在每个单元的中部,对应的检测电极彼此距离较远,这样输出信号的交叉耦合就比较小。(3) The isolation distance of the electrode layout is large, and the cross-coupling of the output signal is small: Since the electrode layout is in the middle of each unit, the corresponding detection electrodes are far away from each other, so the cross-coupling of the output signal is relatively small.
附图说明Description of drawings
图1为典型z轴电容式微机械加速度计剖面图。Figure 1 is a cross-sectional view of a typical z-axis capacitive micromachined accelerometer.
图2为本发明z轴电容式微机械加速度计剖面图。Fig. 2 is a sectional view of the z-axis capacitive micromachined accelerometer of the present invention.
图3为本发明涉及的Z轴电容式微机械加速度计的结构图。FIG. 3 is a structural diagram of a Z-axis capacitive micromachined accelerometer involved in the present invention.
图4为扭转结构层的结构图。Fig. 4 is a structural diagram of a twisted structural layer.
图5为第二子单元A2的结构图。FIG. 5 is a structural diagram of the second subunit A2.
图6为Z轴电容式微机械加速度计通过金属引线与外部电路连接的示意图。FIG. 6 is a schematic diagram of the Z-axis capacitive micromachined accelerometer connected to an external circuit through metal leads.
图7为Z轴电容式微机械加速度计中各子单元电容梳齿的示意图。7 is a schematic diagram of the capacitive comb teeth of each subunit in the Z-axis capacitive micromachined accelerometer.
图中标号说明:A1-A4依次为第一至第四子单元,M2为等腰梯形质量块,K21、K22为长方形支撑梁,H11、H21、H31、H41为水平梳齿,H12、H22、H32、H42为垂直梳齿,J11、J21、J22、J31、J41为锚点区,S1、S2、S3、S4为电极。Explanation of the symbols in the figure: A1-A4 are the first to fourth subunits in sequence, M2 is the isosceles trapezoidal mass block, K21, K22 are rectangular support beams, H11, H21, H31, H41 are horizontal comb teeth, H12, H22, H32, H42 are vertical comb teeth, J11, J21, J22, J31, J41 are anchor points, S1, S2, S3, S4 are electrodes.
具体实施方式Detailed ways
下面结合附图对发明的技术方案进行详细说明:Below in conjunction with accompanying drawing, the technical scheme of invention is described in detail:
如图1所示的典型Z轴电容式微机械加速度计,为确保活动质量块在加速度作用下发生扭转,扭转后质量块左边被抬高,右边被降低,活动质量块与左右固定检测质量块之间对应电容的极板正对面积与极板间距的比值均减小。由于扭转刚度相对比较大,电容变化比较小,从而加速度计的灵敏度比较小。For a typical Z-axis capacitive micromachined accelerometer as shown in Figure 1, in order to ensure that the movable mass is torsion under the action of acceleration, the left side of the mass is raised and the right is lowered after the torsion, and the difference between the movable mass and the left and right fixed detection masses The ratio of the facing area of the plates corresponding to the capacitance to the distance between the plates decreases. Because the torsional stiffness is relatively large, the capacitance change is relatively small, so the sensitivity of the accelerometer is relatively small.
本发明的Z轴电容式微机械加速度计,在典型的Z轴电容式微机械加速度计上进行了改进,图2虚线为活动质量块结构在初始平衡时的状态,中心质量块左右有两个活动检测质量块。当存在Z轴方向的加速度时,中间活动质量块左端向上扭转,右端向下扭转,此条件下,检测质量块也通过支撑梁支撑起来,在Z轴方向的加速度作用下,左端检测质量块向下转动,这样一个向上扭转,一个向下扭转,两个质量块的正对面积与间距的比值就会大大减小,变化的电容增大。同样,在Z轴方向的加速度作用下,右端检测质量块设计成向上转动,这样也是中心活动质量块向下扭转,右端检测质量块向上转动,两个质量块的正对面积与间距的比值就会大大减小,变化的电容也同样增大。这样两个检测电容的并联就能进一步增大加速度计的灵敏度。The Z-axis capacitive micromachined accelerometer of the present invention is improved on a typical Z-axis capacitive micromachined accelerometer. The dotted line in Fig. 2 is the state of the active mass structure at initial balance, and there are two active detections on the left and right of the central mass mass block. When there is an acceleration in the Z-axis direction, the left end of the middle active mass is twisted upwards, and the right end is twisted downwards. Under this condition, the proof mass is also supported by the support beam. Rotate downward, such that one twists upward and the other twists downward, the ratio of the facing area of the two mass blocks to the distance will be greatly reduced, and the changing capacitance will increase. Similarly, under the action of acceleration in the Z-axis direction, the right-end proof mass is designed to rotate upwards, so that the central movable mass is twisted downward, and the right-end proof mass is rotated upward, and the ratio of the facing area of the two masses to the distance is will be greatly reduced, and the changing capacitance will be similarly increased. In this way, the parallel connection of the two detection capacitors can further increase the sensitivity of the accelerometer.
如图3所示,本发明涉及的Z轴电容式微机械加速度计用来测量垂直方向的一维加速度,包括:玻璃基座,键合在玻璃基座上的单晶硅扭转结构层,溅射在玻璃基座上的金电极层。玻璃基座用于支撑单晶硅扭转结构层,单晶硅扭转结构层背面刻蚀有键合区,金电极层布置信号引线。As shown in Figure 3, the Z-axis capacitive micromachined accelerometer related to the present invention is used to measure the one-dimensional acceleration in the vertical direction, including: a glass base, a single crystal silicon torsion structure layer bonded on the glass base, sputtering A gold electrode layer on a glass pedestal. The glass base is used to support the twisted structure layer of single crystal silicon, the backside of the twisted structure layer of single crystal silicon is etched with a bonding area, and the gold electrode layer is arranged with signal wires.
扭转结构层如图4所示包括:中心活动质量单元、检测单元,中心活动质量单元与所述检测单元关于所述扭转结构层质心中心对称,中心活动质量单元包括关于扭转结构层质心中心对称的第一子单元A1、第三子单元A3,检测单元包括关于扭转结构层质心中心对称的第二子单元A2、第四子单元A4。第一至第四子单元A1、A2、A3、A4按顺时针方向布置,也可以逆时针方向布置。As shown in Figure 4, the torsion structure layer includes: a central active mass unit and a detection unit, the central active mass unit and the detection unit are symmetrical about the center of mass of the torsion structural layer, and the central active mass unit includes a center of mass symmetrical about the torsion structural layer. The first subunit A1, the third subunit A3, and the detection unit include a second subunit A2 and a fourth subunit A4 that are symmetrical about the center of mass of the twisted structure layer. The first to fourth subunits A1 , A2 , A3 , A4 are arranged in a clockwise direction, and may also be arranged in a counterclockwise direction.
下面以顺时针方向布置的第一至第四子单元A1、A2、A3、A4组成的扭转结构层为例:每个子单元结构相同,第二子单元A2如图5所示包括:等腰梯形质量块M2,与等腰梯形质量块连接的长方形支撑梁K21、K22,附着在梯形质量块M2左斜边上的多个水平梳齿H21,附着在梯形质量块M2右斜边上有多个垂直梳齿H22。在梯形质量块M2对称轴一侧的局部质量块上留有镂空区域,镂空区域可以为三角形或者其他形状,可以根据需要设计镂空面积大小。水平梳齿H21与第二子单元的垂直方向夹角为九十度,垂直梳齿H22与第二子单元的水平方向夹角为九十度,水平梳齿H21、垂直梳齿H22的长度和宽度根据设计需要调节。相邻水平梳齿H21、垂直梳齿H22之间的间隔距离也可以根据设计需要调节。长方形支撑梁K21与梯形质量块M2的长底边连接,长方形梁K22与梯形质量块M2的短底边连接。长方形支撑梁K21通过锚点区J21固定在基座上,长方形支撑梁梁K22通过锚点区J22固定在基座上,锚点区J21和锚点区J22为长方形,面积大小可以根据需要变化,梯形质量块M2及其上附着的梳齿在锚点区J21、J22的支撑作用下悬空。第二子单元A2在垂直直面方向关于支撑梁K21、K22受力平衡。Take the torsion structure layer composed of the first to fourth subunits A1, A2, A3, and A4 arranged in a clockwise direction as an example: each subunit has the same structure, and the second subunit A2 includes, as shown in Figure 5: an isosceles trapezoid Mass M2, rectangular support beams K21, K22 connected with isosceles trapezoidal mass, multiple horizontal combs H21 attached to the left hypotenuse of trapezoidal mass M2, multiple horizontal combs H21 attached to the right hypotenuse of trapezoidal mass M2 Vertical comb H22. A hollow area is left on the local mass block on one side of the symmetry axis of the trapezoidal mass M2. The hollow area can be triangular or other shapes, and the size of the hollow area can be designed as required. The vertical angle between the horizontal comb H21 and the second subunit is ninety degrees, the horizontal angle between the vertical comb H22 and the second subunit is ninety degrees, the length of the horizontal comb H21, the vertical comb H22 and The width can be adjusted according to design needs. The distance between adjacent horizontal comb teeth H21 and vertical comb teeth H22 can also be adjusted according to design requirements. The rectangular support beam K21 is connected to the long base of the trapezoidal mass M2, and the rectangular beam K22 is connected to the short base of the trapezoidal mass M2. The rectangular supporting beam K21 is fixed on the base through the anchor point area J21, and the rectangular supporting beam beam K22 is fixed on the base through the anchor point area J22. The anchor point area J21 and the anchor point area J22 are rectangular, and the area size can be changed as required. The trapezoidal mass M2 and the comb teeth attached to it are suspended in the air under the support of the anchor points J21 and J22. The second sub-unit A2 is force-balanced with respect to the support beams K21 and K22 in the vertical plane direction.
第二子单元A2顺时针旋转九十度就可以得到第三子单元A3,第二子单元A2中的垂直梳齿H22和第三子单元A3中的水平梳齿H31交叠在一起,但不接触形成梳齿电容对。立体看,在静态时需要保证两子个单元梳齿交叠高度合适,交叠高度与两个子单元中支撑梁的几何尺寸及支撑梁与其支撑的质量块连接的位置有关。由于本发明中四个子单元完全相同,可以根据设计需求调整支撑梁的几何尺寸及梁与其支撑的质量块连接的位置,从而调整梳齿交叠高度。依次类推,第三子单元A3顺时针旋转九十度得到第四子单元A4,第三子单元A3中的垂直梳齿与第四子单元A4中的水平梳齿交叠在一起形成梳齿电容对;第四子单元A4顺时针旋转九十度得到第一子单元A1,第四子单元A4中的垂直梳齿与第一子单元A1中的水平梳齿交叠在一起形成梳齿电容对。第一子单元中的水平梳齿H11与第四子单元中的垂直梳齿H42构成第一梳齿电容对,第一子单元中的垂直梳齿H12与第二子单元中的水平梳齿H21构成第二梳齿电容对,第三子单元中的水平梳齿H31与第二子单元中的垂直梳齿H22构成第三梳齿电容对,第三子单元中的垂直梳齿H32与第四子单元中的水平梳齿H41构成第四梳齿电容对。The third subunit A3 can be obtained by rotating the second subunit A2 clockwise ninety degrees, the vertical comb teeth H22 in the second subunit A2 and the horizontal comb teeth H31 in the third subunit A3 overlap together, but do not The contacts form comb-tooth capacitor pairs. From a three-dimensional perspective, it is necessary to ensure that the comb teeth of the two sub-units overlap at an appropriate height in static state. The overlapping height is related to the geometric dimensions of the support beams in the two sub-units and the position where the support beams are connected to the mass blocks they support. Since the four sub-units in the present invention are identical, the geometric dimensions of the supporting beam and the position where the beam is connected to the mass block supported can be adjusted according to the design requirements, thereby adjusting the overlapping height of the comb teeth. By analogy, the third subunit A3 is rotated 90 degrees clockwise to obtain the fourth subunit A4, and the vertical comb teeth in the third subunit A3 overlap with the horizontal comb teeth in the fourth subunit A4 to form a comb capacitor Right; the fourth subunit A4 is rotated 90 degrees clockwise to obtain the first subunit A1, and the vertical comb teeth in the fourth subunit A4 overlap with the horizontal comb teeth in the first subunit A1 to form a comb capacitor pair . The horizontal comb H11 in the first subunit and the vertical comb H42 in the fourth subunit constitute the first comb capacitor pair, the vertical comb H12 in the first subunit and the horizontal comb H21 in the second subunit Constitute the second comb-tooth capacitor pair, the horizontal comb-tooth H31 in the third subunit and the vertical comb-tooth H22 in the second sub-unit form the third comb-tooth capacitor pair, the vertical comb-tooth H32 in the third sub-unit and the fourth The horizontal comb teeth H41 in the subunit form a fourth comb tooth capacitance pair.
Z轴电容式微机械加速度计需要通过金属引线与外部电路进行连接,如图6所示,玻璃基座上的金属电极层有4个电极S1、S2、S3、S4。电极S1通过阳极键合与锚点区J11相连接,电极S2通过阳极键合与锚点区J21相连接,电极S3通过阳极键合与锚点区J31相连接,电极S4通过阳极键合与锚点区J41相连接。电极S1、S2、S3、S4依次分别为第一、第二、第三、第四子单元A1、A2、A3、A4提供电信号的连接。电极S1、S2、S3、S4的形状可以根据需要调整,电极间隔距离大,可减小输出信号的交叉耦合影响。The Z-axis capacitive micromachined accelerometer needs to be connected to the external circuit through metal leads. As shown in Figure 6, the metal electrode layer on the glass base has four electrodes S1, S2, S3, and S4. Electrode S1 is connected to the anchor region J11 through anodic bonding, electrode S2 is connected to the anchor region J21 through anodic bonding, electrode S3 is connected to the anchor region J31 through anodic bonding, and electrode S4 is connected to the anchor region through anodic bonding. Point area J41 is connected. The electrodes S1 , S2 , S3 , and S4 respectively provide electrical signal connections for the first, second, third, and fourth subunits A1 , A2 , A3 , and A4 in turn. The shapes of the electrodes S1, S2, S3, and S4 can be adjusted according to needs, and the distance between the electrodes is large, which can reduce the cross-coupling effect of the output signal.
中心活动质量单元和检测单元可以互换,在测量Z轴加速度时,固定一组中心对称的子单元作为中心活动质量单元,另外一组中心对称的子单元即为检测单元,中心活动质量单元与检测单元在测量过程中都可以活动,相对于已有的Z轴电容式微机械加速度计中只有中心活动质量单元活动的技术方案而言,本发明的方案增大了中心活动质量单元与检测单元在检测中的相对扭转角度,进而减小了检测电容极板的正对面积与极板间距的比值,增大了加速度计的灵敏度。The central active mass unit and the detection unit can be interchanged. When measuring the Z-axis acceleration, a set of centrally symmetrical subunits is fixed as the central active mass unit, and another set of centrally symmetrical subunits is the detection unit. The central active mass unit and The detection unit can move during the measurement process. Compared with the technical solution in which only the central active mass unit is active in the existing Z-axis capacitive micromachined accelerometer, the solution of the present invention increases the distance between the central active mass unit and the detection unit. The relative torsion angle in the detection further reduces the ratio of the facing area of the detection capacitance plate to the distance between the plates, and increases the sensitivity of the accelerometer.
如图7所示,以第一子单元A1和第三子单元A3这一对作为中心活动质量单元,将第二子单元A2和第四子单元A4这一对作为检测对单元为例,在Z轴方向的加速度作用下,第二子单元A2的垂直梳齿H22向下移动,水平梳齿H21向上移动;第三子单元A3的垂直梳齿H32向下移动,水平梳齿H31向上移动;第四子单元A4的梳垂直齿H42向下移动,水平梳齿H41向上移动;第一子单元A1的垂直梳齿H12向下移动,水平梳齿H11向上移动。以第二子单元A2为例,第二梳齿电容对大小为C21,第四梳齿电容对大小为C23,在Z轴方向加速度作用下,第一子单元A1的垂直梳齿H12向下移动,第二子单元A2的水平梳齿H21向上移动,使得C21对应的检测电容极板的正对面积与极板间距的比值减小,C21大小减小△C21,第三子单元A3的水平梳齿H31向上移动,第二子单元A2的垂直梳齿H22向下移动,使得C23对应的检测电容极板的正对面积与极板间距的比值也减小,C23大小减小△C23。在Z轴加速度作用下,C21与C23均减小,减小大小为△C21+△C23。同样的原理,第四子单元A4为例,第一梳齿电容对大小为C41,第三梳齿电容对大小为C43,在Z轴方向加速度作用下,第一子单元A1的水平梳齿H11向上移动,第四子单元A4的垂直梳齿H42向下移动,使得C41对应的检测电容极板的正对面积与极板间距的比值减小,C41大小减小△C41;第三子单元A3的垂直梳齿H32向下移动,第四子单元A4的水平梳齿H41向上移动,使得C43对应的检测电容极板的正对面积与极板间距的比值减小,C43大小减小△C43。在Z轴加速度作用下,C41与C43均减小,减小大小为△C41+△C43。将电极S2和S4通过信号线短接引出作为测试等效电容的一个引线,将电极S1和S3通过信号线短接引出作为测试等效电容的另外一个引线,在Z轴方向加速度为0时,测试电容大小为C21+C23+C41+C43;在Z轴方向加速度不为0时,测试电容大小为C21+C23+C41+C43-△C21-△C23-△C41-△C43,变化量为△C21+△C23+△C41+△C43。变化量比单一的梳齿电容对大很多,这样灵敏度就增大了。As shown in Figure 7, taking the pair of the first subunit A1 and the third subunit A3 as the central active mass unit, and the pair of the second subunit A2 and the fourth subunit A4 as the detection pair unit as an example, in Under the action of acceleration in the Z-axis direction, the vertical comb H22 of the second subunit A2 moves downward, and the horizontal comb H21 moves upward; the vertical comb H32 of the third subunit A3 moves downward, and the horizontal comb H31 moves upward; The vertical comb teeth H42 of the fourth subunit A4 move downwards, and the horizontal comb teeth H41 move upwards; the vertical comb teeth H12 of the first subunit A1 move downwards, and the horizontal comb teeth H11 move upwards. Taking the second sub-unit A2 as an example, the size of the second comb-tooth capacitor pair is C21, and the size of the fourth comb-tooth capacitor pair is C23. Under the action of acceleration in the Z-axis direction, the vertical comb teeth H12 of the first sub-unit A1 move downward , the horizontal comb H21 of the second subunit A2 moves upwards, so that the ratio of the facing area of the detection capacitance plate corresponding to C21 to the distance between the plates decreases, and the size of C21 decreases by △C21, the horizontal comb of the third subunit A3 The tooth H31 moves upward, and the vertical comb tooth H22 of the second subunit A2 moves downward, so that the ratio of the facing area of the detection capacitor plate corresponding to C23 to the distance between the plates also decreases, and the size of C23 decreases by △C23. Under the action of Z-axis acceleration, both C21 and C23 decrease, and the size of the decrease is △C21+△C23. In the same principle, taking the fourth subunit A4 as an example, the size of the first comb-tooth capacitance pair is C41, and the size of the third comb-tooth capacitance pair is C43. Under the action of acceleration in the Z-axis direction, the horizontal comb-tooth H11 Moving upwards, the vertical comb H42 of the fourth subunit A4 moves downwards, so that the ratio of the facing area of the detection capacitor plate corresponding to C41 to the distance between the plates decreases, and the size of C41 decreases by △C41; the third subunit A3 The vertical comb H32 of the fourth subunit A4 moves downward, and the horizontal comb H41 of the fourth subunit A4 moves upward, so that the ratio of the facing area of the detection capacitor plate corresponding to C43 to the distance between the plates decreases, and the size of C43 decreases by △C43. Under the action of Z-axis acceleration, both C41 and C43 decrease, and the decrease is △C41+△C43. Short-circuit the electrodes S2 and S4 through the signal line as a lead for testing the equivalent capacitance, and short-circuit the electrodes S1 and S3 through the signal line as another lead for testing the equivalent capacitance. When the acceleration in the Z-axis direction is 0, The test capacitance is C21+C23+C41+C43; when the acceleration in the Z-axis direction is not 0, the test capacitance is C21+C23+C41+C43-△C21-△C23-△C41-△C43, and the change is △ C21+△C23+△C41+△C43. The amount of change is much larger than that of a single comb-tooth capacitance pair, so the sensitivity is increased.
综上所述,本发明具有以下优点:In summary, the present invention has the following advantages:
(1)通过减小检测电容极板的正对面积与极板间距的比值来增大微机械加速度计的灵敏度;(1) Increase the sensitivity of the micromachined accelerometer by reducing the ratio of the facing area of the detection capacitor plate to the plate spacing;
(2)结构层每个单元全相同,结构共模抑制比大,能减小输出信号的零点偏移;(2) Each unit of the structural layer is identical, and the common mode rejection ratio of the structure is large, which can reduce the zero offset of the output signal;
(3)电极布局隔离距离大,输出信号交叉耦合小:由于电极布局在每个单元的中部,对应的检测电极彼此距离较远,这样输出信号的交叉耦合就比较小。(3) The isolation distance of the electrode layout is large, and the cross-coupling of the output signal is small: Since the electrode layout is in the middle of each unit, the corresponding detection electrodes are far away from each other, so the cross-coupling of the output signal is relatively small.
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