CN103589522A - Alkaline photovoltaic battery silicon wafer cleaning agent and preparation method thereof - Google Patents
Alkaline photovoltaic battery silicon wafer cleaning agent and preparation method thereof Download PDFInfo
- Publication number
- CN103589522A CN103589522A CN201310527802.3A CN201310527802A CN103589522A CN 103589522 A CN103589522 A CN 103589522A CN 201310527802 A CN201310527802 A CN 201310527802A CN 103589522 A CN103589522 A CN 103589522A
- Authority
- CN
- China
- Prior art keywords
- parts
- alkaline
- cleaning agent
- silicon wafer
- photovoltaic battery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
An alkaline photovoltaic battery silicon wafer cleaning agent is prepared form the following raw materials: by weight, 2-3 of parts of sodium silicate, 1-2 parts of sodium borate, 2-3 parts of diethylenetriamine pentaacetic acid, 2-3 parts of sodium dodecyl benzene sulfonate, 3-4 parts of tetramethylammonium hydroxide, 4-6 parts of ferrous sulfate, 20-30 parts of ethylene glycol monomethyl ether, 2-3 parts of salicylic acid, 4-5 parts of n-butanol, 4-5 parts of an additive and 100-120 parts of deionized water. The alkaline photovoltaic battery silicon wafer cleaning agent is weakly alkaline, has good decontamination and cleaning performances, is good in working fluid pH buffer performance and obvious in surfactant synergistic effect, has a cleaning rate reaching to 99% above, has a long use cycle, can effectively remove grease, metal impurities, dust and other particles on the surface of a circuit board, and is simple in cleaning process. The unit cost of the alkaline photovoltaic battery silicon wafer cleaning agent is reduced by 48% compared with that of a traditional circuit board cleaning agent. The additive of the alkaline photovoltaic battery silicon wafer cleaning agent can form a protective film on the surface of the circuit board for isolating air to prevent water and other molecules in the atmosphere from corroding the circuit board, and is anti-oxidizing.
Description
Technical field
The present invention relates to clean-out system field, relate in particular to a kind of alkaline photovoltaic cell silicon slice detergent and preparation method thereof.
Background technology
The industry Wafer Cleanings such as silicon slice detergent is widely used in photovoltaic, electronics; Because silicon chip can pollute to some extent in transportation, surface cleanliness is not very high, the corrosion and the etching that are about to carry out is had a huge impact, so first will carry out a series of cleaning operation to silicon chip surface.First the general thinking of cleaning is to remove surperficial organic contaminations, and dissolved oxygen film then, because zone of oxidation is " contamination fall into into ", can cause epitaxy defect; Remove again particle, metal etc., make the surface passivation of silicon chip simultaneously.
Current most silicon slice detergent adopts a liquid and No. three liquid in RAC cleaning, but the aobvious alkalescence of liquid may cause silicon face coarse, strictly control temperature, concentration and time; No. three liquid is aobvious acid, has severe corrosive, also unfavorable to HUMAN HEALTH, production cost is high, irritant smell, contaminate environment, therefore require further improvement formula, with reach clean thorough, pollution-free, corrode little, to HUMAN HEALTH, circuit safety, the object that reduces costs.
Summary of the invention
The object of the present invention is to provide a kind of alkaline photovoltaic cell silicon slice detergent and preparation method thereof, this clean-out system is clean thoroughly, cleaning speed is fast, product is without piebald.
Technical scheme of the present invention is as follows:
A photovoltaic cell silicon slice detergent, is characterized in that being made by the raw material of following weight part: water glass 2-3, Sodium Tetraborate 1-2, diethylene triamine pentacetic acid (DTPA) 2-3, Sodium dodecylbenzene sulfonate 2-3, Tetramethylammonium hydroxide 3-4, ferrous sulfate 4-6, ethylene glycol monomethyl ether 20-30, Whitfield's ointment 2-3, propyl carbinol 4-5, auxiliary agent 4-5, deionized water 100-120;
Described auxiliary agent is made by the raw material of following weight part: Silane coupling reagent KH-570 2-3, oxidation inhibitor 1035 1-2, phytic acid 1-2, morpholine 3-4, methacrylic acid-2-hydroxy methacrylate 3-4, ethanol 12-15; Preparation method mixes Silane coupling reagent KH-570, phytic acid, ethanol, is heated to 60-70 ℃, stirs after 20-30 minute, then adds other remaining component, is warming up to 80-85 ℃, stirs 30-40 minute, obtains.
The preparation method of described alkaline photovoltaic cell silicon slice detergent, it is characterized in that comprising the following steps: deionized water, diethylene triamine pentacetic acid (DTPA), Sodium dodecylbenzene sulfonate, Tetramethylammonium hydroxide, ferrous sulfate, ethylene glycol monomethyl ether, Whitfield's ointment, propyl carbinol are mixed, under 1000-1200 rev/min of stirring, speed with 6-8 ℃/minute is heated to 60-70 ℃, add other remaining components, continue to stir 15-20 minute, obtain.
Beneficial effect of the present invention
Clean-out system of the present invention is weakly alkaline, there is good decontamination, cleaning performance, the pH value shock-absorbing capacity of working fluid is good, tensio-active agent synergistic effect is obvious, cleaning rate is up to more than 99%, life cycle is long, can effectively remove circuit board surface grease, metallic impurity, dust and other particle, and cleaning is simple.The present invention compares unit cost and declines 48% with traditional circuit card clean-out system.Auxiliary agent of the present invention can form protective membrane at circuit board surface, and isolated air, prevents water and other molecule open circuit potential plates in atmosphere, anti-oxidant, facilitates next step manufacture craft to carry out.
Embodiment
A photovoltaic cell silicon slice detergent, by following weight part (kilogram) raw material make: water glass 2.4, Sodium Tetraborate 2, diethylene triamine pentacetic acid (DTPA) 2.5, Sodium dodecylbenzene sulfonate 2.5, Tetramethylammonium hydroxide 3.5, ferrous sulfate 5, ethylene glycol monomethyl ether 26, Whitfield's ointment 2.5, propyl carbinol 4.5, auxiliary agent 4.5, deionized water 110;
Described auxiliary agent by following weight part (kilogram) raw material make: Silane coupling reagent KH-570 2.5, oxidation inhibitor 1,035 1.5, phytic acid 1.5, morpholine 3.5, methacrylic acid-2-hydroxy methacrylate 3.5, ethanol 14; Preparation method mixes Silane coupling reagent KH-570, phytic acid, ethanol, is heated to 65 ℃, stirs after 25 minutes, then adds other remaining component, is warming up to 84 ℃, stirs 34 minutes, obtains.
The preparation method of described alkaline photovoltaic cell silicon slice detergent, comprise the following steps: deionized water, diethylene triamine pentacetic acid (DTPA), Sodium dodecylbenzene sulfonate, Tetramethylammonium hydroxide, ferrous sulfate, ethylene glycol monomethyl ether, Whitfield's ointment, propyl carbinol are mixed, under 1100 revs/min of stirrings, with the speed of 7 ℃/minute, be heated to 65 ℃, add other remaining components, continue to stir 17 minutes, obtain.
This alkalescence photovoltaic cell silicon slice detergent is used for cleaning photovoltaic cell silicon chip, and clean rate is 99.5%, can residual insolubles to cleaning silicon chip surface, do not produce new pollution, and do not affect the quality of product, the silicon chip surface after cleaning is clean, and color and luster is consistent, without piebald.
Claims (2)
1. an alkaline photovoltaic cell silicon slice detergent, is characterized in that being made by the raw material of following weight part: water glass 2-3, Sodium Tetraborate 1-2, diethylene triamine pentacetic acid (DTPA) 2-3, Sodium dodecylbenzene sulfonate 2-3, Tetramethylammonium hydroxide 3-4, ferrous sulfate 4-6, ethylene glycol monomethyl ether 20-30, Whitfield's ointment 2-3, propyl carbinol 4-5, auxiliary agent 4-5, deionized water 100-120;
Described auxiliary agent is made by the raw material of following weight part: Silane coupling reagent KH-570 2-3, oxidation inhibitor 1035 1-2, phytic acid 1-2, morpholine 3-4, methacrylic acid-2-hydroxy methacrylate 3-4, ethanol 12-15; Preparation method mixes Silane coupling reagent KH-570, phytic acid, ethanol, is heated to 60-70 ℃, stirs after 20-30 minute, then adds other remaining component, is warming up to 80-85 ℃, stirs 30-40 minute, obtains.
2. the preparation method of alkaline photovoltaic cell silicon slice detergent according to claim 1, it is characterized in that comprising the following steps: deionized water, diethylene triamine pentacetic acid (DTPA), Sodium dodecylbenzene sulfonate, Tetramethylammonium hydroxide, ferrous sulfate, ethylene glycol monomethyl ether, Whitfield's ointment, propyl carbinol are mixed, under 1000-1200 rev/min of stirring, speed with 6-8 ℃/minute is heated to 60-70 ℃, add other remaining components, continue to stir 15-20 minute, obtain.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310527802.3A CN103589522A (en) | 2013-10-31 | 2013-10-31 | Alkaline photovoltaic battery silicon wafer cleaning agent and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310527802.3A CN103589522A (en) | 2013-10-31 | 2013-10-31 | Alkaline photovoltaic battery silicon wafer cleaning agent and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103589522A true CN103589522A (en) | 2014-02-19 |
Family
ID=50079845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310527802.3A Pending CN103589522A (en) | 2013-10-31 | 2013-10-31 | Alkaline photovoltaic battery silicon wafer cleaning agent and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103589522A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113667991A (en) * | 2021-08-04 | 2021-11-19 | 诺而曼环保科技（江苏）有限公司 | New energy aluminum battery shell oil and ash removing hydrocarbon cleaning agent and preparation method thereof |
| CN115353934A (en) * | 2022-08-23 | 2022-11-18 | 库珀新能源股份有限公司 | Photovoltaic power generation panel cleaning liquid |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090120457A1 (en) * | 2007-11-09 | 2009-05-14 | Surface Chemistry Discoveries, Inc. | Compositions and method for removing coatings and preparation of surfaces for use in metal finishing, and manufacturing of electronic and microelectronic devices |
| CN102242025A (en) * | 2010-05-14 | 2011-11-16 | 富士胶片株式会社 | Cleaning composition, method for producing semiconductor device, and cleaning method |
| WO2011142362A1 (en) * | 2010-05-11 | 2011-11-17 | 日産化学工業株式会社 | Silicon-wafer polishing composition and silicon-wafer polishing method |
| CN102660409A (en) * | 2012-05-14 | 2012-09-12 | 陕西省石油化工研究设计院 | Cleaning agent for silicon wafer of photovoltaic cell and preparation method for cleaning agent |
| CN103215595A (en) * | 2013-02-04 | 2013-07-24 | 安徽省繁昌县皖南阀门铸造有限公司 | Metal rust-preventive oil comprising sorbitan monooleate |
-
2013
- 2013-10-31 CN CN201310527802.3A patent/CN103589522A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090120457A1 (en) * | 2007-11-09 | 2009-05-14 | Surface Chemistry Discoveries, Inc. | Compositions and method for removing coatings and preparation of surfaces for use in metal finishing, and manufacturing of electronic and microelectronic devices |
| WO2011142362A1 (en) * | 2010-05-11 | 2011-11-17 | 日産化学工業株式会社 | Silicon-wafer polishing composition and silicon-wafer polishing method |
| CN102242025A (en) * | 2010-05-14 | 2011-11-16 | 富士胶片株式会社 | Cleaning composition, method for producing semiconductor device, and cleaning method |
| CN102660409A (en) * | 2012-05-14 | 2012-09-12 | 陕西省石油化工研究设计院 | Cleaning agent for silicon wafer of photovoltaic cell and preparation method for cleaning agent |
| CN103215595A (en) * | 2013-02-04 | 2013-07-24 | 安徽省繁昌县皖南阀门铸造有限公司 | Metal rust-preventive oil comprising sorbitan monooleate |
Non-Patent Citations (1)
| Title |
|---|
| 王亚妮: "一种太阳能硅片清洗剂的制备方法", 《化学工程师》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113667991A (en) * | 2021-08-04 | 2021-11-19 | 诺而曼环保科技（江苏）有限公司 | New energy aluminum battery shell oil and ash removing hydrocarbon cleaning agent and preparation method thereof |
| CN115353934A (en) * | 2022-08-23 | 2022-11-18 | 库珀新能源股份有限公司 | Photovoltaic power generation panel cleaning liquid |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101892132B (en) | Solar silicon slice cleaning agent and method for preparing same | |
| CN102477358A (en) | Silicon wafer cleaning agent | |
| CN102653706A (en) | Nonmetallic element cleaner | |
| CN102296001B (en) | Cleaning fluid for panel display and preparation method thereof | |
| CN102660393B (en) | Cleaning solution for light-emitting diode (LED) chip | |
| CN105039006A (en) | Cleaning agent used for solar grade silicon wafers and preparing method thereof | |
| CN103571647A (en) | Solar grade silicon wafer water-based cleaning agent and preparation method thereof | |
| CN103571670A (en) | Silicon slice detergent for photovoltaic cells and preparation method thereof | |
| CN103571664A (en) | Environment-friendly solar silicon wafer cleaning agent and preparation method thereof | |
| CN103555431A (en) | Printed circuit board cleaning agent and preparation method thereof | |
| CN103589522A (en) | Alkaline photovoltaic battery silicon wafer cleaning agent and preparation method thereof | |
| CN108660461A (en) | Preparation method of the efficient paraffin removal of polished part of copper except the integrated cleaning agent of oxidation | |
| CN102329698A (en) | Novel environmentally-friendly liquid crystal detergent and preparation method thereof | |
| CN110387292A (en) | A kind of cleaning solution and preparation method applied to optical glass substrate | |
| CN103589525A (en) | Semiconductor silicon wafer cleaning agent for removal of black wax, rosin and paraffin mixtures and preparation method thereof | |
| CN103555443A (en) | Aqueous solder paste cleaning agent for printed circuit board and preparation method for aqueous solder paste cleaning agent | |
| CN110591832A (en) | Efficient environment-friendly pollution-free silicon wafer cleaning agent and preparation method thereof | |
| CN103571640A (en) | Water-based LED (Light-Emitting Diode) chip cleaning agent and preparation method thereof | |
| CN103571665A (en) | Cleaning agent used for integrated circuit substrate silicon wafers and preparation method thereof | |
| CN103605270B (en) | A kind of water base silicon chip cleaning liquid of photoresist and preparation method thereof | |
| CN108239433A (en) | A kind of aqua type UV three-proofing coating cleaning agents and preparation method thereof | |
| CN1872974A (en) | Cleaning agent for metal parts, and preparation method | |
| CN103589521A (en) | Water-based cleaning agent for removal of silicon wafer surface stains and preparation method thereof | |
| CN103042009B (en) | A kind of polycrystalline silicon material produces the cleaning method of reduction furnace electrode protective cover | |
| CN103571644A (en) | Water-based silicon wafer cleaning agent and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20140219 |