CN103403609B - For forming the method, apparatus and system of filter element on display base plate - Google Patents

Abstract

The invention discloses a kind of method and system for using digital imaging system to form filter element on multiple display base plates, described digital imaging system operationally optionally deposits filter at multiple deposition positions.Described method includes receiving orientation information, and described orientation information limits the setting of the multiple pixels relevant at least one display base plate；Identify that the pixel by receiving filter is to form filter element in described pixel in a plurality of pixels；In each identified pixel, select deposition position according to orientation information, thus meet the alignment criteria relevant to filter element layout in described pixel；And control described digital imaging system so that filter is deposited at selected described deposition position.The invention also discloses a kind of method and system for forming filter element on substrate, including selecting reception filter to form the position of filter element on the substrate；Stochastic variable is introduced in the layout of described filter element；And filter element is formed in selected described position, described substrate is directed at display base plate to form display subsequently.The invention also discloses a kind of method and system forming filter element on display base plate, including optionally depositing filter in multiple pixels relevant to described display base plate to form filter element；And deposited filter is selectively exposed to LASER HEAT radiation to regulate described deposited filter.

Description

For forming the method, apparatus and system of filter element on display base plate

Related application

The application be on July 21st, 2011 submit to international patent application no be PCT/CA2011/ The application in the 000582 American National stage under 35USC371, it is desirable to July 26 in 2010 The right of the U.S. Provisional Application Serial No. 61/400,291 that day submits to, also requires at 2010 8 The right of the U.S. Provisional Application Serial No. 61/402,234 that the moon 26 was submitted to, also requires 2011 The right of the U.S. Provisional Application Serial No. 61/520,138 that on June 6, in submits to.All above-mentioned The complete disclosure of application is incorporated by reference in the application.

Technical field

Present invention relates generally to electronic displays, on display base plate, particularly form the unit that filters Part.

Background technology

Electronic displays is for filling for such as TV, computer monitor, device for mobile communication and e-book The multiple electronic installation putting (e-Readers) provides visual output.Including such as liquid crystal display (LCD), the multiple types of organic light emitting diode display, electric moistening display and electrophoretic display The electronic displays of type is widely used.

LCD display is the example of transmissive display, and it utilizes chromatic filter effectively by monochrome Display is converted to color display.Thin film transistor (TFT) (TFT) layer and color filter layer are generally divided Not being made on glass substrate, these glass substrates are aligned subsequently and are assembled into display unit.Should TFT layer include multiple driver, each driver be operatively controlled display sub-fraction or Elementary area (pixel).This color filter layer generally includes redness, green and blue filter element, It covers display picture element and filters to show coloured image to white light.

The chromatic filter of LCD display is currently mainly made by photoetching process, but also attempts By on color pigment laser transfer or inkjet transfer to chromatic filter glass substrate or the most straight Connect laser transfer or inkjet transfer to TFT layer.By directly transferring colorant on TFT layer, can To avoid the follow-up requirement being accurately directed between chromatic filter with TFT layer.

Electrophoretic display is the example of reflective display, provides photograph at electrophoretic display ambient light Bright and display picture element is electronically controlled optionally reflection environment light by underlying TFT, thus Form display image.As LCD display, electrophoretic display is the most also monochrome display. In order to provide color display, color filter element can be formed on reflective display picture element. This color filter element can substantially cover the whole area of associated reflections escope pixel, it is possible to Only to cover a part for this area.

Yet suffer from the needs being modified to form the method and apparatus of chromatic filter at present.

Summary of the invention

According to an aspect of the invention, it is provided one is used for using digital imaging system at least one The method forming filter element on individual display base plate, this digital imaging system is operationally multiple heavy Long-pending position optionally deposits filter.The method includes: receive orientation information, and this orientation is believed Breath limits the setting of the multiple pixels relevant at least one display base plate；The plurality of pixel is known Will not receive the pixel of filter to form filter element in this pixel；According to orientation information often Select deposition position in individual identified pixel, thus meet with described filter element in described pixel Arrange relevant alignment criteria；And control digital imaging system so that filter is deposited on selected At the deposition position selected.

Each identified pixel can have relevant border, and filter element will be disposed in this border In, and this alignment criteria includes the threshold that represents filter element relative to the tolerance of the layout on border Value, described selection can include select deposition position so that: when filter element is at identified picture When element is maintained within threshold value relative to the layout in succession moved on border, make the layout of filter element In succession move.Selection may further include selection deposition position so that: when the cloth in succession moved Put when exceeding this threshold value, make the layout movement of filter element within threshold value.

Select deposition position so that the layout of filter element may include that selection within moving back to threshold value The deposition position of the spacing looked younger between adjacent deposition position it is moved into relative to border.

The method can be included in threshold value introducing stochastic variable, and this stochastic variable operationally destroys rule Then pattern, this regular pattern is sent out due to the filter element layout in succession moved in pixel in succession It is raw in filter element is arranged.

Identify that pixel can include identifying in a plurality of pixels for receiving in multiple color filter materials A kind of pixel, and select deposition position can include selecting deposition position so that filter element Be arranged in multiple color filter materials various between change, thus destroy regular pattern, this rule Pattern occurs at filter element due to the filter element layout in succession moved in pixel in succession Layout in.

This deposition position can include the first deposition position and the second deposition position, this first deposition position Putting the first axle along this display base plate by rough alignment, this second deposition position is along display base plate Second axle is by rough alignment, and this second deposition position is tightr than the first deposition position interval, and often Individual identified pixel can have the first relevant axle border and on the direction of the first axle There is on the direction of two axles the second relevant axle border, this first axle border and the second axle borders This filter element will be disposed in interior region, and select to may include that selection the first deposition position To provide bigger spacing between this filter element and the first axle border, and select the second deposition position Put between this filter element and the second axle border, provide less spacing, so that the first deposition position Putting combines with the selection of the second deposition position meets the coverage criteria relevant to filter element.

This selection may further include introducing stochastic variable in the layout of filter element, and this becomes at random Amount operationally destroys regular pattern, and this regular pattern occurs due to this selection to arrange at filter element In.

In the layout of filter element, introduce stochastic variable can be included in the selection of the first deposition position Middle introducing stochastic variable, so that spacing bigger described on the direction of the first axle is at quilt in succession Change randomly between the pixel identified, and the selection of the second deposition position can include selecting second Deposition position is to meet the coverage criteria relevant to filter element.

This first deposition position can to multiple can excitation passage in the passage of independent actuation relevant, should Can the passage of independent actuation along the first axle by rough alignment, and be operationally configured to make optical filtering unit Part is deposited at the selected discrete deposition position relevant to described passage.

This can the passage of independent actuation can be provided by one of following: lasing source, it is operationally Be configured to produce multiple can the laser beam of independent actuation, this laser beam selectivity operationally makes filter Optical element material deposits at least one display base plate from filter donor sheet；And for inciting somebody to action Filter element deposits to the multiple inkjet heads at least one display base plate.

This second deposition position can and make between this display base plate and this digital imaging system with The side of described second axle rough alignment is upwardly formed relative displacement and is correlated with, thus contributes to described optical filtering Material is deposited at the selected deposition position arranged along the elongated row of the second axle extension.

This selection may further include introducing stochastic variable in the layout of filter element, and this becomes at random Amount operationally destroys regular pattern, and this regular pattern is due to the spacing between deposited adjacent position In occurring the filter element in the identified pixel on each display base plate to arrange.

Identify this pixel can be included in the plurality of pixel and identify randomly for receiving multiple coloured silk A kind of pixel in color filter, so that the filter element of each color obtained is randomly It is scattered on each display base plate.

This at least one display base plate can include at least two display base plate, and this deposition position can To include the first deposition position and the second deposition position, described first deposition position shows along at least two First axle of device substrate is by rough alignment, and described second deposition position is along at least two display base plate Second axle can be arranged along the second axle in succession by rough alignment, at least two display base plate, receives Orientation information can include receiving limit at least two display base plate each relevant multiple Pixel is relative to described first axle and the information of the setting of the second axle, and the method also includes: at least At least one in two display base plates, calculate on the direction of described first axle with the plurality of The side-play amount that pixel is relevant；Determine side-play amount can not be compensated by the selection of deposition position surplus Remaining part is divided, and controls digital imaging system and may include that and make at least two display base plate and numeral Relative displacement is formed in the direction of the second axis between imaging system；And by showing with at least one The remainder of the side-play amount that device substrate is relevant, makes digital imaging system relative at least two display Substrate resets on the direction of the first axle, shows at least two to position described digital imaging system Show deposition filter element material at least one of device substrate.

Make this digital imaging system reset can include when digital imaging system is at least two display Digital imaging system is made to reset during motion between substrate.

Make between at least two display base plate and this digital imaging system shape in the direction of the second axis The first time alternately made on the first direction being directed at the second axle leads to become relative displacement may include that Relative displacement and second time in a second direction that is opposite the first direction is formed by middle shape in crossing Become relative displacement, control this numerical value imaging system and may include that this digital imaging system of control so that sinking Long-pending filter on first be deposited at least two display base plate by period for the first time, And on second that second time was deposited at least two display base plate by period, make this number Word imaging system resets and can include when changing direction between passing through for the first time and passing through for the second time This digital imaging system is made to reset.

The more than two that this at least two display base plate can include arranging continuously along the second axle aobvious Show device substrate, control this digital imaging system and can include controlling this digital imaging system so that described filter Luminescent material is deposited in the display base plate of more than two display alternately for the first time by period On substrate, and it is deposited in the display base plate of more than two remaining aobvious in second time by period Show on device substrate, make the reset of this digital imaging system may further include and exist at this digital imaging system It is arranged at least two display base plate in display base plate alternately extremely by period for the first time It is arranged at remaining display base in display base plate by period between few one or in second time Time between plate, digital imaging system is made to be reset.

This at least one display base plate can be individually arranged in the substrate of this digital imaging system Install on surface, receive orientation information can include by telltale mark on each display base plate with Generate this orientation information.

The method can include making the selected pixels at least one display base plate be energized To show this labelling.

This at least one display base plate can include having the multiple aobvious of at least one public substrate layer Show device substrate, receive orientation information and can include by telltale mark at least one public substrate layer To generate orientation information.

Position this labelling can include making the photographing unit location relevant to this digital imaging system to gather Represent the view data of a part with this labelling at least one display base plate, and the method May further include this view data of process to determine the relative position of this labelling.

This deposition position can include the first deposition position and the second deposition position, this first deposition position Along the first axle of this display base plate by rough alignment, this second deposition position is along this display base plate Second axle by rough alignment, control this digital imaging system may include that alternately make with the second axle First time on the first direction of alignment is by middle formation relative displacement with the most contrary Second direction on second time by middle formation relative displacement；For the first time by period, make optical filtering Material is deposited at first group of selected deposition position, and in second time by period, makes optical filtering Material is deposited at second group of selected deposition position.

This first group of selected deposition position can include the selected deposition replaced along the first axle Position, and this second group of selected deposition position can include along the first axle remaining selected Deposition position.

The method can be included in this first time by this digital image system of chien shih passed through with second time Unite at the square upward displacement of the first axle.

According to another aspect of the present invention, it is provided that a kind of computer-readable medium, on it, coding has For guiding controller processor circuit to perform the code of any one method above-mentioned.

According to another aspect of the present invention, it is provided that a kind of display device, it has according to above-mentioned The filter element that a kind of method of anticipating is formed.

According to another aspect of the present invention, it is provided that a kind of digital imaging system, it operationally exists Filter is optionally deposited to be formed at least one display base plate at multiple deposition positions Filter element.This digital imaging system includes controller, and this controller is operationally configured to: connect Receiving orientation information, this orientation information limits setting of the multiple pixels relevant at least one display base plate Put, identify that the pixel by receiving filter is to form the unit that filters in this pixel in a plurality of pixels Part；In each identified pixel, select deposition position according to orientation information, thus meet and filter The alignment criteria that element layout in pixel is relevant；And control this digital imaging system so that filtering Material is deposited at selected deposition position.

According to another aspect of the present invention, it is provided that a kind of formation at least two display base plate The method and system of filter element, its use operationally optionally deposits at multiple deposition positions The digital imaging system of filter.This deposition position includes the first deposition position and the second deposition position Put, this first deposition position along the first axle of display base plate by rough alignment, this second deposition position Along the second axle of display base plate by rough alignment, this at least two display base plate is connected along the second axle Continuous setting.The method includes: receive orientation information, and this orientation information limits and each display base plate Relevant multiple pixels are relative to the first axle and the setting of the second axle；Identify in a plurality of pixels and will receive The pixel of filter is to form filter element in this pixel；According to orientation information each identified Pixel in select deposition position, thus meet and the filter element relevant alignment of layout in pixel Standard；And at least one display base plate, calculate on the direction of the first axle with multiple pictures The side-play amount that element is relevant.What the method also included determining this side-play amount can not be by the selection of deposition position And the remainder being compensated；Control this digital imaging system, so that described filter is by following Mode is deposited at described selected deposition position: make between display base plate and digital imaging system In passing through with the first time on the first direction of the second axle alignment and with first direction contrary the Second time on two directions forms corresponding relative displacement by middle；For the first time by period, make filter Luminescent material is deposited at least two display base plate on display base plate alternately, and in second time By period, filter is made to be deposited at least two substrate on remaining display base plate.The party Method farther includes when this digital imaging system is arranged in display base plate by period for the first time It is arranged at display by period between at least one in display base plate alternately or in second time Time in device substrate between remaining display base plate, make this digital image by the remainder of side-play amount System resets relative to display base plate.

According to another aspect of the present invention, it is provided that a kind of for forming filter element on substrate Method and system, this substrate is directed at display base plate to form display subsequently.The method includes: Substrate selects the position receiving filter to form filter element, in the layout of filter element Introduce stochastic variable, and form filter element in selected position.

According to another aspect of the present invention, it is provided that a kind of computer-readable medium, on it, coding has For guiding controller processor circuit to perform the code of said method.

According to another aspect of the present invention, it is provided that a kind of display device, it has according to above-mentioned side The filter element that method is formed.

According to another aspect of the present invention, it is provided that a kind of for forming optical filtering on display base plate The method of element.The method includes: in the multiple pixels relevant to this display base plate optionally Deposition filter is to form filter element, and is optionally exposed to by deposited filter The filter that LASER HEAT radiation is deposited with regulation.

Optionally deposition can include receiving radiation in response to from the controlled lasing light emitter of imaging, makes optical filtering material Material is transferred to display base plate from donor, and deposited filter is exposed to LASER HEAT radiation can be wrapped Include the radiation that deposited filter is exposed to the controlled lasing light emitter of imaging.

Make filter element be transferred to display base plate from donor to may include that for multiple donors, make filter Luminescent material is transferred to display base plate from donor, wherein deposited filter is exposed to LASER HEAT Radiation may include that when completing the material each transfer from multiple donors, by deposited filter Luminescent material is exposed to LASER HEAT radiation.

Optionally deposition filter can include controlling the controlled lasing light emitter of imaging to realize optical filtering material The deposition of material, is wherein exposed to deposited filter LASER HEAT radiation and can include display Substrate is exposed to the LASER HEAT radiation produced by the controlled lasing light emitter of described imaging.

Selectivity deposition filter element can include controlling the first controlled lasing light emitter of imaging to realize filtering The deposition of element, is exposed to deposited filter LASER HEAT radiation and can include display base Plate is exposed to the LASER HEAT radiation produced by the second controlled lasing light emitter of imaging.

The method can be included in and deposited filter is optionally exposed to LASER HEAT radiation The working strength that front change is relevant to lasing light emitter.

Deposited filter is exposed to LASER HEAT radiation source can include optionally showing The LASER HEAT that is partially exposed to deposited filter of device substrate radiates.

This filter element can include color filter element.

This color filter element can be included in the color filter element on reflective display substrate.

According to another aspect of the present invention, it is provided that a kind of computer-readable medium, on it, coding has For guiding controller processor circuit to perform the code of any one method above-mentioned.

According to another aspect of the present invention, it is provided that a kind of display device, it has according to above-mentioned The filter element that a kind of method of anticipating is formed.

According to another aspect of the present invention, it is provided that a kind of for forming optical filtering on display base plate The digital imaging system of element.This system includes controller, and this controller is operationally configured to make Obtain this digital imaging system: optionally deposition is filtered in multiple pixels relevant to this display base plate Luminescent material is to form filter element, and optionally deposited filter is exposed to LASER HEAT Radiate the filter deposited with regulation.

Description according to the specific embodiment below for the present invention combines accompanying drawing, common for this area For technical staff, other aspects and features of the present invention are apparent from.

Accompanying drawing explanation

Embodiments of the invention are described in following figure.

Fig. 1 is the perspective view of digital imaging system.

Fig. 2 is the aobvious of making in the digital imaging system according to a first embodiment of the present invention shown in Fig. 1 Show the plane graph of a part for device substrate.

Fig. 3 is the structure chart of the processor circuit embodiment of controller shown in Fig. 1.

Fig. 4 is the work that the processor circuit shown in Fig. 3 forms filter element on multiple display base plates Process flow figure.

Fig. 5 is the process chart of the part for receiving orientation information of the flow process shown in Fig. 4.

Fig. 6 is the floor map of the multiple display base plates shown in Fig. 1.

Fig. 7 is the enlarged drawing of two in display base plate shown in Fig. 6.

Fig. 8 is the process chart of the part for selecting deposition position of flow process shown in Fig. 4.

Fig. 9 be an alternate embodiment according to the present invention Fig. 6 shown in display base plate two Further enlarged drawing.

Figure 10 be an alternate embodiment according to the present invention Fig. 6 shown in display base plate three Individual schematic diagram.

Figure 11 is according to three in display base plate shown in Fig. 6 of another alternate embodiment of the present invention Individual schematic diagram.

Figure 12 is according in display base plate shown in Fig. 6 of the another alternate embodiment of the present invention Individual schematic diagram.

Figure 13 is the flow process that the processor circuit shown in Fig. 3 performs the deposited filter element of regulation Flow chart.

Detailed description of the invention

Digital imaging system

Seeing accompanying drawing 1, digital imaging system totally identifies with reference 100.This system 100 quilt It is configured to a flat panel imaging system, and it includes the pedestal 102 of a dimensionally stable, this size Stable pedestal 102 has smooth upper surface 104.

This system 100 also includes a pontic 106, and it is supported on pedestal 102.This pontic 106 Thering is provided stable support for an imaging head 108, this imaging head 108 is arranged on pontic, to realize it Motion on the first axle (being represented by arrow 110).In the embodiment shown, this system 100 is wrapped Include the first axle linear electric motors 112, these linear electric motors 112 be used for making this imaging head 108 along this first Any one direction motion of axle 110.These linear electric motors 112 farther include to provide position anti- The coding scale 114 of feedback, thus contribute to being accurately positioned and motor control of this imaging head 108.

This system 100 also includes one in order to erecting bed or the chuck of installing multiple display base plate 120 116, chuck 116 has flat mounting surface 118.In this embodiment, chuck 116 includes point Cloth is at the multiple ports installed on surface 118, when this installation surface 118 is coupled to vacuum generator During (not shown), it attracts display base plate 120 so that display base plate 120 and smooth peace Dress surface 118 is closely contacted.Reciprocal in order to realize on the second axle (being represented by arrow 124) Motion, this chuck 116 is supported on air bearing (not shown).Should in flat panel imaging system Second axle 124 is substantially orthogonal with this first axle 110, but this first axle and in certain embodiments Angle between two axles can not be 90 °.This system 100 farther includes for making chuck 116 exist The second axle linear electric motors 122 that any one side along the second axle 124 moves upward.This straight-line electric Machine 122 also includes encoding scale 126, and it provides the position feedback on the second axle with reciprocating Control.

In one embodiment, imaging head 108 includes a radiation source, and this radiation source is configured to carry For multiple light beams 128.This radiation source can be laser instrument, such as laser diode, and this imaging 108 may further include multichannel manipulator (not shown), each in this multichannel manipulator Individual passage is selectively excited so the plurality of light beam 128 of generation.

Although the embodiment shown in Fig. 1 is described as including the concrete of such as linear electric motors 112 and 122 Parts, but utilize other parts, such as electric rotating machine and ball screw mechanism or belt transmission dress Putting, this system 100 can also be implemented equally.Similarly, this chuck 116 can be to maintain static , and by imaging head is installed in frame the motion realizing this imaging head 108, this frame permits Permitted imaging head in the both direction motion being directed at axle 110 and 124.

In the embodiment shown in fig. 1, each display base plate separates with adjacent display base plate, And when being installed on chuck 116, it is likely that there are between these display base plates and can not ignore The difference of orientation, this difference needs to be eliminated in follow-up imaging process.In other embodiments, One or more display base plates 120 can be on single substrate or in being added as single substrate It is loaded on other carriers in this digital imaging system 100 processed.In such embodiments, aobvious Show that the registration between device substrate 120 can be the most accurate.

Each display base plate 120 includes that multiple labelling 134, the plurality of labelling 134 are arranged on this and show Show on the outer surface 130 of exposure of device substrate, in order to generation is positioned opposite with display base plate The orientation information being associated.This system 100 farther includes the photographing unit being arranged on imaging head 108 132, this photographing unit 132 is configured to gather the image of the labelling for generating orientation information.Because Photographing unit 132 is installed on imaging head 108, and then photographing unit 132 starts shipment with imaging head 108 1 Dynamic, being accurately positioned again by the coding scale 114 being associated with linear electric motors 112 of photographing unit Realize.Such that it is able to the image processing the labelling 134 gathered by photographing unit 132 is each aobvious to determine Show the relative orientation of device substrate 120.Relative between multiple imaging beams 128 and photographing unit 132 Orientation can be by using one or more imaging beams 128 at the test table being installed on chuck 116 Make target characteristic on face to determine.The image of this target characteristic can be acquired and processed subsequently with really Being scheduled on the relative displacement between imaging beam 128 and photographing unit 132, this relative displacement can be made It is saved for calibration value.

In the embodiment shown, each display base plate 120 includes three labellings 134, these marks Note 134 can be indicated on this display base plate in procedure of processing above.Alternatively, exist In some embodiments, this display base plate 120 includes reflective display picture element, and this reflection-type shows Device pixel can work, the selected pixels on each display base plate can be energized with Show this labelling, and then this display base plate is no longer necessary to include the aforesaid labelling being labeled.Such as, In other examples, this labelling can include the physical features of this display base plate, such as with spy A part for the TFT element that fixation element is relevant.In each in the embodiment of these labellings, aobvious Show the labelling on device substrate 120 to be arranged to relative to display picture element 200 and there is known fixing pass System, and then known to combination, Pixel Dimensions and structure can provide each pixel about the phase of this labelling To position.Generally, the pixel 200 of display base plate uses photoetching process to be formed, between it can provide Every be orientated point-device pixel 200 and labelling 134.

In some embodiments, it may be possible to be necessary to provide generally normal to this first axle 110 and second Motion on 3rd axle of axle 124, to eliminate the multiple display that this system 100 can be utilized to process The difference of the thickness between substrate.Imaging optic element for utilizing high-NA is multiple to be formed The imaging head 108 of imaging beam 128, this imaging head is it may be necessary to use autofocus system to be used for The focusing of light beam is maintained in the whole imaging region of system 100.In this case, the 3rd axle Adjust for ensureing that autofocus system is able to maintain that focusing is probably important.

In one embodiment, for forming the optical filtering of filter element on multiple display base plates 120 Material is illustrated in FIG with a part for donor sheet this donor sheet of 150() form be provided. Donor sheet 150 includes the filter being arranged on supporting layer (such as mylar).In order to strengthen When being exposed to the radiation of light beam 128, filter also may be used to the transfer of display base plate, donor 150 To include the releasing layer being arranged between filter and supporting layer.Such as, in order to form colorized optical filtering Element, filter can include multiple colorant, the most red, green and blue colorant, or green grass or young crops Color, magneta colour and yellow colorant.Other colorant is equally added in multiple colorant.Such as, As the colorant of yellow colorant can be added in redness, green and blue colorant improve display Colour gamut.In this case, different donors 150 can be installed respectively and imaging completes colour The deposition process of filter element.Thermal transfer for body technique be commercially used in printing industry, And such as FujiWith Kodak Approval^TMSome donor medium can be used in make number The color proof of word image.The most suitable donor 150 will comprise and be adapted to provide for having institute's light requirement transmission The colorant material of the color filter element of characteristic.

Although reference is configured to the deposition of the color filter element of the specific lambda1-wavelength of transmission generally Describe these embodiments, but, this filter element can with same purpose with change incident illumination other Character.Such as, this filter element can include the polarizing materials that is deposited in the pixel of selection so that thoroughly Penetrate the light polarization by this filter element.Other examples of the filter element that can deposit include that interference filters Device or anti-glare light filter.

As described above, in the embodiment shown in fig. 1, this imaging head 108 is multichannel imaging Head, the multiple imaging beam 128 towards donor sheet 150 orientation of its generation, this donor sheet 150 covers The outer surface 130 of the exposure of display base plate 120.By roll marks donor material, this donor 150 can To be applied to be in close contact with display base plate 120, and it is distributed in installation surface by putting on The vacuum of the multiple ports on 118, it is ensured that this donor 150 is in proper position.Surface is being installed Multiple port on 118 is divided into edge of substrate port area and donor port areas, these regions It is connected with single vaccum circuit to allow when donor 150 is applied in, it is ensured that display base plate 120 It is in correct position.At donor by roll marks to being in close contact position with multiple display base plates 120 During or after, this donor areas port will be activated to guarantee that donor is in proper position.

This system 100 farther includes a controller 140, and this controller 140 is operationally joined Put to control the operation of this digital imaging system.This controller 140 includes for controlling imaging head respectively 108, linear electric motors 112, and the control signal input/output end port 142,144 of linear electric motors 122 With 146.In order to control the function of the imaging system of vacuum generator, donor installation and other necessity, Other signal output part (not shown) can be set.In the embodiment shown, according to being stored in control View data in device processed, this signal port 142 produces for the signal controlling imaging head 108 to adjust Make selected light beam in multiple imaging beam 128.Such as, this view data can be with such as labelling The form of the image file of picture format (TIFF) file stores.

The imaging of this thermal transfer donor may need this imaging head 108 to be configured to produce wavelength and power Be enough to the infrared light causing colorant from donor 150 thermal transfer to display base plate 120.A kind of suitable Imaging head 108 be Rochester, New York Eastman Kodak produce ThermalImaging head.Although the various embodiments disclosed in the present invention are all to supply with reference to thermal transfer The imaging of body describes, but other are for the imaging technique of filter transfer, and such as ink-jet turns The transfer of print, ultraviolet, the laser explosure of chromatic photoresist material or other method, equally can also be by Implement on display base plate 120, form filter element.

In the operation of this system 100, when imaging head 108 is according to the signal port from controller 140 When the view data that 142 receive modulates multiple imaging beam 128, controller 140 makes chuck 116 Move along the second axle 124.In one embodiment so that this chuck 116 is with about 2m/s's Speed is traversing.The relative motion produced between chuck 116 and imaging head 108 makes multiple imaging Bundle 128 goes out the width having and the multiple light beams 128 produced by imaging head 108 along the second imaging shaft The suitable elongated row (being illustrated as dotted outline with 136) of width.In one embodiment, become As 108 224 imaging beams of generation, these beam spacing 10.6 μm, and then create one The elongated row of 2.374mm width.

Pass through for the first time traversing by multiple display base plates 120 once this chuck 116, control Device 140 makes linear electric motors 122 be decelerated to chuck 116 stop, and makes the traversing of chuck 116 Direction is reverse.When chuck 116 slows down, linear electric motors 112 move imaging head 108 and cross one carefully The width (that is, crossing 2.374mm in the above-described embodiments) of long line, and with elongated row 136 It is logical in second time that the imaging of another adjacent elongated row (not shown in figure 1) starts from chuck 116 Return when crossing substrate 120 is traversing.Correspondingly, in described exercisable embodiment, at card Dish 116 every time by time imaging go out elongated row.But, in other embodiments, may Need staggered mode imaging described below.In this case, linear electric motors 112 can move Imaging head 108 crosses the distance less than an elongated column width, so that the elongated row of imaging next time At least partly overlapping with these the most imaged elongated row.

Being moved into as going out continuous print across multiple display bases of the traversing and imaging head 108 of chuck 116 The elongated row of plate 120, contribute to depositing filter at multiple deposition positions.For the one-tenth having As having the imaging head 108 of constant spacing between the light beam of light beam 128, corresponding deposition position is limited It is scheduled on the multiple dispersed locations on the direction of the first axle 110.But, in the reality of above-mentioned photohead Execute in example, this light beam 128 on the direction of the second axle 124 traversing by display base plate 120 and Correspondingly the deposition on this axle can occur comparing with the region provided in the first axle 110 direction Bigger or less region.With KodakAs a example by imaging head, this light beam 128 can To have a substantially rectangular cross section, it extends about 10.6 μm at the first direction of principal axis 110, and Second direction of principal axis 124 only extends about 1-2 μm.In this case, on the second direction of principal axis 124 Deposition position can be controlled as filtering than bigger precision deposition possible on the first direction of principal axis 110 Material.

In the embodiment shown in fig. 1, chuck 116 is traversing on the direction of the second axle 124 passes through base The upper surface 104 of seat 102, and imaging head 108 only moves upward in the side of the first axle 110.At it In his embodiment, chuck can be static with opposite base 102, and pontic 106 can be arranged on directly To realize the imaging head 108 transverse motion on the first axle 110 and the second axle 124 on trajectory.

Under many circumstances, the display base plate 120 that it will be formed with filter element is rigidity. But, even if the display produced will be flexible display, very widespread practice is will so Flexible display process this flexible display when being installed on the rigid carrier removed subsequently.Real at other Executing in example, flexible display substrate can be configured to just be adapted to mount to a cylindrical drum surface On, in this case, the imager of drum type pedestal can be with the flat-panel imager shown in alternate figures 1. Flat panel imaging system shown in FIG is equally used for processing flexibility substrate.

Display base plate

The display base plate part of in display base plate 120 one is the most more specifically shown Shown in 138(Fig. 1).With reference to Fig. 2, this display base plate part 138 includes multiple pixel 200, Multiple pixels 200 in this embodiment are reflective display picture element, so arrive down in response to offer The pumping signal of layer driver (not shown), incides ambient light in pixel from being reflected by the pixel State changes into the state absorbed by pixel.

In the particular embodiment shown, pixel 200 includes: first group of pixel, shape in this pixel Become to have green filter element 202；Second group of pixel, is formed with blue filter element 204 in this pixel； With the 3rd group of pixel, it is formed with red filter element 206 in this pixel.Uncovered additionally It is formed without color filter element in four groups of pixels 208.Color filter element 202-206 and not being coated to The pixel 208 of lid is operable to generate reflected image, wherein, from first, second, and third group of picture The light of element reflection is that the image produced provides chrominance component, and uncovered pixel 208 provides more Bright display.So, owing to containing uncovered pixel 208, such it is arranged on reduction Traded off between colour gamut and display brightness of image.In the embodiment shown, each colorized optical filtering unit Part 202 206 only covers a part of region relevant to each capped pixel 200, and part Region 210 is still that uncovered.This uncovered region 210 and uncovered pixel 208 Having same function, wherein this uncovered region improves the brightness of reflective display.Due to The deposition that these uncovered regions reduce filter element material surmounts the scope of related pixel 200 And extend to the probability in neighbor, therefore this uncovered region 210 also relaxes and filters Optical element 202-206 arranges relevant tolerance.Various other color filter element 202-206, The arrangement in uncovered pixel 208 and uncovered region 210 can be used for manufacturing reflection Escope.Such as, some embodiments can be omitted uncovered pixel 208, and increase not Capped region 210.Similarly, other embodiment fully can cover each with filter The area of pixel, and rely on uncovered pixel 208 to produce required display brightness.

Although as in case of a transmissive type display, the chromatic filter energy of reflective display Enough manufactured on single substrate, but color filter element can also be straight by digital imaging technology Connect and be formed in reflective display picture element.The digital image of chromatic filter includes using digital image Colorant is transferred on other mono-color reflective escope Systematic selection.

Non-reflective display, such as LCD display, typically requires that pixel light emission region is all filtered Luminescent material covers, the black matrix" on these areas but non-luminous region of pixel is generally blocked Material is covered.In such internal display producing luminous flux, brightness can be carried on the back by increase Intensity of illumination increases, and therefore compared to reflective display, display brightness may less be concerned.

No matter the type of display, the layout of filter element should be enough accurate, less desirable to avoid Effect, such as neighborhood pixels are partly covered by adjacent filter element, or can not cover enough Elemental area.Arrange that the deficiency of accuracy is also possible to cause less desirable image artifacts, this image artifacts It is that eyes are visible and its detraction is by the picture quality of the display generation obtained.Especially, people The eyes of class are the most sensitive for regular pattern, and this regular pattern can be arranged by color filter element Error causes.

In one embodiment, the pixel 200 on reflective display can have in about 90 μm Size between 220 μm, and the area coverage of color filter materials can account for elemental area About 60% to about about 100%.

When the multiple display base plate 120 of imaging, yield is an important Consideration and wishes Process multiple display as shown in Figure 1.The multiple display base plate of imaging simultaneously 120 decreases The time overhead relevant to display base plate 120 and the loading of related donor sheet 150 and unloading.With often Secondary imaging single substrate is compared, and imaging simultaneously also reduces and subtracts at each traversing end with chuck 116 Speed, the expense that reversion chuck motion direction is relevant with again speeding up image taking speed.

Kept the embodiment connected by common carrier or substrate layer at multiple display base plates 120 In, skew and the rotation of the pixel of each display base plate should be directed at substantially.But, at other In embodiment, even as it is shown in figure 1, initially as a bigger base supporting multiple display A part for plate is processed, and each display base plate 120 is also to separate, it is thus possible to have respectively The difference can not ignore in orientation between individual display, due to the pixel on a display base plate May not be directed at the pixel on other display base plate so that be suitable to imaging axis right of pixel orientation Quasi-complication.

Correspondingly, it is often impossible to filter element 202-206 is all of many to select one ensure that All in the imaging starting position of correct layout on individual display base plate.This error may be significantly Depend on the relative alignment between each substrate, and do not eliminate this species diversity and may cause filter element Obvious placement error relative to the pixel of display base plate.Additionally, display base plate 120 also may be used To rotate about axle 110 and 124, this will introduce extra placement error.

Digital imaging system controller

See Fig. 3, in one embodiment, this controller 140 can use one overall with 300 The processor circuit presented.This processor circuit 300 include microprocessor 302, program storage 304, Alterable memory 306, media reader 308 and input/output port (I/O) 310, all above Part all communicate with microprocessor 302.

Program code for guiding microprocessor 302 to implement various function is stored in program storage In 304, this program storage may be implemented as random-access memory (ram), hard drive Device (HDD), nonvolatile memory such as flash memory, or combinations of the above.This program storage Including for guiding microprocessor 302 perform the first program code block 320 of operation system function and use The imaging function of this digital imaging system 100 is controlled thus at multiple display in guiding this microprocessor The second filial generation code block 322 of filter element is formed on substrate 120.

This media reader 308 contributes to from computer-readable medium 312, program code is loaded into journey In sequence memorizer 304, such as, this computer-readable medium 312 be such as CD read-only optical disc 314, Flash memory 316, or the computer-readable signal 318 received such as by network.

I/O310 includes control signal input/output end port 142.I/O310 also includes: motor drives Device 380, this motor driver 380 has the control port for controlling the first axle linear electric motors 112 144；With motor driver 382, this motor driver 382 has for controlling the second axle linear electric motors The control port 146 of 122.I/O310 can include extraly for controlling digital imaging system 100 Other outfans of other functions and/or input, the work of described function for example, photographing unit 132 Work, the loading of donor 150, the vacuumizing etc. of chuck 116.

Alterable memory 306 includes multiple storage position, and the plurality of storage position comprises for storing aobvious Show device substrate and pixel value orientation information storage 350, for storage about with display base plate 120 The display configuration storage 352 of the value of relevant pixel configuration, the storage 354 for storage arrangement threshold value, With the digital mask storage 356 for storing deposition position mask value.Alterable memory 306 can be by It is embodied as such as random access memory, flash memory or hard disk drive.

In other embodiment (not shown), controller 140 can be by partly or wholly profit Realizing with hardware logic electric circuit, this hardware logic electric circuit such as includes discrete logic and/or special Integrated circuit (ASIC).

Form filter element

See Fig. 4, illustrate generally a flow chart with 400, the flowchart depicts for guiding place Reason device circuit 300 uses this digital imaging system 100 to form optical filtering on multiple display base plates 120 The module of the code of element.This module generally represents can be by from computer-readable medium 312 Reading and be stored in the code in program storage storage 322, this code is used for guiding micro-process Device 302 performs the various function relevant with deposition filter element material on display 120.In order to reality The actual code of existing each module can use the most suitable programming language, such as, C, C++ And/or assembly code.

This flow process 400 is by module 402, and this module 402 guides microprocessor 302 to receive orientation Information, this orientation information defines setting of the multiple pixels 200 relevant to each display base plate 120 Put.

Hereafter this flow process continues from module 404, and this module 404 guides microprocessor 302 at multiple pictures Element 200 identifying, the pixel by receiving filter is to form filter element in identified pixel 202-206.In one embodiment, module 404 guides microprocessor 302 from alterable memory 306 Display configuration storage 352 in read pixel configuration information.In many examples, multiple display Substrate 120 will be configured equally, and configuration (that is, the size of pixel, quantity and the cloth of pixel Office) also can be identical.In other embodiments, different configuration of display base plate 120 is permissible The most processed, in this case, for each display base plate 120 from display configuration storage Read pixel configuration information in 352.Which the pixel configuration information read from storage 352, identifies Individual pixel (i.e. the pixel groups being provided with filter element 202-206 in Fig. 2) will receive correspondence Color filter materials, and filter element and/or uncovered region can be limited further The size of 210.Such as, pixel configuration information can as include identify pixel coordinate file and Stored.

It follows that module 406 guides microprocessor 302 according to the orientation letter received in module 402 Breath selects deposition position in each identified pixel.In one embodiment, as in detail below As Miao Shuing, the selection of deposition position need to meet with filter element 202-206 in pixel 200 Arrange relevant alignment criteria.It is each that module 408 can guide microprocessor 302 to identify further The digital mask value of the selected deposition position of filter element is saved in the numeral of alterable memory 306 In mask storage 356.Digital mask can as such as bitmap file, tiff file or other fit When the image file of file format stored.

It follows that this flow process 400 is continued by module 408, this module 408 guides microprocessor 302 Read the digital mask value in digital mask storage 356, and at port 142,144 and 146 Generate control signal so that filter element is deposited at selected deposition position, as above for numeral The description of imaging system 100.Swashed corresponding to the one or more of selected deposition position by excitation Light beam and make imaging head 108 respond.

In the embodiment of the flow process 400 shown in Fig. 4, module 404 and 406 can be in module 408 In the step starting to deposit filter element material before complete.But, in other embodiments, Module 408 can start before module 404 and/or module 406 complete.

Receive orientation information

Fig. 5 shows in detail the module 402 for receiving orientation information shown in Fig. 4 with 402 Flow process.See Fig. 5, each display base plate in multiple display base plates 120 is carried out Flow process 402.This flow process is from the beginning of module 500, and this module 500 guides microprocessor 302 to generate control Signal processed make photographing unit 132 position with gather show each display base plate 120 there is labelling 134 The view data of part.

Fig. 6 shows the floor map of display base plate 120.See Fig. 6, an embodiment In, it is mounted with that 9 independent display base plates are to process in digital imaging system 100 simultaneously.One For as, display base plate 120 can be installed in framework (not shown in figure 1), and this framework will Each display is oriented relative to the first axle 110 and the second axle 124 is substantially orthogonal, the first axle 110 It is defined as imaging head 108 and the direction of chuck 116 motion with the second axle 124.In figure 6, should Framework is represented by dotted line 608-612 and 614-618, which show the pass of multiple display base plate 120 Setting needed for axle 110 and 124.

In general, the display picture element 200 on display base plate 120 can pass through photoetching process Formed, process provides the pixel 200 with precise intervals and orientation.But, general subsequently Display base plate is divided into the cutting of independent display base plate 120 may cause pixel 200 opposing substrate The slightly misalignment at edge.Compared between Pixel Dimensions and/or the deposition position that provided by imaging head 108 Spacing, the registration (if provided that) of framework may also be coarse.Then, Duo Gexian Show that the second display substrate 604 in device substrate 120 has the relevant setting about axle 110 and 124, That includes side-play amount D relative to line 614₁, relative to side-play amount D of line 610₂And the anglec of rotation Degree θ.In figure 6, such misalignment, the such as size of pixel 200 are for the sake of clarity amplified. In practice, this misalignment may be small enough to for bore hole inconspicuous, but if does not entangles Just, it be enough to the most inaccurate to the layout causing at least some filter element 202-206.Additionally, it is real The display on border is compared with the display shown in Fig. 6, and Pixel Dimensions is the most much smaller, and number is the most more Many.

It follows that this flow process is continued by module 502, this module 502 guides microprocessor processes image To determine each labelling 134 coordinate (x over the display₁,y₁), (x₂,y₂) and (x₃,y₃).Such as, The first labelling 134 above the right side of the first display base plate 602 in multiple display base plates 120 Coordinate (x₁,y₁) it is shown as the coordinate of coordinate system that reference axis 110 and 124 limits.

It follows that module 504 guides the D of microprocessor 302 calculation display substrate₁、D₂And θ It is worth, and module 506 guides microprocessor this value to be stored in shown in alterable memory 306(Fig. 3) Orientation information storage 350 in.See Fig. 6, in this embodiment, D₁Value be calculated as each The first labelling on display base plate is from the side-play amount of line 614, as shown in display base plate 604.Class As, D₂Value be calculated as first labelling side-play amount from line 610.In this embodiment, each Right side overlay mark that the angle, θ of display base plate is defined as on display base plate 604 and right side The line extended between the labelling of lower section is relative to the angular deviation of the second axle 124.And then, this angle, θ by Given below:

$\mathrm{\θ}=\arctan \left[\frac{x_2-x_1}{y_2-y_1}\right]$ Equation 1

Wherein, (x₁,y₁), (x₂,y₂) it is each of labelling above and below the right side as determined in module 502 From coordinate.It follows that module 506 guides microprocessor 302 that this value is stored in alterable memory In the orientation information storage 350 of 306.

Select deposition position

After module 402 and 404 in performing this flow process 400, it is stored in alterable memory 306 Orientation information storage 350 and display configuration storage 352 in information be easy to calculate with each show The relevant multiple pixels 200 of device substrate 120 are relative to the first axle 110 and setting of the second axle 124. Two display base plates 602 and 604 illustrate with zoomed-in view in the figure 7.With reference to Fig. 7, by imaging The 108 elongated row of imaging 136 produced are shown as being superimposed upon on display base plate 602-604, and And include multiple deposition position 700.In this embodiment being described, imaging head 108 is configured to Second direction of principal axis is formed 24 deposition positions.Deposition position 700 shown in Fig. 7 is shown as There is the close width on the first axle 110 and the length along the second axle 124, but real at other Executing in example, the width of the first axle and the length of the second axle can be different.Due to imaging head 108 Motion with chuck 116 defines the first axle 110 and the second axle 124, the most elongated row 136 and One axle and the second axle alignment.

For selecting along the first axle 110 shown in module 406(Fig. 4 of deposition position in first embodiment) Flow process represent with 800 in fig. 8.Seeing Fig. 8, this flow process 800, should from the beginning of module 802 Module 802 guides microprocessor 302 to store from the threshold value of alterable memory 306 and reads layout 354 Threshold value.This layout threshold value represents the filter element layout relative to the border of identified pixel 200 Tolerance.It follows that module 804 guides microprocessor 302 to read display from storage 352 The configuration information of substrate 602.It is aobvious that module 804 also guides microprocessor 302 to read from storage 350 Show the orientation information of device substrate 602.

It follows that this flow process 800 is continued by module 806, this module 806 guides microprocessor 302 The border of first identified pixel 702 is relative to heavy to use configuration information and orientation information to determine The setting of long-pending position 700.This orientation information provides D₁、D₂With the value of θ, these values combine should The pixel configuration of display base plate can calculate each pixel on display base plate relative to first Axle 110 and the position of the second axle 124 and border.

It follows that module 808 guides microprocessor 302 to select deposition position, this deposition position will make First filter element 710 is arranged in the position of approximate centre in pixel boundary.See above Fig. 7, institute The first filter element 710 shown covers 16 deposition positions, and along the first axle 110 and pixel limit Boundary is inwardly generally isolated and opens about deposition position.Module 808 guides microprocessor 302 further The numeral that the selected deposition position of the first filter element 710 is saved in alterable memory 306 is covered In mould storage 356.

It follows that flow process 800 is continued by module 810, module 810 guides microprocessor 302 to calculate The layout of the second filter element 712 makes the first axle deposition position phase of itself and the first filter element 710 With, thus processing is along the identified pixel 704 of the next one of the second axle 124.In the embodiment shown Calculate the layout deviation value at the center on the border relative to the second pixel 704 of filter element 712.

Subsequently, module 812 guides microprocessor 302 to determine the layout deviation of the second filter element 712 Whether meet alignment criteria, include in this case determining that whether this deviation value is less than or equal at mould The threshold value read at block 802.If at module 812, meet this alignment criteria, then this stream Journey is continued by module 814, and this module 814 guides microprocessor 302 by the second filter element 712 Selected deposition position is saved in digital mask storage 356.Subsequently, this flow process is by module 816 Continue, this module 816 guide microprocessor 302 to determine filter element all of for substrate 602 is No it is arranged.In this case, still will be by due to other filter element 714 and 718 Arrange, so module 816 guides microprocessor 302 return to module 810 and add in the same way Work the 3rd pixel 706.

In example shown in the figure 7, the 3rd pixel 706 also meets alignment criteria, therefore identifies The digital mask value of selected deposition position is saved to the digital mask storing in 356.Work as module When the alignment criteria of 812 is satisfied, first three filter element 710-714 is on display base plate 602 Filter element be arranged on the direction of the first axle 110 and be moved to the left continuously.

If alignment criteria is not satisfied at module 812, then this flow process is continued by module 818, This module 818 guides microprocessor 302 to make the layout of filter element move one along the first axle 110 Or multiple deposition position, make the center that filter element returns to approximately in pixel along the first axle 110. See above Fig. 7, in the embodiment shown, the 4th pixel 708 alignment criteria at module 812 It is not satisfied, and the layout of the 4th therefore shown filter element 716 retracts one along the first axle First axle deposition position.Subsequently, this flow process 800 is continued by module 818, and this module 818 guides micro- Processor 302 to module 816, module 816 guides microprocessor by the quilt of the 4th filter element 716 The deposition position selected is saved in digital mask storage 356.

In the embodiment shown by Fig. 7,24 deposition positions formed by imaging head 108 are permitted Permitted two row filter elements to deposit simultaneously, thus this flow process 800 can be performed to generate at this one-tenth As arranging the digital mask value of extra element 718-722 in elongated row 136.Similarly, this flow process 800 will be performed the elongated row (not shown) forming continuous print along the first axle 110, thus be formed Cover the digital mask value of all of pixel 200 relevant to display base plate.In the reality shown in Fig. 7 Executing in example, filter element 710-722 corresponds to the green filter element 202 shown in Fig. 2, and separately The deposition position of outer filter element 204 and 206 can be likewise by performing same flow process 800 It is chosen.

If all of filter element of display base plate 602 is arranged at module 816, then Module 816 guides microprocessor 302 to module 820, module 820 to guide microprocessor 302 to process Next display base plate, this next one display base plate is display base plate 604 in this case. Module 820 guides microprocessor 302 to return to module 804 subsequently, reads display at this module 804 The display configuration information of device substrate 604 and orientation information.All have at all substrates 120 and similarly configure Embodiment in, read configuration information step can be omitted.Module 806 guides micro-process again Device 302 uses configuration information and orientation information to determine, and the first identified pixel 702 is relative to deposition The setting on the border of position 700.As for substrate 602, orientation information provides D₁、D₂With the value of θ, This makes it possible to calculate on display base plate each pixel relative to the first axle 110 and the second axle 124 Position and border.See Fig. 7, display base plate 604 will receive filter element 728 First identified pixel 726 of deposition is further along the first axle 110 left shift.This In the case of, filter element 728 offset as shown in 730 from the beginning of elongated row 136, and this Side-play amount is than the side-play amount 732 relevant to the first filter element 710 on display base plate 602 more Greatly.Therefore, this flow process 800, by selecting deposition position, eliminates display base plate 602 and 604 Between difference on relative orientation.Once all substrates in multiple display base plates 120 are the most Through processed, this flow process 800 is terminated.

Due to the difference of the orientation of display base plate 602 and 604, for each identified pixel 702-708 selects deposition position 700 to be encouraged to make color filter element 710-716 in pixel Layout consecutive variations.

In one embodiment, respective size based on pixel 702-708 and filter element 710-722 Required covering, the threshold value being stored in storage 354 can be determined in advance.Such as, if depositing position Spacing between putting is 10.6 μm, and pixel size on the first direction of principal axis is 70 μm and by filtering Optical element covers the elemental area of 60%, then this threshold value can be set to about 5 μm.Therefore, Once filter element reaches 5 μm relative to the deviation at center, and filter element is just by along the shaft towards pixel Center moves back 10.6 μm.In other examples, spacing between deposition position, pixel Size and/or filter element cover the area of pixel can be more smaller or greater than above-mentioned value and permissible Correspondingly select threshold value.For example, with reference to Fig. 2, this threshold value can be chosen as with pixel 200 not by The region 210 covered is proportional.In one embodiment, this threshold value can be the most selected Select: distribute an initial threshold, utilize this selected initial threshold to process more than one display Substrate, the imaging artefacts of display that then inspection institute obtains or other defect.Can use subsequently Different threshold values repeats this flow process, until obtaining a required result.

In the embodiment shown in fig. 7, along the second axle 124 deposition position interval with along the The interval of the deposition position of one axle 110 is identical, and therefore similar to flow process 800 flow process can be by Implement to select deposition position along the second axle.In other embodiments, the deposition position of the second axle Deposition position interval that can be more axial than the first is tightr.

See above Fig. 2, in the example of shown display base plate, blue filter element 204 quilt It is set to adjacent with green filter element 202.Perform this flow process 800 so that filter element 204 There is identical continuous dislocation therefore there is the arrangement pattern of corresponding rule, and such pattern can To strengthen the pattern being already present in during filter element 202 is arranged.Therefore, in a second embodiment, This flow process 800 could be implemented such that being arranged in multiple color filter materials of filter element 204 Various between change, thus destroy the reinforcement of any regular pattern of generation.In some circumstances, Such change can also weaken the effect that this pattern is relevant to color filter element 202, because totally Pattern frequency may be increased thus lower the eyes of user and distinguish the ability of obtained pattern.This The change of sample can be by carving some filter element from common center position in pixel coverage Meaning ground offsets and is introduced into, and so this continuous print displacement result in the layout of filter element 204 Pattern shift.Same skew can also be employed in the layout of red filter element 206.

In the 3rd embodiment of the flow process of the module 406 shown in Fig. 4, an extra step is permissible It is added in this flow process 800, to introduce a random change in by the threshold value read in module 802 Amount.For the combination at the interval of some pixel sizes, the coverage rate of filter element and/or deposition position, The continuous moving performing the filter element layout that the flow process 800 shown in Fig. 8 can occur will cause the unit that filters Regular pattern in part layout, the eyes of the mankind are very sensitive to this as described above.Due to The continuous moving of the layout of filter element and the relevant movement produced when performing this flow process 800, threshold The stochastic variable of value will destroy the regular pattern occurred in filter element is arranged.An embodiment In, this stochastic variable can be set to proportional to this threshold value, such as, is 5 μm for threshold value Situation, this stochastic variable is ± 40% or ± 2 μm, this therefore can make arrange threshold value from one group of bag Include in the threshold value of 3 μm, 5 μm and 7 μm and be selected randomly.Can be based on relevant to operating system Connection random number generator generate random digit and realize this random choosing from one group of threshold value Selecting, it is by first module of the program code 320 of the program storage 304 shown in Fig. 3 Operating system code performs.

This second and third embodiments described above can also be combined application, thus for different coloured silks Color filter element 202-206 offset pattern the most also introduces random change in the layout of filter element Amount, thus destroy contingent arrangement pattern extraly.Alternatively, shown in Fig. 4 at this stream At the module 404 of journey 400, identify that the pixel receiving filter element can include identifying randomly many Individual pixel 200 receives a kind of pixel in multiple color filter materials.In this embodiment, The filter element of each color obtained will be scattered on each display base plate randomly, from And destroy owing to issuable pattern arranged by filter element.The position of this randomized filter element will Need to be supplied to the display driver relevant to display base plate so that for each corresponding colored filter Optical element can encourage correct pixel.

Although the stochastic variable in filter element is arranged is by module 802 in this embodiment The threshold value that place reads introduces a stochastic variable and completes, but in other embodiments, so Random arrangement variable can be introduced into other positions in this flow process 800.Such as, module 808 Microprocessor 302 can be guided to introduce the random value independent of threshold value.Other the reality being described herein as Executing and can also introduce a random arrangement variable in example to destroy regular pattern, this regular pattern occurs to exist During filter element in above-mentioned identified pixel on each display base plate is arranged.

Similarly, the most in certain embodiments, filter element will be formed on glass substrate or example On other substrates of plastics, this substrate is directed at display base plate subsequently, and color filter element is permissible Utilize the system 100 shown in Fig. 1 to be formed or can utilize replacement such as photoetching for forming filter The technique of optical element is formed.In further processing steps, filter element described herein is arranged In the introducing of stochastic variable can be used to destroy regular pattern, this regular pattern is likely being formed at Filter element on glass substrate occurs punctual with display.Such pattern may be by filter element Misalignment between substrate and the underlying pixels of display and cause.When glass colour light filter is placed on During the top of display, stochastic variable can operationally destroy by color filter element and display The pattern that deviation of the alignment between pixel causes.Such pattern can be by display picture element and the unit that filters Aliasing between two patterns of part causes, as colored optical filtering substrates and display base plate are connected to each other Time presented as.This stochastic variable can help reduce such pattern and relax alignment precision Requirement.

The reset of digital imaging system

In above-mentioned flow process 800, when the processing of the first display base plate 602 starts, imaging head 108 Can be positioned along the first axle according to the orientation information read at module 804, so that elongated row 136 It is aligned, to deposit filter element in pixel 702-708 on display base plate and other pixels Material.Such alignment can provide at the first axle linear electric motors 112 and relevant coding scale 114 Precision in be done.In one embodiment, arrange accuracy can be about ± 3 μm and Code distinguishability can be less than ± 1 μm.Therefore, module 808 can include determining that and apply this right Accurate extra step.But, when processing not accurately being directed at display base plate 602 subsequently When display base plate compares display base plate 604 as shown in Figure 7, these elongated row are likely not to have optimally It is directed at the pixel of second substrate.Although skew 730 can correct some between substrate 602 and 604 The deviation of alignment, but still can at least half of residue of spacing between remaining adjacent deposition position Side-play amount.

See Fig. 9, in an alternative embodiment of this flow process 800 shown in Fig. 7, at display After depositing filter element on substrate 602, be equivalent to remain by being upwardly formed in the side of the first axle 110 The thin tail sheep 900 of remaining side-play amount, imaging head 108 can be reset.Deposition process at filter element In, this photohead 108 is shifted on the direction of the second axle 124 relative to substrate, and by multiple Position imaging head 108 eliminates the residual migration caused by the elongated row of imaging 136, thus forms one The elongated row of imaging 902 of skew.Thus the elongated row of imaging 902 offset by and sink less than or equal to adjacent The distance of the half of spacing between long-pending position, and be directed at the pixel 726 of display base plate 604.

In order to accelerate the speed of filter element deposition in digital imaging system 100, at the second direction of principal axis On speed may be about 2m/s or bigger.For the 20mm between display base plate 602 and 604 Spacing, the time being available for displacement is about 10 milliseconds, therefore in view of the phase of linear electric motors 112 Closing stabilization time, the skew for 5 μm on the first direction of principal axis needs about 0.2m/s²Acceleration Degree.This acceleration and for eliminating the whole deviation institutes between the skew 730 and 732 shown in Fig. 7 The acceleration needed is compared and be may differ by relatively greatly, and the latter may be much larger.In some cases, display Between substrate, the difference of orientation is likely to be breached 1mm, above-mentioned under conditions of only by reset imaging head 108 Correct this difference and would require about 40m/s²Acceleration.Correspondingly, the reality of the flow process shown in Fig. 9 Execute example and provide one when correct arbitrary residual migration by making imaging head move to lesser extent Amount offsets the combination of digital mask simultaneously, and owing to requiring relatively low to the acceleration of the first axle, it can be more easy to In realization.

The above-described embodiment described in conjunction with Fig. 9, describes imaging head 108, and this imaging head 108 is becoming As not moving on the first axle 110 during each display base plate.But, the display base shown in Fig. 9 Each having the anglec of rotation about the second axle 124 in plate 602 and 604, it causes Continuous shifting in arranging in pixel above in connection with the color filter element described by flow process 800 Dynamic.In another embodiment, above-mentioned reset can be with the imaging head 108 on the first direction of principal axis Slow scanning combine to also compensate for the rotation of this display base plate 602 and 604, thus reduce with After pixel on filter element between continuous moving.

Such as, for having a display base plate of the second axle relative displacement of 2m/s, Coordinate the collaborative scanning of anglec of rotation θ=0.5 °, it would be desirable to the 0.017m/s on the first direction of principal axis sweeps Retouch speed.Linear electric motors 112 and controller 140 have the time of about 10 milliseconds and start this change Changing, this needs an about 3.4m/s²Acceleration.Such acceleration is for as overall in Fig. 1 Shown accurate flat panel imaging system is also rational.

But, in other embodiments, the anglec of rotation relevant to display base plate may be substantially higher than 0.5 °, it is therefore desirable to bigger gap is set between this display, thus the sufficient time is provided Adapt to the synergy movement between display to display.Alternately, if between display This gap is limited, then must be provided higher acceleration by the first axle linear electric motors 112, it can Cost and the complexity of this first axle linear actuator can be increased.

Generally, the relative displacement on the second direction of principal axis between display base plate and digital imaging system The first time included on the direction being directed at the second axle 124 is passed through and with first time by opposite direction Direction on second time by or pass back through.In certain embodiments, when changing the direction of motion So that when second time is by middle deposition filter element, imaging head 108 offsets elongated row 136 width Distance, thus improve yield.In other embodiments, the optical filtering deposited by period in second time Element can be sufficiently different from the filter element deposited by period for the first time, and in this feelings Can only be deposited by period for the first time under condition.With reference to Figure 10, in another interchangeable enforcement In example, by the most in the first pass along elongated row 1000 at some display base selected Deposit filter element on plate (such as substrate 602 and 606), subsequently second time pass through in approximately along Elongated row 1000 to remaining display base plate (such as substrate 604) imaging, can increase and be used for The time of imaging head 108 is accelerated between display.One associated advantages of this embodiment is as above State distance 1002 that the imaging head 108 described in Fig. 9 embodiment can be accelerated in order to reset by significantly Increase.This reduce the demand to acceleration and provide the more time in the first axle side Stable and the initialization of scanning speed upwards.In the embodiment shown in fig. 10, imaging head 108 It is initially positioned with deposition optical filtering on display base plate 602 in for the first time by elongated row 1000 Element, and subsequently period in traversing distance 1002 be reset, such as above-mentioned Fig. 9 embodiment, institute is big Cause description.Subsequently, filter element is deposited on substrate 606, and the imaging when completing this deposition Head is for the first time being decelerated by the motion on direction and imaging head passes through quilt on direction in second time Accelerate to image taking speed.Therefore, distance 1004 is available, imaging head 108 between distance 1004 Image taking speed can be accelerated on the second axle 124 and accelerate on the first axle 110, so that The reset for imaging display substrate 604 can be realized by period in second time.For typically Display base plate size and the setting on chuck 116, this embodiment embodiment relative to Fig. 9 Further reduce acceleration required on the first axle 110.

The step quilt once along elongated row 1000, filter element being deposited on display base plate 604 Complete, then distance 1006 moves to the position of next elongated row 1008 for making imaging head 108 It is available.Deposition for the filter element of elongated row 1008 can be done in the same fashion.

Embodiment shown in Figure 10 can be used for having at least two display along the second axle 124 In the configuration of substrate, but it configures equally applicable for having other number of substrates any. Although in Fig. 10, this embodiment has been described as the deposition of filter element and occurs to pass through for the first time The display of period odd number and at the second time display by period even number, but other display base plate The configuration not arranged regularly still can be implemented, such as, be removed at some display In the case of.

Staggered

According to Figure 11, it is shown that alternatively deposit embodiment, it can be tied with several above-described embodiments Close.In this embodiment, the deposition along the filter element of elongated row 1100 occurs at imaging head The first time of 108 by each in the display base plate 602,604 and 606 of period, but In passing through for the first time, only deposition position every one is energized.Therefore, the phase can be passed through for the first time Between deposit incomplete filter element.In second time by period, by being swashed by period in second time Encouraging the suitable deposition position along elongated row 1100, this filter element remainder is filled.

Alternatively, when completing to pass through for the first time, imaging head can move across between deposition position Spacing, imaging head to be directed at the second elongated row 1102, and in second time by period, pass through Encouraging the suitable deposition position in elongated row 1102, the remainder of filter element will be filled.

The advantage of above-mentioned staggered deposition configuration is to make each filter element at the two of imaging head 108 Individual in opposite direction pass through in deposited, therefore reduce for the first time by and between second time passes through The impact of deposition difference, as discussed above concerning described in the embodiment of Figure 10.It addition, some Imaging system and/or medium cause colorant to be transferred to illy on display, such as in filter element When producing imaging solid area, this phenomenon may be especially pronounced.This above-mentioned intertonguing is equally Reduce such impact.

In the description above, this interlocks and is described as based on single deposition position, but at other In embodiment, this interlocks and can relate to more than one deposition position.

Filter element shapes

Substantially describing above-described embodiment together with imaging system, this imaging system is configured to produce the The deposition position that on one axle and the second axle, size is similar.But, as described above about KodakThe example of imaging head, the light beam 128 of generation has substantially rectangular cross section, and Can be controlled to be used on the second direction of principal axis to sink higher than precision possible on the first direction of principal axis Long-pending filter.

See Figure 12, in an alternate embodiment, imaging head 108 be configured to supply along Second deposition position 1200 of the second axle 124, the second deposition position 1200 ratio is along the first of the first axle Deposition position interval is tightr.As shown in figure 12, identified pixel 1202 respectively at the first axle and There is on second direction of principal axis the first relevant axle border and the second axle border.Under these conditions, filter Element can be more accurate along the layout of the first axle 110 compared to filter element along arranging of the second axle 124 Ground is controlled.In this embodiment, the module 808 of the flow process 800 shown in Fig. 8 can be implemented For making selection difference on the first axle 110 and the second axle 124 of deposition position.An embodiment In, the deposition position of the first axle is selected as the first axle limit at filter element 1204 with pixel 1202 Bigger spacing is provided between boundary 1206 and 1208.In the embodiment shown in fig. 12, pixel 1202 In deposition position more than one not selected, it can be contrasted with the embodiment shown in Fig. 7, The deposition position being the most only adjacent to pixel boundary in Fig. 7 is not selected.But It is that, in most embodiment, deposited filter element should meet coverage criteria, such as mesh Mark area coverage, so that have essentially identical compared with each pixel pixel identical with other color Brightness.Then, as the compensation of spacing bigger on the first axle 110 direction, along the second axle 124 The second deposition position be selected as between filter element and the second axle border 1210 and 1212 arrange The spacing reduced, the selection of such first and second deposition positions combines and meets and pixel 1202 The interior relevant coverage criteria of filter element 1204.This embodiment can also be with the reality other described Execute example to combine, such as, combine the embodiment described by Fig. 9-11.

Embodiment shown in Figure 12 is further helpful at filter element on the first axle and the second axle Layout in introduce stochastic variable, with destroy filter element arrange in produce regular pattern, these rule Then pattern is because selecting by arranging bigger spacing between filter element 1204 and the first axle border Select deposition position and produce.Because the deposition accuracy on the second direction of principal axis has exceeded the heavy of the first axle Long-pending precision, so filter element is placed along the first axle 110 cloth more accurately along the second axle 124 Stochastic variable in putting provides bigger degree of freedom.

In other embodiments, during stochastic variable be directed into identified pixel subsequently In the spacing on the first axle border 1206 and 1208.Such stochastic variable can be by along the second axle 124 Select the second deposition position to be compensated, thus meet the coverage criteria relevant to filter element.Although In described embodiment, disclosed filter element substantially rectangular in shape；But the embodiment at other In the shape of this filter element can have the shape in addition to square or rectangle, the most irregularly Shape.

The regulation of deposition filter element

The filter element using any of above embodiment to deposit may make the optical filtering unit being transferred Part has coarse surface texture.Owing to the transfer from donor at each deposition position cannot not be probably completely Beautiful, therefore when using thermal transfer donor, this effect is especially apparent.Some are applied, coarse Superficial makings is probably less desirable and may make troubles.Such as, at the colour for display In filter element, coarse surface texture the optical effect caused may cause the imaging that display shows The degeneration of quality.It is believed that reflective display is affected the biggest by such optical effect.

In another embodiments of the invention, once the selectivity of filter element material has deposited Becoming, a further step can be introduced into, and this step includes optionally by deposited optical filtering Material is exposed to LASER HEAT radiation to regulate the deposition of filter element material.Therefore deposited optical filtering unit Part experienced by annealing process, it is believed that this process makes the temperature of filter element material rise To the glass transition temperature of this material, so that this material at least partly refluxes so that coarse Superficial makings smooths.Once this material is cooled, owing to this backflow makes filter element material surface Smoothness is enhanced.

Compared with single annealing steps, the selective control using the controlled lasing light emitter of same imaging can To have several advantage.Introduce single annealing process and can increase extra step in process, also can Relate to extra annealing device.Carry out annealing by the temperature fully improving monolith substrate and be also possible to tool There is the probability of infringement display base plate.These problems can by selective control described herein Being solved, this is owing to the most only color filter element can be raised to the temperature of annealing, thus subtracts The danger that little underlying pixels suffers damage.Additionally, for thermal transfer, be adapted for carrying out swashing of laser transfer Optical wavelength would generally be absorbed well by filter element material, and then can be particularly effectively by filter element Material warms is to annealing temperature.

See Figure 13, according to one embodiment of present invention, be used for guiding microprocessor shown in Fig. 3 302 flow processs performing regulation process are substantially illustrated with 1300.As described in the above-described embodiments, This flow process is from the beginning of module 1302, and this module 1302 guides microprocessor 302 to control digital image Shown in system 100(Fig. 1) filter is deposited at selected deposition position.Subsequently, The strength grade that module 1304 guides microprocessor 302 to adjust lasing light emitter alternatively is suitable for moving back to one The grade of fire.Such as, such a grade can by be increased or decreased laser power or by with The class of attenuation relevant to the manipulator being used to the radiation that control is produced by lasing light emitter adjusts and obtains. In the embodiment being adjusted under same laser intensity or power grade, module 1304 can be saved Slightly.

Subsequently, flow process 1300 is continued by module 1306, and this module 1306 guides microprocessor 302 Digital mask information is read in the storage 356 of alterable memory 306.Anneal at the same time all differences In the embodiment of the color filter element of color, the single numeral relevant to each color filter element Mask will need to process extraly, to provide a Combination with Digital mask for all colours.Subsequently, Module 1308 guides microprocessor 302 to generate control signals to control at port 142,144 and 146 Digital imaging system processed thus at deposition position regulate filter element material.

In one embodiment, the lasing light emitter for filter element deposition is also used to perform selectivity exposure Light is to regulate filter element.In other embodiments, another lasing light emitter with different wave length can It is used to perform selectivity expose to regulate filter element.

Above mentioned embodiment provide for directly in the pixel of display base plate or at glass or non-glass Method and the relevant device of color filter element is formed on the substrate of glass.Direct precipitation on filter element There is the related advantages of in-situ deposition, therefore can reduce extra alignment procedures.Additionally, obtained Display product can save the extra glassy layer of carrying filter element, therefore alleviate display and produce The weight of product.The embodiment of Direct precipitation generally can also obtain dissipating of less transmission or reflection light Penetrate, potentially provide the most colored display performance.

Although the specific embodiment of the present invention is described and illustrated, but such embodiment should only be seen Work is the signal of the present invention, and the explanation not according to claims limits the present invention.

Claims (19)

1. one kind is used for using digital imaging system to form optical filtering unit at least one display base plate The method of part, described digital imaging system operationally optionally deposits filter at multiple deposition positions Luminescent material, described method includes:

Receiving orientation information, described orientation information limits relevant at least one display base plate described The setting of multiple pixels；

In the plurality of pixel, identify that the pixel by receiving filter is to be formed in described pixel Filter element, each identified pixel has relevant border, and described filter element will be disposed in In described border；

In each identified described pixel, deposition position is selected according to described orientation information, thus full Sufficient and described filter element arranges relevant alignment criteria, described alignment criteria bag in described pixel Include the threshold value representing filter element relative to the tolerance of the layout on described border, wherein said selection Including select deposition position so that: when filter element in identified pixel relative to described limit When the layout in succession moved on boundary is maintained within described threshold value, make the described layout of filter element in succession Mobile；And when the described layout in succession moved exceedes described threshold value, make the layout of filter element move Move to described threshold value；And

Control described digital imaging system so that described filter is deposited on selected described deposition Position.

2. the method described in claim 1, wherein selects deposition position so that the layout of filter element is moved Move and include within returning to described threshold value: select to be moved into adjacent deposition position of looking younger relative to described border Between the deposition position of spacing.

3. the method described in claim 1, further includes at introducing stochastic variable in described threshold value, Described stochastic variable operationally destroys regular pattern, and described regular pattern exists due to described filter element The described layout in succession moved in described pixel in succession and occur in filter element is arranged.

4. the method described in claim 1, wherein identifies that described pixel is included in the plurality of pixel Identify and be used for receiving a kind of pixel in multiple color filter materials, and wherein select described deposition Position include select deposition position so that described filter element be arranged in described multiple colorized optical filtering material Changing between various in material, thus destroy regular pattern, described regular pattern is due to the described unit that filters The part described layout in succession moved in described pixel in succession and occur in filter element is arranged.

5. the method described in claim 1, wherein said selection further includes at described filter element Layout in introduce stochastic variable, described stochastic variable operationally destroys regular pattern, described rule Pattern occurs due to described selection in filter element is arranged.

6. the method described in claim 5, wherein said deposition position includes: along described display base First axle of plate is by the first deposition position of rough alignment；And the second axle along described display base plate By the second deposition position of rough alignment, described second deposition position is than described first deposition position interval More closely, in the layout of described filter element, and wherein introduce described stochastic variable be included in described The described selection of the first deposition position introduces stochastic variable, so that on the direction of described first axle Described filter element and described border between bigger spacing identified pixel in succession it Between change randomly, and the described selection of wherein said second deposition position includes selecting the second deposition The standard that position is relevant to meet the area covering pixel to described filter element.

7. the method described in claim 1, wherein said selection further includes at the cloth of filter element Putting middle introducing stochastic variable, described stochastic variable operationally destroys regular pattern, described regular pattern Occur on each display base plate due to the spacing between deposited adjacent position is described identified Pixel in filter element arrange in.

8. the method described in claim 1, wherein identifies that described pixel is included in the plurality of pixel Identify randomly and be used for receiving a kind of pixel in multiple color filter materials, so that obtained The filter element of each color is randomly dispersed on each display base plate.

9. a display device, it has the filter element that method according to claim 1 is formed.

10. a digital imaging system, it operationally optionally deposits filter at multiple deposition positions Luminescent material is to form filter element at least one display base plate, and described digital imaging system includes Controller, described controller is operationally configured to:

Receiving orientation information, described orientation information limits relevant at least one display base plate described The setting of multiple pixels；

In the plurality of pixel, identify that the pixel by receiving filter is to be formed in described pixel Filter element, each identified pixel has relevant border, and described filter element will be disposed in In described border；

In each identified described pixel, deposition position is selected according to described orientation information, thus full Sufficient and described filter element arranges relevant alignment criteria, described alignment criteria bag in described pixel Include the threshold value representing filter element relative to the tolerance of the layout on described border；And

Control described digital imaging system so that described filter is deposited on selected described deposition Position, described controller operationally be configured to select deposition position so that: when filter unit Part layout in succession moved relative to described border in identified pixel is maintained at described threshold value Within time, make the layout of filter element in succession move；And the described layout that ought in succession move exceedes institute When stating threshold value, the layout of filter element is made to move to described threshold value.

System described in 11. claim 10, wherein said controller is operationally configured to: logical Crossing in the following manner selects deposition position so that the layout of filter element is moved back to: select relative to described Border is moved into the deposition position of the spacing looked younger between adjacent deposition position.

System described in 12. claim 10, wherein said controller is operationally configured in institute Stating introducing stochastic variable in threshold value, described stochastic variable operationally destroys regular pattern, described rule Pattern is sent out due to the described filter element described layout in succession moved in described pixel in succession It is raw in filter element is arranged.

System described in 13. claim 10, wherein said controller is operationally configured to, logical Cross pixel described in the following manner identification: identify in the plurality of pixel and be used for receiving multiple colorized optical filtering A kind of pixel in material, and select described deposition position in the following manner: select deposition position Put so that described filter element be arranged in described multiple colored filter materials various between change, Thus destroying regular pattern, described regular pattern is owing to described filter element is in described pixel in succession The described layout in succession moved and occur filter element arrange in.

System described in 14. claim 10, wherein said controller is operationally configured in institute Stating introducing stochastic variable in the layout of filter element, described stochastic variable operationally destroys rule schema Case, described regular pattern occurs due to described selection in filter element is arranged.

System described in 15. claim 14, wherein said deposition position includes: along described display First axle of substrate is by the first deposition position of rough alignment；And along the second of described display base plate Axle is by the second deposition position of rough alignment, between described second deposition position is than described first deposition position Every tightr, and wherein said controller is operationally configured in the following manner in described filter The layout of optical element introduces described stochastic variable: draw in the described selection of described first deposition position Enter stochastic variable so that described filter element on the direction of described first axle and described border it Between bigger spacing change randomly between identified pixel in succession, and wherein said control Device processed is operationally configured in the following manner and selects described second deposition position: select second to sink The standard that long-pending position is relevant to meet the area covering pixel to described filter element.

System described in 16. claim 10, wherein said controller is operationally configured in institute Stating introducing stochastic variable in the layout of filter element, described stochastic variable operationally destroys rule Pattern, described regular pattern occurs at each display base due to the spacing between deposited adjacent position During filter element in described identified pixel on plate is arranged.

System described in 17. claim 10, wherein said controller is operationally configured to Pixel described in the following manner identification: identify randomly in the plurality of pixel and be used for receiving multiple colour A kind of pixel in filter, so that the filter element of each color obtained divides randomly Dissipate on each display base plate.

18. 1 kinds for the method that forms filter element on substrate, described substrate subsequently by with display Base plate alignment is to form display, and described method includes:

Select the position receiving filter to form filter element on the substrate；

Stochastic variable is introduced in the layout of described filter element；And

Filter element is formed in selected described position.

19. 1 kinds for forming the systems of filter element on substrate, described substrate subsequently by with display Base plate alignment is to form display, and described system includes that controller, described controller are operationally joined It is set to:

Select the position receiving filter to form filter element on the substrate；

Stochastic variable is introduced in the layout of described filter element；And

Described system is made to form filter element in selected described position.