CN103269556A - Large-area Atmospheric Plasma Uniform Discharge Electrode - Google Patents

Abstract

The invention discloses a large-area atmosphere plasma even discharge electrode and belongs to the field of optical processing. The large-area atmosphere plasma even discharge electrode aims to solve the problems that an alternating current generated by discharging of an existing large-area atmosphere plasma has the skin effect that the current density is increased when the alternating current approaches the edge of the electrode, uneven discharging of the large-area electrode is caused, and precision and efficiency of a processing technology of the atmosphere plasma are seriously influenced. The large-area atmosphere plasma uneven discharge electrode is flat-sheet-shaped. A plurality of protruding microelectrodes are arranged on the discharging surface of the large-area atmosphere plasma even discharge electrode, the shapes and the sizes of all protruding microelectrodes are identical, the distances between each protruding microelectrode and adjacent protruding microelectrode are identical, and the distances between the discharging surfaces of each protruding microelectrode and the processed working surfaces which are opposite to the protruding microelectrodes are equal. The large-area atmosphere plasma even discharge electrode can achieve large-area even discharging of the atmosphere plasma, avoids the phenomenon of uneven discharging caused by the skin effect and the marginal discharge effect when continuous surface electrodes motivate the plasma in an atmospheric environment, and therefore the processing precision and the processing efficiency of the atmosphere plasma can be effectively improved.

Description

Large-area Atmospheric Plasma Uniform Discharge Electrode

technical field

The invention belongs to the field of optical processing.

Background technique

Atmospheric plasma chemical processing technology is a chemical processing technology that uses radio frequency power to excite reactive atoms with high density and high reactivity in the atmospheric environment to chemically react with workpiece surface atoms. The excited reactive atoms can be adjusted by the power of the excitation power supply and the flow rate of the reactive gas. Compared with the removal rate of traditional mechanical polishing, the rate of chemical reaction is several times or even ten times higher. It has a wide range of applications in the field of processing large-scale optical components. application value.

At present, the processing form of atmospheric plasma is mainly realized through the motion control of small-diameter plasma jets. Although the efficiency of this processing method has been improved for large-scale precision optical parts, it still cannot meet the requirements of large-scale optical parts for atmospheric plasma. Body processing efficiency requirements. In order to further increase the processing and removal rate of atmospheric plasma, the plasma discharge area under atmospheric pressure conditions can be increased to realize large-area atmospheric plasma discharge. Chinese Patent No.: 200910085918.X, Invention Name: Large-area flat-plate atmospheric pressure radio frequency cold plasma system, this invention is mainly used for surface modification, surface cleaning and surface disinfection, and the large-area discharge electrode in the system is discharged when the plasma is discharged There is a skin effect, and the edge discharge intensity is large, and the skin effect becomes more obvious with the increase of the electrode size. Large-area atmospheric plasma discharge is based on the principle of dielectric barrier discharge. It is excited by the electric field formed by the alternating voltage applied to the electrode by the radio frequency power supply. The alternating current generated by the discharge has a skin effect in which the current density increases when it approaches the edge of the electrode. , resulting in high plasma excitation intensity at the edge of the electrode during the discharge process, but insufficient plasma excitation at the center of the electrode, and the uneven discharge of large-area electrodes seriously affects the accuracy and efficiency of atmospheric plasma processing technology.

Contents of the invention

The purpose of the present invention is to provide a large-area atmospheric plasma uniform discharge electrode. In order to solve the problem that the alternating current generated by the existing large-area atmospheric plasma discharge has a skin effect that the current density increases at the edge of the electrode, resulting in large The area electrode discharge is uneven, which seriously affects the accuracy and efficiency of the atmospheric plasma processing technology.

The stated purpose is achieved through the following scheme: the described large-area atmospheric plasma uniform discharge electrode is flat in shape; a plurality of raised microelectrodes (arrays) are arranged on the discharge surface, The shape and size of all the raised microelectrodes are the same, the distances between all the raised microelectrodes and the adjacent raised microelectrodes are equal, and the distance between the discharge surface of all the raised microelectrodes and its opposite processed surface The distances are all equal; the outer surface of the discharge surface is covered with an insulating dielectric layer by micro-arc oxidation technology or plasma spraying technology.

The technical advantages of the invention patent:

1. The patent of this invention can realize large-area uniform discharge of atmospheric plasma, avoiding the phenomenon of uneven discharge caused by continuous surface electrode excitation plasma in atmospheric environment due to skin effect and edge discharge effect, thereby effectively improving the processing accuracy and efficiency of atmospheric plasma ;

2. The generation of large-area plasma discharge is realized under open atmospheric conditions, which breaks through the limitation of large-area discharge in vacuum, and is not limited by the size of the vacuum chamber, greatly reducing the cost of use and expanding the use of atmospheric plasma range of processing applications.

Description of drawings

Fig. 1 is the overall structural representation of the present invention;

Fig. 2 is a top view structural schematic diagram of Fig. 1;

Fig. 3 is the schematic structural view when the protruding microelectrode 2 is a continuous elongated protuberance;

Fig. 4 is the schematic structural view when the protruding microelectrode 2 is a continuous elongated protuberance;

Fig. 5 is the structure schematic diagram when protruding microelectrode 2 is the elongated protuberance that runs through;

Fig. 6 is a schematic structural diagram of a sixth embodiment.

Detailed ways

Specific embodiment one: as shown in Fig. 1, Fig. 2, its shape is flat plate shape; Its discharge surface 1 is provided with a plurality of protruding microelectrodes 2 (arrays), and the shape of all protruding microelectrodes 2 The size is the same, the distances between all convex microelectrodes 2 and adjacent convex microelectrodes 2 are equal, and the distances between the discharge surfaces of all convex microelectrodes 2 and their opposite processed surfaces are all equal; The outer surface of the discharge surface 1 is covered with an insulating dielectric layer by micro-arc oxidation technology or plasma spraying technology.

Embodiment 2: As shown in FIG. 3 , FIG. 4 , and FIG. 5 , the difference between this embodiment and Embodiment 1 is that the protruding microelectrode 2 is a through elongated protrusion. Other compositions and connections are the same as in the first embodiment.

Specific embodiment three: as shown in Figure 3, the difference between this embodiment and specific embodiment two is that the sectional shape of described protruding microelectrode 2 is rectangular; The duty ratio of the spacing between adjacent electrodes is 0.5-3, and the height of the raised microelectrode 2 is 0.2 mm-3 mm. Other compositions and connections are the same as in the first embodiment.

Specific embodiment four: as shown in Figure 4, the difference between this embodiment and specific embodiment two is that the shape of the cut-off surface of described protruding microelectrode 2 is a triangle; The duty ratio of the space between them is 0.5 ~ 3, and the height of the raised microelectrode 2 is 0.2 mm ~ 3 mm. Other compositions and connections are the same as in the first embodiment.

Specific embodiment five: as shown in Figure 5, the difference between this embodiment and specific embodiment two is that the shape of the cut-off surface of described protruding microelectrode 2 is arc-shaped; the bottom width of protruding microelectrode 2 The duty ratio of the dimension and the spacing dimension between them is 0.5 ~ 3, and the height of the raised microelectrode 2 is 0.2 mm ~ 3 mm. Other compositions and connections are the same as in the first embodiment.

Embodiment 6: As shown in FIG. 6 , the difference between this embodiment and Embodiment 1 is that the raised microelectrode 2 is pyramid-shaped, and the bottom size of the raised microelectrode 2 is between its neighbors. The duty cycle of the pitch size is 0.5 ~ 3, and the height of the raised microelectrode 2 is 0.2 mm ~ 3 mm. Other compositions and connections are the same as in the first embodiment.

Working principle: Since the discharge surface 1 of the electrode is provided with a plurality of raised microelectrodes 2, that is, each raised microelectrode 2 structure is used as a small electrode for independent discharge machining, and the gap between the electrode and the processed surface The discharge gap is 3mm to 5mm. When using this electrode to process large-area workpieces, the removal amount is relatively uniform, which effectively suppresses the skin effect generated during the large-area electrode discharge process, and uses the local tip discharge to make the middle part produce The removal and increased concentration of plasma active particles enable high-speed processing of large-area plasma at atmospheric pressure.

Claims (6)

1. the even sparking electrode of large tracts of land atmosphere plasma is characterized in that flat shape of being shaped as of it; Its discharge face (1) is provided with a plurality of convex shaped microelectrodes (2), the geomery of all convex shaped microelectrodes (2) is identical, all convex shaped microelectrodes (2) equate all that with the distance each other of adjacent protrusion shape microelectrode (2) distance of the machined surface that the discharging surface of all convex shaped microelectrodes (2) is relative with it all equates; On the outer surface of discharge face (1), cover one deck insulating medium layer with differential arc oxidization technique or plasma spray coating technology.

2. the even sparking electrode of large tracts of land atmosphere plasma according to claim 1 is characterized in that the strip projection of described convex shaped microelectrode (2) for connecting.

3. the even sparking electrode of large tracts of land atmosphere plasma according to claim 2, it is characterized in that described convex shaped microelectrode (2) truncation surface be shaped as rectangle; The duty ratio of their spacing dimensions between adjacent of the width dimensions of convex shaped microelectrode (2) and its is 0.5 ~ 3, and the height of convex shaped microelectrode (2) is 0.2 mm ~ 3 mm.

4. the even sparking electrode of large tracts of land atmosphere plasma according to claim 2, it is characterized in that described convex shaped microelectrode (2) truncation surface be shaped as triangle; The duty ratio of their spacing dimensions between adjacent of the bottom width size of convex shaped microelectrode (2) and its is 0.5 ~ 3, and the height of convex shaped microelectrode (2) is 0.2 mm ~ 3 mm.

5. the even sparking electrode of large tracts of land atmosphere plasma according to claim 2, it is characterized in that described convex shaped microelectrode (2) truncation surface be shaped as circular arc; The duty ratio of their spacing dimensions between adjacent of the bottom width size of convex shaped microelectrode (2) and its is 0.5 ~ 3, and the height of convex shaped microelectrode (2) is 0.2 mm ~ 3 mm.

6. the even sparking electrode of large tracts of land atmosphere plasma according to claim 1, it is characterized in that described convex shaped microelectrode (2) is pyramid, the duty ratio of their spacing dimensions between adjacent of the bottom size of convex shaped microelectrode (2) and its is 0.5 ~ 3, and the height of convex shaped microelectrode (2) is 0.2 mm ~ 3 mm.

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