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CN102906833A - 电隔离变压器 - Google Patents

电隔离变压器 Download PDF

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CN102906833A
CN102906833A CN2011800250092A CN201180025009A CN102906833A CN 102906833 A CN102906833 A CN 102906833A CN 2011800250092 A CN2011800250092 A CN 2011800250092A CN 201180025009 A CN201180025009 A CN 201180025009A CN 102906833 A CN102906833 A CN 102906833A
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W·弗兰茨
P·J·霍波
P·司美思
A·咖布利斯
D·I·安德森
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National Semiconductor Corp
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Abstract

一种集成电路管芯或裸芯系统,包含第一集成电路管芯或裸芯,第二集成电路管芯或裸芯,以及在电介质衬底(例如石英)上形成的并且电气连接在第一集成电路管芯和第二集成电路管芯之间以提供其间电隔离的变压器。

Description

电隔离变压器
技术领域
本发明关于电气系统中的电隔离,并且,尤其关于在电介质(例如石英,或者玻璃)衬底上的电隔离变压器的构成。
背景技术
具有不同接地参考,又或具有产生冲击电流能力的任何电气系统需要加入电隔离以保障系统和使用者的安全。
集成电路的电隔离要求器件把两个系统电气隔离开在高目标隔离电压,例如5千伏,但要求在不同的接地电位的系统之间进行数据传输。有很多提供两系统之间电隔离的解决方法存在。一种是多管芯的方法,该方法在要彼此隔离的管芯之间利用变压器;在一个管芯系统上产生的短脉冲经过变压器传输以供第二个管芯系统解码。另一种解决方法类似刚才所述,只是使用电容器取代变压器来隔离两个管芯系统。然而还有一种解决方法就是采用光耦合,其通过一个管芯系统上的发光二极管(LED)发射光和第二个管芯系统上的光电二极管检测光并产生相应的电气电流。
图1示出多管芯电隔离的设计100,其利用在单个硅衬底104上形成的变压器102以在第一个硅管芯108上形成的第一集成电路106和第二个硅管芯112上形成的第二集成电路110之间产生电隔离。图1示出在第一集成电路106和第二集成电路110之间通过焊线114连接的变压器102,该焊线114电气相连第一个硅管芯108和第二个硅管芯116到“变压器”的衬底104。在变压器102各绕组之间形成的电介质116(如图1示意显示)必须足够厚以抵挡第一个集成电路106和第二个集成电路110之间的电压差。在图1的集成电路系统100中,为传输数据,被包括在第一个集成电路106里的模拟或者数字编码/解码器获取第一集成电路106产生的数据,对其编码,并将其传输通过变压器102。用于传输电压/电流通过变压器有很多现有方法,例如,很短的方波脉冲,或者通过高频射频载波正弦波。包括在第二个集成电路110里的模拟或者数字编码/解码器检测传输到的经过编码的数据,对其解码并提取数据以供第二个集成电路110使用。
通常用于半导体IC工业的集成电路变压器有两种基本类型:内绕线平面型和堆叠型。内绕线型采用单金属层,并且各绕组因布局设计而分开。堆叠型采用两层金属,所述两层金属之间分开足够大以抵挡两绕组之间的电压差的距离。
为了提供电隔离,例如,具有大于或等于隔离目标电压(例如5千伏)的电压的集成电路(IC)的电隔离,则至少需要四种类型隔离的方法:绕组到绕组隔离,绕组到衬底隔离,焊线到焊线隔离,以及管芯到管芯隔离。绕组到绕组隔离方式的最小距离由各绕组之间所使用的绝缘体的介电强度来决定。下方表格1提供了在半导体加工和封装工业中普遍使用的几种介电材料和隔离5千伏电压所需的距离的一览。通常情况下,考虑到电介质质量的不同和不均匀性,为了安全,在实际器件里使用的距离会更大。
表1
Figure BDA00002433274700021
对于堆叠式变压器和内绕线变压器,绕组到衬底隔离方式的最小距离以不同方式确定。对于堆叠式变压器,高电压侧在顶金属层,通过设计,该顶金属层位于距衬底足够远的距离以避免电介质击穿到衬底。然而,对于内绕线变压器来说,金属层,即变压器的两绕组,都必须离硅衬底有足够的距离以使在隔离电压下不会发生电介质击穿。这个距离类似于表格1所示的距离并取决于金属层和衬底之间的材料堆叠。
焊线到焊线的间距是由最后封装注入的模塑料或模塑化合物决定。通常的模塑料可以是所列出的介电强度为15V/μm的Sumitomo G700系列的模塑料。焊垫片或盘和线路间的间距必须足够大以保证在模塑料里面永远不会发生击穿。模塑料是封装里面的所有材料中最不好控制的,因此,会带来很多的变化。
管芯到管芯的击穿电压类似地由模塑料限定。一般来说,集成电路是建立在铜引线框架上的衬底上,这意味着两个硅管芯不能同时放在相同的管芯粘接垫上(DAP)。这迫使使用具有间距的两个DAP引线框架,该间距之间随后被填充模塑料。同样的对于焊线来说,两个DAP之间的距离必须足够大以超过额定的电介质耐受电压。
发明内容
在本文要求保护的主题的一个实施例中,集成电路系统包含第一集成电路管芯或裸芯,所述第一集成电路管芯具有形成在其上的第一集成电路;和第二集成电路管芯或裸芯,所述第二集成电路管芯具有形成在其上的第二集成电路;以及在电介质衬底(例如石英或者玻璃)上形成的并且电气连接在第一集成电路和第二集成电路之间以提供其间电隔离的变压器。
在本文要求保护的主题的另一个实施例中,集成电路系统包含石英或者玻璃衬底,附加到衬底并具有与其关联的第一电压的第一集成电路管芯系统,附加到衬底并具有与其关联的第二电压的第二集成电路管芯系统,其中第二电压小于第一电压,以及在衬底上形成的并且电气连接在第一集成电路管芯或裸芯系统和第二集成电路管芯或裸芯系统之间以提供其间电隔离的变压器。
在本文要求保护的主题的另一个实施例中,形成集成电路系统的方法包含提供第一集成电路管芯或裸芯,所述第一集成电路管芯具有形成在其上的第一集成电路;提供第二集成电路管芯或裸芯,所述第二集成电路管芯具有形成在其上的第二集成电路;以及将形成在电介质(例如,石英或者玻璃)上的变压器电气地连接在第一集成电路和第二集成电路之间以提供其间的电隔离。
本文所公开的主题的各方面的特点与优势,在考虑了下面的详细描述和附图后会更清楚和容易想到,详细描述和附图给出了要求保护的本主题所采用的概念的说明性实施例。
附图说明
图1框图说明了为提供两个集成电路之间电隔离的变压器的利用。
图2框图说明了在电介质衬底上形成的以提供两个集成电路之间电隔离的变压器的利用。
图3示意布局图说明在石英衬底上形成的内绕线变压器。
图4是说明图3的内绕线变压器的剖视图的示意。
图5是在硅衬底和石英衬底上的内绕线变压器的Q因子随频率变化的对比图。
图6平面示意图说明利用多个内绕线变压器在两个多通道集成电路之间提供电隔离的多通道系统的实施例。
具体实施方式
如上所述,一般的集成电路变压器在处理高电压隔离,比如,电压等级等于或者大于5千伏时,要求变压器(内绕线或堆叠型)高电压的绕组高于半导体(例如硅等)晶片衬底足够的距离,以避免泄露或者电介质击穿到衬底。这造成了明显的额外工艺与成本。本文公开和要求保护的主题提供在一层或者多层金属层中,但是在石英晶片之上而不是硅晶片之上,产生电隔离变压器的工艺。石英,类似于二氧化硅,是一种电介质绝缘体,因此意味着变压器高电压的绕组上到衬底的击穿将被消除。
图2示出包括在电介质衬底204形成的并且连接在第一集成电路206和第二集成电路210之间的变压器202的集成电路系统200,所述第一集成电路206在第一半导体(例如硅)管芯或裸芯208上形成,所述第二集成电路210在第二半导体(例如硅)管芯或裸芯212上形成。在一实施例中,第一半导体管芯208和第二半导体管芯212也都形成在电介质衬底204上。电介质衬底204可以包括,但不局限于,石英晶片或任何绝缘晶片,诸如玻璃晶片或由其衍生的版本,例如耐热玻璃,苏打-石灰或称碱石灰,硼硅酸盐玻璃,铝硼硅酸盐玻璃。第一集成电路206具有与其相关的第一电压,例如,高于或者等于5千伏,并且第二集成电路210具有与其相关的小于第一电压的第二电压。图2示出将变压器202电气连接在第一集成电路206和第二集成电路210之间的焊线214。在图2的集成电路系统200中,为了传输数据,被包含在第一集成电路206里的模拟或者数字编码/解码器获取由第一集成电路206产生的数据,对其编码并将该数据以非常短方波脉冲或者高频载波的方式经过变压器进行传输;被包含在第二集成电路210里的模拟或者数字编码/解码器检测脉冲,对其解码并提取数据以供第二集成电路210使用。
图2所示的集成电路系统的设计通过在一个封装里使用双管芯贴装片(DAPs)来实现。DAP用于对管芯或裸芯提供支撑。然而,这导致在只有单一的金属层级可用时使用焊线的困难以及更高的成本。因此,图2的设计示出完全在单一石英衬底204上形成的系统。第一硅管芯208与第二硅管芯212利用键合粘接粘接在石英衬底204上。本领域技术人员熟知的键合粘接能用来键合连接石英到硅或到金属板,例如,使用铜,能够被图案化并且之后键合在金属板和硅之间形成,这是一个更加标准的方法。将集成电路系统整个形成在石英衬底上的优点包括,但不限于:实现三组电路之间的绝缘;在封装里能采用单DAP,从而简化封装设计;DAP可以是可导电又可以是不导电的,这样可以得到最小的成本消耗;在石英上使用铜互连的本地布线的能力,从而允许用于从DAP引线键合到引线框架的键合垫片的最优布局;与在封装中使用多个DAP的封装相比,此类管芯的封装变得更紧凑;这两个硅管芯也能够被凸起(垫片为金属凸块),被倒装,以及被键合到石英衬底的表面上的铜垫片,从而减少焊线的数量和伴随的寄生效应。
变压器202可以是采用单金属层和基于布局设计而被电介质材料分开的各绕组的内绕线型,也可以是采用由电介质材料分开足够大距离以抵挡两绕组之间的电压差的两层金属的堆叠型。在这两种内绕线型和堆叠型变压器中,电介质材料可以选自(但不局限于)上面表格1中所标出的电介质材料。本文所述变压器是空气芯变压器;然而,本领域技术人员应明白,本文所公开的概念也可以应用于带磁芯的变压器。
图3所示的内绕线变压器300形成在石英衬底302上。焊线304提供在第一半导体管芯上形成的高电压集成电路(例如,具有等于或者大于5千伏的电压)与内绕线型变压器300的高电压铜绕组306之间的电气连接。焊线308提供在第二半导体管芯上形成的“低”电压集成电路与内绕线型变压器300的低电压铜绕组310之间的电气连接。如上所述,高电压铜绕组306和低电压铜绕组310被电介质(例如苯并环丁烯(BCB))分开并根据布局设计具有一个最小的绕组间分开厚度。在使用BCB的实施例中,在一个具有7/7圈(没显示在图3的示意图中),在外侧的大小为2100x2100μm、内侧的大小为800x800μm的变压器内,变压器各绕组的铜金属的宽度可以为20μm,各绕组之间的间距为25μm,其各绕组的厚度可以为5μm。图4示出图3中带有10μm厚的分开高电压铜绕组线圈306和低电压铜绕组线圈310的BCB层的内绕线变压器的剖视图。
由于根据本领域技术人员所熟知的技术,高电压铜绕组304和低电压铜绕组308可以直接电镀或沉积在石英衬底302上,图3和图4所示的内绕线平面变压器实施例300的工艺方面相当优越。铜与石英的粘合是非常好的,如同应力与晶片弯曲度。如上所述,因为石英是绝缘体,所以不会发生电介质击穿到衬底302。石英的介电强度为25-40V/μm,则对于750μm(或者更厚的)厚石英衬底来说,将不会有到衬底的过早击穿。在石英可以被封装以前,减薄晶片,例如薄至16密耳,需要小心以确保到衬底的击穿电压保持在额定隔离等级以上。
使用石英衬底的另一个优点是在频域里,用于电感的公认的优值被称作“Q因子”并被定义为阻抗的虚数部分与实数部分的比率。在硅衬底上形成的电感器或者变压器里,随着频率的提高,会在硅衬底发生涡流电流。这是在硅的集成螺旋电感器中公知的现象。石英衬底的使用有效地消除了涡流电流的存在,并且允许电感器或者变压器获得他的最大可能频率响应。结果是最大Q的值大幅增长。(应注意的是,本领域里技术人员将明白本文所公开的关于在石英衬底上形成的变压器的概念和主题,同样适用于在石英衬底上形成的电感器。)
图5示出的是图3和图4示出的在石英上的内绕线变压器300的频率响应。如上所述,在本设计里,金属是5μm厚的铜,螺旋线圈有7个绕组,金属的宽度为20μm,并且金属与金属之间的间距是25μm。金属被10μm厚的BCB层覆盖作为钝化层。如图5所示,石英衬底能在400MHz频率下达到最大Q值,与此相比,同样的设计下硅晶片只能达到70MHz的频率。石英衬底的最大Q值在图5里与硅晶片的10相比可以达到更高的19。
图6示出高电压硅管芯与低电压硅管芯以及四个内绕线变压器键合到石英衬底上形成的一个多通道实施例。虽然图6所示的是内绕线八角变压器设计,但是其他的内绕线设计(例如图3和图4所示的设计)或者堆叠设计也可以被采用。石英上的本地铜布线被用来将四个内绕线变压器互连在高电压管芯和低电压管芯之间。在图6的实施例中,四个变压器可以被集成进44个引脚的PLCC封装。这就允许焊线的金属垫片围绕石英衬底的边缘分布并且使用本地铜互连来连接到变压器。如果不使用公共的石英衬底和互连在石英上的本地铜布线以分布线焊垫片,此多通道设计不能装进44个引脚的PLCC封装。
应理解的是,本文所述的特定的实施例是通过实例的方式阐述的,并且本领域技术人员容易想到许多修改而不偏离如在权利要求和其等同物所表达的要求保护的主题范围。

Claims (20)

1.一种集成电路系统,包含:
第一集成电路管芯,所述第一集成电路管芯具有形成在其上的第一个集成电路;
第二集成电路管芯,所述第二集成电路管芯具有形成在其上的第二个集成电路;以及
形成在电介质衬底上并且电气连接在所述第一集成电路和所述第二集成电路之间的变压器。
2.根据权利要求1中所述的集成电路系统,其中,所述电介质衬底包含石英衬底。
3.根据权利要求1中所述的集成电路系统,其中,所述电介质衬底包含玻璃衬底。
4.根据权利要求1中所述的集成电路系统,其中,所述变压器包含空气芯变压器。
5.根据权利要求1中所述的集成电路系统,其中,所述变压器包括磁芯。
6.根据权利要求1中所述的集成电路系统,其中,所述第一集成电路管芯和所述第二集成电路管芯附在所述电介质衬底上。
7.根据权利要求1中所述的集成电路系统,其中,所述第一集成电路具有与其相关的高于或者等于5千伏的电压。
8.一种集成电路系统,包含:
石英衬底;
第一集成电路管芯,所述第一集成电路管芯附在所述石英衬底上并且具有形成在其上的第一集成电路,所述第一集成电路具有与其关联的第一电压;
第二集成电路管芯,所述第二集成电路管芯附在所述石英衬底上并且具有形成在其上的第二集成电路,所述第二集成电路具有与其关联的第二电压,所述第二电压小于所述第一电压;
在所述石英衬底上形成的并且电气连接在所述第一集成电路和所述第二集成电路之间以提供其间电隔离的变压器。
9.根据权利要求8中所述的集成电路系统,其中,所述第一集成电路管芯和所述第二集成电路管芯形成在所述石英衬底上。
10.根据权利要求8中所述的集成电路系统,其中,所述第一电压高于或者等于5千伏。
11.根据权利要求8中所述的集成电路系统,其中,所述变压器系统包含内绕线变压器。
12.根据权利要求8中所述的集成电路系统,其中,所述变压器系统包含堆叠式变压器。
13.根据权利要求8中所述的集成电路系统,其中,所述变压器系统包含多个内绕线变压器以提供所述第一集成电路和所述第二集成电路之间的多通道信号的通信。
14.根据权利要求8中所述的集成电路系统,其中,
所述第一集成电路包括对所述第一集成电路产生的数据进行编码并将编码过的数据通过所述变压器传输给所述第二集成电路的第一编码/解码器,以及其中,
所述第二集成电路包括对由所述第一集成电路传输过来的编码过的数据进行解码并且提取数据以供所述第二集成电路使用的第二编码/解码器。
15.一种形成集成电路系统的方法,包括:
提供第一集成电路管芯,所述第一集成电路管芯具有形成在其上的第一集成电路;
提供第二集成电路管芯,所述第二集成电路管芯具有形成在其上的第二集成电路;以及
将在电介质衬底上形成的变压器系统电气连接在所述第一集成电路和所述第二集成电路之间以提供其间的电隔离。
16.根据权利要求15中所述的方法,其中,所述电介质衬底包含石英。.
17.根据权利要求15中所述的方法,其中,所述第一集成电路管芯系统和所述第二集成电路管芯系统附在所述石英衬底上。
18.根据权利要求15中所述的方法,其中,所述变压器系统包含内绕线变压器。
19.根据权利要求15中所述的方法,其中,所述变压器系统包含堆叠式变压器。
20.根据权利要求12中所述的方法,其中,所述变压器系统包含多个内绕线变压器以提供所述第一集成电路和所述第二集成电路间之间的多通道信号的通信。
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104969312A (zh) * 2013-02-08 2015-10-07 高通股份有限公司 无基板分立耦合电感器结构
CN110858579A (zh) * 2018-08-23 2020-03-03 凌力尔特科技控股有限责任公司 隔离架构
CN116110894A (zh) * 2022-12-27 2023-05-12 重庆线易电子科技有限责任公司 数字隔离器及电子设备

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8519506B2 (en) * 2011-06-28 2013-08-27 National Semiconductor Corporation Thermally conductive substrate for galvanic isolation
US8659149B2 (en) * 2011-08-09 2014-02-25 National Semiconductor Corporation Semiconductor structure with galvanic isolation
US8674418B2 (en) * 2011-08-19 2014-03-18 National Semiconductor Corporation Method and apparatus for achieving galvanic isolation in package having integral isolation medium
GB2501528B (en) 2012-04-27 2018-07-11 Metaswitch Networks Ltd Telecommunications equipment
US9136213B2 (en) 2012-08-02 2015-09-15 Infineon Technologies Ag Integrated system and method of making the integrated system
US20140152410A1 (en) 2012-12-03 2014-06-05 Arizona Board of Regents, a body corporate of the State of Arizona Acting for and on behalf of Arizo Integrated tunable inductors
WO2014135209A1 (en) 2013-03-06 2014-09-12 SiEVA Apparatus for high side transistor bridge driver
KR101526680B1 (ko) * 2013-08-30 2015-06-05 현대자동차주식회사 절연 게이트 양극성 트랜지스터 모듈의 온도 센싱 회로
US9781780B1 (en) 2014-08-22 2017-10-03 Musco Corporation Apparatus, method, and system for galvanically isolated control and monitoring of LED drivers
US9257834B1 (en) 2015-02-13 2016-02-09 The Silanna Group Pty Ltd. Single-laminate galvanic isolator assemblies
JP2017063146A (ja) * 2015-09-25 2017-03-30 パナソニックIpマネジメント株式会社 トランス装置およびその製造方法
US10575395B2 (en) 2016-06-07 2020-02-25 Honeywell International Inc. Band pass filter-based galvanic isolator
US10903746B2 (en) 2016-08-05 2021-01-26 Texas Instruments Incorporated Load dependent in-rush current control with fault detection across Iso-barrier
US10651147B2 (en) 2016-09-13 2020-05-12 Allegro Microsystems, Llc Signal isolator having bidirectional communication between die
US10090769B2 (en) 2016-11-29 2018-10-02 Texas Instruments Incorporated Isolated high frequency DC/DC switching regulator
US10761111B2 (en) 2017-05-25 2020-09-01 Texas Instruments Incorporated System and method for control of automated test equipment contactor
US10622908B2 (en) 2017-09-19 2020-04-14 Texas Instruments Incorporated Isolated DC-DC converter
US10432102B2 (en) 2017-09-22 2019-10-01 Texas Instruments Incorporated Isolated phase shifted DC to DC converter with secondary side regulation and sense coil to reconstruct primary phase
US11127689B2 (en) 2018-06-01 2021-09-21 Qorvo Us, Inc. Segmented shielding using wirebonds
US11219144B2 (en) 2018-06-28 2022-01-04 Qorvo Us, Inc. Electromagnetic shields for sub-modules
US11114363B2 (en) 2018-12-20 2021-09-07 Qorvo Us, Inc. Electronic package arrangements and related methods
US11515282B2 (en) 2019-05-21 2022-11-29 Qorvo Us, Inc. Electromagnetic shields with bonding wires for sub-modules
US11115244B2 (en) 2019-09-17 2021-09-07 Allegro Microsystems, Llc Signal isolator with three state data transmission
US11705930B2 (en) * 2020-09-30 2023-07-18 Skyworks Solutions, Inc. Measurement and calibration of mismatch in an isolation channel
CN113933558A (zh) * 2021-10-13 2022-01-14 江苏斯菲尔电气股份有限公司 一种可自动识别电流互感器规格并设置变比的仪表
EP4432317A1 (en) * 2023-03-16 2024-09-18 Infineon Technologies Austria AG Transformer arrangement

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020186114A1 (en) * 1999-02-26 2002-12-12 Memscap Inductor for integrated circuit
US20030042571A1 (en) * 1997-10-23 2003-03-06 Baoxing Chen Chip-scale coils and isolators based thereon
US7064442B1 (en) * 2003-07-02 2006-06-20 Analog Devices, Inc. Integrated circuit package device
US20080013635A1 (en) * 2004-06-03 2008-01-17 Silicon Laboratories Inc. Transformer coils for providing voltage isolation

Family Cites Families (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2212080A5 (zh) * 1972-12-22 1974-07-19 Thomson Csf
US4375661A (en) * 1979-09-10 1983-03-01 Zenith Radio Corporation Overvoltage protection circuit for a television
DE3247543A1 (de) * 1982-12-22 1984-06-28 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur mehrkanaligen messung schwacher, sich aendernder magnetfelder und verfahren zu ihrer herstellung
US4646319A (en) * 1985-02-27 1987-02-24 Westinghouse Electric Corp. Bidirectional bus coupler presenting peak impedance at carrier frequency
US4713723A (en) * 1986-07-01 1987-12-15 Kaufman Lance R Isolation transformer
FR2624801B1 (fr) * 1987-12-16 1990-04-13 Michelin & Cie Elements necessaires a l'excitation et a l'ecoute des modules de roues dans un systeme de surveillance des roues d'un vehicule
DE4117878C2 (de) * 1990-05-31 1996-09-26 Toshiba Kawasaki Kk Planares magnetisches Element
US6107674A (en) * 1993-05-05 2000-08-22 Ixys Corporation Isolated multi-chip devices
US6147393A (en) * 1993-05-05 2000-11-14 Ixys Corporation Isolated multi-chip devices
US6344271B1 (en) * 1998-11-06 2002-02-05 Nanoenergy Corporation Materials and products using nanostructured non-stoichiometric substances
US5747982A (en) * 1996-12-05 1998-05-05 Lucent Technologies Inc. Multi-chip modules with isolated coupling between modules
US5781077A (en) * 1997-01-28 1998-07-14 Burr-Brown Corporation Reducing transformer interwinding capacitance
US5952849A (en) * 1997-02-21 1999-09-14 Analog Devices, Inc. Logic isolator with high transient immunity
US6873065B2 (en) * 1997-10-23 2005-03-29 Analog Devices, Inc. Non-optical signal isolator
FR2771843B1 (fr) * 1997-11-28 2000-02-11 Sgs Thomson Microelectronics Transformateur en circuit integre
US6738275B1 (en) * 1999-11-10 2004-05-18 Electromed Internationale Ltee. High-voltage x-ray generator
US8571179B2 (en) * 1999-11-10 2013-10-29 Robert Beland Computed tomography systems
US6891461B2 (en) * 1999-11-23 2005-05-10 Intel Corporation Integrated transformer
US6262600B1 (en) * 2000-02-14 2001-07-17 Analog Devices, Inc. Isolator for transmitting logic signals across an isolation barrier
DE10115279A1 (de) * 2000-03-31 2001-10-18 Toshiba Lighting & Technology Entladungslampenlicht und Leuchteinrichtung hierfür
FR2818824B1 (fr) * 2000-12-21 2003-03-21 St Microelectronics Sa Commutateur integre a commande par transformateur rf
US8116602B2 (en) * 2001-04-03 2012-02-14 Infinera Corporation High efficiency optical mode transformer for matching a single mode fiber to a high index contrast planar waveguide
DE60234775D1 (de) * 2001-08-09 2010-01-28 Nxp Bv Planares induktives bauelement und flachtransformator
US6856007B2 (en) * 2001-08-28 2005-02-15 Tessera, Inc. High-frequency chip packages
US6924724B2 (en) * 2003-01-24 2005-08-02 Solarflare Communications, Inc. Method and apparatus for transformer bandwidth enhancement
WO2004100473A2 (en) * 2003-04-30 2004-11-18 Analog Devices, Inc. Signal isolators using micro-transformers
US6927663B2 (en) * 2003-07-23 2005-08-09 Cardiac Pacemakers, Inc. Flyback transformer wire attach method to printed circuit board
US20050088376A1 (en) * 2003-10-28 2005-04-28 Matsushita Electric Industrial Co., Ltd. Capacitive load driver and plasma display
US20060023387A1 (en) * 2004-07-15 2006-02-02 Iowa State University Research Foundation, Inc. ESD device for high speed data communication system with improved bandwidth
US7548411B2 (en) * 2004-10-29 2009-06-16 Hitachi, Ltd. Electronic circuit structure, power supply apparatus, power supply system, and electronic apparatus
JP2006211744A (ja) * 2005-01-25 2006-08-10 Sony Corp スイッチング電源回路
JP2006217747A (ja) * 2005-02-04 2006-08-17 Sony Corp スイッチング電源回路
US7427801B2 (en) * 2005-04-08 2008-09-23 International Business Machines Corporation Integrated circuit transformer devices for on-chip millimeter-wave applications
US7315212B2 (en) * 2005-04-13 2008-01-01 International Business Machines Corporation Circuits and methods for implementing transformer-coupled amplifiers at millimeter wave frequencies
US7101226B1 (en) * 2005-06-08 2006-09-05 Wave Intellectual Property, Inc. Compact contour electrical converter package
DE102005036116B4 (de) * 2005-08-01 2012-03-22 Infineon Technologies Ag Leistungshalbleitermodul
WO2007018227A1 (ja) * 2005-08-11 2007-02-15 Murata Manufacturing Co., Ltd. 絶縁型スイッチング電源装置
JP2007250891A (ja) * 2006-03-16 2007-09-27 Fuji Electric Device Technology Co Ltd パワーエレクトロニクス機器
JP4918795B2 (ja) * 2006-03-16 2012-04-18 富士電機株式会社 パワーエレクトロニクス機器
US7719305B2 (en) * 2006-07-06 2010-05-18 Analog Devices, Inc. Signal isolator using micro-transformers
US20080278275A1 (en) * 2007-05-10 2008-11-13 Fouquet Julie E Miniature Transformers Adapted for use in Galvanic Isolators and the Like
US7427856B2 (en) * 2006-12-29 2008-09-23 General Electric Company Current sensing apparatus
US7570144B2 (en) * 2007-05-18 2009-08-04 Chartered Semiconductor Manufacturing, Ltd. Integrated transformer and method of fabrication thereof
TWI389283B (zh) * 2007-10-22 2013-03-11 Analog Devices Inc 具有絕緣墊片以減少元件間漏電之封裝微晶片
JP5253012B2 (ja) * 2008-06-24 2013-07-31 ローム株式会社 パワー半導体の駆動回路装置およびそれに用いる信号伝達回路装置
US8815700B2 (en) * 2008-12-08 2014-08-26 Texas Instruments Incorporated Method of forming high lateral voltage isolation structure involving two separate trench fills

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030042571A1 (en) * 1997-10-23 2003-03-06 Baoxing Chen Chip-scale coils and isolators based thereon
US20020186114A1 (en) * 1999-02-26 2002-12-12 Memscap Inductor for integrated circuit
US7064442B1 (en) * 2003-07-02 2006-06-20 Analog Devices, Inc. Integrated circuit package device
US20080013635A1 (en) * 2004-06-03 2008-01-17 Silicon Laboratories Inc. Transformer coils for providing voltage isolation

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
陈大为等: "片上螺旋电感集总模型中衬底因子的分析与拟合", 《电子器件》, vol. 32, no. 3, 30 June 2009 (2009-06-30) *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104969312A (zh) * 2013-02-08 2015-10-07 高通股份有限公司 无基板分立耦合电感器结构
CN104969312B (zh) * 2013-02-08 2018-05-15 高通股份有限公司 无基板分立耦合电感器结构
US10115661B2 (en) 2013-02-08 2018-10-30 Qualcomm Incorporated Substrate-less discrete coupled inductor structure
CN110858579A (zh) * 2018-08-23 2020-03-03 凌力尔特科技控股有限责任公司 隔离架构
CN116110894A (zh) * 2022-12-27 2023-05-12 重庆线易电子科技有限责任公司 数字隔离器及电子设备
CN116110894B (zh) * 2022-12-27 2023-11-03 重庆线易电子科技有限责任公司 数字隔离器及电子设备

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