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CN102877038B - Transparent conductive film reeling coating device and application method thereof - Google Patents

Transparent conductive film reeling coating device and application method thereof Download PDF

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Publication number
CN102877038B
CN102877038B CN201210363929.1A CN201210363929A CN102877038B CN 102877038 B CN102877038 B CN 102877038B CN 201210363929 A CN201210363929 A CN 201210363929A CN 102877038 B CN102877038 B CN 102877038B
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chamber
coating
coating chamber
gas
nesa
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CN102877038A (en
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江成军
夏国涛
李章国
钟欣
柳锡运
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SHENZHEN CSG DISPLAY DEVICES CO Ltd
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SHENZHEN CSG DISPLAY DEVICES CO Ltd
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Abstract

The invention relates to a transparent conductive film reeling coating device and an application method thereof. A transparent conductive film reeling coating device comprises an unreeling chamber, a coating chamber and a reeling chamber which are orderly connected, also comprises a control system, wherein the control system comprises: a gas analyzer disposed in the coating chamber for analyzing components and contents of gas in the coating chamber; a vacuum gauge disposed in the coating chamber for measuring the gas pressure in the coating chamber; a gas flowmeter disposed on a gas inlet pipe of the coating chamber for controlling the gas inflow of the coating chamber; a tension control system disposed in the unreeling chamber, the coating chamber and the reeling chamber for controlling the smooth running of flexible base materials; and a computer connected with the on-line gas analyzer, the vacuum gauge, the gas flowmeter, an on-line resistance meter, and an on-line transmittance tester. The transparent conductive film reeling coating device performs real-time adjustment of the gas inflow of the coating chamber through on-line monitoring of the working parameters of the coating chamber, and thus provides a high production control degree, controllable product performance, and improved production efficiency.

Description

Nesa coating coil film coating apparatus and using method thereof
Technical field
The present invention relates to a kind of winding film plating equipment, particularly relate to a kind of coil film coating apparatus for flexible transparent conducting film and using method thereof.
Background technology
Vacuum winding coating technique is the technology of preparing one deck or multilayer by the method such as thermal evaporation or magnetron sputtering on flexible parent metal surface and have the film of certain function in vacuum chamber.Vacuum winding filming equipment technical characteristics is: one, and plated base material is flexible parent metal, has the property of coiling; Its two, coating process has continuity, within a work period, plated film carries out continuously; Its three, coating process carries out in certain vacuum environment.Rotate so the basic structure of vacuum winding filming equipment must have to reel, have unreeling and rolling of base material.Unreel with wrapup procedure in base material be coated with film.The structure of plated film is exactly the operate portions of vacuum winding filming equipment.It is between the unwinding and rewinding of base material.The principle of work of plated film part can be any one in thermal resistance evaporation, induction evaporation mode, electron beam evaporation, magnetron sputtering or other vacuum coating method.
The control techniques that traditional flexible transparent conducting film is produced is only the control to power parameter, not high for the controllability of process.
Summary of the invention
Based on this, be necessary the nesa coating coil film coating apparatus and the using method thereof that provide a kind of production control degree higher.
A kind of nesa coating coil film coating apparatus, comprise be successively connected unreel chamber, coating chamber and rolling chamber and vacuum acquiring system, flexible parent metal is transported to plated film in described coating chamber by the described chamber that unreels, form nesa coating, described rolling chamber is used for receiving described nesa coating, and described vacuum acquiring system is installed on described coating chamber, for obtaining the required vacuum state of plated film, described nesa coating coil film coating apparatus also comprises Controlling System, and described Controlling System comprises:
Gas analyzer, is located in described coating chamber, and for analyzing gaseous constituent and the content in described coating chamber, gas wherein has Ar, O 2, H 2o, H 2, N 2, CO, CO 2deng;
Vacuumometer, is located in described coating chamber, and for measuring the air pressure in described coating chamber, plated film operating air pressure is generally 10 -4~10 -3torr;
Gas meter, is located on the intake ducting of described coating chamber, for controlling the air input of described coating chamber;
Tension control system, is located at that to unreel chamber, coating chamber and rolling indoor, for controlling the smooth running of flexible parent metal; And
Computer, takes into account gas meter and is connected with described on-line gas analysis instrument, vacuum.
In an embodiment, described Controlling System also comprises to be located in described coating chamber and the resistance instrument being connected with described computer, for detection of the resistance of nesa coating therein.
In an embodiment, described Controlling System also comprises to be located in described coating chamber and the online transmission measurement instrument being connected with described computer, for detecting in real time the transmitance of nesa coating therein.
A using method for above-mentioned nesa coating coil film coating apparatus, comprises the steps:
Base material enters described coating chamber from the described chamber of unreeling and carries out plated film;
Determine in described coating chamber that according to the measuring result of described on-line gas analysis instrument and described vacuumometer foreign gas is (as H 2o, N 2, NO x, CO, CO 2, CH 4deng gas) content, H under normal circumstances 2the partial pressure of O is 1 ~ 2.5 × 10 -6torr, N 2partial pressure 5 ~ 9 × 10 -8torr;
In the time that described computer judges that the content (characterizing by partial pressure) of described foreign gas increases, described gas meter reduces the air input of described coating chamber process gas, in the time that described computer judges that the content of described foreign gas reduces, described gas meter increases the air input of described coating chamber process gas, and
The nesa coating forming after plated film is sent into described rolling chamber.
Above-mentioned nesa coating coil film coating apparatus, by the working parameter of on-line monitoring coating chamber, is adjusted the air input of coating chamber in real time, and therefore production control degree is higher, and then has improved production efficiency.
Brief description of the drawings
Fig. 1 is the structural representation of the nesa coating coil film coating apparatus of an embodiment.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail.A lot of details are set forth in the following description so that fully understand the present invention.But the present invention can implement to be much different from alternate manner described here, and those skilled in the art can do similar improvement without prejudice to intension of the present invention in the situation that, and therefore the present invention is not subject to the restriction of following public concrete enforcement.
Refer to Fig. 1, the nesa coating coil film coating apparatus 100 of one embodiment comprise be successively connected unreel chamber 10, coating chamber 20, rolling chamber 30 and vacuum acquiring system (figure does not show, is installed on described coating chamber 20, for obtaining the required vacuum state of plated film).
Unreel in chamber 10 and be provided with unwinding device 11, for base material 12 being transported to the interior plated film of coating chamber 20.Base material 12 is flexible parent metal, for example PET(polyethylene terephthalate), PEN(PEN), PC(polycarbonate), PI(polyimide), PMMA(polymethylmethacrylate) etc.
Unreel and in chamber 10, be provided with multiple charging guide rollers 22.Between multiple charging guide rollers 22, be also provided with the heating source 221 for heated substrate 12.Heating source 221 is preferably Infrared heaters, and it is positioned near base material 12, for removing the steam, the organism etc. that are attached to substrate surface.Owing to being that vacuum unreels chamber, so heat the effect of adsorbents such as can reaching good removal pet sheet face steam, organism by infrared emanation by Infrared heaters.
In coating chamber 20, vacuumize, and pass into process gas by the intake ducting 21 of being located on coating chamber 20 inwalls, for example O 2, Ar, N 2, H 2o, H 2deng.
In coating chamber 20, be provided with main warming mill 23 and ion source 222.The both sides of main warming mill 23 are also respectively equipped with two targets 231.When working, target 231 can, by bottom and conductive layer deposition at substrate surface, form nesa coating 32.Bottom can be MgF 2, TiO 2, SiO 2, Al 2o 3, Nb 2o 5, Ta 2o 5, ZrO 2in one or more; Conductive layer can be ITO, AZO, the one in Graphene (Graphene), two kinds.
Rolling chamber 30 comprises discharging guide roller 24 and wrap-up 31, for receiving the nesa coating 32 from coating chamber 20.
In coating chamber 20, be also provided with gas analyzer 25, vacuumometer 26, gas meter 27 and resistance instrument 28 and transmission measurement instrument 29.Nesa coating coil film coating apparatus 100 also comprises computer (not shown), and gas analyzer 25, vacuumometer 26, gas meter 27, resistance instrument 28 and transmission measurement instrument 29 and computer form a Controlling System.
Gas analyzer 25 is located on the sidewall of coating chamber 20, for analyzing gaseous constituent and the content in coating chamber 20.For example, can the mass spectrum of gas to be measured be shown by gas analyzer 25, and contrast with standard database, just can determine composition and the content of gas.
Vacuumometer 26 is located on the sidewall relative with gas analyzer 25 of coating chamber 20, for measuring the air pressure in coating chamber 20.
Gas meter 27, is located on intake ducting 21, for controlling air input.
Resistance instrument 28 is located near of multiple discharging guide rollers 24, for detecting in real time the resistance of nesa coating 32.
Transmission measurement instrument 29 is located near of multiple discharging guide rollers 24, for detecting in real time the transmitance of nesa coating 32.
When use, base material 12 enters coating chamber 20 from the unwinding device 11 that unreels chamber 10, and moves along multiple charging guide rollers 22, after heating source 221 heating, enters main warming mill 23.Target 231, by conductive layer, is deposited on substrate surface, forms nesa coating 32.Nesa coating 32 moves along multiple discharging guide rollers 24, and back is transported to the interior collection rolling of wrap-up 31 of rolling chamber 30.
In the process of plated film, computer is by gas analyzer 25, vacuumometer 26 and resistance instrument and transmission measurement instrument 28 Real-time Collections and monitor the working condition of coating chamber 20.For example, such as, content by vacuumometer 26 and gas analyzer 25 analysing impurity gases (water vapour, nitrogen, carbon monoxide etc.) (by corresponding software by data feedbacks such as the dividing potential drops of foreign gas to computer, the content of foreign gas in real time reaction vacuum chamber), obtain resistance and the transmitance (showing in real time on computers by corresponding software) of nesa coating 32 by resistance instrument 28 and transmission measurement instrument 29.
Dividing of general aqueous vapor is under normal circumstances pressed in 1 ~ 2.5 × 10 -6torr, in the time that the content of foreign gas increases, control gas meter 27 reduces the air input of coating chamber 20 process gass.For example,, when the dividing potential drop of aqueous vapor has increased by 0.4 ~ 1.0 × 10 -6when Torr, the feed rate of oxygen is reduced to 0.1 ~ 0.3sccm.In like manner, in the time that the content of foreign gas reduces, controlling gas meter 27 increases the air input of coating chamber 20 process gass.By adjusting the feed rate of oxygen, while reaching plated film, target voltage is controlled, ensures target sputter under higher speed, realizes produce efficient, controlled; By adjusting the feed rate of oxygen, can adjust in real time the quality of rete simultaneously, ensure compactness and the tack of sputtered layer; By adjusting the feed rate of oxygen, ensure the optimal light electrical property of sputtered layer.
Above-mentioned nesa coating coil film coating apparatus 100 is by the working parameter of on-line monitoring coating chamber, adjust in real time the air input of coating chamber 20, therefore production control degree is higher, improved the controllability of product quality (as the performance such as optical, electrical), and then improved product yield and production efficiency.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.

Claims (1)

1. the using method of a nesa coating coil film coating apparatus, it is characterized in that, described nesa coating coil film coating apparatus comprises: what be connected successively unreels chamber, coating chamber, rolling chamber and vacuum acquiring system, flexible parent metal is transported to plated film in described coating chamber by the described chamber that unreels, form nesa coating, described rolling chamber is used for receiving described nesa coating, described vacuum acquiring system is installed on described coating chamber, for obtaining the required vacuum state of plated film, it is characterized in that, described nesa coating coil film coating apparatus also comprises Controlling System, described Controlling System comprises:
Gas analyzer, is located in described coating chamber, for analyzing gaseous constituent and the content in described coating chamber;
Vacuumometer, is located in described coating chamber, for measuring the air pressure in described coating chamber;
Gas meter, is located on the intake ducting of described coating chamber, for controlling the air input of described coating chamber;
Tension control system, is located at that to unreel chamber, coating chamber and rolling indoor, for controlling the smooth running of flexible parent metal; And
Computer, takes into account gas meter with described gas analyzer, vacuum and is connected;
Described Controlling System also comprises to be located in described coating chamber and the online resistance instrument being connected with described computer, for detecting in real time the resistance value of nesa coating;
Described Controlling System also comprises to be located in described coating chamber and the online transmission measurement instrument being connected with described computer, for detecting in real time the transmitance of nesa coating;
Described method comprises the steps:
Base material enters described coating chamber from the described chamber of unreeling and carries out plated film;
Determine the content of foreign gas in described coating chamber according to the measuring result of described gas analyzer and described vacuumometer;
In the time that described computer judges that the content of described foreign gas increases, described gas meter reduces the air input of described coating chamber process gas, in the time that described computer judges that the content of described foreign gas reduces, described gas meter increases the air input of described coating chamber process gas; And
The nesa coating forming after plated film is sent into described rolling chamber;
When the dividing potential drop of aqueous vapor has increased by 0.4~1.0 × 10 -6when Torr, the feed rate of oxygen is reduced to 0.1~0.3sccm.
CN201210363929.1A 2012-09-26 2012-09-26 Transparent conductive film reeling coating device and application method thereof Active CN102877038B (en)

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CN105603380B (en) * 2015-10-30 2018-02-13 武汉科技大学 A kind of vacuum coating high speed constant winding tension equipment and control method
CN105349961B (en) * 2015-11-30 2018-11-02 广东腾胜真空技术工程有限公司 Multiple roll multicell coil film coating apparatus
CN108165948A (en) * 2018-02-09 2018-06-15 旭科新能源股份有限公司 A kind of online real-time monitoring device and method for magnetron sputtering method production transparent conductive film
CN110091522A (en) * 2018-11-28 2019-08-06 平高集团有限公司 A kind of substrate winding device
CN110629191A (en) * 2019-11-01 2019-12-31 北京大学 Graphene film roll-to-roll production device and method
CN113603081B (en) * 2021-08-27 2022-08-23 辽宁分子流科技有限公司 Preparation method of graphene composite film
CN114959626A (en) * 2022-05-27 2022-08-30 九江德福科技股份有限公司 Preparation method and device of ultrathin flexible conductive composite film

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Publication number Priority date Publication date Assignee Title
JP2575891B2 (en) * 1989-09-21 1997-01-29 三菱重工業株式会社 Continuous vacuum deposition equipment
CN101033935A (en) * 2006-03-10 2007-09-12 奈普森株式会社 Film thickness measurement device
CN201610446U (en) * 2010-02-02 2010-10-20 深圳市海森应用材料有限公司 Winding film coating machine of ITO transparent conductive film
CN102304695A (en) * 2011-10-14 2012-01-04 南昌欧菲光科技有限公司 Method for on-line monitoring of residual gas on coiling coating machine

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2575891B2 (en) * 1989-09-21 1997-01-29 三菱重工業株式会社 Continuous vacuum deposition equipment
CN101033935A (en) * 2006-03-10 2007-09-12 奈普森株式会社 Film thickness measurement device
CN201610446U (en) * 2010-02-02 2010-10-20 深圳市海森应用材料有限公司 Winding film coating machine of ITO transparent conductive film
CN102304695A (en) * 2011-10-14 2012-01-04 南昌欧菲光科技有限公司 Method for on-line monitoring of residual gas on coiling coating machine

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