CN102861745B - Power-off protection silicon chip cleaning machine - Google Patents
Power-off protection silicon chip cleaning machine Download PDFInfo
- Publication number
- CN102861745B CN102861745B CN201210348357.XA CN201210348357A CN102861745B CN 102861745 B CN102861745 B CN 102861745B CN 201210348357 A CN201210348357 A CN 201210348357A CN 102861745 B CN102861745 B CN 102861745B
- Authority
- CN
- China
- Prior art keywords
- pipeline
- seal valve
- normally closed
- ripple seal
- silicon wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a power-off protection silicon chip cleaning machine, which comprises a process chamber and N2 pipelines positioned at the bottom of the process chamber, wherein the N2 pipelines comprise a normally-open N2 pipeline and a normally-closed N2 pipeline which are arranged in parallel; a normally-open corrugated sealing valve is arranged on the normally-open N2 pipeline; and a normally-closed corrugated sealing valve is arranged on the normally-closed N2 pipeline. Double-channel interlocking parallel design is adopted in the power-off protection silicon chip cleaning machine, and when a main power supply of equipment fails, the N2 pipelines are not interrupted due to power-off by opposite control actions of the two interlocked corrugated sealing valves, so that clean environment of the cleaning machine is ensured.
Description
Technical field
The present invention relates to Semiconductor Cleaning Technology field, particularly a kind of silicon wafer cleaner of anti-power failure protection.
Background technology
At semicon industry, need to be to after the silicon chip postchannel process copper-connection stage, porous medium material carries out hyperfine cleaning, Chuck(chuck) the silicon chip High Rotation Speed of clamping completes while cleaning, cleans and comprise that liquid rinsing, ultra-pure water rinse and N in processing chamber
2the techniques such as drying.Clean process in order to realize the recycling to chemical liquid, processing chamber adopts hierarchical design, Up/down unit drives Chuck to each technique position, drives Chuck to do high speed rotary motion by servomotor, by centrifugal force, chemical liquid is thrown to special accumulator tank the inside.In order to prevent that chemical liquids from water clock occurring downwards, need to be at the bottom of processing chamber back to blowing up N
2thereby, form one deck gas shield film from bottom to top in silicon chip bottom.Generally, if power-off occurs suddenly equipment, chemical liquids will remain in above silicon chip, if silicon chip bottom N now
2protection gas interrupts, and liquid may be by silicon chip edge water clock to processing chamber the inside, and severe contamination cleans the cleannes of environment.If whole equipment adopts UPS power-off protection, cost is higher.
Summary of the invention
(1) technical problem that will solve
The technical problem to be solved in the present invention is, for the deficiencies in the prior art, to provide a kind of silicon wafer cleaner of anti-power failure protection, to N
2pipeline carries out binary channels design, thereby ensures whole cleaning process N
2passage is all the time in unimpeded state.
(2) technical scheme
The silicon wafer cleaner that the invention provides a kind of anti-power failure protection, comprising: processing chamber and the N that is positioned at processing chamber bottom
2pipeline, described N
2pipeline comprises: often open N
2pipeline and normally closed N
2pipeline, the described N that often opens
2pipeline and normally closed N
2pipeline is arranged in parallel, the described N that often opens
2pipeline is provided with and often opens ripple seal valve, described normally closed N
2pipeline is provided with normally closed ripple seal valve.
Wherein, when described, when often opening ripple seal valve and opening, described normally closed ripple seal valve is closed; When described, when often opening ripple seal valve and closing, described normally closed ripple seal valve is opened.
Wherein, described ripple seal valve and the normally closed ripple seal valve often opened is by electromagnetism valve island pneumatic control.
Wherein, the silicon wafer cleaner of anti-power failure protection also comprises: be positioned at the pressure needle-valve on normally closed ripple seal valve front end pipeline.
Wherein, the silicon wafer cleaner of anti-power failure protection also comprises: be positioned at the check valve on the pipeline of normally closed ripple seal valve rear end.
Wherein, the silicon wafer cleaner of anti-power failure protection also comprises: be positioned at ultrasonic flowmeter and the filter often opened on the pipeline of ripple seal valve rear end, described ultrasonic flowmeter is positioned on the front end pipeline of described filter.
(3) beneficial effect
The silicon wafer cleaner of anti-power failure protection provided by the invention, adopts binary channels interlocking Parallel Design, and in the time of equipment main power source generation power-off, the ripple seal valve of two interlockings, by contrary control action, makes N
2path can not interrupt because of power-off, ensures cleaning machine clean environment.Brief description of the drawings
Fig. 1 is the silicon wafer cleaner pipeline structure schematic diagram of anti-power failure protection of the present invention;
Fig. 2 is the processing chamber structural representation of the silicon wafer cleaner of anti-power failure protection of the present invention.
Detailed description of the invention
Below in conjunction with drawings and Examples, the specific embodiment of the present invention is described in further detail.Following examples are used for illustrating the present invention, but are not used for limiting the scope of the invention.
As shown in Figure 1, the invention provides a kind of silicon wafer cleaner of anti-power failure protection, comprising: processing chamber 8 and the N that is positioned at processing chamber bottom
2pipeline, described N
2pipeline comprises: often open N
2pipeline 9 and normally closed N
2pipeline 10, the described N that often opens
2pipeline 9 and normally closed N
2pipeline 10 is arranged in parallel, the described N that often opens
2pipeline 9 is provided with and often opens ripple seal valve 4, described normally closed N
2pipeline 10 is provided with normally closed ripple seal valve 3.When described, when often opening ripple seal valve 4 and opening, described normally closed ripple seal valve 3 is closed, and when described, when often opening ripple seal valve 4 and closing, described normally closed ripple seal valve 3 is opened.Described ripple seal valve 4 and the normally closed ripple seal valve 3 of often opening is by electromagnetism valve island pneumatic control.
The silicon wafer cleaner of anti-power failure protection also comprises: be positioned at pressure needle-valve 2 on normally closed ripple seal valve 3 front end pipelines, be positioned at the check valve 7 on normally closed ripple seal valve 3 rear end pipelines and be positioned at ultrasonic flowmeter 5 and the filter 6 often opened on ripple seal valve 4 rear end pipelines, described ultrasonic flowmeter 5 is positioned on the front end pipeline of described filter 6.
Operation principle:
After device start, by high definition digital pressure switch 1, by default, to needed gas pressure, dry clean source of the gas (CDA) gas by electromagnetism valve island control is to often opening ripple seal valve 4 and normally closed ripple seal valve 3 carries out pneumatic control, often opens ripple seal valve 4 and opens formation and often open N
2pipeline 9; Normally closed ripple seal valve 3 is opened and is formed normally closed N
2pipeline 10, on the pipeline of normally closed ripple seal valve 3 front ends, arrange one can manual adjustments pressure needle-valve 2, manual unlocking pressure needle-valve 2 after device start, N when ensureing power-off
2can pass through smoothly.Described normally closed ripple seal valve 3 is by the open closed condition, normally closed N of being switched to
2pipeline 10 disconnects; Often open 4 of ripple seal valves and be switched to open mode by closed condition, often open N
2pipeline 9 keeps unimpeded, N
2through ultrasonic flowmeter 5 and filter 6, enter processing chamber 8.As shown in Figure 2, in described processing chamber, air flue adopts reducing, airflow design, under processing chamber 8 top silicon chips, place, edge offers evenly spaced oblique circular hole, ensures that air-flow has enough pressure to spray from inclined hole, forms the bottom-up mobile N of one deck in silicon chip bottom
2diaphragm.
Above embodiment is only for illustrating the present invention; and be not limitation of the present invention; the those of ordinary skill in relevant technologies field; without departing from the spirit and scope of the present invention; can also make a variety of changes and modification; therefore all technical schemes that are equal to also belong to category of the present invention, and scope of patent protection of the present invention should be defined by the claims.
Claims (5)
1. a silicon wafer cleaner for anti-power failure protection, is characterized in that, comprising: processing chamber and the N that is positioned at processing chamber bottom
2pipeline, described N
2pipeline comprises: often open N
2pipeline and normally closed N
2pipeline, the described N that often opens
2pipeline and normally closed N
2pipeline is arranged in parallel, the described N that often opens
2pipeline is provided with and often opens ripple seal valve, described normally closed N
2pipeline is provided with normally closed ripple seal valve, and normally closed ripple seal valve front end pipeline is provided with pressure needle-valve.
2. silicon wafer cleaner as claimed in claim 1, is characterized in that, when described, when often opening ripple seal valve and opening, described normally closed ripple seal valve is closed; When described, when often opening ripple seal valve and closing, described normally closed ripple seal valve is opened.
3. silicon wafer cleaner as claimed in claim 1 or 2, is characterized in that, described ripple seal valve and the normally closed ripple seal valve often opened is by electromagnetism valve island pneumatic control.
4. silicon wafer cleaner as claimed in claim 1, is characterized in that, the silicon wafer cleaner of anti-power failure protection also comprises: be positioned at the check valve on the pipeline of normally closed ripple seal valve rear end.
5. silicon wafer cleaner as claimed in claim 1; it is characterized in that; the silicon wafer cleaner of anti-power failure protection also comprises: be positioned at ultrasonic flowmeter and the filter often opened on the pipeline of ripple seal valve rear end, described ultrasonic flowmeter is positioned on the front end pipeline of described filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210348357.XA CN102861745B (en) | 2012-09-18 | 2012-09-18 | Power-off protection silicon chip cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210348357.XA CN102861745B (en) | 2012-09-18 | 2012-09-18 | Power-off protection silicon chip cleaning machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102861745A CN102861745A (en) | 2013-01-09 |
| CN102861745B true CN102861745B (en) | 2014-07-30 |
Family
ID=47441022
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210348357.XA Active CN102861745B (en) | 2012-09-18 | 2012-09-18 | Power-off protection silicon chip cleaning machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102861745B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201171925Y (en) * | 2007-11-26 | 2008-12-31 | 北京有色金属研究总院 | Isopropyl alcohol supply device used in silicon-slice isopropyl alcohol drying method |
| CN102005367A (en) * | 2010-09-10 | 2011-04-06 | 上海集成电路研发中心有限公司 | Semiconductor silicon wafer cleaning process cavity and cleaning method |
| CN201935527U (en) * | 2010-12-08 | 2011-08-17 | 北京有色金属研究总院 | Quick drying device used after cleaning of silicon chip |
| CN202824050U (en) * | 2012-09-18 | 2013-03-27 | 北京七星华创电子股份有限公司 | Anti-power-off protective silicon wafer cleaning machine |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0864568A (en) * | 1994-08-23 | 1996-03-08 | Toshiba Corp | Wafer cleaning device |
| JP4623706B2 (en) * | 2004-04-14 | 2011-02-02 | 東京エレクトロン株式会社 | Ultrasonic cleaning equipment |
-
2012
- 2012-09-18 CN CN201210348357.XA patent/CN102861745B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201171925Y (en) * | 2007-11-26 | 2008-12-31 | 北京有色金属研究总院 | Isopropyl alcohol supply device used in silicon-slice isopropyl alcohol drying method |
| CN102005367A (en) * | 2010-09-10 | 2011-04-06 | 上海集成电路研发中心有限公司 | Semiconductor silicon wafer cleaning process cavity and cleaning method |
| CN201935527U (en) * | 2010-12-08 | 2011-08-17 | 北京有色金属研究总院 | Quick drying device used after cleaning of silicon chip |
| CN202824050U (en) * | 2012-09-18 | 2013-03-27 | 北京七星华创电子股份有限公司 | Anti-power-off protective silicon wafer cleaning machine |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102861745A (en) | 2013-01-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103871938B (en) | For cleaning the rinse bath of semiconductor crystal wafer | |
| KR102635712B1 (en) | Substrate cleaning device, substrate cleaning method, substrate processing device, and substrate drying device | |
| US20120227768A1 (en) | Liquid Processing Apparatus, Liquid Processing Method, and Recording Medium Having Computer Program for Performing the Same Method | |
| TW202131386A (en) | Substrate processing apparatus substrate processing method and recording medium | |
| KR20080028921A (en) | Liquid processing apparatus and liquid processing method | |
| CN103170469A (en) | Device and method for cleaning and drying wafer cassettes | |
| KR102581139B1 (en) | Substrate processing apparatus and method for detecting clogging of exhaust pipe in substrate processing apparatus | |
| US20170092530A1 (en) | Substrate holding/rotating device, substrate processing apparatus including the same, and substrate processing method | |
| CN206225326U (en) | A kind of cleaning device | |
| CN109478524A (en) | Baseplate support device | |
| CN201812803U (en) | Atmospheric transmission unit and wafer transmission system with the same | |
| JP2016167514A (en) | Substrate cleaning device, substrate cleaning method, and substrate processing device | |
| CN102861745B (en) | Power-off protection silicon chip cleaning machine | |
| CN202824050U (en) | Anti-power-off protective silicon wafer cleaning machine | |
| JP2015177090A (en) | Process liquid supply device | |
| JP2015099851A (en) | Substrate cleaning device and substrate processing device | |
| JP2017034188A (en) | Substrate processing apparatus and process liquid discharge method | |
| CN201721623U (en) | Washing, drying and encapsulating linked machine set | |
| JP2014027201A (en) | Substrate processing device | |
| JP2011204933A (en) | Substrate processing apparatus | |
| CN210420124U (en) | Vacuum coating equipment | |
| CN102243988B (en) | The cleaning processing chamber of semi-conductor silicon chip and the cleaning of semi-conductor silicon chip | |
| CN105562412B (en) | The cleaning machine and cleaning method of a kind of ink horn of regeneration | |
| CN206622989U (en) | A kind of Jet Polishing self-stripping unit | |
| CN105590879A (en) | Automatic photoetching plate cleaning machine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |