CN102668025A - Exposure device - Google Patents
Exposure device Download PDFInfo
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- CN102668025A CN102668025A CN2010800580609A CN201080058060A CN102668025A CN 102668025 A CN102668025 A CN 102668025A CN 2010800580609 A CN2010800580609 A CN 2010800580609A CN 201080058060 A CN201080058060 A CN 201080058060A CN 102668025 A CN102668025 A CN 102668025A
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- mentioned
- light
- light beam
- switch element
- beam spot
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
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- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Disclosed is an exposure device provided with: a beam spot generation means (9) that receives light (L1) from a light source and generates a plurality of beam spots at prescribed intervals, in at least two staggered rows; an optical scanning means (10) that moves the plurality of beam spots back and forth a prescribed amount in the direction in which the rows of beam spots extend; a pattern generator (11); and a projection lens (12). A plurality of prism-shaped switching elements comprising an electro-optical crystal material are arranged such that the central axes thereof are aligned with the centers of the back-and-forth scan ranges of the aforementioned beam spots, and each switching element is provided with a pair of electrodes on an opposing surface parallel to the central axis of said switching element. The switching elements are wider in the scan direction of the beam spots than the beam spots are. By turning the plurality of switching elements on and off, the pattern generator (11) optically modulates the aforementioned light (L1) to generate a prescribed pattern of light and dark. The projection lens (12) projects said pattern onto a color filter substrate (5).
Description
Technical field
The present invention relates to the switch element that is made up of the electrooptic crystal material is driven the LO-pattern that generates regulation; And with the exposure device of this LO-pattern exposure on quilt exposure body; Detailed, relate to exposure position is simulated the exposure device that control improves the positioning accuracy of exposing patterns.
Background technology
This exposure device of prior art; Through will in two dimensional surface, arranging the pattern generator that forms by a plurality of switch elements that the electrooptic crystal material constitutes; Generate the pattern of regulation; And this pattern that made public by the exposure body to carrying to a direction; Above-mentioned pattern generator; By the throughput direction of exposure body with predetermined distance configuration multiple row switch element row, and switch element that will be adjacent row each other be configured by the deviation in driction ormal weight of the throughput direction quadrature of exposure body, wherein these switch element row be with a plurality of switch elements with the direction of the throughput direction quadrature of the body that made public on be configured to (for example with reference to the patent documentation 1) that the straight line shape forms with prescribed distance.
Technical literature formerly
Patent documentation
Patent documentation 1:JP spy opens the 2007-310251 communique
Brief summary of the invention
The problem that invention will solve
But; In the exposure device of such prior art; Owing to the resolution of exposure position by the end face size (pixel size) of switch element and switch element be listed as to determined by the bias of the direction of the throughput direction quadrature of exposure body, so, pixel size is diminished in order to improve the resolution of exposure position; And make switch element be listed as to diminished by the bias of direction of the throughput direction quadrature of exposure body, have the manufacturing difficulty of pattern generator, the anxiety of component costs raising.
Summary of the invention
Therefore, the objective of the invention is to, a kind of such problem of tackling is provided, exposure position is simulated control, with the exposure device of the positioning accuracy that improves exposing patterns.
Be used to solve the technological means of problem
To achieve these goals, exposure device of the present invention possesses: the light beam spot generation unit, and it is accepted light source light and is arranged in 2 row with staggering each other at least and generates a plurality of light beam spots with predetermined distance; Light scanning unit, it makes above-mentioned a plurality of light beam spot in prescribed limit separately, come and go scanning along their orientation; Pattern generator; It is configured to make the center of round scanning of above-mentioned a plurality of light beam spots consistent with central shaft separately, and carries out on/off through a plurality of switch elements and drive, thereby above-mentioned light source light is carried out the LO-pattern that light modulation generates regulation; Wherein, Above-mentioned a plurality of switch element is provided with pair of electrodes in the opposed faces with above-mentioned central axes, is shaped as flat column, is made up of the electrooptic crystal material; And projecting lens, it is projected in above-mentioned LO-pattern by on the exposure body, makes above-mentioned each switch element bigger at the width of equidirectional than above-mentioned light beam spot at the width of the scanning direction of above-mentioned light beam spot.
Through adopting such structure; Accept light source light through the light beam spot generation unit; At least be arranged in 2 row to generate a plurality of light beam spots with predetermined distance with staggering each other; Make these a plurality of light beam spots in prescribed limit separately, come and go scanning in their orientation through light scanning unit; Be configured to make the center of round scanning of above-mentioned a plurality of light beam spots consistent with central shaft separately through pattern generator; Carry out on/off through a plurality of switch elements that constitute by the electrooptic crystal material and drive, thereby light source light is carried out the LO-pattern that light modulation generates regulation, this LO-pattern is projected in by on the exposure body through projecting lens to the flat column that is provided with pair of electrodes in opposed faces with this central axes.In this case; Through making each switch element bigger than light beam spot at the width of equidirectional at the width of the scanning direction of light beam spot; Make light beam spot in the enterprising line scanning of switch element; And the driving timing of switch element controlled, thereby to being simulated control by the position of the LO-pattern on the exposure body.
In addition, above-mentioned light beam spot generation unit is that a plurality of collector lenses are planar arranged the microlens array that forms.Like this, through planar being arranged the microlens array that forms, a plurality of collector lenses generate a plurality of light beam spots.
And then above-mentioned light beam spot generation unit is planar to arrange the photomask that a plurality of openings form.Like this, just generate a plurality of light beam spots through the photomask that planar has a plurality of openings.
And then; In addition; The a pair of band electrode that above-mentioned light scanning unit makes Rack in the opposite side of the electrooptic crystal material of square bulk forms inclination according to the mode that the arbitrary side's in the length and width of its long limit central shaft and above-mentioned side central shaft is predetermined angular, and light is passed through between this pair of electrodes.Like this; The a pair of band electrode that makes Rack through the opposite side at the electrooptic crystal material of square bulk forms inclination according to the mode that central shaft of arbitrary side of length and width in its long limit central shaft and the above-mentioned side is predetermined angular; And the light scanning unit that light is passed through between this pair of electrodes, make a plurality of light beam spots in prescribed limit, come and go scanning respectively.
And, above-mentioned by the exposure body be set to along with the scanning direction of above-mentioned light beam spot roughly the direction of quadrature move continuously.Like this, on one side with the scanning direction of light beam spot roughly the direction of quadrature make public on one side to being undertaken moving continuously by the exposure body.
The invention effect
The present invention who relates to according to first technical scheme, owing to make switch element bigger than light beam spot at the width of equidirectional at the width of the scanning direction of light beam spot, so can make light beam spot in the enterprising line scanning of switch element.Thereby, control through driving timing switch element, thus can be to carrying out light modulation through a plurality of switch elements and to simulating control in the position of the LO-pattern that is formed on the body by exposure.Like this,, the positioning accuracy of exposing patterns is improved, can reduce the manufacturing cost of device again even a plurality of switch elements are arranged in the pattern generator of the 2 simple formations that form of row at least.
In addition,, can carry out optically focused to light source light and generate light beam spot, the utilization ratio of light source light is improved according to the invention that second technical scheme relates to.Therefore, the power of employed light source is diminished, can alleviate the burden of light source.
And then, according to the invention that the 3rd technical scheme relates to, can adopt the photomask that uses photoetching technique to form to generate a plurality of light beam spots.Therefore, the shape and the position of these a plurality of light beam spots can be formed accurately, the positioning accuracy of exposing patterns can be further improved.
And then, according to the invention that the 4th technical scheme relates to, can control the scanning of light beam spot through driving voltage.Therefore, if take away relevant between the position of closing the light beam spot on the element and the driving voltage in advance, just can learn the position of the light beam spot on the switch element according to driving voltage, can be by the driving timing of driving voltage control switch element.
And,,,, can shorten single operation required time (tact time) of exposure process Yi Bian make public Yi Bian can move continuously by the exposure body according to the invention that the 5th technical scheme relates to.
Description of drawings
Fig. 1 is the synoptic diagram of the execution mode of expression exposure device of the present invention.
Fig. 2 is the vertical view that one of the employed filter substrate of the above-mentioned execution mode of expression constitutes example.
Fig. 3 is the routine figure of a formation of the light beam spot generation unit of expression exposure device of the present invention, (a) is vertical view, (b) is front view.
Fig. 4 is the routine figure of a formation of the light scanning unit of expression exposure device of the present invention, (a) is stereogram, (b) is the view of the O direction of arrow of figure (a).
Fig. 5 is the routine vertical view of a formation of the switch element assembling body of expression exposure device of the present invention.
Fig. 6 is the key diagram of action of each switch element of the above-mentioned switch element of expression assembling body, and (a) driving condition is broken off in expression, and (b) driving condition is connected in expression.
Fig. 7 is the process chart of the formation method of the above-mentioned switch element assembling of explanation body.
Fig. 8 is the key diagram of other formation methods of the above-mentioned switch element assembling of expression body, and final operation is shown.
Fig. 9 is the switch element assembling body of expression exposure device of the present invention and takes the key diagram of the position relation between the unit.
Figure 10 is the block diagram of formation of the control unit of expression exposure device of the present invention.
Figure 11 is the key diagram of expression drive signal waveform that above-mentioned light scanning unit is driven.
Figure 12 is the key diagram of the exposure actions of expression exposure device of the present invention.
Figure 13 is the key diagram of expression through an example of the exposing patterns of above-mentioned exposure actions formation.
Embodiment
Below, based on accompanying drawing execution mode of the present invention is elaborated.Fig. 1 is the synoptic diagram of the execution mode of expression exposure device of the present invention.This exposure device drives to generate the LO-pattern of regulation the switch element that is made up of the electrooptic crystal material; And with the exposure of this LO-pattern on by the exposure body, and possess: supply unit 1, exposure optical component 2, take unit 3 and control unit 4.Below, describe to the situation that by the exposure body is filter substrate.
Fig. 2 is to use in the vertical view of the filter substrate 5 of exposure device of the present invention.This filter substrate 5 is to possess the rectangular black matrix that makes light transmissive a plurality of pixel 6 in the formation of the surface of transparent glass substrate to form.
Above-mentioned supply unit 1; The filter substrate of the colored resist that has been coated with regulation put at the upper surface of base (stage) 7 and to a direction (arrow A direction shown in Figure 1) in 5 years carry continuously, for example base 7 is moved through making motor and gear etc. make up the travel mechanism that constitutes.Perhaps, also can possess the ejiction opening and the suction inlet of gas, gas ejection power gone out and the inhalation power balance is carried filter substrate 5 under the state that floats with ormal weight on the base 7 on the surface of base 7.And, the position transducer (omitting diagram) that is provided for the displacement of filter substrate 5 is measured at supply unit 1.
Exposure optical component 2 is set above above-mentioned supply unit 1.This optical component 2 that makes public is to light source light L
1Carry out light modulation and generate the exposure light L of the LO-pattern of regulation
2, light L should make public
2Shine to the surface of filter substrate 5 the colored resist on the respective pixel 6 of filter substrate 5 is made public, and possess successively: light supply apparatus 8, light beam spot generation unit 9, light scanning unit 10, pattern generator 11 and projecting lens 12 from the upstream side of the direction of advance of light.
At this, above-mentioned light supply apparatus 8 makes the light source light L with uniform Luminance Distribution
1The light beam spot generation unit 9 stated backward of directional light shine, and its formation possesses: radiate ultraviolet LASER Light Source; To light source light L from this LASER Light Source radiation
1The optical beam expander that enlarges of beam diameter; The light source light L that beam diameter has been enlarged
1The for example light integrator of illuminance distributionization; With the illuminance distribution change light source light L
1Become the condenser lens of directional light.
In addition, above-mentioned light beam spot generation unit 9 is accepted light source light L
1The back in Fig. 1 along with the direction of the substrate throughput direction quadrature shown in the arrow A with arrangement pitches W
1At least arrange 2 row to generate a plurality of light beam spots with staggering each other, particularly as shown in Figure 3, be a plurality of collector lenses 13 for example to be arranged in the microlens array that 2 row form on the surface of transparency carrier 14.In this case, the interval of the lens arrays 15 of 2 row is set W
2In addition, around each collector lens 13, form photomask 16, to cut off optical transmission.
And then; Above-mentioned light scanning unit 10 make a plurality of light beam spots that above-mentioned light beam spot generation unit 9 generates along with the direction of substrate throughput direction (arrow A direction) quadrature on (orientations of above-mentioned a plurality of collector lenses 13) in the scope of separately regulation, come and go scanning; Shown in Fig. 4 (a); Opposite side 17a at the electrooptic crystal material 17 of square bulk; The mode that is predetermined angular between the central shaft of a pair of band electrode 18 that makes Rack according to arbitrary side in the length and width of its long limit central shaft and above-mentioned side 17a forms inclination, and light is passed through between this pair of electrodes 18.In this case; If to applying electric field between two electrodes 18; Then the refractive index by the electrooptic crystal material 17 of the part of two electrode 18 clampings changes, and can between the part and other parts of these two electrode 18 clampings, (interface 17b) produce refringence.Therefore, according to this refringence, light source light L
1In above-mentioned interface 17b refraction.Thereby, when the electric field that makes light scanning unit 10 between above-mentioned electrode 18 changes the refringence change that makes above-mentioned interface 17b, shown in this Fig. 4 (b), from the light source light L of light scanning unit 10 ejaculations
1Pivot angle θ with regulation swings, and light beam spot 19 is in the arrow B shown in this figure, on the C direction after come and go scanning on the switch element 21 (Fig. 5 with reference to) stated.
And then, in addition, above-mentioned pattern generator 11 through after the control unit 4 (Figure 10 with reference to) stated control, to light source light L
1Carry out light modulation and generate LO-pattern (the exposure light L of regulation
2); Shown in Fig. 4 (b); Make the center of the round scanning of a plurality of light beam spots 19 as one man form a plurality of switch elements 21 with separately central shaft, the scanning direction (with the direction of the substrate throughput direction quadrature shown in the arrow A among Fig. 1) of these a plurality of switch elements 21 light beam spot 19 shown in arrow B, the C in Fig. 5 is with arrangement pitches W
1The ground alignment arrangements that staggers each other becomes 2 row, with the corresponding width W in scanning direction (arrow B, C direction) of above-mentioned light beam spot 19
3(in this execution mode, by W
3=W
1Expression) is formed than light beam spot 19 in equidirectional width W
4Bigger, and be provided with pair of electrodes 20 opposed to each other in side with the scanning direction that is parallel to light beam spot 19, be shaped as flat column, and constitute by the electrooptic crystal material.In addition, the distance between center lines of 2 row switch element row 22a, 22b is with the distance between center lines W of 2 row lens arrays 15 of light beam spot generation unit 9
2Equate.And the formation of pattern generator 11 comprises: the switch element assembling body 23 that possesses above-mentioned a plurality of switch element 21; With the approaching polarization plates 24 that disposes of the light incident side end face of light scanning unit 10; And with the emitting side end face of switch element assembling body 23 polarization plates 25 near configuration.In this case, two polarization plates 24,25 are cross Nicols (cross Nicol) configuration that makes polarizing axis mutually orthogonal.
According to the pattern generator 11 of such formation, carry out action as follows.That is, as shown in Figure 6, the light source light L of the collector lens 13 of transmitted beam dot generation unit 9
1, after becoming linear polarization, be incident to the light incident side end face 21a of switch element 21 by polarization plates 24.In this case, shown in Fig. 6 (a), when the electrode 20 of switch element 21 not being applied voltage, switch element 21 breaks off driving, through the not rotation of plane of polarization of the linear polarization in the switch element 21.Therefore, the plane of polarization of the linear polarization that penetrates from the emitting side end face 21b of switch element 21, with the polarizing axis quadrature of polarization plates 25, linear polarization is cut off by this polarization plates 25.
On the other hand, shown in Fig. 6 (b), the electrode 20 of switch element 21 is applied behind the voltage of regulation switch element 21 is connected when driving, through the plane of polarization half-twist of the linear polarization in this switch element 21.Therefore, the plane of polarization of the linear polarization that penetrates from the emitting side end face 21b of switch element 21 is consistent with the polarizing axis of polarization plates 25, and linear polarization can pass through polarization plates 25.Like this, pattern generator 11 carries out the on/off driving through pattern according to the rules to a plurality of switch elements 21, thereby can generate the exposure light L that is become light and shade by light modulation
2Penetrate.
Then, the formation method to above-mentioned switch element assembling body 23 describes with reference to Fig. 7.
At first, in the one side of the strip sheet material 26 that constitutes by electrooptic crystal material such shown in Fig. 7 (a), shown in Fig. 7 (b), use cast-cutting saw and its axis ground to form the groove 27 of depth D, thereby form width W symmetrically with respect to long limit central shaft
5A pair of protuberance 28.At this moment, the centreline space of two protuberances 28 is at a distance from being set as W at interval
2
Then, shown in Fig. 7 (c), with two sides of the axis of above-mentioned a pair of protuberance 28 and the bottom surface sections of groove 27, adopt technique known to form conducting film 29.
Then, shown in Fig. 7 (d), use the transverse tooth thickness of blade to be W
3(=W
1) cast-cutting saw at the short-axis direction of above-mentioned a pair of protuberance 28 with spacing 2W
3Form the darker width W of depth D of the above-mentioned groove 27 of depth ratio
3(W
3＞W
5) separating tank 30, a pair of protuberance was broken into a plurality of back in 28 minutes forms a plurality of switch elements 21.At this moment; In Fig. 7 (d),, the blade of cast-cutting saw moved to the arrow E direction right side protuberance 28 is cut apart for right side protuberance 28; Afterwards; For left side protuberance 28, the blade of cast-cutting saw is moved to stay corresponding left side protuberance 28 parts between the adjacent separating tank 30 with right side protuberance 28 to arrow F direction, come disjunction left side protuberance 28.Like this, just, form the switch element assembling body 23 that a plurality of switch elements 21 are arranged in 2 row with staggering each other.In this case; If will be along the conducting film 29 of the bottom surface sections of the groove 27 of the central authorities that long axis direction extends as the grounding electrode terminal; Then through the pair of electrodes 20 of each switch element 21, the electrode 20 of the long limit central shaft side of switch element assembling body 23 just becomes grounding electrode.
Fig. 8 is the key diagram of other formation methods of the above-mentioned switch element assembling of expression body 23.As shown in Figure 8; For the strip sheet material 26 that has formed the electrooptic crystal material of conducting film 29 in bottom surface sections with the side of the axis of a pair of protuberance 28 shown in Fig. 7 (c) and groove 27; Use cast-cutting saw; Make the darker separating tank 30 of the depth D of the above-mentioned groove 27 of depth ratio form, and be a plurality of a pair of protuberance 28 disjunctions with respect to above-mentioned a pair of protuberance 28.At this moment, through the separated W of the centreline space of suitably setting a pair of protuberance 28
2And the angle of inclination φ with respect to the major axis of a pair of protuberance 28 of above-mentioned separating tank, thereby can make end 21c such overlap (overlap) shown in dotted line this Fig. 8 that sees adjacent switch element 21 from substrate moving direction (arrow A direction).Like this; On one side filter substrate 5 arrow A direction in Fig. 1 is being moved one side when making public; End 21c through the switch element 21 of priority existence on the substrate moving direction makes public repeatedly, can avoid a problem that produces unexposed at exposing patterns.In this case, as shown in Figure 8, because the end 21c of switch element 21 is excised obliquely, therefore become the half the of exposure under the situation of the end 21c that forms the right angle based on the average exposure of this end 21c.Therefore, through the exposure that above-mentioned exposure repeatedly obtains stipulating, can carry out the exposure of prescribed depth.Thereby, can avoid because of the problem of the excessive exposure that causes of exposure repeatedly.
In addition, above-mentioned projecting lens 12, the LO-pattern reduced projection that will be generated by above-mentioned pattern generator 11 is on 5 of filter substrates, and the formation of projecting lens 12 comprises: imaging len 31 and object lens 32.
The side in the front of above-mentioned exposure optical component 2 is provided with shooting unit 3 towards substrate throughput direction (arrow A direction).3 pairs of filter substrate 5 surfaces, this shooting unit are taken; Be roughly a plurality of photo detectors to be arranged in the line formula camera of straight line shape in quadrature ground with the substrate throughput direction; As shown in Figure 9; With respect to the central shaft of the switch element row 22a of side in front of the substrate throughput direction is in of switch element assembling body 23, partition distance L and disposing only.In this case, switch element is assembled body 23 be configured behind the location each other, the switch element 21A of switch element assembling body 23 and the position x of shooting unit 3 on the central shaft of long limit with shooting unit 3
1～x
2Correspondence, switch element 21B and position x
2～x
3Correspondence, switch element 21C and position x
3～x
4Correspondence, switch element 21D and position x
4～x
5Correspondence, switch element 21E and position x
5～x
6Correspondence, switch element 21F and position x
6～x
7Corresponding.In addition, with the camera site of taking unit 3 opposed to each other at the downside of base 7, be provided with and omit illustrated lighting unit, thrown light on carrying out the shooting of substrate surface by taking unit 3 in the above-mentioned camera site of filter substrate 5.
With the switch element assembling body 23 of above-mentioned supply unit 1, light scanning unit 10, pattern generator 11 and take unit 3 ground connection that is electrically connected control unit 4 is set.4 pairs of each inscapes of this control unit suitably drive; Shown in figure 10, possess: image processing part 33, operational part 34, memory 35, supply unit driving governor 36, light scanning unit driving governor 37, switch element driving governor 38 and control part 39.
At this, 33 pairs of above-mentioned image processing parts are handled by the one dimension image of the pixel 6 of taking the filter substrate 5 that unit 3 obtains, and come the position of brightness cataclysm is detected, and detect the position that this position is the edge part of pixel 6.
In addition; Above-mentioned operational part 34; Calculate the displacement of filter substrate 5, the shooting unit 3 in the memory of after filter substrate 5 moves and preestablishes and is kept at, stating 35 and each switch element row 22a of switch element assembling body 23, the distance L, (L+W between the 22b based on the output of the position transducer of supply unit 1
2) equate apart from the time, to after the switch element driving governor 38 stated send driving command.
And then above-mentioned memory 35 is in advance to LASER Light Source power and take unit 3 and assemble each switch element row 22a of body 23, the distance L, (L+W between the 22b with switch element
2) etc. the data of initial set value preserve, and preserve to the operation result in the operational part 34 and by the position data of the edge part of image processing part 33 detected pixels 6 temporarily.
In addition, the travel mechanism of 36 pairs of supply units 1 of above-mentioned supply unit driving governor drives base 7 is moved with constant speed along the arrow A direction in Fig. 1 continuously.
And then; Above-mentioned light scanning unit driving governor 37 sends jagged drive signal shown in Figure 11 to light scanning unit 10; The refringence that part and the interface 17b between other parts by band electrode 18 clampings in light scanning unit 10 are produced recurs variation in prescribed limit, make from light beam spot 19 round scanning in the scope of regulation of the laser of light scanning unit 10 ejaculations.In this case; Because the sweep speed of light beam spot 19 depends on the cycle repeatedly of above-mentioned jagged drive signal, it is synchronous with the translational speed (equating with the translational speed of filter substrate 5) of the base 7 of supply unit 1 therefore the cycle repeatedly of drive signal to be controlled the sweep speed that makes light beam spot 19.In addition, the sweep speed of light beam spot 19, usually, according to filter substrate 5 at forward travel distance W
5(W
5Equate with the width of switch element 21 at the substrate throughput direction) or than this distance W
5The mode that comes and goes run-down during the short distance is set.In addition, in this execution mode, the sweep speed of light beam spot 19 is set to enough fast with respect to the translational speed of filter substrate 5.In addition, the sweep speed of returning according to light beam spot 19 becomes about 10 times mode of the sweep speed when going to, and the decrease speed of drive signal is controlled to be 10 times of the rate of climb.
And then; In addition; Above-mentioned switch element driving governor 38 is accepted from the driving command of operational part 34 transmission; Read out in the memory 35 position data of the edge part of the pixel 6 of preserving one by one, and will be used for that each switch element 21 corresponding with this position data carried out drive signal that on/off drives and send to switch element and assemble body 23.In this case, switch element driving governor 38 goes scan period that the on/off drive signal is sent to switch element assembling body 23 before the light beam spot 19 that comes and goes scanning, in the scan period of returning of light beam spot 19, sends and breaks off drive signal.
Then, above-mentioned control part 39 is the CPU that control according to the mode that suitably drives above-mentioned each key element.
Then, describe to action according to the exposure device of such formation.
At first, with filter substrate 5 location of the colored resist that has been coated with regulation and carry and put assigned position on the base 7 of supply unit 1.Then, when switching starting, the supply unit driving governor 36 of supply unit 1 Be Controlled unit 4 is controlled and is started, and filter substrate 5 is transferred with constant speed to arrow A direction shown in Figure 1.
When filter substrate 5 is transferred and when arriving the camera site of taking unit 3, takes the surface of filter substrate 5 through taking unit 3, the photographic images of this one dimension is carried out image processing in the image processing part 33 of control unit 4.At this moment, in image processing part 33, check that above-mentioned photographic images changes in the brightness with the direction of substrate throughput direction (arrow A direction) quadrature, the position probing of threshold value and cataclysm that brightness is surpassed regulation is as the edge part of pixel 6 (bright portion).
Particularly, shown in Figure 12 (a), when filter substrate 5 is transferred, if the substrate throughput direction of pixel 6 beginning end arrives the camera site of taking unit 3, then based at this moment captured photographic images, test example such as line P
1On the position x of edge part of pixel 6 (bright portion)
8, x
9, x
10, x
11, and this position data is kept at memory 35.In this case, if according to the pixel 6G, the 6B that whenever preestablish, then can ignore other colors (for example green, blueness) between adjacent two the pixel 6R that are positioned at same color (for example red) at a distance from two modes that pixel 6 (bright portion) is detected.
When in Figure 12 (a), filter substrate 5 being carried to the arrow A direction, make line P
1When consistent with the central shaft of the switch element row 22a of switch element assembling body 23, each switch element 21 through these switch element row 22a is optionally to line P
1On assigned position make public.That is line P,
1On position x
8, x
3Between, position x
4, x
9Between and position x
12, x
13Between, respectively by switch element 21C, 21E, 21K take on and make public.In this case, switch element 21C is only at 19 couples of position x of light beam spot
8, x
3Between carry out scan period and control by switch element driving governor 38 and be switched on driving.Likewise, switch element 21E is only at 19 couples of position x of light beam spot
4, x
9Between carry out scan period and be switched on driving, switch element 21K is only at 19 couples of position x of light beam spot
12, x
13Between carry out scan period and be switched on driving.Like this, shown in cross-hatched among this figure, the position x on the pixel 6R
8, x
3Between, position x
4, x
9Between and position x
12, x
13Between the zone made public.At this moment, switch element 21A, 21G, 21I, the 21M of switch element row 22a are disconnected driving.In addition, the position of the light beam spot 19 on the switch element 21 is relevant with pivot angle θ based on the laser beam of light scanning unit 10, and the pivot angle θ of this laser beam is relevant with drive signal voltage based on light scanning unit driving governor 37.Therefore, the position of the light beam spot 19 on the switch element 21 just can be learnt according to above-mentioned drive signal voltage.
Afterwards, on one side light beam spot 19 is come and gone scanning, likewise each switch element 21 of switch element row 22a is driven with above-mentioned on one side, filter substrate 5 execution of moving with constant speed are made public.In addition, among Figure 12 (a), during light beam spot 19 carries out once coming and going, be based on to line P
1The opposite direction of arrow A departed from the captured view data in position of the equidistant distance that moves with filter substrate 5 one by one, above-mentioned each switch element 21 is driven carries out this exposure.
Then, shown in Figure 12 (b), when mobile filter substrate 5 so that line P
1When consistent with the central shaft of switch element row 22b, each the switch element 21B through these switch element row 22b, 21D, 21F, 21H, 21J, 21L are optionally to line P
1On assigned position optionally make public.That is line P,
1On position x
4, x
5Between, position x
10, x
12Between and position x
13, x
11Between, make public with above-mentioned likewise taking on by switch element 21D, 21J, 21L respectively.At this moment, switch element 21B, 21F, 21H are disconnected driving.
On the other hand, read with respect to line P from memory 35
1Along the deviation in driction opposite with arrow A W
2Line P
2On the position data of edge part of pixel 6R, come each switch element 21 of driving switch element row 22a through switch element driving governor 38.Then, line P
2On the position x of pixel 6R
3, x
4Between through switch element 21C by being made public the position x of pixel 6R
12, x
13Between through switch element 21K by being made public.At this moment, switch element 21A, 21E, 21G, 21J, 21M are disconnected driving.
Afterwards; For the filter substrate 5 that is moving with constant speed; Come and go scanning light beam point 19 on one side; By switch element row 22a the assigned position on the pixel 6R is made public on one side in advance, and the part between each switch element 21 of switch element row 22a is carried out the interpolation exposure by switch element row 22b.Like this, shown in cross-hatched among Figure 13, pixel 6R goes up the exposing patterns 40 that is formed regulation by exposure.Shown in this execution mode; The sweep speed of light beam spot than the enough fast situation of the translational speed of filter substrate 5 under; Shown in figure 13, can make with respect to the edge part of the exposing patterns of substrate throughput direction diagonal cross or the edge part of circular exposing patterns to form glossily.In addition, because can be to controlling with the irradiation position simulation ground of the light beam spot of the direction of substrate throughput direction quadrature, therefore digital control different with prior art can be carried out fine and close more pattern exposure.
In addition; In the above-described embodiment; Though be illustrated by the situation that 2 row switch element row 22a, 22b constitute to switch element assembling body 23; But the present invention is not limited to this, also can be with 2 row switch element row 22a, 22b as one group, with a plurality of groups along the substrate throughput direction with the prescribed distance alignment arrangements.Like this, just can carry out multiple-exposure in the zone of pixel 6, can reduce the power of LASER Light Source and alleviate the burden of LASER Light Source through many groups switch element row 22a, 21 pairs of filter substrates 5 of each switch element of 22b
In addition, in the above-described embodiment, though be directed against light beam spot generation unit 9 for the situation of microlens array is illustrated, the present invention is not limited to this, and light beam spot generation unit 9 also can be that a plurality of openings are planar arranged the photomask that forms.
And then; In the above-described embodiment; Though to the opposite side 17a of light scanning unit 10 at the electrooptic crystal material 17 of square bulk; The situation that the mode that is predetermined angular between the central shaft of a pair of band electrode 18 that makes Rack according to arbitrary side in the length and width of its long limit central shaft and side 18 forms inclination is illustrated; But the present invention is not limited to this, if light scanning unit 10 be for example electromagnetic actuators or sound optical element etc., can come and go the element of scan laser light beam.
And more than in the explanation, though to being that the situation of filter substrate 5 is described by the exposure body, the present invention is not limited to this, and the body that make public also can be any parts such as circuit substrate for example.
The explanation of symbol
5 ... Filter substrate (body is made public)
9 ... The light beam spot generation unit
10 ... Light scanning unit
12 ... Projecting lens
13 ... Collector lens
17 ... The electrooptic crystal material
17a ... Opposite side
18,20 ... Electrode
19 ... Light beam spot
21,21A～21M ... Switch element
L
1Light source light
L
2Exposure light
Claims (5)
1. exposure device is characterized in that possessing:
The light beam spot generation unit, it is accepted light source light and is arranged in 2 row at least with predetermined distance with staggering each other, thereby generates a plurality of light beam spots;
Light scanning unit, it makes above-mentioned a plurality of light beam spot in prescribed limit separately, come and go scanning along their orientation;
Pattern generator; It is configured to make the center of round scanning of above-mentioned a plurality of light beam spots consistent with central shaft separately, and drives through a plurality of switch elements being carried out on/off, thereby above-mentioned light source light is carried out the LO-pattern that light modulation generates regulation; Wherein, Above-mentioned a plurality of switch element is provided with pair of electrodes in the opposed faces with above-mentioned central axes, is shaped as flat column, is made up of the electrooptic crystal material; With
Projecting lens, it is projected in above-mentioned LO-pattern by on the exposure body,
Make above-mentioned each switch element bigger than above-mentioned light beam spot at the width of equidirectional at the width of the scanning direction of above-mentioned light beam spot.
2. exposure device according to claim 1 is characterized in that,
Above-mentioned light beam spot generation unit is planar to arrange the microlens array that a plurality of collector lenses form.
3. exposure device according to claim 1 is characterized in that,
Above-mentioned light beam spot generation unit is planar to arrange the photomask that a plurality of openings form.
4. exposure device according to claim 1 is characterized in that,
Above-mentioned light scanning unit; The a pair of band electrode that makes Rack in the opposite side of the electrooptic crystal material of square bulk forms inclination according to the mode that the arbitrary side's in the length and width of its long limit central shaft and above-mentioned side central shaft is predetermined angular, and light is passed through between this pair of electrodes.
5. according to each described exposure device in the claim 1 to 4, it is characterized in that,
Above-mentioned by the exposure body be set to along with the scanning direction of above-mentioned light beam spot roughly the direction of quadrature move continuously.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009-290649 | 2009-12-22 | ||
| JP2009290649A JP5282979B2 (en) | 2009-12-22 | 2009-12-22 | Exposure equipment |
| PCT/JP2010/072172 WO2011077965A1 (en) | 2009-12-22 | 2010-12-09 | Exposure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102668025A true CN102668025A (en) | 2012-09-12 |
| CN102668025B CN102668025B (en) | 2015-01-28 |
Family
ID=44195499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201080058060.9A Expired - Fee Related CN102668025B (en) | 2009-12-22 | 2010-12-09 | Exposure device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5282979B2 (en) |
| KR (1) | KR101813212B1 (en) |
| CN (1) | CN102668025B (en) |
| TW (1) | TWI510865B (en) |
| WO (1) | WO2011077965A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105739246A (en) * | 2014-12-24 | 2016-07-06 | 爱德万测试株式会社 | Exposure apparatus and exposure method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1242104A (en) * | 1996-11-28 | 2000-01-19 | 株式会社尼康 | Aligner and method for exposure |
| JP2007310251A (en) * | 2006-05-22 | 2007-11-29 | V Technology Co Ltd | Aligner |
| US20080204851A1 (en) * | 2007-02-26 | 2008-08-28 | Seiko Epson Corporation | Electro-optic element and scanning optical device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7876420B2 (en) * | 2004-12-07 | 2011-01-25 | Asml Holding N.V. | System and method utilizing an electrooptic modulator |
| JP2007031025A (en) | 2005-07-25 | 2007-02-08 | Kyocera Mita Corp | Curl correction device and image formation device using it |
| JP5119446B2 (en) * | 2008-03-21 | 2013-01-16 | 株式会社ブイ・テクノロジー | Light modulation element |
-
2009
- 2009-12-22 JP JP2009290649A patent/JP5282979B2/en not_active Expired - Fee Related
-
2010
- 2010-12-09 CN CN201080058060.9A patent/CN102668025B/en not_active Expired - Fee Related
- 2010-12-09 WO PCT/JP2010/072172 patent/WO2011077965A1/en active Application Filing
- 2010-12-09 KR KR1020127012115A patent/KR101813212B1/en active IP Right Grant
- 2010-12-21 TW TW099144867A patent/TWI510865B/en not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1242104A (en) * | 1996-11-28 | 2000-01-19 | 株式会社尼康 | Aligner and method for exposure |
| JP2007310251A (en) * | 2006-05-22 | 2007-11-29 | V Technology Co Ltd | Aligner |
| US20080204851A1 (en) * | 2007-02-26 | 2008-08-28 | Seiko Epson Corporation | Electro-optic element and scanning optical device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105739246A (en) * | 2014-12-24 | 2016-07-06 | 爱德万测试株式会社 | Exposure apparatus and exposure method |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011077965A1 (en) | 2011-06-30 |
| TW201131318A (en) | 2011-09-16 |
| KR20120112396A (en) | 2012-10-11 |
| KR101813212B1 (en) | 2017-12-29 |
| JP2011134767A (en) | 2011-07-07 |
| CN102668025B (en) | 2015-01-28 |
| JP5282979B2 (en) | 2013-09-04 |
| TWI510865B (en) | 2015-12-01 |
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