CN102590901A - Process for manufacturing micro-lens array with large numerical aperture - Google Patents
Process for manufacturing micro-lens array with large numerical aperture Download PDFInfo
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- CN102590901A CN102590901A CN2012100864029A CN201210086402A CN102590901A CN 102590901 A CN102590901 A CN 102590901A CN 2012100864029 A CN2012100864029 A CN 2012100864029A CN 201210086402 A CN201210086402 A CN 201210086402A CN 102590901 A CN102590901 A CN 102590901A
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- microlens array
- zinc
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- preparation technology
- numerical aperture
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Abstract
The invention discloses a process for manufacturing a micro-lens array with a large numerical aperture, which comprises the following steps (a) manufacturing a zinc oxide nanometer column; (b) manufacturing an octafluorocyclobutane (C4F8) layer on the surface of the zinc oxide nanometer column; (c) manufacturing a micro-lens in a spray ink printing mode; and (d) curing the micro-lens and enabling the micro-lens array obtained in the step (b) to be cured through a mode of ultraviolet light source exposure and substrate heating. The method greatly reduces cost of the existing graphical technology, has potential of large-area manufacture simultaneously, and remarkably improves the numerical aperture of the micro-lens array. In addition, the spray ink printing is the process of natural dropping and forming of liquid drops, roughness of the surface of the manufactured lens is low, and errors including noises and the like can be removed when the lens is actually used.
Description
Technical field
The present invention relates to a kind of microlens array manufacturing process, relate in particular to a kind of big numerical aperture lenticule manufacturing process that has.
Background technology
Lens are one of elementary cells that constitute optical system; It is to surround a kind of transparent medium by two planes of refraction to form; Be used for transmitting and the refraction incident ray; Thereby make the light wave wavefront that thereby one type of optical element that modulation reaches the particular optical effect take place, be significant components indispensable in optical instrument and the electro-optical system.Microlens array is as one of the important devices in micro-optic field, closes in the optical fiber misfortune, occasions such as beam shaping, integration imaging, optical neural network are widely used.
In recent years, the manufacturing technology of lenticule and microlens array has had development at full speed.At present, there is a large amount of researchists to be engaged in the manufacturing research of lenticule and array device thereof both at home and abroad.Make lenticular method and mainly contain diamond cutting, photoresist hot melt molding, compression molding method, inkjet printing formula technology and sessile drop method, photoetching ion exchange technique and gel method or the like.
Numerical aperture is to differentiate an important parameter of lenticule performance, and it has determined the resolution and the imaging effect of lens, pursues the research focus that bigger numerical aperture becomes present manufacturing microlens array.But the method for present various manufacturing microlens arrays all exists cost higher, is difficult to the dissatisfactory problems of parameter such as large-area preparation and numerical aperture, is difficult to satisfy the needs of more and more fields to microlens array.
Therefore, the necessary manufacturing process that provides a kind of high efficiency, low cost and ability large tracts of land to make the high-performance microlens array.
Summary of the invention
The purpose of this invention is to provide a kind of manufacturing process that is used to have submicron order structure OLED, to solve the above problems.
This technology comprises:
(a) substrate cleaning step;
(b) zinc oxide film preparation process prepares zinc oxide film on the cleaned substrate in (a);
(c) surface treatment step, the mode that deposits (ICP) with inductively coupled plasma prepares C
4F
8Layer.
(d) prepared by ink-jet printing technique lenticule step prepares microlens array with inkjet technology on the substrate that in (c), obtains;
(e) lenticular curing schedule adopts the mode of ultraviolet source (UV) irradiation and substrate heating to make the microlens array solidified forming that obtains in (d).
Adopt the manufacturing process of above-mentioned microlens array; Abandon high, the inefficient process means of costs such as diamond cutting, photoresist hot melt molding, compression molding method in the past, taked the mode of inkjet printing, had stock utilization high; Preparation speed is fast, but the potentiality of large-area preparation.
Zinc-oxide nano column is the means of at present emerging change surface hydrophilic and hydrophobic, has easy preparation, advantage with low cost, C
4F
8Deposition also is to reduce surface energy; Promote the means of surface hydrophobic, both are combined, can obtain hydrophobic surface to greatest extent; The drop that makes inkjet printing form has bigger contact angle at substrate surface, thereby makes the lenticule of preparing have bigger numerical aperture.
The method that prepare at present ZnO mainly contains that molecular beam epitaxy (MBE), pulsed laser deposition (PLD), magnetron sputtering, plasma are synthetic, thermal evaporation and burning, vapor transportation etc., and the temperature required height of these methods, apparatus expensive, cost be high, be difficult for production in enormous quantities.And this process using immersion method growing method has temperature required low, plurality of advantages such as cost is low, the growth conditions requirement is low, the device is simple, operation is easy.
The present invention has adopted the printing ink of the ultra-violet curing glue after the dilution as inkjet printing; Selected solvent needs that ultra-violet curing glue is had solubility; Leave standstill not stratifiedly, and boiling point needs the working temperature greater than inkjet-printing nozzle, to guarantee the constant of preparation process medium viscosity and proportioning.
The present invention has combined the zinc paste bonded hydrophobic layer to do surface treatment, adopts this emerging microstructure preparation method of inkjet printing, greatly reduces the cost of existing pattern technology, simultaneously and have potentiality of large-area preparation.
Adopt above-mentioned preparation method, the numerical aperture of microlens array is significantly increased, and inkjet printing is that drop falls and forming process naturally, and the lens surface roughness of preparing is very low, in the reality use with eliminating the noise equal error.
Description of drawings
Fig. 1 is the cleaning and the surface treatment process flow diagram of substrate.
Fig. 1 a is for cleaning microslide technology.
Fig. 1 b is a magnetron sputtering zinc paste amethyst layer process.
Fig. 1 c is a water-bath growth of zinc oxide nano post technology.Fig. 1 d is inductively coupled plasma deposition C
4F
8Process.
10 is the microslide as the present embodiment substrate, and 12 is zinc paste Zijin layer, and 14 is zinc-oxide nano column, and 16 is C
4F
8Layer.
Fig. 2 is the process flow diagram that inkjet printing is made microlens array on surface-treated substrate.
Fig. 2 a is that inkjet-printing nozzle is by array liquid droplets technology on substrate of setting;
Fig. 2 b is a ultra-violet curing technology.Fig. 2 c is the technology that is heating and curing.
20 is the microlens array of prepared by ink-jet printing technique, 22 for ultraviolet irradiation and be heating and curing after microlens array.
Fig. 3 is the Electronic Speculum figure of the prepared zinc-oxide nano column of present embodiment.
Fig. 4 is for inkjet printing and through the ultraviolet irradiation and the rear lens array Electronic Speculum figure that is heating and curing.
Embodiment:
Below in conjunction with accompanying drawing the present invention is done and to describe in further detail:
Referring to Fig. 1-4, the technological process for preparing the large-numerical aperture microlens array with the inkjet printing mode that this patent is announced may further comprise the steps:
(1) substrate cleaning step carries out ultrasonic cleaning with washing agent, deionized water and acetone ethanol solution to substrate glass, afterwards substrate is placed on oven dry under the infrared lamp.
(2) shown in Fig. 1 b, pass through normal temperature rf magnetron sputtering sputter layer of ZnO amethyst layer on microslide, after sputtering rate (power) was set up, the time of sputter was long more, and the amethyst layer thickness that obtains is big more; The time of sputter is 5 minutes in the present embodiment, and the Zijin layer thickness is about 100 nanometers.
(3) be shown in water-bath growth ZnO nano-pillar on the ZnO amethyst layer like Fig. 1 b; The diameter of nano-pillar is relevant with sputtering time, solution solubility, bath temperature and growth time with growth length; Fix at bath temperature one; Sputtering time is longer, solution concentration is bigger, the water-bath growth time is long more, and the diameter of ZnO nano-pillar is magnanimous big more with growth, can control the growing state of ZnO nano-pillar through controlling above-mentioned conditional parameter.
Concrete growth conditions and solution ratio are following:
(a) temperature of water-bath is 90 degrees centigrade of constant temperature;
(b) dispose zinc nitrate and the hexamethylenetetramine solution that 50-100 rubs in the least respectively, and zinc nitrate solution is poured in the hexamethylenetetramine;
(c) have the glass substrate of ZnO film to put into the water bath shampoo that has prepared sputter, and in water-bath with 90 degree temperature growths, growth time is 2 hours in the present embodiment, the zinc-oxide nano column height be about 700 nanometers.
(3) with the inductively coupled plasma depositional mode at the above-mentioned zinc-oxide nano column surface preparation one deck C that obtains
4F
8Hydrophobic layer.Sedimentation time is 20 seconds, and the deposit thickness in the present embodiment is 10 nanometers.
(4) have zinc-oxide nano column and a C above-mentioned
4F
8Adopt the mode of inkjet printing to prepare microlens array on the substrate of hydrophobic layer;
(a) printing ink that present embodiment the adopted solution that to be ultraviolet-curing resin mixed with acetone in 1: 1 by volume.With glass bar solution stirring is moved in the ink-jet print cartridge after evenly.
(b) on ink-jet printer, draw microlens array; Select driving voltage, number of nozzle and the shower nozzle step-length of advancing, prepared the square microlens array of 50*50 in the present embodiment, driving voltage is 38V; The drop centered spacing is 50 microns, takes the one-jet working method to carry out.
(5) inkjet printing is gone out microlens array plate and be positioned on the hot plate machine, use ultraviolet source irradiation simultaneously, be cured; The hot plate machine temperature is set at 80 degrees centigrade, and this temperature can make the solvent acetone evaporation be lower than the fusing point of ultraviolet-curing resin simultaneously, and the ultra-violet curing time set is 5 minutes.
The above only is preferred embodiment of the present invention, is not the present invention is done any pro forma restriction; Though the present invention discloses as above with preferred embodiment; Yet be not in order to limiting the present invention, anyly be familiar with the professional and technical personnel, in not breaking away from technical scheme scope of the present invention; When the method for above-mentioned announcement capable of using and technology contents are made a little change or be modified to the equivalent embodiment of equivalent variations; In every case be the content that does not break away from technical scheme of the present invention, to any simple modification, equivalent variations and modification that above embodiment did, still belong in the scope of technical scheme of the present invention according to technical spirit of the present invention.
Claims (8)
1. the microlens array preparation technology with large-numerical aperture is characterized in that, comprises the steps:
(a) the preparation zinc-oxide nano column prepares zinc-oxide nano column on cleaned substrate;
(b) handle the zinc-oxide nano column surface, with the mode of inductively coupled plasma deposition at zinc-oxide nano column surface preparation C
4F
8Layer;
(c) prepared by ink-jet printing technique lenticule prepares microlens array with inkjet technology on the substrate that in step (a), obtains;
(d) solidify lenticule, adopt the mode of ultraviolet source irradiation and substrate heating to make the microlens array solidified forming that obtains in the step (b).
2. microlens array preparation technology as claimed in claim 1 is characterized in that: adopt zinc-oxide nano column and C
4F
8Layer is as finish materials, and the structure of zinc-oxide nano column makes the substrate surface hydrophobicity strengthen C
4F
8Layer is the hydrophobic layer material of using always, and both combine obtainable hydrophobic surface.
3. microlens array preparation technology as claimed in claim 1; It is characterized in that: adopt the lenticular technology of prepared by ink-jet printing technique; The patterned way of inkjet technology is controlled, carries the microlens array that the software drawing obtains different sizes and arrangement mode through ink-jet printer.
4. microlens array preparation technology as claimed in claim 1 is characterized in that: adopt ultraviolet source irradiation that the resinous principle in the ink-jet ink is solidified, heating makes the organic solvent in the printing ink volatilize, and printing ink finally becomes solid-state.
5. microlens array preparation technology as claimed in claim 3 is characterized in that: adopt the water-bath growth method to prepare zinc oxide film.
6. microlens array preparation technology as claimed in claim 5; It is characterized in that: when adopting immersion method to prepare zinc oxide film; Need selected high-index material be dissolved in the solvent, use the spin coating sol evenning machine that film is coated on the patterned ultra-violet curing glue uniformly.
7. microlens array preparation technology as claimed in claim 4 is characterized in that: the ultraviolet-curing resin of preparation ink-jet ink and solvent chemical property need more stable, and solvent has suitable fusing point.
8. microlens array preparation technology as claimed in claim 1 is characterized in that: said microlens array, prepare soft mold or hard with the mode of turning over mould, and can directly obtain the lenticule of large-numerical aperture through imprint process with the mould of preparing.
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| CN2012100864029A CN102590901A (en) | 2012-03-28 | 2012-03-28 | Process for manufacturing micro-lens array with large numerical aperture |
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| CN2012100864029A CN102590901A (en) | 2012-03-28 | 2012-03-28 | Process for manufacturing micro-lens array with large numerical aperture |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018094801A1 (en) * | 2016-11-28 | 2018-05-31 | 武汉华星光电技术有限公司 | Oled display device and manufacturing method therefor |
| CN110137386A (en) * | 2019-04-17 | 2019-08-16 | 深圳市华星光电半导体显示技术有限公司 | Preparation method, OLED device and the display device of OLED device |
| CN111370592A (en) * | 2020-03-17 | 2020-07-03 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN111708110A (en) * | 2020-06-18 | 2020-09-25 | 欧菲微电子技术有限公司 | Preparation method of diffuser, diffuser and camera module |
| CN113066916A (en) * | 2021-03-05 | 2021-07-02 | 致晶科技（北京）有限公司 | Method for preparing convex micro-lens and method for manufacturing white light LED device |
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| DE102007001953A1 (en) * | 2007-01-10 | 2008-07-17 | Technische Universität Chemnitz | Microstructured film use as components in micro reaction systems, filtration media, optical element, matting layer, reducer or diffraction filter, is produced by printing micrometer size fluid structures using inkjet-printer |
| JP2009136912A (en) * | 2007-12-10 | 2009-06-25 | Konica Minolta Holdings Inc | Method and apparatus for processing of transparent material |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018094801A1 (en) * | 2016-11-28 | 2018-05-31 | 武汉华星光电技术有限公司 | Oled display device and manufacturing method therefor |
| US10276832B2 (en) * | 2016-11-28 | 2019-04-30 | Wuhan China Star Optoelectronics Technology Co., Ltd. | Oled display and manufacturing method thereof |
| CN110137386A (en) * | 2019-04-17 | 2019-08-16 | 深圳市华星光电半导体显示技术有限公司 | Preparation method, OLED device and the display device of OLED device |
| CN111370592A (en) * | 2020-03-17 | 2020-07-03 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN111370592B (en) * | 2020-03-17 | 2023-04-11 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN111708110A (en) * | 2020-06-18 | 2020-09-25 | 欧菲微电子技术有限公司 | Preparation method of diffuser, diffuser and camera module |
| CN113066916A (en) * | 2021-03-05 | 2021-07-02 | 致晶科技（北京）有限公司 | Method for preparing convex micro-lens and method for manufacturing white light LED device |
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Application publication date: 20120718 |