CN102566264A - Photopolymerization non-silver multi-band laser photosensitive resin, laser photosensitive plate and manufacturing methods of laser photosensitive resin and laser photosensitive plate - Google Patents
Photopolymerization non-silver multi-band laser photosensitive resin, laser photosensitive plate and manufacturing methods of laser photosensitive resin and laser photosensitive plate Download PDFInfo
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- CN102566264A CN102566264A CN2010106024938A CN201010602493A CN102566264A CN 102566264 A CN102566264 A CN 102566264A CN 2010106024938 A CN2010106024938 A CN 2010106024938A CN 201010602493 A CN201010602493 A CN 201010602493A CN 102566264 A CN102566264 A CN 102566264A
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Abstract
The invention discloses a photopolymerization non-silver multi-band laser photosensitive resin, a laser photosensitive plate and manufacturing methods of the laser photosensitive resin and the laser photosensitive plate. The photopolymerization non-silver multi-band laser photosensitive resin comprises the following components in percentage by weight: 80.0%-90.0% of unsaturated macromolecule alkali-soluble polymer, 5.0%-10.0% of unsaturated monomer, 1.0%-5.0% of photoinitiator, 0.5%-5.0% of photosensitizer, 0.05%-5.0% of pigment, and 0.001%-1.0% of heat stabilizer. The products disclosed by the invention can be scanned and printed by using an AGFA polaris 100 plate setter, and a lithographic plate with the photographic resolution being 2540DPI (Dots Per Inch) and the print resistance rate being more than 300 thousand-print can be obtained.
Description
Technical field
The present invention relates to a kind of laser photosensitive resin and planographic printing plate material; Be particularly related to a kind of non-silver-colored multi-wave band laser polymerization laser photosensitive resin and plate; More relating to a kind of wavelength that is suitable for is the green laser of 532nm, the laser photosensitive resin and the planographic printing plate material of the blue laser of 488nm, the purple laser of 410nm.
Background technology
Nearly ten years, directly laser Graphic development in flat stamping field was very fast, and its core is with the continuous development and update of the corresponding plate of the development of laser instrument kind and power.Roughly can be divided into such several stages.Initial stage is because the laser utensil is limited to infrared laser, and power is limited, so have only silver salt stencilling material to be complementary with its high-velocity scanning record.The power of infrared laser can be gone up several watts afterwards, and had occurred frequency doubling technology again, and corresponding temperature-sensitive version is come out one after another, and (CTP computer to plate) abbreviation CTP technology of flat stamping is developed rapidly.Wavelength is the appearance of the argon laser of 488nm, and its power rises to more than 35 milliwatts, for the appearance of photopolymerization laser plate provides condition.The photopolymerization plate that laser platemaker and silver salt and non-silver have successively occurred.Previous decade is because the YAG laser development of wavelength 532nm is fast; Long service life, stable performance is so new laser platemaker occurred; Corresponding 532nm laser version comes into the market; Purple in recent years laser instrument developing trend is ripe, and power is by 5～30 milliwatts and higher release, for comprehensive CTPization of flat stamping has been created condition.
Because purple laser wave length, energy is high, maybe so created for the downward price adjustment of non-silver-colored laser version.Make non-silver-colored photopolymerization laser version operating conditions that the space of improving arranged, and initial stage and recent silver salt version, the temperature-sensitive version just can not have been shared purple laser superiority.In order to make original 488nm, the 532nm laser platemaker continues to use, and can cater to the needs of purple laser platemaker again, so the urgent hope of relevant department can provide a kind of new photopolymerization non-silver-colored multi-wave band laser version, to satisfy its needs.
Summary of the invention
The technical issues that need to address of the present invention are to disclose non-silver-colored multi-wave band laser photosensitive resin of a kind of photopolymerization and method for making thereof, to overcome the defective that prior art exists, satisfy the needs of relevant department.
Another technical matters that the present invention need solve provides a kind of non-silver-colored multi-wave band laser version of photopolymerization that adopts said photosensitive resin preparation.
The non-silver-colored multi-wave band laser photosensitive resin of photopolymerization of the present invention, its component and weight percent content comprise:
Unsaturated polymeric alkali insoluble polymer may 80.0～90.0%
Unsaturated monomer 5.0～10.0%
Light trigger 1.0～5.0%
Light sensitizer 0.5～5.0%
Pigment 0.05～5.0%
Thermal stabilizer 0.001～1.0%
Described unsaturated polymeric alkali insoluble polymer may a kind of wire organic high molecular polymer of broadly saying so; Analyse from the macromolecular structure credit; Just must its main chain or side chain introduce a certain amount of hydrophilic radical as :-OH ,-COOH, R-O-R '; To satisfy the requirement that water-based weak base develops, be wire high molecular polymer with water or weak base aqueous solution or swelling property.The acquisition of high sensitivity polymerization photoresists light sensitivity; Basic resin was very important during sizing material was formed; It is a kind of weak base lean solution development version; So macromolecule resin must dissolve by alkali; Therefore the unsaturated polymeric alkali insoluble polymer may of being selected for use comprises a kind of in propylene class interpolymer, polyvinyl alcohol derivative, cellulose derivative or the phenolics class, preferably a kind of in the modifier of alkali solubility acetyl cellulose, acrylic acid-butadiene-acrylic acid ester terpolymers, acrylic acid-butadiene-methacrylate, methacrylic acid-butadiene-acrylic acid ester copolymer, polyvinyl alcohol (PVA) maleic anhydride condensation product, O-phthalic acid cellulose-acrylic acid modified body, ethyl cellulose-acrylic acid modified body, ethyl cellulose itaconic acid modification body, cellulose acetate-phthalate CAP, cellulose propylene modification body, line style phenolic aldehyde propylene oxide modification body, the unsaturated monomer modified body of line style phenolic aldehyde epoxy, line style phenolic aldehyde epoxy acrylic modification body, styrene maleic anhydride interpolymer, the mandelic resin polyurethane oligomeric structural reform gonosome;
Described unsaturated monomer is selected from the compound with at least one vinyl unsaturated double-bond, comprises monoesters and polyester, polyurethane acroleic acid, urethane acrylate, polyurethane methacrylic acid, the urethane methacrylate of methacrylic acid or itaconic acid; Epoxy acrylate, epoxy novolac methacrylic acid or epoxy novolac methacrylate.More than one in epoxy acrylate, urethane acrylate, triethylene-glycol acrylic ester, trimethylolpropane triacrylate, the acrylic amide etc. preferably;
As acrylic ester: can give an example like glycol diacrylate, triglycerin omega-diol diacrylate, 1; 3-butanediol diacrylate, 1,4-butanediol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, tetramethylol methane tetraacrylate, trimethylolethane trimethacrylate acrylic ester etc.;
As methacrylate: can give an example like 1,3 butylene glycol dimethylacrylate, 1 4-butanediol dimethylacrylate, neopentylglycol dimethacrylate, new pentaerythritol acrylate trimethyl etc.;
As the itaconicacid ester: can give an example like ethylene glycol bisthioglycolate itaconicacid ester, propylene glycol two itaconicacid esters, 1,3 butylene glycol two itaconicacid esters, 1,4-butylene glycol two itaconicacid esters etc.;
As containing the urethane acrylate class: can give an example like polyurethane acroleic acid, urethane acrylate, polyurethane methacrylic acid, urethane methacrylate etc.;
As the esters of acrylic acid that contains the ethylene oxide skeleton: can give an example like epoxy acrylate, epoxy novolac methacrylic acid or epoxy novolac methacrylate etc.
Described light trigger is allly can produce the free radical and the further material of initiated polymerization thing through illumination, promptly the resin unsaturated double-bond at its material that causes generation free radical down and accomplish polymerization.Light trigger is that high sensitivity is crucial; Said light trigger comprises organic peroxide, superoxide-pigment, the acid of N-phenylethylamine, thioxanthone system, right-the dimethylamino isoamyl formate, azoisobutyronitrile, aromatic ketone, imidazolium compounds, two 2, more than one in 6-two fluoro-3-pyrroles phenyl two luxuriant titaniums, two aromatic sulfonium salts or the two fragrant salt compounded of iodine etc.;
The preferred benzoyl peroxide of said organic peroxide, di-tert-butyl peroxide or peroxidating naphthoyl;
Preferred acetyl peroxide-the anthracene of said superoxide-pigment or acetyl peroxide-naphthalene;
Said thioxanthone is preferred 2-isopropyl thioxanthone;
Preferred phenyl ketone benzene of said aromatic ketone or benzene pentanone;
Said imidazolium compounds is preferred 1,3-diamino heterocyclic pentylene;
Most preferred light trigger is 1,3-diamino heterocyclic pentylene or two 2,6-two fluoro-3-pyrroles phenyl two luxuriant titaniums etc.
Said 1, the blue arrow brand that 3-diamino heterocyclic pentylene can adopt Wuhan Institute of Ka-Fat Collagen to produce;
Said pair 2, the JMT-784 trade mark product that 6-two fluoro-3-pyrroles phenyl two luxuriant titaniums can adopt Shanghai Shang Jie Industrial Co., Ltd. to be produced.
Said light sensitizer is through using the adjuvant of some kind; The light sensitivity of photographic layer is improved; The effect of sensitizer is to regulate the energy of the absorbing wavelength of photoresists and activated group to shift, and said sensitizer is selected from triethanolamine, N methyldiethanol amine, triisopropanolamine, 4-(N, N-dimethyl amine)-methyl benzoate or 4-(N; The TMSDMA N dimethylamine base) a kind of in benzoic acid or 4-(N, the TMSDMA N dimethylamine base) butyl glycol ether;
Described pigment is to make photographic layer painted, and the visuognosis degree of the laser light sensitive plate after the plate-making and detection property that image color is measured suitability are improved.Described dyestuff comprises 4, and 4 '-dimethylamino benzophenone thio-alcohol organic pigment class, titanium cyanines, sarranine, eosin, algae are red, rose-red, Hua Jing, crystal violet azo dyes or anthraquinone dyes;
Said thermal stabilizer has long-term stability in order to make photopolymerization layer; In prescription, must add the small amount of thermal stabilizing agent; Mainly be in order to stop the ethylenic unsaturated double bond can the unnecessary polymerization of polymeric compounds in its manufacturing or in preserving, thermal stabilizer be selected from a kind of in p-dihydroxy-benzene, gallic acid, 2-6 tert-butyl group p methoxy phenol or the copper sulphate etc.
In order to improve physical characteristics; The non-silver-colored multi-wave band laser photosensitive resin of said photopolymerization also comprises inorganic filler; Said inorganic filler, like lime carbonate, wollastonite etc., the weight consumption of inorganic filler is 0.001～0.01% of the non-silver-colored multi-wave band laser photosensitive resin general assembly (TW) of said photopolymerization;
The invention still further relates to the non-silver-colored multi-wave band laser version of a kind of photopolymerization, comprise compound successively aluminum substrate, photographic layer and protective seam each other;
Said aluminum substrate can be selected pure aluminum plate for use in the present invention, and aluminium plate thickness generally is about 0.1mm～0.6mm, preferably about 0.15mm～0.4mm, preferred especially 0.2mm～0.3mm.Must carry out surface roughening to the fine aluminium version and handle (being commonly called as pre-treatment).Multi-component alkali lye is used earlier on fine aluminium version surface, like NaOH, again with the greasy dirt on removing aluminium surfaces such as damping fluid, sodium phosphate, carries out residual alkali neutralisation treatment with diluted acid then, uses flushing with clean water at last.
Make the aluminum substrate surface coarsening with electrolysis, form Grains.Electrolysis be the aluminium plate of pre-treatment as electrolysis, in acidic electrolysis bath, when electric current through the time, the aluminium plate surface forms Grains evenly fine and closely woven, that depth thickness is moderate at anodic solution.
Electrolytic solution has hydrochloric acid solution, nitric acid liquid or nitric acid, hydrochloric acid mixed solution etc.Generally selecting nitric acid, hydrochloric acid mixed solution for use is electrolytic solution electrolytic treatments version base, does not go up dirty high-quality plate thereby obtain high pressrun, high resolution and blank parts.
After above-mentioned steps, also need aluminum substrate pressrun and keeping quality to be improved a lot through anodized.Anodic oxidation electrolyte is sulfuric acid, phosphoric acid or their mixed liquors normally.The direct sulfuric acid process of general employing in anodised process, under the effect of electric current and electrolytic solution, makes aluminium ion pass internal layer and the many dead levels of oxidation liquid reaction generation.Aluminum substrate that the present invention selects for use be that type matrix one Pudong of factory in Shanghai produces.
Said photographic layer is above-mentioned photosensitive resin, and in dried quality, the coating weight of photosensitive resin is 1～2.5g/m
2
The coating weight of photographic layer is influenced by light sensitivity, development property, exposure film strength, the light resistance of photographic layer mainly.Coating weight is very few, and light resistance is had to fully; Coating weight is too much, and light sensitivity can descend.
The material that said protective seam adopted comprises styrene maleic acid interpolymer, acrylic acid-acrylate interpolymer, phthalic acid ethyl cellulose, gathers the pyridine of N vinyl pyrrole, a kind of in polyvinyl alcohol (PVA), polyvinyl alcohol (PVA) maleic acid modified resin, modification dextrin, CMC (CMC) or the modification copolyamide;
The preparation method of the non-silver-colored multi-wave band laser version of above-mentioned photopolymerization comprises the steps:
(1) with unsaturated polymeric alkali insoluble polymer may, unsaturated monomer, light trigger, light sensitizer and pigment and thermal stabilizer, mixes stirring and dissolving at normal temperatures with solvent orange 2 A; Filter; Adopt conventional method to coat aluminum substrate,, obtain to be coated with the aluminum substrate of photographic layer 85～90 ℃ of oven dry;
Said solvent orange 2 A is selected from more than one in EGME, a condensed ethandiol methyl ether, a condensed ethandiol ether, tetrahydrofuran, dimethyl formamide, butanone or the ethyl acetate, and the solvent orange 2 A consumption is 65～85% of a total solution weight;
(2) protective layer material is dissolved in solvent B, adopts conventional method to coat on the photographic layer, the protective seam coating weight is 0.02～0.5g/m
2,, obtain product of the present invention 85～90 ℃ of oven dry;
Said solvent B is selected from ethylene glycol monomethyl ether, dimethyl formamide, 1, more than one in 4-dioxane, toluene or the ethyl acetate, and solvent B consumption is 65～85% of a total solution weight;
When being coated in support on as photographic layer photosensitive composite of the present invention, can make it to be dissolved in behind the various organic solvents easy to use.
The inventor thinks; The non-silver-colored multi-wave band laser photosensitive resin of photopolymerization of the present invention is that poly-reaction has the kation initiation type; Mechanism is that light trigger receives laser beam and excites and decomposite positively charged kation and lewis acid, and in order to obtain the superelevation sensitivity, the weakness of system of the present invention is to be afraid of oxygen.Anaerobic reaction is promptly arranged.So the present invention is coated with the polymeric membrane that one deck has the oxygen barrier superperformance, i.e. protective seam on photographic layer.
Version of the present invention must be dashed with weak lye after the laser beam flying imaging and shown, thereby the unexposed portion of removing photographic layer obtains image.The medicine that can be used to prepare has sodium silicate, potassium silicate, sodium phosphate, potassium phosphate, ammonium phosphate, dibastic sodium phosphate, phosphoric acid hydrogen amine, sodium carbonate, soda mint, NaOH, potassium hydroxide, monomethyl amine, dimethyl amine, an ethylamine, triethylamine, triethanolamine, ethene ethamine, glucose sodium etc., the amount in the WS 1～15%.
After developing, must clean, use in the phosphoric acid liquid of weight concentration 0.01～0.05% again and acidifying, press dry with squeeze roll(s) again, coat my Ba Shu glue then, to obtain best printing performance with clear water.Utilize post-exposure can improve anti-seal property greatly, under the ultraviolet light 3-10 minute.
Product of the present invention with AGFA Polaris 100 platemaking machine scanning plate-making, after flushing, can obtain image resolving rate 2540DPI, the lithographic plate of press resistance rate more than 300,000 seals.
With instance the present invention is carried out below bright more specifically, but the present invention is not limited to this.
Embodiment 1
Acrylic acid copolymer modified resin is acrylic acid-butadiene-methacrylate interpolymer.
Said components is added No. three bottles of 500ml at normal temperatures stirred 2 hours, use the filter paper suction filtration, glue is processed.
The aluminum substrate qualified the electrolytic oxidation sealing of hole dries by the fire half an hour at 90 ℃, uses the blade coating coating process, the sizing material of preparation above coating.Baking oven dry in 20 minutes in 90 ℃, (protection glue is made up of polyvinyl alcohol (PVA) 14.5g, pure water 85g, polyvinyl pyrrolidone 0.5g, can treat laser scanning to protect glue then on the blade coating.The coating weight of photoresists is at 2.5g/m
2, protection glue coating weight is at 0.5g/m
2
With AGFA Polaris 100 platemaking machine scanning plate-making, after flushing, can obtain image resolving rate 2540DPI, the lithographic plate of press resistance rate more than 300,000 seals.
Embodiment 2
Said components is added No. three bottles of 500ml at normal temperatures stirred 2 hours, use the filter paper suction filtration, glue is processed.
The aluminum substrate qualified the electrolytic oxidation sealing of hole dries by the fire half an hour at 85 ℃, uses the flow coat coating process, the sizing material of preparation above coating.Baking oven dry in 15 minutes in 85 ℃, (protection glue is made up of polyvinyl alcohol (PVA) 14.5g, pure water 85g, polyvinyl pyrrolidone 0.5g, can treat laser scanning to protect glue then on the blade coating.The coating weight of photoresists is at 1g/m
2, protection glue coating weight is at 0.02g/m
2
With AGFA Polaris 100 platemaking machine scanning plate-making, after flushing, can obtain image resolving rate 2540DPI, the lithographic plate of press resistance rate more than 300,000 seals.
Embodiment 2～4
Acrylic copolymer among the embodiment 1 can be used instead as follows, and other components are constant basically, as a rule 1 order experiment.
Embodiment 5～7
Following component among the embodiment 1 is substituted with the component in the following table, and other are according to embodiment 1.
Test findings is identical with embodiment 1.
Embodiment 8～10
Following component among the embodiment 1 is substituted with the component in the following table, and other are according to embodiment 1.
| Embodiment 1 | Embodiment 8 | Embodiment 9 | Embodiment 10 |
| Imidazoles | Imidazoles | Two imidazoles | Two imidazoles |
| Mi Shi ketone | Mi Shi ketone | Two methyl ethers | Mi Shi ketone |
| Organic peroxide | Organic peroxide | The butyl peroxy maleic acid | The butyl peroxy maleic acid |
| Aromatic series salt | Luxuriant iron fragrance salt | Luxuriant titanium fragrance salt | Luxuriant titanium fragrance salt |
Test findings is identical with embodiment 1.
Claims (18)
1. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization is characterized in that component and weight percent content comprise:
Unsaturated polymeric alkali insoluble polymer may 80.0～90.0%
Unsaturated monomer 5.0～10.0%
Light trigger 1.0～5.0%
Light sensitizer 0.5～5.0%
Pigment 0.05～5.0%
Thermal stabilizer 0.001～1.0%.
2. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 1 is characterized in that said unsaturated polymeric alkali insoluble polymer may comprises propylene class interpolymer, polyvinyl alcohol derivative, cellulose derivative or phenolics class.
3. require the non-silver-colored multi-wave band laser photosensitive resin of 2 described photopolymerization according to profit; It is characterized in that said unsaturated polymeric alkali insoluble polymer may is a kind of in modifier or the mandelic resin polyurethane oligomeric structural reform gonosome of alkali solubility acetyl cellulose, acrylic acid-butadiene-acrylic acid ester terpolymers, acrylic acid-butadiene-methacrylate, methacrylic acid-butadiene-acrylic acid ester copolymer, polyvinyl alcohol (PVA) maleic anhydride condensation product, O-phthalic acid cellulose-acrylic acid modified body, ethyl cellulose-acrylic acid modified body, ethyl cellulose itaconic acid modification body, cellulose acetate-phthalate CAP, cellulose propylene modification body, line style phenolic aldehyde propylene oxide modification body, the unsaturated monomer modified body of line style phenolic aldehyde epoxy, line style phenolic aldehyde epoxy acrylic modification body, styrene maleic anhydride interpolymer.
4. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 1 is characterized in that said unsaturated monomer is the compound with at least one vinyl unsaturated double-bond.
5. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 4; It is characterized in that said unsaturated monomer comprises monoesters or polyester, polyurethane acroleic acid, urethane acrylate, polyurethane methacrylic acid, urethane methacrylate, epoxy acrylate, epoxy novolac methacrylic acid or the epoxy novolac methacrylate of methacrylic acid or itaconic acid.
6. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 5; It is characterized in that said unsaturated monomer is selected from more than one in epoxy acrylate, urethane acrylate, triethylene-glycol acrylic ester, trimethylolpropane triacrylate or the acrylic amide etc.
7. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 6; It is characterized in that; Said acrylic ester is selected from glycol diacrylate, triglycerin omega-diol diacrylate, 1; 3-butanediol diacrylate, 1,4-butanediol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, tetramethylol methane tetraacrylate or trimethylolethane trimethacrylate acrylic ester;
Said methacrylate is a 1,3 butylene glycol dimethylacrylate, 1,4-butanediol dimethylacrylate, neopentylglycol dimethacrylate or new pentaerythritol acrylate trimethyl;
Said itaconicacid ester is ethylene glycol bisthioglycolate itaconicacid ester, propylene glycol two itaconicacid esters, 1,3 butylene glycol two itaconicacid esters or 1,4-butylene glycol two itaconicacid esters;
The said urethane acrylate class that contains is polyurethane acroleic acid, urethane acrylate, polyurethane methacrylic acid or urethane methacrylate;
The said esters of acrylic acid that contains the ethylene oxide skeleton is epoxy acrylate, epoxy novolac methacrylic acid or epoxy novolac methacrylate.
8. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 1; It is characterized in that; Described light trigger is selected from organic peroxide, superoxide-pigment, the acid of N-phenylethylamine, thioxanthone system, right-the dimethylamino isoamyl formate, azoisobutyronitrile, aromatic ketone, imidazolium compounds, two 2, more than one in 6-two fluoro-3-pyrroles phenyl two luxuriant titaniums, two aromatic sulfonium salts or the two fragrant salt compounded of iodine etc.
9. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 8 is characterized in that said organic peroxide is selected from benzoyl peroxide, di-tert-butyl peroxide or peroxidating naphthoyl; Said superoxide-pigment is selected from acetyl peroxide-anthracene or acetyl peroxide-naphthalene; Said thioxanthone is to be selected from the 2-isopropyl thioxanthone; Said aromatic ketone is selected from phenyl ketone benzene or benzene pentanone; Said imidazolium compounds is selected from 1,3-diamino heterocyclic pentylene.
10. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 1 is characterized in that light trigger is 1,3-diamino heterocyclic pentylene or two 2,6-two fluoro-3-pyrroles phenyl two luxuriant titaniums.
11. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 1; It is characterized in that; Said light sensitizer is selected from triethanolamine, N methyldiethanol amine, triisopropanolamine, 4-(N; The N-dimethyl amine)-a kind of in methyl benzoate or 4-(N, TMSDMA N dimethylamine base) benzoic acid or 4-(N, the TMSDMA N dimethylamine base) butyl glycol ether.
12. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 1; It is characterized in that; Described pigment comprises 4, and 4 '-dimethylamino benzophenone thio-alcohol organic pigment class, titanium cyanines, sarranine, eosin, algae are red, rose-red, Hua Jing, crystal violet azo dyes or anthraquinone dyes.
13. the non-silver-colored multi-wave band laser photosensitive resin of photopolymerization according to claim 1 is characterized in that, said thermal stabilizer is to be selected from a kind of in p-dihydroxy-benzene, gallic acid, 2-6 tert-butyl group p methoxy phenol or the copper sulphate etc.
14. according to the non-silver-colored multi-wave band laser photosensitive resin of each described photopolymerization of claim 1～13, it is characterized in that, also comprise inorganic filler.
15. the non-silver-colored multi-wave band laser version of photopolymerization is characterized in that, comprises compound successively aluminum substrate, photographic layer and protective seam each other;
Said photographic layer is the non-silver-colored multi-wave band laser photosensitive resin of each described photopolymerization of claim 1～14.
16. the non-silver-colored multi-wave band laser version of photopolymerization according to claim 15 is characterized in that in dried quality, the coating weight of the non-silver-colored multi-wave band laser photosensitive resin of said photopolymerization is 1～2.5g/m
2
17. the non-silver-colored multi-wave band laser version of photopolymerization according to claim 15; It is characterized in that the material that said protective seam adopted is styrene maleic acid interpolymer, acrylic acid-acrylate interpolymer, phthalic acid ethyl cellulose, gather a kind of in the pyridine of N vinyl pyrrole, polyvinyl alcohol (PVA), polyvinyl alcohol (PVA) maleic acid modified resin, modification dextrin, CMC (CMC) or the modification copolyamide.
18. prepare the method for the non-silver-colored multi-wave band laser version of each described photopolymerization of claim 15～17, comprise the steps:
(1) with unsaturated polymeric alkali insoluble polymer may, unsaturated monomer, light trigger, light sensitizer and pigment and thermal stabilizer, mixes stirring and dissolving at normal temperatures with solvent orange 2 A; Filter; Adopt conventional method to coat aluminum substrate,, obtain to be coated with the aluminum substrate of photographic layer 85～90 ℃ of oven dry;
Said solvent orange 2 A is selected from more than one in EGME, a condensed ethandiol methyl ether, a condensed ethandiol ether, tetrahydrofuran, dimethyl formamide, butanone or the ethyl acetate, and the solvent orange 2 A consumption is 65～85% of a total solution weight;
(2) protective layer material is dissolved in solvent B, adopts conventional method to coat on the photographic layer, the protective seam coating weight is 0.02～0.5g/m
2,, obtain product 85～90 ℃ of oven dry;
Said solvent B is selected from ethylene glycol monomethyl ether, dimethyl formamide, 1, more than one in 4-dioxane, toluene or the ethyl acetate, and solvent B consumption is 65～85% of a total solution weight.
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Application publication date: 20120711 |