CN102566170B - Pixel substrate and fabrication method thereof, LCD( liquid crystal display) panel and LCD device - Google Patents

Abstract

The invention relates to a substrate having a multi-domain vertical alignment pixel structure, a fabrication method of the substrate, an LCD( liquid crystal display) panel and an LCD device. The substrate faces an opposite substrate having a common electrode, and a liquid crystal layer is located between the substrate and the opposite substrate. The substrate comprises a scan line, a data line, an active component, a first and second patterned pixel electrode, and a voltage reduction layer, wherein the substrate is divided into a plurality of pixel regions by the scan line and the data line; the active component is electrically connected with the scan line and the data line; the first patterned pixel electrode is electrically connected with the active component; the voltage reduction layer is arranged on the first patterned pixel electrode; the second patterned pixel electrode is arranged above the first patterned pixel electrode, and is electrically connected with the active component; the first patterned pixel electrode and the second patterned pixel electrode have the identical potential, and respectively provide a first electrical field and a second electrical field to the liquid crystal layer; and the first electrical field is weaker than the second electrical field due to the existence of the voltage reduction layer.

Description

Pixel substrate and preparation method thereof, display panels, liquid crystal indicator

Technical field

The invention relates to a kind of substrate with dot structure and preparation method thereof and there is display panels and the liquid crystal indicator of this substrate, and relate to a kind of low colour cast (Low Color Shift especially, and few there is substrate of multidomain vertical alignment type (Multi-domain Vertical Alignment, MVA) dot structure and preparation method thereof and there is display panels and the liquid crystal indicator of this substrate of dark line LCS).

Background technology

Liquid crystal display has that high image quality, space efficiency utilization are good, low consumpting power, the advantageous characteristic such as radiationless.At present, propose there is following several liquid crystal display with good display effect, as: copline suitching type (in-plane switching, IPS) liquid crystal display, marginal field suitching type (fringe field switching, FFS) liquid crystal display, multidomain vertical alignment type (multi-domain vertical alignment, MVA) liquid crystal display and polymer-stabilized alignment formula (Polymer-stabilized alignment, PSA) liquid crystal display etc.

Fig. 1 is the diagrammatic cross-section of known a kind of multi-field vertical assigned LCD panel.Please refer to Fig. 1, multi-field vertical assigned LCD panel 100 comprises: first substrate 110, pixel electrode 120, liquid crystal layer 130, common electrode 140, chromatic filter layer 150 and second substrate 160.It may be noted that and arrange slit S on pixel electrode 120 and common electrode 140, the electric field E formed can be subject to the impact of slit S and tortuous.Therefore, liquid crystal molecule 132 is toppled over toward different directions and forms the distribution in multiple region, to reach the display effect of wide viewing angle.But this kind of multi-domain vertical alignment-type liquid crystal display panel 100 needs the slit S exactitude position making upper-lower position.Otherwise, once produce bit errors, orientation region will be caused uneven and light transmittance is declined.

Fig. 2 A, Fig. 2 B are respectively the schematic top plan view of known two kinds of multi-field vertical assigned LCD panels.Fig. 2 C, Fig. 2 D be respectively Fig. 2 A, Fig. 2 B multi-field vertical assigned LCD panel along the diagrammatic cross-section of profile line I-I '.Fig. 2 E, Fig. 2 F are respectively the schematic top plan view of pixel electrode 120,120 ' of multi-field vertical assigned LCD panel of Fig. 2 A, Fig. 2 B.Fig. 2 G, Fig. 2 H are respectively the schematic top plan view of pixel electrode 122,122 ' of multi-field vertical assigned LCD panel of Fig. 2 A, Fig. 2 B.

Referring to Fig. 2 A, 2C, 2E, 2G, the element of multi-field vertical assigned LCD panel 200 and the element of above-mentioned multi-field vertical assigned LCD panel 100 similar, be thus denoted as identical symbol.

It should be noted that in multi-field vertical assigned LCD panel 200, made the two-layer pixel electrode 120,122 with slit S in the same side, and on common electrode 140, do not made slit S.Protective seam 170 is also provided with between pixel electrode 120,122.So, can improve the problem of above-mentioned bit errors, the structure so possessing slit S can produce dark line and reduce penetrance.

For reducing the dark line number of above-mentioned multi-field vertical assigned LCD panel, there is another kind of known multi-field vertical assigned LCD panel 200 ', referring to Fig. 2 B, 2D, 2E, 2H, the element of multi-field vertical assigned LCD panel 200 ' and the element of above-mentioned multi-field vertical assigned LCD panel 200 similar, be thus denoted as identical symbol.In multi-field vertical assigned LCD panel 200 ', the configuration via this pixel electrode 120 ', 122 ' can make dark line number reduce.

But utilize two thin film transistor (TFT)s 210,220,210 ', 220 ' to carry out the driving of pixel electrode 120,122,120 ', 122 ' respectively with above-mentioned multi-field vertical assigned LCD panel 200,200 '.For Fig. 2 C, thin film transistor (TFT) 210 is connected to pixel electrode 120, and thin film transistor (TFT) 220 is connected to pixel electrode 122.More specifically, thin film transistor (TFT) 210 is utilized to apply low pressure (V _l) form dark space to pixel electrode 120; Thin film transistor (TFT) 220 is utilized to apply high pressure (V _h) form clear zone to pixel electrode 122.Whereby, multi-field vertical assigned LCD panel 200 can be made to produce the display effect of low colour cast.But drive the mode of two-layer pixel electrode 120,122 with two thin film transistor (TFT)s 210,220, the design not only driven is comparatively complicated, and the number of the thin film transistor (TFT) 210,220 needed is more, can cause the lifting of manufacturing cost.

In addition, as shown in Figure 2 A, this multi-field vertical assigned LCD panel 200 mainly utilizes jagged long strip type pixel electrode pattern J to control swinging to of liquid crystal molecule 132.But the marginal electric field of jagged long strip type pixel electrode pattern J also cannot contain the region of slit S completely, so have the region of slit S, can produce the dark line of a rule in optical appearance.Although the width (being diminished by slit S) of long strip type pixel electrode pattern J can be increased by manufacturing method thereof, and then promote the marginal electric field of long strip type pixel electrode pattern J.But the resolution of current exposure machine and the processing procedure width limit of etch process ability are 3.5 μm, in fact effectively cannot increase the width of long strip type pixel electrode pattern J.

Fig. 3 is the diagrammatic cross-section of known another kind of multi-field vertical assigned LCD panel.Please refer to Fig. 3, multi-field vertical assigned LCD panel 202 comprises: first substrate 110, protective seam 170, first pixel electrode 122a, the second pixel electrode 122b, liquid crystal layer 130, common electrode 140 and second substrate 160.

When considering the display effect of low colour cast, the distribution of bright dark space must be formed.In order to obtain preferably light transmittance, the first pixel electrode 122a, the second pixel electrode 122b that generally pixel electrode cutting can be distributed in about distribution or up and down, and apply high pressure (V respectively _h) and low pressure (V _l).But such distribution mode, the electric field E that the slit S place between the first pixel electrode 122a and the second pixel electrode 122b is formed, cannot the state of printing opacity by making the liquid crystal molecule 132 of this position topple over into.Therefore, produce three dark lines at the arrow A place (three positions) of Fig. 3 A, reduce the display quality of multi-field vertical assigned LCD panel 202.

Summary of the invention

In view of this, the invention provides a kind of substrate with multidomain vertical alignment type dot structure, there is low manufacturing cost, structure is simple and have low colour cast effect and less dark line.

The present invention provides again a kind of display panels, has above-mentioned substrate, can provide good display quality.

The invention provides a kind of liquid crystal indicator, there is above-mentioned display panels, good display quality can be provided.

The present invention also proposes a kind of method for making with the substrate of multidomain vertical alignment type dot structure, can produce and have low manufacturing cost and the substrate with low colour cast effect and less dark line.

Based on above-mentioned, the first invention of the present invention provides a kind of substrate with multidomain vertical alignment type dot structure, and subtend is in the subtend substrate with common electrode, and liquid crystal layer is between substrate and subtend substrate.This substrate comprises: sweep trace and data line, active component, first and second patterned pixel electrode and drawdown zone.Substrate is divided into multiple pixel region by sweep trace and data line.Active component and sweep trace and data line are electrically connected.First patterned pixel electrode and active component are electrically connected.Drawdown zone is arranged on the first patterned pixel electrode.Second patterned pixel electrode is arranged at the top of the first patterned pixel electrode, and be electrically connected with active component, wherein, first patterned pixel electrode and the second patterned pixel electrode equipotential, first patterned pixel electrode provides liquid crystal layer first electric field, second patterned pixel electrode provides liquid crystal layer second electric field, and drawdown zone makes the first electric field be less than the second electric field.

The present invention provides again a kind of display panels, comprising: above-mentioned substrate, subtend substrate and liquid crystal layer.Subtend substrate has common electrode, and subtend substrate is arranged at substrate subtend, and common electrode corresponds to first and second patterned pixel electrode.Liquid crystal layer is folded between subtend substrate and substrate.First patterned pixel electrode and the second patterned pixel electrode equipotential, the first patterned pixel electrode provides liquid crystal layer first electric field, and the second patterned pixel electrode provides liquid crystal layer second electric field, and drawdown zone makes the first electric field be less than the second electric field.

The present invention reoffers a kind of liquid crystal indicator, comprising: backlight module and above-mentioned display panels.This display panels is arranged at the top of backlight module.

The present invention also proposes a kind of manufacture method with the substrate of multidomain vertical alignment type dot structure, comprising: provide a substrate.On substrate, form sweep trace, data line and active component, substrate is divided into multiple pixel region by sweep trace and data line, and active component and sweep trace and data line are electrically connected.On substrate, form the first patterned pixel electrode, be electrically connected with active component.Drawdown zone is formed on the first patterned pixel electrode.On drawdown zone, form the second patterned pixel electrode, be electrically connected with active component.Wherein, the first patterned pixel electrode and the second patterned pixel electrode equipotential, the first patterned pixel electrode provides liquid crystal layer first electric field, and the second patterned pixel electrode provides liquid crystal layer second electric field, and drawdown zone makes the first electric field be less than the second electric field.

In one embodiment of this invention, above-mentioned drawdown zone meets following condition:

$\frac{{\mathrm{\ϵ}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\≤\frac{{\mathrm{\ϵ}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\×(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1),$

ε _passfor specific inductive capacity, the ε of drawdown zone _lCfor specific inductive capacity, the d of liquid crystal layer _passfor thickness, the d of drawdown zone _lCfor thickness, the V of liquid crystal layer _0-grayfor when dark-state zero gray scale to first patterned pixel electrode apply data voltage, V _comfor the voltage applied common electrode, wherein 0.3≤B≤2.

In one embodiment of this invention, above-mentioned drawdown zone meets following condition:

$\frac{{\mathrm{\ϵ}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\≤\frac{{\mathrm{\ϵ}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\×(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1),$

ε _passfor specific inductive capacity, the ε of drawdown zone _lCfor specific inductive capacity, the d of liquid crystal layer _passfor thickness, the d of drawdown zone _lCfor thickness, the V of liquid crystal layer _0-grayfor when dark-state zero gray scale to first patterned pixel electrode apply data voltage, V _comfor the voltage applied common electrode, wherein B is 0.5.

In one embodiment of this invention, the material of above-mentioned drawdown zone comprises macromolecule transparent insulation material.

In one embodiment of this invention, above-mentioned drawdown zone is multi-layer film structure.

In one embodiment of this invention, the manufacture method of above-mentioned multidomain vertical alignment type dot structure more comprises: on substrate, form a storage capacitors electrode between adjacent two sweep traces.

In one embodiment of this invention, the active component of above-mentioned multidomain vertical alignment type dot structure comprises: grid, source electrode and drain electrode, and wherein, grid and sweep trace are electrically connected, source electrode and data line are electrically connected, and drain electrode and first and second patterned pixel electrode are electrically connected.

In one embodiment of this invention, above-mentioned multidomain vertical alignment type dot structure manufacture method forms at least one contact window in drawdown zone, and the second patterned pixel electrode is electrically connected with the first patterned pixel electrode through contact window.

In one embodiment of this invention, above-mentioned multidomain vertical alignment type dot structure, wherein the first patterned pixel electrode comprises: the first complete areal coverage and at least one slit distributive province; Multiple liquid crystal molecules of liquid crystal layer have multiple toppling direction, and what wherein the first complete areal coverage was positioned at the toppling direction of liquid crystal molecule topples over center, and slit distributive province is in order to the toppling direction of stabilizing liquid crystal molecule.

In one embodiment of this invention, above-mentioned multidomain vertical alignment type dot structure, wherein the second patterned pixel electrode comprises: the second complete areal coverage and at least one slit distributive province, slit distributive province radially distributes outward from the center of the second complete areal coverage.

In one embodiment of this invention, the manufacture method of above-mentioned multidomain vertical alignment type dot structure more comprises: form a chromatic filter layer in the top of common electrode.

According to above-mentioned, second invention of the present invention proposes a kind of substrate with multidomain vertical alignment type dot structure, comprising: sweep trace and data line, the first active component, the second active component, the first patterned pixel electrode, passivation layer and the second patterned pixel electrode.First active component is electrically connected with corresponding sweep trace and data line.Second active component is electrically connected with corresponding sweep trace and data line.First patterned pixel electrode is electrically connected to the first active component, and the first patterned pixel electrode has multiple first strip shaped electric poles.Passivation layer (silicon nitride layer L _siN) be arranged on the first patterned pixel electrode.Second patterned pixel electrode is electrically connected to the second active component, and the second patterned pixel electrode has multiple second strip shaped electric poles; Wherein, the first strip shaped electric poles and the second strip shaped electric poles each other part overlap, and make the second strip shaped electric poles from the first strip electrode offset one preset distance.

In one embodiment of this invention, above-mentioned preset distance can be 0.1 ~ 2.5 μm, is preferably 0.5 ~ 1.5 μm.

In one embodiment of this invention, the overall width after each first strip shaped electric poles above-mentioned and each the second strip shaped electric poles overlap can be 3.6 ~ 6 μm, is preferably 4 ~ 5 μm.

The present invention proposes again a kind of display panels and the liquid crystal indicator with the substrate of above-mentioned second invention.

According to above-mentioned, the 3rd invention of the present invention proposes a kind of substrate with multidomain vertical alignment type dot structure, comprising: sweep trace and data line, the first active component, the second active component, patterned pixel electrode, bias electrode and passivation layer.First active component is electrically connected with corresponding sweep trace and data line.Second active component is electrically connected with corresponding sweep trace and data line.Patterned pixel electrode has the firstth district and the secondth district, and the firstth district is electrically connected to the first active component, and the secondth district is electrically connected to the second active component, and has frontier district between the firstth district and the secondth district.Bias electrode (bias electrode) is corresponding to frontier district.Passivation layer is folded between bias electrode and patterned pixel electrode.

In one embodiment of this invention, above-mentioned have in the substrate of multidomain vertical alignment type dot structure, from the secondth district toward the direction in the firstth district, makes edge one preset space length of the patterned pixel electrode in Edge Distance second district of bias electrode.

In one embodiment of this invention, above-mentioned preset space length is 0 ~ 1 μm.

In one embodiment of this invention, the material of above-mentioned bias electrode comprises metal.

In one embodiment of this invention, the material of above-mentioned bias electrode comprises electrically conducting transparent material.

The present invention proposes again a kind of display panels and the liquid crystal indicator with the substrate of above-mentioned 3rd invention.

Based on above-mentioned, have in the substrate of multidomain vertical alignment type dot structure of the present invention, via the slit configuration of the design of drawdown zone or patterned pixel electrode, low colour cast, display effect that dark line is few can be reached.And display panels of the present invention and liquid crystal indicator, owing to having the above-mentioned substrate with multidomain vertical alignment type dot structure, so good display quality can be provided.In addition, according to the method for making with the substrate of multidomain vertical alignment type dot structure of the present invention, simple flow process can be utilized produce the multidomain vertical alignment type dot structure with low colour cast effect and less dark line.

Accompanying drawing explanation

For above-mentioned purpose of the present invention, feature and advantage can be become apparent, below in conjunction with accompanying drawing, the specific embodiment of the present invention is elaborated, wherein:

Fig. 1 is the diagrammatic cross-section of known a kind of multi-field vertical assigned LCD panel.

Fig. 2 A, Fig. 2 B are respectively the schematic top plan view of known two kinds of multi-field vertical assigned LCD panels.

Fig. 2 C, Fig. 2 D be respectively Fig. 2 A, Fig. 2 B multi-field vertical assigned LCD panel along the diagrammatic cross-section of profile line I-I '.

Fig. 2 E, Fig. 2 F are respectively the schematic top plan view of pixel electrode 120,120 ' of multi-field vertical assigned LCD panel of Fig. 2 A, Fig. 2 B.

Fig. 2 G, Fig. 2 H are respectively the schematic top plan view of pixel electrode 122,122 ' of multi-field vertical assigned LCD panel of Fig. 2 A, Fig. 2 B.

Fig. 3 is the diagrammatic cross-section of known another kind of multi-field vertical assigned LCD panel.

Fig. 4 is a kind of substrate upper schematic diagram with multidomain vertical alignment type dot structure of present pre-ferred embodiments.

Fig. 5 A is the diagrammatic cross-section of multidomain vertical alignment type dot structure along A-A ' line of Fig. 4.

Fig. 5 B has the equivalent circuit diagram executing alive rete in Fig. 5 A.

Fig. 6 A, Fig. 6 B are the upper schematic diagram of a kind of first patterned pixel electrode of present pre-ferred embodiments.

Fig. 6 C is the upper schematic diagram of a kind of second patterned pixel electrode of present pre-ferred embodiments.

Fig. 7 is under different pressure reduction, the curve map that colour cast degree changes along with visual angle.

Fig. 8 is drawdown zone when selecting different materials, and above-mentioned pressure reduction corresponds to the curve map of thickness.

When Fig. 9 A is for selecting silicon nitride as drawdown zone material, liquid crystal molecule is by the schematic diagram of electric field influence.

When Fig. 9 B is for selecting macromolecule transparent insulation material as drawdown zone material, liquid crystal molecule is by the schematic diagram of electric field influence.

Figure 10 is the schematic perspective view of a kind of display panels of present pre-ferred embodiments.

Figure 11 is the schematic diagram of a kind of liquid crystal indicator of present pre-ferred embodiments.

Figure 12 A ~ Figure 12 E is a kind of method for making part run schematic diagram with the substrate of multidomain vertical alignment type dot structure of present pre-ferred embodiments.

Figure 13 A is the upper schematic diagram that the another kind of present pre-ferred embodiments has the substrate of multidomain vertical alignment type dot structure.

Figure 13 B is the diagrammatic cross-section of multidomain vertical alignment type dot structure along B-B ' line of Figure 13 A.

Figure 14 A is the schematic top plan view of the first patterned pixel electrode of the multidomain vertical alignment type dot structure of Figure 13 A.

Figure 14 B is the schematic top plan view of the second patterned pixel electrode of the multidomain vertical alignment type dot structure of Figure 13 A.

Figure 15 A is the upper schematic diagram that another of present pre-ferred embodiments has the substrate of multidomain vertical alignment type dot structure.

Figure 15 B is the diagrammatic cross-section of multidomain vertical alignment type dot structure along II-II ' line of Figure 15 A.

Figure 15 C is the diagrammatic cross-section of multidomain vertical alignment type dot structure along III-III ' line of Figure 15 A.

Figure 16 A is the schematic top plan view with the bias electrode of the substrate of multidomain vertical alignment type dot structure of Figure 15 A.

Figure 16 B is the schematic top plan view with the patterned pixel electrode of the substrate of multidomain vertical alignment type dot structure of Figure 15 A.

Main element symbol description:

100: multi-domain vertical alignment-type liquid crystal display panel

110: first substrate

120,120 ', 122,122 ': pixel electrode

122a: the first pixel electrode

122b: the second pixel electrode

130,390,790,890: liquid crystal layer

132,392,892: liquid crystal molecule

140,780,880: common electrode

150: chromatic filter layer

160: second substrate

170: protective seam

200,200 ', 202: display panels

210,210 ', 220,220 ': thin film transistor (TFT)

300,700,800: multidomain vertical alignment type dot structure

310,710,810: the substrate with multidomain vertical alignment type dot structure

310a: pixel region

320,720,820: sweep trace

322: storage capacitors electrode

330,730,830: data line

332: the second metal electrodes

340,740,750,840,845: active component

342: grid

344: source electrode

346: drain electrode

348: channel layer

350,760,875: the first patterned pixel electrodes

350a: the first complete areal coverage

350b, 360b: slit distributive province

360,770,876: the second patterned pixel electrodes

360a: the second complete areal coverage

370,860: drawdown zone

380: common electrode

382: chromatic filter layer

384,782: subtend substrate

390: liquid crystal layer

400: display panels

500: backlight module

600: liquid crystal indicator

762,772: cross part

764,774,852,872: annulus

766,776,854,874a, 874b: strip part

760a: the first strip shaped electric poles

770a: the second strip shaped electric poles

850: bias electrode

860, L _siN: passivation layer (silicon nitride layer)

870: patterned pixel electrode

392,892: liquid crystal molecule

C1, C2, D1, D2: curve

D: preset space length

D1: offset distance

D2 ~ d4: width

E, E _h, E _i, E _l: electric field

E _siN, E _pFA: boundary electric field

J: long strip type pixel electrode pattern

R1: the first district

R2: the second district

S: slit

V _h: higher-pressure region

V _i: frontier district

V _l: low-pressure area

W1: contact window

Embodiment

First embodiment

Fig. 4 is a kind of substrate upper schematic diagram with multidomain vertical alignment type dot structure of present pre-ferred embodiments.Fig. 5 A is the diagrammatic cross-section of multidomain vertical alignment type dot structure along A-A ' line of Fig. 4.Fig. 5 B has the equivalent circuit diagram executing alive rete in Fig. 5 A.

Please also refer to Fig. 4, Fig. 5 A and Fig. 5 B, this have 300 substrate 310 can subtend in the subtend substrate 384 with common electrode 380, and liquid crystal layer 390 is between substrate 310 and subtend substrate 384.This substrate 310 comprises: sweep trace 320, data line 330, active component 340, first patterned pixel electrode 350, drawdown zone 370 and the second patterned pixel electrode 360.Substrate 310 is divided into multiple pixel region 310a by sweep trace 320 and data line 330.Active component 340 is electrically connected with sweep trace 320 and data line 330.First patterned pixel electrode 350 is electrically connected with active component 340.Drawdown zone 370 is arranged on the first patterned pixel electrode 350.Second patterned pixel electrode 360 is arranged at the top of the first patterned pixel electrode 350, and be electrically connected with active component 340, wherein, first patterned pixel electrode 350 and the second patterned pixel electrode 360 equipotential, first patterned pixel electrode 350 provides liquid crystal layer 390 one the first electric field, second patterned pixel electrode 360 provides liquid crystal layer 390 one the second electric field, and drawdown zone 370 makes the first electric field be less than the second electric field.

In one embodiment, drawdown zone 370 can meet following condition:

$\frac{{\mathrm{\ϵ}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\≤\frac{{\mathrm{\ϵ}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\×(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1)-------\left(1\right),$

ε _passfor specific inductive capacity, the ε of drawdown zone 370 _lCfor specific inductive capacity, the d of liquid crystal layer 390 _passfor thickness, the d of drawdown zone 370 _lCfor thickness, the V of liquid crystal layer 390 _0-grayfor when dark-state zero gray scale to first patterned pixel electrode 350 apply data voltage, V _comfor the voltage applied common electrode 380, wherein B is a constant, and 0.3≤B≤2, or in another embodiment, B can be 0.5.

Continue referring to Fig. 4, Fig. 5 A and Fig. 5 B, active component 340 can comprise: grid 342, source electrode 344 are electrically connected with drain electrode 346, grid 342 and sweep trace 320, and source electrode 344 is electrically connected with drain electrode 346 and data line 330.Particularly, also there is in active component 340 channel layer 348, electronics can be made to move in channel layer 348.This active component 340 is such as three terminal switch elements of thin film transistor (TFT) and so on, is used for applying to come from the data voltage of data line 330 to first and second patterned pixel electrode 350,360.

In addition, the substrate 310 with multidomain vertical alignment type dot structure 300 as shown in Figure 4 can also comprise: storage capacitors electrode 322, to be arranged on substrate 310 and between adjacent two sweep traces 320.This storage capacitors electrode 322 generally utilizes the first optical cover process identical with sweep trace 320 to make.This storage capacitors electrode 322, be positioned at lock insulation course (not illustrating) on storage capacitors electrode 322 and the second metal electrode 332 can form a storage capacitors (Cst), make the display of multi-domain perpendicular alignment-type pixel structure 300 can maintain the time of one longer.Second metal electrode 332 such as utilizes the second optical cover process identical with data line 330 to make.

Fig. 6 A, 6B are the upper schematic diagram of a kind of first patterned pixel electrode of present pre-ferred embodiments.Fig. 6 C is the upper schematic diagram of a kind of second patterned pixel electrode of present pre-ferred embodiments.Please refer to Fig. 4, Fig. 5 A and Fig. 6 A, 6B, first patterned pixel electrode 350 can comprise: the first complete areal coverage 350a and at least one slit distributive province 350b, multiple liquid crystal molecules 392 of liquid crystal layer 390 have multiple toppling direction, what wherein the first complete areal coverage 350a was positioned at the toppling direction of liquid crystal molecule 392 topples over center, and slit distributive province 350b is in order to the toppling direction of stabilizing liquid crystal molecule 392.Referring again to Fig. 4, Fig. 5 A and Fig. 6 C, the second patterned pixel electrode 360 can comprise: the second complete areal coverage 360a and at least one slit distributive province 360b, slit distributive province 360b radially distribute outward from the center of the second complete areal coverage 360a.In addition, Fig. 6 A illustrates a kind of form of contact hole, and Fig. 6 B illustrates the form of another kind of contact hole, is so only citing at this, and is not used to limit the present invention.

Moreover, first patterned pixel electrode 350 can also have following change, such as, first complete areal coverage 350a also can be made a slit distributive province, that is, in the first complete areal coverage 350a of Fig. 6 A, form the slit as Fig. 6 C, and the surrounding correspondence with the first complete areal coverage 350a of slit is provided with slit distributive province 350b, that is, the first patterned pixel electrode 350 comprises: at least one slit distributive province.

In addition, first patterned pixel electrode 350 can also have following change, such as, first complete areal coverage 350a is without any pixel electrode, that is, pixel electrode is there is not at the first complete areal coverage 350a of Fig. 6 A, and the surrounding correspondence without the first complete areal coverage 350a of pixel electrode is provided with slit distributive province 350b, that is, first patterned pixel electrode 350 comprises: one without pixel electrode areal coverage (the first complete areal coverage 350a being equivalent to Fig. 6 A does not exist pixel electrode) and at least one slit distributive province 350b, slit distributive province 350b is around without pixel electrode areal coverage 350a.

It should be noted that the slit via first and second patterned pixel electrode 350,360 is arranged, liquid crystal molecule 392 can be made to have multiple toppling direction and cause multiple viewing area, therefore, the display effect of wide viewing angle can be obtained.Particularly, the design of first and second patterned pixel electrode 350,360 above-mentioned, is suitable for making the dump angle of liquid crystal molecule 392 to be consecutive variations.Therefore, dark line can not be produced at the intersection (bright dark space every) of first and second patterned pixel electrode 350,360.Owing to there is no the impact of dark line, the overall penetrance of this multidomain vertical alignment type dot structure 300 can be promoted.The slit pattern of first and second patterned pixel electrode 350,360 above-mentioned only as illustrating, but during practical application not with above-mentioned slit pattern for restriction.What have this area knows that the knowledgeable is when being changed according to its different object usually.

Please more simultaneously with reference to figure 4, Fig. 5 A and Fig. 5 B, drawdown zone 370 also can comprise: at least one contact window W1, and the second patterned pixel electrode 360 through contact window W1 to be electrically connected with the first patterned pixel electrode 350.In addition, drawdown zone 370 can be simple layer structure or the multi-layer film structure stacked by two-layer above rete.In addition, referring again to Fig. 5 A, this multidomain vertical alignment type dot structure 300 more can comprise chromatic filter layer 382 further, is arranged at the top of common electrode 380.The effect of chromatic filter layer 382 is to make this multidomain vertical alignment type dot structure 300 carry out true color display.

Below, the first electric field is made to be less than the principle of the second electric field and the effect of generation by going on to say drawdown zone 370 of the present invention.Please refer to Fig. 5 A, above-mentioned multidomain vertical alignment type dot structure 300 has the first district R1 and the second district R2.Multidomain vertical alignment type dot structure 300 only utilizes an active component 340 to be electrically connected first and second patterned pixel electrode 350,360, so, in the second district R2, the data voltage V that first and second patterned pixel electrode 350,360 applies _iTO1, V _iTO2identical.In theory, common electrode 380 is identical with the pressure reduction formed between first and second patterned pixel electrode 350,360 respectively.But, owing to being provided with drawdown zone 370 and drawdown zone 370 makes the first electric field be less than the second electric field, in fact, at the first R1 place of district, the liquid crystal molecule 392 of liquid crystal layer 390 can be made to become different from the pressure reduction that first and second patterned pixel electrode 350,360 is experienced.

More specifically, in the first district R1, owing to being provided with drawdown zone 370, so liquid crystal molecule 392 is experienced less voltage difference from the first patterned pixel electrode 350 and becomes low-voltage area, the angle of toppling at the liquid crystal molecule 392 of low-voltage area is little, so the first district R1 becomes dark space.In addition, in the second district R2, because the second patterned pixel electrode 360 directly has an impact (not the impact of drawdown zone 370) for liquid crystal molecule 392, so liquid crystal molecule 392 is directly experienced larger voltage difference from the second patterned pixel electrode 360 and becomes high voltage region, the angle of toppling at the liquid crystal molecule 392 of high voltage region is large, so the second district R2 becomes clear zone.In sum, owing to can form bright dark space in same multidomain vertical alignment type dot structure 300 simultaneously, so low colour cast display effect can be reached.In addition, when the condition of drawdown zone 370 meets above-mentioned formula (1), can effectively adjust above-mentioned pressure reduction, obtain better liquid crystal display effect.

The meaning that please refer to each symbol in Fig. 5 A and Fig. 5 B, Fig. 5 B is described as follows: V _comfor being applied to the common voltage (common voltage) of common electrode 380; V _sthe data voltage being the first patterned pixel electrode 350, after drawdown zone 370 step-down, makes liquid crystal molecule 392 cause the voltage of toppling over; V _iTO1for being applied to the data voltage of the first patterned pixel electrode 350; V _iTO2for being applied to the data voltage of the second patterned pixel electrode 360; C _lCfor the electric capacity of liquid crystal layer 390; C _passfor the electric capacity of drawdown zone 370; d _passfor the thickness of drawdown zone 370.

The derivation of above-mentioned formula (1) below will be described, the derivation of formula (1) is carried out for the first district R1 of Fig. 5 A.More specifically, first and second patterned pixel electrode 350,360 such as is at the voltage (V _iTO1=V _iTO2), form bright dark space need by drawdown zone 370 to cause pressure drop, and this is the process of carrying out in the first district R1.The voltage V that first patterned pixel electrode 350 is formed after drawdown zone 370 _s, capacitance equation can be borrowed to calculate, obtain formula (2) thus:

$V_S=(V_{\mathrm{ITO}2}-V_{\mathrm{com}})\×\frac{C_{\mathrm{pass}}}{C_{\mathrm{pass}}+C_{\mathrm{LC}}}+V_{\mathrm{com}}-------\left(2\right)$

Generally speaking, visual transition effect when liquid crystal molecule 392 changes on state of by dark-state under display state is comparatively obvious, applying voltage V during dark-state zero gray scale _iTO2(=V _0-gray) and V _compressure reduction, it is than V _sand V _compressure reduction large B volt more than, be a constant by experience B, time can obtain preferably liquid crystal display effect in 0.3≤B≤2, obtain formula (3) thus:

(V _ITO2-V _com)-(V _S-V _com)≥B -------(3)

Formula (2) is substituted into formula (3) formula (4) can be obtained:

$V_{\mathrm{ITO}2}-[(V_{\mathrm{ITO}2}-V_{\mathrm{com}})\×\frac{C_{\mathrm{pass}}}{C_{\mathrm{pass}}+C_{\mathrm{LC}}}+V_{\mathrm{com}}]\≥B-------\left(4\right)$

Formula (4) abbreviation can be obtained formula (5):

$\frac{{\mathrm{\ϵ}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\≤\frac{{\mathrm{\ϵ}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\×(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1)-------\left(5\right)$

V _ITO2-V _com＝V _LC-------(6)

Bring formula (6) into formula (5) and carry out abbreviation, formula (7) can be obtained:

$V_{\mathrm{LC}}\×\left[\frac{C_{\mathrm{LC}}}{C_{\mathrm{pass}}+C_{\mathrm{LC}}}\right]\≥B-------\left(7\right)$

Formula (8) can be obtained again by formula (7):

$V_{\mathrm{ITO}2}-V_{\mathrm{com}}\≥A\×\left(\frac{C_{\mathrm{pass}}+C_{\mathrm{LC}}}{C_{\mathrm{LC}}}\right)-------\left(8\right)$

Define dark-state zero grayscale voltage again:

|V _0-gray-V _com|＝V _LC-------(9)

Formula (9) is substituted into formula (8) formula (10) can be obtained:

$V_{0-\mathrm{gray}}-V_{\mathrm{com}}\≥A\×\left(\frac{C_{\mathrm{pass}}+C_{\mathrm{LC}}}{C_{\mathrm{LC}}}\right)-------\left(10\right)$

Formula (11) can be obtained by formula (10)

$\left(\frac{C_{\mathrm{pass}}+C_{\mathrm{LC}}}{C_{\mathrm{LC}}}\right)\≤\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-------\left(11\right)$

Formula (12) can be obtained again by formula (11)

$C_{\mathrm{pass}}\≤C_{\mathrm{LC}}(\frac{|V_{0-\mathrm{gray}}-\mathrm{Vcom}}{B}-1)-------\left(12\right)$

From capacitance equation (13):

$C_{\mathrm{pass}}={\mathrm{\ϵ}}_{\mathrm{pass}}\×\frac{A}{d_{\mathrm{pass}}};$ $C_{\mathrm{LC}}={\mathrm{\ϵ}}_{\mathrm{LC}}\×\frac{A}{d_{\mathrm{LC}}}-------\left(13\right)$

Therefore, bring formula (13) into formula (12) and arrange, namely can obtain the setting model of drawdown zone 370, be i.e. above-mentioned formula (1),

$\frac{{\mathrm{\ϵ}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\≤\frac{{\mathrm{\ϵ}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\×(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1)-------\left(1\right)$

Learn that B is a constant by above-mentioned explanation, time can obtain preferably liquid crystal display effect in 0.3≤B≤2.For example, refer to Fig. 7, it is under different pressure reduction, the curve map that colour cast degree changes along with visual angle.Wherein, applying voltage V when curve C 1 is dark-state zero gray scale _iTO2(=V _0-gray) and V _compressure reduction and V _sand V _comthe colour cast degree of pressure reduction when being 0V with the curve of visual angle change; And the applying voltage V of curve C 2 when being dark-state zero gray scale _iTO2(=V _0-gray) and V _compressure reduction and V _sand V _comthe colour cast degree of pressure reduction when being 0.5V with the curve of visual angle change.Please refer to Fig. 7, known: to be 0V (curve C 1) compared to pressure reduction, when above-mentioned pressure reduction is 0.5V (curve C 2), color offset phenomenon can obtain obvious improvement, therefore B is better can be 0.5.

It should be noted that the set-up mode of drawdown zone 370, as the thickness etc. selecting (size of specific inductive capacity), drawdown zone 370 of material, can directly have influence on above-mentioned pressure reduction.From above-mentioned formula (1) ~ formula (13), when the specific inductive capacity of the material of drawdown zone 370 is less or the thickness of drawdown zone 370 is comparatively large, all can obtains larger pressure reduction and make first and second patterned pixel electrode 350,360 produce obvious bright dark space to improve colour cast effect.In other words, if drawdown zone 370 is under same thickness, the capacitance of the drawdown zone 370 between first and second patterned pixel electrode 350,360 will reduce as far as possible.

For describing the mode that drawdown zone 370 is arranged in detail, will silicon nitride (SiN) and macromolecule transparent insulation material (PFA) be adopted to illustrate for the material of drawdown zone 370 respectively below.Fig. 8 is drawdown zone when selecting different materials, and above-mentioned pressure reduction corresponds to the curve map of thickness, and wherein, curve D 1 adopts silicon nitride, and curve D 2 adopts macromolecule transparent insulation material.When Fig. 9 A is for selecting silicon nitride as drawdown zone 370 material, liquid crystal molecule 392 is by the schematic diagram of electric field influence.When Fig. 9 B is for selecting macromolecule transparent insulation material as drawdown zone 370 material, liquid crystal molecule 392 is by the schematic diagram of electric field influence.

Please refer to Fig. 8, in above-mentioned multidomain vertical alignment type dot structure 300, if the material selection silicon nitride of drawdown zone 370, this specific inductive capacity (ε _pass) be 10, as thickness (d _pass) be the producible pressure reduction of condition of 0.3 μm be 0.2V; If the material of drawdown zone 370 is macromolecule transparent insulation materials, this specific inductive capacity (ε _pass) be 3.5, as thickness (d _pass) be the producible pressure reduction of condition of 0.3 μm be 0.7V.

Comparison diagram 9A and Fig. 9 B, as shown in Figure 9 A, when using silicon nitride as drawdown zone 370 material, if thickness is 0.3 μm, the pressure reduction caused is only 0.2V, so the second patterned pixel electrode 360 produces extra boundary electric field E _siNmore weak, so bright dark space is less obvious, even if thickness is increased to 3 μm, pressure reduction is also only increased to 1.3V; But as shown in Figure 9 B, when using macromolecule transparent insulation material as drawdown zone 370 material, if thickness is 3 μm, then the pressure reduction produced can be about 3V, so the boundary electric field E that the second patterned pixel electrode 360 is formed _pFAcomparatively strong, that is, with same thickness, the pressure reduction produced using macromolecule transparent insulation material as drawdown zone 370 is larger, is therefore subject to boundary electric field E _pFAthe liquid crystal molecule 392 of impact reacts very fast and dump angle is large, makes bright dark space therefore comparatively clearly demarcated.Thus, the display effect of low colour cast can be reached.Material, thickness and rete number that above-mentioned drawdown zone 370 is selected can need according to designing and change, and are only herein and illustrate, and unrestricted content of the present invention.

In sum, above-mentioned multidomain vertical alignment type dot structure 300 only utilizes an active component 340 to be electrically connected first and second patterned pixel electrode 350,360, though apply identical data voltage on first and second patterned pixel electrode 350,360, coordinate the setting of drawdown zone 370 that liquid crystal molecule 392 in fact can be caused to experience the different pressure reduction coming from first and second patterned pixel electrode 350,360 respectively.So this multidomain vertical alignment type dot structure 300 can reduce the usage quantity of active component 340, structure is simple, and can cause obvious pressure reduction and produce bright dark space, to reach the display effect of low colour cast.

Figure 10 is the schematic perspective view of a kind of display panels of present pre-ferred embodiments.Please refer to Figure 10, this display panels 400 comprises multiple above-mentioned multidomain vertical alignment type dot structure 300.All be illustrated in the above embodiments, so no longer repeated at this as each multidomain vertical alignment type dot structure 300.The active component that this display panels 400 entirety uses is less, can save cost of manufacture.Particularly, by the setting of an active component 340, first and second patterned pixel electrode 350,360 and drawdown zone 370, easily can reach low colour cast display effect, and then good display quality is provided.

Figure 11 is the schematic diagram of a kind of liquid crystal indicator of present pre-ferred embodiments.Please refer to Figure 11, this liquid crystal indicator 600 comprises: above-mentioned display panels 400 and backlight module 500, this display panels 400 is arranged at the top of backlight module 500.Similarly, this display panels 400 comprises multiple above-mentioned multidomain vertical alignment type dot structure 300.Carry out related description in the above embodiments as each multidomain vertical alignment type dot structure 300, no longer repeated at this.In addition, backlight module 500 can use direct type backlight module or side incident backlight module, and provide area source L to display panels 400, the kind about backlight module 500 is not limited at this.This liquid crystal indicator 600 has the display panels 400 of low colour cast effect owing to employing, so can provide good display quality.

Figure 12 A ~ Figure 12 E is a kind of method for making part run schematic diagram with the substrate of multidomain vertical alignment type dot structure of present pre-ferred embodiments.When the Making programme with reference to Figure 12 A ~ Figure 12 E, referring to Fig. 4 and Fig. 5 A to understand the Making programme with the substrate 310 of multidomain vertical alignment type dot structure 300.

First, please refer to Fig. 5 A and Figure 12 A, a substrate 310 is provided.This substrate 310 can be glass substrate or quartz base plate.

Then, please refer to Figure 12 A and Figure 12 B, on substrate 310, form scan line 320, data line 330 and an active component 340, substrate 310 is divided into multiple pixel region 310a by sweep trace 320 and data line 330, and active component 340 is electrically connected with sweep trace 320 and data line 330.Specifically, as illustrated in fig. 12 for carrying out first optical cover process (Metal 1), in first optical cover process, the grid 342 of sweep trace 320 and follow-up active component 340 is formed.In addition, also on substrate 310, a storage capacitors electrode 322 can be formed between adjacent two sweep traces 320.

As shown in Fig. 5 A and Figure 12 B, carry out second optical cover process (Metal 2), in second optical cover process, form data line 330, and form active component 340 by stacking of rete.This active component 340 comprises: grid 342, source electrode 344 and drain electrode 346, wherein grid 342 and sweep trace 320 are electrically connected, source electrode 344 and data line 330 are electrically connected, and drain electrode 346 can be electrically connected with first and second patterned pixel electrode 350,360 of follow-up formation.Particularly, also there is in active component 340 channel layer 348, electronics can be made to move in channel layer 348.In addition, in this step, also can form one second metal electrode 332 above storage capacitors electrode 322, form a storage capacitors (Cst) to make storage capacitors electrode 322, lock insulation course (not illustrating) and the second metal electrode 332.

Then, please refer to Fig. 5 A and Figure 12 C, on substrate 310, form one first patterned pixel electrode 350, be electrically connected with active component 340.This first patterned pixel electrode 350 comprises one first complete areal coverage 350a and at least one slit distributive province 350b, multiple liquid crystal molecules 392 of the liquid crystal layer 390 of follow-up formation have multiple toppling direction, what wherein the first complete areal coverage 350a was positioned at the toppling direction of liquid crystal molecule 392 topples over center, slit distributive province 350b, can more simultaneously with reference to Fig. 5 A in order to the toppling direction of stabilizing liquid crystal molecule 392.In some embodiments, patterned pixel electrode 350 also can be electrically connected with the second metal electrode 332.

Come again, please refer to Fig. 5 A and Figure 12 D, on the first patterned pixel electrode 350, form a drawdown zone 370 (being illustrated in Fig. 5 A).The material of drawdown zone 370 can be silicon nitride or macromolecule transparent insulation material, and this drawdown zone 370 can be single-layer membrane structure or multi-layer film structure.

Then, please refer to Fig. 5 A and Figure 12 E, on drawdown zone 370, form one second patterned pixel electrode 360, be electrically connected with active component 340.This second patterned pixel electrode 360 can comprise: one second complete areal coverage 360a and at least one slit distributive province 360b, slit distributive province 360b radially distribute outward from the center of the second complete areal coverage 360a, can simultaneously with reference to Fig. 6 C.Particularly, at least one contact window W1 can be formed in drawdown zone 370, the second patterned pixel electrode 360 of formation is electrically connected with the first patterned pixel electrode 350 through contact window W1.So far, the substrate 310 with multidomain vertical alignment type dot structure 300 can be completed.

Then, please refer to Fig. 5 A, also can form a common electrode 380 in the subtend of first and second patterned pixel electrode 350,360.Afterwards, between common electrode 380 and first and second patterned pixel electrode 350,360, a liquid crystal layer 390 is formed.Thus, namely the making of multidomain vertical alignment type dot structure 300 is completed, wherein, first patterned pixel electrode 350 and the second patterned pixel electrode 360 equipotential, first patterned pixel electrode 350 provides liquid crystal layer 390 one the first electric field, second patterned pixel electrode 360 provides liquid crystal layer 390 one the second electric field, and drawdown zone 370 makes the first electric field be less than the second electric field.It should be noted that when making above-mentioned drawdown zone 370, drawdown zone 370 can be made to meet following condition:

$\frac{{\mathrm{\ϵ}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\≤\frac{{\mathrm{\ϵ}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\×(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1)$

ε _passfor specific inductive capacity, the ε of drawdown zone 370 _lCfor specific inductive capacity, the d of liquid crystal layer 390 _passfor thickness, the V of drawdown zone 370 _comfor the voltage, the d that apply common electrode 380 _lCfor thickness, the V of liquid crystal layer 390 _0-grayfor when dark-state zero gray scale to the data voltage that the first patterned pixel electrode 350 applies, wherein B is a constant, and 0.3≤B≤2, and in another embodiment, B also can be 0.5.In addition, as shown in Figure 5A, a chromatic filter layer 382 can also be formed in the top of common electrode 380, to reach the display of true color.

Second embodiment

In addition, in order to the processing procedure width limit of the resolution and etch process ability that improve current exposure machine is 3.5 μm, and effectively cannot increase the problem of the width of the pixel electrode pattern J of long strip type, therefore, in the dot structure 700 of the embodiment of Figure 13 A, have employed two-layer patterned pixel electrode and make the strip shaped electric poles of two-layer patterned pixel electrode offset a segment distance each other, the width of equivalent increase strip shaped electric poles is carried out with this, to solve in lower the brought dark line phenomenon of slit place electric field intensity, further describe as follows.

Figure 13 A is the upper schematic diagram that the another kind of present pre-ferred embodiments has the substrate of multidomain vertical alignment type dot structure.Figure 13 B is the diagrammatic cross-section of multidomain vertical alignment type dot structure along B-B ' line of Figure 13 A.Referring to Figure 13 A and Figure 13 B, the substrate 710 with multidomain vertical alignment type dot structure 700 comprises: sweep trace 720 and data line 730, first active component 740, second active component 750, first patterned pixel electrode 760, passivation layer (can be silicon nitride layer L _siN) and the second patterned pixel electrode 770.In addition, also can arrange subtend substrate 782, have common electrode 780, subtend substrate 782 is arranged at substrate 710 subtend, and common electrode 780 corresponds to first and second patterned pixel electrode 760,770.And liquid crystal layer 790 is folded between subtend substrate 782 and substrate 710.

Continue referring to Figure 13 A and Figure 13 B, the first active component 740 is electrically connected with corresponding sweep trace 720 and data line 730.Second active component 750 is electrically connected with corresponding sweep trace 720 and data line 730.First patterned pixel electrode 760 is electrically connected to the first active component 740 and has multiple first strip shaped electric poles 760a (being illustrated in further in Figure 14 A).Passivation layer (silicon nitride layer L _siN) be arranged on the first patterned pixel electrode 760.Second patterned pixel electrode 770 is electrically connected to the second active component 750 and has multiple second strip shaped electric poles 770a (being illustrated in further in Figure 14 B).

Particularly, the first strip shaped electric poles 760a and the second strip shaped electric poles 770a each other part overlaps, and makes the second strip shaped electric poles 770a offset a predetermined distance d 1 from the first strip shaped electric poles 760a.

Can the width d2 of comprehensive consideration offset distance d1, the first strip shaped electric poles 760a and the second strip shaped electric poles 770a, diminish to make the width d4 of slit S.In one embodiment, as shown in Figure 13 B, the width d2 of each first strip shaped electric poles 760a and each the second strip shaped electric poles 770b can be 3.5 μm, and predetermined distance d 1 is 1.5 μm, and the overall width d3 after each first strip shaped electric poles 760a and each the second strip shaped electric poles 770a is overlapped is 5 μm.Now, slit S width d4 becomes 2 μm.

Above-mentioned predetermined distance d 1 can be 0.1 ~ 2.5 μm, is preferably 0.5 ~ 1.5 μm.In addition, the overall width d3 that can make each first strip shaped electric poles 760a and each the second strip shaped electric poles 770a is 3.6 ~ 6 μm, is preferably 4 ~ 5 μm.Now, slit S width d4 can be 1 ~ 3.4 μm, is preferably 2 ~ 3 μm.Within the scope of this, effectively can reduce the width d4 of slit S and then increase the electric field intensity at slit S place.

Can know and know, even if the processing procedure width limit of the resolution of current exposure machine and etch process ability is 3.5 μm, (namely, originally the slit S that width is 3.5 μm can only be produced), but, by aforesaid way, the width of slit S effectively can be reduced.

Hold above-mentioned, by making the first patterned pixel electrode 760 and the second pattern pixel electrode 770 overlap, and the width d4 of slit S can be reduced and then increase the electric field intensity at slit S place.Therefore, at slit S place, the impact being subject to increased electric field intensity is toppled over, so above-mentioned multidomain vertical alignment type dot structure 700 can reduce dark line further by the liquid crystal molecule (not illustrating) of originally failing to topple in liquid crystal layer 790.

Continue referring to Figure 13 B, multidomain vertical alignment type dot structure 700 can comprise: silicon nitride layer L _siN, be arranged between the first patterned pixel electrode 760 and the second patterned pixel electrode 770.High pressure, low pressure can be supplied respectively to the first patterned pixel electrode 760 and the second patterned pixel electrode 770, to cause bright dark space via the first active component 740 and the second active component 750.Particularly, from the D1 curve of above-mentioned Fig. 8, silicon nitride layer L _siNthe pressure drop effect caused is little, therefore can not have influence on overall display effect.

Figure 14 A is the schematic top plan view of the first patterned pixel electrode of the multidomain vertical alignment type dot structure of Figure 13 A.Figure 14 B is the schematic top plan view of the second patterned pixel electrode of the multidomain vertical alignment type dot structure of Figure 13 A.Referring to Figure 14 A and Figure 14 B, can know, the first patterned pixel electrode 760 has many strip shaped electric poles 760a, and the second patterned pixel electrode 770 has many strip shaped electric poles 770a.Substantially, the first patterned pixel electrode 760 has identical pattern with the second patterned pixel electrode 770, all has cross part 762,772 separately; Annulus 764,774; With radial strip part 766,776 (i.e. first and second strip shaped electric poles 760a, 770a).

About the Making programme of the dot structure 700 in active elements array substrates side, then similar with general five road optical cover process, be roughly: make Metal 1 (grid of sweep trace 720, first and second active component 740,750), cover insulation course GIN, make the channel layer of first and second active component 740,750, make Metal 2 (source electrode of data line 730, first and second active component 740,750 and drain electrode), make the first patterned pixel electrode 760, cover passivation layer (silicon nitride layer L _siN) and make the second patterned pixel electrode 770 etc.It should be noted that in above-mentioned Making programme, deliberately make the first patterned pixel electrode 760 and the second patterned pixel electrode 770 misalignment each other, and make the second strip shaped electric poles 770a offset a predetermined distance d 1 from the first strip shaped electric poles 760a.Thus, the resolution of exposure machine and the processing procedure width limit (3.5 μm) of etch process ability can be overcome, effectively reduce the width of slit S, to reduce the dark line of dot structure 700.

Similarly, the substrate 710 with multidomain vertical alignment type dot structure 700 of the second embodiment, also can be used in display panels (not illustrating), liquid crystal indicator (not illustrating), is not namely repeated at this.

3rd embodiment

In addition, for improving the problem of the dark line of the multi-field vertical assigned LCD panel 202 of Fig. 3, the present invention also been proposed the substrate 810 with another kind of multidomain vertical alignment type dot structure 800, below will be described in detail.

Figure 15 A is the upper schematic diagram that another of present pre-ferred embodiments has the substrate of multidomain vertical alignment type dot structure.Figure 15 B is the diagrammatic cross-section of multidomain vertical alignment type dot structure along II-II ' line of Figure 15 A.Figure 15 C is the diagrammatic cross-section of multidomain vertical alignment type dot structure along III-III ' line of Figure 15 A.Can learn from Figure 15 B the situation (waiting voltage) that following first patterned pixel electrode 875 is connected with bias electrode 850, the distribution scenario of the electric field that following first patterned pixel electrode 875, second patterned pixel electrode 876 causes with bias electrode 850 can be learnt from Figure 15 C.

Referring to Figure 15 A ~ Figure 15 C, the substrate 810 with multidomain vertical alignment type dot structure 800 comprises: sweep trace 820 and data line 830, first active component 840, second active component 845, patterned pixel electrode 870, bias electrode 850 and passivation layer 860.Similarly, common electrode 880 can be arranged at the subtend of patterned pixel electrode 870, and liquid crystal layer 890 can between common electrode 880 and patterned pixel electrode 870.

Please refer to Figure 15 A and Figure 15 B, sweep trace 820 and data line 830 are arranged on substrate 810.Active component 840 to be arranged on substrate 810 and to be electrically connected with corresponding sweep trace 820 and data line 830, wherein, patterned pixel electrode 870 has the first patterned pixel electrode 875 and the second patterned pixel electrode 876, first active component 840 and the second active component 845 can supply high pressure, low pressure respectively to the first patterned pixel electrode 875 and the second patterned pixel electrode 876, to cause bright dark space.The present embodiment is arranged on substrate 810 with bias electrode 850, drawdown zone 860 is arranged on bias electrode 850, it is example that patterned pixel electrode 870 is arranged on drawdown zone 860, so not as limit, also can be that patterned pixel electrode 870 is arranged on substrate 810, drawdown zone 870 is arranged on patterned pixel electrode 870, and bias electrode 850 is arranged on drawdown zone 870.Patterned pixel electrode 860 has higher-pressure region V _hwith low-pressure area V _l, and higher-pressure region V _hwith low-pressure area V _lbetween there is frontier district V _i.Common electrode 880 is arranged at the subtend of patterned pixel electrode 870.Liquid crystal layer 890 is between common electrode 880 and patterned pixel electrode 870.

This embodiment is electrically connected to higher-pressure region V with bias electrode 850 _hfor example, and corresponding sides battery limit (BL) V _iposition and arrange, so not as limit.Higher-pressure region V can be obtained by this configuration _helectric field strength E _hbe greater than frontier district V _ielectric field strength E _i, frontier district V _ielectric field strength E _ibe greater than low-pressure area V _lelectric field strength E _l.

More specifically, referring to Figure 15 A and Figure 15 B, in the position of the patterned pixel electrode 870 on upper strata, in low-pressure area V _lapply low-voltage, and apply high voltage in higher-pressure region, the bias electrode 850 due to lower floor is electrically connected to higher-pressure region V _hin patterned pixel electrode 870, so bias electrode 850 is same current potential with the patterned pixel electrode 870 (i.e. the first patterned pixel electrode 875) in higher-pressure region.It should be noted that bias electrode 850 is arranged on frontier district V _iand be positioned at the below of drawdown zone 860, so, at frontier district V _iplace, the voltage that liquid crystal molecule 892 is experienced can cause pressure drop via drawdown zone 860, so frontier district V _iplace is by formation one electric field E _i, electric field E _ielectric field intensity can be between: higher-pressure region V _helectric field E _helectric field intensity, with low-pressure area V _lelectric field E _lelectric field intensity between.

Hold above-mentioned, be provided with the frontier district V of bias electrode 850 in below _iin liquid crystal molecule 892 can topple over continuously, and dark line is disappeared, that is, comparison diagram 3 and Figure 15 B, a dark line at known only remaining arrow A place, centre position.By the design of above-mentioned dot structure 800, the quantity of dark line can be reduced.

Referring again to Figure 15 B and Figure 15 C, from low-pressure area V _l(the secondth district) is toward higher-pressure region V _hthe direction in (the firstth district), makes the Edge Distance low-pressure area V of bias electrode 850 _lthe edge one preset space length d of patterned pixel electrode 870.This above-mentioned preset space length d can be 0≤d≤1 μm (Figure 15 B and Figure 15 C is for d=0 μm), within the scope of this, in frontier district V _iin can form preferably electric field strength E _i, to make frontier district V _iin liquid crystal molecule 892 topple over.This is because liquid crystal molecule 892 can be toppled over, because E toward high direction of an electric field _l< E _i< E _h, so at bias electrode and V _ldistrict's intersection as produced a gap, wherein electric field E _iby V _hdistrict causes pressure drop to produce through drawdown zone 860, therefore electric field E _land E _idifference is comparatively large, so liquid crystal molecule 892 more easily swings to V _idistrict, right gap also can not ether large.And electric field E _hand E _idiffer less, as bias electrode and V _hdistrict's intersection produces a gap, then liquid crystal molecule 892 more not easily swings to V _hdistrict.

Figure 16 A is the schematic top plan view with the bias electrode of the substrate of multidomain vertical alignment type dot structure of Figure 15 A.Figure 16 B is the schematic top plan view with the patterned pixel electrode of the substrate of multidomain vertical alignment type dot structure of Figure 15 A.Please also refer to Figure 16 A, bias electrode 850 can have annulus 852 and strip part 854.The material of bias electrode 850 can be metal or electrically conducting transparent material, wherein, when utilizing electrically conducting transparent material, such as, can adopt indium tin oxide and indium-zinc oxide.

Referring again to Figure 16 B, patterned pixel electrode 870 can have annulus 872, and is positioned at many radial strip part 874a inside annulus 872, with many that are positioned at outside annulus 872 radial strip part 874b.Particularly, the annulus 872 of patterned pixel electrode 870 is around the annulus 852 of bias electrode 850, and above-mentioned predetermined distance d of can being separated by each other.

About the Making programme of the dot structure 800 in active elements array substrates side, then similar with general five road optical cover process.But, make in Metal 1 processing procedure according to bias electrode 850, or bias electrode 850 be use extra increase utilize electrically conducting transparent material together to make, and make respective processing procedure different, be respectively described below:

[in Metal 1 processing procedure, making bias electrode 850]

The Making programme of multidomain vertical alignment type dot structure 800 is roughly: make Metal 1 (grid of sweep trace 820, active component 840 and bias electrode 850), cover insulation course (not illustrating), make the channel layer of active component 840, make Metal 2 (source electrode of data line 830, active component 840 and drain electrode), cover drawdown zone 860 and fabricating patterned pixel electrode 870 etc.

[using electrically conducting transparent material to make the situation of bias electrode 850]

The Making programme of multidomain vertical alignment type dot structure 800 is roughly: make Metal 1 (grid of sweep trace 820, active component 840), cover insulation course (not illustrating), make the channel layer of active component 840, make Metal 2 (source electrode of data line 830, active component 840 and drain electrode), utilize electrically conducting transparent material to make bias electrode 850, cover drawdown zone 860 and fabricating patterned pixel electrode 870 etc.The particular design of above-mentioned dot structure 800, can make dark line only remaining (arrow A place as shown in fig. 15b), thus can reduce the quantity of dark line significantly.

Similarly, the substrate 810 with multidomain vertical alignment type dot structure 800 of the 3rd embodiment, also can be used in display panels (not illustrating), liquid crystal indicator (not illustrating), is not namely repeated at this.

In sum, proposed by the invention have substrate of multidomain vertical alignment type dot structure and preparation method thereof, display panels and liquid crystal indicator at least have the following advantages:

(1) via the design of drawdown zone, multidomain vertical alignment type dot structure of the present invention can use an active component in same dot structure, produce successional bright dark space.Compared to known mode, owing to decreasing the usage quantity of active component, except structure simply except, can also manufacturing cost be reduced.Arrange through suitable slit, while reaching low colour cast display effect, also can promote the overall penetrance of multidomain vertical alignment type dot structure.There is display panels and the liquid crystal indicator of above-mentioned dot structure, good display quality can be provided, and can cost of manufacture be saved.In addition, the method for making of above-mentioned multidomain vertical alignment type dot structure, can produce and have low colour cast effect and the simple multidomain vertical alignment type dot structure of structure.

(2) make the misalignment of upper and lower two-layer patterned pixel electrode, and strip shaped electric poles is each other overlapped mutually, and then the resolution of exposure machine and the processing procedure width limit (3.5 μm) of etch process ability can be overcome.Therefore, the width of slit effectively can be reduced, to reduce the dark line of dot structure.

(3) drawdown zone and bias electrode are set by the frontier district between higher-pressure region and low-pressure area, and obtain the electric field of electric field intensity between higher-pressure region and low-pressure area.Therefore, the dark line of frontier district can be made to disappear, thus the quantity of dark line can be reduced significantly.

Although the present invention discloses as above with preferred embodiment; so itself and be not used to limit the present invention, any those skilled in the art, without departing from the spirit and scope of the present invention; when doing a little amendment and perfect, therefore protection scope of the present invention is when being as the criterion of defining with claims.

Claims (52)

1. have a substrate for multidomain vertical alignment type dot structure, subtend is in a subtend substrate with a common electrode, and a liquid crystal layer is between this substrate and this subtend substrate, and this substrate comprises:

Scan line and a data line, be divided into multiple pixel region by this substrate;

One active component, is electrically connected with this sweep trace and this data line;

It is characterized in that:

One first patterned pixel electrode, is electrically connected with this active component;

One drawdown zone, is arranged on this first patterned pixel electrode; And

One second patterned pixel electrode, is arranged at the top of this first patterned pixel electrode, and is electrically connected with this active component;

Wherein, this the first patterned pixel electrode and this second patterned pixel electrode equipotential, this the first patterned pixel electrode provides this liquid crystal layer one first electric field, and this second patterned pixel electrode provides this liquid crystal layer one second electric field, and this drawdown zone makes this first electric field be less than this second electric field.

2. have the substrate of multidomain vertical alignment type dot structure as claimed in claim 1, it is characterized in that, this drawdown zone meets following condition:

$\frac{{\mathrm{\&epsiv;}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\&le;\frac{{\mathrm{\&epsiv;}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\&times;(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1),$

ε _passfor specific inductive capacity, the ε of this drawdown zone _lCfor specific inductive capacity, the d of this liquid crystal layer _passfor thickness, the d of this drawdown zone _lCfor thickness, the V of this liquid crystal layer _0-grayfor when dark-state zero gray scale to this first patterned pixel electrode apply data voltage, V _comfor the voltage applied this common electrode, wherein 0.3≤B≤2.

3. have the substrate of multidomain vertical alignment type dot structure as claimed in claim 1, it is characterized in that, this drawdown zone meets following condition:

$\frac{{\mathrm{\&epsiv;}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\&le;\frac{{\mathrm{\&epsiv;}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\&times;(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1),$

ε _passfor specific inductive capacity, the ε of this drawdown zone _lCfor specific inductive capacity, the d of this liquid crystal layer _passfor thickness, the d of this drawdown zone _lCfor thickness, the V of this liquid crystal layer _0-grayfor when dark-state zero gray scale to this first patterned pixel electrode apply data voltage, V _comfor the voltage applied this common electrode, wherein B is 0.5.

4. have the substrate of multidomain vertical alignment type dot structure as claimed in claim 1, it is characterized in that, the material of this drawdown zone comprises: macromolecule transparent insulation material.

5. have the substrate of multidomain vertical alignment type dot structure as claimed in claim 1, it is characterized in that, this drawdown zone is multi-layer film structure.

6. there is the substrate of multidomain vertical alignment type dot structure as claimed in claim 1, it is characterized in that, more comprise:

One storage capacitors electrode, to be arranged on this substrate and between adjacent two these sweep traces.

7. have the substrate of multidomain vertical alignment type dot structure as claimed in claim 1, it is characterized in that, this active component comprises:

One grid, is electrically connected with this sweep trace;

One source pole and one drains, and this source electrode and this data line are electrically connected, this drain electrode and this first and this second patterned pixel electrode be electrically connected.

8. there is the substrate of multidomain vertical alignment type dot structure as claimed in claim 1, it is characterized in that, this drawdown zone comprises at least one contact window, and this second patterned pixel electrode is electrically connected with this first patterned pixel electrode through this contact window.

9. have the substrate of multidomain vertical alignment type dot structure as claimed in claim 1, it is characterized in that, this first patterned pixel electrode comprises: one first complete areal coverage and at least one slit distributive province;

Multiple liquid crystal molecules of this liquid crystal layer have multiple toppling direction, and what wherein this first complete areal coverage was positioned at those toppling directions of those liquid crystal molecules topples over center, and this slit distributive province is in order to stablize those toppling directions of those liquid crystal molecules.

10. there is the substrate of multidomain vertical alignment type dot structure as claimed in claim 1, it is characterized in that, this the first patterned pixel electrode comprises: one without pixel electrode areal coverage and at least one slit distributive province, this slit distributive province around this without pixel electrode areal coverage.

11. substrates as claimed in claim 1 with multidomain vertical alignment type dot structure, it is characterized in that, this first patterned pixel electrode comprises: at least one slit distributive province.

12. substrates as claimed in claim 1 with multidomain vertical alignment type dot structure, it is characterized in that, this the second patterned pixel electrode comprises: one second complete areal coverage and at least one slit distributive province, this slit distributive province radially distributes outward from the center of this second complete areal coverage.

13. substrates as claimed in claim 1 with multidomain vertical alignment type dot structure, more comprise a chromatic filter layer, are arranged at the top of this common electrode.

14. 1 kinds of display panels, comprising:

One substrate, comprising:

Scan line and a data line, be arranged on this substrate, and this substrate is divided into multiple pixel region, and wherein this each pixel region has one first district and one second district;

One active component, to be arranged on this substrate and to be electrically connected with this sweep trace and this data line;

It is characterized in that:

One first patterned pixel electrode, is at least arranged at this firstth district and is electrically connected with this active component;

One drawdown zone, is arranged at above this first patterned pixel electrode; And

One second patterned pixel electrode, is arranged at this secondth district and is electrically connected with this active component;

One subtend substrate, has a common electrode, and this subtend substrate is arranged at this substrate subtend, and this common electrode corresponds to this first patterned pixel electrode and this second patterned pixel electrode; And

One liquid crystal layer, is folded between this subtend substrate and this substrate;

Wherein, this the first patterned pixel electrode and this second patterned pixel electrode equipotential, this the first patterned pixel electrode provides this liquid crystal layer one first electric field, and this second patterned pixel electrode provides this liquid crystal layer one second electric field, and this drawdown zone makes this first electric field be less than this second electric field.

15. display panels as claimed in claim 14, it is characterized in that, this drawdown zone meets following condition:

$\frac{{\mathrm{\&epsiv;}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\&le;\frac{{\mathrm{\&epsiv;}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\&times;(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1),$

ε _passfor specific inductive capacity, the ε of this drawdown zone _lCfor specific inductive capacity, the d of this liquid crystal layer _passfor thickness, the d of this drawdown zone _lCfor thickness, the V of this liquid crystal layer _0-grayfor when dark-state zero gray scale to this first patterned pixel electrode apply data voltage, V _comfor the voltage applied this common electrode, wherein 0.3≤B≤2.

16. display panels as claimed in claim 14, it is characterized in that, this drawdown zone meets following condition:

$\frac{{\mathrm{\&epsiv;}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\&le;\frac{{\mathrm{\&epsiv;}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\&times;(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1),$

ε _passfor specific inductive capacity, the ε of this drawdown zone _lCfor specific inductive capacity, the d of this liquid crystal layer _passfor thickness, the d of this drawdown zone _lCfor thickness, the V of this liquid crystal layer _0-grayfor when dark-state zero gray scale to this first patterned pixel electrode apply data voltage, V _comfor the voltage applied this common electrode, wherein B is 0.5.

17. display panels as claimed in claim 14, it is characterized in that, the material of this drawdown zone comprises macromolecule transparent insulation material.

18. display panels as claimed in claim 14, it is characterized in that, this drawdown zone is multi-layer film structure.

19. display panels as claimed in claim 14, more comprise a storage capacitors electrode, to be arranged on this substrate and between adjacent two these sweep traces.

20. display panels as claimed in claim 14, it is characterized in that, this active component comprises:

One grid, is electrically connected with this sweep trace;

One source pole and one drains, and this source electrode and this data line are electrically connected, this drain electrode and this first and this second patterned pixel electrode be electrically connected.

21. display panels as claimed in claim 14, it is characterized in that, this drawdown zone comprises at least one contact window, and this second patterned pixel electrode is electrically connected with this first patterned pixel electrode through this contact window.

22. display panels as claimed in claim 14, is characterized in that, this first patterned pixel electrode comprises: one first complete areal coverage and at least one slit distributive province;

Multiple liquid crystal molecules of this liquid crystal layer have multiple toppling direction, and what wherein this first complete areal coverage was positioned at those toppling directions of those liquid crystal molecules topples over center, and this slit distributive province is in order to stablize those toppling directions of those liquid crystal molecules.

23. display panels as claimed in claim 14, is characterized in that, this first patterned pixel electrode comprises: one without pixel electrode areal coverage and at least one slit distributive province, this slit distributive province around this without pixel electrode areal coverage.

24. display panels as claimed in claim 14, is characterized in that, this first patterned pixel electrode comprises: at least one slit distributive province.

25. display panels as claimed in claim 14, it is characterized in that, this the second patterned pixel electrode comprises: one second complete areal coverage and at least one slit distributive province, this slit distributive province radially distributes outward from the center of this second complete areal coverage.

26. display panels as claimed in claim 14, more comprise a chromatic filter layer, are arranged at the top of this common electrode.

27. 1 kinds of liquid crystal indicators, comprising:

One backlight module; And

One display panels, is arranged at the top of this backlight module, comprises:

One substrate, comprising:

Scan line and a data line, be arranged on this substrate, and this substrate is divided into multiple pixel region, it is characterized in that, this each pixel region has one first district and one second district;

One active component, to be arranged on this substrate and to be electrically connected with this sweep trace and this data line;

It is characterized in that:

One first patterned pixel electrode, is at least arranged at this firstth district and is electrically connected with this active component;

One drawdown zone, is arranged at above this first patterned pixel electrode; And

One second patterned pixel electrode, is arranged at this secondth district and is electrically connected with this active component;

One subtend substrate, has a common electrode, and this subtend substrate is arranged at this substrate subtend, this common electrode correspond to this first and this second patterned pixel electrode; And

One liquid crystal layer, is folded between this subtend substrate and this substrate;

Wherein, this the first patterned pixel electrode and the second patterned pixel electrode equipotential, this the first patterned pixel electrode provides this liquid crystal layer one first electric field, and this second patterned pixel electrode provides this liquid crystal layer one second electric field, and this drawdown zone makes this first electric field be less than this second electric field.

28. liquid crystal indicators as claimed in claim 27, it is characterized in that, this drawdown zone meets following condition:

$\frac{{\mathrm{\&epsiv;}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\&le;\frac{{\mathrm{\&epsiv;}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\&times;(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1),$

ε _passfor specific inductive capacity, the ε of this drawdown zone _lCfor specific inductive capacity, the d of this liquid crystal layer _passfor thickness, the d of this drawdown zone _lCfor thickness, the V of this liquid crystal layer _0-grayfor when dark-state zero gray scale to this first patterned pixel electrode apply data voltage, V _comfor the voltage applied this common electrode, wherein 0.3≤B≤2.

29. liquid crystal indicators as claimed in claim 27, it is characterized in that, this drawdown zone meets following condition:

$\frac{{\mathrm{\&epsiv;}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\&le;\frac{{\mathrm{\&epsiv;}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\&times;(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1),$

ε _passfor specific inductive capacity, the ε of this drawdown zone _lCfor specific inductive capacity, the d of this liquid crystal layer _passfor thickness, the d of this drawdown zone _lCfor thickness, the V of this liquid crystal layer _0-grayfor when dark-state zero gray scale to this first patterned pixel electrode apply data voltage, V _comfor the voltage applied this common electrode, it is characterized in that, B is 0.5.

30. liquid crystal indicators as claimed in claim 27, it is characterized in that, the material of this drawdown zone comprises macromolecule transparent insulation material.

31. liquid crystal indicators as claimed in claim 27, it is characterized in that, this drawdown zone is multi-layer film structure.

32. liquid crystal indicators as claimed in claim 27, more comprise a storage capacitors electrode, to be arranged on this substrate and between adjacent two these sweep traces.

33. liquid crystal indicators as claimed in claim 27, it is characterized in that, this active component comprises:

One grid, is electrically connected with this sweep trace;

One source pole and one drains, and this source electrode and this data line are electrically connected, this drain electrode and this first and this second patterned pixel electrode be electrically connected.

34. liquid crystal indicators as claimed in claim 27, it is characterized in that, this drawdown zone comprises at least one contact window, and this second patterned pixel electrode is electrically connected with this first patterned pixel electrode through this contact window.

35. liquid crystal indicators as claimed in claim 27, is characterized in that, this first patterned pixel electrode comprises: one first complete areal coverage and at least one slit distributive province;

Multiple liquid crystal molecules of this liquid crystal layer have multiple toppling direction, it is characterized in that, what this first complete areal coverage was positioned at those toppling directions of those liquid crystal molecules topples over center, and this slit distributive province is in order to stablize those toppling directions of those liquid crystal molecules.

36. liquid crystal indicators as claimed in claim 27, is characterized in that, this first patterned pixel electrode comprises: one without pixel electrode areal coverage and at least one slit distributive province, this slit distributive province around this without pixel electrode areal coverage.

37. liquid crystal indicators as claimed in claim 27, is characterized in that, this first patterned pixel electrode comprises: at least one slit distributive province.

38. liquid crystal indicators as claimed in claim 27, it is characterized in that, this the second patterned pixel electrode comprises: one second complete areal coverage and at least one slit distributive province, this slit distributive province radially distributes outward from the center of this second complete areal coverage.

39. liquid crystal indicators as claimed in claim 27, is characterized in that, more comprise a chromatic filter layer, be arranged at the top of this common electrode.

40. 1 kinds of manufacture methods with the substrate of multidomain vertical alignment type dot structure, this substrate subtend is in a subtend substrate with a common electrode, and a liquid crystal layer is between this substrate and this subtend substrate, and this manufacture method comprises:

One substrate is provided;

On this substrate, form scan line, a data line and an active component, this substrate is divided into multiple pixel region by this sweep trace and this data line, and this active component and this sweep trace and this data line are electrically connected;

It is characterized in that:

On this substrate, form one first patterned pixel electrode, be electrically connected with this active component;

A drawdown zone is formed on this first patterned pixel electrode; And

On this drawdown zone, form one second patterned pixel electrode, be electrically connected with this active component;

This first patterned pixel electrode and this second patterned pixel electrode equipotential, this the first patterned pixel electrode provides this liquid crystal layer one first electric field, this the second patterned pixel electrode provides this liquid crystal layer one second electric field, and this drawdown zone makes this first electric field be less than this second electric field.

41. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, this drawdown zone meets following condition:

$\frac{{\mathrm{\&epsiv;}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\&le;\frac{{\mathrm{\&epsiv;}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\&times;(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1),$

ε _passfor specific inductive capacity, the ε of this drawdown zone _lCfor specific inductive capacity, the d of this liquid crystal layer _passfor thickness, the d of this drawdown zone _lCfor thickness, the V of this liquid crystal layer _0-grayfor when dark-state zero gray scale to this first patterned pixel electrode apply data voltage, V _comfor the voltage applied this common electrode, wherein 0.3≤B≤2.

42. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, this drawdown zone meets following condition:

$\frac{{\mathrm{\&epsiv;}}_{\mathrm{pass}}}{d_{\mathrm{pass}}}\&le;\frac{{\mathrm{\&epsiv;}}_{\mathrm{LC}}}{d_{\mathrm{LC}}}\&times;(\frac{|V_{0-\mathrm{gray}}-V_{\mathrm{com}}|}{B}-1),$

ε _passfor specific inductive capacity, the ε of this drawdown zone _lCfor specific inductive capacity, the d of this liquid crystal layer _passfor thickness, the d of this drawdown zone _lCfor thickness, the V of this liquid crystal layer _0-grayfor when dark-state zero gray scale to this first patterned pixel electrode apply data voltage, V _comfor the voltage applied this common electrode, it is characterized in that, B is 0.5.

43. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, the material of this drawdown zone comprises macromolecule transparent insulation material.

44. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, this drawdown zone is multi-layer film structure.

45. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, to be more included on this substrate and to form a storage capacitors electrode between adjacent two these sweep traces.

46. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, this active component comprises:

One grid, is electrically connected with this sweep trace;

One source pole and one drains, and this source electrode and this data line are electrically connected, this drain electrode and this first and this second patterned pixel electrode be electrically connected.

47. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, in this drawdown zone, form at least one contact window, this second patterned pixel electrode is electrically connected with this first patterned pixel electrode through this contact window.

48. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, this first patterned pixel electrode comprises: one first complete areal coverage and at least one slit distributive province;

Multiple liquid crystal molecules of this liquid crystal layer have multiple toppling direction, and what wherein this first complete areal coverage was positioned at those toppling directions of those liquid crystal molecules topples over center, and this slit distributive province is in order to stablize those toppling directions of those liquid crystal molecules.

49. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, this the first patterned pixel electrode comprises: one without pixel electrode areal coverage and at least one slit distributive province, this slit distributive province around this without pixel electrode areal coverage.

50. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, this first patterned pixel electrode comprises: at least one slit distributive province.

51. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, this the second patterned pixel electrode comprises: one second complete areal coverage and at least one slit distributive province, this slit distributive province radially distributes outward from the center of this second complete areal coverage.

52. manufacture methods as claimed in claim 40 with the substrate of multidomain vertical alignment type dot structure, it is characterized in that, the top being more included in this common electrode forms a chromatic filter layer.