CN102540766A - Optical device for immersion lithography and projection exposure apparatus comprising such a device - Google Patents
Optical device for immersion lithography and projection exposure apparatus comprising such a device Download PDFInfo
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- CN102540766A CN102540766A CN2012100327279A CN201210032727A CN102540766A CN 102540766 A CN102540766 A CN 102540766A CN 2012100327279 A CN2012100327279 A CN 2012100327279A CN 201210032727 A CN201210032727 A CN 201210032727A CN 102540766 A CN102540766 A CN 102540766A
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- 230000003287 optical effect Effects 0.000 title claims abstract description 129
- 238000000671 immersion lithography Methods 0.000 title claims abstract description 14
- 238000000576 coating method Methods 0.000 claims abstract description 95
- 239000011248 coating agent Substances 0.000 claims abstract description 93
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 85
- 230000005855 radiation Effects 0.000 claims abstract description 44
- 239000007788 liquid Substances 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 28
- 239000000284 extract Substances 0.000 claims description 27
- 238000002803 maceration Methods 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 21
- 238000009736 wetting Methods 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 238000010521 absorption reaction Methods 0.000 claims description 9
- 239000011651 chromium Substances 0.000 claims description 9
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- 239000004809 Teflon Substances 0.000 claims description 6
- 229920006362 Teflon® Polymers 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 229920002313 fluoropolymer Polymers 0.000 claims description 6
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 claims description 6
- 229910000510 noble metal Inorganic materials 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 6
- 239000012498 ultrapure water Substances 0.000 claims description 6
- 208000000187 Abnormal Reflex Diseases 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- 206010021089 Hyporeflexia Diseases 0.000 claims description 5
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 5
- 238000005507 spraying Methods 0.000 claims description 5
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000013459 approach Methods 0.000 claims description 4
- 229940090961 chromium dioxide Drugs 0.000 claims description 4
- IAQWMWUKBQPOIY-UHFFFAOYSA-N chromium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Cr+4] IAQWMWUKBQPOIY-UHFFFAOYSA-N 0.000 claims description 4
- AYTAKQFHWFYBMA-UHFFFAOYSA-N chromium(IV) oxide Inorganic materials O=[Cr]=O AYTAKQFHWFYBMA-UHFFFAOYSA-N 0.000 claims description 4
- 238000003618 dip coating Methods 0.000 claims description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 4
- 239000010970 precious metal Substances 0.000 claims description 4
- 229910000077 silane Inorganic materials 0.000 claims description 4
- 238000004528 spin coating Methods 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 3
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- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 3
- 229910052729 chemical element Inorganic materials 0.000 claims description 3
- 229910000423 chromium oxide Inorganic materials 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229940119177 germanium dioxide Drugs 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 3
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052753 mercury Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 239000010955 niobium Substances 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052762 osmium Inorganic materials 0.000 claims description 3
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 238000007750 plasma spraying Methods 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052702 rhenium Inorganic materials 0.000 claims description 3
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 239000010948 rhodium Substances 0.000 claims description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052706 scandium Inorganic materials 0.000 claims description 3
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052716 thallium Inorganic materials 0.000 claims description 3
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 239000002966 varnish Substances 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910005793 GeO 2 Inorganic materials 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 2
- 239000000853 adhesive Substances 0.000 claims description 2
- 230000001070 adhesive effect Effects 0.000 claims description 2
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 2
- 239000012780 transparent material Substances 0.000 claims description 2
- 239000008398 formation water Substances 0.000 claims 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 238000007654 immersion Methods 0.000 abstract description 3
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- 230000006872 improvement Effects 0.000 description 11
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- 239000007767 bonding agent Substances 0.000 description 9
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- 238000005259 measurement Methods 0.000 description 8
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- 229910001634 calcium fluoride Inorganic materials 0.000 description 3
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- 239000011521 glass Substances 0.000 description 3
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- 150000004706 metal oxides Chemical class 0.000 description 3
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- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 2
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- 230000007774 longterm Effects 0.000 description 2
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- 239000011358 absorbing material Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention relates to an optical device for immersion lithography, comprising: at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to ultraviolet radiation during operation of the projection lens, and the at least one component (1) being at least partially wetted by an immersion liquid during operation of the projection lens. The hydrophobic coating (6, 7) comprises at least one uv-resistant layer (6) which absorbs and/or reflects uv radiation having a wavelength of less than 260 nm.
Description
The application is the dividing an application that be on September 12nd, 2007 and denomination of invention the applying date for the one Chinese patent application No.200780033939.6 of " being used for the optical devices with hydrophobic coating of immersion lithography and the apparatus for projection exposure that comprises this device ".
The cross reference of related application
According to 35 U.S.C.119 (e) (1), the application asks for protection the 60/877th, No. 743 U.S. Provisional Application of submitting on Dec 29th, 2006.The 60/877th, No. 743 disclosed content of submitting on Dec 29th, 2006 of U.S. Provisional Application incorporated the application into and reached the part as the application's disclosure as a reference.According to 35 U.S.C.119 (a), the application also asks to enjoy the right of priority in the 10 2,006 062 No. 480.7 German patent application of submission on Dec 28th, 2006, incorporates its disclosed full content into the application as a reference.According to 35 U.S.C.199 (a), the application also asks to enjoy the right of priority in the 10 2,006 043 No. 548.6 German patent application of submission on September 12nd, 2006, incorporates its disclosed full content into the application as a reference.
Technical field
The present invention relates to be used for the optical devices of immersion lithography; It comprises: at least one has applied the assembly of hydrophobic coating; This hydrophobic coating is exposed to UV radiation during operation projection lens, this at least one assembly is impregnated at least in part liquid wetting during operation projection lens.The invention further relates to the apparatus for projection exposure that comprises these optical devices.
Background technology
Generally speaking, use liquid, water-wet optical module particularly, this has negative effect to its optical characteristics.For example, wetting meeting causes forming in its surface the polluter such as salt.In order to prevent optical element, perhaps, be known as optical element hydrophobic coating is provided in order to remove water fast from this optical element by water-wet.In the application's category, term " hydrophobic coating " refers to its surface like generalized case and comprises that the contact angle with water is 90 ° or bigger coating.
JP 2003-161806 A has described a kind of optical element with ARC, wherein in the uncoated area of substrate of glass, forms water barrier.In this device, water-proof coating forms near ARC, perhaps on the rim of the side of substrate of glass, forms.In this way, can avoid moisture to reside in the space between optical element and the related support structure.
US 5,494, and 712 have described a kind of being used for is applied to substrate to reduce it by the method for water-wet with polymeric layer.This layer preferably comprises one or more organo-silicon compound, for example silane or siloxane, and the chemical vapor deposition (PECVD) that strengthens by plasma applies.
Wetting problem is at microlithography, and is particularly significantly same in the immersion lithography.In microlithography, the purpose from making semiconductor subassembly is being plotted in the structure on the mask in the sensitization substrate on the scale of dwindling by projection lens.For the high resolving power that realizes that this application is required, use in the uv wavelength range general lighting radiation below 250nm.In order further to improve the resolution and the depth of field, in immersion lithography, between the last optical element of projection lens and sensitization substrate, maceration extract is set, distilled water normally is with the raising refractive index.In this device, the last optical element of projection lens is at least in part by water-wet, thereby in immersion lithography, uses waterproof and anti-water coating more continually.
JP 2005-268759A discloses a kind of optical module, and it is arranged on the apparatus for projection exposure that is used for immersion lithography, and at least one surface is exposed to lighting radiation.This surface comprises by silicon dioxide (SiO
2), magnesium fluoride (MgF
2) or calcium fluoride (CaF
2) bonding coat processed, be applied with the water barrier that comprises amorphous fluoropolymer on it.
JP 11-149812 has described a kind of optical element, and the fish tail and waterproof layer that wherein will preferably comprise fluorocarbon polymer is applied to the multilayer system of reflection enhancement or hyporeflexia, thereby provides protection to get into from surrounding air to prevent moisture.The thickness of this protective seam is 1nm to 10nm, in case blocking fluorine compounds polymer at wavelengths is less than the taken in excess of the radiation of 250nm.
EP 0 895 113 A2 have described and have a kind ofly comprised bracing or strutting arrangement and by the assembly parts of the bonding assembly of bonding agent, the radiation in this assembly ultraviolet transmissive spectral range.This bonding agent can pass through ultraviolet light polymerization; And between transparent components and bonding agent; In the zone of bonding agent, apply one deck thin layer; This thin layer transmission is suitable for the interior light of spectral range of cure adhesive, and its high reflection or absorption come comfortable ultraviolet light by the useful spectral range in the spectral range of transparent components transmission, thereby the protection bonding agent does not receive the interior UV radiation of this wavelength coverage.
US 2006/0240365 discloses a kind of method that is used to protect the water sensitivity lens element.In the method, produce the uv-resistant layer of UV radiation absorbing at the fringe region of lens surface, this layer is made up of metal oxide.Another protective seam is applied to metal oxide layer, and this another layer for example can be a layer of polyurethane.This is two-layer, and be used to protect for example can be by the not impregnated liquid dissolving of the lens element that water sensitivity calcium fluoride is formed.
Yet as stated, hydrophobic coating not only can be used for the purpose that prevents that optical surface is wetting.But also can hydrophobic coating be applied to can't avoid by the position of water-wet on the assembly, thereby for example make the water column (meniscal water column) that is essentially falcate.For example before using these lens, the projection lens that is used for microlithography is being carried out under the situation of interferometry aspect its optical imagery characteristic and any image error, it can be favourable applying this coating.For this measurement, projection lens is arranged at corresponding measuring equipment top, and maceration extract is placed between this measuring equipment and the projection lens, thereby can measure under the empirical condition in practical application.In most of the cases ultrapure water has the ring that prevents that this ultrapure water from flowing away as maceration extract around the optical module of this measuring equipment.This ring must have hydrophobic surface making convexity, and therefore forms the water meniscus that is bent upwards.Importantly, guarantee reliably to contact with the perfection towards the last optical module of measuring equipment of lens always.
In dipping systems, use the general considerations of hydrophobic coating to comprise: the UV radiation that during operation projection lens, is radiated on this coating possibly damage or damage this coating.In addition, because UV radiation, the hydrophobic characteristics of this coating possibly degenerated, and therefore this coating can produce hydrophilic characteristics under extreme case.Particularly, practical application shows that the material that in the structure of the ring with hydrophobic surface, uses is at present changing aspect its character of surface after the short time, and along with the prolongation of radiation duration, its hydrophobic characteristics reduces.This relates in particular to and uses shorter and shorter wavelength, for example 193nm and more short wavelength's laser emission.This means after short-term operation, the water meniscus of stable convexity can't be provided, so the immersion post between lens and the measuring equipment is damaged, measure and have to interrupt.
Summary of the invention
The objective of the invention is, have the assembly that under intensive and lasting UV radiation, still keeps the hydrophobic coating of its hydrophobic characteristics even in said introduction, mention providing in the optical devices of type.
This purpose is to realize less than the hydrophobic coating of the uv-resistant layer of the UV radiation of 260nm through comprising at least one absorption and/or reflection wavelength.In this device, hydrophobic coating for example can only comprise extra single uvioresistant absorption and/or reflection horizon with hydrophobic characteristics, and perhaps this uvioresistant absorption and/or reflection horizon can protect another hydrophobic coating to avoid the UV radiation of projection lens.
In an advantageous embodiment, this assembly is the optical element of being processed by material transparent on the wavelength in the ultraviolet range, and this optical element is preferably formed the end component of projection lens.In the case; The impregnated liquid of this optical element is wetting in the subregion at least; Hydrophobic coating generally is applied on the surface of the optical element beyond this subregion in this device; Other parts to prevent optical element are wetted, common and this wetting subregion direct neighbor of this part, and this part does not immerse in the maceration extract.
In a preferred improvement project, hydrophobic coating is formed at outside the optical clarity diameter of optical element." the optical clarity diameter " of term optical element refers to the zone that radiation is passed through with mode targetedly, promptly for example with regard to lens, helps the zone of forming images.Particularly, the optical clarity diameter can be confirmed through the zone of polishing by lens surface, and the zone beyond this diameter has without polishing, lacklustre, therefore coarse surface.Generally speaking, the end component that corresponds essentially to projection lens of the zone in the optical clarity diameter immerses the zone in the maceration extract.
Inventor of the present invention recognizes that any wetting of optical element beyond the optical clarity diameter all can have negative effect to its optical characteristics, the low temperature that the promptly wetting evaporation that causes causes.Therefore, in wetting zones, dispel the heat, this can have a negative impact to temperature balance of optical element, and for example can cause the image error of non-expectation under as the situation of optical element at lens.This problem especially is present on the lacklustre surface, promptly particularly beyond the optical clarity diameter, because liquid that can not is as also flowing away from lacklustre surface through polished surface is the same.
In addition, inventor of the present invention recognizes that also even beyond clear optical diameter, hydrophobic coating also can be owing to UV radiation be damaged, promptly because when operation projection lens, in optical element, produce scattered light; This is that hydrophobic coating comprises the reason of one deck uv-resistant layer at least.In this device, hydrophobic coating can only comprise individual layer uvioresistant hydrophobic layer, perhaps preferably by means of the uv-resistant layer of absorbing ultraviolet light, can protect another hydrophobic layer to avoid the UV radiation from optical element inside.
In a favourable improvement project, the coating of hyporeflexia is applied to optical element, wherein hydrophobic coating is arranged in the uncoated zone of optical element, preferably approaches this hyporeflexia coating.Generally speaking, ARC is applied in the scope of clear optical diameter of lens at least; This ARC comprises several layers usually, and wherein the material of high index of refraction and low-refraction alternately.In the applicant's PCT/EP2006/005630, described the preferred examples of ARC, incorporated its disclosed content into the application and reach a part as a reference as the application.
In a preferred especially improvement project, hydrophobic layer puts on the uv-resistant layer top.As stated, the layer protection hydrophobic layer of uvioresistant and UV radiation absorbing receives UV radiation.Can prevent hydrophobic layer degeneration (relating to contact angle, coating stickability and leaching characteristic) in this way with water.
In a favourable improvement project, the material of hydrophobic layer is selected from following group: chromium dioxide (CrO
2), silane, siloxane, DLC, fluoride, hydrophobicity varnish and bonding agent, polymkeric substance, preferred fluorocarbon polymer, particularly Optron, WR1 and Teflon AF.Optron is a kind of coating that Merck makes; Teflon AF is sold by Cytop.This siloxane can pass through ultraviolet light polymerization, and perhaps they can heat curing (for example Ormocer), and perhaps they can apply by the CVD method.When they are exposed to the following time of ultraviolet light of radiation intensity general in microlithography, above-mentioned material all is not steady in a long-term, at least when this hydrophobic layer is used for containing the air atmosphere of oxygen.In the application's category, term " long-term stability " refers to and was generally 7 years or the shorter life-span.In addition, in multiple above-mentioned material, substrate stickability and hydrophobic characteristics can be hindered through being exposed to ultraviolet light.Yet, can be through inert gas atmosphere be provided, N for example
2, rare gas or its potpourri and improve the long-time stability of these materials.Other materials that are suitable for hydrophobic layer comprise fluororesin, fluoro resin material, like teflon, and acrylic materials or silicone material.CYTOP (by ASAHI GLASS manufactured) can be used as water barrier equally.
In another preferred improvement project, transparent material is selected from following group: calcium fluoride (CaF
2), quartz glass (SiO
2) and germanium dioxide (GeO
2).Especially, calcium fluoride and quartz glass are the exemplary lens materials that in microlithography, uses.
In an improvement project, uv-resistant layer is that 900nm or bigger radiation are transparent to wavelength.Therefore, can pass through under the wavelength that uv-resistant layer must be shone in the method chain, be 940nm for laser bonding for example promptly, is more than the 1 μ m for high temperature measurement perhaps.
In a preferred improvement project, this optical element is designed to plano-convex lens, and wherein plane surface comprises conical lenticular unit.The optical element that is shaped in this way is preferably used as the end component of the projection lens that is used for immersion lithography.
In another preferred embodiment, hydrophobic coating is arranged on the conical lateral surface of conical lenticular unit and/or on the plane surface.Because conical lenticular unit contacts with maceration extract at least in part, particularly under the situation of conical lateral surface, there is the danger of the impregnated liquid wetting of this conical lateral surface, wherein wettingly can extend to plane surface by this position.By hydrophobic coating, can prevent that wetting optical element reaches the temperature that reduces optical element thus in this zone.In addition or alternatively, hydrophobic coating also can put on the fringe region of lens, for example side surface links to each other with stilt at these fringe region lens: can prevent that in this way sealing gets into the gap between lens and the base.
In another favourable improvement project, the positive at least of the conical lenticular unit of optical element immerses in the maceration extract, so the numerical aperture of projection lens becomes possibility with therefore being imaged under the high resolving power of minimal structure, and has the big depth of field.
In a highly preferred embodiment of the present invention; Optical devices comprise the optical measuring device of the optical characteristics that is used to measure projection lens; Wherein between projection lens and optical measuring device, maceration extract is set, in the zone of maceration extract, is provided for forming the assembly that comprises hydrophobic coating of the water column that is essentially falcate.As stated, this hydrophobic coating is not used in and prevents this assembly by water-wet in the case, but is used to produce the protruding water meniscus that is bent upwards.These optical devices that comprise measuring equipment needn't form the part of apparatus for projection exposure, but can be as the independent measuring apparatus of the optical property that in the manufacture process of different apparatus for projection exposure, is used to characterize projection lens.
In one of this embodiment favourable improvement project, this assembly that comprises hydrophobic coating forms the part of the outer cover of this measuring equipment, or the assembly of this measuring equipment, and this assembly is connected with this measuring equipment, and maceration extract is positioned at this assembly top.
In another favourable improvement project, this assembly that comprises hydrophobic coating comprises the encirclement ring that is used to limit maceration extract and flows away to prevent maceration extract.
In another favourable improvement project, this assembly that comprises hydrophobic coating is processed by noble metal.Certainly, other materials also can be used for this.
If lens to be measured lens in for example being to use wherein are provided with wafer below lens, then this assembly to be coated also can be processed by Zerodur, quartz or the analog material that is used for apparatus for projection exposure.
In a preferred embodiment, with water, ultrapure water particularly is as maceration extract.Except making water, also can use other maceration extracts, for example oil.
Even during these lens of operation, must carry out energy measurement, transmissivity measurement etc. once in a while, so be provided with various measuring equipments around the wafer.In this device, also need between the last optical element of lens and measuring equipment, having closely, liquid contacts.Therefore in this device, the assembly of guaranteeing to form protruding water meniscus also need be provided, even still be retained in original position during the intense radiation under the empirical condition of this water meniscus in practical application.
In another preferred embodiment, uv-resistant layer to wavelength less than 260nm, preferably the UV radiation less than 200nm can not pass through.Generally speaking, because available light source, the wavelength that is used for the UV radiation of immersion exposure sources is 248nm or 193nm.Therefore, the absorption limit of uv-resistant layer is greater than the operation wavelength of exposure device, thereby on this layer top, applies incomplete uvioresistant hydrophobic layer, and it can be protected from radiation.In addition; When being in application to optical element; This layer that can not pass through also provides the protection to UV radiation during the what is called " ultraviolet burning " of relative lens surface, in this cleaning method, this lens surface is implemented strong UV radiation to remove any impurity that is adsorbed.At the method chain that is used for providing optical element, the ultraviolet burning is arranged in a plurality of coatings, measurement and the installation steps.Because hydrophobic layer is provided, can be in the method chain very early time point apply this absorption layer.
Uv-resistant layer preferably comprises the material that is selected from following group: titania (TiO
2), tantalum pentoxide (Ta
2O
5), hafnium oxide (HfO
2), zirconium dioxide (ZrO
2) and titanium-Zr mixed oxide, it can be particularly advantageous for being coated with the assembly that comprises quartz glass, calcium fluoride or germanium dioxide.Especially, TiO
2And Ta
2O
5Be suitable as the material of uv-resistant layer; Because they have high-absorbable at the wavelength less than 280nm; Even demonstrate the hydrophobic characteristics that is superior to quartz glass at least, thereby the damage of the part of the hydrophobic layer that on its top, applies can not produce too adverse influence to the optical characteristics of optical element.If need, then hydrophobic coating also can comprise the layer of one of above-mentioned material separately.In addition, above-mentioned material can be used as the bonding agent of hydrophobic coating, promptly compares with the substrate of assembly, and this hydrophobic layer is bonding with these materials better.Being suitable for other metal oxides that having of uv-resistant layer be not less than 1 optical density for example is SiO or Cr
2O
3The potpourri that should be appreciated that above-mentioned material also can be used for forming uv-resistant layer.
In another preferred embodiment, uv-resistant layer records the thickness of 200nm at least.Under the situation of this thickness,, can guarantee that UV radiation does not penetrate absorption layer through most absorbing material.Yet, leaving in order to prevent this pull-up, the thickness of this absorption layer should be inexcessive.At Ta
2O
5And TiO
2Under the situation as layer material, should not surpass the maximum layer thickness of 1 μ m.
In another advantageous embodiment, uv-resistant layer is a layer of precious metal.
A large amount of tests show that noble coatings for example comprises gold, iridium, palladium, platinum, mercury, osmium, rhenium, rhodium, ruthenium, silver, cobalt, copper or their alloy, though extend and intensive irradiation after still keep its hydrophobic surface characteristic.
The alternative plan that has the hydrophobic coating of very high resistance equally comprises the metal level that uses III to the VII family in the chemical element periodic system, for example chromium, molybdenum, tungsten, vanadium, niobium, tantalum, titanium, zirconium, hafnium, scandium, yttrium, manganese, thallium and their alloy.Should be appreciated that also can use and have other metals that are not less than 1 optical density, for example silicon (Si).
When using according to noble metal of the present invention or metal level, proved under condition based on the aggravation of short-wave laser radiation, there is not the pollution of the maceration extract that causes by the material that comes from coating.
In practical application, comprise the coating that chromium oxide is also referred to as black chromium and be proved to be specially suitable.Black chromium is the compound that comprises chromium dioxide and crome metal, and it demonstrates permanance to microlithography applications enough UV radiation following times being exposed to, particularly when coating is arranged in the maceration extract.
In addition, the layer thickness of uvioresistant noble metal or metal level is 10 to 200nm, is preferably 15 to 100nm, has been proved to be particularly advantageous.
Preferably; Uv-resistant layer and/or hydrophobic layer apply through the method that is selected from following group: sputter, PVD (physical vapour deposition (PVD)), CVD (chemical vapor deposition), PECVD (chemical vapor deposition that plasma strengthens), cold air spraying, spin coating, plasma spraying, dip-coating and hardened coating, particularly use brush or sponge to apply.Sputter is also referred to as cathodic sputtering, is the method that is used for sedimentary deposit, can realize having layer to be applied high-quality of extremely thin layer thickness through this method.Three kinds of methods mentioning subsequently relate on the surface to be coated through the technology at the bottom of the vapour deposition coated base.Under the situation of cold air spraying, coating material is applied on the base material with powder type with very high speed.Under the situation of spin coating, thin and uniform layer is coated or is rotated in the substrate of rotation.Under the situation of plasma spray coating, powder is added plasma jet, this powder is owing to high plasma temperature melts, and along with plasma jet is injected on the workpiece to be coated.Dip-coating can apply coating equably.At last, use brush or sponge to apply the selection that hardened coating is provided.
The present invention further implements at the apparatus for projection exposure that is used for immersion lithography, and it comprises: illuminator, projection lens and aforesaid optical devices.These optical devices can comprise optical element as the end component with projection lens of hydrophobic coating, and/or it can comprise the assembly that comprises hydrophobic coating that is used to make the water column that is falcate basically.
Other features and advantages of the present invention are in the explanation of following exemplary embodiment of the present invention, in the accompanying drawing of the material particular in showing content of the present invention and in claim, set forth.In the scheme of a change of the present invention, independent characteristic can itself be implemented individually, and perhaps a plurality of modes with combination are implemented.
Description of drawings
Exemplary embodiment is shown in the accompanying drawing, and in following description, explains.
Fig. 1 a, b are depicted as the synoptic diagram of the optical element with hydrophobic coating, (a) skeleton view, (b) sectional view;
The synoptic diagram of embodiment for the apparatus for projection exposure that is used for microlithography shown in Figure 2, it comprises a according to Fig. 1, and the optical element of b is as the end component of projection lens; And
The synoptic diagram of embodiment for the optical devices that are used to measure projection lens shown in Figure 3.
Embodiment
Fig. 1 a, b illustrate and comprise quartz glass (SiO
2) optical element 1 be designed to plano-convex lens, and on plane surface 2, comprise the conical lenticular unit 3 of truncated cone shape.This taper shape lenticular unit 3 comprises two subregions with different aperture angles, and comprises the surface 4 that has applied ARC 9 (being shown in Fig. 1 b) on it, prevents that so that protection to be provided it can comprise for example by SiO by the water degraded
2Or Teflon processes the superiors of (not shown), is called cap rock.In addition,, then also can form hydrophobic coating on this ARC, wherein must select in the case simultaneously to the transparent uvioresistant coating of the UV radiation of operation wavelength if need.During operation, only have the part UV radiation to be used for promoting imaging, this part gets into through surface 4, thereby makes the diameter on this surface 4 roughly confirm clear optical diameter.Should be appreciated that when particularly in immersion lithography, using optical element 1, can not have ARC 9.
On the conical lateral surface 5 of conical lenticular unit 3, approach ARC and apply hydrophobic coating 6,7 (being shown in Fig. 1 b), it further extends on planar lens surface 2, and comprises TiO
2The ground floor of processing 6, this ground floor uvioresistant and absorbing wavelength are less than the ultraviolet light of 280nm.Alternatively, ground floor 6 also can comprise other materials, for example Ta
2O
5, HfO
2, ZrO
2Or comprise the mixed oxide of titanium-zirconium.Except shown in the zone, lens also can comprise hydrophobic coating on rims of the lens, for example on cylindrical side.Can prevent that in this way sealing gets into the gap between lens and the base, this gap produces when optical element 1 is installed.
The hydrophobicity second layer 7 is applied on the ground floor 6, and this second layer 7 comprises fluorocarbon polymer, is Optron in the case.Therefore the not anti-anti-ultraviolet radiation of the second layer 7 can be damaged through the side surface 5 of conical lenticular unit 3 or through the scattered light that plane surface 4 gets into.In order to protect the second layer 7 to avoid scattered light, ground floor 6 comprises the thickness above 200nm, is enough to make it not pass through ultraviolet light.The second layer 7 also can be processed by the not uvioresistant other materials of hydrophobicity, for example is selected from chromium dioxide (CrO
2), silane, siloxane, polymkeric substance, fluoropolymer polymer, like WR1 or Teflon AF, DLC, fluoride or hydrophobicity varnish or bonding agent.Therefore ground floor 6 extra bonding agents as the second layer 7 have the crystalline network that can compare with the second layer 7.
In the method chain that is used for preparing the optical element 1 that is installed in optical device, apply hydrophobic coating 6,7 in early days.In the method, the second layer 7 receives ground floor 6 protections, avoids the UV radiation of scioptics, and this UV radiation uses during the ultraviolet burning of convex lens surface 8, for example in the follow-up application step of this method chain.TiO
2 Ground floor 6 be transparent more than 900nm, thereby also can carry out the step in this method chain, optical element 1 need be by the radiation transillumination, for example during laser bonding in these steps.
Second comprises (layer thickness provides) with other suitable combinations of the layer material of ground floor 7,6 in bracket: fluororesin (1.0 μ m)/Si (200nm), fluororesin (1.0 μ m)/Ta (200nm), fluororesin (0.5 μ m)/Cr
2O
3(50nm)/Cr (150nm), fluororesin (0.5 μ m)/W (100nm)/Cr (1.00nm) etc.In any of these combination, can provide to be not less than 1 optical density.
Adopt the coating of CVD technology to have the optical element 1 of hydrophobic coating 6,7.Should be appreciated that alternatively, also can adopt other coating techniques, for example PVD, PECVD, cold air spraying, spin coating, plasma spraying, dip-coating and hardened coating particularly use brush or sponge to apply.
In addition, comprise except use beyond the coating 6,7 of the ground floor 6 and the second layer 7, also can use to have more or less layer coating.If need, then can apply surpass two-layer, can be between first and second layer 6,7, and/or between surface 5,2 and ground floor 6, another functional layer is provided respectively.This functional layer can be a protective seam, is used to improve the layer of the tight contact performance between the ground floor 6 and the second layer 7, or is used for the layer of enhance mechanical strength.Yet, only apply individual layer uvioresistant material, for example TiO
2Or Ta
2O
5, also be enough, therefore have better hydrophobic characteristics because these materials are compared with quartz glass, and provide to a certain extent and prevent wetting protection.
Especially; This coating can also be the uv-resistant layer of being processed by noble metal; For example gold, iridium, palladium, platinum, mercury, osmium, rhenium, rhodium, ruthenium, silver, cobalt, copper and their alloy; Perhaps be selected from the metal of III to the VII family in the chemical element periodic system, for example chromium, molybdenum, tungsten, vanadium, niobium, tantalum, titanium, zirconium, hafnium, scandium, yttrium, manganese, thallium and their alloy.Verified, the anti-especially anti-ultraviolet radiation of these materials, and they can not pollute maceration extract through the material that is derived from this coating.In this device, can use the coating that only comprises single this layer, promptly wherein hydrophobic layer is avoided the coating of UV radiation through metal level or layer of precious metal protection.Should be appreciated that as stated in order to improve cohesive, this coating also can comprise the metal of several layers noble metal or III to the VII main group.
The function of optical element 1 is described in the content of the exposing operation of the apparatus for projection exposure 10 that is used for microlithography simply, and is as shown in Figure 2, with the form of the wafer scanner that is used to make the high-integrated semiconductor element.
Apparatus for projection exposure 10 comprises the PRK 11 of the operation wavelength with 193nm as light source, wherein also can adopt other operation wavelengths, for example 248nm.The illuminator 12 that is arranged on downstream forms big field of view clear qualification, that illuminate very equably at its pelvic outlet plane, meets the telecentric iris requirement of the projection lens 13 that is arranged on downstream.
This plane 15 is also referred to as the mask plane, is following projection lens 13 at the back at it, its ratio to dwindle, the ratio of 4: 1 or 5: 1 or 10: 1 for example, with the image imaging of photo mask to the wafer that has applied photoresist layer 17.Wafer 17 as photosensitive substrate is set, makes plane 18 overlap basically with the plane of delineation 19 of projection lens 13 with photoresist layer.This wafer 17 supports through the equipment 20 that comprises scanner driver so that wafer 17 moves with respect to the photo mask simultaneously and with this photo mask antiparallel.This equipment 20 also comprises controller, and is so that wafer 17 not only moves on the z of the optical axis that is parallel to projection lens 13 21 direction, also mobile on x and y direction perpendicular to this.
Be to be understood that; Not only can give the optical element hydrophobic coating and avoid wetting beyond the clear optical diameter, also can give assembly a kind of coating, wherein between hydrophobic coating and maceration extract, deliberately form and forever contact to protect this element; Promptly in optical devices shown in Figure 3; In little space, be provided for the projection lens 102 of semiconductor lithography through measuring equipment 101, this projection lens 102 must measure, and is used for dipping systems.Short spacing above the optical element 103 of the last setting of the direction of propagation of the radiation through projection lens 102 is positioned at this measuring equipment 101.
Among this measuring equipment 101 or on exist grid 104 as optical module, it is used for interferometry.Around grid 104, ring-shaped component 105 is set.At least in the inboard towards grid 104, this ring comprises hydrophobic coating 108.This hydrophobic coating is layer of precious metal or the metal level that is applied to the surface of this ring by sputter.In the exemplary embodiment, chromium oxide is as the hydrophobic metals coating.Proved that in practical application this material has very high resistance for the irradiation along the ultraviolet light of the direction of arrow 106, and kept its hydrophobic characteristics.In practical application, there are not the maceration extract of the intermediate space between evidence proof last optical element 103 of complete filling and the measuring equipment 101 such as the pollution of ultrapure water 107.
Mode measurement of Lens that for example can discontinuous measurement, wherein maceration extract is positioned at this intermediate space.After the falcate post formed, the latter correspondingly kept stability number hour, can carry out required measurement.If use ultrapure water, then preferred operation under atmospheric pressure under 20 ℃ water temperature.
Yet, also alternative discontinuous method, the flow velocity with for example several mm/min passes through this intermediate space pumps water continuously.In the case, also form stable falcate post.
Generally speaking, during measuring, be about 2 to 4mm, be preferably 3mm with the operating distance of measuring equipment 101.
Except the hydrophobic coating of inside of ring as the assembly 105; Perhaps except above-mentioned situation; Hydrophobic coating also can be arranged on the top of outer cover of measuring equipment 101; This top surface perhaps is arranged on grid 104 plate on every side to projection lens 102, and this plate is positioned on the top of this measuring equipment 101.
In addition, for example can use measuring equipment as shown in Figure 3 or measurement mechanism in the apparatus for projection exposure as shown in Figure 2.In the case, the last optical element 1 of projection lens 13 and the space water between the measuring equipment 101 are filled in the apparatus for projection exposure 10 of Fig. 2, and use jointly with the aforesaid assembly 105 that comprises hydrophobic coating, to form the falcate water column.In the case, form the optical devices that optical element wherein 1 and assembly 105 comprise uvioresistant hydrophobic layer 6,7 and 108 respectively.
Provide foregoing description by way of example to preferred embodiment.By disclosed content, those skilled in the art not only are to be understood that the present invention and the advantage of enclosing thereof, and also should find tangible various changes and modification to disclosed structure and method.Therefore, the applicant asks to cover all such changes and modifications, because they fall into as within claim and the spirit and scope of the present invention that equivalent limited thereof.
Claims (27)
1. be used for the optical devices of immersion lithography, it comprises:
Applied hydrophobic coating (6,7; 108) at least one assembly (1,105), this hydrophobic coating (6,7; 108) during operation projection lens (13,102), be exposed to UV radiation,
This at least one assembly (1,105) impregnated at least in part liquid (22,107) during operation projection lens (13,102) is wetting, it is characterized in that,
This hydrophobic coating (6,7; 108) comprise one deck absorption at least and/or reflection wavelength uv-resistant layer (6,108) less than the UV radiation of 260nm.
2. according to the optical devices of claim 1, the optical element (1) that wherein said assembly is served as reasons and processed for material transparent under the wavelength in ultraviolet range, this optical element (1) is preferably formed the end component of projection lens (13,102).
3. according to the optical devices of claim 2, wherein said hydrophobic coating (6,7) is formed at beyond the optical clarity diameter of said optical element (1).
4. according to the optical devices of claim 2 or 3, wherein hyporeflexia coating (9) is applied to said optical element (1), said hydrophobic coating (6,7) is arranged in the uncoated area of said optical element (1), preferably approaches said hyporeflexia coating (9).
5. according to the described optical devices of one of claim 2 to 4, wherein on the top of said uv-resistant layer (6), apply said hydrophobic layer (7).
6. according to the optical devices of claim 5, the material of wherein said hydrophobic layer (7) is selected from following group: chromium dioxide (CrO
2), silane, siloxane, DLC, fluoride, hydrophobicity varnish and hydrophobic adhesive, polymkeric substance, be preferably fluorocarbon polymer, particularly Optron, WR1 and Teflon AF.
7. according to the described optical devices of one of claim 2 to 6, wherein said transparent material is selected from following group: calcium fluoride (CaF
2), quartz glass (SiO
2) and germanium dioxide (GeO
2).
8. according to the described optical devices of one of claim 2 to 7, wherein said uv-resistant layer (6) is transparent for the radiation of 900nm or bigger wavelength.
9. according to the described optical devices of one of claim 2 to 8, wherein said optical element (1) is designed to plano-convex lens, and plane surface (2) comprises conical lenticular unit (3).
10. according to the optical devices of claim 9, wherein said hydrophobic coating (6,7) is arranged on the conical lateral surface (5) and/or said plane surface (2) of said conical lenticular unit (3).
11. according to the optical devices of claim 9 or 10, positive (4) at least of the conical lenticular unit (3) of wherein said optical element (1) are immersed in the said maceration extract (22).
12. according to the described optical devices of one of aforementioned claim; It further comprises the optical measuring apparatus (101) of the optical characteristics that is used to measure said projection lens (102); Between said projection lens (102) and said optical measuring apparatus (101), be provided with maceration extract (107), and in the zone of said maceration extract (107), the assembly (105) that comprises said hydrophobic coating (108) is essentially falcate with formation water column be set.
13. optical devices according to claim 12; The wherein said assembly (105) that comprises hydrophobic coating (108) forms the part of the outer cover of said measuring equipment (101); Or the assembly (105) of said measuring equipment (101); This assembly (105) is connected to said measuring equipment (101), and said maceration extract (107) is positioned at this assembly (105) top.
14. according to the optical devices of claim 12 or 13, the wherein said assembly (105) that comprises hydrophobic coating comprises the encirclement ring that is used to limit said maceration extract (107).
15. according to the described optical devices of one of claim 12 to 14, the wherein said assembly (105) that comprises hydrophobic coating (108) is processed by noble metal.
16. according to the described optical devices of one of aforementioned claim, wherein with water, particularly ultrapure water is as said maceration extract (22,107).
17. according to the described optical devices of one of aforementioned claim, less than 260nm, preferably the UV radiation less than 200nm can not pass through wherein said uv-resistant layer (6,108) to wavelength.
18. according to the described optical devices of one of aforementioned claim, wherein said uv-resistant layer (6) comprises the material that is selected from following group: titania (TiO
2), tantalum pentoxide (Ta
2O
5), hafnium oxide (HfO
2), zirconium dioxide (ZrO
2) and titanium-Zr mixed oxide.
19. according to the described optical devices of one of aforementioned claim, the thickness of wherein said uv-resistant layer (6) is at least 200nm.
20. according to the described optical devices of one of aforementioned claim, wherein said uv-resistant layer (6,108) is a layer of precious metal.
21. according to the optical devices of claim 20, wherein said uv-resistant layer (6,108) comprises the material that is selected from following group: gold, iridium, palladium, platinum, mercury, osmium, rhenium, rhodium, ruthenium, silver, cobalt, copper and their alloy.
22. according to the described optical devices of one of aforementioned claim, wherein said uv-resistant layer (6,108) is the metal level of III to the VII family in the chemical element periodic system.
23. according to the optical devices of claim 22, wherein said uv-resistant layer (6,108) comprises the material that is selected from following group: chromium, molybdenum, tungsten, vanadium, niobium, tantalum, titanium, zirconium, hafnium, scandium, yttrium, manganese, thallium and their alloy.
24. according to the optical devices of claim 23, wherein said uv-resistant layer (6,108) comprises chromium oxide.
25. according to the described optical devices of one of claim 20 to 24, the coating thickness of wherein said uv-resistant layer (6,108) is 10 to 200nm, is preferably 15 to 100nm.
26. according to the described optical devices of one of aforementioned claim; Wherein said uv-resistant layer (6) and/or said hydrophobic layer (7) apply through the method that is selected from following group: sputter, PVD, CVD, PECVD, cold air spraying, spin coating, plasma spraying, dip-coating and hardened coating, particularly use brush or sponge to apply.
27. be used for the apparatus for projection exposure (10) of immersion lithography, it comprises:
Illuminator (12),
Projection lens (13,102), and
According to the described optical devices of one of aforementioned claim.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006043548.6 | 2006-09-12 | ||
| DE200610043548 DE102006043548B4 (en) | 2006-09-12 | 2006-09-12 | Optical measuring device |
| DE102006062480A DE102006062480A1 (en) | 2006-12-28 | 2006-12-28 | Optical arrangement for use in projection exposure apparatus used for immersion lithography has hydrophobic coating comprising ultraviolet (UV) resistant layer that absorbs and reflects UV radiation at predetermined wavelength |
| DE102006062480.7 | 2006-12-28 | ||
| US87774306P | 2006-12-29 | 2006-12-29 | |
| US60/877,743 | 2006-12-29 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007800339396A Division CN101535899B (en) | 2006-09-12 | 2007-09-12 | Optical arrangement for immersion lithography with a hydrophobic coating and projection exposure apparatus comprising the same |
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|---|---|
| CN102540766A true CN102540766A (en) | 2012-07-04 |
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| CN1717776A (en) * | 2002-12-10 | 2006-01-04 | 株式会社尼康 | Optical device and projection exposure apparatus using such optical device |
| EP1670038A1 (en) * | 2003-08-26 | 2006-06-14 | Nikon Corporation | Optical element and exposure device |
| EP1510871A2 (en) * | 2003-08-29 | 2005-03-02 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN1591197A (en) * | 2003-08-29 | 2005-03-09 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
| US20050100745A1 (en) * | 2003-11-06 | 2005-05-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Anti-corrosion layer on objective lens for liquid immersion lithography applications |
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Application publication date: 20120704 |