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CN102522402A - On-chip transformer structure of novel substrate shielding layer - Google Patents

On-chip transformer structure of novel substrate shielding layer Download PDF

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Publication number
CN102522402A
CN102522402A CN2011104419415A CN201110441941A CN102522402A CN 102522402 A CN102522402 A CN 102522402A CN 2011104419415 A CN2011104419415 A CN 2011104419415A CN 201110441941 A CN201110441941 A CN 201110441941A CN 102522402 A CN102522402 A CN 102522402A
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substrate
metal
layer
chip transformer
shielding layer
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文进才
孙玲玲
章南
苏国东
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Hangzhou Electronic Science and Technology University
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Hangzhou Electronic Science and Technology University
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Abstract

The invention relates to an on-chip transformer structure of a novel substrate shielding layer. The structure comprises an on-chip transformer. Multilayer substrate shielding layers are arranged right below the on-chip transformer. The substrate shielding layer is formed by a rectangular metal strip and a plurality of metal gate strips with a same shape. The metal gate strips are vertical to the rectangular metal strip. The metal gate strips are parallelly arranged with an equal interval. By using the on-chip transformer structure of the novel substrate shielding layer of the invention, good substrate isolation can be realized; substrate loss can be reduced and a capacitor function can be realized through the substrate shielding layers.

Description

一种新型衬底屏蔽层的片上变压器结构A Novel On-Chip Transformer Structure with Substrate Shielding Layer

技术领域 technical field

本发明属于微波技术领域,涉及一种新型衬底屏蔽层的片上变压器结构。 The invention belongs to the field of microwave technology, and relates to a novel on-chip transformer structure of a substrate shielding layer.

背景技术 Background technique

近年来,有关将CMOS工艺在射频技术中应用的可能性研究大量增多,尤其是深亚微米的CMOS技术在10GHz以下的某些领域已经能同传统的GaAs微器件一争高下,这无疑推动了CMOS电路的发展。利用CMOS标准工艺实现在一块芯片上的数字、模拟及部分射频部分的集成,不仅可以大大降低制造成本,而且可以实现各种不同的功能。这也迎合了全球通讯市场的迅猛发展中,无线通信系统对减小芯片尺寸,降低制作成本以及缩短研发周期的要求。故而,近年来应用于通信系统中的微波单片集成电路得到了空前的高速发展,而变压器作为RFIC与MMIC中极为重要的无源器件,通常被应用与低噪声放大器、压控振荡器、双平衡混频器、功率放大器等电路中,以此来实现阻抗匹配、差分与单端信号转换,交流耦合及增加带宽等。 In recent years, research on the possibility of applying CMOS technology to radio frequency technology has increased a lot, especially deep submicron CMOS technology has been able to compete with traditional GaAs microdevices in some fields below 10GHz, which undoubtedly promotes development of CMOS circuits. Using CMOS standard technology to realize the integration of digital, analog and some radio frequency parts on one chip can not only greatly reduce the manufacturing cost, but also realize various functions. This also caters to the rapid development of the global communication market, and the wireless communication system requires reducing chip size, reducing production costs and shortening the R&D cycle. Therefore, in recent years, microwave monolithic integrated circuits used in communication systems have achieved unprecedented rapid development, and transformers, as extremely important passive devices in RFICs and MMICs, are usually used in low-noise amplifiers, voltage-controlled oscillators, dual In circuits such as balanced mixers and power amplifiers, impedance matching, differential and single-ended signal conversion, AC coupling and increased bandwidth can be achieved.

与数字集成电路和低频电路不同,射频集成电路广泛使用无源元件。由于受到工艺的限制,集成无源元件的性能远低于分立元件,而且对射频集成电路来说,电路性能在很大程度上受限于无源元件。因此,在工艺允许的情况下,通过尺寸或者版图设计尽可能提高集成无源元件的性能,对于射频集成电路来说具有特别重要的意义。 Unlike digital ICs and low-frequency circuits, RF ICs make extensive use of passive components. Due to the limitations of the process, the performance of integrated passive components is much lower than that of discrete components, and for radio frequency integrated circuits, circuit performance is largely limited by passive components. Therefore, if the process allows, it is particularly important for radio frequency integrated circuits to improve the performance of integrated passive components through size or layout design.

特别是随着近几十年来,数字集成电路的工作电压根据Moore定律不断下降,限制了模拟以及射频电路的工作电压。也有人使用多工作电压系统来缓解这一问题,不过这会增加电路的功耗及复杂程度。因此,为了适应现今的低电压工作环境,基于绕线间磁场耦合工作的片上变压器在片上系统中扮演着越来越重要的角色,而其在射频前端电路中的作用更是不可替代。 Especially in recent decades, the operating voltage of digital integrated circuits has been decreasing according to Moore's law, which limits the operating voltage of analog and radio frequency circuits. Some people also use multiple operating voltage systems to alleviate this problem, but this will increase the power consumption and complexity of the circuit. Therefore, in order to adapt to today's low-voltage working environment, the on-chip transformer based on the magnetic field coupling between windings plays an increasingly important role in the system on chip, and its role in the RF front-end circuit is even more irreplaceable.

片上变压器应用能提高射频电路的紧凑性并实现电路高性能。变压器能有效地实现阻抗匹配、稳定性、直流偏置。不同于传统的单端结构的射频电路,差分结构的电路能很好地利用片上变压器耦合的优点,能实现比相同面积下的单端结构高出3dB的输出功率。变压器因于其自身电阻、耦合系数以及内在的阻抗,基本上不需要额外的结构就能提高稳定性。变压器来进行匹配能简化电路结构,直接可以通过变压器直接进行偏置和匹配,不需额外的扼流电感。 The application of on-chip transformers can increase the compactness of RF circuits and achieve high circuit performance. Transformers are effective for impedance matching, stability, and DC biasing. Different from the traditional RF circuit with single-ended structure, the circuit with differential structure can make good use of the advantages of on-chip transformer coupling, and can achieve 3dB higher output power than the single-ended structure with the same area. Due to its own resistance, coupling coefficient and inherent impedance, the transformer basically does not require additional structures to improve stability. Matching with a transformer can simplify the circuit structure, and the bias and matching can be directly performed through the transformer without additional choke inductance.

不过,随着射频通信频率的不断提高,片上变压器的导电硅基衬底将会引入越来越多的寄生耦合现象。采用标准CMOS工艺实现的片上变压器的品质因子都较低,一般在10以下。这是由于片上器件存在的各种非理想因素引起的,这包括微带线有限的电导率引起的损耗,高频时由于趋肤效应和其他的磁场效应而使得这种损耗更加严重;高频时非绝缘的衬底和微带线之间的电磁场相互作用而引起的损耗;金属层和衬底之间存在的寄生电容以及金属线之间的边缘电容。 However, as the frequency of radio frequency communication continues to increase, the conductive silicon-based substrate of the on-chip transformer will introduce more and more parasitic coupling phenomena. The quality factor of the on-chip transformer realized by standard CMOS process is low, generally below 10. This is caused by various non-ideal factors in the on-chip devices, including the loss caused by the limited conductivity of the microstrip line. At high frequencies, this loss is more serious due to the skin effect and other magnetic field effects; The loss caused by the electromagnetic field interaction between the non-insulated substrate and the microstrip line; the parasitic capacitance between the metal layer and the substrate and the fringe capacitance between the metal lines.

类似于片上电感,为了减少衬底的影响可以加大变压器与衬底之间的氧化层的厚度、采用轻掺杂衬底或者使用绝缘衬底(SOI工艺或者单独将变压器下的衬底掏空并填充绝缘材料)。这些工艺都与标准CMOS工艺不兼容,会使得成本增加。更好的办法是在标准CMOS工艺的支持下,通过对片上变压器进行优化来提高性能,在变压器下使用最底层金属接地隔离层来将变压器和衬底隔离,减小衬底损耗。 Similar to the on-chip inductor, in order to reduce the influence of the substrate, the thickness of the oxide layer between the transformer and the substrate can be increased, a lightly doped substrate or an insulating substrate can be used (SOI process or the substrate under the transformer can be hollowed out separately) and filled with insulating material). These processes are not compatible with the standard CMOS process, which will increase the cost. A better way is to improve performance by optimizing the on-chip transformer with the support of standard CMOS technology, and use the bottom metal ground isolation layer under the transformer to isolate the transformer from the substrate and reduce substrate loss.

发明内容 Contents of the invention

为了克服衬底效应对片上变压器的影响,本发明的目的是提供一种新型衬底屏蔽层的片上变压器结构。 In order to overcome the influence of the substrate effect on the on-chip transformer, the object of the present invention is to provide a novel on-chip transformer structure of the substrate shielding layer.

本发明解决技术问题所采取的技术方案: The technical solution adopted by the present invention to solve technical problems:

一种新型衬底屏蔽层的片上变压器结构,包括片上变压器,在片上变压器的正下方设置有多层衬底屏蔽层;所述的衬底屏蔽层由矩形金属条和多根形状相同的金属栅条组成,所述的金属栅条与矩形金属条垂直设置,金属栅条之间等间距平行设置。 An on-chip transformer structure of a novel substrate shielding layer includes an on-chip transformer, and a multi-layer substrate shielding layer is arranged directly below the on-chip transformer; the substrate shielding layer is composed of a rectangular metal strip and a plurality of metal grids with the same shape Composed of strips, the metal grid strips are arranged vertically to the rectangular metal strips, and the metal grid strips are arranged in parallel at equal intervals.

作为优选,所述的衬底屏蔽层为一层。 Preferably, the substrate shielding layer is one layer.

本发明的有益效果: Beneficial effects of the present invention:

本发明的新型衬底屏蔽层的片上变压器结构能实现更好的衬底隔离,减小衬底损耗,并且通过多个衬底屏蔽层能实现电容功能。 The on-chip transformer structure of the novel substrate shielding layer of the invention can realize better substrate isolation, reduce substrate loss, and realize capacitance function through multiple substrate shielding layers.

附图说明 Description of drawings

图1是本发明的新型衬底屏蔽层示意图。 Fig. 1 is a schematic diagram of the novel substrate shielding layer of the present invention.

图2是本发明利用第一层金属(M1)作为屏蔽层的片上变压器立体示意图。 Fig. 2 is a schematic perspective view of an on-chip transformer using the first layer of metal (M1) as a shielding layer according to the present invention.

图3是本发明利用第一层金属(M1)及第二层金属(M2)作为屏蔽层实现电容功能的截面示意图。 Fig. 3 is a schematic cross-sectional view of the present invention using the first layer of metal (M1) and the second layer of metal (M2) as the shielding layer to realize the capacitive function.

图4是本发明利用第一层金属(M1)、第二层金属(M2)及第三层金属(M3)作为屏蔽层实现电容功能的截面示意图。 Fig. 4 is a schematic cross-sectional view of the present invention using the first layer of metal (M1), the second layer of metal (M2) and the third layer of metal (M3) as shielding layers to realize the capacitive function.

具体实施方式 Detailed ways

本发明的新型衬底屏蔽层可以是多层,作为优选,所述的衬底屏蔽层为一层。如图1、图2所示,本发明包括片上变压器,在片上变压器的正下方设置有一层衬底屏蔽层;所述的衬底屏蔽层由矩形金属条和多根形状相同的金属栅条组成,所述的金属栅条与矩形金属条垂直设置,金属栅条之间等间距平行设置。本发明能有效地实现片上变压器和衬底的隔离,使得片上变压器磁场与衬底之间实现隔断,避免隔离层中出现涡流损耗,使得衬底损耗减小,同时也减小了对相邻器件的信号串扰。 The novel substrate shielding layer of the present invention may be multi-layered, and preferably, the substrate shielding layer is one layer. As shown in Fig. 1 and Fig. 2, the present invention includes an on-chip transformer, and a substrate shielding layer is arranged directly below the on-chip transformer; the substrate shielding layer is composed of a rectangular metal strip and a plurality of metal grid strips with the same shape , the metal grid strips are arranged vertically to the rectangular metal strips, and the metal grid strips are arranged in parallel at equal intervals. The invention can effectively realize the isolation between the on-chip transformer and the substrate, so that the on-chip transformer magnetic field can be isolated from the substrate, avoiding eddy current loss in the isolation layer, reducing the substrate loss, and reducing the impact on adjacent devices. signal crosstalk.

图2是本发明利用第一层金属(M1)作为屏蔽层的片上电感立体示意图。射射频信号从变压器初级线圈的端口1(Port1)、端口3(Port3),通过磁场耦合后从次级线圈的端口2(Port2)、端口4(Port4)出来。通过屏蔽层(如第一层金属M1)实现变压器和衬底的隔离,可以避免隔离层中出现涡流损耗,减小衬底损耗。 FIG. 2 is a perspective view of an on-chip inductor using the first layer of metal (M1) as a shielding layer in the present invention. The radio frequency signal comes out from Port 1 (Port1) and Port 3 (Port3) of the primary coil of the transformer, and then comes out from Port 2 (Port2) and Port 4 (Port4) of the secondary coil after being coupled by a magnetic field. The isolation between the transformer and the substrate is realized through the shielding layer (such as the first layer of metal M1), which can avoid the eddy current loss in the isolation layer and reduce the substrate loss.

本发明能通过多个衬底屏蔽层来实现电容功能,图3为本发明利用第一层金属(M1)及第二层金属(M2)作为屏蔽层来实现电容功能的截面示意图。具体实现方式为:屏蔽层2(用第二层金属M2实现)通过连线连接到电源端,屏蔽层1(用第一层金属M1实现)通过连线接地。这样就可以形成第二层金属(M2)与衬底之间的电容C1、第一层金属(M1)与第二层金属(M2)之间的电容C2,得到总的电容C为电容C1与电容C2的并联。 The present invention can realize the capacitive function through multiple substrate shielding layers. FIG. 3 is a schematic cross-sectional view of the present invention using the first layer of metal (M1) and the second layer of metal (M2) as shielding layers to realize the capacitive function. The specific implementation method is as follows: the shielding layer 2 (realized by the second layer of metal M2) is connected to the power supply terminal through a connection, and the shielding layer 1 (realized by the first layer of metal M1) is grounded through a connection. In this way, the capacitance C1 between the second layer metal (M2) and the substrate, the capacitance C2 between the first layer metal (M1) and the second layer metal (M2) can be formed, and the total capacitance C can be obtained as capacitance C1 and Parallel connection of capacitor C2.

若图3所示的两层衬底屏蔽层所得到的电容值不够大,则可以用更多层金属实现屏蔽层,比如图4所示为本发明利用第一层金属(M1)、第二层金属(M2)、第三层金属(M3)作为屏蔽层实现电容功能。具体的实现方式为:屏蔽层2(第二层金属M2)通过连线连接到电源端,屏蔽层1(第一层金属M1)与屏蔽层3(第三层金属M3)分别接地。这样就可以得到第二层金属(M2)与衬底之间的电容C1、第一层金属(M1)与第二层金属(M2)之间的电容C2、第三层金属(M3)与第二层金属(M2)之间的电容C2,得到总的电容C为电容C1与电容C2的并联。 If the capacitance value obtained by the two-layer substrate shielding layer shown in Figure 3 is not large enough, more layers of metal can be used to realize the shielding layer. For example, Figure 4 shows that the present invention utilizes the first layer of metal (M1), the second The layer metal (M2) and the third layer metal (M3) are used as the shielding layer to realize the capacitance function. The specific implementation method is as follows: the shielding layer 2 (the second layer of metal M2) is connected to the power supply terminal through a wire, and the shielding layer 1 (the first layer of metal M1) and the shielding layer 3 (the third layer of metal M3) are respectively grounded. In this way, the capacitance C1 between the second layer metal (M2) and the substrate, the capacitance C2 between the first layer metal (M1) and the second layer metal (M2), and the capacitance C2 between the third layer metal (M3) and the first layer metal (M3) can be obtained. The capacitance C2 between the two layers of metal (M2), the total capacitance C obtained is the parallel connection of the capacitance C1 and the capacitance C2.

Claims (2)

1. the on-chip transformer structure of a novel substrate shield layer is characterized in that: comprise on-chip transformer, under on-chip transformer, be provided with the MULTILAYER SUBSTRATE screen; Described substrate shield layer is made up of with the many identical metal grizzly bars of shape the rectangular metal bar, and described metal grizzly bar is provided with the rectangular metal bar is vertical, equidistantly laterally arranges between the metal grizzly bar.
2. on-chip transformer structure according to claim 1 is characterized in that: described substrate shield layer is one deck.
CN2011104419415A 2011-12-27 2011-12-27 On-chip transformer structure of novel substrate shielding layer Pending CN102522402A (en)

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Cited By (5)

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CN102738124A (en) * 2012-06-29 2012-10-17 杭州电子科技大学 Novel fractal pattern grounding shield structure
CN104733452A (en) * 2013-12-19 2015-06-24 深圳市中兴微电子技术有限公司 Transformer, manufacturing method thereof and chip
CN105185778A (en) * 2015-08-31 2015-12-23 中国科学院自动化研究所 On-chip integrated transformer
CN105408973A (en) * 2013-08-08 2016-03-16 株式会社Ihi Method for manufacturing contactless power-supply device, and resonator
CN106024340A (en) * 2016-08-02 2016-10-12 成都线易科技有限责任公司 Transformer with shielding structure

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102738124A (en) * 2012-06-29 2012-10-17 杭州电子科技大学 Novel fractal pattern grounding shield structure
CN102738124B (en) * 2012-06-29 2015-05-13 杭州电子科技大学 Novel fractal pattern grounding shield structure
CN105408973A (en) * 2013-08-08 2016-03-16 株式会社Ihi Method for manufacturing contactless power-supply device, and resonator
CN105408973B (en) * 2013-08-08 2017-10-03 株式会社Ihi The manufacture method and resonator of contactless power supply device
US10686333B2 (en) 2013-08-08 2020-06-16 Ihi Corporation Method for manufacturing wireless power-transmitting device, and resonator
CN104733452A (en) * 2013-12-19 2015-06-24 深圳市中兴微电子技术有限公司 Transformer, manufacturing method thereof and chip
CN104733452B (en) * 2013-12-19 2018-02-02 深圳市中兴微电子技术有限公司 A kind of transformer and preparation method thereof and chip
CN105185778A (en) * 2015-08-31 2015-12-23 中国科学院自动化研究所 On-chip integrated transformer
CN106024340A (en) * 2016-08-02 2016-10-12 成都线易科技有限责任公司 Transformer with shielding structure

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Application publication date: 20120627