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CN102443500A - Cleaning liquid composition and cleaning method - Google Patents

Cleaning liquid composition and cleaning method Download PDF

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Publication number
CN102443500A
CN102443500A CN2010105029506A CN201010502950A CN102443500A CN 102443500 A CN102443500 A CN 102443500A CN 2010105029506 A CN2010105029506 A CN 2010105029506A CN 201010502950 A CN201010502950 A CN 201010502950A CN 102443500 A CN102443500 A CN 102443500A
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ablution
ether
constituent
ammonium
carbon number
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CN102443500B (en
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薛人豪
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Chi Mei Corp
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Chi Mei Corp
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Abstract

The present invention relates to a detergent composition for removing grease, resin or particles attached to electronic parts and a cleaning method, and particularly provides a detergent composition which has low metal corrosion and good stripping performance and is used for stripping an alignment film after a post-heating treatment of a glass substrate for a liquid crystal display and a cleaning method using the detergent composition. The cleaning solution composition comprises: a basic compound , a primary alcohol organic solvent (B) and an ether-group-containing secondary and/or tertiary alcohol organic solvent (C).

Description

A kind of ablution constituent and method of cleaning
Technical field
The present invention relates to a kind of in order to remove the ablution constituent and the method for cleaning of the grease, resin or the particulate that are attached on the electronic component; Particularly provide a kind of in order to peeling off in the liquid crystal display glass substrate, the ablution constituent of the alignment film after post-heating is handled and use the method for cleaning of this constituent.
Background technology
All the time, compared to neutral ablution, alkaline ablution is comparatively remarkable for the removal ability of grease, resin and particulate etc., so be widely used in the manufacturing process for cleaning of electronic component, metal parts and ceramic part etc.But, general in the method for cleaning of electronic component because non-ferrous metal such as aluminium are corroded by alkaline ablution easily with aluminium, be not suitable for using alkaline ablution.Be the polyimide alignment film in the example, particularly liquid-crystal display with the electronic component, be to be main with the horizontal direction matching type, but along with more and more stronger for the demand of wide-angle liquid-crystal display, the polyimide alignment film of vertical orientation type has the trend of increase in the past.If the polyimide alignment film glass substrate of horizontal direction matching type; Handle (post-bake at post-heating; Post-heating treatment temp: 180～280 ℃) the preceding state that partly burns till; The unacceptable product of this moment can be peeled off its alignment film by N-Methyl pyrrolidone (N-methylpyrrolidone) equal solvent, and can not corrode aluminium film (electronic circuit).But when the polyimide alignment film of vertical orientation type; Even partly burning till state; Still can't use the N-Methyl pyrrolidone equal solvent to peel off, so openly specially permit communique japanese kokai publication hei 6-306661 number and disclosed the means of using alkaline ablution to peel off.Yet; Because the aluminium film of glass substrate can be by alkaline ablution corrosion; So the part of aluminium film being used material such as wax protect earlier cleans again; Then remove wax with the hydro carbons equal solvent again and make substrate and aluminium film restore, or alignment film and aluminium film are peeled off fully simultaneously and dissolved, substrate is restored.
In addition, in the preparation process of semiconductor subassembly circuit etc., the photoresistance residue that is produced when forming electronic circuit in order to remove uses the amine series stripping agent to carry out all the time.But the amine series stripping agent has the metallic circuit of aluminium and the tungsten of corrosion on the substrate etc. and the problem of mf.Therefore openly speciallyying permit for japanese kokai publication hei 4-48633 number to disclose in the communique uses the aqueous solution that contains fourth stage ammonium oxyhydroxide and carbohydrate to solve the corrosive problem; But the separability of photoresistance and suppress metallic circuit corrosion this aspect two, and can't be simultaneously satisfied fully.
In addition, openly specially permit the ablution that communique discloses use tetraalkylammonium hydroxides collocation certain alcohols kind solvent composition, have good ability for TOHKEMY 2005-336470 number for suppressing metallic corrosion.Alignment film after but this ablution is handled for post-heating still can't fully be peeled off it clean.
Summary of the invention
The present invention's first purpose is the ablution constituent that provides a kind of separability good, provides particularly that a kind of metal protection is low, separability is good, in order to peel off in the liquid crystal display glass substrate ablution constituent of the alignment film after post-heating is handled.
The present invention's second purpose is at the method for cleaning that the electronic component that a kind of metal protection is low, separability is good is provided.
For satisfying aforementioned intended purposes, ablution constituent of the present invention comprises: the secondary of basic cpd (A), one-level alcohol organic solvent (B) and tool ether and/or the organic solvent (C) of tertiary alcohol class.
Below one by one each composition of the present invention is done detailed explanation:
< ablution constituent >
[basic cpd (A)]
Basic cpd of the present invention (A) is to be selected from the group that is made up of metal hydroxides, carbonate, phosphoric acid salt, silicate, ammoniacal liquor, diamine, volatile caustic and the represented organic bases of following note general expression (1).
Figure BSA00000297670300031
general expression (1)
In the formula, R 1Be the alkyl of carbon number 1～24, R 2, R 3With R 4For the alkyl of Wasserstoffatoms, carbon number 1～24 or-(R 5O) pThe functional group that-H is represented, wherein, R 5It for alkylidene group, the p of carbon number 2～4 1～6 integer.
The concrete example of said metal hydroxides is like alkali metal hydroxides such as Lithium Hydroxide MonoHydrate, sodium hydroxide and Pottasium Hydroxide; Alkaline earth metal hydroxidess such as calcium hydroxide, Marinco H and hydrated barta.
The concrete example of said carbonate is like alkaline carbonate classes such as yellow soda ash and salt of wormwood; Alkaline earth metal carbonate classes such as lime carbonate, magnesiumcarbonate and barium carbonate.
Said phosphatic concrete example is like alkali metal phosphate classes such as trisodium phosphate, potassium pyrophosphate, tripoly phosphate sodium STPP and Potassium tripolyphosphates; Alkali earth metal phosphate classes such as Calcium Pyrophosphate, magnesium pyrophosphate, barium pyrophosphate, tripolyphosphate calcium, tripolyphosphate magnesium and tripolyphosphate barium.
The concrete example of the organic bases shown in the said general expression (1) comprises like following (i)～(mixture of v) cited positively charged ion and the formed salt of oxyhydroxide negatively charged ion and this salt.
(i) contain the level Four ammonium cation of four alkyl
The concrete example of tetraalkyl ammonium of alkyl that contains four carbon numbers 1～6 is like tetramethyl-ammonium, tetraethyl ammonium, four n-propyl ammoniums, tetra isopropyl ammonium, tetra-n-butyl ammonium, four isobutyl-ammoniums, four tributyl ammonium, four pentyl ammonium and tetrahexyl ammonium etc.
The concrete example of tetraalkyl ammonium of alkyl that contains three carbon numbers 1～6 is like trimethylammonium heptyl ammonium, trimethylammonium octyl group ammonium, trimethylammonium decyl ammonium, trimethyldodecane base ammonium, trimethylammonium octadecyl (stearyl) ammonium, Three methyl Benzene ammonium methyl, triethyl hexyl ammonium, triethyl octyl group ammonium, triethyl octadecyl ammonium, triethylbenzene ammonium methyl, tributyl phenmethyl ammonium, tributyl octyl group ammonium and three hexyl octadecyl ammonium etc.
The concrete example of tetraalkyl ammonium of alkyl that contains two carbon numbers 1～6 is like dimethyl-dioctyl ammonium, diethylammonium dioctyl ammonium and dimethyl-diphenyl-methyl ammonium etc.
The concrete example of tetraalkyl ammonium of alkyl that contains a carbon number 1～6 is like methyl trioctylammonium, ethyl trioctylammonium and Methyl Octyl diphenyl-methyl ammonium etc.
Three grades of ammonium cations that (ii) contain three alkyl
The concrete example of trialkyl ammonium cation of alkyl that contains three carbon numbers 1～6 is like trimethyl ammonium positively charged ion, triethyl ammonium positively charged ion and tributyl ammonium positively charged ion etc.
The concrete example of trialkyl ammonium cation of alkyl that contains two carbon numbers 1～6 is like dimethyl-octyl group ammonium cation, dimethyl stearyl ammonium cation, diethylammonium octyl group ammonium cation, dibutyl octyl group ammonium cation and dimethyl benzene ammonium methyl positively charged ion etc.
The concrete example of trialkyl ammonium cation of alkyl that contains a carbon number 1～6 is like methyl dioctyl ammonium cation, ethyl dioctyl ammonium cation and Methyl Octyl phenmethyl ammonium cation etc.
The secondary ammonium cation that (iii) contains two alkyl
The concrete example of dialkyl ammonium cation of alkyl that contains two carbon numbers 1～6 is like Dimethyl Ammonium positively charged ion, diethyl ammonium positively charged ion, dibutyl ammonium cation and dihexyl ammonium cation etc.
The concrete example of dialkyl ammonium cation of alkyl that contains a carbon number 1～6 is like Methyl Octyl ammonium cation, ethyl octyl group ammonium cation, butyl octyl ammonium cation, hexyl octyl group ammonium cation, methyl octadecyl ammonium cation, methylbenzene ammonium methyl positively charged ion and ethylbenzyl ammonium cation etc.
The one-level ammonium cation that (iv) contains an alkyl
The concrete example of single alkyl (carbon number 1～6) ammonium cation is like ammonium methyl positively charged ion, ethyl ammonium positively charged ion, butyl ammonium cation and hexyl ammonium cation etc.
(the positively charged ion that v) contains oxyalkylene group
The cationic concrete example that contains an oxyalkylene group is like hydroxyethyl trimethyl ammonium positively charged ion, hydroxyethyl triethyl ammonium positively charged ion, Hydroxyproyl Trimethyl ammonium cation, hydroxypropyl triethyl ammonium positively charged ion, hydroxyethyl dimethyl ethyl ammonium positively charged ion and hydroxyethyl dimethyl octyl group ammonium cation etc.
The cationic concrete example that contains two oxyalkylene groups is like dihydroxy ethyl Dimethyl Ammonium positively charged ion, dihydroxy ethyl diethyl ammonium positively charged ion, dihydroxypropyl Dimethyl Ammonium positively charged ion, dihydroxypropyl DIETHANOL AMINE positively charged ion, dihydroxy ethyl methylethyl ammonium cation, dihydroxy ethyl Methyl Octyl ammonium cation and two (2-hydroxyl ethoxyethyl) octyl group ammonium cations etc.
The cationic concrete example that contains three oxyalkylene groups is like trihydroxyethyl ammonium methyl positively charged ion, trihydroxyethyl ethyl ammonium positively charged ion, trihydroxyethyl butyl ammonium cation, three hydroxypropylmethyl ammonium cations, three hydroxypropyl ethyl ammonium positively charged ions and trihydroxyethyl octyl group ammonium cation etc.
In basic cpd of the present invention (A); Viewpoint with detergency and cleaning; Preferably alkali metal hydroxide, diamine and above-mentioned containing (i) reach (ii) said cationic oxyhydroxide; Better is diamine and contains (i) cationic oxyhydroxide, particularly contain the tetraalkyl ammonium oxyhydroxide of the alkyl of four carbon numbers 1～6.Above-mentioned compound can be a kind of separately or mix several uses.
Based on ablution constituent gross weight 100 weight parts, basic cpd of the present invention (A) usage quantity is generally 5～50 weight parts, is preferably 10～45 weight parts, is more preferred from 15～40 weight parts.
[one-level alcohol organic solvent (B)]
One-level alcohol organic solvent of the present invention (B) is for the ether alcohol class of one-level unit price alcohols, one-level multivalence alcohols or band one-level alcohol radical etc.
The concrete example of one-level unit price alcohols is like methyl alcohol, ethanol, n-propyl alcohol, propyl carbinol, 2-methyl 1-propyl alcohol, Pentyl alcohol, 2-methyl 1-butanols, 3-methyl 1-butanols, 2, one-level unit price alcohols such as 2-dimethyl-1-propyl alcohol.
The concrete example of one-level multivalence alcohols is like terepthaloyl moietie (ethylene glycol), 1; Ammediol (1; 3-propylene glycol), 1, the 4-butyleneglycol (1,4-butanediol), 1; The 6-pinakon (1,6-hexanediol), NSC 6366 (neopentyl glycol), trimethylolethane (trimethylol ethane), TriMethylolPropane(TMP) (trimethylol propane) and isoamyl tetrol one-level multivalence alcohols such as (pentaerythritol).
The concrete example of the ether alcohol class of band one-level alcohol radical as: Ethylene Glycol Methyl ether (ethylene glycol monomethyl ether), glycol ethyl ether (ethylene glycol monoethyl ether), glycol ether (diethylene glycol), glycol ether methyl ether (diethylene glycol monomethyl ether), glycol ether ethyl ether (diethylene glycol monoethyl ether), glycol ether butyl ether (diethylene glycol monobutyl ether), glycol ether n-hexyl ether (diethylene glycol mono n-hexyl ether), glycol ether 2-ethylhexyl ether (diethylene glycol mono 2-ethylhexyl ether), Tri Ethyleneglycol (triethylene glycol), Tri Ethyleneglycol methyl ether (triethylene glycol monomethyl ether), tetraethylene-glycol (tetraethylene glycol), tetraethylene-glycol methyl ether (tetraethylene glycol monomethyl ether), polyoxyethylene glycol (polyethylene glycol, Mn:150～850) etc. are with the ether alcohol class of one-level alcohol radical.
Based on ablution constituent gross weight 100 weight parts, one-level alcohol organic solvent of the present invention (B) usage quantity is generally 5～70 weight parts, is preferably 10～65 weight parts, is more preferred from 15～60 weight parts.
[having the secondary of ether and/or the organic solvent (C) of tertiary alcohol class]
In the present invention; The concrete example of organic solvent (C) of secondary and/or tertiary alcohol class with ether is like 1-methoxyl group-2-propyl alcohol (1-methoxy-2-propanol), 1-oxyethyl group-2-propyl alcohol (1-ethoxy-2-propanol), 1-propoxy--2-propyl alcohol (1-propoxy-2-propanol), 1-butoxy-2-propyl alcohol (1-butoxy-2-propanol), 1-phenoxy-2-propyl alcohol (1-phenoxy-2-propanol), 1-methoxyl group-2-butanols (1-methoxy-2-butanol), 1-butoxy-2-butanols (1-butoxy-2-butanol), 1-(2-methoxyl group-1-methyl ethoxy)-2-propyl alcohol [1-(2-methoxy-1-methylethoxy)-2-propanol], 1-(2-methoxyl group-2-methyl ethoxy)-2-propyl alcohol [1-(2-methoxy-2-methylethoxy)-2-propanol], 1-(2-oxyethyl group-1-methyl ethoxy)-2-propyl alcohol [1-(2-ethoxy-1-methylethoxy)-2-propanol], 1-(2-propoxy--1-methyl ethoxy)-2-propyl alcohol [1-(2-propoxy-1-methylethoxy)-2-propanol], 1-(2-butoxy-1-methyl ethoxy)-2-propyl alcohol [1-(2-butoxy-1-methylethoxy)-2-propanol], 1-(2-the 3rd butoxy-1-methyl ethoxy)-2-propyl alcohol [1-(2-tert-butoxy-1-methylethoxy)-2-propanol], 1-(2-hexyloxy-1-methyl ethoxy)-2-propyl alcohol [1-(2-hexyloxy-1-methylethoxy)-2-propanol], 1; 1 '-[propane-1; 2-two bases two (stretching the oxygen base)] two propane-1-alcohol { 1; 1 '-[propane-1; 2-diylbis (oxy)] dipropane-1-ol}, 1-[2-(2-methoxyl group-1-methyl ethoxy)-1-methyl ethoxy]-2-propyl alcohol { 1-[2-(2-methoxy-1-methylethoxy)-1-methylethoxy]-2-propanol}, 1-[1-methyl-2-(1-methyl-2-propoxy-oxyethyl group) oxyethyl group]-2-propane { 1-[1-methyl-2-(1-methyl-2-propoxyethoxy) ethoxy]-2-propanol}, 4; 7; 10-trimethylammonium-2; 5; 8; The 11-four oxygen tetradecane-13-alcohol { 4; 7; 10-trimethyl-2; 5; 8,11-tetraoxatetradecane-13-ol}, 1-[1-[1-(1-methoxy propoxy) propoxy-] propoxy--2-propyl alcohol { 1-[1-[1-(1-methoxypropoxy) propoxy] propoxy]-2-propanol}, 1-methoxyl group-2-methyl-2-propyl alcohol (1-methoxy-2-methyl-2-propanol), 1-isopropoxy-2-methyl-2-propyl alcohol (1-Isopropoxy-2-methyl-2-propanol).
Based on ablution constituent gross weight 100 weight parts, of the present invention have the secondary of ether and/or organic solvent (C) usage quantity of tertiary alcohol class is generally 5～70 weight parts, is preferably 10～65 weight parts, is more preferred from 15～60 weight parts.
In the ablution constituent of the present invention, basic cpd (A), one-level alcohol organic solvent (B) and have the secondary of ether and/or the organic solvent (C) and the time spent of tertiary alcohol class can obtain the alignment film ablution that metal protection is low, separability is good.
When not using one-level alcohol organic solvent (B), the metal protection problem can take place; And when using the organic solvent (C) of secondary with ether and/or tertiary alcohol class, then have the not good shortcoming of separability.Ablution constituent of the present invention is except above-mentioned basic cpd (A), one-level alcohol organic solvent (B) and have the organic solvent (C) of secondary and/or tertiary alcohol class of ether; Do not influencing under the performance of ablution constituent, can optionally add water, other hydrophilic organic solvents (D), interfacial agent (E) and additive (F).
[other hydrophilic organic solvents (D)]
Other hydrophilic organic solvents (D) are pyridines, amides, oxazolinyl ketone, nitrites, lactone, ketone, ethers, ether-ether class, cyclic ethers class, sulfoxide class or ether alcohol class etc.
The concrete example of pyridines is like pyridines such as N-Methyl pyrrolidone, N-ethyl pyrrolidone and 2-Pyrrolidones.
The concrete example of amides is like N-NMF (N-methylformamide), N; Dinethylformamide (N, N-dimethylformamide), N-ethyl-formamide (N-ethylformamide) and N, N-DEF (N; Benzamide type such as N-diethylformamide); N-methylacetamide (N-methylacetamide), DMAC N,N (N, N-dimethylacetamide), N-ethyl acetamide (N-ethylacetamide), N; N-diethyl acetamide (N; N-diethylacetamide) ethanamide, N such as, and N-dimethyl propylene acid amides (N, N-dimethylpropionamide), hexamethylphosphoric acid triamide amidess such as (hexamethyl phosphoramide).
The concrete example of oxazolinyl ketone is like N-methyl-2-oxazolinyl ketone (N-methyl-2-oxazolidinone), 3, and 5-dimethyl--2-oxazolinyl ketone (3,5-dimethyl-2-oxazolidinone) wait the oxazolinyl ketone.
The concrete example of nitrites is like acetonitrile (acetonitrile), propionitrile (propionitrile), butyronitrile (butyronitrile), vinyl cyanide (acrylonitrile), methacrylonitrile (methacrylonitrile), cyanobenzene nitrites such as (benzonitrile).
The concrete example of lactone is like: gamma-butyrolactone (γ-butyrolactone), α-ethanoyl-gamma-butyrolactone (α-acetyl-γ-butyrolactone), beta-butyrolactone (β-butyrolactone), γ-Wu Neizhi (γ-valerolactone), δ-Wu Neizhi (lactone such as δ-valerolactone).The concrete example of ketone is like acetone (acetone), methyl phenyl ketone (acetophenone), methyl ethyl ketone (methylethylketone), pimelinketone (cyclohexanone), ketopentamethylene (cyclopentanone) and diacetone alcohol ketones such as (diacetone alcohol).
The concrete example of ethers is like ethylene glycol dimethyl ether (ethylene glycol dimethyl ether); Diethylene glycol dimethyl ether (diethylene glycol dimethyl ether); Triethylene glycol dimethyl ether (triethylene glycol dimethyl ether); Diethylene glycol diethyl ether (diethylene glycol diethyl ether); Diethylene Glycol dibutyl ether (diethylene glycol dibutyl ether); Diethylene Glycol isopropyl methyl ether (diethylene glycol isopropylmethyl ether); Diethylene Glycol normal-butyl methyl ether (diethylene glycol n-butylmethyl ether); Dipropylene glycol dimethyl ether (dipropylene glycol dimethyl ether); Tripropylene glycol dimethyl ether (tripropylene glycol dimethyl ether); Dipropylene glycol n-propyl methyl ether (dipropylene glycol n-propylmethyl ether); Dipropylene glycol normal-butyl methyl ethers (dipropylene glycol n-butylmethyl ether) etc. are the ethers of containing alcohol-based not.
The concrete example of ether-ether class is like glycol methyl ether acetate (ethylene glycol monomethyl ether acetate); Ethylene glycol ether acetate (ethylene glycol monoethyl ether acetate); Diethylene glycol dimethyl ether acetic ester (diethylene glycol monomethyl ether acetate); Diethylene glycol ether acetic ester (diethylene glycol monoethyl ether acetate) and Diethylene Glycol monobutyl ether acetate ether-ether classes such as (diethylene glycol monobutyl ether acetate).
The concrete example of cyclic ethers class is like THF (tetrahydrofuran), tetrahydropyrans cyclic ethers classes such as (tetrahydropyran).
The concrete example of sulfoxide class is like DMSO 99.8MIN. (dimethylsulfoxide), diethyl sulfoxide (diethylsulfoxide), tetramethylene sulfone sulfoxide classes such as (sulfolane).
The concrete example of multivalence alcohols as: 1,2-Ucar 35 (1,2-propylene glycol), USP Kosher (glycerin), 1,3 butylene glycol (1; 3-butanediol), 2, the 3-butyleneglycol (2,3-butanediol), 1,2-pentanediol (1; 2-pentanediol), 1, the 4-pentanediol (1,4-pentanediol), 2,4-pentanediol (2; 4-pentanediol), 1, the 2-pinakon (1,2-hexanediol), 1,5-pinakon (1; 5-hexanediol) and 2, and the 5-pinakon (2,5-hexanediol) wait the straight chain formula glycols (alkane diol) of carbon number 2～8; 1, and the 2-cyclohexane diol (1,2-cyclohexanediol), 1; The 3-cyclohexane diol (1,3-cyclohexanediol), 1,4-cyclohexane diol (1; 4-cyclohexanediol), 1,2-pentamethylene glycol (1,2-cyclopentanediol), 1; 3-pentamethylene glycol (1,3-cyclopentanediol) the ester ring type glycols of carbon number 6～12 such as grade.
Based on ablution constituent gross weight 100 weight parts, other hydrophilic organic solvents of the present invention (D) are preferably 0～20 weight part.
[interfacial agent (E)]
The kind of interfacial agent (E) can be divided into non-ionic surfactant (E1), teepol (E2), cation interfacial active agent (E3) and both sexes interfacial agent (E4).But the organic bases shown in aforementioned alcohols and the general expression (1) also is not included in this type of.
The concrete example of aforementioned non-ionic interfacial agent (E1) is the multivalence alcohol type non-ionic surfactant of alkylene oxide compound add-on type non-ionic surfactant, carbon number 3～20.
Described alkylene oxide compound add-on type non-ionic surfactant can be in the compounds such as senior alkylamines of higher fatty acid or carbon number 8～24 of alkylphenol, carbon number 12～24 of higher alcohols, the carbon number 10～24 of carbon number 8～18; The oxyalkylene group products therefrom of direct addition carbon number 2～4; The oxyalkylene base system of this carbon number 2～4 is oxyethylene group (hereinafter to be referred as EO), oxypropylene group or oxybutylene base; And the addition of the oxyalkylene group of carbon number 2～4 not ear number is 8～5,000; Described alkylene oxide compound add-on type non-ionic surfactant also can be polyoxy alkylene terepthaloyl moietie, and (Mn is 150～6; 000) with the product of the reactions such as higher fatty acid of carbon number 12～24, react the product of addition oxyalkylene group on the carboxylate of gained (Mn is 250～30 in the higher fatty acid that the multivalence alcohol of glycols or 3～8 valencys etc. contains compound and the carbon number 12～24 of hydroxyl; 000), on the higher fatty acid amides of carbon number 8～24 product of addition oxyalkylene group (Mn is 200～30; 000) product (Mn is 120～30,000) of addition oxyalkylene group etc. or on the multivalence of carbon number 8～60 alcohol alkyl oxide.
The multivalence alcohol type non-ionic surfactant of said carbon number 3～20 is the multivalence alcohol fatty acid ester of carbon number 8～60, the multivalence fatty acid alkyl ether of carbon number 8～60 or the fatty acid alkyl amide of carbon number 8～60.
The concrete example of anionic interfacial agent (E2) does, the salt of carboxylic acid (the saturated or unsaturated fatty acids of carbon number 8～22) or its esters, carboxymethylation compound [salt of the carboxymethylation compound of the aliphatics alcohols of carbon number 8～16 and/or the EO affixture of this aliphatics alcohols (addition number 1～10) etc. etc.], sulfuric ester salt [higher alcohol sulfate salt (the sulfuric ester salt of the aliphatics lipid of carbon number 8～18 etc.) etc.], senior alkyl ether sulfuric ester salt [the sulfuric ester salt of the EO affixture of the aliphatics alcohols of carbon number 8～18 (addition number 1～10)], sulfated oil (natural consaturated oil or undersaturated wax oil carry out after the sulfation again in the salt of gained), sulfation the fatty acid ester salt of gained (in the carrying out after the sulfation again to the low-carbon-ester class of unsaturated fatty acids with), sulfation the alkene salt of gained (in the carrying out after the sulfation again to the olefines of carbon number 12～18 with), sulphonate [sulfonated of sulfonated alkylbenzene, sulfonated alkyl naphathalene, sulfosuccinic acid diesters type, carbon number 12～18, Igepon T type (trade(brand)name) interfacial agent] and phosphate ester salt salts such as [phosphate ester salts of the EO affixture of the phosphate ester salt of the EO affixture of the phosphate ester salt of carbon number 8～60 higher alcoholss, carbon number 8～60 higher alcoholss, carbon number 4～60 alkylphenols etc.].
The concrete example of above-mentioned salt is the alkylamine salt of basic metal (sodium, potassium etc.) salt, alkaline earth metal (calcium, magnesium etc.) salt, ammonium salt, carbon number 1～20 and the alkanolamine of carbon number 2～12 (list, two, trolamine) salt etc.
The concrete example of cationic interfacial agent (E3) does, and halogenation quarternary ammonium salt type [tetraalkylammonium salt of carbon number 4～100, for example: chlorination dodecyl trimethyl ammonium, chlorination didecyldimethyl ammonium, bromination dioctyl Dimethyl Ammonium, bromination stearyl trimethyl ammonium; The trialkyl phenyl ammonium salt of carbon number 3～80, for example: chlorination dodecyl dimethyl phenyl ammonium (benzalkonium chloride); The alkyl pyridine salt of carbon number 2～60, for example: chlorination hexadecyl pyridine salt; Change the polyoxyethylene groups trimethyl ammonium; Sapamine type (trade(brand)name) quarternary ammonium salt, for example: the Methylsulfate of stearylamide ethyl diethylmethyl ammonium], amine salt type [mineral acid (hydrochloric acid, sulfuric acid, nitric acid and the phosphoric acid) salt or organic acid (acetic acid, propionic acid, laurostearic acid, oleic acid, TRIMETHOXY BENZOIC ACID (FOR MANUFACTURING OF T.M., succsinic acid, hexanodioic acid, the nonane diacid) salt of the aliphatics higher amines of carbon number 12～60 (for example: lauryl amine, stearic amine, hexadecylamine, sclerosis tallow amine, rosin Amine D etc.); The higher fatty acid of carbon number 1～11 low-grade amine (carbon number 12～24, for example: Triple Pressed Stearic Acid, oleic acid) salt; Mineral acid (aforesaid mineral acid) salt or organic acid (aforesaid organic acid) salt of the EO affixture of carbon number 1～30 fatty amine etc.; Mineral acid (aforesaid mineral acid) salt of tertiary amine (triethanolamine monostearate, stearylamide ethyl diethylmethyl thanomin etc.) or organic acid (aforesaid organic acid) salt etc.] etc.
The concrete example of both sexes interfacial agent (E4) is amino acid both sexes interfacial agent [Sodium Propionate of the senior alkylamines of carbon number 12～18 etc.], trimethyl-glycine (Trimethyl glycine) type both sexes interfacial agent [the alkyl dihydroxy ethyl trimethyl-glycine of the alkyl dimethyl trimethyl-glycine of carbon number 12～18 etc., carbon number 12～18 etc., coco-nut oil fatty acid amido propyl betaine etc.], sulfuric acid type both sexes interfacial agent [the sulfuric ester sodium salt of the senior alkylamines of carbon number 8～18, hydroxyethyl imidazole quinoline sulfuric ester sodium salt etc.], sulfonate amphoteric interfacial agent (five decyl amido ethyl sulfonic acids, tetrahydroglyoxaline sulfonic acid etc.), phosphate ester salt type both sexes interfacial agent [phosphate amine salt of the glycerine higher fatty acid esterification thing of carbon number 8～22] etc.
In described interfacial agent (E), with the viewpoint of detergency and erosion resistance, preferably non-ionic surfactant (E1) and teepol (E2), better is non-ion interface promoting agent (E1).Based on ablution constituent gross weight 100 weight parts, interfacial agent of the present invention (E) is preferably 0～20 weight part.
[additive (F)]
Additive (F); For example be rust-preventive agent [carbon number is the alkylolamide an alkali metal salt (for example dodecyl succinate diglycollic amide sodium salt) etc. of dicarboxylicacid of alkylolamide (for example dodecyl succinate diglycollic amide), carbon number 12～24 of dicarboxylicacid of basic metal (sodium, potassium etc.) salt, ammonium salt or alkanolamine salt (triethanolamine salt etc.), carbon number 12～24 of dicarboxylicacid of higher fatty acid (carbon number 8～30) salt, carbon number 12～24 of amine of oxygen second rare (EO) affixture (addition number 2～10), chromic salt, nitrite, the carbon number 6～30 of 6～30 amine (like cyclo-hexylamine, lauryl amine, stearic amine etc.)]; Inhibitor [phenolic cpd (2; 6;-two-t-butyl-4-sylvan etc.), sulfocompound (two dodecyl phenyl disulfide amine propionic salts etc.), amine compound (octyl group diphenylamine etc.), phosphorus compound (triphenyl phosphite etc.) etc.]; Metal ion chelation agent (ethylene diamine tetra acetic acid sodium, Trisodium Citrate etc.), basic metal (sodium, potassium etc.) salt, ammonium salt or the alkanolamine salt (like triethanolamine salt) etc. of organic acid (Hydrocerol A, oxyacetic acid, succsinic acid, tartrate, lactic acid, FUMARIC ACID TECH GRADE, oxysuccinic acid, acetyl acid, butyric acid, lucky oxalic acid, oxalic acid, maleic acid, tussol etc.) and these materials.
The content of additive (F), based on ablution constituent gross weight 100 weight parts, rust-preventive agent of the present invention is usually below 20 weight parts; Preferably 0.5～10 weight part, inhibitor usually below 5 weight parts, preferably 0.1～1 weight part; Metal ion chelation agent is usually below 20 weight parts; Preferably 0.5～10 weight part, organic acid usually below 20 weight parts, preferably 0.5～10 weight part.
Gross weight 100 weight parts with ablution constituent of the present invention are benchmark; The content that other hydrophilic organic solvents (D), interfacial agent (E) and additive (F) add up to; Usually below 40 weight parts, preferably below 30 weight parts, better is below 20 weight parts.And the kinematic viscosity of ablution constituent in the time of 25 ℃ is usually at 2～300mm 2/ sec is from the viewpoint of detergency and flushing, preferably 3～100mm 2/ sec, that better is 4～50mm 2/ sec.Wherein, viscosity is to measure with this Ward (Ostwald) difficult to understand or Chinese tallow tree Luo De viscosmeters such as (Ubbelohde).
< method of cleaning >
Ablution constituent of the present invention; Its purposes that is suitable for does not have special qualification; Can be used for cleaning of various electronic components and aluminium building materials etc., preferably be used for cleaning of electronic component, the cleaning of parts such as electronic component that particularly is widely used in some or all uses aluminium.For example, the glass substrate used of liquid crystal panel, semiconductor substrate, printed substrate, electricity slurry show the electric parts, aluminium building materials of the aluminum electrode plate, electric razor etc. of glass substrate, the first-class electronic component of thermoinduction, air-conditioning cooling film, air cleaner etc.In addition, the object of cleaning (dirt) is organism such as grease, fingerprint, resin, organic fine particles, inorganic particles (for example, inorganicss such as glass powder, ceramics powder, metal powder).In these clean objects, ablution constituent of the present invention is particularly suitable for being used in clean (alignment film carries out cleaning of film front glass substrate, or alignment film is cleaning of underproof glass substrate) of glass substrate that liquid crystal panel uses.
Ablution constituent of the present invention is applicable be selected from by UW, spray clean, spray clean, dipping and dipping shake composing method group of institute and clean.When cleaning, ablution constituent of the present invention can dilute by water where necessary.
Clean temperature, be generally 10～70 ℃, preferably 15～60 ℃.Normally 0.2～120 minute clean time, preferably 0.5～30 minute.After cleaning with ablution constituent of the present invention, can remove the ablution constituent that is attached to substrate with the water flushing again, normally 5～90 ℃ of the flushing temperature of water, preferably 10～70 ℃, process of washing is with the above-mentioned method of cleaning that is suitable for.After the flushing, usually in 50～150 ℃ environment, preferably in 60～100 ℃ environment; Carry out heat drying, the time is usually at 1～120 minute, preferably at 3～60 minutes; To obtain the glass substrate that clean liquid crystal panel is used, glass substrate is restored.
Embodiment
For effect of the present invention is described; Special it is merely preferable possible embodiments of the present invention with the following example explanation, is not in order to restriction the present invention; Therefore all modification or changes of doing according to the present invention's spirit category all ought to be included in this case invention claim.
< embodiment 1～8, comparative example 1～6 >
According to the required weight part of each composition of put down in writing in the table 1, in even fully stirring and mixing in 1 liter beaker under the room temperature, can make the ablution constituent, and each evaluation of measuring mode of following note estimates, the gained result is as shown in table 1.
< evaluation method >
Alignment film separability (spray ablution):
On the glass substrate that is pre-formed ITO film (indium-tin oxide film) (25mm * 25mm, thickness are 0.75mm), the coating polyimide resin.Then, carry out roasting in advance (pre-bake) operation at 80 ℃, roasting in advance after 2 minutes, the circulation baking oven of putting into 220 ℃ carries out roasting (post-bake) operation after 30 minutes, accomplishes the glass substrate experiment slice of polyimide alignment film (thickness 0.1 μ m).Experiment slice is placed on the stainless (steel) wire, and the surface that has this alignment film with ablution constituent (25 ℃) spray (shower) is after 2～11 minutes, cleans the two sides each minute of experiment slice again with the ion exchanged water spray.Then; Experiment slice after dry ten minutes, with the state of peeling off of microscopic examination alignment film, is peeled off required ablution constituent spray time according to alignment film fully in 70 ℃ of recirculating air drying machines; Estimate the alignment film separability of ablution constituent, judgement criteria is following.
◎: spray time≤3 minute
Zero: 3 minute＜spray time≤5 minutes
△: 5 minutes＜spray time≤10 minutes
*: 10 minutes＜spray time
(b) alignment film separability (pickling process):
On the glass substrate that is pre-formed ITO film (indium-tin oxide film) (25mm * 25mm, thickness are 0.75mm), the coating polyimide resin.Then, carry out roasting in advance (pre-bake) operation at 80 ℃, roasting in advance after 2 minutes, the circulation baking oven of putting into 220 ℃ carries out roasting (post-bake) operation after 30 minutes, accomplishes the glass substrate experiment slice of polyimide alignment film (thickness 0.1 μ m).With experiment slice in ablution constituent (25 ℃), flood 2～11 minutes respectively after, place on the stainless (steel) wire, with ion exchanged water the one side of experiment slice spray is cleaned one minute after, the another side of experiment slice is carried out same rinse step.Then, experiment slice after dry ten minutes, with the state of peeling off of microscopic examination alignment film, is peeled off required time of immersion according to alignment film fully in 70 ℃ of recirculating air drying machines, estimate the alignment film separability of ablution constituent, and judgement criteria is following.
◎: time of immersion≤3 minute
Zero: 3 minute＜time of immersion≤5 minutes
△: 5 minutes＜time of immersion≤10 minutes
*: 10 minutes＜time of immersion
The metal non-aggressive:
The glass substrate test film (25mm * 25mm, thickness 0.75mm) that will have aluminium film (thickness 0.03 μ m) adherence is immersed in the ablution constituent of 100ml; Judge the whether fully dissolving of aluminium film with at interval range estimation mode per hour; With aluminium film completely dissolve required time; As etching time, the longer expression of etching time metal non-aggressive is good more, and judgement criteria is following.
Zero: 24 hour≤etching time
△: 12 hours≤etching time＜24 hours
*: etching time＜12 hour
The subordinate list explanation: table 1 is the proportion of composing and the evaluation result of ablution constituent embodiment of the present invention and comparative example.Wherein:
A-1: tetramethyl-ammonium oxyhydroxide (tetramethylammonium hydroxide);
A-2: diamine (hydrazine); A-3: choline (choline);
A-4: triethylamine (triethyl amine); A-5: sodium hydroxide (sodium hydroxide);
B-1: glycol ether methyl ether (diethylene glycol monomethyl ether);
B-2: polyoxyethylene glycol (Mw:200) (poly ethylene glycol);
B-3: glycol ether butyl ether (diethylene glycol monobutyl ether);
C-1:1-propoxy--2-propyl alcohol (1-propoxy-2-propanol);
C-2:1-methoxyl group-2-methyl-2-propyl alcohol (1-methoxy-2-methyl-2-propanol);
C-3:1-methoxyl group-2-propyl alcohol (1-methoxy-2-propanol);
D-1:N-SL 1332 (N-methyl-2-pyrrolidone);
D-2:N, and the N-N,N-DIMETHYLACETAMIDE (N, N-dimethylacetamide);
D-3: USP Kosher (glycerin)
Figure BSA00000297670300191

Claims (9)

1. an ablution constituent is characterized in that, comprises following component:
Basic cpd (A);
One-level alcohol organic solvent (B); And
Have the secondary of ether and/or the organic solvent (C) of tertiary alcohol class.
2. ablution constituent according to claim 1; It is characterized in that said basic cpd (A) is selected from the group that metal hydroxides, carbonate, phosphoric acid salt, silicate, ammoniacal liquor, diamine, volatile caustic and the represented organic bases of following formula (1) are formed;
Figure FSA00000297670200011
formula (1)
In the formula, R 1Be the alkyl of carbon number 1～24, R 2, R 3With R 4For the alkyl of Wasserstoffatoms, carbon number 1～24 or-(R 5O) pThe functional group that-H is represented, wherein R 5It for alkylidene group, the p of carbon number 2～4 1～6 integer.
3. ablution constituent according to claim 1 is characterized in that, said one-level alcohol organic solvent (B) is the ether alcohol class of one-level unit price alcohols, one-level multivalence alcohols or band one-level alcohol radical.
4. ablution constituent according to claim 1 is characterized in that, said organic solvent (C) is secondary and/or the three grades of multivalence alcohols that have secondary and/or three grades of unit price alcohols of ether or have ether.
5. ablution constituent according to claim 1 is characterized in that, based on said ablution constituent 100 weight parts, said one-level alcohol organic solvent (B) is 5～70 weight parts, and said organic solvent (C) is 5～70 weight parts.
6. ablution constituent according to claim 5 is characterized in that, based on said ablution constituent 100 weight parts, said basic cpd (A) is 5～50 weight parts.
7. the method for cleaning of an electronic component is characterized in that, uses like arbitrary described ablution constituent in the claim 1～3, clean to be selected from ultrasonic cleansing, spray, spray clean, dipping and flood and shake the method group that is formed and clean.
8. the method for cleaning of electronic component according to claim 4 is characterized in that, said electronic component comprises glass substrate.
9. according to the method for cleaning of the said electronic component of claim 5, it is characterized in that, dispose the orientation rete on the said glass substrate.
CN201010502950.6A 2010-09-30 2010-09-30 Detergent remover component and washing method Expired - Fee Related CN102443500B (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102641876A (en) * 2012-05-17 2012-08-22 深圳市华测检测技术股份有限公司 Method for quickly cleaning flask
CN103289835A (en) * 2013-05-28 2013-09-11 金发科技股份有限公司 Cleaning composition and method for cleaning production device by using same
CN105274543A (en) * 2015-09-29 2016-01-27 惠州英乐威表面处理科技有限公司 Alkaline wax remover
CN108409161A (en) * 2018-04-20 2018-08-17 深圳市海风润滑技术有限公司 A kind of long-life decoating liquid of high temperature diphasic system
CN110343576A (en) * 2019-07-25 2019-10-18 江苏全真光学科技股份有限公司 A kind of mold mixed type cleaning agent of ultra-toughness resin lens
CN113717798A (en) * 2021-08-27 2021-11-30 东莞优诺电子焊接材料有限公司 Phosphorus-free and nitrogen-free semiconductor packaging cleaning agent

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CN1495535A (en) * 2002-09-09 2004-05-12 ͬ�Ϳ�ҵ��ʽ���� Etching solution for forming bimetallic mosaic structure craft and base phate treatment method
CN1693439A (en) * 2004-04-30 2005-11-09 三洋化成工业株式会社 Alkali cleaner

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US5203926A (en) * 1992-03-06 1993-04-20 Bondurant Louis E Cleanser and desensitizer for printing equipment
CN1495535A (en) * 2002-09-09 2004-05-12 ͬ�Ϳ�ҵ��ʽ���� Etching solution for forming bimetallic mosaic structure craft and base phate treatment method
CN1693439A (en) * 2004-04-30 2005-11-09 三洋化成工业株式会社 Alkali cleaner

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102641876A (en) * 2012-05-17 2012-08-22 深圳市华测检测技术股份有限公司 Method for quickly cleaning flask
CN103289835A (en) * 2013-05-28 2013-09-11 金发科技股份有限公司 Cleaning composition and method for cleaning production device by using same
CN105274543A (en) * 2015-09-29 2016-01-27 惠州英乐威表面处理科技有限公司 Alkaline wax remover
CN105274543B (en) * 2015-09-29 2017-11-07 惠州英乐威表面处理科技有限公司 A kind of alkaline Wax removal water
CN108409161A (en) * 2018-04-20 2018-08-17 深圳市海风润滑技术有限公司 A kind of long-life decoating liquid of high temperature diphasic system
CN110343576A (en) * 2019-07-25 2019-10-18 江苏全真光学科技股份有限公司 A kind of mold mixed type cleaning agent of ultra-toughness resin lens
CN113717798A (en) * 2021-08-27 2021-11-30 东莞优诺电子焊接材料有限公司 Phosphorus-free and nitrogen-free semiconductor packaging cleaning agent

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