CN102345968B - Device and method for drying microemulsion based on supercritical carbon dioxide - Google Patents
Device and method for drying microemulsion based on supercritical carbon dioxide Download PDFInfo
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- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 title claims abstract description 154
- 239000001569 carbon dioxide Substances 0.000 title claims abstract description 77
- 229910002092 carbon dioxide Inorganic materials 0.000 title claims abstract description 77
- 238000001035 drying Methods 0.000 title claims abstract description 34
- 239000004530 micro-emulsion Substances 0.000 title claims abstract description 32
- 238000000034 method Methods 0.000 title claims abstract description 23
- 239000007788 liquid Substances 0.000 claims abstract description 29
- 239000004094 surface-active agent Substances 0.000 claims abstract description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000006243 chemical reaction Methods 0.000 claims description 48
- 238000000746 purification Methods 0.000 claims description 20
- 238000003860 storage Methods 0.000 claims description 15
- 238000001816 cooling Methods 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 7
- 208000036822 Small cell carcinoma of the ovary Diseases 0.000 claims description 6
- 239000008367 deionised water Substances 0.000 claims description 6
- 229910021641 deionized water Inorganic materials 0.000 claims description 6
- 201000005292 ovarian small cell carcinoma Diseases 0.000 claims description 6
- 239000012530 fluid Substances 0.000 claims description 2
- 238000010926 purge Methods 0.000 claims description 2
- 238000009530 blood pressure measurement Methods 0.000 claims 1
- 238000006073 displacement reaction Methods 0.000 claims 1
- 238000004140 cleaning Methods 0.000 abstract description 7
- 239000004065 semiconductor Substances 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 5
- 230000008569 process Effects 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 abstract description 4
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 4
- 238000002210 supercritical carbon dioxide drying Methods 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 12
- 238000001914 filtration Methods 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000004064 recycling Methods 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
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- 239000002904 solvent Substances 0.000 description 4
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- 230000009471 action Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
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- 238000004377 microelectronic Methods 0.000 description 2
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- 239000007864 aqueous solution Substances 0.000 description 1
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Abstract
本发明公开了一种基于超临界二氧化碳微乳液的干燥装置及方法,利用液态二氧化碳置换水基清洗液,然后加入表面活性剂并加热二氧化碳使其达到超临界态对光刻胶或MEMS中的微结构等进行干燥。该方法由于避免了气液界面的产生和防止了表面张力的作用,可以对高深宽比或多孔结构等进行清洗和干燥而没有损伤。与目前超临界二氧化碳干燥方法相比,该方法不需使用有机溶液,因此不会对光刻胶等造成破坏;而且干燥时间大大降低,可以有效防止图形塌陷的问题。该方法符合国际半导体技术蓝图中有关减少有机溶液消耗和节约能源等要求,并且易与目前的IC工艺兼容。
The invention discloses a drying device and method based on supercritical carbon dioxide microemulsion, which uses liquid carbon dioxide to replace the water-based cleaning solution, then adds a surfactant and heats the carbon dioxide to make it reach a supercritical state. structure etc. to dry. Because the method avoids the generation of gas-liquid interface and prevents the effect of surface tension, it can clean and dry high aspect ratio or porous structures without damage. Compared with the current supercritical carbon dioxide drying method, this method does not need to use an organic solution, so it will not cause damage to the photoresist, etc.; and the drying time is greatly reduced, which can effectively prevent the problem of pattern collapse. The method meets the requirements of reducing the consumption of organic solution and saving energy in the international semiconductor technology blueprint, and is easily compatible with the current IC process.
Description
技术领域 technical field
本发明涉及半导体清洗和干燥技术领域,尤其涉及一种基于超临界二氧化碳(SCCO2)微乳液干燥的装置及方法。The invention relates to the technical field of semiconductor cleaning and drying, in particular to a device and method for drying microemulsions based on supercritical carbon dioxide (SCCO 2 ).
背景技术 Background technique
在微电子器件的制造过程中,随着特征尺寸的进一步减小和结构复杂程度的进一步提高,器件结构的塌陷已成为日益严重的问题。以水为主要溶剂清洗之后的器件在干燥时,其机械性结构较弱的如微机电元件及高深宽比的光刻胶图形会遭到破坏。In the manufacturing process of microelectronic devices, with the further reduction of feature size and the further increase of structure complexity, the collapse of device structure has become an increasingly serious problem. When the devices cleaned with water as the main solvent are dried, the weaker mechanical structures such as micro-electro-mechanical components and photoresist patterns with high aspect ratios will be damaged.
二氧化碳作为一种环境友好和价格低廉的溶剂,其超临界态具有接近于零的表面张力和高扩散性,非常适合用于半导体清洗工艺,所以2006年的国际半导体技术蓝图(ITRS)将超临界流体视为可以解决半导体和微机电技术中清洗和干燥的新型绿色溶剂。虽然利用液态二氧化碳替换有机溶液,然后进入超临界态进行干燥的方法可以有效的解决目前结构塌陷的问题。但是为了避免一定量的有机溶液或水仍然残留在器件结构中,往往需要进行脉冲式的多次重复置换,不仅耗时,而且二氧化碳的用量很大。在二氧化碳中加入一些特殊的表面活性剂,当二氧化碳遇到水时,在一定条件下可形成微乳滴,将极大的增加水在二氧化碳中的溶解度。利用液态二氧化碳置换去离子水并用超临界二氧化碳和表面活性剂组成的微乳液体系可以快速、高效的进行干燥。As an environmentally friendly and cheap solvent, carbon dioxide has a supercritical state with close to zero surface tension and high diffusivity, which is very suitable for semiconductor cleaning processes, so the 2006 International Semiconductor Technology Blueprint (ITRS) will supercritical Fluids are regarded as new green solvents that can solve cleaning and drying in semiconductor and MEMS technology. Although the method of replacing the organic solution with liquid carbon dioxide and then entering the supercritical state for drying can effectively solve the current problem of structure collapse. However, in order to avoid a certain amount of organic solution or water still remaining in the device structure, it is often necessary to perform repeated pulse replacement, which is not only time-consuming, but also consumes a large amount of carbon dioxide. Add some special surfactants to carbon dioxide. When carbon dioxide meets water, microemulsion droplets can be formed under certain conditions, which will greatly increase the solubility of water in carbon dioxide. The microemulsion system composed of supercritical carbon dioxide and surfactant can be dried quickly and efficiently by replacing deionized water with liquid carbon dioxide.
因此基于超临界二氧化碳微乳液体系的提出,将是解决这个问题的一条有效途径。Therefore, the proposal based on supercritical carbon dioxide microemulsion system will be an effective way to solve this problem.
发明内容 Contents of the invention
(一)要解决的技术问题(1) Technical problems to be solved
有鉴于此,本发明的主要目的在于提供一种基于超临界二氧化碳微乳液干燥的装置及方法。In view of this, the main purpose of the present invention is to provide a device and method based on supercritical carbon dioxide microemulsion drying.
(二)技术方案(2) Technical solution
为达到上述目的,本发明提供了一种基于超临界二氧化碳微乳液干燥的装置,包括:To achieve the above object, the invention provides a device based on supercritical carbon dioxide microemulsion drying, comprising:
装有表面活性剂的储液罐1和提供高纯二氧化碳的储气罐2,二者分别通过第二增压泵3和第一增压泵4连接于电磁阀5,电磁阀5的另一端连接于反应腔室6的入口;The liquid storage tank 1 that is equipped with surfactant and the gas storage tank 2 that provides high-purity carbon dioxide are connected to the solenoid valve 5 through the
反应腔室6的一个出口管路上通过第一手动阀9连接于观察视窗10,另一个出口管路上通过第一膨胀阀19连接于第二热交换器18;One outlet pipeline of the reaction chamber 6 is connected to the
观察视窗10的出口连接于第一分离器13,在观察视窗10与第一分离器13的连接管路上接有一个第二膨胀阀11和第一热交换器12;第一分离器13的出口连接于第一过滤纯化装置15,第一过滤纯化装置15通过第三增压泵23和第四热交换器24连接于反应腔室6;The outlet of the
第二热交换器18的出口连接于第三分离器17,第三分离器17依次通过第三热交换器21、第二分离器20、冷却装置22、第三增压泵23和第四热交换器24连接于反应腔室6;The outlet of the
第二分离器20的一个出口通过第四手动阀25和第二过滤纯化装置26连接于表面活性剂储罐1。An outlet of the
上述方案中,所述反应腔室6内部固定有可翻转和旋转托盘8,其外部安装有冷循环29系统、加热系统30、温度测量装置27和压力测量装置28。In the above solution, the reaction chamber 6 is fixed with a reversible and rotatable tray 8 inside, and a
上述方案中,所述第三分离器17,其第一端与第二热交换器18的出口连接,第二端通过第三热交换器21与第二分离器20连接,第三端接有第三手动阀16。In the above scheme, the first end of the third separator 17 is connected to the outlet of the
上述方案中,该装置具有一个二氧化碳循环使用系统,包括:In the above scheme, the device has a carbon dioxide recycling system, including:
连接到反应腔室6底部的第一手动阀9,其另一端连接于观察视窗10,观察视窗10的出口连接有第二膨胀阀11和第一热交换器12,从第一热交换器12中出来的二氧化碳流入第一分离器13中,再经过第一过滤纯化装置15通过第三增压泵23和第四热交换器24流入反应腔室6中;The first
连接到反应腔室6底部的第一膨胀阀19,其另一端连接于第二热交换器18,从第二热交换器18中出来的二氧化碳流入第三分离器17中,从第三分离器17中出来的二氧化碳再经第三热交换器21流入第二分离器20中,第二分离器20的另一端连接于冷却装置22,从冷却装置22中出来的二氧化碳通过第三增压泵23和第四热交换器24流入反应腔室6中。The
上述方案中,该装置具有一个表面活性剂循环使用系统,包括:In the above scheme, the device has a surfactant recycling system, comprising:
连接到反应腔室6底部的第一膨胀阀19,其另一端连接于第二热交换器18,第二热交换器18与第三分离器17连接,第三分离器17的顶部出口经第三热交换器21与第二分离器20的入口接通,表面活性剂从第二分离器20的出口再经过第四手动阀25和第二过滤纯化装置26流回表面活性剂储罐1中。The
为达到上述目的,本发明还提供了一种基于超临界二氧化碳微乳液的干燥方法,该方法是利用液态二氧化碳置换去离子水,接着利用基于SCCO2的微乳液对结构图形进行干燥,然后通入纯二氧化碳吹洗。In order to achieve the above object, the present invention also provides a drying method based on supercritical carbon dioxide microemulsion, the method is to utilize liquid carbon dioxide to replace deionized water, then utilize SCCO based on Microemulsion to dry the structure pattern, then pass through Pure carbon dioxide purge.
上述方案中,所述水为去离子水,且使用二氧化碳源纯度达5N以上,表面活性剂的选择不会对结构图形造成损伤。In the above solution, the water is deionized water, and the carbon dioxide source is used with a purity of more than 5N, and the choice of surfactant will not cause damage to the structural pattern.
(三)有益效果(3) Beneficial effects
从上述技术方案可以看出,本发明具有以下有益效果:As can be seen from the foregoing technical solutions, the present invention has the following beneficial effects:
1、本发明提供的这种基于超临界二氧化碳微乳液的干燥装置及方法,超临界二氧化碳由于具有相当低的黏滞系数、高扩散性和可忽略的表面张力等独特性质,对更细微的结构也不会被表面张力及毛细作用的拉力所破坏,因此能够有效的解决干燥过程中结构塌陷的问题,并提供干净和干燥的器件。因此将超临界二氧化碳作为下一代半导体新型绿色清洗和干燥溶剂,不仅减少了有机溶剂的大量使用、保护了环境、降低对能源的消耗,而且符合ITRS的发展趋势。直接用液态二氧化碳置换水溶液,并在超临界二氧化碳微乳液环境中进行干燥,避免了有机溶液和二氧化碳的大量使用,缩短了清洗时间,提高了效率。因此无论从环保问题还是经济效益来说,超临界二氧化碳微乳液体系都有良好的发展和应用前景,有望运用在微电子加工生产线上。1. This drying device and method based on supercritical carbon dioxide microemulsion provided by the present invention, supercritical carbon dioxide has unique properties such as very low viscosity coefficient, high diffusivity and negligible surface tension, and is suitable for finer structures. It will not be damaged by surface tension and capillary pull, so it can effectively solve the problem of structure collapse during drying and provide clean and dry devices. Therefore, using supercritical carbon dioxide as a new green cleaning and drying solvent for next-generation semiconductors not only reduces the use of organic solvents, protects the environment, and reduces energy consumption, but also conforms to the development trend of ITRS. Directly replace the aqueous solution with liquid carbon dioxide, and dry in a supercritical carbon dioxide microemulsion environment, avoiding the use of a large amount of organic solution and carbon dioxide, shortening the cleaning time and improving efficiency. Therefore, whether in terms of environmental protection or economic benefits, the supercritical carbon dioxide microemulsion system has good development and application prospects, and is expected to be used in microelectronics processing production lines.
2、本发明提供的这种基于超临界二氧化碳微乳液的干燥装置及方法,主要利用液态二氧化碳置换水基清洗液,然后加入表面活性剂并加热二氧化碳使其达到超临界态对光刻胶或MEMS中的微结构等进行干燥。该方法由于避免了气液界面的产生和防止了表面张力的作用,可以对高深宽比或多孔结构等进行清洗和干燥而没有损伤。与目前超临界二氧化碳干燥方法相比,该方法不需使用有机溶液,因此不会对光刻胶等造成破坏;而且干燥时间大大降低,可以有效防止图形塌陷的问题。该方法符合国际半导体技术蓝图中有关减少有机溶液消耗和节约能源等要求,并且易与目前的IC工艺兼容。2. The drying device and method based on the supercritical carbon dioxide microemulsion provided by the present invention mainly utilizes liquid carbon dioxide to replace the water-based cleaning solution, then adds a surfactant and heats the carbon dioxide to make it reach a supercritical state for photoresist or MEMS Drying of the microstructure etc. in the Because the method avoids the generation of gas-liquid interface and prevents the effect of surface tension, it can clean and dry high aspect ratio or porous structures without damage. Compared with the current supercritical carbon dioxide drying method, this method does not need to use an organic solution, so it will not cause damage to the photoresist, etc.; and the drying time is greatly reduced, which can effectively prevent the problem of pattern collapse. The method meets the requirements of reducing the consumption of organic solution and saving energy in the international semiconductor technology blueprint, and is easily compatible with the current IC process.
附图说明 Description of drawings
图1是本发明提供的基于超临界二氧化碳微乳液干燥的装置的示意图;Fig. 1 is the schematic diagram of the device based on supercritical carbon dioxide microemulsion drying provided by the present invention;
图2是本发明中液态二氧化碳置换和SCCO2微乳液干燥过程的示意图;Fig. 2 is the schematic diagram of liquid carbon dioxide replacement and SCCO microemulsion drying process among the present invention;
其中,1为表面活性剂储罐,2为二氧化碳储气罐,3为第二增压泵,4为第一增压泵,5为电磁阀,6为反应腔室,7为被干燥样片,8为可翻转和旋转的托盘,9为第一手动阀,10为观察视窗,11为第二膨胀阀,12为第一热交换器,13为第一分离器,14为第二手动阀,15为第一过滤纯化装置,16为第三手动阀,17为第三分离器,18为第二热交换器,19为第一膨胀阀,20为第二分离器,21为第三热交换器,22为冷却装置,23为第三增压泵,24为第四热交换器,25为第四手动阀,26为第二过滤纯化装置;27为温度传感器;28为压力传感器;29为冷循环系统;30为加热系统。Among them, 1 is the surfactant storage tank, 2 is the carbon dioxide gas storage tank, 3 is the second booster pump, 4 is the first booster pump, 5 is the solenoid valve, 6 is the reaction chamber, 7 is the sample to be dried, 8 is a reversible and rotatable tray, 9 is the first manual valve, 10 is the observation window, 11 is the second expansion valve, 12 is the first heat exchanger, 13 is the first separator, 14 is the second manual valve , 15 is the first filter purification device, 16 is the third manual valve, 17 is the third separator, 18 is the second heat exchanger, 19 is the first expansion valve, 20 is the second separator, 21 is the third heat exchanger Exchanger, 22 is a cooling device, 23 is a third booster pump, 24 is a fourth heat exchanger, 25 is a fourth manual valve, 26 is a second filtration and purification device; 27 is a temperature sensor; 28 is a pressure sensor; 29 Is a cold cycle system; 30 is a heating system.
具体实施方式 Detailed ways
为使本发明的目的、技术方案和优点更加清楚明白,以下结合具体实施例,并参照附图,对本发明进一步详细说明。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
如图1所示,图1是本发明提供的基于超临界二氧化碳微乳液干燥的装置的示意图,该装置包括:As shown in Fig. 1, Fig. 1 is the schematic diagram of the device based on supercritical carbon dioxide microemulsion drying provided by the present invention, and this device comprises:
装有表面活性剂的储液罐1和提供高纯二氧化碳的储气罐2,二者分别通过第二增压泵3和第一增压泵4连接于电磁阀5,电磁阀5的另一端连接于反应腔室6的入口;The liquid storage tank 1 that is equipped with surfactant and the gas storage tank 2 that provides high-purity carbon dioxide are connected to the solenoid valve 5 through the
反应腔室6的一个出口管路上通过第一手动阀9连接于观察视窗10,另一个出口管路上通过第一膨胀阀19连接于第二热交换器18;One outlet pipeline of the reaction chamber 6 is connected to the
观察视窗10的出口连接于第一分离器13,在观察视窗10与第一分离器13的连接管路上接有一个第二膨胀阀11和第一热交换器12;第一分离器13的出口连接于第一过滤纯化装置15,第一过滤纯化装置15通过第三增压泵23和第四热交换器24连接于反应腔室6;The outlet of the
第二热交换器18的出口连接于第三分离器17,第三分离器17依次通过第三热交换器21、第二分离器20、冷却装置22、第三增压泵23和第四热交换器24连接于反应腔室6;The outlet of the
第二分离器20的一个出口通过第四手动阀25和第二过滤纯化装置26连接于表面活性剂储罐1。An outlet of the
其中,所述反应腔室6内部固定有可翻转和旋转托盘8,其外部安装有冷循环29系统、加热系统30、温度测量装置27和压力测量装置28。所述第三分离器17,其第一端与第二热交换器18的出口连接,第二端通过第三热交换器21与第二分离器20连接,第三端接有第三手动阀16。Wherein, the inside of the reaction chamber 6 is fixed with a reversible and rotatable tray 8 , and its outside is equipped with a
本发明提供的基于超临界二氧化碳微乳液干燥的装置,具有一个二氧化碳循环使用系统,包括:连接到反应腔室6底部的第一手动阀9,其另一端连接于观察视窗10,观察视窗10的出口连接有第二膨胀阀11和第一热交换器12,从第一热交换器12中出来的二氧化碳流入第一分离器13中,再经过第一过滤纯化装置15通过第三增压泵23和第四热交换器24流入反应腔室6中;连接到反应腔室6底部的第一膨胀阀19,其另一端连接于第二热交换器18,从第二热交换器18中出来的二氧化碳流入第三分离器17中,从第三分离器17中出来的二氧化碳再经第三热交换器21流入第二分离器20中,第二分离器20的另一端连接于冷却装置22,从冷却装置22中出来的二氧化碳通过第三增压泵23和第四热交换器24流入反应腔室6中。The device based on supercritical carbon dioxide microemulsion drying provided by the present invention has a carbon dioxide recycling system, including: the first
本发明提供的基于超临界二氧化碳微乳液干燥的装置,还具有一个表面活性剂循环使用系统,包括:连接到反应腔室6底部的第一膨胀阀19,其另一端连接于第二热交换器18,第二热交换器18与第三分离器17连接,第三分离器17的顶部出口经第三热交换器21与第二分离器20的入口接通,表面活性剂从第二分离器20的出口再经过第四手动阀25和第二过滤纯化装置26流回表面活性剂储罐1中。The device based on supercritical carbon dioxide microemulsion drying provided by the present invention also has a surfactant recycling system, including: the
再次参照图1,本发明提供的基于超临界二氧化碳微乳液干燥的装置中各部件的连接关系为:表面活性剂储罐1的出口通过第二增压泵3连接到电磁阀5的一端;二氧化碳储罐2的出口通过第一增压泵4连接到电磁阀5的一端;电磁阀5的另一端与反应腔室6的入口端相连;被干燥的样片7被固定在可旋转和翻转的托盘8上;反应腔室6的出口位于底部,通过第一手动阀9与观察视窗10连接;观察视窗10的出口连接到第二膨胀阀11,然后经第一热交换器12与第一分离器13的入口相连,其底部出口接有第二手动阀14;第一分离器13的顶部出口连接第一过过滤纯化装置15,然后与第三增压泵23的入口连接;第三增压泵23的出口经由第四热交换器24连接到反应腔室6;反应腔室6的另一个出口通过第一膨胀阀19和第二热交换器18与第三分离器17的入口连通;第三分离器17中的废液通过第三手动阀16排出,其顶部出口经第三热交换器21连接到第二分离器20的进口;第二分离器20的顶部出口通过冷却装置22与第三增压泵23连接,然后经第四热交换器24与电磁阀5连接;第二分离器20的底部出口连接在一起经第四手动阀25和第二过过滤纯化装置26与表面活性剂储罐1连通;温带传感器27位于反应腔室6的顶部,压力传感器28位于反应腔室6的顶部;冷循环系统29缠绕在反应腔室6的外壁,加热系统30固定在反应腔室6的外部。Referring again to Fig. 1, the connection relation of each part in the device based on supercritical carbon dioxide microemulsion drying provided by the present invention is: the outlet of surfactant storage tank 1 is connected to an end of solenoid valve 5 by the
结合图1,本发明提供的基于超临界二氧化碳微乳液干燥的装置中各部件的作用分别为:第一、第二和第三增压泵用来将反应物泵入腔室并对腔室加压;温带传感器27用来实时测量和显示反应腔室6内的温度;压力传感器28用来实时测量和显示反应腔室6内的压力;托盘8设计成可旋转和翻转是为了使被干燥样片7中大部分的水在机械力的作用下脱离硅片;冷循环系统29是用来给反应腔室6制冷从而维持进入的二氧化碳为液态;加热系统30是用来给反应腔室6进行加热从而使二氧化碳达到超临界态;观察视窗10的作用是用来观察置换是否完全;膨胀阀的作用是使高压中温物质变成低温低压状态;第一、第二、第三和第四热交换器进一步增强气液分离;第一、第二和第三分离器实现气液分离并收集液态物质;冷却装置22用来对气态二氧化碳制冷,使其变为液态;第一和第二过滤纯化装置用来对需要循环使用的物质进行过滤和提纯。In conjunction with Fig. 1, the effect of each part in the device based on supercritical carbon dioxide microemulsion drying that the present invention provides is respectively: the first, the second and the 3rd booster pump are used for pumping the reactant into the chamber and adding to the chamber pressure; the
如图2所示,图2是本发明中液态二氧化碳置换和SCCO2微乳液干燥过程的示意图,该基于SCCO2微乳液体系的干燥过程为:将腐蚀后的结构或图形放入反应腔室中的硅片卡盘上,并用去离子水浸没,防止出现气液界面。然后将反应腔室密封并制冷,使温度达到5℃,压力维持在4MPa,该过程可以通过温度和压力传感器进行实时测量和显示;此时进入腔室的二氧化碳为液体,其密度为0.893g/cm3,小于水的密度,因此液态二氧化碳从反应腔室的上部泵入腔室。因为水在纯液态二氧化碳中的溶解度很小,易被液态二氧化碳置换;在反应过程中,每隔一定时间,就将第一手动阀缓慢打开,使观察视窗充满混合液体,并根据视窗中混合液态的界面位置来分析置换是否充分;视窗中的混合液体通过膨胀阀和热交换器排入第一分离器中;第一分离器中的气态二氧化碳通过过滤纯化器进行过滤和提纯后,由增压泵加压注入到腔室中进行循环利用;第一分离器中的废液可以通过第二手动阀被排出;当置换结束后,硅片就被液态二氧化碳所浸没,此时打开第二增压泵,加入表面活性剂,然后关闭冷循环系统,打开加热系统,对反应腔室加热;当二氧化碳达到超临界态后,将盛放硅片的托盘倒转,同时进行旋转,让覆盖在硅片表面的大部分水在离心力的作用下离开硅片表面,小部分水则由于表面活性剂的作用会在SCCO2中形成微乳滴,对硅片进行干燥;干燥一段时间后,通入气态纯二氧化碳,将腔室中的SCCO2微乳液通过膨胀阀排放到第三分离器和第二分离器中;第三分离器中的废液可以通过第三手动阀的控制排出;从第三分离器和第二分离器中分离出来的气态二氧化碳经冷却器制冷后变为液态,最终由增压泵注入反应腔室进行循环使用;第二分离器中的表面活性剂可以由过滤纯化装置提纯过滤进行循环使用。干燥结束后,将腔室泄压至常压,在泄压过程中需要保证腔室温度始终大于临界温度;然后可将最样片取出进行后续分析。最后将分离器中的水等废液排出。As shown in Figure 2, Figure 2 is a schematic diagram of liquid carbon dioxide replacement and SCCO2 microemulsion drying process in the present invention, the drying process based on SCCO2 microemulsion system is: put the corroded structure or figure into the reaction chamber on a silicon wafer chuck and submerged in deionized water to prevent the occurrence of an air-liquid interface. Then the reaction chamber is sealed and refrigerated so that the temperature reaches 5°C and the pressure is maintained at 4MPa. This process can be measured and displayed in real time through temperature and pressure sensors; at this time, the carbon dioxide entering the chamber is a liquid with a density of 0.893g/ cm 3 , less than the density of water, so liquid carbon dioxide is pumped into the chamber from the upper part of the reaction chamber. Because the solubility of water in pure liquid carbon dioxide is very small, it is easy to be replaced by liquid carbon dioxide; The position of the interface to analyze whether the replacement is sufficient; the mixed liquid in the window is discharged into the first separator through the expansion valve and the heat exchanger; the gaseous carbon dioxide in the first separator is filtered and purified by the filter purifier, and then the The pump pressurizes and injects into the chamber for recycling; the waste liquid in the first separator can be discharged through the second manual valve; Press the pump, add the surfactant, then close the cold circulation system, turn on the heating system, and heat the reaction chamber; when the carbon dioxide reaches the supercritical state, turn the tray containing the silicon wafer upside down and rotate it at the same time, so that the silicon wafer is covered Most of the water on the surface leaves the surface of the silicon wafer under the action of centrifugal force, and a small part of the water will form microemulsion droplets in SCCO 2 due to the action of the surfactant, and dry the silicon wafer; after drying for a period of time, the gaseous pure Carbon dioxide, the SCCO 2 microemulsion in the chamber is discharged into the third separator and the second separator through the expansion valve; the waste liquid in the third separator can be discharged through the control of the third manual valve; from the third separator The gaseous carbon dioxide separated from the second separator becomes liquid after cooling by the cooler, and finally injected into the reaction chamber by the booster pump for recycling; the surfactant in the second separator can be purified and filtered by the filtration purification device recycle. After drying, the chamber is depressurized to normal pressure. During the decompression process, it is necessary to ensure that the temperature of the chamber is always greater than the critical temperature; then the final sample can be taken out for subsequent analysis. Finally, the waste liquid such as water in the separator is discharged.
以上所述的具体实施例,对本发明的目的、技术方案和有益效果进行了进一步详细说明,所应理解的是,以上所述仅为本发明的具体实施例而已,并不用于限制本发明,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The specific embodiments described above have further described the purpose, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above descriptions are only specific embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.
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