CN102252747A - Micro sound pressure sensor with bionic cricket cilia structure and manufacturing method thereof - Google Patents
Micro sound pressure sensor with bionic cricket cilia structure and manufacturing method thereof Download PDFInfo
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- CN102252747A CN102252747A CN 201110154934 CN201110154934A CN102252747A CN 102252747 A CN102252747 A CN 102252747A CN 201110154934 CN201110154934 CN 201110154934 CN 201110154934 A CN201110154934 A CN 201110154934A CN 102252747 A CN102252747 A CN 102252747A
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Abstract
The invention discloses a micro sound pressure sensor with a bionic cricket cilia structure and a manufacturing method thereof, belonging to the field of microelectromechanical systems (MEMS). The cricket cilia structure 1 of the sensor is positioned above a sensitive membrane 2 connected to an annular fixed structure 4 through a supporting beam 3; and the sensitive membrane 2 and two detection electrodes 5 on a glass substrate 6 form a flat type capacitor structure. When a foreign sound excites, the bionic cricket cilia structure 1 bends and deforms to drive the sensitive membrane 2 to move up and down, so that the capacitance between the sensitive membrane 2 and the two detection electrodes 5 changes, so as to detect the size of the sound pressure generated under the exciting of the foreign sound. The cilia structure 1 of the sensor disclosed by the invention has the advantages of high strength and large depth-to-width ratio and overcomes the defects of insufficient cilia stiffness and weak sensitivity of an acoustic sensor caused by SU-8 photoresist in the conventional method. The sensor can be used in the field of monitoring of moving targets in the sea, at the low altitude and on the ground.
Description
Affiliated field
The invention belongs to MEMS (micro electro mechanical system) (MEMS) field, relate in particular to a kind of miniature imitative cricket ciliary structures sound pressure sensor.
Background technology
The acoustic sounding location technology in the ocean, there is important use in the monitoring field of low latitude and ground moving object.Sound pressure sensor is the Primary Component that underwater sound signal receives in the passive acoustic detection device, and the sound pressure sensor volume of traditional mechanical processing and manufacturing is big, the frequency of operation height, and sensitivity is low.In order to improve Target Detection Ability of Infrared, must reduce the frequency of operation of sound pressure sensor, expand bandwidth of operation, improve receiving sensitivity and reduce volume and weight, the raising that develops into the sound pressure sensor sensitivity behaviour and the microminiaturization of MEMS technology provide the important techniques means, increased the number of sound pressure sensor array in the unit area, reduced the spacing between the sound pressure sensor in the array, improved the directive property of sound pressure sensor low frequency signal.
The sound pressure sensor (MEMS based hair flow-sensors as model systems for acoustic perception studies) of the imitative cricket cercus ciliary structures of people's developments such as the Holland Krijnen of Twente University, adopt capacitive detection principle, on the sensitive diaphragm by twice spin coating SU-8 photoresist, exposure imaging after, form imitative cricket ciliary structures, because its imitative cricket ciliary structures adopts the SU-8 photoresist to make, ratio of rigidity is lower, causes sound pressure sensor sensitivity not high.
Summary of the invention
Low in order to overcome the rigidity that has ciliary structures in the sound pressure sensor of imitating cricket cercus ciliary structures now, the shortcoming that sensitivity is not high, also in order to reduce the volume of sensor component, the present invention proposes a kind of new miniature imitative cricket ciliary structures sound pressure sensor and preparation method thereof simultaneously.
Technical scheme of the present invention is, a kind of miniature imitative cricket ciliary structures sound pressure sensor comprises imitative cricket ciliary structures 1, sensitive diaphragm 2, brace summer 3, annular fixed sturcture 4, two detecting electrodes 5 and substrate of glass 6.Imitative cricket ciliary structures 1 is positioned at the top of sensitive diaphragm 2 and is connected as a single entity with it, and sensitive diaphragm 2 is connected on the annular fixed sturcture 4 by two brace summers 3, and has gap 9 between sensitive diaphragm 2 and the annular fixed sturcture 4; Fixed sturcture 4 and sputter have substrate of glass 6 anode linkages of two detecting electrodes 5, make between sensitive diaphragm 2 and two detecting electrodes 5 and form the flat capacitor structure by certain interval, detect the vibration displacement of sensitive diaphragm 2.The metal lead wire of two detecting electrodes 5 is drawn from the wire guide 7 on the fixed sturcture 4, links to each other with extraneous power supply.
Do the time spent as external sound stimulation, the imitative cricket ciliary structures 1 that is positioned on the sensitive diaphragm 2 occurs bending and deformation, drive sensitive diaphragm 2 and produce upper and lower displacements, make that the electric capacity between sensitive diaphragm 2 and two detecting electrodes 5 changes, detect the acoustic pressure size of external sound stimulation with this.
The method for making of described miniature imitative cricket ciliary structures sound pressure sensor comprises the steps:
Step 1: selection standard cleans the twin polishing silicon chip, applies photoresist 8 at the silicon chip back side, and photoetching is developed, and the annular fixed sturcture 4 on the mask is transferred to the silicon chip back side.
Step 2: high-density plasma (ICP) the etching certain depth silicon chip back side, form spacing and wire guide 7 between annular fixed sturcture 4, capacity plate antenna pole plate, remove photoresist 8.
Step 3: apply photoresist 8 once more at the silicon chip back side, photoetching is developed, and the sensitive diaphragm on the mask 2 is transferred to the silicon chip back side.
The step 4:ICP etching silicon chip back side forms sensitive diaphragm 2 lower surfaces, and the gap 9 between sensitive diaphragm 2 and the fixed sturcture 4, and removes photoresist 8.
Step 5: at substrate of glass 6 front splash-proofing sputtering metals, resist coating 8, photoetching development, the etching metal forms two detecting electrodes 5.
Step 6: anode linkage is carried out at the silicon chip back side of step 4 and substrate of glass 6 fronts of step 5.
Step 7: apply photoresist 8 on the silicon chip front, photoetching is developed, and imitative cricket ciliary structures 1 figure transfer on the mask is arrived the silicon chip front.
Step 8:ICP etching silicon chip front forms imitative cricket ciliary structures 1 and sensitive diaphragm 2 upper surfaces, removes photoresist 8, finishes the making of miniature imitative cricket ciliary structures sound pressure sensor.
Description of drawings
Fig. 1 is the miniature imitative cricket ciliary structures sound pressure sensor three-dimensional structure synoptic diagram that the present invention proposes
Fig. 2 is the miniature imitative cricket ciliary structures sound pressure sensor process flow diagram that the present invention proposes
Among the figure: 1-imitates the cricket ciliary structures, 2-sensitive diaphragm, 3-brace summer, 4-annular fixed sturcture, two detecting electrodes of 5-, 6-substrate of glass, 7-wire guide, 8-photoresist, 9-gap
Specific implementation method
Consult Fig. 1, the miniature imitative cricket ciliary structures sound pressure sensor in the present embodiment comprises imitative cricket ciliary structures 1, sensitive diaphragm 2, brace summer 3, fixed sturcture 4, two detecting electrodes 5 and substrate of glass 6; Imitative cricket ciliary structures 1 is positioned at the top of sensitive diaphragm 2 and is connected as a single entity with it, and the diameter of imitative cricket ciliary structures 1 is 500nm, and length is 10 μ m; Sensitive diaphragm 2 is connected on the annular fixed sturcture 4 by two brace summers 3, and has 20 μ m gaps 9 between sensitive diaphragm 2 and the annular fixed sturcture 4; Annular fixed sturcture 4 and sputter have substrate of glass 6 anode linkages of two detecting electrodes 5, make between sensitive diaphragm 2 and two detecting electrodes 5 and form the flat capacitor structure by certain interval, detect the vibration displacement of sensitive diaphragm 2.The metal lead wire of two detecting electrodes 5 is drawn from the wire guide 7 on the fixed sturcture 4, links to each other with extraneous power supply.
Do the time spent as external sound stimulation, the imitative cricket ciliary structures that is positioned on the sensitive diaphragm can occur bending and deformation, drive sensitive diaphragm and produce upper and lower displacement, make that the electric capacity between sensitive diaphragm and the glass electrode changes, detect the acoustic pressure size of external sound stimulation with this.
The method for making of described miniature imitative cricket ciliary structures sound pressure sensor comprises the steps:
Step 1: select for use＜100〉crystal orientation, thickness 200 μ m twin polishing silicon chips.In temperature is 120 ℃, volume ratio is to boil in 4: 1 98% concentrated sulphuric acid and 30% superoxol to boil 30 minutes, (volume ratio is 1: 1: 5 28% ammoniacal liquor, 30% hydrogen peroxide and a water to be placed on alkaline hydrogen peroxide solution then respectively, 75 ℃) and acid superoxol (volume ratio is 1: 1: 5 36% hydrochloric acid, 30% hydrogen peroxide and a water, 75 ℃) the middle immersion 10 minutes, with deionized water silicon chip is rinsed well and dried at last, finish the silicon chip standard cleaning.Apply photoresist 8, photoetching is developed, and the annular fixed sturcture 4 on the mask is transferred to the silicon chip lower surface, shown in Fig. 2 (a).
Step 2: with photoresist 8 is mask, high-density plasma (ICP) the etching silicon chip back side, and etching depth is 5 μ m, form annular fixed sturcture 4, and wire guide 7, on this moment capacity plate antenna between bottom crown spacing be 5 μ m, remove photoresist 8 at last, as Fig. 2 (b).
Step 3: apply photoresist 8 once more at the silicon chip back side, photoetching is developed, and the sensitive diaphragm on the mask 2 is transferred to the silicon chip back side, as Fig. 2 (c).
Step 4: with photoresist 8 is mask, the ICP etching silicon chip back side, and etching depth is 3 μ m, form the gap 9 between sensitive diaphragm 2 and the fixed sturcture 4, and sensitive diaphragm 2 lower surfaces, this moment, the thickness of sensitive diaphragm 2 was 3 μ m, remove photoresist 8 at last, as Fig. 2 (d).
Step 5: at substrate of glass 6 upper surface sputter 300nm metallic aluminiums, resist coating 8, photoetching is developed, and is mask with photoresist 8, and the etching metallic aluminium forms two detecting electrodes 5, as Fig. 2 (e).
Step 6: anode linkage is carried out at the silicon chip back side of step 4 and substrate of glass 6 fronts of step 5, as Fig. 2 (f).
Step 7: apply photoresist 8 on the silicon chip front, photoetching is developed, and imitative cricket ciliary structures 1 figure transfer on the mask is arrived the silicon chip front, as Fig. 2 (g).
Step 8: with photoresist 8 is mask, ICP etching silicon chip front, etching depth is 195 μ m, form imitative cricket ciliary structures 1 and sensitive diaphragm 2 upper surfaces, ciliary structures 1 length is 195 μ m, and sensitive diaphragm 2 thickness are 5 μ m, remove photoresist 8 at last, finish the making of miniature imitative cricket ciliary structures sound pressure sensor, as Fig. 2 (h).
Claims (2)
1. a miniature imitative cricket ciliary structures sound pressure sensor is characterized in that: comprise imitative cricket ciliary structures (1), sensitive diaphragm (2), brace summer (3), annular fixed sturcture (4), two detecting electrodes (5) and substrate of glass (6).Imitative cricket ciliary structures (1) is positioned at the top of sensitive diaphragm (2) and is connected as a single entity with it, and sensitive diaphragm (2) is connected on the annular fixed sturcture (4) by two brace summers (3), and has gap (9) between sensitive diaphragm (2) and the annular fixed sturcture (4); Fixed sturcture (4) and sputter have substrate of glass (6) anode linkage of two detecting electrodes (5), make between sensitive diaphragm (2) and two detecting electrodes (5) and form the flat capacitor structure by certain interval, detect the vibration displacement of sensitive diaphragm (2).The metal lead wire of two detecting electrodes (5) is drawn from the wire guide (7) on the fixed sturcture (4), links to each other with extraneous power supply.
2. the method for making of a miniature imitative cricket ciliary structures sound pressure sensor as claimed in claim 1 is characterized in that, comprises the steps:
Step 1: selection standard cleans the twin polishing silicon chip, applies photoresist (8) at the silicon chip back side, and photoetching is developed, and the annular fixed sturcture (4) on the mask is transferred to the silicon chip back side.
Step 2: high-density plasma (ICP) the etching certain depth silicon chip back side, form annular fixed sturcture (4), spacing between the capacity plate antenna pole plate, and wire guide (7) are removed photoresist (8).
Step 3: apply photoresist (8) once more at the silicon chip back side, photoetching is developed, and the sensitive diaphragm on the mask (2) is transferred to the silicon chip back side.
The step 4:ICP etching silicon chip back side forms sensitive diaphragm (2) lower surface, and the gap (9) between sensitive diaphragm (2) and the fixed sturcture (4), and removes photoresist (8).
Step 5: at substrate of glass (6) front splash-proofing sputtering metal, resist coating (8), photoetching development, the etching metal forms two detecting electrodes (5).
Step 6: anode linkage is carried out at the silicon chip back side of step 4 and substrate of glass (6) front of step (5).
Step 7: apply photoresist (8) on the silicon chip front, photoetching is developed, with the imitative cricket ciliary structures 1 on the mask) figure transfer is to the silicon chip front.
Step 8:ICP etching silicon chip front forms imitative cricket ciliary structures (1) and sensitive diaphragm (2) upper surface, removes photoresist 8, finishes the making of miniature imitative cricket ciliary structures sound pressure sensor.
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102620814A (en) * | 2012-03-30 | 2012-08-01 | 中北大学 | Orange-peel encapsulating structure for bionic vector hydrophone of micro-electro-mechanical system |
| CN104764521A (en) * | 2015-03-20 | 2015-07-08 | 西北工业大学 | High-sensitivity micro-vibration detecting method |
| CN108069385A (en) * | 2017-11-30 | 2018-05-25 | 中国电子科技集团公司第三研究所 | A kind of particle plane vibration speed measurement sensitive structure and preparation method |
| CN109060108A (en) * | 2018-07-02 | 2018-12-21 | 中国电子科技集团公司第三研究所 | A kind of low frequency sound field particle vibration velocity sensitive structure and preparation method |
| CN111595381A (en) * | 2020-05-29 | 2020-08-28 | 上海交通大学 | Bionic cilium capacitive micro-sensor with back lead and preparation method thereof |
| CN111609887A (en) * | 2020-05-29 | 2020-09-01 | 上海交通大学 | Flexible polymer closed membrane bionic cilium micro-sensor and preparation method thereof |
| CN111762751A (en) * | 2020-07-06 | 2020-10-13 | 瑞声声学科技(深圳)有限公司 | MEMS conductive piece and preparation method of conductive coating |
| CN112978670A (en) * | 2021-02-19 | 2021-06-18 | 上海交通大学 | Torsion type bionic cilium flow velocity sensor device |
| CN113029321A (en) * | 2021-02-26 | 2021-06-25 | 中国兵器工业集团第二一四研究所苏州研发中心 | Capacitive MEMS vector acoustic wave sensor capable of inhibiting vibration interference and processing method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102620814A (en) * | 2012-03-30 | 2012-08-01 | 中北大学 | Orange-peel encapsulating structure for bionic vector hydrophone of micro-electro-mechanical system |
| CN102620814B (en) * | 2012-03-30 | 2013-10-30 | 中北大学 | Orange-peel encapsulating structure for bionic vector hydrophone of micro-electro-mechanical system |
| CN104764521A (en) * | 2015-03-20 | 2015-07-08 | 西北工业大学 | High-sensitivity micro-vibration detecting method |
| CN104764521B (en) * | 2015-03-20 | 2017-12-05 | 西北工业大学 | A kind of high sensitivity micro-vibration detection method |
| CN108069385A (en) * | 2017-11-30 | 2018-05-25 | 中国电子科技集团公司第三研究所 | A kind of particle plane vibration speed measurement sensitive structure and preparation method |
| CN108069385B (en) * | 2017-11-30 | 2019-08-23 | 中国电子科技集团公司第三研究所 | A kind of particle plane vibration speed measurement sensitive structure and preparation method |
| CN109060108A (en) * | 2018-07-02 | 2018-12-21 | 中国电子科技集团公司第三研究所 | A kind of low frequency sound field particle vibration velocity sensitive structure and preparation method |
| CN109060108B (en) * | 2018-07-02 | 2020-11-06 | 中国电子科技集团公司第三研究所 | Low-frequency sound field particle vibration velocity sensitive structure and preparation method thereof |
| CN111609887A (en) * | 2020-05-29 | 2020-09-01 | 上海交通大学 | Flexible polymer closed membrane bionic cilium micro-sensor and preparation method thereof |
| CN111595381A (en) * | 2020-05-29 | 2020-08-28 | 上海交通大学 | Bionic cilium capacitive micro-sensor with back lead and preparation method thereof |
| CN111762751A (en) * | 2020-07-06 | 2020-10-13 | 瑞声声学科技(深圳)有限公司 | MEMS conductive piece and preparation method of conductive coating |
| WO2022006957A1 (en) * | 2020-07-06 | 2022-01-13 | 瑞声声学科技(深圳)有限公司 | Mems conductive member and preparation method for conductive coatings |
| CN112978670A (en) * | 2021-02-19 | 2021-06-18 | 上海交通大学 | Torsion type bionic cilium flow velocity sensor device |
| CN112978670B (en) * | 2021-02-19 | 2023-12-26 | 上海交通大学 | Torsion bionic cilia flow velocity sensor device |
| CN113029321A (en) * | 2021-02-26 | 2021-06-25 | 中国兵器工业集团第二一四研究所苏州研发中心 | Capacitive MEMS vector acoustic wave sensor capable of inhibiting vibration interference and processing method thereof |
| CN113029321B (en) * | 2021-02-26 | 2023-08-04 | 中国兵器工业集团第二一四研究所苏州研发中心 | Capacitive MEMS vector acoustic wave sensor capable of inhibiting vibration interference and processing method thereof |
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Application publication date: 20111123 |