CN102220133B - Stripping solution of titanium carbide and/or titanium nitride film and stripping method - Google Patents
Stripping solution of titanium carbide and/or titanium nitride film and stripping method Download PDFInfo
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- CN102220133B CN102220133B CN201010150010.5A CN201010150010A CN102220133B CN 102220133 B CN102220133 B CN 102220133B CN 201010150010 A CN201010150010 A CN 201010150010A CN 102220133 B CN102220133 B CN 102220133B
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- nitride film
- titanium
- titanium nitride
- acid
- stripping
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- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 title claims abstract description 52
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 15
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000002253 acid Substances 0.000 claims abstract description 20
- -1 alcohol amine organic compound Chemical class 0.000 claims abstract description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000007864 aqueous solution Substances 0.000 claims abstract description 4
- 150000003839 salts Chemical class 0.000 claims abstract description 4
- 150000007524 organic acids Chemical class 0.000 claims abstract description 3
- 239000007788 liquid Substances 0.000 claims description 51
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- 229960004418 trolamine Drugs 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 7
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 4
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 239000004202 carbamide Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 3
- 229910021645 metal ion Inorganic materials 0.000 claims description 3
- 239000011707 mineral Substances 0.000 claims description 3
- 235000010755 mineral Nutrition 0.000 claims description 3
- RPAJSBKBKSSMLJ-DFWYDOINSA-N (2s)-2-aminopentanedioic acid;hydrochloride Chemical compound Cl.OC(=O)[C@@H](N)CCC(O)=O RPAJSBKBKSSMLJ-DFWYDOINSA-N 0.000 claims description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 2
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- LCKIEQZJEYYRIY-UHFFFAOYSA-N Titanium ion Chemical compound [Ti+4] LCKIEQZJEYYRIY-UHFFFAOYSA-N 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 2
- 239000004310 lactic acid Substances 0.000 claims description 2
- 235000014655 lactic acid Nutrition 0.000 claims description 2
- 150000002894 organic compounds Chemical class 0.000 claims description 2
- 239000004033 plastic Substances 0.000 claims description 2
- 229920003023 plastic Polymers 0.000 claims description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 239000011775 sodium fluoride Substances 0.000 claims description 2
- 235000013024 sodium fluoride Nutrition 0.000 claims description 2
- 229910001495 sodium tetrafluoroborate Inorganic materials 0.000 claims description 2
- 239000000243 solution Substances 0.000 abstract description 12
- 238000005260 corrosion Methods 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 3
- 239000003112 inhibitor Substances 0.000 abstract 2
- 150000007522 mineralic acids Chemical class 0.000 abstract 1
- 150000003585 thioureas Chemical class 0.000 abstract 1
- 239000008367 deionised water Substances 0.000 description 9
- 229910021641 deionized water Inorganic materials 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 7
- 238000000576 coating method Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 235000006708 antioxidants Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000003204 osmotic effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/08—Iron or steel
- C23G1/086—Iron or steel solutions containing HF
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Detergent Compositions (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The invention provides a stripping solution of titanium carbide and/or titanium nitride films, which is an aqueous solution comprising an acid, an accelerator, a promoter and a corrosion inhibitor, wherein the acid is an organic acid or an inorganic acid, and has an acid concentration of 90-1000 g/L; the accelerator is an acid or a salt containing a fluoride ion, and has a concentration of 70-500 g/L; the promoter is an alcohol amine organic compound, and has a concentration of 15-200 g/L; the corrosion inhibitor is one of or a combination of more than one of thiourea and thiourea derivatives, and has a concentration of 2-8 g/L. The invention also provides a stripping method of the titanium carbide and/or titanium nitride film, and the method comprises the contact of the titanium carbide and/or titanium nitride film and a stripping solution, wherein the stripping solution is the stripping solution provided by the invention.
Description
Technical field
The present invention relates to a kind of method that strips the solution of substrate surface titanium carbide and/or titanium nitride film and utilize this solution stripping titanium carbide and/or titanium nitride film.
Background technology
Coating process has a wide range of applications at industrial circle.Yet, conventionally in following two kinds of situations, need plated film to strip: (1), after life-time service, the plated film of workpiece surface has been damaged or serious aging, thereby need to remove coating, again plating; (2) aborning, the coating of institute's plating does not meet quality requirements, for reducing the loss, cost-saving, need to return coating, allows the workpiece plated film again of doing over again.Therefore, how, in the situation that not damaging base material, it is a major issue industrial production that coating is removed completely from substrate surface.
Titanium carbide (TiC) and titanium nitride (TiN) rete have very strong anti-oxidant, erosion resistance, and hardness is high, toughness is strong, and chemical stability is good, and wear resisting property is good, at industrial circle, has broad prospects.But, also do not have at present a kind of can be in the situation that not damaging base material, stable, effectively to strip titanium carbide and/or titanium nitride film solution and method.
Summary of the invention
In view of this, be necessary to provide a kind of not easy damaged base material, and can stablize, effectively strip the stripping liquid of titanium carbide and/or titanium nitride film.
In addition, be also necessary to provide a kind of method of using above-mentioned stripping liquid stripping titanium carbide and/or titanium nitride film.
And/or a stripping liquid for titanium nitride film, this stripping liquid is the aqueous solution, and this stripping liquid is comprised of acid and accelerator, promotor, inhibiter and water, and wherein said acid is organic acid or mineral acid, and this sour concentration is 90～1000g/L; This accelerator is in order to promote the dissolving of metal ion in titanium carbide and/or titanium nitride film, the acid that this accelerator is fluoride ion or salt, and the concentration of this accelerator is 70～500g/L; This promotor strips hydrionic seepage velocity in liquid in order to quickening, the alcamines organic compound that this promotor being can be combined with titanium ion, and the concentration of this promotor is 15～200g/L; This inhibiter is the derivative of thiocarbamide, thiocarbamide and one or several the combination in urea, and the concentration of this inhibiter is 2～8g/L.
And/or a stripping method for titanium nitride film, comprise titanium carbide and/or titanium nitride film are contacted with stripping liquid, wherein this stripping liquid is above-mentioned stripping liquid of the present invention.
Compared to prior art, after the stripping liquid of described titanium carbide and/or titanium nitride film and the stripping method of titanium carbide and/or titanium nitride film make to move back film, substrate surface is not corroded, and can stablize, effectively strip titanium carbide and/or titanium nitride film.
Embodiment
Stripping liquid of the present invention is applicable to titanium carbide and/or the titanium nitride film that stripping is formed at substrate surface.Titanium carbide of the present invention and/or titanium nitride film comprise the rete being formed by titanium carbide, the rete being formed by titanium nitride and the rete jointly being formed by titanium carbide and titanium nitride.Described base material comprises ferrous alloy, copper, copper alloy and plastics.
Stripping liquid of the present invention is the aqueous solution that contains acid and accelerator, promotor and inhibiter.Wherein said acid can be that hydrionic organic acid or mineral acid can be provided, and for example, can, for one or more the mixture in the acid such as sulfuric acid, acetic acid, citric acid and lactic acid, be preferably sulfuric acid.This sour concentration can be 90～1000g/L, is preferably 90～750g/L.
Described accelerator works to promote that in titanium carbide and/or titanium nitride film, metal ion dissolves.This accelerator can be the compounds such as the acid of fluoride ion or salt, such as can, for one or several the mixture in the compounds such as hydrofluoric acid, ammonium bifluoride, Sodium Fluoride, Potassium monofluoride, Sodium tetrafluoroborate and sodium fluozirconate, being preferably hydrofluoric acid and/or ammonium bifluoride.The concentration of accelerator can be 70～500g/L, is preferably 75～300g/L.
Described promotor is risen and is reduced solution interface tension force in stripping liquid, and auxiliary rete dissolves, and promotes the effect of hydrogen ion rapid osmotic.This promotor is the compound that can be combined with titanium in alcamines organism, and as trolamine, Monoethanolamine MEA BASF and diethanolamine etc., it can, for one or more the mixture in above compound, be preferably trolamine.The concentration of promotor is 15～200g/L, is preferably 30～80g/L.
Described inhibiter plays protection base material and avoids sour corrosion in stripping liquid.Inhibiter can, for the derivative of thiocarbamide, thiocarbamide and one or several the mixture in urea, be preferably thiocarbamide and derivative thereof.The concentration of inhibiter is 2～8g/L, is preferably 3～5g/L.
This stripping liquid can be by making above-mentioned acid, accelerator, promotor and inhibiter are water-soluble.
Utilize titanium carbide on above-mentioned stripping liquid stripping base material and/or the method for titanium nitride film to comprise, the base material that is formed with titanium carbide and/or titanium nitride film is contacted with this stripping liquid, so that this titanium carbide and/or titanium nitride film strip completely.The described way of contact comprises soaks and spray.The temperature that strips liquid during contact is 20～30 ℃, and be 0.5～2 hour duration of contact.Base material washs base material and is dried after contacting with stripping liquid.
Below by embodiment, the present invention is described in more detail.
Embodiment 1
1. preparation strips liquid
Get the deionized water of 500ml, to adding 50ml weight concentration in deionized water, be 98% sulfuric acid, add again 5g thiocarbamide, after being stirred to thiocarbamide and dissolving completely, adding 200ml weight percent concentration is that 40% hydrofluoric acid solution and 50ml weight percent concentration are 80% trolamine, finally mending deionized water, to make liquor capacity be 1000ml, obtains stripping liquid.In this stripping liquid, the concentration of sulfuric acid is 90.16g/L, and the concentration of hydrofluoric acid is 90.4g/L, and the concentration of trolamine is 40.8g/L.
2. strip titanium carbide and/or titanium nitride film
Get sample that stainless steel substrate surface is formed with titanium carbide and/or titanium nitride film several, the thickness of this titanium carbide and/or titanium nitride film is approximately 2 μ m.Sample is immersed in completely in the stripping liquid of above-mentioned preparation of 25 ℃ and soaks 1.5 hours, stripping titanium carbide and/or titanium nitride film.Take out sample, water cleans up post-drying.
Embodiment 2
1. preparation strips liquid
Get the deionized water of 500ml, to adding 55ml weight concentration in deionized water, be 98% sulfuric acid, add again 5g thiocarbamide, after being stirred to thiocarbamide and dissolving completely, adding 175ml weight percent concentration is the triethanolamine solution that 40% hydrofluoric acid solution and 55ml weight percent concentration are 80%, finally mending deionized water, to make liquor capacity be 1000ml, obtains stripping liquid.In this stripping liquid, the concentration of sulfuric acid is 99.18g/L, and the concentration of hydrofluoric acid is 79.11g/L, and the concentration of trolamine is 44.88g/L.
2. strip rete
Get sample that stainless steel substrate surface is formed with titanium carbide and/or titanium nitride film several, the thickness of this titanium carbide and/or titanium nitride film is approximately 1.5 μ m.Sample is immersed in completely in the stripping liquid of the above-mentioned preparation under room temperature and soaks 1 hour, stripping titanium carbide and/or titanium nitride film.Take out sample, water cleans up post-drying.
Embodiment 3
1. preparation strips liquid
Get the deionized water that 500ml temperature is 50 ℃ of left and right, 400g ammonium bifluoride and 5g thiocarbamide are dissolved in deionized water, then adding 400ml weight percent concentration is the triethanolamine solution that 36% acetum and 20ml weight percent concentration are 80%, add again deionized water and make liquor capacity to 1000ml, obtain stripping liquid.In this stripping liquid, the concentration of acetic acid is 145g/L, and the concentration of trolamine is 16.32g/L.
2. strip rete
Get sample that stainless steel substrate surface is formed with titanium carbide and/or titanium nitride film several, the thickness of this titanium carbide and/or titanium nitride film is approximately 2 μ m.Sample is immersed in completely in the stripping liquid of the above-mentioned preparation under room temperature and soaks 2 hours, stripping titanium carbide and/or titanium nitride film.Take out sample, water cleans up post-drying.
Embodiment 4-6
According to the method preparation stripping liquid described in embodiment 1-3, different respectively, the stainless steel substrate in embodiment 1-3 is replaced with copper base material, move back film respectively with under the same terms of embodiment 1-3.
The sample stripping in above-described embodiment 1 to embodiment 6 after rete is done to X-ray diffraction (X-RD) analysis, all do not find that Ti element exists, and proves that rete strips completely; Sample after stripping rete is carried out to scanning electron microscope (SEM) test, find that base material is not all corroded.
Claims (14)
1. the stripping liquid of a titanium carbide and/or titanium nitride film, this stripping liquid is the aqueous solution, it is characterized in that: this stripping liquid is comprised of acid and accelerator, promotor, inhibiter and water, wherein said acid is organic acid or mineral acid, and this sour concentration is 90～1000g/L; This accelerator is in order to promote the dissolving of metal ion in titanium carbide and/or titanium nitride film, the acid that this accelerator is fluoride ion or salt, and the concentration of this accelerator is 70～500g/L; This promotor strips hydrionic seepage velocity in liquid in order to quickening, the alcamines organic compound that this promotor being can be combined with titanium ion, and the concentration of this promotor is 15～200g/L; This inhibiter is the derivative of thiocarbamide, thiocarbamide and one or several the combination in urea, and the concentration of this inhibiter is 2～8g/L.
2. the stripping liquid of titanium carbide as claimed in claim 1 and/or titanium nitride film, is characterized in that: described acid is one or more the mixture in sulfuric acid, acetic acid, citric acid and lactic acid.
3. the stripping liquid of titanium carbide as claimed in claim 2 and/or titanium nitride film, is characterized in that: described acid is sulfuric acid or acetic acid.
4. the stripping liquid of titanium carbide as claimed in claim 1 and/or titanium nitride film, is characterized in that: this sour concentration is 90～750g/L.
5. the stripping liquid of titanium carbide as claimed in claim 1 and/or titanium nitride film, is characterized in that: described accelerator is one or several the mixture in hydrofluoric acid, ammonium bifluoride, Sodium Fluoride, Potassium monofluoride, Sodium tetrafluoroborate and sodium fluozirconate.
6. the stripping liquid of titanium carbide as claimed in claim 5 and/or titanium nitride film, is characterized in that: described accelerator is hydrofluoric acid and/or ammonium bifluoride.
7. the stripping liquid of titanium carbide as claimed in claim 1 and/or titanium nitride film, is characterized in that: the concentration of this accelerator is 75～300g/L.
8. the stripping liquid of titanium carbide as claimed in claim 1 and/or titanium nitride film, is characterized in that: described promotor is one or more the mixture in trolamine, Monoethanolamine MEA BASF and diethanolamine.
9. the stripping liquid of titanium carbide as claimed in claim 1 and/or titanium nitride film, is characterized in that: the concentration 30～80g/L of described promotor.
10. the stripping liquid of titanium carbide as claimed in claim 1 and/or titanium nitride film, is characterized in that: described inhibiter is the derivative of thiocarbamide or thiocarbamide.
The stripping liquid of 11. titanium carbides as claimed in claim 1 and/or titanium nitride film, is characterized in that: the concentration of described inhibiter is 3～5g/L.
The stripping method of 12. 1 kinds of titanium carbides and/or titanium nitride film, the method comprises: the titanium carbide and/or the titanium nitride film that are formed at substrate surface are contacted with stripping liquid, and this stripping liquid is for stripping as claimed in any one of claims 1 to 9 wherein liquid.
The stripping method of 13. titanium carbides as claimed in claim 12 and/or titanium nitride film, is characterized in that: the temperature that strips liquid during described contact is 20～30 ℃, and be 0.5～2 hour duration of contact.
The stripping method of 14. titanium carbides as claimed in claim 12 and/or titanium nitride film, is characterized in that: described base material is a kind of in ferrous alloy, copper, copper alloy and plastics.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010150010.5A CN102220133B (en) | 2010-04-19 | 2010-04-19 | Stripping solution of titanium carbide and/or titanium nitride film and stripping method |
| US12/974,200 US20110253169A1 (en) | 2010-04-19 | 2010-12-21 | Solution for removing titanium-containing coatings and method for same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010150010.5A CN102220133B (en) | 2010-04-19 | 2010-04-19 | Stripping solution of titanium carbide and/or titanium nitride film and stripping method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102220133A CN102220133A (en) | 2011-10-19 |
| CN102220133B true CN102220133B (en) | 2014-02-12 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010150010.5A Expired - Fee Related CN102220133B (en) | 2010-04-19 | 2010-04-19 | Stripping solution of titanium carbide and/or titanium nitride film and stripping method |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20110253169A1 (en) |
| CN (1) | CN102220133B (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102234513A (en) * | 2010-04-20 | 2011-11-09 | 深圳富泰宏精密工业有限公司 | Stripping solution for titanium-containing film and using method for stripping solution |
| CN102644079B (en) * | 2012-05-04 | 2013-09-11 | 哈尔滨工业大学（威海） | Removing solution of nickel phosphorus alloy coating on magnesium alloy |
| CN102899667B (en) * | 2012-09-11 | 2015-01-07 | 珠海承鸥卫浴用品有限公司 | Application of aqueous solution of ammonium bifluoride in de-plating of PVD decorative film |
| CN103046052B (en) * | 2012-12-27 | 2016-01-20 | 广东山之风环保科技有限公司 | The stripping liquid of environment-friendly type titanium-containing film and using method thereof |
| CN110387237B (en) * | 2018-04-20 | 2021-05-18 | 蓝思科技（长沙）有限公司 | Deplating solution for deplating NCVM (non-conductive metallization) layer and preparation method and application thereof |
| CN109554710A (en) * | 2018-12-25 | 2019-04-02 | 广东富行洗涤剂科技有限公司 | A kind of acid decoating liquid and obstacles in quit containing titanium coating |
| CN110616432A (en) * | 2019-08-26 | 2019-12-27 | 广东药科大学 | Zirconium-containing film layer removing liquid and use method thereof |
| CN111850564A (en) * | 2020-07-16 | 2020-10-30 | 桂林理工大学 | Titanium compound film deplating solution and deplating method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1735671A (en) * | 2002-12-10 | 2006-02-15 | 高级技术材料公司 | Passivative chemical mechanical polishing composition for copper film planarization |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3622391A (en) * | 1969-04-04 | 1971-11-23 | Alloy Surfaces Co Inc | Process of stripping aluminide coating from cobalt and nickel base alloys |
| US3844859A (en) * | 1969-12-16 | 1974-10-29 | Boeing Co | Titanium chemical milling etchant |
| US5932024A (en) * | 1997-07-01 | 1999-08-03 | Moore; Jesse C. | Decoating titanium and other metallized glass surfaces |
| JP4159334B2 (en) * | 2002-09-30 | 2008-10-01 | 新日本製鐵株式会社 | Discoloration removal cleaning agent and discoloration removal cleaning method for titanium and titanium alloy building materials |
| US7611588B2 (en) * | 2004-11-30 | 2009-11-03 | Ecolab Inc. | Methods and compositions for removing metal oxides |
| JP2009512194A (en) * | 2005-10-05 | 2009-03-19 | アドバンスド テクノロジー マテリアルズ，インコーポレイテッド | Oxidative aqueous cleaning agent to remove post-etch residue |
-
2010
- 2010-04-19 CN CN201010150010.5A patent/CN102220133B/en not_active Expired - Fee Related
- 2010-12-21 US US12/974,200 patent/US20110253169A1/en not_active Abandoned
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1735671A (en) * | 2002-12-10 | 2006-02-15 | 高级技术材料公司 | Passivative chemical mechanical polishing composition for copper film planarization |
Also Published As
| Publication number | Publication date |
|---|---|
| US20110253169A1 (en) | 2011-10-20 |
| CN102220133A (en) | 2011-10-19 |
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