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CN102024823B - Integrated circuit with embedded SRAM and technical method thereof - Google Patents

Integrated circuit with embedded SRAM and technical method thereof Download PDF

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Publication number
CN102024823B
CN102024823B CN2010102880154A CN201010288015A CN102024823B CN 102024823 B CN102024823 B CN 102024823B CN 2010102880154 A CN2010102880154 A CN 2010102880154A CN 201010288015 A CN201010288015 A CN 201010288015A CN 102024823 B CN102024823 B CN 102024823B
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lightly doped
doped drain
zone
transistor
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CN102024823A (en
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廖忠志
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Taiwan Semiconductor Manufacturing Co TSMC Ltd
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Taiwan Semiconductor Manufacturing Co TSMC Ltd
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/41—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
    • G11C11/412—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using field-effect transistors only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B10/00—Static random access memory [SRAM] devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B10/00—Static random access memory [SRAM] devices
    • H10B10/12—Static random access memory [SRAM] devices comprising a MOSFET load element

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

The invention provides an integrated circuit with an embedded SRAM and a technical method thereof, the integrated circuit comprises a first core, which comprises a first logic portion provided with a first gate dielectric thickness and a plurality of first NMOS transistors, wherein the first NMOS transistors are provided with lightly doped drain (LDD) implantations formed using different first LDD masks; a single port type embedded SRAM zone is provided with the first gate dielectric thickness and a plurality of second NMOS transistors, the second NMOS transistors are provided with LDD implants formed using the logic portion second LDD masks; and a first dual port type embedded SRAM zone is provided with the first gate dielectric thickness and at least a third NMOS transistor, the third transistor is provided with lightly doped drain (LDD) implantations formed using different first LDD masks. The invention reduces standby electricity consumption and improves access speed.

Description

Integrated circuit and process thereof with embedded SRAM
Technical field
The present invention relates to integrated circuit component, relate in particular to static RAM (the Static random access memory with low-power consumption; Hereinafter to be referred as SRAM) bit unit (bit cell) structure.
Background technology
In semiconductor technology, be used at present electronic circuit, particularly be made into the electronic circuit of integrated circuit, required element is modal is plate following formula (on-board) or embedded (embedded) array that belongs to memory storage element.These elements can become dynamic random access memory (dynamic random access memory; Hereinafter to be referred as DRAM) unit or sram cell.DRAM and SRAM memory are called volatile formula (volatile) memory cell, and in other words, if remove the power supply of integrated circuit, the data of having stored will be lost.The DRAM unit is very dense array, because the DRAM unit only needs a single access transistor and a storage capacitance, yet the DRAM circuit has slow reading (read) and writes (write) access sequential, and need some complicated control circuits, to such an extent as to must periodically refreshing (refresh), the DRAM array keeps state.Can make like this processor periodically stop other operations and carry out the refresh cycle (refresh cycle), or tailored version Memory Controller (dedicated memory controller) (more often being used in recent manufacturing equipment) is carried out the refresh cycle.
Do not need the refresh cycle when on the contrary, the SRAM memory array is stored.Because each bit unit is by six transistors (six transistors, 6T) or the latch circuit that consists of of multiple transistor more, so the silicon chip area that the SRAM array need be more.Yet as long as enough supply voltage is arranged, sram cell can keep data for a long time.Compared to the DRAM unit, sram cell has more advantage and is very fast access sequential, make the special tool attractability of sram cell be scratchpad (scratchpad) or operational data storage, for example memory cache of processor (cache memory).Present system combination chip (system on a chip; Being designated hereinafter simply as SOC) design often is merged into single core, double-core or multi-core.These multi-cores are designed to popular processor, for example digital signal processor (digital signal processing processor in advance; Hereinafter to be referred as DSP), high-order reduced instruction set computer (Advanced RISO Machine; Hereinafter to be referred as ARM), reduced instruction set computer (Reduced Instruction Set Computer; Hereinafter to be referred as RISC) or microprocessor, and with this processor in abutting connection with or configured the 1st grade of (L1) memory cache of a sram cell nearby, make the calculation process speed can be faster.Use double-core (dual-core) in many devices, for instance, radio transceiver (radio transceiver) core possesses microcontroller core.The SRAM array can use in said integrated circuit.
The situation that integrated circuit is used in battery powered device day by day improves.For example, SOC may be used for providing all or major part is used for realizing the circuit of mobile phone, laptop computer, notebook computer, audio-video player, Video Camera, camera, intelligent telephone or personal digital assistant (Personal Digital Assistant, PDA) major function.In these devices, the processor core design of the logic OR of client definition license can be predetermined to other or unit (as microprocessor, digital signal processor, core (as ARM, RISC or similar Core Feature), mobile telephone module etc.) huge collection combine.
In sram cell, data can be stored in the memory node of two inversely relateds.A pair of CMOS inverter (being comprised of four MOS transistor) is configured as one and fastens lock unit.In complementary MOS (CMOS) technology, each memory node is that the gate terminal by two MOS transistor is formed, and receives the output of the inverter that is comprised of two MOS transistor.
Fig. 1 shows the sram cell 10 of typical six transistor arrangement.In Fig. 1, a pair of transmission grid (pass gate) transistor PG1, PG2 electrically connect respectively pair of data lines (also referred to as bit line BL and BLB) to storing contact SN1 and SN2.In known technology, transmit gate transistor PG1 and PG2 and normally formed by nmos pass transistor.Show a positive supply voltage Vdd in figure, its scope is at 0.6 volt to 3.0 volts or higher, mainly depending on technology.On draw (pull up) transistor PU1 and PU2 to be formed by the PMOS transistor, and positive supply voltage can be electrically connected to one or the other memory node, according to the state of SRAM bit unit 10 and decide.Also show second supply voltage Vss, normally ground connection in figure.
Two drop-down (pull down) transistor PD1 and PD2 (being also nmos pass transistor) will bear or supply voltage Vss (earthed voltage) is electrically connected to one or the other memory node SN1 and SN2, decides according to the state of sram cell 10.Sram cell 10 is phase locking units, as long as the supply power supply is enough to correctly function circuit, and ground save data state when this phase locking unit meeting is unlimited.Two are formed CMOS inverter wrong coupling intersected with each other (cross-coupled) by pull up transistor PU1 and PU2 with pull up transistor PD1 and PD2 respectively, and their operation is used for strengthening continuously the electric charge that is stored in memory node SN1 and SN2.As shown in the figure, these two memory nodes are inverting each other.When memory node SN1 is logic state 1 (being generally high potential), memory node SN2 can be logic state 0 (normally electronegative potential) at one time, and vice versa.
Write fashionable, complementary data writing when sram cell 10 and can input respectively bit line BL and BLB.The upper positive control signal of character line WL can be electrically connected to two grids that transmit gate transistor PG1 and PG2.The ordered size of PU1 and PU2 and pull-down transistor PD1 and PD2 of pulling up transistor can make the data on bit line override the data of storage, writes whereby in SRAM bit unit 10.
When sram cell 10 read, positive voltage put on character line WL, and transmission gate transistor PG1 and PG2 allow bit line BL and BLB is electrically connected to memory node SN1 and SN2 comes receive data.Be different from dynamic storage cell, if supply voltage Vdd maintains under enough high level, sram cell 10 can not lost the state of its storage at during read.Therefore, just do not need to write back the action of (write back) after reading release.
Bit line BL and BLB consist of the data wire pair of a pair of complementation.These two paired data wires can be electrically connected to a differential induction amplifier (not being shown in figure), and differential voltage can be sensed and be amplified, and this is design well known to those of ordinary skill in the art.This had both amplified and the output signal responded to can be used as data and exports in this device other logical circuit to.
Fig. 2 is the sram cell 12 of another kind of traditional form, has wherein used the additional function that disposes of eight transistors (8T) and read port 14.In Fig. 2, sram cell 12 uses six transistors of sram cell 10 as shown in Figure 1.And sram cell 12 has a read port 14 that is comprised of two nmos pass transistors in addition, and these two transistors are respectively read port pulldown transistor RPD and read port transmits gate transistor RPG.Read port 14 also has one and only reads character line RWL for what read.Previous character line WL in Fig. 1 only writes character line WWL for what write.The benefit that read port is separated is to have lowered the probability that reads interference, can be read action and affects because be stored in the data of bit unit.Relatively, read port pulldown transistor RPD can come conducting or cut-off according to the memory node SN2 that is electrically connected to its grid.Because nmos pass transistor has gain, the data-signal that is stored in node SN2 can be read the gain amplification of port pull-down transistor RPD.Therefore when reading character line RWL and be applied in positive voltage, read port transmits gate transistor RPG can conducting and will read bit line RBL and be electrically connected to and read pull-down transistor, so the data bit element that read port can be exported a correspondence is reading on bit line RBL.
In the middle of many application, data or program that the SRAM array with many bits unit is used to that recovery of stomge is used and uses after a while.Sram cell experienced within the same time, and to read the action meeting more than write activity.Therefore, it is quite helpful reading by read port 14 that action separates with the bit unit, even if eight transistorized unit will be completed with more silicon layout area.In addition, when attempting saving electric power (supply voltage Vdd), minimum feature measurement (minimal characteristic measurement) becomes even more important to reading circuit, because that is the part of the most often moving in circuit.
Fig. 3 is another kind of known sram cell 20, has wherein used ten transistors (10T).In this configuration, circuit possesses two read ports, is electrically connected to respectively memory node SN1 and the SN2 of sram cell 10.Read port 22 and 24 has respectively control line RWL1 and RWL2, pull-down NMOS transistor separately and transmits the grid nmos pass transistor.Article two, read that bit line RBL1 and RBL2 transmit gate transistor RPG1 by read port respectively and RPG2 is electrically connected to read port pulldown transistor RPD1 and RPD2.Pull-down transistor RPD1 and RPD2 have respectively a grid that is connected to memory node SN1 and SN2.Reading action can independently or side by side carry out.Use two read ports additional elasticity to be provided and two outputs are read out from sram cell 20 simultaneously.
Fig. 4 is the layout (layout) of sram cell 10.As shown in Figure 4, N-type trap (N type well) 1001 is formed in semiconductor substrate, and for instance, semiconductor substrate can be that P type substrate or P doped silicon cover insulating barrier (silicon-on insulator; SOI).Dashed area is polysilicon gate (polysilicon gate), also show contact hole in figure, and active area (active area) 31 is used for showing nmos pass transistor and PMOS transistor.The transistor that consists of six layer transistor SRAM units of the single-ended shape of the mouth as one speaks uses PG-1, PG-2, PU-1, PU-2, PD-1 and PD-2 to be marked at transistorized grid.Sram cell 10 is at Y-direction mark Y1-pitch and directions X mark X1-pitch.Contact hole uses suitable holding wire mark, for example character line contact hole (word line contact; WLC) consisted of by transistor PG-1 and PG-2.And the area of sram cell 10 is defined as the zone that character line contact hole WLC, contact window of bit line BLC and supply power supply contact hole (power contact) VccC and VssC include.Two memory nodes are positioned at sram cell 10.The layout of Fig. 4 is corresponding to the sram cell 10 of Fig. 1.
Similarly, Fig. 5 has the layout of the sram cell 12 of the eight transistorized both-end shape of the mouth as one speaks.In this layout, increase in the sram cell 10 of the transistorized single-ended shape of the mouth as one speaks of read port to six.Show source region 31 in figure, in the same manner, transmission gate transistor PG1 and PG2, pull up transistor PU1 and PU2, pull-down transistor PD1 and PD2 write port one 202 in order to formation, increase in addition the read port 1203 that read port transmission gate transistor RPG1 and read port pulldown transistor RPD1 consist of.Read contact window of bit line RBLC and read the right end that character line contact hole RWLC is shown in SRAM bit unit 12.The approach (channel) that N-type trap 1201 pulls up transistor in order to consist of two PMOS, remaining nmos pass transistor is based upon in P type substrate.The Y-direction of SRAM bit unit 12 is labeled as Y2-pitch and directions X is labeled as X2-pitch.
SRAM array (zone) becomes core (core) in conjunction with other functions.The design core is a mac function (functional block), can be used for designing a kind of standardized mode, and being placed in by other kinds of combination function becomes new integrated circuit on integrated circuit.Because the design core is understood fully and confirms and can make, and the conventional semiconductor processing standardization that is providing, for instance, semiconductor foundry (semiconductor foundry) uses the design core to make the realization that new functional device can be quick and cheap.Because many design cores comprise processor, microprocessor, digital signal processor or other computing functions, the SRAM memory is also normal involved enters.SRAM can be divided into the storage of general service data and the first order (L1) cache, memory cache (cache memory) but storage of processor is used, be about to use or reusable appointment (instruction) or data, for instance, above-mentioned condition occurs in when carrying out circuit operation.The use memory cache falls, and low processor is waited for the time of finding out character from closing the chip-stored position.Use embedded SRAM memory cache close processor or logic function circuit in being arranged on integrated circuit, can find fast necessary data character or program command, therefore increased the usefulness of processor.
Fig. 6 is the mac function block diagram with integrated circuit 41 of single core, and wherein integrated circuit 41 has the embedded SRAM array.As shown in the figure, the first of transistor unit (in known integrated circuit, having thousands of transistors) is in order to form input/output terminal or input and output (I/O) regional 43.Because input/output unit is coupled to outside pin position (external pin) and signal path (signal trace), in order to drive larger electric current, these transistors have higher gain and thicker gate dielectric, form the larger area device in order to load extra electric current.The second portion of integrated circuit 41 is logic regions 45.Because logic transistor needs at a high speed and low-power consumption, these devices are usually smaller, have lower threshold voltage, and under the input and output zones, have thinner medium thickness.Threshold voltage can be used alloy to inject (implant) and adjust, for instance, and lightly doped drain (lightly doped drain; LDD) Implantation (ion implant) and extra bag type inject (pocket implant) in order to special element characteristic, and this is known skill.
Fig. 6 shows the embedded SRAM array 47 of the single-ended shape of the mouth as one speaks.The known process method uses gate dielectric material identical with logic region 45 and injecting program to make sram cell.As shown in the figure, embedded SRAM array 49 is eight layer transistor SRAM memory cell arrays (2P-8T) of the both-end shape of the mouth as one speaks.Identical gate dielectric and identical lightly doped drain and bag type Implantation photomask are used in explanation again, known process single core integrated circuit method, in order to complete all parts of element.
Fig. 7 is the known single core integrated circuit that another kind has the embedded SRAM memory.In this block diagram, integrated circuit 51 has input and output zone 43 and logic region 45, wherein transistor uses the logic rules (logic rule) of gate dielectric (having the first grid oxide thickness) to consist of, and uses the NMOS lightly doped drain photomask NLDD-1 in lightly doped drain Implantation (LDD ion implantation) and bag type implantation step (pocket implant step) to consist of.In Fig. 7, SRAM array 53 is to embed the SRAM array.SRAM array 53 (embedded SRAM array) is to use one group of SRAM design rule to produce the SRAM of the single-ended shape of the mouth as one speaks, comprise foregoing identical gate dielectric, but different is, use the 2nd NMOS lightly doped drain photomask NLDD-2 in the SRAM transistor, form lightly doped drain zone and bag type Implantation step to reach.In Fig. 7, SRAM array 55 has the embedded SRAM array, wherein write the inbound port transistor at six transistors and use identical gate dielectric layer thickness (thickness) with pair transistor (2T) read port transistor, and have the 2nd NMOS lightly doped drain photomask NLDD-2 step.Inject to use different injection photomasks at lightly doped drain and bag type, can produce the transistor in the logic region transistor that has the different performance characteristics in same core and SRAM zone in semiconductor technology.
(level 1 to realize the first order of core with eight layer transistor SRAM units of the both-end shape of the mouth as one speaks; L1) memory cache is very popular in the recent period.In this, must reduce the energy consumption of SRAM array, the energy consumption of the power supply of especially awaiting orders becomes new problem.Make the size decreases of element because of the development of semiconductor technology, the ability that reduces the loss of power has reached critical restriction.The SRAM array need to be stablized and save data, however the general supply power supply that reduces reaching supply voltage minimum Vcc, the method for min is difficult to compatible stability and the reduction seepage electric current I sb that awaits orders.
Due to continuing and increase (particularly more complicated powered battery type carrying device) of low power consumption integrated circuit demand, sram cell need to have good electricity-saving characteristic.One of method for limiting of power consumption must lean on leakage current Isb for seep.When sram cell does not use, the SRAM array can be in standby mode.Seepage electric current I sb when awaiting orders must be reduced.In known technology, the method that the power consumption of cmos circuit is lowered in the positive supply supply during the reduce standby is widely known.Supply voltage minimum Vcc with the metric system that decides supply voltage vcc level, min.Provide one to possess low supply voltage minimum value Vcc, the sram cell of min is clearly favourable.Yet this is difficult to effectively go to implement for six transistor cells, this be because plant bulk dwindle and process variations and other restrictions that the progress of technique causes cumulative.
Therefore, we need the sram cell structure of an improvement, this structure has the supply voltage minimum Vcc of low standby leakage current Isb, improvement, min in order to reduce standby power consumption, with the access speed of improving (when particularly reading action), keep simultaneously known semiconductor process techniques and be used for the compatibility of manufacturing integration circuit, and not obvious processing step and the cost of increasing.
Summary of the invention
In view of this, the invention provides a kind of integrated circuit with embedded SRAM, comprise the semiconductor substrate; One input and output are regional, comprise a plurality of the first transistors, and above-mentioned the first transistor has a first grid medium thickness; One first core comprises one first logic region, has a plurality of transistor secondses, wherein the above-mentioned transistor seconds lightly doped drain zone that has a second grid medium thickness and injected with one first lightly doped drain photomask; One first static RAM zone has a plurality of the 3rd transistors, wherein above-mentioned the 3rd transistor lightly doped drain zone that has above-mentioned second grid medium thickness and injected with one second lightly doped drain photomask; And one second static RAM zone, have a plurality of the 4th transistors and at least one the 5th transistor, wherein above-mentioned the 4th transistor has above-mentioned second grid medium thickness, and above-mentioned the 5th transistor has the lightly doped drain zone of being injected with above-mentioned the first lightly doped drain photomask.
The present invention also provides a kind of integrated circuit with embedded SRAM, comprise: one first core, comprise: one first logic region, have a first grid medium thickness and a plurality of the first nmos pass transistor, wherein above-mentioned the first nmos pass transistor has the lightly doped drain zone of being injected with one first lightly doped drain photomask; The embedded SRAM zone of the one single-ended shape of the mouth as one speaks, have above-mentioned first grid medium thickness and a plurality of the second nmos pass transistor, wherein above-mentioned the second nmos pass transistor has the lightly doped drain zone of being injected with one second lightly doped drain photomask; And the embedded SRAM zone of the one first both-end shape of the mouth as one speaks, have above-mentioned first grid medium thickness and at least one the 3rd nmos pass transistor, above-mentioned the 3rd transistor has the lightly doped drain zone of being injected with above-mentioned the first lightly doped drain photomask.
The present invention also provides a kind of process with integrated circuit of embedded SRAM, and comprising provides the semiconductor substrate; Form an input and output zone, above-mentioned input and output zones comprises a plurality of the first nmos pass transistors, has a first grid medium thickness; Form one first logic region, above-mentioned the first logic region comprises a plurality of the second nmos pass transistors, and above-mentioned the second nmos pass transistor has a second grid medium thickness and regional with the one first formed lightly doped drain of lightly doped drain photomask; Form one first static RAM regional, above-mentioned the first static RAM zone comprises a plurality of the 3rd nmos pass transistors, and above-mentioned the 3rd nmos pass transistor has a second grid medium thickness and with the one second formed lightly doped drain of lightly doped drain photomask zone; And it is regional to form one second static RAM, above-mentioned the first static RAM zone comprises at least one the 4th nmos pass transistor, has a second grid medium thickness and with above-mentioned the first formed lightly doped drain of lightly doped drain photomask zone.
The present invention can reduce standby power consumption, with the access speed of improving.
For above and other purpose of the present invention, feature and advantage can be become apparent, a preferred embodiment cited below particularly, and coordinate appended accompanying drawing, be described in detail below:
Description of drawings
Fig. 1 is the sram cell of typical six transistor arrangement.
Fig. 2 is traditional sram cell of another kind of form, and it has used eight transistors.
Fig. 3 is another kind of known sram cell, and it has used ten transistors.
Fig. 4 is the layout of sram cell.
Fig. 5 is the layout with sram cell of the eight transistorized both-end shape of the mouth as one speaks.
Fig. 6 is the mac function block diagram that shows the integrated circuit 41 with single core.
Fig. 7 is another known method with single core integrated circuit of embedded SRAM memory.
Fig. 8 is the block diagram with integrated circuit of embedded SRAM of the present invention.
Fig. 9 is the opposing party's block diagram with integrated circuit of embedded SRAM of the present invention.
Figure 10 is the opposing party's block diagram with integrated circuit of embedded SRAM of the present invention.
Figure 11 is the opposing party's block diagram with integrated circuit of embedded SRAM of the present invention.
Figure 12 is the opposing party's block diagram with integrated circuit of embedded SRAM of the present invention.
Figure 13 is the opposing party's block diagram with integrated circuit of embedded SRAM of the present invention.
Figure 14 is the opposing party's block diagram of integrated circuit of the present invention, and wherein integrated circuit 140 has the double-core array of the first core Core-1 and the second core Core-2.
Figure 15 is the flow chart of steps of the process of the integrated circuit with embedded SRAM of the present invention.
Figure 16 is another flow chart of steps of the process of the integrated circuit with embedded SRAM of the present invention, in order to produce aforesaid three gate oxidation construction element.
Wherein, description of reference numerals is as follows:
Vdd, Vss: supply voltage; WL: character line;
BL, BLB: bit line; PU1, PU2: pull up transistor;
PD1, PD2: pull-down transistor; SN1, SN2: memory node;
10,12,20:SRAM unit; 14,22,24: read port;
PG1, PG2: transmit gate transistor; 31: active area;
RBL1, RBL2: read bit line; WWL: write the character line;
WLC: character line contact hole; BLC: contact window of bit line;
1001,1201:N type trap; The X1-pitch:X direction;
1202: write inbound port; 1203: read port;
43: input and output are regional; 45,101,107: logic region;
Core-1: the first core; Core-2: the second core;
RPG1, RPG2: read port transmits gate transistor;
RPD1, RPD2: read port pulldown transistor;
WBL, WBLB: write bit line;
RWL, RWL1, RWL2: read the character line;
SNBC, SNC: storage node contacts window;
VssC, VccC: supply voltage contact hole;
RBLC: read contact window of bit line;
RWLC: read character line contact hole;
Y1-pitch, Y2-pitch:Y direction;
47,49: the embedded SRAM array;
53,55:SRAM array;
41,51,81,91,102,110,120,130,140: integrated circuit;
73,103,71,77,105,106,108,109,111,112: embedded SRAM is regional;
1501～1514,1601～1617: step;
Embodiment
The making of the preferred embodiment of the invention and using method will details are as follows.Many invention application concepts provided by the present invention can be implemented on kind widely in certain content.Specific embodiment discussed below is only to describe to make the unrestricted category of the present invention with using ad hoc approach of the present invention.
SRAM array of the present invention (zone) has the multiple memorizers cell type, be embedded in have logical circuit, in the integrated circuit such as processor.The SRAM bit unit of hybrid transistor type is in order to reaching the low current leakage (standby current leakage) of awaiting orders, and has high access speed when low-power consumption, and is compatible with existing and following semiconductor technology.The Method and circuits of a kind of SRAM of providing memory bit unit is provided, in order to improvement seepage electric current (the standby leakage current that awaits orders, Isb), also improve the operation of awaiting orders, voltage source Vcc, minimum power (min power) and the high speed reads of low supply level (lowered supply level) are deposited sequential (high speed read access times).The present invention has advantage for the multi-core integrated circuit of logical circuit and the special circuit of user, and sram cell has the stability after improvement, and making is providing reliable operation under condition widely.
Fig. 8 is the block diagram with integrated circuit of embedded SRAM of the present invention, and wherein integrated circuit 81 is the single core integrated circuit, and uses the SRAM transistor design rule of logic transistor design rule and embedded SRAM array (zone).In Fig. 8, input and output zone 43 has a plurality of transistors, wherein above-mentioned transistor has the formed gate dielectric of design rule (gate oxide) thickness with the input and output zone, logic region 45 is formed with the first design rule Device-1, and wherein the first design rule Device-1 is in order to standard first grid dielectric layer (comprising oxide, nitride, nitrogen oxide, silicon dioxide or other dielectric layer material) thickness.In addition, logic region 45 has with the formed lightly doped drain of NMOS lightly doped drain (LDD) photomask NLDD-1 zone, referred to here as be dual gate oxide (DGO) technique.Use different lightly doped drain photomasks and the transistorized threshold voltage Vt of the controlled system of implantation step (threshold voltage).In sram cell, the read port of dual port cell has the element of higher threshold voltage Vt, and lower threshold voltage Vt element has speed and the lower power of use faster.Regional 71 arrays that consist of for both-end shape of the mouth as one speaks sram cell of the embedded SRAM of the both-end shape of the mouth as one speaks, each dual-port sram cell comprises six transistors (6T) unit and pair transistor (2T) read port, in certain embodiments, the embedded SRAM zone 71 of the both-end shape of the mouth as one speaks can be the SRAM zone.Embedded SRAM zone 71 use the first design rule Device-1 and NMOS lightly doped drain photomask NLDD-1 of the both-end shape of the mouth as one speaks.Yet in the embedded SRAM zone 73 of the single-ended shape of the mouth as one speaks, embedded single port SRAM zone uses the design rule that indicates " Device-2 " to consist of.When logic region used injecting mask and step, the logic region of SRAM array had extra usefulness, design flexibility and low surcharge.
Therefore, in the single core of the integrated circuit of this embodiment, use different N MOS lightly doped drain photomask and implantation step, produce the embedded SRAM unit with different crystal pipe characteristic.Design embedded SRAM by different process and design rule with the SRAM zone, in order to threshold voltage (threshold voltage), speed, the seepage of awaiting orders electric current I sb and the stability of optimizing sram cell, especially low-power and high-speed under, the stable particular importance of SRAM.
Fig. 9 is the opposing party's block diagram with integrated circuit of embedded SRAM of the present invention, and wherein integrated circuit 91 has the embedded SRAM unit of multiple design rule in single core.In Fig. 9, reuse foregoing input and output zone 43, and logic region 45 has a plurality of transistors, wherein these transistors come standard gate dielectric layer thickness, NMOS lightly doped drain to inject with the first design rule Device-1 and the bag type injects.Sram cell array with embedded SRAM zone 73 of the single-ended shape of the mouth as one speaks is provided by the second design rule Device-2, provides with diverse ways with distinct methods in the embedded SRAM zone 77 of the both-end shape of the mouth as one speaks.In this embodiment, the embedded SRAM zone 77 of the both-end shape of the mouth as one speaks has two different NMOS lightly doped drain photomasks and injections.In " writing (write) " port of integrated circuit, six transistor cells use the second design rule Device-2 or SRAM design rule.These transistors have the gate dielectric layer thickness identical with logic region 45, but use the 2nd NMOS lightly doped drain photomask NLDD-2 that lightly doped drain injects and bag type injects.The photomask that use in the embedded SRAM zone 73 of the 2nd NMOS lightly doped drain photomask NLDD-2 and the single-ended shape of the mouth as one speaks is the same.Yet, in the embedded SRAM zone 77 of the both-end shape of the mouth as one speaks, the pair transistor read port of sram cell is formed with the first design rule Device-1 or logic design rule, wherein logic design rule is to carry out lightly doped drain Implantation and bag type Implantation with a NMOS lightly doped drain photomask NLDD-1, so that it is regional to inject lightly doped drain, what these and logic region 45 used is identical photomask.In these methods, the embedded SRAM zone 77 of the both-end shape of the mouth as one speaks is in each sram cell, have two different crystal tube elements characteristics, a kind of transistor version is the port identity that writes of six transistor cells, and another kind of transistor version is the characteristic of the pair transistor read port in eight transistor units.These features have advantage, are that the read port transistor can be the higher speed element, and the memory node transistor keeps reliability and stability under the low seepage electric current of awaiting orders.
Figure 10 is the opposing party's block diagram with integrated circuit of embedded SRAM of the present invention, and wherein integrated circuit 102 has the double-core element, comprises respectively the first core Core-1 and the second core Core-2.In the double-core element, the first core Core-1 has Three regions.The first core Core-1 has a logic region 101, and logic region 101 has the first design rule Device-1, the first design rule Device-1 is in order to standard gate dielectric layer thickness and a NMOS lightly doped drain photomask NLDD-1, and lightly doped drain injects and the bag type injects in order to carry out.The first core Core-1 also has two embedded SRAM arrays, be respectively the embedded SRAM zone 105 of the embedded SRAM zone 103 of the single-ended shape of the mouth as one speaks and the both-end shape of the mouth as one speaks, the transistor in the embedded SRAM zone 105 of the embedded SRAM zone 103 of the single-ended shape of the mouth as one speaks and the both-end shape of the mouth as one speaks uses the second design rule Device-2 to form.In the second core Core-2, logic region 107 has the second grid medium thickness that is different from the first grid medium thickness, and have the 3rd NMOS lightly doped drain photomask NLDD-3, wherein the 3rd NMOS lightly doped drain photomask NLDD-3 is in order to determine lightly doped drain and injection technology.At last, the embedded SRAM zone 109 of the both-end shape of the mouth as one speaks is in the zone of the second core Core-2.The embedded SRAM zone 109 of the both-end shape of the mouth as one speaks is the embedded SRAM of dual-port eight transistor units, wherein transistor has the second grid medium thickness, and uses the 4th NMOS lightly doped drain photomask NLDD-4 in lightly doped drain and bag type injection technology.Under this method, integrated circuit 102 provides the embedded SRAM array with first, second gate dielectric layer thickness and different N MOS lightly doped drain photomask.The SRAM array that each is embedded in integrated circuit all has different crystal pipe characteristic in another one, in order to optimize the seepage electric current I sb that awaits orders, minimum supply voltage vcc, and min and read access speed.Because the embodiment of the present invention is used three different gate dielectrics (oxide layer) thickness, so this is three grid oxic horizons (triple gate oxide; TGO) technique.
Figure 11 is the opposing party's block diagram with integrated circuit of embedded SRAM of the present invention, and wherein integrated circuit 110 has the first core Core-1 and the second core Core-2.The first core Core-1 has the embedded SRAM zone 106 of the embedded SRAM zone 103 of logic region 101, the single-ended shape of the mouth as one speaks and the both-end shape of the mouth as one speaks.Logic region 101 has the first design rule Device-1, and the first design rule Device-1 is in order to the standard gate dielectric layer thickness, and with a NMOS lightly doped drain photomask NLDD-1, carries out that lightly doped drain injects and the bag type injects.The embedded SRAM zone 103 of the single-ended shape of the mouth as one speaks has the second design rule Device-2, makes transistor have identical first grid medium thickness, and uses the 2nd NMOS lightly doped drain photomask NLDD-2 to carry out that lightly doped drain injects and the bag type injects.The embedded SRAM zone 106 of the both-end shape of the mouth as one speaks has the first grid medium thickness, and forms the writing inbound port and form the pair transistor read port with a NMOS lightly doped drain photomask NLDD-1 of six transistor cells of the sram cell of the both-end shape of the mouth as one speaks with the 2nd NMOS lightly doped drain photomask NLDD-2.In integrated circuit 110, the second core Core-2 is made of 111, the embedded SRAM of logic region 107 and both-end shape of the mouth as one speaks zone.Logic region 107 has second grid dielectric layer (also claiming oxide layer) thickness, and injects and the bag type injects and uses the 3rd NMOS lightly doped drain photomask NLDD-3 with " Device-3 " design rule institute standard at lightly doped drain.The embedded SRAM zone 111 of the both-end shape of the mouth as one speaks is the dual-port sram cell with six transistor cells (writing inbound port), be to use first grid medium thickness and the 2nd NMOS lightly doped drain photomask NLDD-2 to form in six transistors (writing inbound port) memory cell, use second grid dielectric layer (also claiming oxide layer) thickness and the 3rd NMOS lightly doped drain photomask NLDD-3 in the pair transistor read port.In this embodiment, the read port of the embedded SRAM unit of the second core Core-2 comes the standard gate dielectric layer thickness with " Device-3 " design rule, the embedded SRAM zone 111 of the both-end shape of the mouth as one speaks has gate dielectric layer thickness and the 2nd NMOS lightly doped drain photomask NLDD-2, make write inbound port and memory node in sram cell that stability and the low current leakage Isb that awaits orders preferably be arranged, and the 3rd NMOS lightly doped drain photomask NLDD-3 use on the pair transistor read port.
Figure 12 is the opposing party's block diagram with integrated circuit of embedded SRAM of the present invention.In the first core Core-1, logic region 101 has the first grid medium thickness and forms lightly doped drain zone and bag type injection zone with a NMOS lightly doped drain photomask NLDD-1.The embedded SRAM zone 103 of the single-ended shape of the mouth as one speaks has the first grid medium thickness, but with the 2nd NMOS lightly doped drain photomask NLDD-2 to carry out lightly doped drain and inject and the bag type injects.The embedded SRAM zone 105 of the both-end shape of the mouth as one speaks has the first grid medium thickness.Six transistors (writing inbound port) and pair transistor read port are to form lightly doped drain zone and bag type Implantation with the 2nd NMOS lightly doped drain photomask NLDD-2 photomask.Integrated circuit 120 has the second core Core-2, comprising logic region 107, has the second grid medium thickness and uses the 3rd NMOS lightly doped drain photomask NLDD-3, and lightly doped drain is regional to be injected with the bag type to form.The second core Core-2 also comprises Embedded Double port sram cell array, i.e. the embedded SRAM zone 108 of the both-end shape of the mouth as one speaks.The embedded SRAM zone 108 of the both-end shape of the mouth as one speaks comprises the second grid medium thickness, and uses the 3rd NMOS lightly doped drain photomask NLDD-3 in SRAM writes the transistor of inbound port and read port.Therefore, integrated circuit 120 comprises the two embedded SRAM zones with same read ports and both-end shape of the mouth as one speaks of writing inbound port, but two Embedded Double port SRAM zones have different gate dielectric layer thickness and different lightly doped drain zone and bag type to be injected, in order to optimize each regional transistor characteristic of integrated circuit 120, threshold voltage (threshold voltage) for example.
Figure 13 is the opposing party's block diagram with integrated circuit of embedded SRAM of the present invention.In this embodiment, also belong to the double-core array.The first core Core-1 comprises the embedded SRAM zone 106 of the embedded SRAM zone 103 of logic region 101, the single-ended shape of the mouth as one speaks and the both-end shape of the mouth as one speaks, and wherein logic region 101 has first grid dielectric layer (oxide layer) thickness and forms the lightly doped drain zone and the bag type injects with a NMOS lightly doped drain photomask NLDD-1.The embedded SRAM zone 103 of the single-ended shape of the mouth as one speaks has first grid dielectric layer (oxide layer) thickness, but forms the lightly doped drain zone and the bag type injects with the 2nd NMOS lightly doped drain photomask NLDD-2.The embedded SRAM zone 106 of the both-end shape of the mouth as one speaks has first grid dielectric layer (oxide layer) thickness, yet in this array, when a NMOS lightly doped drain photomask NLDD-1 was used in the logical design of read port (being pair transistor), the inbound port transistor (i.e. six transistors) of writing of Embedded Double port SRAM array injected with the 2nd NMOS lightly doped drain photomask NLDD-2 formation lightly doped drain zone and bag type.In the second core Core-2, the embedded SRAM of both-end shape of the mouth as one speaks zone 108 and logic region 107 all use second grid dielectric layer (oxide layer) thickness, and the embedded SRAM zone 108 of the both-end shape of the mouth as one speaks write inbound port and read port all uses the 3rd NMOS lightly doped drain photomask NLDD-3.Therefore, in the first core Core-1 of integrated circuit 130, has different N MOS lightly doped drain photomask in the embedded SRAM zone 106 of the both-end shape of the mouth as one speaks, make the transistor of writing inbound port and the transistor of read port have different crystal pipe characteristic, and second grid dielectric layer (oxide layer) thickness of the SRAM array of the second core Core-2 is different from first grid dielectric layer (oxide layer) thickness of the SRAM array of the first core Core-1.
Figure 14 is the opposing party's block diagram of integrated circuit of the present invention, and wherein integrated circuit 140 has the double-core array of the first core Core-1 and the second core Core-2.In the first core Core-1, logic region 101 is not just being given unnecessary details as previously mentioned.The embedded SRAM zone 103 of the single-ended shape of the mouth as one speaks has first grid dielectric layer (oxide layer) thickness, but has the 2nd NMOS lightly doped drain photomask NLDD-2.In the embedded SRAM zone 106 of the both-end shape of the mouth as one speaks, the dual-port SRAM array of sram cell use first grid dielectric layer (oxide layer) thickness but form with the 2nd NMOS lightly doped drain photomask NLDD-2 the both-end shape of the mouth as one speaks embedded SRAM zone 106 write inbound port, and form the read port in the embedded SRAM zone 106 of the both-end shape of the mouth as one speaks with a NMOS lightly doped drain photomask NLDD-1.In this embodiment, logic region 107 in the second core Core-2 of integrated circuit 140 has second grid dielectric layer (oxide layer) thickness and the 3rd NMOS lightly doped drain photomask NLDD-3, and the embedded SRAM zone 112 of the both-end shape of the mouth as one speaks is the sram cell array of eight transistorized both-end shape of the mouth as one speaks.The embedded SRAM zone 112 of the both-end shape of the mouth as one speaks also has second grid dielectric layer (oxide layer) thickness and uses different N MOS lightly doped drain photomask, write inbound port (six transistors) and form lightly doped drain zone and the injection of bag type with the 2nd NMOS lightly doped drain photomask NLDD-2 (or SRAM photomask), the pair transistor of read port uses the 3rd NMOS lightly doped drain photomask NLDD-3, also is same as the 3rd NMOS lightly doped drain photomask NLDD-3 that the logic region 107 of the second core Core-2 uses.Therefore, in this embodiment, integrated circuit 140 has two embedded SRAM arrays, wherein above-mentioned embedded SRAM is the dual-port array, each embedded SRAM all has read port and has two different NMOS lightly doped drain photomasks, one of them writes inbound port and memory node in order to generation, and another has low await orders current leakage Isb and fast access time in order to produce read port in order to optimize dual-port SRAM array.
Fig. 8～Figure 14 is in order to the combination that represents the embodiment of the present invention and the feature that produces.And the feature of other combinations needs to represent with extra description, and becomes the part of the embodiment of the present invention.
Figure 15 is the flow chart of steps of the process of the integrated circuit with embedded SRAM of the present invention, with so that the double-core device is realized feature of the present invention.In Figure 15, provide the semiconductor substrate.In step 1501, form shallow trench isolation from (shallow trench isolation, STI), in order to define active area (active areas) in substrate.In step 1502, carry out doping, in order to form trap (well) and control threshold voltage (Vt) in the NMOS element.In step 1503, form PMOS alloy (dopant) and PMOS trap.In step 1504, deposition (deposited) first grid dielectric layer (thickness) on input and output I/O zone.In step 1505, form a second grid dielectric layer (thickness), so this is a dual gate oxide (DGO) technique.Gate dielectric or gate oxide can be any for present semiconductor technology with anyly be applicable to following technique, the dielectric layer that comprises silica, silicon dioxide, silicon oxynitride and high-k (high K), such as hafnium (hafnium) and zirconium (zirconium) etc.In step 1506, the deposition grid conducting layer.Use traditionally polysilicon, but metal gates and other grid conductors can use also.In step 1507, carry out gate pattern (gate patterning) step, be wherein to form grid conductor (gate conductor) with photoresistance (photo resist) and etching (etch) step.In step 1508, form a NMOS lightly doped drain with a NMOS lightly doped drain photomask NLDD-1 regional, also use Implantation and NMOS lightly doped drain photomask NLDD-1 execution angle injection (angled implant) and bag type to inject.In step 1509, use a NMOS lightly doped drain photomask NLDD-1 to form the nmos pass transistor lightly doped drain zone of logic region.In step 1510, use a PMOS lightly doped drain photomask PLDD-1 to form the lightly doped drain zone of PMOS SRAM.In step 1511, form the PMOS transistor lightly doped drain zone of logic region with a PMOS lightly doped drain photomask PLDD-1.Step 1512 is optionally steps, but also uses in some designs photomask NLDD and the photomask PLDD in input and output zone, and it is different from the SRAM lightly doped drain photomask that forms logic region and lightly doped drain zone.After formation lightly doped drain zone and bag type injected and complete, in step 1513, use oxide, nitride and nitrogen oxide produced grid gap wall (gate spacer), in order to the sidewall (sidewall) of protecting grid conductor.In step 1514, carry out dark inject (deeper implants), in order to form source electrode and transistor is completed in the drain region.
Figure 15 provides the manufacture method of a kind of bigrid dielectric layer (oxide) device.Remaining part of input and output zone and integrated circuit has two different medium thicknesses.Figure 16 is another flow chart of steps of the process of the integrated circuit with embedded SRAM of the present invention, in order to produce (TGO) element of three gate oxides as above (dielectric layer).In Figure 16, technique opens and starts from step 1601, in order to form shallow trench isolation from (STI), then in step 1602, carries out doping, in order to form threshold voltage (Vt) and trap (well) alloy of NMOS in the specific region.In step 1603, form threshold voltage (Vt) and trap (well) alloy of PMOS.In step 1604, dielectric layer (thickness) on the input and output zones.In step 1605, in the upper deposition of the first core Core-1 gate dielectric (thickness).In step 1606, be a new step, in the upper deposition of the second core Core-2 gate dielectric (thickness).In step 1607, deposition grid conducting layer (gate conductive layer), for example polysilicon.In step 1608, carry out gate pattern (gate patterning).In step 1609, form lightly doped drain zone and the injection of bag type with the 2nd NMOS lightly doped drain photomask NLDD-2.In step 1610, form the lightly doped drain zone of the logic region of the first core Core-1 with a NMOS lightly doped drain photomask NLDD-1.In step 1611, carry out the lightly doped drain technique of the logic region of the second core Core-2 with the 3rd NMOS lightly doped drain photomask NLDD-3.In step 1612, carry out a PMOS lightly doped drain technique with the 2nd PMOS lightly doped drain photomask PLDD-2 in sram cell.In step 1613, carry out the PMOS lightly doped drain technique of the logic region of the first core Core-1 with a PMOS lightly doped drain photomask PLDD-1.In step 1614, carry out the PMOS lightly doped drain technique of the logic region of the second core Core-2 with the 3rd PMOS lightly doped drain photomask PLDD-3.Optionally step 1615 is used extra-light doped-drain photomask in the lightly doped drain zone in input and output zones.Perhaps the lightly doped drain zone in input and output zone can produce in other lightly doped drain steps.In step 1616, produce grid gap wall on grid conductor.In step 1617, carry out deep source and drain electrode (S/D) and inject, to complete whole transistor.
Although the order of describing in above-mentioned steps may be resequenced and combination on step, becoming another embodiment of the invention, yet these still are useful on scope of the present invention.
Gate dielectric can be any known dielectric medium, for example silica, silicon dioxide, silicon nitride, silicon oxynitride and other known siliceous dielectric mediums.Also can use the dielectric medium of high-k (high-K), for instance, in the embodiment of the present invention, dielectric medium comprises hafnium (hafnium), zirconium (zirconium), silicate and oxygen or does not have silicate and oxygen.
Although embodiments of the invention and its advantage illustrate with describing in detail, yet do not breaking away under the defined spirit of the present invention such as claim and category, multi-form change, displacement are all practicable with change.For example, those of ordinary skills can understand easily still have many variable places under category of the present invention.
In addition, the viewpoint of the present invention's application is not limited to the embodiment of the ad hoc approach described in specification or step.Any those of ordinary skills can understand the existing or following technique that develops and step from disclosure of the present invention, as long as implement the cardinal principle identical function or obtain the cardinal principle identical result all can be used in the present invention in described embodiment herein.Therefore, protection scope of the present invention comprises above-mentioned technique and step.

Claims (10)

1. integrated circuit with embedded SRAM comprises:
The semiconductor substrate;
One input and output are regional, comprise a plurality of the first transistors, and above-mentioned the first transistor has a first grid medium thickness;
One first core comprises:
One first logic region has a plurality of transistor secondses, and wherein above-mentioned transistor seconds has a second grid medium thickness that is different from above-mentioned first grid medium thickness and the lightly doped drain zone of being injected with one first lightly doped drain photomask;
One first static RAM zone has a plurality of the 3rd transistors, wherein above-mentioned the 3rd transistor lightly doped drain zone that has above-mentioned second grid medium thickness and injected with one second lightly doped drain photomask; And
One second static RAM is regional, have a plurality of the 4th transistors and at least one the 5th transistor, wherein above-mentioned the 4th transistor has above-mentioned second grid medium thickness, and above-mentioned the 5th transistor has the lightly doped drain zone of being injected with above-mentioned the first lightly doped drain photomask;
Wherein above-mentioned the first lightly doped drain photomask is different from above-mentioned the second lightly doped drain photomask.
2. the integrated circuit with embedded SRAM as claimed in claim 1, an array of consisting of for a plurality of dual-port sram cells of above-mentioned the second static RAM zone wherein, each dual-port sram cell comprises one or six transistor cells and a pair transistor read port, above-mentioned six transistor cells have above-mentioned the 4th transistor, and above-mentioned the 4th transistor has the lightly doped drain zone of being injected with above-mentioned the second lightly doped drain photomask.
3. the integrated circuit with embedded SRAM as claimed in claim 1, wherein the second static RAM zone has a read port, above-mentioned read port has bi-NMOS transistor, and above-mentioned nmos pass transistor has the lightly doped drain zone of being injected with the first lightly doped drain photomask.
4. the integrated circuit with embedded SRAM as claimed in claim 1 also comprises:
One second core, above-mentioned the second core comprises:
One second logic region, have a plurality of the 6th transistors, wherein above-mentioned the 6th transistor has one the 3rd gate dielectric layer thickness that is different from above-mentioned first grid medium thickness and above-mentioned second grid medium thickness and the lightly doped drain zone of being injected with one the 3rd lightly doped drain photomask; And
One the 3rd static RAM is regional, have a plurality of the 7th transistors and at least one the 8th transistor, wherein above-mentioned the 7th transistor has above-mentioned the 3rd gate dielectric layer thickness, and the lightly doped drain that is injected with one the 3rd lightly doped drain photomask zone.
5. integrated circuit with embedded SRAM comprises:
One first core comprises:
One first logic region has a first grid medium thickness and a plurality of the first nmos pass transistor, and wherein above-mentioned the first nmos pass transistor has the lightly doped drain zone of being injected with one first lightly doped drain photomask;
The embedded SRAM zone of the one single-ended shape of the mouth as one speaks, have above-mentioned first grid medium thickness and a plurality of the second nmos pass transistor, wherein above-mentioned the second nmos pass transistor has the lightly doped drain zone of being injected with one second lightly doped drain photomask; And
The embedded SRAM zone of the one first both-end shape of the mouth as one speaks, have above-mentioned first grid medium thickness, at least one the 3rd nmos pass transistor and a plurality of the 4th nmos pass transistor, above-mentioned the 3rd transistor has the lightly doped drain zone of being injected with above-mentioned the first lightly doped drain photomask, above-mentioned the 4th nmos pass transistor is arranged in writes inbound port, the lightly doped drain zone that above-mentioned the 4th nmos pass transistor has above-mentioned first grid medium thickness and injected with above-mentioned the second lightly doped drain photomask;
Wherein above-mentioned the first lightly doped drain photomask is different from above-mentioned the second lightly doped drain photomask.
6. the integrated circuit with embedded SRAM as claimed in claim 5 also comprises:
One second core comprises:
One second logic region, have the second grid medium thickness and a plurality of the 5th nmos pass transistor that are different from above-mentioned first grid medium thickness, wherein above-mentioned the 5th nmos pass transistor has the lightly doped drain zone of being injected with one the 3rd lightly doped drain photomask;
The embedded SRAM zone of the one second both-end shape of the mouth as one speaks, have above-mentioned second grid medium thickness and at least one the 6th nmos pass transistor, above-mentioned the 6th transistor has the lightly doped drain zone of being injected with above-mentioned the 3rd lightly doped drain photomask.
7. the integrated circuit with embedded SRAM as claimed in claim 5 also comprises:
One second core comprises:
One second logic region, have the second grid medium thickness and a plurality of the 5th nmos pass transistor that are different from above-mentioned first grid medium thickness, wherein above-mentioned the 5th nmos pass transistor has the lightly doped drain zone of being injected with one the 3rd lightly doped drain photomask;
The embedded SRAM zone of the one second both-end shape of the mouth as one speaks, have above-mentioned second grid medium thickness and at least one the 6th nmos pass transistor, above-mentioned the 6th transistor has the lightly doped drain zone of being injected with above-mentioned the second lightly doped drain photomask.
8. process with integrated circuit of embedded SRAM comprises:
The semiconductor substrate is provided;
Form an input and output zone, above-mentioned input and output zones comprises a plurality of the first nmos pass transistors, has a first grid medium thickness;
Form one first logic region, above-mentioned the first logic region comprises a plurality of the second nmos pass transistors, and above-mentioned the second nmos pass transistor has the second grid medium thickness that is different from above-mentioned first grid medium thickness and with the one first formed lightly doped drain of lightly doped drain photomask zone;
Form one first static RAM regional, above-mentioned the first static RAM zone comprises a plurality of the 3rd nmos pass transistors, and above-mentioned the 3rd nmos pass transistor has above-mentioned second grid medium thickness and with the one second formed lightly doped drain of lightly doped drain photomask zone;
Form one second static RAM regional, above-mentioned the first static RAM zone comprises at least one the 4th nmos pass transistor, has above-mentioned second grid medium thickness and with above-mentioned the first formed lightly doped drain of lightly doped drain photomask zone; And
Form a plurality of the 5th nmos pass transistors in above-mentioned the second static RAM zone, have above-mentioned second grid medium thickness and with above-mentioned the second formed lightly doped drain of lightly doped drain photomask zone;
Wherein above-mentioned the first lightly doped drain photomask is different from above-mentioned the second lightly doped drain photomask, and the performed implantation step of the performed implantation step of above-mentioned the first lightly doped drain photomask and above-mentioned the second lightly doped drain photomask is different.
9. the process with integrated circuit of embedded SRAM as claimed in claim 8 also comprises:
Form one second logic region, above-mentioned the second logic region comprises a plurality of the 6th nmos pass transistors, and above-mentioned the 6th nmos pass transistor has one the 3rd gate dielectric layer thickness that is different from above-mentioned first grid medium thickness and above-mentioned second grid medium thickness and with one the 3rd formed lightly doped drain of lightly doped drain photomask zone; And
Form one the 3rd static RAM regional, above-mentioned the 3rd static RAM zone comprises at least one the 7th nmos pass transistor, and above-mentioned the 7th nmos pass transistor has above-mentioned the 3rd gate dielectric layer thickness and with above-mentioned the 3rd formed lightly doped drain of lightly doped drain photomask zone.
10. the process with integrated circuit of embedded SRAM as claimed in claim 8 also comprises:
Form one second logic region, above-mentioned the second logic region comprises a plurality of the 6th nmos pass transistors, above-mentioned the 6th nmos pass transistor has one the 3rd gate dielectric layer thickness that is different from above-mentioned first grid medium thickness and above-mentioned second grid medium thickness, and regional with one the 3rd formed lightly doped drain of lightly doped drain photomask; And
Form one the 3rd static RAM regional, above-mentioned the 3rd static RAM zone comprises at least one the 7th nmos pass transistor, and above-mentioned the 7th nmos pass transistor has above-mentioned the 3rd gate dielectric layer thickness and with above-mentioned the second formed lightly doped drain of lightly doped drain photomask zone.
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