CN101958231A - Gaseous environment buffer device - Google Patents
Gaseous environment buffer device Download PDFInfo
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- CN101958231A CN101958231A CN 201010171161 CN201010171161A CN101958231A CN 101958231 A CN101958231 A CN 101958231A CN 201010171161 CN201010171161 CN 201010171161 CN 201010171161 A CN201010171161 A CN 201010171161A CN 101958231 A CN101958231 A CN 101958231A
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- vacuum chamber
- gaseous environment
- gate valve
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
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- Microelectronics & Electronic Packaging (AREA)
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Abstract
The invention discloses a gaseous environment buffer device which is arranged between two different gaseous environment devices to transit a substrate from a first gaseous environment device to a second gaseous environment device. The gaseous environment buffer device comprises a control device, a sensor, a vacuum chamber, a first gate valve used for connecting the vacuum chamber with the first gaseous environment device, a second gate valve used for connecting the vacuum chamber with the second gaseous environment device, a transmission mechanism arranged in the vacuum chamber and a gas extraction and inflation mechanism, wherein the gas extraction and inflation mechanism is communicated with the vacuum chamber, the control device is respectively electrically connected with the first gate valve, the second gate valve, the sensor and the gas extraction and inflation mechanism, controls the first gate valve to open and controls the transmission mechanism to send the substrate into the vacuum chamber, the sensor detects that the substrate completely enters the vacuum chamber as well as controls the first gate valve to close and controls the transmission mechanism to stop transporting the substrate through the control device, meanwhile, the control device controls the gas extraction and inflation mechanism to sequentially carrying out gas extraction and inflation on the vacuum chamber until the atmospheric pressure of the vacuum chamber is equal to the pressure in the second gaseous environment device, controls the second gate valve to open and controls the transmission mechanism to send the substrate out of the vacuum chamber.
Description
Technical field
The present invention relates to a kind of gaseous environment buffer unit, relate more specifically to a kind of being located between two gas with various environmental units substrate is carried out the transition to the gaseous environment buffer unit of the second gaseous environment equipment from the first gaseous environment equipment.
Background technology
The basic structure of OLED is by the indium tin oxide of a thin and transparent tool characteristic of semiconductor (ITO), links to each other with positive pole, adds another metallic cathode, as the structure of sandwich.Wherein also comprise organic film.Compare with LCD, organic material and metal pair oxygen and WGR are responsive, and how at utmost avoiding organic film and metal oxidation by air is one of technological difficulties in the OLED manufacture process.
In the process that OLED makes, substrate need carry out under different gaseous environments in different operation processes, if substrate directly enters the another kind of gaseous environment from a kind of gaseous environment, can cause next gaseous environment cleanliness factor to reduce, thereby influence the manufacturing environment of substrate.For example, in the OLED manufacture process, the operation that has need be carried out under the environment of inert gas (as nitrogen), enter nitrogen environment as substrate from atmospheric environment, being easy to an oxygen G﹠W together takes in the nitrogen environment, cause in the process of making or using organic material and metal electrode oxidized easily, thereby reduce the useful life of OLED and influence quality.
Therefore, be necessary to provide and added a gaseous environment buffer unit between a kind of operation of two gas with various environment and overcome above-mentioned defective.
Summary of the invention
The purpose of this invention is to provide a kind of gaseous environment buffer unit, can guarantee effectively that operation carries out under required gaseous environment, avoid being subjected to other gases and disturb, thereby improve the quality of products.
For achieving the above object, the invention provides a kind of gaseous environment buffer unit, be located between two gas with various environmental units so that substrate is carried out the transition to the second gaseous environment equipment from the first gaseous environment equipment, comprise control device, transducer, vacuum chamber, first gate valve that connects the described vacuum chamber and the first gaseous environment equipment, second gate valve that connects the described vacuum chamber and the second gaseous environment equipment, be located in the described vacuum chamber transport sector and with the inflation mechanism of bleeding of described vacuum chamber, described control device respectively with described first gate valve, second gate valve, the transducer and the inflation mechanism of bleeding are electrically connected, described control device is controlled described first gate valve and is opened and control described transport sector described substrate is sent into described vacuum chamber, the described substrate of described sensor enters in the described vacuum chamber fully and controls by described control device that described first gate valve is closed and described transport sector stops to transmit described substrate, the described inflation mechanism of bleeding of simultaneously described control device control is bled successively to described vacuum chamber and is inflated, after the air pressure of described vacuum chamber was identical with pressure in the described second gaseous environment equipment, described control device was controlled described second gate valve and is opened and control described transport sector described substrate is sent described vacuum chamber.
Preferably, described transducer comprises the first sensor and second transducer, and described first sensor is used to detect described substrate and enters described vacuum chamber fully, and described second transducer is used to detect described substrate and sends described vacuum chamber fully.
Preferably, described transport sector mainly is made up of the some rollers that are arranged in the described vacuum chamber, described first sensor is fixed in the described vacuum chamber and near described first gate valve, described second transducer is fixed in the described vacuum chamber also near described second gate valve.
Preferably, the described inflation mechanism of bleeding comprise air extractor, aerating device, the described air extractor of connection and described vacuum chamber first valve, be connected second valve and the vacuum gauge of described aerating device and described vacuum chamber, described control device is controlled described first valve open so that described air extractor is bled to described vacuum chamber; When described vacuum gauge detected described vacuum chamber and is base vacuum, described control device was controlled described first valve closing and is controlled described second valve open simultaneously so that described aerating device is inflated described vacuum chamber; After the pressure that the air pressure that detects described vacuum chamber when described vacuum gauge and the described second gaseous environment equipment do not have was identical, described control device was controlled described second valve closing.
Preferably, described vacuum chamber is provided with top cover, and described top cover is provided with first observation window; The sidepiece of described vacuum chamber is provided with second observation window.
Preferably, described first observation window comprise viewing glass, the described viewing glass of carrying the observation window holder, be located at observation window pad between described viewing glass and the described observation window holder, be located at the sealing O circle between described viewing glass and the described top cover and support the supporting seat that the described O of sealing encloses.
Preferably, described first gate valve and second gate valve include plugboard trough and are located at the interior plate of described plugboard trough, and are provided with sealing ring between described plugboard trough and the plate.
Preferably, described first valve and described second valve are operated pneumatic valve, and described air extractor is dried pump, and described aerating device is identical with the gas of the described second gaseous environment equipment to the gas that described vacuum chamber charges into.
Compared with prior art, gaseous environment buffer unit employing vacuum chamber of the present invention cooperates with the inflation mechanism of bleeding, after making the substrate that leaves the first gaseous environment equipment enter this gaseous environment buffer unit fully to get vacuum chamber, start first described vacuum chamber is bled of the described inflation mechanism of bleeding and in the substrate transportation, be with the gas of coming together to take away, charge into the required gas of the second gaseous environment equipment to this vacuum chamber again, thereby effectively guarantee the degree of purity of this second gaseous environment equipment when substrate enters the second gaseous environment equipment, can guarantee effectively that operation carries out under required gaseous environment, avoid being subjected to other gases and disturb, thereby improve the quality of products.And whole gaseous environment buffer unit all carries out according to default program control, the automaticity height, and the continuity of assurance whole production line is enhanced productivity.
By following description also in conjunction with the accompanying drawings, it is more clear that the present invention will become, and these accompanying drawings are used to explain embodiments of the invention.
Description of drawings
Fig. 1 is the structural representation of gaseous environment buffer unit of the present invention.
Fig. 2 prepares the view of input gaseous environment buffer unit of the present invention for substrate.
Fig. 3 is the view of substrate sections input gaseous environment buffer unit of the present invention.
Fig. 4 all imports the view of gaseous environment buffer unit of the present invention for substrate.
Fig. 5 is the view of substrate output gaseous environment buffer unit of the present invention.
Embodiment
With reference now to accompanying drawing, describe embodiments of the invention, the similar elements label is represented similar elements in the accompanying drawing.As mentioned above, the invention provides a kind of gaseous environment buffer unit, this gaseous environment buffer unit can guarantee effectively that operation carries out under required gaseous environment, avoids being subjected to other gases and disturbs, thereby improve the quality of products.
Please refer to Fig. 1, be the structural representation of gaseous environment buffer unit of the present invention.Described gaseous environment buffer unit is located between two gas with various environmental units so that substrate 90 is carried out the transition to the second gaseous environment equipment 200 from the first gaseous environment equipment 100, comprise vacuum chamber 10, first gate valve 20, second gate valve 30, transport sector 40, the inflation mechanism 50 of bleeding, control device (figure does not show), the first sensor 60 and second transducer 70, described first gate valve 20 connects the described vacuum chamber 10 and the first gaseous environment equipment 100, described second gate valve 30 connects the described vacuum chamber 10 and the second gaseous environment equipment 200, described transport sector 40 is located in the described vacuum chamber 10 so that substrate 90 is sent to the second gaseous environment equipment from the first gaseous environment equipment through vacuum chamber 10, the described inflation mechanism 50 of bleeding is communicated with described vacuum chamber 10 and described vacuum chamber 10 is bled and inflated, described control device respectively with described first gate valve 20, second gate valve 30, first sensor 60, second transducer 70 and the inflation mechanism 50 of bleeding are electrically connected.
In the present embodiment, the described first gaseous environment equipment 100 is atmospheric environment equipment, and the described second gaseous environment equipment 200 is the pure nitrogen gas environmental unit.Be appreciated that ground, the described first gaseous environment equipment 100 and the second gaseous environment equipment 200 are not limited to the atmospheric environment equipment and the pure nitrogen gas environmental unit of present embodiment.
Please continue with reference to figure 1, described transport sector 40 mainly is made up of the some rollers that are arranged in the described vacuum chamber 10, and described some rollers are used for described vacuum chamber 10 is sent into or sent to described substrate 90.Described first sensor 60 is fixed in the described vacuum chamber 10 and near described first gate valve 20, described second transducer 70 is fixed in the described vacuum chamber 10 and near described second gate valve 30, described first sensor 60 is used to detect described substrate 90 and enters described vacuum chamber 10 fully, and described second transducer 70 is used to detect described substrate 90 and sends described vacuum chamber 10 fully.
The described inflation mechanism 50 of bleeding comprises air extractor 51, aerating device 52, connect described air extractor 51 and described vacuum chamber 10 first valve 53, be connected second valve 54 and the vacuum gauge 55 of described aerating device 52 and described vacuum chamber 10, described first valve 53 is operated pneumatic valve with described second valve 54, and described air extractor 51 is dried pump, and the gas that described aerating device 52 charges into to described vacuum chamber 10 is pure nitrogen gas.Described control device is controlled 51 pairs of vacuum chambers 10 of described air extractor and is bled or stop by controlling opening or closing of described first valve 53, and controls 52 pairs of vacuum chambers 10 of described aerating device and inflate or stop by controlling opening or closing of described second valve 54; Described vacuum gauge 55 is used to detect the atmospheric pressure state of described vacuum chamber 10, when described vacuum gauge 55 detected described vacuum chamber 10 for base vacuum, described control device controlled described first valve 53 and cuts out to stop 51 pairs of vacuum chambers 10 of air extractor and bleed and control simultaneously that described second valve 54 is opened so that 52 pairs of described vacuum chambers 10 of described aerating device are inflated; When described vacuum gauge 55 detects the air pressure of described vacuum chamber 10 when identical with pressure in the described second gaseous environment equipment 200, control described second valve 54 and close to stop 52 pairs of described vacuum chambers 10 inflations of aerating device.
Described first gate valve 20 is pneumatic gate valve, comprise plugboard trough 21 and the plate of being located in the described plugboard trough 21 22, and the junction at described first gate valve 20 and described atmospheric environment equipment is provided with the first sealing ring 23a, described first gate valve 20 is provided with the second sealing ring 23b with the junction of described vacuum chamber 10, the plate 22 closed places that are installed in the described plugboard trough 21 are provided with the 3rd sealing ring 23c, and the described first sealing ring 23a, the second sealing ring 23b and the 3rd sealing ring 23c are used to guarantee the air-tightness of described vacuum chamber 10.The structure of described second gate valve 30 is corresponding with described first gate valve 20, is not described in detail in this.
Preferably, maintenance for convenience, described vacuum chamber 10 is provided with top cover 21, and described top cover 21 can be opened, if then fix with fixed mechanisms such as screws when closing.For the working order of monitoring equipment at any time, described top cover 21 is provided with first observation window 22, described first observation window 22 comprise viewing glass 221, the described viewing glass 221 of carrying observation window holder 222, be located at observation window pad 223 between described viewing glass 221 and the described observation window holder 222, be located at the sealing O circle 224 between described viewing glass and the described top cover and support the described O of sealing and enclose 224 supporting seat 225.The sidepiece of described vacuum chamber 10 also is provided with second observation window 28.
Specifically describe the concrete course of work of gaseous environment buffer unit of the present invention below.At first, please refer to Fig. 2, this moment, substrate 90 preparations entered gaseous environment buffer unit of the present invention from the described first gaseous environment equipment 100; Then, please refer to Fig. 3, control described first gate valve 20 when described control device and open and control described transport sector 40 startups, described substrate 90 is sent into described vacuum chamber 10 (roller of described transport sector 40 rotates along arrow a direction among the figure, and described transport sector 40 drives the direction of advance of described substrate 90 shown in arrow b among the figure) under the effect of described transport sector 40; Then, please refer to Fig. 4, when detecting described substrate 90, described first sensor 60 enters fully in the described vacuum chamber 20, control by described control device that described first gate valve 20 is closed and described transport sector 40 stops to transmit described substrate 90, described inflation mechanism 50 first valves 53 of bleeding of simultaneously described control device control are opened so that 51 pairs of vacuum chambers 10 of described air extractor are bled, when described vacuum gauge 55 detects vacuum degree in the vacuum chamber 10 and is base vacuum (as: 1E-1Pa), described vacuum gauge 55 makes described control device control first valve 53 to close to control described air extractor 51 and stop to bleed by transmitting signal, and controls simultaneously that described second valve 54 is opened so that 52 pairs of described vacuum chambers 10 of described aerating device begin to charge into pure nitrogen gas (pure nitrogen gas charges into direction shown in arrow c among the figure); When described vacuum gauge 55 detects the air pressure of described vacuum chamber 10 when identical with pressure in the described second gaseous environment equipment 200, control described second valve 54 by control device and close stopping described vacuum chambers 10 inflations of 52 pairs of aerating devices, and control described second gate valve 30 simultaneously and open and control described transport sector 40 and drive described substrate 90 move on (direction of advance is shown in figure arrow b); At last, please refer to Fig. 5, when described second transducer 70 detect described substrate 90 leave fully vacuum chamber 10 and and enter in the described second gaseous environment equipment 200, controlling described second gate valve 30 by described control device closes, and control described first gate valve 20 simultaneously and open, to transmit next substrate.
Above invention has been described in conjunction with most preferred embodiment, but the present invention is not limited to the embodiment of above announcement, and should contain various modification, equivalent combinations of carrying out according to essence of the present invention.
Claims (8)
1. gaseous environment buffer unit, be located between two gas with various environmental units so that substrate is carried out the transition to the second gaseous environment equipment from the first gaseous environment equipment, it is characterized in that: comprise control device, transducer, vacuum chamber, first gate valve that connects the described vacuum chamber and the first gaseous environment equipment, second gate valve that connects the described vacuum chamber and the second gaseous environment equipment, be located in the described vacuum chamber transport sector and with the inflation mechanism of bleeding of described vacuum chamber, described control device respectively with described first gate valve, second gate valve, the transducer and the inflation mechanism of bleeding are electrically connected, described control device is controlled described first gate valve and is opened and control described transport sector described substrate is sent into described vacuum chamber, the described substrate of described sensor enters in the described vacuum chamber fully and controls by described control device that described first gate valve is closed and described transport sector stops to transmit described substrate, the described inflation mechanism of bleeding of simultaneously described control device control is bled successively to described vacuum chamber and is inflated, after the air pressure of described vacuum chamber was identical with pressure in the described second gaseous environment equipment, described control device was controlled described second gate valve and is opened and control described transport sector described substrate is sent described vacuum chamber.
2. gaseous environment buffer unit as claimed in claim 1, it is characterized in that: described transducer comprises the first sensor and second transducer, described first sensor is used to detect described substrate and enters described vacuum chamber fully, and described second transducer is used to detect described substrate and sends described vacuum chamber fully.
3. gaseous environment buffer unit as claimed in claim 2, it is characterized in that: described transport sector mainly is made up of the some rollers that are arranged in the described vacuum chamber, described first sensor is fixed in the described vacuum chamber and near described first gate valve, described second transducer is fixed in the described vacuum chamber also near described second gate valve.
4. gaseous environment buffer unit as claimed in claim 1, it is characterized in that: the described inflation mechanism of bleeding comprise air extractor, aerating device, the described air extractor of connection and described vacuum chamber first valve, be connected second valve and the vacuum gauge of described aerating device and described vacuum chamber, described control device is controlled described first valve open so that described air extractor is bled to described vacuum chamber; When described vacuum gauge detected described vacuum chamber and is base vacuum, described control device was controlled described first valve closing and is controlled described second valve open simultaneously so that described aerating device is inflated described vacuum chamber; After the pressure that the air pressure that detects described vacuum chamber when described vacuum gauge and the described second gaseous environment equipment do not have was identical, described control device was controlled described second valve closing.
5. gaseous environment buffer unit as claimed in claim 1 is characterized in that: described vacuum chamber is provided with top cover, and described top cover is provided with first observation window; The sidepiece of described vacuum chamber is provided with second observation window.
6. gaseous environment buffer unit as claimed in claim 5 is characterized in that: described first observation window comprise viewing glass, the described viewing glass of carrying the observation window holder, be located at observation window pad between described viewing glass and the described observation window holder, be located at the sealing O circle between described viewing glass and the described top cover and support the supporting seat that the described O of sealing encloses.
7. gaseous environment buffer unit as claimed in claim 1 is characterized in that: described first gate valve and second gate valve include plugboard trough and are located at the interior plate of described plugboard trough, and are provided with sealing ring between described plugboard trough and the plate.
8. gaseous environment buffer unit as claimed in claim 4, it is characterized in that: described first valve and described second valve are operated pneumatic valve, and described air extractor is dried pump, and described aerating device is identical with the gas of the described second gaseous environment equipment to the gas that described vacuum chamber charges into.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010171161 CN101958231A (en) | 2010-05-06 | 2010-05-06 | Gaseous environment buffer device |
| PCT/CN2011/071913 WO2011137692A1 (en) | 2010-05-06 | 2011-03-17 | Gas environment buffer device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010171161 CN101958231A (en) | 2010-05-06 | 2010-05-06 | Gaseous environment buffer device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101958231A true CN101958231A (en) | 2011-01-26 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201010171161 Pending CN101958231A (en) | 2010-05-06 | 2010-05-06 | Gaseous environment buffer device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN101958231A (en) |
| WO (1) | WO2011137692A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011137692A1 (en) * | 2010-05-06 | 2011-11-10 | 东莞宏威数码机械有限公司 | Gas environment buffer device |
| CN114798599A (en) * | 2022-04-15 | 2022-07-29 | 深圳市华星光电半导体显示技术有限公司 | Mask plate cleaning equipment and mask plate cleaning method |
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| US6843809B2 (en) * | 2002-10-22 | 2005-01-18 | Samsung Electronics Co., Ltd. | Vacuum/purge operation of loadlock chamber and method of transferring a wafer using said operation |
| CN1749820A (en) * | 2004-09-16 | 2006-03-22 | 三星电子株式会社 | Be used for eliminating the method and apparatus of the display defect of liquid crystal indicator |
| CN1790616A (en) * | 2004-10-28 | 2006-06-21 | 东京毅力科创株式会社 | Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program |
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| JP3967424B2 (en) * | 1997-04-30 | 2007-08-29 | 東京エレクトロン株式会社 | Vacuum processing apparatus and pressure adjustment method |
| CN100388456C (en) * | 2005-12-08 | 2008-05-14 | 北京圆合电子技术有限责任公司 | Vacuum lock transitional cavity |
| CN201689873U (en) * | 2010-05-06 | 2010-12-29 | 东莞宏威数码机械有限公司 | Gas environment transitional device |
| CN101958231A (en) * | 2010-05-06 | 2011-01-26 | 东莞宏威数码机械有限公司 | Gaseous environment buffer device |
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2010
- 2010-05-06 CN CN 201010171161 patent/CN101958231A/en active Pending
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2011
- 2011-03-17 WO PCT/CN2011/071913 patent/WO2011137692A1/en active Application Filing
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| JPH07211761A (en) * | 1994-01-21 | 1995-08-11 | Tokyo Electron Ltd | Transfer of material to be treated in treating device |
| US6843809B2 (en) * | 2002-10-22 | 2005-01-18 | Samsung Electronics Co., Ltd. | Vacuum/purge operation of loadlock chamber and method of transferring a wafer using said operation |
| CN1954093A (en) * | 2004-05-14 | 2007-04-25 | 波克股份有限公司 | Methods and apparatuses for transferring articles through a load lock chamber under vacuum |
| CN1749820A (en) * | 2004-09-16 | 2006-03-22 | 三星电子株式会社 | Be used for eliminating the method and apparatus of the display defect of liquid crystal indicator |
| CN1790616A (en) * | 2004-10-28 | 2006-06-21 | 东京毅力科创株式会社 | Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2011137692A1 (en) * | 2010-05-06 | 2011-11-10 | 东莞宏威数码机械有限公司 | Gas environment buffer device |
| CN114798599A (en) * | 2022-04-15 | 2022-07-29 | 深圳市华星光电半导体显示技术有限公司 | Mask plate cleaning equipment and mask plate cleaning method |
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| Publication number | Publication date |
|---|---|
| WO2011137692A1 (en) | 2011-11-10 |
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Application publication date: 20110126 |