CN101714566B - 传感器元件、驱动其的方法、输入装置、显示装置和通信装置 - Google Patents
传感器元件、驱动其的方法、输入装置、显示装置和通信装置 Download PDFInfo
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- CN101714566B CN101714566B CN2009101794110A CN200910179411A CN101714566B CN 101714566 B CN101714566 B CN 101714566B CN 2009101794110 A CN2009101794110 A CN 2009101794110A CN 200910179411 A CN200910179411 A CN 200910179411A CN 101714566 B CN101714566 B CN 101714566B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/1446—Devices controlled by radiation in a repetitive configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/12—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
- H01L31/14—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the light source or sources being controlled by the semiconductor device sensitive to radiation, e.g. image converters, image amplifiers or image storage devices
- H01L31/145—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the light source or sources being controlled by the semiconductor device sensitive to radiation, e.g. image converters, image amplifiers or image storage devices the semiconductor device sensitive to radiation being characterised by at least one potential-jump barrier or surface barrier
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- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Thin Film Transistor (AREA)
- Light Receiving Elements (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Electronic Switches (AREA)
Abstract
Description
Claims (18)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008-258862 | 2008-10-03 | ||
JP2008258862A JP5275739B2 (ja) | 2008-10-03 | 2008-10-03 | センサ素子およびその駆動方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101714566A CN101714566A (zh) | 2010-05-26 |
CN101714566B true CN101714566B (zh) | 2012-01-04 |
Family
ID=42075438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009101794110A Expired - Fee Related CN101714566B (zh) | 2008-10-03 | 2009-10-09 | 传感器元件、驱动其的方法、输入装置、显示装置和通信装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8456460B2 (zh) |
JP (1) | JP5275739B2 (zh) |
KR (1) | KR20100038160A (zh) |
CN (1) | CN101714566B (zh) |
TW (1) | TWI406400B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011040094A1 (ja) * | 2009-09-30 | 2011-04-07 | シャープ株式会社 | 表示装置 |
WO2011040092A1 (ja) | 2009-09-30 | 2011-04-07 | シャープ株式会社 | 表示装置 |
CN105336752B (zh) * | 2014-06-23 | 2018-08-21 | 上海箩箕技术有限公司 | 面阵传感器装置及其形成方法 |
CN105097941B (zh) * | 2015-05-28 | 2019-02-26 | 京东方科技集团股份有限公司 | 一种薄膜晶体管及其制造方法、阵列基板、显示装置 |
JP6704802B2 (ja) * | 2016-06-10 | 2020-06-03 | 株式会社ジャパンディスプレイ | 入力検出装置および電子装置 |
CN115290953B (zh) * | 2022-06-24 | 2024-05-17 | 杭州格蓝丰科技有限公司 | 一种基于动态二极管的自驱动机械信号传感器及其制备方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6051857A (en) * | 1998-01-07 | 2000-04-18 | Innovision, Inc. | Solid-state imaging device and method of detecting optical signals using the same |
JP2004119719A (ja) * | 2002-09-26 | 2004-04-15 | Toshiba Matsushita Display Technology Co Ltd | 光センサ用ダイオード、これを用いた画像入力回路、および画像入力回路の駆動方法 |
US7265740B2 (en) * | 2002-08-30 | 2007-09-04 | Toshiba Matsushita Display Technology Co., Ltd. | Suppression of leakage current in image acquisition |
JP4565815B2 (ja) * | 2003-06-27 | 2010-10-20 | 三洋電機株式会社 | 表示装置 |
JP4737956B2 (ja) * | 2003-08-25 | 2011-08-03 | 東芝モバイルディスプレイ株式会社 | 表示装置および光電変換素子 |
KR100669270B1 (ko) * | 2003-08-25 | 2007-01-16 | 도시바 마쯔시따 디스플레이 테크놀로지 컴퍼니, 리미티드 | 표시 장치 및 광전 변환 소자 |
KR20070003784A (ko) * | 2003-12-15 | 2007-01-05 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 광센서를 가지는 능동 매트릭스 픽셀 디바이스 |
JP4599985B2 (ja) * | 2004-10-21 | 2010-12-15 | セイコーエプソン株式会社 | 光検出回路、電気光学装置、および電子機器 |
US8300031B2 (en) * | 2005-04-20 | 2012-10-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device comprising transistor having gate and drain connected through a current-voltage conversion element |
US8059109B2 (en) * | 2005-05-20 | 2011-11-15 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic apparatus |
US7636078B2 (en) * | 2005-05-20 | 2009-12-22 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic device |
JP2007248956A (ja) * | 2006-03-17 | 2007-09-27 | Epson Imaging Devices Corp | 電気光学装置および電子機器 |
JP2007310628A (ja) * | 2006-05-18 | 2007-11-29 | Hitachi Displays Ltd | 画像表示装置 |
JP2008122659A (ja) * | 2006-11-13 | 2008-05-29 | Seiko Epson Corp | 液晶表示装置及び液晶表示装置の製造方法並びに電子機器 |
US8514165B2 (en) * | 2006-12-28 | 2013-08-20 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
JP4301297B2 (ja) * | 2007-01-19 | 2009-07-22 | エプソンイメージングデバイス株式会社 | 電気光学装置 |
CN101625996B (zh) * | 2008-07-08 | 2011-03-23 | 中芯国际集成电路制造(上海)有限公司 | 用以减少暗电流的ono侧墙刻蚀工艺 |
-
2008
- 2008-10-03 JP JP2008258862A patent/JP5275739B2/ja not_active Expired - Fee Related
-
2009
- 2009-09-14 TW TW098130971A patent/TWI406400B/zh not_active IP Right Cessation
- 2009-09-18 US US12/562,317 patent/US8456460B2/en not_active Expired - Fee Related
- 2009-10-01 KR KR1020090093985A patent/KR20100038160A/ko not_active Application Discontinuation
- 2009-10-09 CN CN2009101794110A patent/CN101714566B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20100085339A1 (en) | 2010-04-08 |
TWI406400B (zh) | 2013-08-21 |
US8456460B2 (en) | 2013-06-04 |
JP5275739B2 (ja) | 2013-08-28 |
CN101714566A (zh) | 2010-05-26 |
TW201027726A (en) | 2010-07-16 |
JP2010092935A (ja) | 2010-04-22 |
KR20100038160A (ko) | 2010-04-13 |
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Owner name: NIPPON DISPLAY CO., LTD. Free format text: FORMER OWNER: SONY CORPORATION Effective date: 20121115 |
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Effective date of registration: 20121115 Address after: Aichi Patentee after: Japan display West Co.,Ltd. Address before: Tokyo, Japan Patentee before: Sony Corporation |
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Granted publication date: 20120104 Termination date: 20181009 |