CN101681106B - 平版印刷印版前体、制备前体中敏化剂混合物的方法 - Google Patents
平版印刷印版前体、制备前体中敏化剂混合物的方法 Download PDFInfo
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- CN101681106B CN101681106B CN2008800174805A CN200880017480A CN101681106B CN 101681106 B CN101681106 B CN 101681106B CN 2008800174805 A CN2008800174805 A CN 2008800174805A CN 200880017480 A CN200880017480 A CN 200880017480A CN 101681106 B CN101681106 B CN 101681106B
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- sensitizer
- printing plate
- potpourri
- plate precursor
- lithographic printing
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- 239000011780 sodium chloride Substances 0.000 description 1
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- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000009997 thermal pre-treatment Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229940113165 trimethylolpropane Drugs 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
- C07C41/01—Preparation of ethers
- C07C41/18—Preparation of ethers by reactions not forming ether-oxygen bonds
- C07C41/30—Preparation of ethers by reactions not forming ether-oxygen bonds by increasing the number of carbon atoms, e.g. by oligomerisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/215—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring having unsaturation outside the six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/23—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/235—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring and to a carbon atom of a ring other than a six-membered aromatic ring
- C07C43/243—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring and to a carbon atom of a ring other than a six-membered aromatic ring having unsaturation outside the six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/06—Systems containing only non-condensed rings with a five-membered ring
- C07C2601/08—Systems containing only non-condensed rings with a five-membered ring the ring being saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Organic Insulating Materials (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
- Secondary Cells (AREA)
Abstract
Description
成分 | PL-01 (比较) | PL-02 (比较) | PL-03 (比较) | PL-04 (比较) | PL-05 (比较) | PL-06 (比较) |
Edaplan | 0.85 | 0.85 | 0.85 | 0.85 | 0.85 | 0.85 |
MEK | 218.74 | 218.74 | 218.74 | 218.74 | 218.74 | 218.74 |
SS-01 | 3.66 | - | - | - | - | - |
SS-02 | - | 3.66 | - | - | - | - |
SS-03 | - | - | 3.66 | - | - | - |
SS-04 | - | - | - | 3.66 | - | - |
SS-05 | - | - | - | - | 3.66 | - |
SSIMIX-01 | - | - | - | - | - | 3.66 |
Dowanol PM | 505.49 | 505.49 | 505.49 | 505.49 | 505.49 | 505.49 |
FST426R | 11.83 | 11.83 | 11.83 | 11.83 | 11.83 | 11.83 |
Mono Z1620 | 126.24 | 126.24 | 126.24 | 126.24 | 126.24 | 126.24 |
Heliogene blue | 67.46 | 67.46 | 67.46 | 67.46 | 67.46 | 67.46 |
Hostanox 03 | 043 | 0.43 | 0.43 | 0.43 | 0.43 | 0.43 |
HABI | 5.53 | 5.53 | 5.53 | 5.53 | 5.53 | 5.53 |
MBT | 0.26 | 0.26 | 0.26 | 0.26 | 0.26 | 0.26 |
KL7177 | 59.53 | 59.53 | 59.53 | 59.53 | 59.53 | 59.53 |
成分 | PL-07 (比较) | PL-08 (比较) | PL-09 (比较) | PL-10 (发明) | PL-11 (发明) | PL-12 (发明) |
Edaplan | 0.85 | 0.85 | 0.85 | 0.85 | 0.85 | 0.85 |
MEK | 218.74 | 218.74 | 218.74 | 218.74 | 218.74 | 218.74 |
SSMIX-02 | 3.66 | - | - | - | - | - |
SSMIX-03 | - | 3.66 | - | - | - | - |
SSMIX-04 | - | - | 3.66 | - | - | - |
SSMIX-05 | - | - | - | 3.66 | - | - |
SSMIX-06 | - | - | - | - | 3.66 | - |
SSMIX-07 | - | - | - | - | - | 3.66 |
Dowanol PM | 505.49 | 505.49 | 505.49 | 505.49 | 505.49 | 505.49 |
FST426R | 11.83 | 11.83 | 11.83 | 11.83 | 11.83 | 11.83 |
Mono Z1620 | 126.24 | 126.24 | 126.24 | 126.24 | 126.24 | 126.24 |
Heliogene blue | 67.46 | 67.46 | 67.46 | 67.46 | 67.46 | 67.46 |
Hostanox 03 | 0.43 | 0.43 | 0.43 | 0.43 | 0.43 | 0.43 |
HABI | 5.53 | 5.53 | 5.53 | 5.53 | 5.53 | 5.53 |
MBT | 0.26 | 0.26 | 0.26 | 0.26 | 0.26 | 0.26 |
KL7177 | 59.53 | 59.53 | 59.53 | 59.53 | 59.53 | 59.53 |
成分OC-01 | g |
PVA-1 | 17.04 |
PVA-2 | 14.87 |
PVA-3 | 7.43 |
Acticide LA 1206 | 0.08 |
Lupasol P | 0.40 |
Lutensol A8 | 0.42 |
水 | 960.00 |
PPP | 灵敏性“新 鲜”印版 (μJ/m2) | 印记或条纹 的水平“陈 化”印版 | 网点增大印版 (Dot Gain Plate)40%“新 鲜”印版的110lpi | 平版印刷性 能 “新鲜”印版 |
PPP-1(比较) | 33 | 1 | 10.6 | 好 |
PPP-2(比较) | 36 | 1 | 10.5 | 好 |
PPP-3(比较) | 32 | 1 | 11.0 | 好 |
PPP-4(比较) | 31 | 1 | 9.8 | 好 |
PPP-5(比较) | 30 | 1 | 9.8 | 好 |
PPP-6(比较) | 32 | 2 | 9.7 | 好 |
PPP-7(比较) | 30 | 1 | 11.5 | 好 |
PPP-8(比较) | 34 | 3 | 10.8 | 好 |
PPP-9(比较) | 32 | 1 | 9.9 | 好 |
PPP-10(发明) | 31 | 6 | 10.1 | 好 |
PPP-11(发明) | 33 | 6 | 10.4 | 好 |
PPP-12(发明) | 31 | 6 | 10.2 | 好 |
Claims (16)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US94010607P | 2007-05-25 | 2007-05-25 | |
EP07108957.7 | 2007-05-25 | ||
EP07108957 | 2007-05-25 | ||
US60/940,106 | 2007-05-25 | ||
PCT/EP2008/055951 WO2008145528A1 (en) | 2007-05-25 | 2008-05-15 | A lithographic printing plate precursor |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101681106A CN101681106A (zh) | 2010-03-24 |
CN101681106B true CN101681106B (zh) | 2013-11-20 |
Family
ID=38626773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008800174805A Active CN101681106B (zh) | 2007-05-25 | 2008-05-15 | 平版印刷印版前体、制备前体中敏化剂混合物的方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8445176B2 (zh) |
EP (1) | EP2153279B1 (zh) |
CN (1) | CN101681106B (zh) |
AT (1) | ATE493688T1 (zh) |
BR (1) | BRPI0811197B1 (zh) |
DE (1) | DE602008004246D1 (zh) |
WO (1) | WO2008145528A1 (zh) |
Families Citing this family (10)
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BRPI0811197B1 (pt) | 2007-05-25 | 2019-04-02 | Agfa Nv | Precursor de placa de impressão litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressão |
EP2290447A1 (en) | 2009-08-25 | 2011-03-02 | Agfa Graphics N.V. | A set for developing a lithographic printing plate |
EP2775351B1 (en) | 2013-03-07 | 2017-02-22 | Agfa Graphics NV | Apparatus and method for processing a lithographic printing plate |
EP3392709A1 (en) | 2017-04-21 | 2018-10-24 | Agfa Nv | A lithographic printing plate precursor |
EP3894958A1 (en) * | 2018-12-10 | 2021-10-20 | Agfa Nv | A lithographic printing plate precursor |
CN114450161B (zh) * | 2019-09-30 | 2024-04-02 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
WO2021065152A1 (ja) * | 2019-09-30 | 2021-04-08 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
CN116601006A (zh) | 2020-12-16 | 2023-08-15 | 爱克发胶印有限公司 | 平版印刷机印活准备方法 |
EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
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CN1882879A (zh) * | 2003-09-22 | 2006-12-20 | 爱克发-格法特公司 | 可光聚合的组合物 |
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-
2008
- 2008-05-15 BR BRPI0811197-9A patent/BRPI0811197B1/pt not_active IP Right Cessation
- 2008-05-15 EP EP08759621A patent/EP2153279B1/en active Active
- 2008-05-15 CN CN2008800174805A patent/CN101681106B/zh active Active
- 2008-05-15 AT AT08759621T patent/ATE493688T1/de not_active IP Right Cessation
- 2008-05-15 DE DE602008004246T patent/DE602008004246D1/de active Active
- 2008-05-15 US US12/602,042 patent/US8445176B2/en active Active
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US20100190105A1 (en) | 2010-07-29 |
WO2008145528A1 (en) | 2008-12-04 |
US8445176B2 (en) | 2013-05-21 |
DE602008004246D1 (de) | 2011-02-10 |
BRPI0811197A2 (pt) | 2014-10-29 |
BRPI0811197B1 (pt) | 2019-04-02 |
EP2153279B1 (en) | 2010-12-29 |
EP2153279A1 (en) | 2010-02-17 |
ATE493688T1 (de) | 2011-01-15 |
CN101681106A (zh) | 2010-03-24 |
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