CN101529328A - Thermally controlled spatial light modulator using phase modulation - Google Patents
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- CN101529328A CN101529328A CNA2007800381016A CN200780038101A CN101529328A CN 101529328 A CN101529328 A CN 101529328A CN A2007800381016 A CNA2007800381016 A CN A2007800381016A CN 200780038101 A CN200780038101 A CN 200780038101A CN 101529328 A CN101529328 A CN 101529328A
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Abstract
An apparatus (43) includes a thin-film interference filter structure (10) having a generally wave length- dependent resonant response to incident optical energy in a predetermined range of wavelengths. The thin-film interference filter structure (10) includes a thermally tunable layer (16) having a thermally tunable optical characteristic such that a range of wavelength-dependent resonant optical responses of the thermally tunable layer (16) are induced by a corresponding range of thermal conditions of the thermally tunable layer. The thin-film interference filter structure (10) is configured to (1) receive a spatially varying pattern of thermal energy (51) at the thermally tunable layer (16) to impart a corresponding spatially varying pattern to the thermally tunable characteristic of the thermally tunable layer (16), and (2) receive the incident optical energy (22) into the thermally tunable layer (16) and output optical energy (26) having spatial modulation corresponding to the spatially varying pattern (51) of the thermally turnable characteristic.
Description
Technical field
The present invention relates to be called as in this article the field of the solid-state light beam tunable devices of photomodulator.
Background technology
US 7,002, and 697 B2 disclose a kind of optical instrument, and it comprises heat-optic tunable, film, the free space interference light filter with tunable passband, and described interference light filter plays a part wavelength selector.Described light filter comprises that one is deposited upon above another layer and the amorphous silicon of forming method Fabry-Perot-type cavity resonator structure and a series of alternating layers of dielectric substance, and described Fabry-Perot cavity structure has: the first multilayered interference film structure that forms first catoptron; Be deposited on the amorphous silicon membrane spacer layer above the first multi-coated interference structure; And be deposited on above the film spacer layer and form the second multilayered interference film structure of second catoptron.This light filter also comprises: the lens that are used for coupling the beam into light filter; Be used for photodetector at light beam and interference light filter interaction back receiving beam; And be used for the circuit of position of heat hot-optic tunable interference light filter with the control passband.
US 7,049, and 004 B2 discloses and comprised one or more dynamic-tuning thin film interference coatings with layer of heat-optic tunable refractive index.Tunable layer in the thin film interference coatings makes film active (active) device of the filtration that is used for light, control and modulation that a class is new become possibility.Active membrane structure can be directly used in or be integrated in the various photonics subsystems, to make tunable laser, to be used for the tunable slotting minute light filter (add-drop filter) of optical fiber telecommunications, tunable polarizer, adjustable chromatic dispersion compensation filter and many other devices.
Summary of the invention
According to the present invention, a kind of device that comprises thin-film interference filter structure is disclosed, described thin-film interference filter structure has the resonance response that the incident optical energy in the presetted wavelength scope is substantially wavelength dependency.But but thin-film interference filter structure comprises the thermal tuning layer of the optical characteristics that at least one has thermal tuning, but but makes respective range by the hot state of thermal tuning layer cause the resonant optical mode responding range of the wavelength dependency of thermal tuning layer.Thin-film interference filter structure is configured to (1) but receives the spatial variations pattern (pattern) of heat energy at thermal tuning layer place, but but giving the spatial variations pattern corresponding with the thermal tuning characteristic of thermal tuning layer, and (2) but but receive the luminous energy that the incident optical energy that enters the thermal tuning layer and output have the spatial modulation corresponding with the spatial variations pattern of thermal tuning characteristic.
Described device can be used for various application, comprises infrared imaging and as the part of display such as visual displays.In another kind of embodiment, described device can be used for optical communication system, for example as add/drop multiplexer (add-drop multiplexer) or carry out the part of other device that wavelength selectivity handles.
Description of drawings
From following description to the specific embodiments of the present invention shown in the accompanying drawing, above and other objects of the present invention, feature and advantage will become obviously, and in the accompanying drawings, the same tag in all different views is represented identical parts.Accompanying drawing is not necessarily drawn in proportion, but focuses on the explanation principle of the present invention.
Fig. 1 is the schematic side elevation of film thermal control (thermally controlled) spatial light modulator according to one embodiment of the invention;
Fig. 2-the 9th is according to the schematic side elevation of the film thermally controlled spatial light modulator of various embodiments of the present invention;
Figure 10 is the schematic plan view according to the film thermally controlled spatial light modulator of one embodiment of the invention;
Figure 11 is the schematic side elevation according to the film thermally controlled spatial light modulator of one embodiment of the invention;
Figure 12 is the figure as the phase response of the function of wavelength that shows the spatial light modulator of Figure 11;
Figure 13 is the generalized block diagram that the use of spatial light modulator in system or application is shown;
Figure 14 is the schematic side elevation according to the film thermally controlled spatial light modulator of another embodiment of the invention;
Figure 15 is the figure that shows the temperature control signals of the spatial light modulator that is used for Figure 14;
Figure 16 is the figure as the phase response of the function of wavelength that shows the spatial light modulator of Figure 14;
Figure 17 illustrates the operation of the spatial light modulator of Figure 14;
Figure 18 is the schematic side elevation that shows the layer structure of spatial light modulator in greater detail;
Figure 19 is the figure as the signal response of the function of phase place that shows owing to utilizing in spatial light modulator that non-zero offset actuates;
Figure 20 illustrates the side view of the spatial light modulator of spendable some mechanical features in one embodiment of the invention;
Figure 21 is the planimetric map of the spatial light modulator of Figure 20;
Figure 22 is the block diagram of demonstration according to the use of the concrete optical texture of one embodiment of the invention;
Figure 23 (a) and 23 (b) are the schematically showing of component of the composograph in the system of Figure 22; And
Figure 24 is the figure of the spatial Fourier light filter that uses in the system of Figure 23.
Embodiment
Fig. 1 shows film thermally controlled spatial light modulator (SLM).SLM comprises the optically resonant structure 10 that is formed by first catoptron 12 (below be also referred to as " back mirror "), second catoptron 14 (below be also referred to as " front mirror ") and optical layers 16.SLM also comprises the thermal element 18 of the space distribution that is positioned at upper surface 20, and these thermal elements 18 play the effect that arrives/be coupled from each regional heat energy of optically resonant structure 10.Optical layers 16 is made by certain material (or combination of multiple material), but this material has the thermal tuning optical property, makes thermal distortion on the SLM cause the respective change of the optical resonance characteristic of SLM.In shown embodiment, light beam 22 (as described in greater detail, its can for monochrome or polychrome) the predetermined wavelength place, first catoptron 12 is essentially total reflection, and second catoptron 14 is for partial reflection.For example, first catoptron 12 can have and is higher than 99% reflectivity, and second catoptron 14 has about 50% reflectivity.According to application, the reflectivity of second catoptron 14 can be with application changes (for example from 10% to 90%) significantly.Such as following with reference to figure 18 description, randomly, can increase the reflectivity of other high layer of reflective material with further improvement first catoptron 12.
In operation, the SLM of Fig. 1 receives the space distribution of heat energy at thermal element 18 places, and receives irradiating light beam 22 at lower surface 24 places.Term " on " and D score only be for ease of reference and use, and any concrete space that does not mean SLM towards or structure.The luminous energy of 10 pairs of incident beams 22 of resonant optical structure is given the space distribution of phase modulation (PM), has the output beam 26 of the desirable characteristics that is caused by phase modulation (PM) with generation.For example, desirable characteristics can be the space distribution of the phase change corresponding with the thermal imagery (thermal image) that receives via thermal element 18, and perhaps it can be a kind of in the characteristic of needed other type in the concrete application of SLM.Provide instantiation below.Though should be pointed out that the SLM of Fig. 1 is configured to operate in reflection (output beam 26 is propagated on the contrary with the direction of propagation of incident beam 22) mode, alternative embodiment can be configured to operate with transmission mode.
Usually, suitable is that one or more material lists of optical layers 16 reveal greater than about 10
-5The thermo-optical coeffecient of/K (as the normalization derivative of the real part of the refractive index n of the function of temperature T), that is:
|(l/n)(dn/dT)|＞10
-5/K
This material, amorphous silicon for example provides high relatively gain in the information that hotlist is shown (receiving via thermal element 18) is converted to the process of available optical phase modulation pattern.
Should be pointed out that thermal element 18 is the general expressions that may reside in the dissimilar hot active structure in the alternative embodiment.In a kind of embodiment that is described below, thermal element 18 is taked the form of radiation absorber.In the another embodiment that is described below equally, they take the form of automatically controlled (electrically controlled) resistive element.Also relate to other variation below.
The variant of the general SLM of Fig. 2 displayed map 1 wherein forms adiabatic toward each other various piece 28, to produce adiabatic region.Each part comprises active region 30 separately, and it separates by the active region 30 of one or more adiabatic regions 32 with adjacent part 28.Can realize in many ways this cutting apart, comprise the pattern etched of for example carrying out as the membrane structure of Fig. 1.By the thermal insulation between the zones of different of improving SLM, cut apart and to improve spatial resolution and contrast significantly.It should be noted that the thermal insulation that is provided by adiabatic region 32 can change according to using, and adiabatic change degree can provide by the distinct methods that produces adiabatic region 32.Can also regulate spatial frequency, to change the contribution of adiabatic region to output beam 26 across the adiabatic region 32 of SLM.In one embodiment, the spatial frequency of adiabatic region 32 can be the twice of the spatial frequency of thermal element 18, thereby produces signal in diffraction system, the exponent number that the main signal that makes it be in autothermal element 18 recently is higher and can therefrom separating.
Should be pointed out that in the embodiment of Fig. 2 part 28 can be divided into " signal " 28a of portion and " reference " 28b of portion of intersperse (interspersed), wherein signal section 28a comprises thermal element 18, and reference section 28b does not comprise thermal element 18.This configuration can be used to provide the self-reference or the differential aspect of operation, and wherein signal section 28a receives interested thermal signal (via thermal element 18).Signal section 28a and reference section 28b stand background or reference thermal level.Part 28a and 28b produce the differential mode and the common mode component of output beam 26, and use suitable technique, these components can be separated,, thereby cause the higher signal to noise ratio (S/N ratio) of signal to noise ratio (S/N ratio) that exists than in component of signal separately then trending towards eliminating the mode combination of common-mode reference or background level.Therefore, self-reference can be the powerful and useful technology in the various application.Yet, may not need self-reference in certain embodiments, and in this case, what can suit is all or in whole basically parts 28 to comprise thermal element 18, so that to the coupling maximization of the thermal information of SLM.Should also be noted that signal section 28a and the number ratio of reference section 28b can depend on application, and the number of reference section 28b can equal, be greater than or less than the number of signal section 28a.
Fig. 3 is presented at the another kind of variant that uses biasing element 34 among each signal section 28a.Explain that as following a kind of diffraction efficiency " response curve " of describing the operating performance of the resonant optical structure 10 that makes up with signal section 28a and reference section 28b is arranged.Described response curve has periodic substantially shape, thereby has the relative steeper part of bigger relative response.For example, biasing element 34 can be used under the situation of the signal that does not come autothermal element 18, makes to operate at this steeper part place of more close response curve.This not only improves signal response, and allows the correct polarity of being imported by the reference or the colder heat of background level of reference section 28b sensing (polarity) is detected.Biasing element 34 can form in every way, for example comprises being increased to (or on the contrary, the thin layer that is not present among the reference section 28a being increased among the reference section 28b) among the signal section 28a by the optical clear thin layer that will not be present among the reference section 28b.Similarly, in some structure of optically resonant structure 10, can from signal section 28a, deduct by the optical clear thin layer that will be present in reference section 28b and form biasing (offset).Should be understood that in alternative embodiment, can realize this biasing, comprise for example relative mechanical shift between the part 28a and 28b by alternate manner.With optical polarization but not the advantage that mechanical bias is attached in the optically resonant structure 10 be, this biasing only the wavelength place in resonant bandwidth is effective.In addition, this biasing can be introduced does not have in the structure of different signal section and reference section, can introduce with the level more than two kinds in addition, for example can use whole series of steps to set up " glittering " optical grating construction.Extra details is provided below.
Fig. 4 illustrates a kind of alternative approach that forms part 28, and wherein second catoptron, 14 continuous spans are crossed some or all of part 28.This continuous reflection mirror can constitute mechanical carrier, and can constitute wherein that structure is thermally (thermal ground) plane of self-supporting (free-standing), and plays by the minimized effect of the part of the incident optical energy of heat insulating construction diffraction.
Fig. 5 shows and utilizes mask 36 to reduce from the coupling in the adiabatic region 32 of luminous energy between part 28 of incident beam 22, thereby reduces the alternatives of any this coupling to the contribution of output beam 26.Incident beam 22 is not to incide on the adiabatic region 32, but incident beam 22 incides on the mask 36.But any this energy that is coupled in the output beam 26 in the mode that can not separate from the contribution that is caused by the thermal tuning optical layers all is effective noise source, and preferably is held low as far as possible.Mask 36 is made by the one or more wavelength place at incident beam 22 opaque relatively (absorbing or reflection) material.Can randomly set the interval of mask 36 and resonant optical structure 10, to provide light in the output beam 26 with respect to the phase differential of the wavelength integral multiple of incident beam 22.
Fig. 6 show wherein part 28 all with common thermal " " 38 alternativess that contact, described common thermal " " 38 can be thin layer or some other conductive structure of Heat Conduction Material.In an alternative embodiment, heat control is public thermally 38 effectively, with control resonance wavelength.In another embodiment, it is public thermally 38 that the serviceability temperature sensor is monitored effectively, and resulting temperature information is used to control the characteristic of incident beam 22, such as its Wavelength distribution.
If Fig. 7 show wherein exist public thermally 38, then part 28 all with the public thermally alternatives of 38 thermal insulation.This configuration can provide the better total sensitivity of SLM.This structure can be preferred for some application.As selection, signal section 28a can be with thermally adiabatic, and reference section 28b can with thermally contact.As selection, in another embodiment, second group of thermal element can be added to lower surface 24, thereby allow thermal signal to be coupled in the part 28 at surperficial 24 places as common-mode signal or difference signal.For example, with respect to each signal section 28a, each reference section 28b can have heat biasing or temperature offset.As selection, can lower surface 24 places with different thermal signals with Fig. 1 in the thermal element 18 described identical modes of upper surface 20 and Fig. 1-6 are introduced.By this way, the thermal distortion at the optical layers place will be to be caused by the composite signal from the upper and lower thermal element.As for as operation,, for example, construct the thermal element on the lower surface by in thermal element, using transparent material in the mode that allows incident bottom light beam 22 and output beam 26 to propagate to the transmission mode that Fig. 1 discussed.
Fig. 8 shows that wherein signal section 28a comprises the alternatives of conducting the radiation absorber 40 that is coupled to thermal element 18.This structure can be used for wherein providing the application of energy, for example infrared ray (IR) imaging applications with forms of radiation to SLM.Radiation absorber 40 is by (for example, in long-wave infrared (LWIR) scope) absorbent material or the structure composition at interested wavelength place.As shown in the figure, radiation absorber 40 can laterally extend covering adjacent reference area 28b at least in part, therefore not only enhancing signal intensity but also reduce the amount that incides the thermal signal on the reference area 28b, thus increase differential response.In order to increase the absorption efficiency of radiation absorber 20, radiation absorber 40 can be placed in 1/4th radiation wavelength places of high reflection layer 20 top.
Radiation absorber 40 and biasing element 34 are wherein used in Fig. 9 demonstration, and part 28 and any public thermally structure of 38 thermal insulation.This special structure for example can be particularly suitable for, the LWIR imaging applications.One skilled in the art should appreciate that alternative embodiment can adopt other combination of the feature that occurs in the alternative embodiment that shows in Fig. 1-8.
How Figure 10 shows in one embodiment the floor map of signal sections 28a (with letter " S " expression) and reference section 28b (representing with letter " R ").In the structure shown in concrete, each signal section 28a by eight reference section 28b around.Optional heat dump 40 with dashed lines contour representations.As shown in Figure 8, these are placed on the structure 10.What also illustrate is the mask layer 36 (noting not illustrating the hole of mask 36, because they are covered by part 28 in Figure 10) that is positioned in part 28 belows as shown in Figure 5.
Figure 11 and 12 explanations comprise the operation of SLM of Fig. 9 of the mask 36 of Fig. 5.Figure 11 shows that SLM receives the hot IR radiation of incident at radiation absorber 40 places, and receives incident reading optical beam 22 and output beam 26 at its lower surface 24 places.Figure 12 shows the response characteristic (SIG) of response characteristics to light (REF) and the signal section 28a under the situation that does not have and exist incident IR radiation (being respectively radiationless and radiation) of reference section 28b.Particularly, light characteristic is from the phase place Φ of the part of various piece 28 (reflection) output beam 26
RAs shown in the figure, this value is being read wavelength X
ReadThe zone in be converted to 2 π from 0.ΔΦ value among Figure 12 is when heat radiation is incided on it, the general expression of the order of magnitude of the difference of the phase place of being given by reference section 28b and the phase place of being given by signal section 28a.
Figure 13 shows the system of SLM or the generalized block diagram of application.With mark 43 expression SLM.Heat structure 45 is arranged as relative, and optical texture 47 is arranged as relative with lower surface 24 with upper surface xx.The signal 49 of 45 pairs of receptions of heat structure responds, and the spatial variations pattern of heat energy 51 is provided with the upper surface 20 to SLM 43.In the embodiment of Fig. 1-11, comprise thermal element 18 in SLM 43 inside.Optical texture 47 produces incident beam 22 and receives output beam 26.
In one embodiment, system is infrared ray (IR) imaging system or similar measurement/sensing system.In this application, for example, the signal 49 of reception can be the source IR radiation from interested scene, and heat structure 45 can comprise IR lens and/or other thermo-optical device, so that source IR radiation is focused on the SLM 43.Incident beam 22 is can be by the reading optical beam of laser instrument in the optical texture 47 or the generation of similar source (not shown).Output beam 26 is the light beams with spatial variations modulation pattern of expression IR image, and it is by the assembly utilization in the optical texture 47, so that the information (such as by suitable transducer output beam 26 being converted to electric signal) about the space distribution of the heat energy in the signal 49 that receives to be provided to the user.As described in greater detail, optical texture 47 can comprise Fourier Optical System, spatial light filter and other optical module, to regulate output beam 26.In an alternative embodiment, heat structure 45 can be configured to receive conduction heat energy but not the source heat energy of the form of radiant heat energy, for example in the application that is used for detecting from the pattern of the heat energy of chemistry or biological assay.Other embodiment is described below.
Figure 14 shows can be at the alternative application of separating one or more wavelength component from multiple wavelength optical signal, for example SLM that uses in wavelength-division multiplex (WDM) optical communication system.In this embodiment, thermal element 18 ' is active heating element (such as a resistor), and this active heating element can be controlled by the external circuit (not shown), thereby controls the space heat distribution of SLM in the mode that causes one or more required wavelength separated.With thermal element 18 ' be arranged in the group T1, the T2 that are labeled as corresponding different predetermined localized temperatures ..., T5.Also there is common heater element 44.In operation, common heater element 44 temperature that is used to be labeled as T0 by foundation with SLM be tuned to specific wavelength λ
i, and element 18 ' is set to makes SLM with wavelength X
iWith be present in incident beam 22 in the different angle of other wavelength carry out the temperature of diffraction.In case set up this apart, just can handle separation component by other system component as required.In wdm system, SLM can form optics and insert/part of division multiplexer (OADM), it optionally removes one or more interested wavelength component from the WDM signal that receives, and optionally inserts one or more interested wavelength component in output WDM signal.
Figure 15 shows operable temperature groups T0-T5.As shown in the figure, these are one group " stepwise " or the temperature that is designed to introduce equably offset phase, and it is to reflection wavelength component λ
iIntroduce corresponding local phase shift amount.Further specify the phase propetry of reflection among Figure 16, it shows the optical characteristics generation n=0,1,2,3,4 that how to utilize phase place-right-wavelength, 5 phase shift group n π/3 (separately corresponding to different temperature T 0-T5).As shown in Figure 17, the overall performance of SLM is the overall performance of wavelength selectivity blazed grating.Figure 17 (a) shows the operation that all temperature T 0-T5 wherein equate each other, and Figure 17 (b) shows the operation that T0-T5 wherein has the stepwise value shown in Figure 15.As shown in Figure 17 (b), wavelength component λ
iHave than other component and (be expressed as λ
1...n-λ
i) bigger angle of diffraction.Can be along wavelength component λ
iTrack on correct position settle one or more optical device, to carry out for one or more specific required functions of this wavelength component.
As noted above, the SLM that describes with reference to figure 14-17 more than can be used as the part of the optical device in the optical communication system.Refer again to Figure 13, SLM is with mark 43 expressions in this application.Optical texture 47 is configured to provide first communicate optical signal as incident beam 22 to SLM 43, and is used to output beam 26 from SLM 43 as second communicate optical signal.For example, incident beam 22 can be the WDM signal that receives from another communication node, and output beam 26 can be the WDM signal that is used to be transferred to the variation of another communication node.Variation can be that the form of (drop) one or more wavelength is told in the part as mentioned above.Should be pointed out that and to use identical structure, to insert (add) one or more wavelength by the direction of the whole light beams shown in Figure 17 that reverse simply.
In this application, the signal 49 (Figure 13) that receives is in optic communication device, the electric control signal that produces by the separation control circuit (not shown) for example, described electric control signal produce being used to and insert/minute one or more specific wavelengths (other optical function that maybe will carry out).Heat structure 45 is configured to respond the signal 49 of reception and the spatial variations pattern of the electric signal of the heat energy 51 that provides to SLM 43 is provided.The spatial variations pattern of heat energy 51 is to allowing SLM 43 to carry out the effective predetermined pattern of required optical function.For example, the spatial variations pattern of heat energy 51 can be the pattern that for example passes through the 0-T5 of temperature T as mentioned above of thermal element 18 ' generation.
Figure 18 shows the membrane structure of SLM in greater detail.It can use normalized optical coating technology and available coating material, such as silicon (Si), silicon nitride (SiN
x), platinum manufacturings such as (Pt).This structure comprises the substrate 46 that is positioned at lower surface or " reading " surperficial 24 places.Baseplate material is at the wavelength of reading of design, and for example visible light or near infrared ray place are radioparent.Typically use glass substrate, but other optical material (for example, sapphire, quartz etc.) is suitable substitute.Preferably, substrate has antireflection (AR) coating in its exposure.In one embodiment, substrate thickness can be about 650um usually.In another embodiment, structure 10 can comprise the Gires-Tournois etalon.
The technician of optical field it should be understood that and can use other material and design to realize identical or similar result, particularly when needs different read wavelength the time.
Figure 19 is used to explain as fixing phase bias being introduced as described in the earlier in respect of figures 3 ultimate principle of the response of SLM.Figure 19 illustrates the diffraction efficiency of phase grating-promptly, is diffracted into the amount of the luminous energy (being shown as " signal ") on higher (non-zero) rank-be non-linear, the periodic symmetric function of peak to the phase differential (being shown as " phase place ") of paddy.In a class embodiment, the energy that is diffracted into non-zeroth order is an interested signal in the system.Can use single single order or single order and more any combination of high-order.Temperature difference between phase depth of this type of grating (phase depth) and the part 28 that replaces (signal and with reference to) is proportional, so point of normal operation of SLM phase grating, promptly the operating point when not importing is positioned at zero-temperature coefficient and almost locates, and this point is represented with " N " in Figure 19.An advantage in this point " N " operation is when not having signal, not have output intensity.Yet, also have shortcoming.Because turnover (inflection), the temperature from N biasing (higher or lower relatively) produces identical output in any direction, that is, though concrete output be meant and the clean temperature difference of just still bearing only of ambient temperature, all may have indeterminate property.
Therefore, for the biasing alternating segments 28 of SLM, can be suitable be shown in Figure 19 mid point " B ", in the more precipitous and more linear part operation of diffraction efficiency response curve.This can by as top with reference to as described in the figure 3, with net phase biased put to add in the alternate picture dot carry out.Operate at such bias point place and not only to improve small signal system response and to provide more linear input-output relation, and allow to differentiate clearly the hot input signal that does not have background so hot (that is, " bearing " phase depth).In some applications, maximum phase is setovered preferably less than the π radian, is low slope, non-linear and symmetrical at this some place response curve again with respect to negative temperature.
In many application, preferred phase bias is less than the pi/2 radian.For example, in hot Application in Sensing, total induced signal phase is the sub-fraction of cycle (cycle).Therefore, preferred biasing is even as big as small-signal response is removed (that is, " N " removes from point) from the flat portions of response/diffraction efficiency curve, and have big biasing of setovering to the big background intensity of introducing.This point symbolically is denoted as point " P " in Figure 19.As selection, high if desired zero order reflection, although then have lower contrast, can preferred point N.
Although as mentioned above, phase bias can in alternative embodiment, can use the mechanical phase biasing technique, such as passing through mechanical mobile alternating segments 28 randomly such as by using biasing element 34 to finish.This mechanical shift can be by before deposition optical texture 10, pre-sacrificial patterned on substrate and producing.Sacrifice layer produces the island (island) of the mechanical shift of a series of qualification alternating segments 28.Can form suspention (suspension) feature and remain on the substrate top with the alternating segments 28 (for example, signal section 28a) that will stay at first on the island.Reference section 28a also can suspend in midair from cantilever, the feasible alternating signals portion and the reference section that can obtain as shown in Figure 10.
Subsequently, sacrificial layer islands is etched, stays the part that replaces 28 that is suspended suspension features.
The response sensitivity of SLM and time constant are decided by that heat energy is sent to the thermal capacity of speed, element 18 in the zone of optical texture 10 from inputting interface and near the heating radiator/substrate any or the balance between other cooling mechanism speed of conducting heat from this zone.In any specific embodiments, the suitable usually requirement that is based on application realizes required balance.
Figure 20 illustrates an embodiment that is in self compensation version with side view, and wherein signal section 28a has to the path of the limited conductivity of heating radiator, and reference section 28b has the high conductance path to heating radiator.What usually, can suit is the transfer rate that reduces signal section 28a; That is, suitable usually is with signal pixels and heat-radiating substrate 55 thermal insulation.As shown in Figure 20, each signal section 28a is suspended in midair from substrate 55 by the suspention feature such as the thin cantilever 56 of the upper surface of the one or more reference section 28b around being connected to.And reference section 28b can directly contact with substrate 55 by for example one or more " projectioies " 58.
Cantilever 56 can be made with monox, silicon nitride, cured polymer or other structural membrane material.If use absorber 40 (Fig. 9), then it is preferably by making with cantilever 56 identical materials.Advantageously, cantilever 56 has lower thermal conductivity, for example by the use of low conductivity material and the patterning of cantilever 56, the required thermal insulation between 28a of picked up signal portion and the substrate 55.Can add extra material to some zone of absorber 40, for example thin metal is to strengthen the absorption of input signal.Because it increases thermal conductivity unfavourably, so this thin metal is not added in the cantilever 56 usually.Can construct absorber 40 and cantilever 56 respectively, make that absorber is " umbrella " of each top among cantilever 56, signal section 28a and the reference section 28b, is connected to sensor part 28a simultaneously so that support structure and heat passage to be provided.When constructing absorber 40 and cantilever 56 respectively, can use different materials, for example be used for the low thermal conductivity material of arm, and the high heat conductance or the high-absorbent material that are used for absorber.
Heat passage between signal section 28a and the substrate 55 arrives reference section 28b through narrow cantilever 56, through projection 58, arrives substrate 55 thus downwards.(not shown) randomly, what replace projection 58 is, can pass the pattern of reference section 28b etch-hole, directly ends at substrate 55 to allow cantilever 56, thereby with signal section 28a hot joining ground (grounding), and without any the remarkable heat transfer to reference section 28b.In such embodiments, reference section 28b is still kept separating with substrate 55 by projection 58.As selecting (also not shown), cantilever 56 can end at reference section 28b and contact substrate 55 not.In this embodiment, the reference and the signal section of whole group are suspended in substrate 55 tops, and the periphery along structure contacts between substrate 55 and the reference area, as schematically illustrated in superincumbent Fig. 7 and 9.
The structure of Figure 20 is easy to use the manufacturing of standard foundry engieering.In a preferred embodiment of the method, as shown in Figure 20, signal section 28a and reference section 28b all with substrate 55 septal space 60 mutually, the thickness in this gap 60 is essentially the integer of half-wavelength.In order to form gap 60, before deposition optical texture 10, the sacrifice layer of deposit patterned on substrate 55.The thickness of this layer is preferably and is provided at the half-wavelength of reading the wavelength place after with this layer removal, and the extra round trip distance that makes reading optical beam 22 to propagate is essentially 1 wavelength, does not read such thickness thereby do not influence.Sacrifice layer can be to be removed complete polyimide, oxide or other this type of material of further feature that keeps design simultaneously.The projection 58 that forms heat passage between reference area 28b and substrate 55 is by producing corresponding to the sectional hole patterns of protruding 58 desired locations sacrifice layer is carried out patterning.Being deposited upon on this patterned sacrificial layers of optical texture 10, and by hole arrival substrate 55.Then, with optical texture 10 patternings and etching, between sensor part 28, to produce adiabatic region 32.Note, in this embodiment, except around projection among a small circle in, reference section 28b and signal section 28a are coplane after the manufacture process neutralization.
After deposition optical texture 10, deposition second sacrifice layer on above-mentioned metallic reflector.With this second sacrifice layer of suitable pattern etching, contact 28a of the sensor portion and reference section 28b simultaneously to allow suspension layer.Then, suspension layer is deposited on the sacrifice layer and patterning, to form narrow cantilever 56 and wide extended absorbers (if you are using).At last, sacrificial layer etching is fallen.Plane illustration among Figure 21 shows that schematically each signal section 28a has the hexagonal lattice of the signal section 28a of three cantilevers 56 to arrange, wherein for the sake of clarity omits extended absorbers.Can for example comprise by other combination imagination alternative construction of aforementioned feature, still less or more cantilever, and the difform suspention that obtains the thermal insulation of more or less amount.Reference section 28a also can suspend in midair from cantilever, the feasible alternating signals portion and the reference section that can obtain as shown in Figure 10.
In another embodiment, the projection 58 among the reference section 28b can be replaced by high heat conductance post or support.Patterning had with first sacrificial material layer in projection 58 required identical holes be coated with outward to form stent strut with high conductivity.Then surface planarization is used for depositing subsequently the uniform surface of optical texture 10 with generation.Preferably, post is by the high thermal conductivity material that the good thermo-contact between reference section 28b and the substrate 55 is provided, and for example aluminium is made, or by the material that is easy to complanation, for example silicon nitride is made.
Figure 22 shows an example of a class optical texture 47 that can be used in combination with for example SLM shown in Figure 13 43.Optical texture 47 comprises the light source 62 (for example NIR laser instrument) that produces divergent beams 64.Light beam 64 strikes on the lens 66, and these lens 66 make light beam 64 collimations and it is guided to SLM 43 as incident beam 22.Assemble from light (the being output beam 26) scioptics 66 of SLM 43 reflections.Settle light filter 68 on the focal plane, its structure describes below with operating in.Beyond the focal plane, (wherein only disperse), for example, settle other lens 70 so that optical alignment and it is guided to transducer subsystem 72.Transducer subsystem 72 can be that response light is imported and CMOS or CCD transducer or other this type of transducer of generation electric signal.
Figure 23 is illustrated in the light pattern that occurs in the focal plane of lens 66.Figure 23 (a) illustrates the pattern that occurs when not existing signal 49 (Figure 13) to make the common mode component that only has signal output beam 26.In this case, the membrane structure of SLM 43 plays the effect of plane mirror in fact, and wherein signal section S and reference section R only respond in its common mode mode.Light from SLM 43 is focused into single common-mode focal image 74.Should be understood that common-mode focal image 74 has high relatively intensity, thus in fact " baseline " heat-photoresponse (below will describe in further detail) of lock-on signal element and reference element.
Figure 23 (b) illustrates the set of diagrams case that occurs when non-zero signal 49 exists.In this case, the signal section S of SLM 43 has the reflectivity different with reference section R, and this species diversity causes the diffraction effect from the output beam 26 of SLM43 reflection.Still there are common-mode focal image or component 74, also have several differential mode images or component 76, the interval of the signal section S of the corresponding SLM 43 of their amount of space.Pattern among Figure 23 (b) can be regarded as the spatial fourier transform of the output beam 26 that is produced by SLM 43.Should be noted that the pattern that shows among Figure 23 (b) is to be arranged by the checkerboard type of signal section S and reference section R to cause, this checkerboard type is arranged and is different from the arrangement shown in Figure 10 and 21.The arrangement that one skilled in the art will understand that Figure 10 and 21 correspondingly causes the different pattern of component 76.
Figure 24 shows light filter 68.It is normally transparent at the wavelength place of light source 62, have be used for tolerance mold component 76 by in stop the material piece of the center zone of opacity 78 of common mode component 74.The space pattern of other type also can be used for this optical filtering, such as the light filter that on single first order of diffraction light is passed through.The single first order can help reducing unwanted signal from the array features of different space frequency by light filter.
Although illustrate and described the present invention particularly with reference to its preferred embodiment, but one skilled in the art should appreciate that, under the situation that does not depart from the spirit and scope of the present invention that limit by appended claim, can carry out the various changes of form and details therein.
For example, the potential application of another of SLM is as a part that is used to show the display (as visual displays) of the information of representing with display control signal.Again with reference to Figure 13, in this used, the signal 49 of reception was a display control signal, and it can be for example common expression or the one group of electric signal that transmits display message (that is, for example, in the intensity and/or the color of each position display of two dimensional display).The signal 49 that heat structure 45 is constructed to receive is converted to the spatial variations pattern of the heat energy that offers SLM 43.In one embodiment, the heat structure 45 of this display comprises: the group of steric heating element (such as resistor), it applies (impress) mode on SLM 43 by " addressing (addressed) " or control with the image that will show with the form of the spatial variations pattern of heat energy 51 by the signal 49 that receives.Optical texture 47 comprises the optics read assembly, and described optics read assembly jointly is constructed to produce incident beam 22 and uses suitable optical system group to handle output beam 26, so that this light beam is projected on the display screen.If use the method for above-mentioned employing signal section 28a and reference section 28b, then optical texture 47 can comprise Fourier's light filter and lens, projects on the display screen with the light beam after will filtering.Another kind method be utilize heat energy to produce will be by the phase image of the Fourier transform of image projected, then can be under the situation that does not get involved optical system (except the optical system that may be used for convergent-divergent) direct display light because the far field pattern is the Fourier transform of the phase pattern on the array.
Claims (36)
1. device that comprises thin-film interference filter structure, described thin-film interference filter structure has the phase response that is substantially wavelength dependency to the incident optical energy in the presetted wavelength scope,
But described thin-film interference filter structure comprises at least one thermal tuning layer, but makes respective range by the hot state of described thermal tuning layer cause the scope of the phase response of wavelength dependency,
Described thin-film interference filter structure is configured to (1) but receives the spatial variations pattern of heat energy at described thermal tuning layer place, and (2) but receive the described incident optical energy enter described thermal tuning layer, and light energy output is given in the modulation of space phase that will be corresponding with the spatial variations pattern of described heat energy.
2. device according to claim 1, described device are configured to make described light energy output propagate on the direction opposite basically with the direction of propagation of described incident optical energy with the reflection way operation.
3. device according to claim 1, but wherein said thermal tuning layer is heat-luminescent material, but and described thermal tuning optical characteristics comprise and satisfy relation | (l/n) (dn/dT) |＞10
-5The temperature dependency refractive index n of/K.
4. device according to claim 1, but described device comprises that also adiabatic region is to produce the thermal tuning layer of patterning.
5. device according to claim 4, but wherein said thin film interference filters comprises the catoptron with the thermo-contact of described thermal tuning layer, but described catoptron continuous span is crossed the thermal tuning layer of described patterning.
6. device according to claim 4, described device also comprises mask, described mask prevents all that basically described incident optical energy from inciding on the described adiabatic region.
7. device according to claim 6, described device also comprises catoptron, the optical path difference between wherein said mask and the described catoptron is rated for the half-wavelength of described incident optical energy.
8. device according to claim 4 is wherein with described adiabatic region patterning, to give the space phase modulation to the described light energy output that can separate from the described space phase modulation of the spatial variations pattern of the described heat energy of correspondence.
9. device according to claim 8 is wherein compared with the spatial modulation that is caused by described heat energy, and the spatial modulation to described light energy output that is caused by described adiabatic region is in higher frequency.
10. device according to claim 1 provides thermally thermally structure but wherein said film interference structure also is included as described thermal tuning layer.
11. device according to claim 10, the temperature of wherein controlling described thermally structure is to select the optical wavelength of described wavelength dependency phase response.
12. device according to claim 10, the temperature of wherein said thermally structure is measured and be used to set the optical wavelength of described incident optical energy.
13. device according to claim 1, but any thermally structure thermal insulation in wherein said thermal tuning layer and the described device.
14. device according to claim 1, but described device also is formed at the second spatial variations pattern that described thermal tuning layer place receives heat energy.
15. device according to claim 1, but wherein said thermal tuning layer is configured for self-reference by comprising signal section and reference section, described signal section and reference section have the common-mode response to background heat energy, and the heat energy pattern that receives is had differential response.
16. device according to claim 15, wherein said signal section comprises heat dump, and described heat dump is configured to increase between described signal section and the described reference section differential response to the heat energy pattern that receives.
17. device according to claim 15, wherein adjacent signal section and reference section are adiabatic mutually, with resolution and the signal-to-noise performance that improves described device.
18. device according to claim 15, described device also comprises mask, but described mask is configured to reduce the amount of the described incident optical energy in the zone that arrives the described thermal tuning layer between the adjacent adiabatic region.
19. also being formed in the differential response of described signal section and reference section, device according to claim 15, described device comprise predetermined bias, to improve linear and to realize the sensing of the hot state colder than background heat state.
20. device according to claim 19 is wherein realized the described predetermined bias of described signal section by the Film Optics bed device.
21. device according to claim 19 is wherein realized the described predetermined bias of described signal section by thermic devices.
22. device according to claim 19 is wherein realized described predetermined bias by mechanical hook-up.
23. device according to claim 19, wherein said predetermined bias are limited to and the described substantially the same optical wavelength of phase response that is substantially wavelength dependency.
24. device according to claim 15, wherein said signal section and reference section are to utilize substantially the same adiabatic apparatus and plane thermal insulation thermally.
25. device according to claim 1, wherein said film interference structure is the Gires-Tournois etalon.
26. an instrument, described instrument are used for the pattern of the source heat energy that is produced by the source of described instrument outside is measured or sensing, described instrument comprises:
The described device of claim 1;
Heat transfer structure, but described heat transfer structure is configured to the spatial variations pattern of described heat energy that the pattern transfer of described source heat energy is received for the described thermal tuning layer by the described device of claim 1; And
The optics read assembly, but described optics read assembly is configured to produce the described incident optical energy that offers described thermal tuning layer jointly, and utilize described light energy output to provide information about the space distribution of the pattern of described source heat energy to the user of described instrument.
27. instrument according to claim 26, wherein said heat transfer structure are configured to receive the pattern of the described source heat energy with radiant heat energy form.
28. instrument according to claim 26, wherein said heat transfer structure are configured to receive the pattern of the described source heat energy with conduction heat energy form.
29. instrument according to claim 28, wherein said conduction heat energy is produced by chemistry or biological device.
30. a display that is used to show the information of representing with display control signal, described display comprises:
The described device of claim 1;
Heat structure, but described heat structure is configured to described display control signal is converted to the spatial variations pattern of the described heat energy that the described thermal tuning layer by the described device of claim 1 receives; And
The optics read assembly, but described optics read assembly is configured to produce the described incident optical energy that offers described thermal tuning layer jointly, and described light energy output is offered one group of steric display element, and described display element is configured to the various piece of described light energy output is converted to each pixel of display.
31. display according to claim 30, wherein said heat structure comprise steric a plurality of heating element.
32. display according to claim 31, but wherein said heating element is an electrical addressing.
33. an optical device that is used for optical communication system, described optical device comprises:
The described device of claim 1;
Optical texture, described optical texture are configured to (1) provides first communicate optical signal as described incident optical energy to the described device of claim 1, and (2) are used to described light energy output from the described device of claim 1 as second communicate optical signal; And
Heat structure, described heat structure is configured to: the control signal that response produces in the time will carrying out institute's light requirement function, but generation is by the spatial variations pattern of the described heat energy of the described thermal tuning layer reception of the described device of claim 1, and the spatial variations pattern of wherein said heat energy is to allowing the described device of claim 1 to carry out the required effective predetermined pattern of light function.
34. optical device according to claim 33, wherein said first and second communicate optical signals are wavelength-division multiplex (WDM) communicate optical signals, and wherein institute's light requirement functional packet draw together to one or more wavelength to/carry out selectivity from other wavelength of the described first wdm optical communication signal to insert/tell.
35. a device that is used to detect the spatial variations pattern of heat energy, described device comprises:
Membrane structure, but described membrane structure has the thermal tuning layer and in the response at the wavelength place of preset range, and
Signal section and reference section, described signal section and reference section are thermally connected to common substrate, the also total common-mode response of described signal section and described reference section thermal insulation, described signal section and reference section to background heat energy, but and the heat energy pattern that receives in the described thermal tuning layer had differential response;
But described device also is configured to receive the described incident optical energy that enters described thermal tuning layer, and will with give light energy output to the corresponding basically phase modulation (PM) of the described differential response of heat energy pattern.
36. a device that is used to detect the spatial variations pattern of heat energy, described device comprises:
Membrane structure, but described membrane structure has the thermal tuning layer and in the response at the wavelength place of preset range,
First surface, described first surface receives the pattern of heat energy,
First and second mirror structures, but described first mirror structure provides thermal conducting path between described first surface and described thermal tuning layer,
But described device also is configured to receive the incident optical energy that enters described thermal tuning layer, and will give light energy output with the corresponding basically phase modulation (PM) of the spatial variations pattern of described heat energy.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US85143806P | 2006-10-13 | 2006-10-13 | |
| US60/851,438 | 2006-10-13 | ||
| US60/872,833 | 2006-12-05 | ||
| US11/803,044 | 2007-05-11 |
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| CN101529328A true CN101529328A (en) | 2009-09-09 |
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| CNA2007800381016A Pending CN101529328A (en) | 2006-10-13 | 2007-07-30 | Thermally controlled spatial light modulator using phase modulation |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108535801A (en) * | 2018-03-22 | 2018-09-14 | 北京邮电大学 | Optical filter |
| CN116990237A (en) * | 2023-09-26 | 2023-11-03 | 国网江苏省电力有限公司电力科学研究院 | An enhanced large depth of field terahertz transceiver device suitable for narrow bandwidth |
-
2007
- 2007-07-30 CN CNA2007800381016A patent/CN101529328A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108535801A (en) * | 2018-03-22 | 2018-09-14 | 北京邮电大学 | Optical filter |
| CN116990237A (en) * | 2023-09-26 | 2023-11-03 | 国网江苏省电力有限公司电力科学研究院 | An enhanced large depth of field terahertz transceiver device suitable for narrow bandwidth |
| CN116990237B (en) * | 2023-09-26 | 2023-12-12 | 国网江苏省电力有限公司电力科学研究院 | Enhanced terahertz transceiver with large depth of field suitable for narrow bandwidth |
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