CN100446215C - Substrate positioning device and storing unit - Google Patents
Substrate positioning device and storing unit Download PDFInfo
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- CN100446215C CN100446215C CNB2006101289635A CN200610128963A CN100446215C CN 100446215 C CN100446215 C CN 100446215C CN B2006101289635 A CNB2006101289635 A CN B2006101289635A CN 200610128963 A CN200610128963 A CN 200610128963A CN 100446215 C CN100446215 C CN 100446215C
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention provides a substrate positioner which positions a substrate while making a space around the substrate as small as possible in a container for containing the substrate such as a load lock chamber or the like. The substrate positioner comprises: a pair of positioners (7) which press a pair of ends (S1) perpendicular to a transfer direction of a substrate (S); and a pair of positioners (8) which press a pair of ends (S2) along the transfer direction of the substrate (S). The first and second positioners (7, 8) have pressers (70, 80) which press the ends (S1, S2) by advance of cylinder mechanisms (71, 81) and pistons (74, 84) of the cylinder mechanisms (71, 81). The first positioner (7) further comprises a driving force conversion mechanism (72) which moves the presser (70) between an evacuation position of evacuating the presser (70) to an outside of a transfer route of the substrate (S), and a press position to press the substrate (S) by advance of the piston (74), and also moves the presser (70) to a press direction at the press position.
Description
Technical field
When the present invention relates to handle the substrate of glass substrate etc. of flat-panel monitor (FPD) usefulness, base positioner that this substrate is positioned and the substrate reception unit that possesses this base positioner.
Background technology
In the manufacture process of FPD,, use the vacuum treatment installation of the so-called many chamber profile that possess a plurality of vacuum processing chambers that are used to carry out above-mentioned processing as under vacuum state, glass substrate being carried out the vacuum treatment installation that etching or ashing, film forming etc. are handled.
In such vacuum treatment installation, do not need all to make vacuum processing chamber return normal pressure when carrying out the load/unload of the indoor substrate of vacuum treatment at every turn, and utilize gate valve by opening and closing opening freely, the load locking room as preparatory vacuum chamber is connected on the vacuum processing chamber.The conveyance to the vacuum processing chamber of the substrate transferring of transport mechanism by conveyance pick-up etc. before with above-mentioned processing after load locking room and vacuum processing chamber reach same vacuum state, is moved into vacuum processing chamber to load locking room again.Therefore, in load locking room, with substrate orientation the regulation the position on so that by transport mechanism with substrate exactly conveyance to the indoor processing position of vacuum treatment.
As the positioner that uses in such substrate orientation, proposed to have a pair of locator (for example with reference to patent documentation 1) that to push the relative bight that is supported on the substrate on the indoor buffer of load-lock respectively.In this technology, each locator has pair of rolls and supports the supporter of these rollers, moves along the diagonal of substrate, under the state with the bight of pair of rolls clamping substrate, by pushing substrate, carries out the location of substrate.In addition, each locator can retreat to the conveyance that the below does not hinder substrate.
[patent documentation 1] TOHKEMY 2000-306980 communique
; in recent years; the LCD substrate has the tendency of maximization; to such an extent as to occurring on one side is the huge substrate of 2m; make chamber maximizations such as existing load locking room if adapt to the gigantism of substrate; the then obvious gigantism of device, so the space of the substrate periphery in the chamber itself is suppressed very for a short time, makes chamber trend minimization.But, in the technology of above-mentioned patent documentation 1, because pair of rolls is supported on and constitutes locator on the supporter, become bigger device so itself have to, but, for it moves essential segment space along diagonal and above-below direction, therefore, the miniaturization of load locking room has the limit.
Summary of the invention
The present invention finishes in view of such situation, purpose is to provide a kind of and takes in the container of substrate at load locking room etc., greatly dwindle the space of substrate periphery, can carry out the base positioner of substrate orientation and possess the substrate reception unit of this base positioner.
In order to solve above-mentioned problem, the invention provides a kind of base positioner, to be positioned in the aforesaid substrate mounting portion from the opening along continuous straight runs conveyance on the sidewall that is arranged on container, the rectangular substrate that in said vesse, is positioned in the substrate-placing portion, it is characterized in that: possess: a pair of first pressing mechanism of pushing a pair of first end face vertical with the conveyance direction of substrate; With push along a pair of second pressing mechanism of a pair of second end face of the conveyance direction of substrate, above-mentioned first pressing mechanism and second pressing mechanism have driving mechanism respectively, with the pressing piece of pushing above-mentioned first end face and second end face by the driving of above-mentioned driving mechanism, in above-mentioned a pair of first pressing mechanism at least one also has actuating force switching mechanism portion, above-mentioned actuating force switching mechanism portion is by the driving of above-mentioned driving mechanism, but make above-mentioned pressing piece beyond the conveyance path of keeping out of the way substrate retreating position and can push between the pressing position of substrate and move, but and move pushing direction at above-mentioned pressing position.
In base positioner of the present invention, above-mentioned driving mechanism preferably is arranged on outside the said vesse.In addition, the choosing of above-mentioned actuating force switching mechanism quality award from the ministry be arranged on substrate the conveyance path above or below, driving by above-mentioned driving mechanism, but make above-mentioned pressing piece keep out of the way with the state parallel with above-mentioned conveyance path substrate the conveyance path above or below retreating position and between the pressing position that can push substrate, move, but and move pushing direction at above-mentioned pressing position.In addition, the above-mentioned driving mechanism of at least one in above-mentioned a pair of first pressing mechanism preferably drives along level and the direction vertical with the conveyance direction of substrate.In the case, the above-mentioned driving mechanism of at least one in above-mentioned a pair of first pressing mechanism, it is the cylinder mechanism that has at the piston of level and the direction vertical advance and retreat with the conveyance direction of substrate, above-mentioned actuating force switching mechanism quality award from the ministry choosing work like this: if the above-mentioned piston-advance regulation stroke of said cylinder mechanism, but then the above-mentioned pressing piece of above-mentioned retreating position is moved into above-mentioned pressing position; The regulation stroke if the above-mentioned piston of said cylinder mechanism readvances, but the above-mentioned pressing piece of above-mentioned pressing position is moved along pushing direction, push above-mentioned first end face; If the above-mentioned piston of said cylinder mechanism is kept out of the way the regulation stroke under this state, but then make the above-mentioned pressing piece that above-mentioned first end face is carried out under the pressed state move to above-mentioned pressing position; If the above-mentioned piston of said cylinder mechanism is kept out of the way the regulation stroke again, but then make the above-mentioned pressing piece of above-mentioned pressing position move to above-mentioned retreating position.Moreover in the case, above-mentioned actuating force switching mechanism portion has: be fixed on the guiding parts in the said vesse; With the advance and retreat of the above-mentioned piston of said cylinder mechanism simultaneously, along the active slip parts of above-mentioned guiding parts in the advance and retreat direction slippage of above-mentioned piston; Follow the slippage of the regulation stroke of above-mentioned active slip parts, along above-mentioned guiding parts, at the driven slide unit of level and the direction slippage vertical with the moving direction of active slip parts; Be set to and on above-mentioned driven slide unit, rotate with an end, above-mentioned pressing piece is set to and can rotates on another end simultaneously, follow the slippage of the regulation stroke of above-mentioned active slip parts, with an above-mentioned end is the center, the chain part that rotates with lodging and the mode that erects, preferably rotate in the mode that lodges and erect by above-mentioned chain part, but above-mentioned pressing piece is moved between above-mentioned retreating position and above-mentioned pressing position, by above-mentioned driven slide unit slippage, but as starting point and terminal point, make above-mentioned pressing piece above-mentioned pressing position along pushing direction and moving in the opposite direction with the side of pushing.
In above base positioner of the present invention, preferred above-mentioned first pressing mechanism and second pressing mechanism have the Buffer Unit of the impact when relaxing above-mentioned pressing piece and pushing above-mentioned first end face and second end face respectively.
In addition, the invention provides a kind of substrate reception unit, possess: on sidewall, be provided with opening, have the container of taking in from the substrate reception portion of the substrate of the rectangular shape of above-mentioned opening conveyance in the horizontal direction; Be arranged in the aforesaid substrate incorporating section, mounting is incorporated in the substrate-placing portion of the substrate in the aforesaid substrate incorporating section; With at the base positioner that in the aforesaid substrate mounting portion substrate that is positioned in the aforesaid substrate mounting portion is positioned, it is characterized in that:
The aforesaid substrate positioner possesses a pair of first pressing mechanism of pushing a pair of first end face vertical with the conveyance direction of substrate; With push along a pair of second pressing mechanism of a pair of second end face of the conveyance direction of substrate, above-mentioned first pressing mechanism and second pressing mechanism have driving mechanism respectively; With driving by above-mentioned driving mechanism, push the pressing piece of above-mentioned first end face and second end face, in above-mentioned a pair of first pressing mechanism at least one also has the driving by above-mentioned driving mechanism, but make above-mentioned pressing piece beyond the conveyance path of keeping out of the way substrate retreating position and can push between the pressing position of substrate and move, but and pushing the actuating force switching mechanism portion that direction moves at above-mentioned pressing position.
In substrate reception of the present invention unit, the choosing of aforesaid substrate mounting quality award from the ministry has and the revolvable spherical roller that is contacted by the back side of the substrate of conveyance.In addition, said vesse is preferably in the aforesaid substrate incorporating section that has up and down more than two sections.In addition, said vesse is a load locking room, this load locking room preferably is respectively equipped with the above-mentioned opening that can open and close on sidewall relative to each other, by each above-mentioned opening, inner can with under vacuum state, carry out in the vacuum treatment chamber of predetermined process and atmospheric side is communicated with to substrate, when carrying out substrate delivery/reception with atmospheric side, inside remains near the atmospheric pressure, when carrying out the handing-over of substrate with above-mentioned vacuum treatment chamber simultaneously, inside remains on vacuum state.
Adopt the present invention, then owing to utilize each a pair of first and second pressing mechanism to push each end face of substrate, so can carry out the location of substrate exactly, simultaneously owing to use driving mechanism separately to drive first and second pressing mechanisms respectively, make pressing piece push base board end surface, in addition, in the conveyance path of substrate, but at least one first pressing mechanism of pushing first end face vertical with the conveyance direction of substrate be provided with make pressing piece beyond the conveyance path of keeping out of the way substrate retreating position and may push between the pressing position of substrate and move, but and pushing the actuating force switching mechanism portion that direction moves at pressing position, it is mobile that pressing piece is avoided from the conveyance path of substrate, so can dwindle the space being set and avoiding the space of mobile usefulness from the conveyance path of substrate of parts of the location usefulness in the container significantly.Therefore, the space of the substrate periphery in the container is greatly diminished, make the container miniaturization.
Particularly under the situation of the load locking room of in applying the present invention to the vacuum treatment installation of many chamber profile, using, can make the load locking room miniaturization, can avoid vacuum treatment installation itself to follow the maximization of substrate and remarkable gigantism.
Description of drawings
Fig. 1 represents that roughly the base positioner of one embodiment of the present invention is applied to the stereogram of the plasma processing apparatus of load locking room.
Fig. 2 is a horizontal sectional view of roughly representing the inside of plasma processing apparatus.
Fig. 3 is the block diagram of the schematic configuration of expression control part.
Fig. 4 is the stereogram after the part of load locking room is cut away in expression.
Fig. 5 is the exploded perspective view of expression actuating force switching mechanism portion.
Fig. 6 is the stereogram of phase I that is used to illustrate the work of actuating force switching mechanism portion.
Fig. 7 is the stereogram of second stage that is used to illustrate the work of actuating force switching mechanism portion.
Fig. 8 is the stereogram of phase III that is used to illustrate the work of actuating force switching mechanism portion.
Fig. 9 is the plane graph after expression is cut off the part of actuating force switching mechanism portion.
Figure 10 is the figure of phase I that is used to illustrate the work of base positioner.
Figure 11 is the figure of second stage that is used to illustrate the work of base positioner.
Figure 12 is the figure of phase III that is used to illustrate the work of base positioner.
Figure 13 is the figure of variation of the allocation position of expression first and second locators that constitute base positioner.
Symbol description
7 first locators (first pressing mechanism); 8 second locators (second pressing mechanism); 30 load locking rooms (container); 31 substrate reception portions; 32 surge chambers (substrate-placing portion); 33,34 openings; 35 spherical rollers; 70,80 pressing pieces; 71,81 cylinder mechanisms (driving mechanism); 72 actuating force switching mechanism portions; 74,84 pick-ups; 75 guiding partss; 76 active slip parts; 77 driven slide units; 78,79 seal members; The S substrate; S1 first end face; S2 second end face
Embodiment
Below, with reference to description of drawings optimal way of the present invention.Here, illustrate base positioner of the present invention is used for constituting the example of load lock apparatus that FPD is carried out the plasma processing apparatus of many chamber profile that plasma treatment uses with glass substrate (following note work " substrate ") S.Here, as FPD, can illustrate for example: LCD (LCD), light-emitting diode (LED) display, electroluminescence (Electro Luminescence; EL) display, fluorescent display tube (Vacuum Fluorescent Display; VFD), plasma display (PDP) etc.
Fig. 1 represents that roughly the base positioner of one embodiment of the present invention is applied to the stereogram of the plasma processing apparatus of load locking room, and Fig. 2 is a horizontal sectional view of representing that roughly it is inner.
This plasma processing unit 1 portion in the central is provided with carrying room 20 and load locking room 30 continuously.Three process chamber 10a, 10b, 10c be configured in carrying room 20 around.
Between carrying room 20 and chambers 10a, 10b, 10c, between carrying room 20 and the load locking room 30 and be communicated with in the opening of air atmosphere in the load locking room 30 and the outside, be inserted with respectively airtight sealing between them, and constitute the gate valve 22 that can open and close (only show between carrying room 20 and chambers 10a, 10b, the 10c among the figure, the gate valve between carrying room 20 and the load locking room 30).
In the outside of load locking room 30, be provided with two boxlike loaders (cassette indexer) 41, take in the box 40 of substrate S and distinguish mountings thereon.For example with among untreated substrate reception in these boxes 40, with the substrate reception handled in another.
Between these two boxes 40, brace table 44 is provided with transport mechanism 43, and this transport mechanism 43 possesses the pick- up 45,45 that is arranged on the two sections is arranged; And support these pick- ups 45,45, make it can advance and retreat respectively and can rotate uniformly and the base 47 of lifting.
The inner space of above-mentioned process chamber 10a, 10b, 10c can keep the reduced atmosphere of regulation, and portion can carry out plasma treatment, for example etching or ashing treatment within it.Like this owing to have three process chambers, so for example general's two process chambers wherein are as etch process chamber, with a remaining process chamber as the ashing treatment chamber, perhaps also can be with three process chambers all as etch process chamber of carrying out same processing or ashing treatment chamber.In addition, the number of process chamber is not limited to three, also can be more than four.
The substrate reception portion 31 of load locking room 30 is arranged to two sections (epimere only is shown among Fig. 2), is provided with a plurality of buffers (substrate-placing portion) 32 of mounting and supporting substrate S in each substrate reception portion 31.Between these buffers 32, the pick- up 45,51 when forming conveyance substrate S withdraw from groove 32a.In addition, corresponding with each substrate reception portion 31, in load locking room 30, near first and second locators (first and second pressing mechanisms) 7,8 that position the bight relative to each other of the substrate S that is provided with at rectangle.The back will describe the load locking room 30 and first and second locators 7,8 in detail.
Each component part of plasma processing apparatus 1 is connected Be Controlled (not shown in figure 1) on the control part 60.The summary of control part 60 is shown in Fig. 3.Control part 60 has the process controller 61 with CPU, is connected with keyboard of input operation that program management person instructs for managing plasma processing unit 1 etc. and the user interface 62 that is made of display of the working condition that shows plasma processing apparatus 1 visually etc. on this process controller 61.
In addition, control part 60 has storage part 63, being used for stored record has control by process controller 61, realizes the method for the control program (software) of the various processing usefulness of carrying out in the plasma processing apparatus 1 and treatment conditions data etc., and this storage part 63 is connected on the process controller 61.
And, as required, be used to from the indication at user interface 62 etc., access arbitrary method from storage part 63, in process controller 61, carry out, under the control of process controller 61, carry out the desirable processing in the plasma processing apparatus 1.
The method of above-mentioned control program or treatment conditions data etc. can be utilized to be stored in and calculate the storage medium that function reads, for example material of the state in CD-ROM, hard disk, floppy disk, the fast storage etc., perhaps, also can install, for example transmit at any time, online utilization by special circuit from other.
Secondly, describe the base positioner of present embodiment and possess the load locking room 30 of base positioner in detail.
Fig. 4 cuts away the stereogram shown in the part of load locking room 30.
Each substrate reception portion 31 of load locking room 30 has respectively on the relative sidewall of the conveyance direction (Y direction) of substrate S, the opening 33 that can be communicated with carrying room 20 by gate valve 22; And the opening 34 that is communicated with the air atmosphere in the outside, when opening 34 is closed at least, the reduced atmosphere that can reduce pressure to and stipulate in inside, vacuum state for example reduces pressure.In each substrate reception portion 31, utilize transport mechanism 43 or 50, the substrate S that is level or approximate horizontal conveyance is incorporated in each substrate reception portion 31 by opening 34 or 33, across on a plurality of buffers 32 and by mounting.
In a plurality of buffers 32, for example on the upper end of the buffer 32 that is provided with on the central portion of the horizontal direction vertical (directions X) with the conveyance direction of substrate, a plurality of and the revolvable spherical roller 35 that is contacted by the back side of the substrate S of conveyance of being interval with regulation, for example on the upper end of the buffer 32 outside directions X, be arranged on the both ends of Y direction with the supporting pin 36 that is contacted by the back side in the bight of the substrate S of conveyance.Thus, be positioned in the substrate on a plurality of buffers 32, can move on buffer 32 by the rotation of spherical roller 35, the friction of utilization and supporting pin 36 is static on buffer 32 simultaneously.
Shown in Fig. 5～9, (Fig. 5 is the exploded perspective view of expression actuating force switching mechanism portion 72, Fig. 6 is the stereogram of phase I that is used to illustrate the work of actuating force switching mechanism portion 72, Fig. 7 is the stereogram of second stage that is used to illustrate the work of actuating force switching mechanism portion 72, Fig. 8 is the stereogram of phase III that is used to illustrate the work of actuating force switching mechanism portion 72, Fig. 9 is the plane graph after the part of actuating force switching mechanism portion 72 is cut away in expression), actuating force switching mechanism portion 72 possesses: be fixed on the tabular guiding parts 75 on the bottom surface in the substrate reception portion 31; Can be installed in active slip parts 76 on the guiding parts 75 slippingly along directions X; Can be installed in driven slide unit 77 on the guiding parts 75 slippingly along the Y direction; And one the end with the Y direction serve as the axle be arranged on revolvably on the driven slide unit 77, pressing piece 70 is arranged on a pair of chain part 78,79 on the other end revolvably.
On directions X one end of active slip parts 76, form and connect recess 765, by this connection recess 765 and mating groove 740 being connected that on the leading section of piston 74, forms at directions X, active slip parts 76 are connected with the piston 74 of cylinder mechanism 71, thus, active slip parts 76 follow the advance and retreat action of piston 74 in the directions X slippage.
Draft helical spring 754 is connected on the directions X both ends of driven slide unit 77 and guiding parts 75, and driven slide unit 77 utilizes draft helical spring 754, the Y direction outside of trend substrate reception portion 31.Thus, near the driven slide unit 77 of the slippage Y of substrate reception portion 31 direction central authorities, at active slip parts 76 by the keeping out of the way of regulation stroke of piston 74 during to the slippage of the directions X of substrate reception portion 31 outside, towards the outside slippage of the Y of substrate reception portion 31 direction.
A pair of chain part 78,79 constitutes: the rotation axis of one end is arranged side by side at directions X, is set to the directions X central authorities than more close substrate reception portion of the portion that is pressed 772 of driven slide unit 77 31, and one towards the crooked forming V-shape of another person, constitutes parallelogram.Be provided with the cam part 780 cylindric or cylindraceous of extending towards the Y of the substrate reception portion 31 direction outside on chain part 78, cam part 780 is inserted in the cam hole 763 that forms on directions X the other end of active slip parts 76.Cam hole 763 is presented the shape of extending down in the cross section of Y direction, a pair of chain part 78,79 constitutes: when 76 slippages of active slip parts, cam part 780 is along cam hole 763 upper and lower displacements, thereby rotates and erect and make chain part 78 to downside lodging (especially with reference to Fig. 6,7).In addition, cam hole 763 is along the cross section of Y direction, be the shape of extending to the directions X outside of substrate reception portion 31 from the upper end, active slip parts 76 and driven slide unit 77 are during respectively along directions X and the slippage of Y direction, cam part 780 is inserted in the cam hole 763, the a pair of chain part 78,79 that erects moves (especially with reference to Fig. 7,8) also with driven slide unit 77 along the Y direction.Thus, can under the state that a pair of chain part 78,79 erects, support reliably.
Draft helical spring 755 is connected on chain part 79 and the driven slide unit 77, and a pair of chain part 78,79 is subjected to the tension of draft helical spring 755 and erects.Thus, a pair of chain part 78,79 of lodging, at the regulation stroke that advances by piston 74, active slip parts 76 are near the directions X central authorities of substrate reception portion 31 during slippage, by draft helical spring 755 auxiliary erecting.In addition, also can replace draft helical spring 755, constitute lodging by the auxiliary a pair of chain part 78,79 that erects of compression helical spring with compression helical spring.
Pressing piece 70 has: contact with the end face S1 of substrate S, that pushes end face S1 pushes body 700; The rotor plate 701 that the other end of chain part 78,79 can be mounted respectively rotationally; Push the linking part 702 that extends along the Y direction of body 700 and rotor plate 701 with binding.Pressing piece 70 constitutes: when a pair of chain part 78,79 erects, be positioned at and the substrate S height (but pressing position) about equally that is positioned on the buffer 32, a pair of chain part 78,79 lodging are fashionable, keep the state parallel, be positioned at the below (retreating position) of the substrate S that is positioned on the buffer 32 with substrate S.
Push body 700 by the end face S1 of the substrate S that can not make contact damage or damaged and be difficult to form owing to contact the material that produces particulate etc. with substrate S.For example, can use certain materials such as flexible synthetic resin, preferably can use fluorine series plastics such as polytetrafluoroethylene.In addition, from improving the viewpoint of positioning accuracy, the press surface of pushing body 700 is circular-arc, so that can contact with the end face S1 point of substrate S in the horizontal direction.In addition, push body 700 also can make with the short transverse be the axle for example columned rotary body.
Linking part 702 constitutes: inner cylinder member 704 can not be extracted after inserting in the outer cylinder member 703, and compression helical spring 705 is configured in outer cylinder member 703 and the inner cylinder member 704.That is, linking part 702 flexibles simultaneously because the effect of compression helical spring 705 and stressed in direction of extension, have the function of the Buffer Unit of the impact when pushing body 700 and push the end face S1 of substrate S as mitigation.
In addition, actuating force switching mechanism portion 72, for example guiding parts 75 be fixed on substrate reception portion 31 above, also can be provided with on the contrary up and down.In the case, when a pair of chain part 78,79 erects, pressing piece 70 is positioned at and the substrate S height (but pressing position) about equally that is positioned on the buffer 32, when a pair of chain part 78,79 lodges, pressing piece 70 still keeps the state parallel with substrate S, is positioned at the top (retreating position) of the substrate S that is positioned on the buffer 32.
In addition, one in one and a pair of cylinder mechanism 81 in a pair of cylinder mechanism 71 also can be made other cylinders replacement electric cylinder such as pneumatic cylinders.In addition, as the driving mechanism that pressing piece 70,80 is moved, except cylinder mechanism 71,81, if can drive along the directions X advance and retreat, the mechanism that simultaneously can the position arbitrarily on directions X stops, so no matter its operation principle and kind how, can for example also can be used electromagnet motor, solenoid, piezoelectric element etc.
Pressing piece 80 and pressing piece 70 to push body 700 identical, by the end face S2 of the substrate S that can not make contact damage or damaged and be difficult to owing to contact the material of the particulate etc. of generation with substrate S and form, it is circular-arc that press surface is, so that in the horizontal direction can be with the end face S2 of way of contact contact substrate S.In addition, pressing piece 80 also can be to be for example columned rotary body of axle with the short transverse.In addition, the impact when pushing the end face S2 of substrate S in order to relax pressing piece 80 preferably by the such buffer cell of linking part 702, links pressing piece 80 and piston 84.
According to such structure, advancing of the piston 84 of second locator 8 by cylinder mechanism 81, pressing piece 80 is moved near the directions X central authorities of substrate reception portion 31, keep out of the way, make pressing piece 80 move to the directions X outside of substrate reception portion 31 by the piston 84 that makes cylinder mechanism 81.
Secondly, utilize the localization method of the substrate that base positioner carries out with reference to Figure 10～12 explanations.Figure 10 is the figure of phase I that is used to illustrate the work of base positioner, and Figure 11 is the figure of second stage that is used to illustrate the work of base positioner, and Figure 12 is the figure of phase III that is used to illustrate the work of base positioner.
At first, under the state that the piston 74,84 that is arranged on the cylinder mechanism 71,81 on first and second locators 7,8 is kept out of the way fully, with substrate S conveyance in the substrate reception portion 31, be positioned on the buffer 32 after, make the piston 74,84 of cylinder mechanism 71,81 advance respectively (with reference to Figure 10).
If make the piston 74 of cylinder mechanism 71 carry out advancing of regulation stroke, near the then active slip parts 76 slippage directions X central authorities of substrate reception portion 31.At this moment, cam part 780 is along rising in the cam hole 763, and draft helical spring 755 also works, and rotate in the mode that erects by a pair of chain part 78,79, but the pressing piece 70 of retreating position rises to pressing position (with reference to Figure 11).
If make the piston 74 of cylinder mechanism 71 carry out advancing of regulation stroke again, near the then active slip parts 76 slippage directions X central authorities of substrate reception portion 31 again.At this moment, pushing blade part 762 contacts with the portion of being pressed 772, push the portion of being pressed 772, by with the elastic force of draft helical spring 754 on the contrary, make near the slippage Y of substrate reception portion 31 direction central authorities of driven slide unit 77, but the pressing piece 70 of pressing position moves near the Y of substrate reception portion 31 direction central authorities, contact with the end face S1 of substrate S, push end face S1 (with reference to Figure 12).
On the other hand, if make the piston 84 of cylinder mechanism 81 carry out advancing of regulation stroke, then pressing piece 80 moves near the directions X central authorities of substrate reception portion 31, contacts with the end face S2 of substrate S, pushes end face S2.
Like this, by utilizing first and second locators 7,8, push each end face S1, S2 of substrate S, substrate S is positioned in the position of regulation on the buffer 32.In addition, also can carry out the forward drive of a pair of cylinder mechanism 71,81 simultaneously, can also make a cylinder mechanism 71,81 in a pair of cylinder mechanism 71,81 carry out forward drive after, make another cylinder mechanism 71,81 carry out forward drive.
If finish the location of substrate S, the piston 74,84 of cylinder mechanism 71,81 is kept out of the way respectively.If make piston 74 carry out keeping out of the way of regulation stroke, then active slip parts 76 are to the directions X outside slippage of substrate reception portion 31.At this moment, be subjected to the driven slide unit 77 of the elastic force of draft helical spring 754,, make pressing piece 70 side shifting outside the Y of substrate reception portion 31 direction that contacts with the end face S1 of substrate S by to the outside slippage of the Y of substrate reception portion 31 direction, leave end face S1, but move to pressing position.
If make piston 74 finish the regulation stroke again, for example keep out of the way then active slip parts 76 slippage outside the directions X of substrate reception portion 31 more fully.At this moment, cam part 780 is along descending in the cam hole 763, by with the elastic force of draft helical spring 755 on the contrary, a pair of chain part 78,79 is rotated in the mode of lodging, but the pressing piece 70 of pressing position drops to retreating position.
On the other hand, if make the piston 84 of cylinder mechanism 81 finish the regulation stroke again, for example keep out of the way fully, pressing piece 80 side shifting outside the directions X of substrate reception portion 31 is then left the end face S2 of substrate S.
Like this, if pressing piece 70,80 is kept out of the way from the conveyance path of substrate S, then substrate S is by in some chambers of conveyance in process chamber 10a, 10b, the 10c.Substrate S after positioning by first and second locators 7,8, in process chamber 10a, 10b, 10c by conveyance to regular processing position, handle the high-precision processing of inhomogeneous grade so can realize unlikely generation.
In the present embodiment, because by the cylinder mechanism 71 that is provided with respectively, 81 piston 74,84 advance, utilize first and second locators 7 respectively, 8, make pressing piece 70,80 push first and second end face S1 of substrate S, S2, be positioned at first locator 7 of pushing the first end face S1 on the conveyance path of substrate S, but be provided with pressing piece 70 is moved between retreating position and pressing position, and, but pushing the actuating force switching mechanism portion 72 that direction moves at pressing position, pressing piece 70 is avoided from the conveyance path of substrate S moved, reach the space of avoiding mobile usefulness from the conveyance path of substrate S so can dwindle the space that is provided with of the parts of the location usefulness in the substrate reception portion 31 significantly.Therefore, the substrate S space on every side of substrate reception portion 31 can be greatly dwindled, load locking room 30 minimizations can be made.
In addition, in the present embodiment because the cylinder mechanism 71,81 that makes pressing piece 70,80 move usefulness is arranged on substrate reception portion 31 outsides of load locking room 30, thus can further dwindle the location usefulness in the substrate reception portion 31 parts the space is set.
In addition, in the present embodiment, because in first locator 7, actuating force switching mechanism portion 72 is transformed into the actuating force of the directions X of piston 74 generations of cylinder mechanism 71 actuating force of Y direction and short transverse, but pressing piece 70 is moved between retreating position and pressing position, and, but with pressing position as starting point and terminal point, pushing direction and moving in the opposite direction with the side of pushing, so can will constitute first and second locators 7,8 cylinder mechanism 71,81 are arranged on the same sidewall of load locking room 30, thus, can effectively utilize the space of the upside and the downside of load locking room 30.In addition, because the advancing and keep out of the way of the stroke of actuating force switching mechanism portion 72 by piston 74, but pressing piece 70 is moved between retreating position and pressing position, and, but with pressing position as starting point and terminal point, pushing direction and moving in the opposite direction, so the positioning action of substrate S is easy with the side of pushing.
In addition, the allocation position of first and second locators 7,8 in substrate reception portion 31 is not limited near the bight relative to each other.(Figure 13 is the figure of variation of the allocation position of expression first and second locators that constitute base positioner) as shown in figure 13, also first locator 7 can be configured near the bight adjacent with the Y direction of substrate reception portion 31, dispose a pair of relative to each other along the Y direction, simultaneously second locator 8 is configured near each bight of substrate reception portion 31, disposes two pairs relative to each other along directions X.In the case, for example, can replace electric cylinder with pneumatic cylinders, constitute the cylinder mechanism 71 of first locator 7, simultaneously can replace electric cylinder, constitute the cylinder mechanism 81 (81a, 81b) of second locator 8 adjacent of a side that is provided with a pair of first locator 7 with the Y direction with pneumatic cylinders.Thus, can reduce the number of electric cylinder, so the cost degradation of energy implement device.When substrate S is positioned, for example, the piston 74,84 of the cylinder mechanism 71,81 that is made of pneumatic cylinders is advanced after, the piston 74,84 of the cylinder mechanism 71,81 that is made of electric cylinder is advanced.
The present invention is not limited to above-mentioned execution mode, can carry out various distortion.The container of taking in substrate is not limited to load locking room 30, also can be process chamber 10a, 10b, 10c or carrying room 20 etc., and substrate is not limited to the glass substrate that FPD uses, and also can be other substrates such as semiconductor wafer.In addition, also can in container, establish three sections above substrate incorporating sections.
Claims (17)
1. base positioner, will from the opening along continuous straight runs conveyance on the sidewall that is arranged on container, in described container, be positioned in the rectangular shape in the substrate-placing portion substrate orientation in described substrate-placing portion, it is characterized in that:
Possess: a pair of first pressing mechanism of pushing a pair of first end face of the substrate vertical with the conveyance direction; With
Push along a pair of second pressing mechanism of a pair of second end face of the substrate of conveyance direction,
Described first pressing mechanism and second pressing mechanism possess driving mechanism and the driving by described driving mechanism respectively, push the pressing piece of described first end face and second end face,
In described a pair of first pressing mechanism at least one, also has actuating force switching mechanism portion, described actuating force switching mechanism portion is by the driving of described driving mechanism, but the described pressing piece that makes described first pressing mechanism outside keeping out of the way the conveyance path of substrate retreating position and can push between the pressing position of substrate and move, but and move along pushing direction at described pressing position.
2. base positioner as claimed in claim 1 is characterized in that: described driving mechanism is arranged on outside the described container.
3. base positioner as claimed in claim 1 or 2, it is characterized in that: described actuating force switching mechanism portion be arranged on substrate the conveyance path above or below, driving by described driving mechanism, the described pressing piece that makes described first pressing mechanism with the parallel state in described conveyance path, but at the retreating position above or below the conveyance path of keeping out of the way substrate with can push between the pressing position of substrate and move, but and move along pushing direction at described pressing position.
4. base positioner as claimed in claim 1 or 2 is characterized in that: the described driving mechanism of at least one in described a pair of first pressing mechanism drives along level and the direction vertical with the conveyance direction of substrate.
5. base positioner as claimed in claim 4 is characterized in that: the described driving mechanism of at least one in described a pair of first pressing mechanism is the cylinder mechanism that has along the piston of level and the direction vertical with the conveyance direction of substrate advance and retreat,
The following work of described actuating force switching mechanism portion: the described piston-advance regulation stroke of described cylinder mechanism, but the described pressing piece that then is positioned at described retreating position is moved into described pressing position; The described piston of the described cylinder mechanism regulation stroke that readvances, but the described pressing piece that is positioned at described pressing position is moved along pushing direction, push described first end face; The described piston of described cylinder mechanism is kept out of the way the regulation stroke under the state of pushing described first end face, but then is moved into described pressing position at the described pressing piece that described first end face is carried out under the pressed state; The described piston of described cylinder mechanism is kept out of the way the regulation stroke again, but the described pressing piece that then is positioned at described pressing position is moved into described retreating position.
6. base positioner as claimed in claim 5 is characterized in that:
Described actuating force switching mechanism portion has:
Be fixed on the guiding parts in the described container;
With the advance and retreat of the described piston of described cylinder mechanism simultaneously, along the active slip parts of described guiding parts in the advance and retreat direction slippage of described piston;
Follow the slippage of the regulation stroke of described active slip parts, along the driven slide unit of described guiding parts in level and the direction slippage vertical with the moving direction of active slip parts; With
One end can be arranged on the described driven slide unit rotationally, described pressing piece can be arranged on the other end rotationally simultaneously, follows the slippage of the regulation stroke of described active slip parts, is the center with a described end, the chain part that rotates with lodging and the mode that erects
Rotate in the mode that lodges and erect by described chain part, but described pressing piece is moved between described retreating position and described pressing position, slippage by described driven slide unit, but as starting point and terminal point, make described pressing piece push direction and move in the opposite direction described pressing position with the side of pushing.
7. base positioner as claimed in claim 1 or 2 is characterized in that: described first pressing mechanism and second pressing mechanism also possess the Buffer Unit of the impact when relaxing described pressing piece and pushing described first end face and second end face respectively.
8. substrate reception unit is characterized in that:
Possess:
Sidewall is provided with opening, has the container of taking in from the substrate reception portion of the substrate of the rectangular shape of described opening conveyance in the horizontal direction;
Be arranged in the described substrate reception portion, mounting is incorporated in the substrate-placing portion of the substrate in the described substrate reception portion; With
At the base positioner that in the described substrate-placing portion substrate that is positioned in the described substrate-placing portion is positioned,
Described base positioner possesses:
Push a pair of first pressing mechanism of a pair of first end face of the substrate vertical with the conveyance direction; With
Push along a pair of second pressing mechanism of a pair of second end face of the substrate of conveyance direction,
Described first pressing mechanism and second pressing mechanism have driving mechanism respectively and push the pressing piece of described first end face and second end face by the driving of described driving mechanism,
In described a pair of first pressing mechanism at least one also has actuating force switching mechanism portion, described actuating force switching mechanism portion is by the driving of described driving mechanism, but the described pressing piece that makes described first pressing mechanism outside keeping out of the way the conveyance path of substrate retreating position and can push between the pressing position of substrate and move, but and move pushing direction at described pressing position.
9. as power claim 8 described substrate reception unit, it is characterized in that: described driving mechanism is arranged on outside the described substrate reception portion of described container.
10. substrate reception unit as claimed in claim 8 or 9, it is characterized in that: described actuating force switching mechanism portion be arranged on substrate the conveyance path above or below, driving by described driving mechanism, the described pressing piece that makes described first pressing mechanism with the parallel state in described conveyance path, but at the retreating position above or below the conveyance path of keeping out of the way substrate with can push between the pressing position of substrate and move, but and move pushing direction at described pressing position.
11. substrate reception unit as claimed in claim 8 or 9 is characterized in that: the described driving mechanism of at least one in described a pair of first pressing mechanism drives along level and the direction vertical with the conveyance direction of substrate.
12. substrate reception as claimed in claim 11 unit is characterized in that: the described driving mechanism of at least one in described a pair of first pressing mechanism is the cylinder mechanism that has along the piston of level and the direction vertical with the conveyance direction of substrate advance and retreat,
The following work of described actuating force switching mechanism portion: the described piston-advance regulation stroke of described cylinder mechanism, but the described pressing piece that then is positioned at described retreating position is moved into described pressing position; The described piston of the described cylinder mechanism regulation stroke that readvances, but the described pressing piece that is positioned at described pressing position is moved pushing direction, push described first end face; The described piston of described cylinder mechanism is kept out of the way the regulation stroke under the state of pushing described first end face, but then is moved into described pressing position at the described pressing piece that described first end face is carried out under the pressed state; The described piston of described cylinder mechanism is kept out of the way the regulation stroke again, but the described pressing piece that then is positioned at described pressing position is moved into described retreating position.
13. substrate reception as claimed in claim 12 unit is characterized in that:
Described actuating force switching mechanism portion possesses:
At the fixing guiding parts of described substrate reception portion;
With the advance and retreat of the described piston of described cylinder mechanism simultaneously, along the active slip parts of described guiding parts in the advance and retreat direction slippage of described piston;
Follow the slippage of the regulation stroke of described active slip parts, along the driven slide unit of described guiding parts in level and the direction slippage vertical with the moving direction of active slip parts; With
One end can be arranged on the described driven slide unit rotationally, described pressing piece can be arranged on the other end rotationally simultaneously, follows the slippage of the regulation stroke of described active slip parts, is the center with a described end, the chain part that rotates with lodging and the mode that erects
Rotate in the mode that lodges and erect by described chain part, but described pressing piece is moved between described retreating position and described pressing position, slippage by described driven slide unit, but as starting point and terminal point, make described pressing piece described pressing position along pushing direction and moving in the opposite direction with the side of pushing.
14. substrate reception unit as claimed in claim 8 or 9 is characterized in that: described first pressing mechanism and second pressing mechanism also possess the Buffer Unit of the impact when relaxing described pressing piece and pushing described first end face and second end face respectively.
15. substrate reception unit as claimed in claim 8 or 9 is characterized in that: described substrate-placing portion has and the revolvable spherical roller that is contacted by the back side of the substrate of conveyance.
16. substrate reception unit as claimed in claim 8 or 9 is characterized in that: described container is in the described substrate reception portion that has up and down more than two sections.
17. substrate reception unit as claimed in claim 8 or 9, it is characterized in that: described container is a load locking room, this load locking room can be provided with described opening respectively with opening and closing on sidewall relative to each other, by each described opening, inner can with under vacuum state, substrate is carried out the indoor and atmospheric side of the vacuum treatment of predetermined process and is communicated with, when carrying out substrate delivery/reception with atmospheric side, inside remains near the atmospheric pressure, when carrying out substrate delivery/reception with described vacuum processing chamber, inside remains on vacuum state.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005257165A JP4642610B2 (en) | 2005-09-05 | 2005-09-05 | Substrate alignment device and substrate accommodation unit |
| JP2005257165 | 2005-09-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1929109A CN1929109A (en) | 2007-03-14 |
| CN100446215C true CN100446215C (en) | 2008-12-24 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006101289635A Active CN100446215C (en) | 2005-09-05 | 2006-09-05 | Substrate positioning device and storing unit |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4642610B2 (en) |
| KR (2) | KR100860143B1 (en) |
| CN (1) | CN100446215C (en) |
| TW (1) | TWI421969B (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5501688B2 (en) * | 2009-07-30 | 2014-05-28 | 東京エレクトロン株式会社 | Substrate alignment mechanism, vacuum prechamber and substrate processing system using the same |
| JP5582895B2 (en) * | 2010-07-09 | 2014-09-03 | キヤノンアネルバ株式会社 | Substrate holder stocker apparatus, substrate processing apparatus, and substrate holder moving method using the substrate holder stocker apparatus |
| TW201514502A (en) * | 2013-10-03 | 2015-04-16 | Chips Best Technology Co Ltd | Chip inspection base |
| TW201514516A (en) * | 2013-10-03 | 2015-04-16 | Chips Best Technology Co Ltd | Automatic chip inspection system |
| WO2017066418A1 (en) * | 2015-10-15 | 2017-04-20 | Applied Materials, Inc. | Substrate carrier system |
| CN106773157B (en) * | 2016-12-06 | 2018-08-31 | 友达光电（昆山）有限公司 | Position correction apparatus and method for correcting position |
| JP2019102721A (en) * | 2017-12-06 | 2019-06-24 | エスペック株式会社 | Substrate positioning device |
| KR102186594B1 (en) * | 2020-04-08 | 2020-12-03 | 백철호 | Automatic alignment device for PCB |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11345858A (en) * | 1998-06-02 | 1999-12-14 | Dainippon Screen Mfg Co Ltd | Substrate transfer equipment |
| JP2000306980A (en) * | 1993-02-26 | 2000-11-02 | Tokyo Electron Ltd | Alignment mechanism of glass substrate for lcd and vacuum treatment apparatus |
| JP2003086659A (en) * | 2001-09-11 | 2003-03-20 | Hirata Corp | Substrate transfer device |
| JP2003282684A (en) * | 2002-03-22 | 2003-10-03 | Olympus Optical Co Ltd | Glass board supporting jig |
| CN1499299A (en) * | 2002-10-25 | 2004-05-26 | 东京毅力科创株式会社 | Substrate calibrating appts, its processing device and delivery appts. |
| JP2005093880A (en) * | 2003-09-19 | 2005-04-07 | Hitachi High-Tech Electronics Engineering Co Ltd | Substrate spin processor and substrate spin processing method, and liquid crystal panel |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3260427B2 (en) * | 1991-09-10 | 2002-02-25 | 東京エレクトロン株式会社 | Vacuum processing apparatus and substrate transfer method in vacuum processing apparatus |
| JPH0751229Y2 (en) * | 1990-09-29 | 1995-11-22 | 大日本スクリーン製造株式会社 | Substrate alignment device |
| JP3426222B2 (en) * | 1991-09-10 | 2003-07-14 | 東京エレクトロン株式会社 | Alignment mechanism, processing device and alignment method in load lock chamber |
| JP3468430B2 (en) * | 1994-02-15 | 2003-11-17 | 東京エレクトロン株式会社 | Position detection guide device, position detection guide method, and vacuum processing device |
| JPH08288368A (en) * | 1995-04-14 | 1996-11-01 | Tokyo Electron Ltd | Substrate aligning device and method therefor |
| JPH0927536A (en) * | 1995-07-10 | 1997-01-28 | Nissin Electric Co Ltd | Ion implanting device with substrate-aligning mechanism in load-lock room |
| JP4841035B2 (en) * | 2000-11-27 | 2011-12-21 | 東京エレクトロン株式会社 | Vacuum processing equipment |
| US20030072639A1 (en) * | 2001-10-17 | 2003-04-17 | Applied Materials, Inc. | Substrate support |
| KR100582695B1 (en) * | 2002-11-21 | 2006-05-23 | 가부시키가이샤 히다치 고쿠사이 덴키 | Method for positioning a substrate and inspecting apparatus using same |
| JP2005116878A (en) * | 2003-10-09 | 2005-04-28 | Toshiba Corp | Method and device for supporting substrate |
-
2005
- 2005-09-05 JP JP2005257165A patent/JP4642610B2/en active Active
-
2006
- 2006-09-04 TW TW095132616A patent/TWI421969B/en not_active IP Right Cessation
- 2006-09-05 CN CNB2006101289635A patent/CN100446215C/en active Active
- 2006-09-05 KR KR1020060085136A patent/KR100860143B1/en active IP Right Grant
-
2008
- 2008-05-07 KR KR1020080042242A patent/KR100952524B1/en active IP Right Grant
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000306980A (en) * | 1993-02-26 | 2000-11-02 | Tokyo Electron Ltd | Alignment mechanism of glass substrate for lcd and vacuum treatment apparatus |
| JPH11345858A (en) * | 1998-06-02 | 1999-12-14 | Dainippon Screen Mfg Co Ltd | Substrate transfer equipment |
| JP2003086659A (en) * | 2001-09-11 | 2003-03-20 | Hirata Corp | Substrate transfer device |
| JP2003282684A (en) * | 2002-03-22 | 2003-10-03 | Olympus Optical Co Ltd | Glass board supporting jig |
| CN1499299A (en) * | 2002-10-25 | 2004-05-26 | 东京毅力科创株式会社 | Substrate calibrating appts, its processing device and delivery appts. |
| JP2005093880A (en) * | 2003-09-19 | 2005-04-07 | Hitachi High-Tech Electronics Engineering Co Ltd | Substrate spin processor and substrate spin processing method, and liquid crystal panel |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007073646A (en) | 2007-03-22 |
| KR20080059118A (en) | 2008-06-26 |
| KR100952524B1 (en) | 2010-04-12 |
| CN1929109A (en) | 2007-03-14 |
| JP4642610B2 (en) | 2011-03-02 |
| TWI421969B (en) | 2014-01-01 |
| TW200721361A (en) | 2007-06-01 |
| KR20070026274A (en) | 2007-03-08 |
| KR100860143B1 (en) | 2008-09-24 |
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