CN100427639C - Method for fabricating oriented film of liquid crystal by using sputtering in long range - Google Patents
Method for fabricating oriented film of liquid crystal by using sputtering in long range Download PDFInfo
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- CN100427639C CN100427639C CNB2005100747862A CN200510074786A CN100427639C CN 100427639 C CN100427639 C CN 100427639C CN B2005100747862 A CNB2005100747862 A CN B2005100747862A CN 200510074786 A CN200510074786 A CN 200510074786A CN 100427639 C CN100427639 C CN 100427639C
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Abstract
The present invention provides a method for preparing oriented films of liquid crystals by sputtering in a long range. The present invention comprises the steps that a substrate is arranged on a substrate seat in a reaction chamber, and high density plasma bombards a target arranged above the substrate so as to generate a sputtering substance. Meanwhile, the sputtering substance can provide a sputtering direction approximate to a vertical mode caused by bias arranged in the reaction chamber, the sputtering substance is deposited on the surface of the substrate along the sputtering direction so as to form a liquid crystal orientation film, and a distance between the target and the substrate is larger than 20cm.
Description
Technical field
The present invention relates to a kind of method of making liquid crystal orientation film, particularly relate to a kind of method of utilizing long-throw sputtering (long-throw sputtering) or collimator tube (collimator) to make liquid crystal orientation film.
Background technology
Along with the digital network development of science and technology, digital information apparatus little by little influences the 21st century mankind's work and life.In liquid-crystal display (LCD) screen has been widely used in each aspect in the daily life, LCD panel industry except originally with mobile computer (NB) as the core application, more use development with all strength towards the market that comprises information household appliances such as Portable consumption-orientation video and audio product, mobile telephone and liquid crystal TV set.Though the image quality of lcd screen is near the CRT screen of technology maturation, but still have problems such as visual angle, contrast, show uniformity to be improved, and be applied in that high-density, height such as LCD TV become more meticulous, on the large size Products Development, more have problems such as speed of answer, color reproduction to overcome.And the assessment technology of the control techniques of relevant liquid crystal aligning, alignment films research in liquid crystal panel is promptly directly closely bound up with above-mentioned problem, so the production control technology of alignment films has its suitable importance.
Generally speaking, the rough segmentation of Liquid Crystal Molecules Alignment mode is three kinds.First kind is parallel to alignment films for long axis of liquid crystal molecule, be called homogeneity orientation (homogeneous alignment), second kind for major axis is perpendicular or normal on the alignment films, is called heterogeneous orientation (hetergeneous alignment) or vertical orientated (verticalalignment).But in the practical application of most of LCD screen, then be the third arrangement mode, that is liquid crystal molecule and alignment layer surface are the inclination (being tilt angle, pre-tilt angle) of a certain angle.Tilt angle is the important parameter that influences the LCD display characteristic, depends primarily on the materialization reactive force of (1) alignment films, as hydrogen bond (hydrogen bond), Fan Dewali (Van der Waals force) and dipole dipolar forces (dipole-dipole force); (2) mechanical force effect, i.e. groove (groove) or alignment layer surface kenel.
Existing being manufactured in of alignment films that is used for liquid crystal plates the organic oriented material of one deck on the substrate, for example poly-inferior acyl film (polyimide, PI), utilize special brushing (rubbing cloth) to brush the PI film that is deposited on the substrate then with certain grooming direction and pressure, form many superfine groove structures thereon, liquid crystal molecule can be arranged along these groove directions.Yet existing this need have many shortcomings with the method for mechanical contact mode grooming alignment films.For example, the power inequality that brushing contacts with the PI film, and formed groove distribution all can have influence on the homogeneity of alignment films, and then have influence on the display quality of display panels in the future, the penetration coefficient problem of PI film in addition, cause light to be difficult for penetrating the PI film, also have influence on the quality of display panels.In addition, have now and utilize mechanical system also can import pollution substance, and need after the grooming process, add cleaning step again.Therefore, existing utilize mechanical system to make liquid crystal orientation film not only technology is loaded down with trivial details, expend cost, and process yield is difficult for generally promoting.
Summary of the invention
Therefore main purpose of the present invention is that method for a kind of liquid crystal orientation film of making homogeneity is to solve above-mentioned existing problem.
According to a preferred embodiment of the invention, present method comprises and places the substrate in the reaction chamber to take advantage of on the seat substrate, utilize high density plasma bombardment to be located at a target of substrate top again, to produce a sputtering material, one bias voltage is provided in reaction chamber simultaneously, so that sputtering material provides an approximately perpendicular sputter direction, and sputtering material according to this sputter direction be deposited on substrate surface to form a liquid crystal orientation film, wherein the distance between target and substrate is greater than 20 centimetres.
Another preferred embodiment according to the present invention, present method comprises and places the substrate in the reaction chamber to take advantage of on the seat substrate, utilize high density plasma bombardment to be located at a target of substrate top again, to produce a sputtering material, simultaneously between substrate and target, provide a collimator tube, so that sputtering material is deposited on substrate surface to form a liquid crystal orientation film according to a specific sputter direction.
Because the present invention can use inorganic oriented material to form target, and utilize the method for sputter to make liquid crystal orientation film, not only got rid of the alignment films low-transmittance problem of prior art, scratch and the uneven first-class problem of alignment films that the wiping seal is caused, the productive rate and the quality that further promote alignment films reduce cost of manufacture.
Description of drawings
Fig. 1 is the method that liquid crystal orientation film is made in general sputter.
Fig. 2 and Fig. 3 are the method for utilizing long-throw sputtering to make liquid crystal orientation film of the present invention.
Fig. 4 and Fig. 5 are the method for utilizing collimator tube to make liquid crystal orientation film of the present invention.
The simple symbol explanation
10 reaction chambers, 12 targets
30 reaction chambers, 32 targets
38 angles, 50 reaction chambers
Seat is taken advantage of in 54 substrates of 52 targets
56 substrates, 58 collimator tubes
60 angles, 62 arrows
A, b, c distance
Embodiment
In order further to understand feature of the present invention and technology contents, see also following about detailed description of the present invention and accompanying drawing.Yet appended graphic only for reference and aid illustration usefulness is not to be used for the present invention is limited.
Please refer to Fig. 1, Fig. 1 utilizes sputter to make the method for liquid crystal orientation film.As shown in Figure 1, comprise in the reaction chamber 10 that a target 12 and a substrate take advantage of seat 14, one substrates 16 to place substrate to take advantage of on the seat 14, and have one apart from a between substrate 16 and the target 12.Then carry out sputtering technology again and make liquid crystal orientation film, wherein the plasma sputter direct of travel is as the dotted arrow direction among Fig. 1, because target 12 is about 10cm with substrate 16 apart from a, wide excessively so that be deposited on the angle of sputtering material in the substrate 16 and substrate 16, cause the alignment films of substrate 16 to have multidirectional groove to produce, and then have influence on the angle of liquid crystal molecule and alignment layer surface, reduce the quality and the yield rate of liquid crystal orientation film.
Please refer to Fig. 2 and Fig. 3, Fig. 2 and Fig. 3 are the method for utilizing long-throw sputtering to make liquid crystal orientation film of the present invention.As shown in Figure 2, the invention provides a reaction chamber 30, comprise in the reaction chamber 30 target 32 and substrate take advantage of the seat 34, the substrate that one substrate 36 is positioned in the reaction chamber 30 is taken advantage of on the seat 34, and make between substrate 36 and the target 32 and have a distance b, utilize the target 32 in the high density plasma bombardment reaction chamber 30 again, make target 32 produce sputtering material (as the dotted arrow among Fig. 2).In order to make sputtering material directivity is arranged be deposited to substrate 36 surfaces, in a preferred embodiment of the invention, the distance b that must control 32 of substrate 36 and targets is to reach the standard of long-throw sputtering, for instance, distance b at least should be greater than 20 centimetres, preferably between 25～90 centimetres, and sputtering material can react with the high density plasma in the reaction chamber 30 to produce freeization, via the bias voltage that provides in the reaction chamber 30 (figure does not show), for example on reaction chamber 30, two sides provide a direct current voltage down, make the sputtering material of freeization be deposited on substrate 36 surfaces upward (as the solid arrow among Fig. 2) with approximately perpendicular direction, form liquid crystal orientation film, so can control the angle of liquid crystal orientation film surface and liquid crystal molecule, produce the alignment films of homogeneity direction.
In addition as shown in Figure 3, because the present invention can make sputtering material be deposited in the substrate 36 with approximately perpendicular direction, therefore can look the required pre-tilt angle of the kind of liquid crystal molecule and liquid crystal molecule and alignment films and adjust liquid crystal pretilt angle.In a preferred embodiment of the invention, after substrate 36 and substrate can being taken advantage of seat 34 inclinations one angle 38, carry out above-mentioned sputtering technology again, sputtering material is deposited on substrate 36 surfaces makes liquid crystal orientation film, make the liquid crystal orientation film surface of substrate 36 that a liquid crystal pretilt angle is provided.Wherein the angle of inclination 38 of substrate 36 is about 20～70 degree.In addition, also utilize collimator tube (figure does not show) to be placed between substrate 36 and the target 32, be used for adjusting the angle that this sputtering material is deposited into this substrate surface.
Please refer to Fig. 4 and Fig. 5, Fig. 4 and Fig. 5 are the method for utilizing collimator tube to make liquid crystal orientation film of the present invention.As shown in Figure 4, the invention provides a reaction chamber 50, comprise in the reaction chamber 50 target 52 and a substrate take advantage of the seat 54, place the substrate in the reaction chamber 50 to take advantage of on the seat 54 substrate 56, and make between substrate 56 and the target 52 and have a distance c, one collimator tube 58 is provided in addition, it is arranged between substrate 56 and the target 52, utilize the target 52 in the high density plasma bombardment reaction chamber 50 again, so that target 52 produces sputtering material, be deposited in the substrate 56 by collimator tube 58, form liquid crystal orientation film.Because collimator tube 58 allows approximately perpendicular sputtering material by collimator tube 58 (dotted line X as shown in Figure 4), the sputtering material of other direction then can't pass through collimator tube 58 (dotted line Y as shown in Figure 4), thus the sputtering material of may command by collimator tube 58 according to this sputter direction be deposited on the liquid crystal orientation films that substrate 56 surfaces form homogeneity.
In addition as shown in Figure 5, also the required pre-tilt angle of the kind of visible liquid crystal molecule and liquid crystal molecule and alignment films is adjusted the angle of inclination 60 of substrate 56 or the position of collimator tube 58, allow sputtering material comply with required angle and be deposited on substrate 56 surfaces, make the liquid crystal orientation film surface of substrate 56 that a liquid crystal pretilt angle is provided.Wherein the angle of inclination 60 of substrate 56 is about 20～70 degree, and high and low position (shown in the double-headed arrow among Fig. 5 62) can be adjusted by liquid crystal orientation film tilt angle optionally in the position of collimator tube 58.
Wherein, pressure in the aforesaid reaction chamber 30,50 is about 0.03～0.1 milli-torr, target 32 is about 25～90 centimetres with the distance b of substrate 34, target 52 is about 20～70 centimetres with the distance c of substrate 56, the surface area of target 32,52 is all greater than the surface area of substrate 36,56, and liquid crystal orientation film (target 32,52) comprises class diamond carbon film or silicon oxide film, and its material can or have the non-conductive material layer of high penetration for inorganic material layer, for example SiO
2, SiO
xOr any dielectric materials.
It should be noted that, collimator tube 58 comprises a plurality of openings, the depth-width ratio of its each opening was greater than 2: 1, and the structure formed by many hexagonal pipes of collimator tube 58, its outward appearance is similar to honeycomb, utilize collimator tube 58 only to allow the sputtering material of smaller angle to pass through the sputtering material filtering of wide-angle, can effectively control sputtering material by this and be deposited on the direction that the liquid crystal orientation film that forms is gone up on substrate 56 surfaces.
In sum, the method that the present invention utilizes long-throw sputtering or collimator tube to make liquid crystal orientation film, can summarize following advantage and benefit at least:
(1) the present invention utilizes long-throw sputtering to make the method for liquid crystal orientation film, and sputtering material is deposited in the substrate with approximately perpendicular direction, can effectively avoid liquid crystal orientation film that multiple tilt angle is arranged, and have a strong impact on quality.
(2) the present invention utilizes collimator tube to make the method for liquid crystal orientation film, can pass through or filtering by the high and low position control sputtering material that changes collimator tube, produces the liquid crystal orientation film of homogeneous tilt angle.
(3) the present invention utilizes long-throw sputtering or collimator tube to make the method for liquid crystal orientation film, all can utilize the angle of inclination of substrate to control the tilt angle on liquid crystal molecule and liquid crystal orientation film surface, effectively promotes liquid crystal quality and yield rate, and the reduction finished product.
(4) the present invention utilizes the method that long-throw sputtering or collimator tube are made liquid crystal orientation film, adopts inorganic materials to make liquid crystal orientation film, improves the penetration coefficient problem of PI film.
The above only is the preferred embodiments of the present invention, and all equalizations of doing according to claim of the present invention change and modify, and all should belong to covering scope of the present invention.
Claims (12)
1. method of utilizing long-throw sputtering to make liquid crystal orientation film, this method comprises:
Place the substrate in the reaction chamber to take advantage of on the seat substrate;
Utilize high density plasma bombardment to be located at a target of this substrate top, to produce a sputtering material; And
One bias voltage is provided in this reaction chamber so that this sputtering material provides an approximately perpendicular sputter direction, and this sputtering material according to this sputter direction be deposited on this substrate surface to form a liquid crystal orientation film;
Wherein the distance between this target and this substrate is greater than 20 centimetres.
2. the method for claim 1, wherein this liquid crystal orientation film is an inorganic material layer.
3. the method for claim 1, wherein this liquid crystal orientation film is one to have the non-conductive material layer of high penetration.
4. the method for claim 1, wherein this liquid crystal orientation film comprises a class diamond carbon film.
5. the method for claim 1, wherein this liquid crystal orientation film comprises the silicon monoxide film.
6. the method for claim 1, wherein when this liquid crystal orientation film of deposition, this method also comprises makes this substrate angle that tilts, so that this liquid crystal orientation film provides a liquid crystal pretilt angle.
7. method as claimed in claim 6, wherein the angle of inclination of this substrate is about 20～70 degree.
8. the method for claim 1, wherein when this liquid crystal orientation film of deposition, this method also is included between this substrate and this target collimator tube is provided, to be used for adjusting the angle that this sputtering material is deposited into this substrate surface.
9. the method for claim 1, wherein this collimator tube comprises a plurality of openings, and respectively the depth-width ratio of this opening greater than 2: 1.
10. the method for claim 1, wherein the surface area of this target is greater than the surface area of this substrate.
11. the method for claim 1, wherein the pressure in this reaction chamber is about 0.03～0.1 milli-torr.
12. the method for claim 1, wherein the distance between this target and this substrate is about 25～90 centimetres.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100747862A CN100427639C (en) | 2005-06-03 | 2005-06-03 | Method for fabricating oriented film of liquid crystal by using sputtering in long range |
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|---|---|---|---|
| CNB2005100747862A CN100427639C (en) | 2005-06-03 | 2005-06-03 | Method for fabricating oriented film of liquid crystal by using sputtering in long range |
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| CNA2008100985417A Division CN101280419A (en) | 2005-06-03 | 2005-06-03 | Method for manufacturing liquid crystal alignment film by long-throw sputtering |
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| CN1873046A CN1873046A (en) | 2006-12-06 |
| CN100427639C true CN100427639C (en) | 2008-10-22 |
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| CNB2005100747862A Expired - Fee Related CN100427639C (en) | 2005-06-03 | 2005-06-03 | Method for fabricating oriented film of liquid crystal by using sputtering in long range |
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| CN103809242B (en) * | 2014-03-10 | 2017-08-25 | 四川飞阳科技有限公司 | A kind of method for manufacturing thin film for planar optical waveguide device |
| CN111041437A (en) * | 2019-12-04 | 2020-04-21 | 山东科技大学 | Auxiliary device for sputtering deposition of inclined c-axis piezoelectric film |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1514471A (en) * | 2002-09-13 | 2004-07-21 | 爱发科股份有限公司 | Method and apparatus for forming bias sputtering film |
| CN1591134A (en) * | 2003-09-04 | 2005-03-09 | 精工爱普生株式会社 | Inorganic orientation film and its forming method,substrate for electronic device,liquid crystal panel |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1514471A (en) * | 2002-09-13 | 2004-07-21 | 爱发科股份有限公司 | Method and apparatus for forming bias sputtering film |
| CN1591134A (en) * | 2003-09-04 | 2005-03-09 | 精工爱普生株式会社 | Inorganic orientation film and its forming method,substrate for electronic device,liquid crystal panel |
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| CN1873046A (en) | 2006-12-06 |
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