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CN100416252C - Method for detecting leak rate of air passage cabinet of etching machine - Google Patents

Method for detecting leak rate of air passage cabinet of etching machine Download PDF

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Publication number
CN100416252C
CN100416252C CNB2005101264440A CN200510126444A CN100416252C CN 100416252 C CN100416252 C CN 100416252C CN B2005101264440 A CNB2005101264440 A CN B2005101264440A CN 200510126444 A CN200510126444 A CN 200510126444A CN 100416252 C CN100416252 C CN 100416252C
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CN
China
Prior art keywords
leak rate
gas circuit
master gage
rate
cabinet
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CNB2005101264440A
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Chinese (zh)
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CN1865884A (en
Inventor
熊坤
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Beijing North Microelectronics Co Ltd
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Beijing North Microelectronics Co Ltd
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Priority to CNB2005101264440A priority Critical patent/CN100416252C/en
Publication of CN1865884A publication Critical patent/CN1865884A/en
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Abstract

The present invention relates to the semiconductor etching field. The present invention provides a method for detecting leakage rate of an air passage cabinet of an etching machine. After the leakage rate detecting program of the method of the present invention is started, the air passage cabinet is automatically flushed and closed, and the working parameter of a mass flow reference gauge is arrange., and finally the leakage rate value of the air passage cabinet is obtained. The detecting process of the technical scheme of the present invention is completed by a computer, which can cause a user to conveniently obtain the leakage rate value.

Description

A kind of method of detection etch machine leak rate of air passage cabinet
Technical field
The present invention relates to the semiconductor etching field, be specifically related to a kind of method of detection etch machine leak rate of air passage cabinet.
Background technology
In semiconductor equipment, the gas that enters reaction chamber has multiple, and in order to control the concrete flow of all gases respectively, we separately separate these gases with pipeline, carry out the size of Control Flow separately according to the requirement of technological parameter, have a valve to enter reaction chamber unified.In order to manage gas concentratedly, we concentrate these gases to be put in the gas circuit cabinet and control respectively like this.
In the technological process in the semiconductor equipment, because technology highly necessary asks very high really for all gases flow, the size of gas flow has influence on last technological level.So the flow for accurate pilot-gas will detect the gas leak rate in the gas circuit cabinet at any time.
Simultaneously, the multichannel toxic gas is arranged in the gas circuit cabinet, so also must guarantee the sealing of gas circuit, to prevent that gas from leaking human body is produced harm, this also needs to measure leak rate, thus the reason of searching.
Measurement for leak rate is at present participated in finishing by the people.Do not form an independent functional units, this method provides a solution, makes the user can obtain the leak rate value easily.
Summary of the invention
(1) technical matters that will solve
The purpose of this invention is to provide a kind of method of measuring leak rate of air passage cabinet of etching machine.
(2) technical scheme
For achieving the above object, method of the present invention comprises the steps:
Design a leak rate trace routine, this program run in computing machine that a mass rate master gage is connected on, this mass rate master gage is connected with the gas circuit cabinet, described leak rate trace routine is carried out following steps,
The parameter value of configuration quality flow master gage, the time-out time that its timing is set then is 1200s;
Open all air intake openings and the gas outlet of gas circuit cabinet, the flow that mass flow controller is set is a maximal value, feeds the nitrogen of pressure stability in the gas circuit cabinet, all gas circuits in the flushing gas circuit cabinet, and the pressure of gas circuit is in steady state (SS) to this gas circuit cabinet;
Start the mass rate master gage, begin to detect the leak rate of gas circuit cabinet, if described mass rate master gage is in idle condition, the leak rate testing result of then described leak rate trace routine inquiry mass rate master gage, and described result sent to industrial computer, if described mass rate master gage is not in idle condition, then detect and whether surpass 1200s its this working time, if, the leak rate testing result of then described leak rate trace routine inquiry mass rate master gage, and this result sent to industrial computer, otherwise the state that continues the quality monitoring flow controller is in idle condition or surpasses 1200s working time until it;
Inspection finishes, output leak rate value.
(3) beneficial effect
Since adopt above technical scheme, the leak rate that records the gas circuit cabinet that the present invention can be more convenient in technological process, and also easy and simple to handle.
Description of drawings
Fig. 1 is the computerized equipment connection diagram of the method for the invention;
Fig. 2 is a gas circuit cabinet sketch of the present invention;
Fig. 3 is a leak rate trace routine process flow diagram of the present invention.
Embodiment
Following examples are used to illustrate the present invention, but are not used for limiting the scope of the invention.
Computerized equipment connection layout of the present invention as shown in Figure 1, industrial computer is by CPCI (Compact Peripheral Component Interconnect, close-coupled peripherals is interconnected) plate is connected with total valve with valve, is connected with mass flow controller with the mass rate master gage by serial port board.
Gas circuit cabinet sketch of the present invention, as shown in Figure 2.Enumerated four gas circuits among the figure, the valve that each gas circuit all has an air intake opening, a manually-operated gate, a mass flow controller and places two ends, the left and right sides respectively after gas converges to valve 50, arrives gas outlet 5 through mass rate master gage and total valve.
Leak rate trace routine process flow diagram of the present invention, as shown in Figure 3.Behind the leakage rate measurement program start, the parameter value of configuration quality flow master gage at first, the time-out time that its timing is set then is 1200s, open all valves, and the flow that mass flow controller is set is maximal value, and is uniform to feeding pressure in all air intake openings, the flushing gas circuit.
Close all manually-operated gates, after treating that the gas circuit internal gas pressure is stable, start the mass rate master gage, begin to detect the leak rate of gas circuit cabinet, in the testing process, if the mass rate master gage is in idle condition, then the leak rate trace routine is inquired about the leak rate testing result of mass rate master gage, and this result sent to industrial computer, if the mass rate master gage is not in idle condition, then detect whether surpass 1200s its this working time, if the leak rate testing result of leak rate trace routine inquiry mass rate master gage then, and this result sent to industrial computer, otherwise the state that continues the quality monitoring flow controller is in idle condition or surpasses 1200s working time until it.

Claims (1)

1. the method for a detection etch machine leak rate of air passage cabinet is characterized in that described method comprises the steps:
Design a leak rate trace routine, this program run in computing machine that a mass rate master gage is connected on, this mass rate master gage is connected with the gas circuit cabinet, described leak rate trace routine is carried out following steps,
The parameter value of configuration quality flow master gage, the time-out time that its timing is set then is 1200s;
Open all air intake openings and the gas outlet of gas circuit cabinet, the flow that mass flow controller is set is a maximal value, feeds the nitrogen of pressure stability in the gas circuit cabinet, all gas circuits in the flushing gas circuit cabinet, and the pressure of gas circuit is in steady state (SS) to this gas circuit cabinet;
Start the mass rate master gage, begin to detect the leak rate of gas circuit cabinet, if described mass rate master gage is in idle condition, the leak rate testing result of then described leak rate trace routine inquiry mass rate master gage, and described result sent to industrial computer, if described mass rate master gage is not in idle condition, then detect and whether surpass 1200s its this working time, if, the leak rate testing result of then described leak rate trace routine inquiry mass rate master gage, and this result sent to industrial computer, otherwise the state that continues the quality monitoring flow controller is in idle condition or surpasses 1200s working time until it;
Inspection finishes, output leak rate value.
CNB2005101264440A 2005-12-09 2005-12-09 Method for detecting leak rate of air passage cabinet of etching machine Active CN100416252C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB2005101264440A CN100416252C (en) 2005-12-09 2005-12-09 Method for detecting leak rate of air passage cabinet of etching machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB2005101264440A CN100416252C (en) 2005-12-09 2005-12-09 Method for detecting leak rate of air passage cabinet of etching machine

Publications (2)

Publication Number Publication Date
CN1865884A CN1865884A (en) 2006-11-22
CN100416252C true CN100416252C (en) 2008-09-03

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104949808B (en) * 2014-03-24 2017-10-13 北京北方华创微电子装备有限公司 A kind of leak rate detection method and system
US10107711B2 (en) * 2016-01-15 2018-10-23 Intertech Development Company Reducing thermal effects during leak testing
CN111855113A (en) * 2020-07-23 2020-10-30 上海华力微电子有限公司 Annealing machine, leak rate detection device and detection method
CN112899663B (en) * 2021-01-15 2022-12-02 长鑫存储技术有限公司 Detection method and detection device of gas transmission equipment and gas transmission equipment

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5546789A (en) * 1992-08-03 1996-08-20 Intertech Development Company Leakage detection system
JPH08271371A (en) * 1995-03-31 1996-10-18 Sony Corp Liquid leak monitoring device
JPH10176971A (en) * 1996-12-18 1998-06-30 Hitachi Ltd Apparatus for testing performance of electrostatic chuck
US20040055369A1 (en) * 2002-09-20 2004-03-25 Dieter Lederer Method and arrangement for checking the tightness of a vessel
CN1704744A (en) * 2004-06-02 2005-12-07 旺宏电子股份有限公司 Method for detecting reaction chamber leakage and etching / depositing process

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5546789A (en) * 1992-08-03 1996-08-20 Intertech Development Company Leakage detection system
JPH08271371A (en) * 1995-03-31 1996-10-18 Sony Corp Liquid leak monitoring device
JPH10176971A (en) * 1996-12-18 1998-06-30 Hitachi Ltd Apparatus for testing performance of electrostatic chuck
US20040055369A1 (en) * 2002-09-20 2004-03-25 Dieter Lederer Method and arrangement for checking the tightness of a vessel
CN1704744A (en) * 2004-06-02 2005-12-07 旺宏电子股份有限公司 Method for detecting reaction chamber leakage and etching / depositing process

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Address after: No. 8, Wenchang Avenue, Beijing economic and Technological Development Zone, 100176

Patentee after: Beijing North China microelectronics equipment Co Ltd

Address before: 100016 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing

Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing

CP03 Change of name, title or address