CN109913919B - A processing method and device for preparing a micro-nano two-dimensional structure on the surface of a workpiece - Google Patents

Abstract

The invention discloses a processing method and a device for preparing a micro-nano two-dimensional structure on the surface of a workpiece, and belongs to the field of special processing. The method adopts a method of coupling laser ablation and electrochemical deposition in the processing process, wherein a laser beam is focused on the surface of a workpiece substrate, and a micron-sized structure is processed on the surface of the workpiece substrate by controlling the area and the path of the laser ablation through a numerical control system; while laser ablation is performed, the anode of the tool is kept opposite to an ablation area, and nano structures are deposited on the micro structures in the area of the workpiece substrate. In order to restrain the electric field of the anode to the maximum extent in the top end area of the electrode, the anode of the tool penetrates into an insulating glass tube to realize side wall insulation. In addition, the heat-force effect of the laser raises the temperature of the solution in the irradiation area, and simultaneously generates a strong stirring effect, thereby accelerating the circulation flow updating of the deposition solution and promoting the rapid and efficient growth of the nano structure. The method is suitable for efficient processing and manufacturing of the micro-nano two-dimensional structure on the surface of the part.

Description

A processing method and device for preparing a micro-nano two-dimensional structure on the surface of a workpiece

technical field

The invention relates to the field of surface processing in special processing technology, in particular to a method and device for laser electrochemical composite processing, which are suitable for processing and manufacturing functional surface microstructures.

Background technique

In recent years, as a method that can significantly improve the interface properties, surface texture has become a research hotspot in the field of interface science at home and abroad. become possible. Wettability is one of the important characteristics of solid surfaces, which directly affects the flow and phase transition of surface fluids. It plays a huge role in both nature and human life. On the other hand, as a typical interface Phenomenon, surface wettability also has extremely important research value in interface chemistry, physics, materials science, interface structure design and other basic research of interdisciplinary. The microstructure of the material surface is one of the main factors that determine the wettability of the solid surface. Therefore, the research on the control of the surface wettability of the material by surface micromodeling has attracted much attention at this stage.

It is generally believed that the surface of the material with a water contact angle θ<5° is defined as a superhydrophilic surface, the surface of the material with a water contact angle of 5°<θ<90° is hydrophilic, the surface of the material with a water contact angle of 90°<θ<150° is hydrophobic, and the surface of the material with θ>150° The surface of the material is defined as a superhydrophobic surface. Studies have shown that the superhydrophobic/hydrophilic properties of the material surface mainly depend on the surface free energy and roughness, and the effective preparation of superhydrophobic/hydrophilic surfaces can be achieved through the synergistic effect of surface chemical composition and surface microstructure.

At this stage, thanks to the special wettability surface research related to the "lotus leaf effect", the construction of surface micro-nano structures has become a common way to obtain superhydrophobic and superhydrophilic surfaces. After searching the existing technology, it is found that the patent with the publication number CN107321583A proposes an in-situ construction method for a superhydrophobic surface with a micro-nano hierarchical structure. A micron-scale rough structure is constructed on the metal substrate, and then a hydrothermal method is used, using a certain concentration of aluminum trichloride hexahydrate and triethanolamine solution as the etching solution, and continuing to etch the surface of the existing micron-scale structure. '-like nanoscale structure, and then use heptadecafluorosilane for low-energy treatment, and finally obtain a superhydrophobic surface with a micro-nano hierarchical structure; the patent publication number CN108478858A proposes a titanium implant nanoscale superhydrophilic The preparation method of the surface, the method firstly uses sand grains to carry out sandblasting and polishing treatment on the titanium implant, then carries out acid etching and polishing treatment, then puts it into an electrolyte for anodic oxidation treatment, and finally puts it into a heat treatment device for heat treatment to obtain Titanium implants with nanoscale topographic surfaces.

The traditional method of preparing biomimetic surface structures centered on nanomaterial preparation methods and photolithography technology can generally only obtain nanometer or micrometer structures. Micro-nano structured surface. Although the two-step method can construct a micro-nano composite structure, it usually requires a longer processing cycle, and the preparation process is complicated and the processing cost is expensive. There is still room for improvement; in terms of application, the prepared superhydrophobic/hydrophilic surface has certain However, the adhesion between the surface microstructure and the substrate is low, which easily leads to the detachment of the superhydrophobic/hydrophilic microstructure on the surface of the substrate, which in turn affects the stability of the superhydrophobic/hydrophilic performance and its application potential.

SUMMARY OF THE INVENTION

The purpose of the present invention is to aim at the shortcomings of the existing processing technology, and propose a simple, low cost, good mechanical performance, strong controllability, suitable for the rapid preparation of micro-nano two-dimensional structure surface on the workpiece surface. Processing method and device for composite micro-electrodeposition.

The present invention is achieved through the following technical solutions:

A processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece, using laser beam ablation and electrochemical deposition to generate a micro-nano two-dimensional structure on the surface of the workpiece at the same time, so as to obtain the superhydrophobic/hydrophilic function of the surface of the part; the laser emits The laser beam is focused by the optical path transmission system and the convex lens, irradiated on the surface of the workpiece substrate, and ablated micron-scale structures on the surface of the workpiece substrate; at the same time, the positive and negative electrodes of the DC power supply are respectively connected to the tool anode and the workpiece substrate, turn on the power supply, keep The tool anode is facing the laser ablation area, and the nanoscale structure is deposited on the microstructure by electrochemical method.

Further, the following steps are included:

Draw the motion path model and input it into the computer;

Surface pretreatment of workpiece substrate;

Fix the workpiece substrate in the working tank, the anode of the tool is connected to the positive electrode of the DC pulse power supply, and is clamped and placed above the workpiece substrate by the working arm. The workpiece substrate is connected to the negative electrode of the DC pulse power supply. In the deposition solution, when power is applied, the workpiece substrate and the workpiece anode form an electrochemical circuit in the deposition solution;

Install the working tank on the motion platform, adjust the height of the x-y-z three-axis motion platform, and make the laser focus on the surface of the workpiece substrate;

Turn on the micro-pump for circulating liquid to ensure the uniform concentration of the solution in the working tank;

Turn on the DC pulse power supply, the charged metal ions in the deposition solution undergo electrochemical reduction reaction on the surface of the workpiece substrate, and at the same time turn on the pulsed laser, the laser beam and the electrodeposition pulse current are synchronously irradiated on the deposition site to realize simultaneous laser and electrodeposition processing;

According to the set motion path, the x-y-z three-axis motion platform is controlled by the motion controller to continuously process the workpiece substrate to realize the synchronous and rapid processing of the micro-nano two-dimensional structure.

A processing device for preparing a micro-nano two-dimensional structure on the surface of a workpiece, comprising a laser irradiation system, a processing system and a control system;

The laser irradiation system includes a pulsed laser, a reflection mirror and a focusing lens; the laser is emitted by the pulsed laser, the transmission direction is changed by the reflection mirror, and then focused by the focusing lens, and the focused laser beam is irradiated on the workpiece substrate;

The processing system includes a DC pulse power supply, a working tank, a workpiece substrate, a tool anode, and an x-y-z three-axis motion platform; the working tank is arranged on the x-y-z three-axis motion platform; the positive electrode of the DC pulse power source is connected to the tool anode, and the negative electrode is connected to the tool anode. connected with the workpiece substrate; the workpiece substrate and the lower end of the tool anode are immersed in the deposition solution, and the workpiece substrate and the workpiece anode form an electrochemical circuit in the deposition solution; the tool anode is clamped by the working arm of the x-y-z three-axis motion platform;

The control system includes a computer and a motion controller, the computer controls the pulse laser, the DC pulse power supply and the motion controller; the motion controller controls the x-y-z three-axis motion platform.

Further, the side wall of the tool anode is insulated, and the tool anode is an insoluble metal wire.

Further, the tool anode is insulated on the side wall by an insulating glass tube.

Further, the tool anode is arranged 0.5-1.5 mm above the workpiece substrate.

Further, the processing device also includes a working fluid circulation system, and the working fluid circulation system includes a liquid storage tank, a micropump, a filter and a throttle valve; the micropump, the filter, and the throttle valve are connected in series in the circuit, and the storage tank is connected in series. The liquid tank is connected with the input end of the micro pump, and the working tank is connected with the filter; one end of the throttle valve is connected with the working tank, and the other end is connected with the liquid storage tank.

Further, the processing system further includes an oscilloscope; the DC pulse power supply is connected to the oscilloscope.

Further, the pulsed laser is a nanosecond pulsed laser or a picosecond pulsed laser.

Further, the liquid level of the deposition solution is 2-10mm higher than the workpiece substrate, the temperature of the deposition solution is 30-50°C; the DC pulse power supply voltage can be adjusted to 0-20V, the frequency is consistent with the laser parameters, and the duty cycle is 0-80%.

The beneficial effects of the present invention are as follows:

1. Simultaneous processing and generation of micro and nano structures, simple operation process and high processing efficiency;

2. During the electrodeposition process, the angle of incidence of the laser can be changed by adjusting the angle between the laser beam and the workpiece substrate, the direction of the microstructure and the distribution of the nanostructure can be controlled, and the orientation of the hydrophilic/hydrophobic properties of the workpiece surface can be changed. to induce and regulate the directional motion and self-transport of droplets.

3. The thermal-mechanical effect of the laser will produce a strong stirring effect in the electrolyte, which will significantly enhance the convective mass transfer of the electrochemical reaction ions, accelerate the circulation and renewal of the deposition solution, promote the rapid and efficient growth of nanostructures, and effectively improve the processing efficiency. .

4. Use a blunt metal wire with a diameter of less than 500 μm as the tool anode, insert the metal wire into an insulating glass tube with a matching inner diameter, and use heat treatment to consolidate the end to insulate the side wall, leaving only the front end conductive. The electric field is limited to the top area of the electrode, which reduces the scope of the electric field on the workpiece substrate, and only the central area of the electrode is reserved for electrodeposition, which enhances the localization of processing.

5. During the electrodeposition process, hydrogen will be precipitated on the deposition body, and the laser thermal effect will form a temperature gradient and pulsating impact at the electrode/solution interface, resulting in localized strong stirring, and hydrogen bubbles are easier to discharge, improving the surface quality of the deposition layer.

6. The laser is irradiated from the side in the area where the electrodeposition occurs, which avoids the problem of affecting the fineness of the processing due to the shielding of the electrode when the laser is irradiated from the top to the bottom of the tool anode.

7. Laser ablation textured workpiece surface has the advantages of high precision, small thermal influence, good controllability, and low pollution. The method is simple, efficient and low in cost.

Description of drawings

Figure 1 is a schematic diagram of a processing system for the rapid preparation of superhydrophobic/hydrophilic surfaces by laser-assisted electrochemical deposition;

2 is a schematic diagram of a directional micro-nano structure obtained after laser biasing;

FIG. 3 is a partial enlarged schematic view of FIG. 2 .

The reference numbers are as follows:

1. Computer; 2. DC pulse power supply; 3. Oscilloscope; 4. Motion controller; 5. x-y-z three-axis motion platform; 6. Liquid storage tank; 7. Filter; 8. Micro pump; 9. Throttle valve; 10. C-axis; 11. Tool anode; 12. Insulating glass tube; 13. Workpiece substrate; 14. Mirror; 15. Focusing lens; 16. Working slot; 17. B-axis; 18. Pulse laser; 19. Laser beam 20. Electric field lines; 21. Nanostructures; 22. Microstructures.

Detailed ways

The present invention will be further described below with reference to the accompanying drawings and specific embodiments, but the protection scope of the present invention is not limited thereto.

A processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece, using laser beam ablation and electrochemical deposition to generate a micro-nano two-dimensional structure on the surface of the workpiece at the same time, so as to obtain the superhydrophobic/hydrophilic function of the surface of the part; the laser emits The laser beam is focused by the optical path transmission system and the convex lens, irradiated on the surface of the workpiece substrate 13, and ablated micron-scale structures on the surface of the workpiece substrate 13; Turn on the power supply, keep the tool anode 11 facing the laser ablation area, and deposit nano-scale structures on the micro-structures by electrochemical methods.

A processing device for preparing a micro-nano two-dimensional structure on the surface of a workpiece, including a laser irradiation system, a processing system and a control system; the laser irradiation system includes a pulsed laser 18, a mirror 14, and a focusing lens 15; 18, the transmission direction is changed by the reflecting mirror 14, and then focused by the focusing lens 15, and the focused laser beam 19 is irradiated on the workpiece substrate 13; the processing system includes a DC pulse power supply 2, a working slot 16, a workpiece substrate 13, The tool anode 11, the x-y-z three-axis motion platform 5; the working tank 16 is arranged on the x-y-z three-axis motion platform 5; the positive electrode of the DC pulse power supply 2 is connected to the tool anode 11, and the negative electrode is connected to the workpiece substrate 13; the workpiece substrate 13 And the lower end of the tool anode 11 is immersed in the deposition solution, and the workpiece substrate 13 and the workpiece anode 11 form an electrochemical circuit in the deposition solution; the tool anode 11 is clamped by the working arm of the x-y-z three-axis motion platform 5;

The control system includes a computer 1 and a motion controller 4 , the computer 1 controls the pulsed laser 18 , the DC pulse power supply 2 and the motion controller 4 ; the motion controller 4 controls the x-y-z three-axis motion platform 5 .

As shown in FIG. 1 , the computer 1 is respectively connected with the pulsed laser 18 , the DC pulsed power supply 2 and the motion controller 4 . The computer 1 can control the laser parameters of the pulsed laser 18 and the power supply parameters of the DC pulse power supply 2. At the same time, the computer 1 can run the path execution code, and control the movement of the x-y-z three-axis motion platform 5 and the C-axis 10 and B-axis 17 through the motion controller 4. rotational movement. The working tank 16 is installed on the x-y-z three-axis motion platform 5, the workpiece substrate 13 is fixed at the bottom of the working tank 16, the tool anode 11 is placed above the workpiece substrate 13, the positive electrode of the DC pulse power supply 2 is connected to the tool anode 11, and the negative electrode is connected to the workpiece substrate 13, The oscilloscope 3 is connected with the DC pulse power supply 2 to monitor the current parameters in real time. The positive electrode of the DC pulse power source 2 → the tool anode 11 → the deposition solution → the workpiece substrate 13 → the negative electrode of the DC pulse power source 2 constitutes a loop, so that the electrochemical reaction can be carried out. The laser beam is emitted by the pulsed laser 18, changes the transmission direction through the mirror 14, and then passes through the focusing lens 15 and penetrates the deposition liquid to focus on the surface of the workpiece substrate 13. The motion controller 4 controls the motion path of the x-y-z three-axis motion platform 5 to achieve different Graphical deposition. The sedimentation liquid is stored in the liquid storage tank 6, and the micropump 8 provides power to transport the sedimentary liquid from the liquid storage tank 6 to the working tank 16 through the filter 7, and the sedimentary liquid flows back to the liquid storage tank 6 through the throttle valve 9 to realize cycle. During the electrodeposition process, the angle of incidence of the laser can be changed by adjusting the angle between the laser beam 19 and the workpiece substrate 13, the direction of the microstructure and the distribution of the nanostructure can be controlled, and the orientation of the hydrophilic/hydrophobic properties of the workpiece surface can be changed. to induce and regulate the directional motion and self-transport of droplets.

As shown in FIG. 2 , the laser is irradiated from the side in the micro-area where electrodeposition occurs, and the workpiece substrate 13 is textured to process a micro-scale surface structure. The tool anode 11 is kept facing the laser ablation area, and the electrochemical current and The laser is synchronized, and nanostructures 21 are deposited on the micron-scale structures 22 in this region of the workpiece substrate 13 to prepare a micro-nano composite structure. 3, it can be seen that the electric field lines 20 between the tool anode 11 and the workpiece substrate 13, the insoluble tool anode 11 penetrates into the insulating glass tube 12 to achieve sidewall insulation, only the top is conductive, and the anode electric field is constrained to the maximum extent In the top area of the electrode, the localization of the deposition is enhanced; the thermal-mechanical effect of the laser will produce a strong stirring effect in the electrolyte, which will significantly enhance the convective mass transfer of the electrochemical reaction ions, and promote the efficient and rapid growth of nanostructures. Efficient processing and fabrication of micro-nano two-dimensional microtextures.

In a specific embodiment of the present invention, a blunt metal wire with a diameter of less than 500 μm is used as the tool anode, the metal wire is inserted into an insulating glass tube with a matching inner diameter, and the end is consolidated by heat treatment to insulate the side wall, leaving only the front end conductive , the anode electric field is limited to the top area of the electrode, the scope of the electric field on the workpiece substrate is reduced, and only the central area of the electrode is reserved for electrodeposition, which enhances the localization of processing.

The workpiece substrate 13 is a conductive material, the tool anode 11 and the workpiece substrate 13 can be arranged vertically, and the tool anode 11 is facing the laser focus area, so that the microstructure 22 and the nanostructure 21 are generated at the same time, and the size and density of the microstructure 22 are determined by the ablation. The path and laser parameters are determined, and the size and density of the nanostructures 21 are determined by electrochemical parameters, laser beam energy density and the movement speed of the workpiece substrate 13; the tool anode 11 is an insoluble metal wire, and an insulating glass tube that matches the size of the inner diameter is used externally. 12 Insulate the side wall, leaving only the end conductive, and grind and polish the end face of the metal wire, and place it 0.5-1.5 mm above the workpiece substrate 13 to constrain the electric field in the anode region to the top of the electrode. The tool anode 11 is clamped by the working arm of the x-y-z three-axis motion platform 5 , and can realize three-dimensional space motion and rotational motion through the motion controller 4 .

The laser beam 19 emitted by the pulsed laser 18 forms a certain angle with the workpiece substrate 13, and irradiates the surface of the workpiece substrate 13 from the side, so as to avoid the influence of processing due to the shielding of the electrodes during laser irradiation. The angle between the laser beams and the workpiece substrate can be adjusted by adjusting the inclination angle of the x-y-z three-axis motion platform. The incident direction of the laser affects the direction of the microstructures 22 and the distribution of the nanostructures 21, so that the hydrophilic/hydrophobic properties of the surface have a certain directional orientation, which can be used to achieve directional movement and self-transportation of droplets. The liquid level of the deposition solution is 132-10 mm higher than the workpiece substrate, and the temperature of the deposition solution is maintained at 30-50°C. The voltage of the DC pulse power supply 2 is adjustable from 0 to 20V, the frequency is consistent with the laser parameters, and the duty cycle is 0 to 80%. The working pressure of the micro pump 8 is less than 2 bar, the flow rate is less than 0.5 L/min, and the solution flow has very little disturbance to the liquid level of the deposition liquid.

The specific implementation method of the present invention is as follows:

S1: Use software to write control codes to ensure the desired graphics. When writing codes, attention should be paid to using a small motion acceleration to prevent the solution from shaking and affecting the processing effect;

S2: Prepare the corresponding deposition solution. The composition and concentration of the deposition solution should be reasonably selected according to the required deposition layer material. A small amount of additives are added to improve the coating performance and deposition speed, and a small amount of brightener and leveling agent can improve the surface quality of the deposition layer. Wait;

S3: The workpiece substrate 13 is subjected to surface pretreatment, then fixed in the working tank 16 and connected to the negative electrode of the DC pulse power supply 2 . Connect the tool anode 11 to the positive pole of the DC pulse power supply 2, and fix it at 0.5-1.5mm above the workpiece substrate 13. Since the side wall of the tool anode 11 is insulated, only the front end conducts electricity, which reduces the electric field action area of the workpiece substrate 13, reduces or eliminates The phenomenon of stray deposition is beneficial to improve the localization of deposition;

S4: Add the deposition solution so that the height of the liquid level is 2-10mm higher than the surface of the workpiece substrate 13. If the solution layer is too thin, the plasma generated by the laser irradiation will splash water. If the solution layer is too thick, the energy loss of the laser will be serious when it passes through the solution. , the efficiency is lower;

S5: Place the working tank 16 on the x-y-z three-axis motion platform 5, adjust the x-y-z three-axis motion platform 5, make the laser focus 0.2-1.5mm above the workpiece substrate 13, use the laser thermal effect to form a pulsating impact, and generate a strong flow field The stirring action drives the metal ions in the solution to move to the processing area, inhibits the concentration polarization, promotes the efficient and rapid growth of nano-microstructures, and significantly improves the efficiency of the electrodeposition reaction;

S6: turn on the micro-pump 8 for circulating liquid exchange to ensure that the concentration and composition of the solution in the working tank 16 are uniform;

S7: Adjust the laser parameters and DC pulse power supply parameters through the computer 1. The voltage of the DC pulse power supply 2 is adjustable from 0 to 20V, the duty cycle is 0 to 80%, and the frequency is consistent with the laser parameters. The oscilloscope 3 and the DC pulse power supply 2 Connected, real-time monitoring of power parameters to ensure the stability of the power supply during processing;

S8: Turn on the pulse laser 18, the DC pulse power supply 2 and the motion controller 4. According to the set motion path, the motion controller 4 controls the x-y-z three-axis motion platform 5 to control the area and path of the laser ablation, and then controls the laser ablation area and path. 13 Carry out continuous processing to achieve efficient simultaneous manufacturing and processing of micro-nano composite structures.

The embodiments are preferred embodiments of the present invention, but the present invention is not limited to the above-mentioned embodiments, and any obvious improvement, replacement or Modifications all belong to the protection scope of the present invention.

Claims (10)

1. A processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece, utilizing laser beam ablation and electrochemical deposition to generate a micro-nano two-dimensional structure on the surface of the workpiece at the same time, so as to obtain the superhydrophobic/hydrophilic function of the surface of the part; It is characterized in that the laser beam emitted by the laser is focused by the optical path transmission system and the convex lens, irradiated on the surface of the workpiece substrate (13), and ablated micron-scale structures on the surface of the workpiece substrate (13); at the same time, the positive and negative electrodes of the DC power supply are respectively The tool anode (11) and the workpiece substrate (13) are connected, the power is turned on, the tool anode (11) is kept facing the laser ablation area, and the nanoscale structure is deposited on the microstructure by an electrochemical method. 2. the processing method of preparing micro-nano two-dimensional structure on workpiece surface according to claim 1, is characterized in that, comprises the steps: Draw the motion path model and input it into the computer (1); performing surface pretreatment on the workpiece substrate (13); The workpiece substrate (13) is fixed in the working tank (16), the tool anode (11) is connected to the positive electrode of the DC pulse power supply (2), and is clamped by the working arm and placed above the workpiece substrate (13), the workpiece substrate (13) and the workpiece substrate (13). The negative electrode of the DC pulse power supply (2) is connected to the negative electrode, so that the workpiece substrate (13) and the lower end of the tool anode (11) are immersed in the deposition solution. When electrified, the workpiece substrate (13) and the workpiece anode (11) form an electrochemical circuit in the deposition solution. ; Install the working tank (16) on the motion platform, adjust the height of the x-y-z three-axis motion platform (5), so that the laser is focused on the surface of the workpiece substrate (13); Turn on the micro-pump (8) to circulate the liquid to ensure that the concentration of the solution in the working tank (16) is uniform; The DC pulse power supply (2) is turned on, the charged metal ions in the deposition solution undergo electrochemical reduction reaction on the surface of the workpiece substrate (13), and the pulsed laser (18) is turned on at the same time, and the laser beam (19) is synchronously irradiated with the electrodeposition pulse current on the surface of the workpiece substrate (13). Deposition part, realize simultaneous processing of laser and electrodeposition; According to the set motion path, the x-y-z three-axis motion platform (5) is controlled by the motion controller (4) to continuously process the workpiece substrate (13), so as to realize the synchronous and rapid machining of the micro-nano two-dimensional structure. 3. The processing device used in the processing method for preparing the micro-nano two-dimensional structure on the surface of the workpiece according to claim 1, is characterized in that, comprising a laser irradiation system, a processing system and a control system; The laser irradiation system comprises a pulsed laser (18), a reflecting mirror (14), and a focusing lens (15); the laser light is emitted by the pulsed laser (18), the transmission direction is changed by the reflecting mirror (14), and then passes through the focusing lens (15). ) is focused, and the focused laser beam (19) is irradiated on the workpiece substrate (13); The processing system comprises a DC pulse power supply (2), a working tank (16), a workpiece substrate (13), a tool anode (11), and an x-y-z three-axis motion platform (5); the working tank (16) is arranged on the x-y-z three-axis. on the axis motion platform (5); the positive electrode of the DC pulse power supply (2) is connected to the tool anode (11), and the negative electrode is connected to the workpiece substrate (13); the lower ends of the workpiece substrate (13) and the tool anode (11) are immersed in In the deposition solution, the workpiece substrate (13) and the workpiece anode (11) form an electrochemical circuit in the deposition solution; the tool anode (11) is clamped by the working arm of the x-y-z three-axis motion platform (5); The control system comprises a computer (1) and a motion controller (4), the computer (1) controls a pulsed laser (18), a DC pulse power supply (2) and a motion controller (4); the motion controller ( 4) Control the x-y-z three-axis motion platform (5). 4. The processing device used in the processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece according to claim 3, wherein the tool anode (11) sidewall is insulated, and the tool anode (11) is insoluble metallic line. 5. The processing device used in the processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece according to claim 4, characterized in that the tool anode (11) is insulated from the sidewall by an insulating glass tube (12). . 6. The processing device used in the processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece according to any one of claims 3 to 5, wherein the tool anode (11) is arranged above the workpiece substrate (13) 0.5 ~1.5mm. 7. The processing device used in the processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece according to claim 3, wherein the processing device further comprises a working fluid circulation system, and the working fluid circulation system comprises a liquid storage tank (6), micro-pump (8), filter (7) and throttle valve (9); the micro-pump (8), filter (7) and throttle valve (9) are connected in series in the circuit to store liquid The tank (6) is connected with the input end of the micro pump (8), the working tank (16) is connected with the filter (7); one end of the throttle valve (9) is connected with the working tank (16), and the other end is connected with the liquid storage tank (6) Connected. 8. The processing device used in the processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece according to claim 3, wherein the processing system further comprises an oscilloscope (3); the DC pulse power supply (2) ) is connected to the oscilloscope (3). 9 . The processing device used in the processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece according to claim 3 , wherein the pulsed laser ( 18 ) is a nanosecond pulsed laser or a picosecond pulsed laser. 10 . 10. The processing device used in the processing method for preparing a micro-nano two-dimensional structure on the surface of a workpiece according to claim 3, wherein the liquid level of the deposition liquid is 2-10 mm higher than the workpiece substrate (13), and the temperature of the deposition liquid is 30～50℃; the voltage of the DC pulse power supply (2) can be adjusted to 0～20V, the frequency is consistent with the laser parameters, and the duty ratio is 0～80%.

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