Disclosure of Invention
In view of the above problems in the prior art, the present applicant provides a ketone-containing compound and its application in an organic electroluminescent device. The compound contains a ketone structure, has higher glass transition temperature and molecular thermal stability, proper HOMO and LUMO energy levels and high electron mobility, and can effectively improve the luminous efficiency of the device and prolong the service life of the OLED device after being applied to the manufacture of the OLED device.
The technical scheme of the invention is as follows: a ketone-containing compound having a structure represented by general formula (1):
in the general formula (1), ar 2 Is represented by substituted or unsubstituted C 1-10 Alkyl, substituted or unsubstituted C 6-30 Aryl, substituted or unsubstituted C 5-30 One of heteroaryl;
in the general formula (1), ar 1 、Ar 3 Each independently represents a single bond, substituted or unsubstituted C 6-30 Arylene, substituted or unsubstituted C 5-30 One of heteroarylenes; ar (Ar) 1 May also be represented by substituted or unsubstituted C 1-10 Alkyl, substituted or unsubstituted C 6-30 Aryl, substituted or unsubstituted C 5-30 In the heteroaryl radicalOne of (a) or (b);
in the general formula (1), X represents a carbon atom, an oxygen atom or a sulfur atom;
when X is a carbon atom, k =1,m, n independently represent 0 or 1, and m and n are different;
when X is an oxygen atom or a sulfur atom, k =0,m =0,n =1.
In the general formula (1), X 1 、X 2 Each independently represents a single bond, an oxygen atom, C 1-10 One of linear chain or branched alkyl substituted alkylidene, aryl substituted alkylidene, alkyl substituted imino or aryl substituted imino; x 1 、X 2 At least one is a single bond.
On the basis of the technical scheme, the invention can be further improved as follows.
Further, the structure of the compound is shown as a general formula (2), a general formula (3), a general formula (4) or a general formula (5):
further, said Ar 1 、Ar 3 Each independently represents one of a single bond, phenylene, biphenylene or naphthylene; ar (Ar) 1 May also represent one of methyl, phenyl, biphenyl or naphthyl;
Ar 2 expressed as one of methyl, phenyl, biphenyl or naphthyl.
Further, in the general formula (1)
Expressed as:
Further, the specific structural formula of the compound is as follows:
The invention also provides a preparation method of the compound, and the reaction equation generated in the preparation process is as follows:
(1) When X is an oxygen atom or a sulfur atom, k =0, m =0, n =1:
when Ar is 3 When not representing a single bond:
the specific reaction process of the above reaction equation is:
dissolving raw material A and intermediate M in mixed solution of toluene and ethanol, removing oxygen, and adding Pd (PPh) 3 ) 4 And K 2 CO 3 Reacting for 10-24 hours at 95-110 ℃ under inert atmosphere; after the raw materials are completely reacted, cooling and filtering, removing the solvent from the filtrate by rotary evaporation, and passing the crude product through a silica gel column to obtain a target compound;
wherein the dosage of the toluene and the ethanol is 30-50 mL of toluene and 5-10 mL of ethanol used per gram of the raw material A, the molar ratio of the intermediate M to the raw material A is (1-1.5) 1, pd (PPh) 3 ) 4 The molar ratio of the raw material A to the raw material A is (0.006-0.02): 1,K 2 CO 3 The mol ratio of the raw material A to the raw material A is (1.5-2) to 1;
when Ar is 3 When represents a single bond:
the specific reaction process of the above reaction equation is:
weighing a raw material A in a nitrogen atmosphere, dissolving the raw material A in tetrahydrofuran, adding a raw material B and tetrakis (triphenylphosphine) palladium, stirring the mixture, adding a potassium carbonate aqueous solution, and heating and refluxing the mixed solution of the reactants at a reaction temperature of 70-90 ℃ for 5-20 hours; after the reaction is finished, cooling and adding water, extracting the mixture by using dichloromethane, drying the extract by using anhydrous sodium sulfate, filtering and concentrating under reduced pressure, and purifying the obtained residue by using a silica gel column to obtain the target compound;
wherein the molar ratio of the raw material A to the raw material B is 1 (1.0-1.5), the molar ratio of the tetrakis (triphenylphosphine) palladium to the raw material A is (0.001-0.02): 1, the molar ratio of the potassium carbonate to the raw material A is (1.0-2.0): 1, the dosage ratio of the THF to the raw material A is 1g: (10-30) ml.
(2) When X is a carbon atom, k =1,m =0, n =1:
when Ar is 3 When not representing a single bond:
the specific reaction process of the above reaction equation is:
dissolving raw material A and intermediate N in mixed solution of toluene and ethanol, removing oxygen, and adding Pd (PPh) 3 ) 4 And K 2 CO 3 Reacting for 10-24 hours at 95-110 ℃ under inert atmosphere; after the raw materials are completely reacted, cooling and filtering, removing the solvent from the filtrate by rotary evaporation, and passing the crude product through a silica gel column to obtain a target compound;
wherein the dosage of the toluene and the ethanol is 30-50 mL of toluene and 5-10 mL of ethanol used in each gram of the raw material A, the mol ratio of the intermediate N to the raw material A is (1-1.5) to 1, pd (PPh) 3 ) 4 The mol ratio of the raw material A to the raw material A is (0.006-0.02): 1,K 2 CO 3 The mol ratio of the raw material A to the raw material A is (1.5-2) to 1;
when Ar is 3 When represents a single bond:
the specific reaction process of the above reaction equation is:
weighing a raw material A and dissolving the raw material A in tetrahydrofuran under the nitrogen atmosphere, adding a raw material C and tetrakis (triphenylphosphine) palladium, stirring the mixture, adding a potassium carbonate aqueous solution, and heating and refluxing the mixed solution of the reactants at the reaction temperature of 70-90 ℃ for 5-20 hours; after the reaction is finished, cooling and adding water, extracting the mixture by using dichloromethane, drying the extract by using anhydrous sodium sulfate, filtering and concentrating under reduced pressure, and purifying the obtained residue by using a silica gel column to obtain the target compound;
wherein the molar ratio of the raw material A to the raw material C is 1 (1.0-1.5), the molar ratio of the tetrakis (triphenylphosphine) palladium to the raw material A is (0.001-0.02): 1, the molar ratio of the potassium carbonate to the raw material A is (1.0-2.0): 1, the dosage ratio of THF to the raw material A is 1g: (10-30) ml;
(3) When X is a carbon atom, k =1,m =1,n =0:
the specific reaction process is as follows:
weighing raw material A and dissolving in tetrahydrofuran under nitrogen atmosphere, adding raw material D and tetrakis (triphenylphosphine) palladium, stirring the mixture, adding potassium carbonate aqueous solution, and heating and refluxing the mixed solution of the reactants at the reaction temperature of 70-90 ℃ for 5-20 hours; after the reaction is finished, water is added for cooling, the mixture is extracted by dichloromethane, the extract liquid is dried by anhydrous sodium sulfate, filtered and concentrated under reduced pressure, and the obtained residue is purified by a silica gel column to obtain the target compound;
the molar ratio of the raw material A to the raw material D is 1.0-1.5, the molar ratio of tetrakis (triphenylphosphine) palladium to the raw material A is 0.001-0.02: 10 to 30ml.
The present invention also provides an organic electroluminescent device comprising at least one functional layer containing the above ketone-containing compound.
On the basis of the technical scheme, the invention can be improved as follows.
Further, the organic electroluminescent device includes a light-emitting layer containing the above ketone-containing compound.
Further, the organic electroluminescent device comprises a hole blocking layer/electron transporting layer containing the above ketone-containing compound.
The invention also provides a lighting or display element comprising an organic electroluminescent device as described above.
The beneficial technical effects of the invention are as follows:
the compound takes ketone and spiroanthracene fluorene groups as a framework, the ketone and spiroanthracene fluorene groups are connected through a single bond or an aromatic group, the ketone and spiroanthracene fluorene groups are electronic groups, and have deep HOMO energy level and high electron mobility, and the HOMO energy level can be freely adjusted through modification of other aromatic groups, so that the compound can be used as an electronic type luminescent material and also can be used as a hole blocking or electron transport layer material. The structure containing the hole group can balance electrons and holes of the material, so that the material can be used as a main body material of a polarized electron type light-emitting layer.
In addition, the ketone and spiroanthracene fluorene groups are electron withdrawing groups, the formed molecules have no symmetry, the aggregation among the molecules is avoided, and the compound group has the characteristics of strong rigidity, difficult crystallization and aggregation among the molecules, good film forming property and high glass transition temperature and thermal stability.
After the compound is used as an organic electroluminescent functional layer material to be applied to an OLED device, the current efficiency, the power efficiency and the external quantum efficiency of the device are greatly improved; meanwhile, the service life of the device is obviously prolonged, and the OLED luminescent device has a good application effect and a good industrialization prospect.
Detailed Description
Example 1: synthesis of intermediate M:
(1) Dissolving raw material B and raw material E in a mixed solution of toluene and ethanol, removing oxygen, and adding Pd (PPh) 3 ) 4 And K 2 CO 3 Reacting for 10-24 hours at 95-110 ℃ under inert atmosphere; after the raw materials are completely reacted, cooling and filtering, removing the solvent from the filtrate by rotary evaporation, and passing the crude product through a silica gel column to obtain a target compound;
wherein the dosage of the toluene and the ethanol is 30-50 mL of toluene and 5-10 mL of ethanol used per gram of the raw material E, the molar ratio of the raw material B to the raw material E is (1-1.5): 1,Pd (PPh) 3 ) 4 The molar ratio of the raw material E to the raw material E is (0.006-0.02): 1,K 2 CO 3 The molar ratio of the raw material E to the raw material E is (1.5-2): 1.
(2) Weighing an intermediate S, dissolving the intermediate S in tetrahydrofuran under the protection of nitrogen, cooling to-78 ℃, adding 1.6mol/L tetrahydrofuran solution of n-butyllithium into a reaction system, reacting at-78 ℃ for 3h, adding triisopropyl borate, reacting for 2h, raising the temperature of the reaction system to 0 ℃, adding 2mol/L hydrochloric acid solution, stirring for 3h, completely reacting, adding diethyl ether for extraction, adding anhydrous magnesium sulfate into an extract liquid, drying, performing rotary evaporation, and recrystallizing by using an ethanol solvent to obtain an intermediate M;
wherein the molar ratio of the intermediate S to the n-butyllithium is 1 (1-1.5); the molar ratio of the intermediate S to the triisopropyl borate is 1 (1-1.5).
Synthesis example of intermediate M-1:
(1) 0.01mol of the raw material E-2 and 0.012mol of the raw material B-1 were dissolved in 150mL (V) of toluene and ethanol Toluene :V Ethanol =5: 1) Adding 0.0002mol of Pd (PPh) into the mixed solution after deoxygenation 3 ) 4 And 0.02molK 2 CO 3 Reacting at 110 ℃ for 24 hours under an inert atmosphere, cooling and filtering after the raw materials react completely, removing the solvent from the filtrate by rotary evaporation, and passing the crude product through a silica gel column to obtain an intermediate target product S-2; elemental analysis Structure (molecular formula C) 19 H 11 BrO 2 ): theoretical value C,64.98; h,3.16; br,22.75; test values are: c,64.98; h,3.16; br,22.74; ESI-MS (M/z) (M +): theoretical value is 349.99, found 350.55.
(2) Weighing 0.01mol of intermediate S-2 under the protection of nitrogen, dissolving in tetrahydrofuran, cooling to-78 ℃, adding 8ml of 1.6mol/L n-butyllithium tetrahydrofuran solution into a reaction system, reacting at-78 ℃ for 3h, adding 0.013mol of triisopropyl borate, reacting for 2h, raising the temperature of the reaction system to 0 ℃, adding 10ml of 2mol/L hydrochloric acid solution, stirring for 3h, reacting completely, adding diethyl ether for extraction, adding anhydrous magnesium sulfate into an extract, drying, rotary evaporating, and recrystallizing with an ethanol solvent to obtain an intermediate M-2; elemental analysis Structure (molecular formula C) 19 H 13 BO 4 ): theoretical value C,72.19; h,4.15; b,3.42; test values are: c,72.19; h,4.15; b,3.43.ESI-MS (M/z) (M) + ): theoretical value is 316.09, found 316.49.
The intermediate M is prepared by a synthesis method of the intermediate M-1, and the specific structure is shown in Table 1.
TABLE 1
Example 2: synthesis of Compound 3:
in a 250mL three-necked flask, 0.01mol of starting material A-1 and 0.012mol of intermediate M-1 were dissolved in 150mL (V) of toluene and ethanol Toluene :V Ethanol =5: 1) Adding 0.0002mol of Pd (PPh) into the mixed solution after deoxygenation 3 ) 4 And 0.02mol of K 2 CO 3 Reacting at 110 ℃ for 24 hours under an inert atmosphere, cooling and filtering after the raw materials react completely, removing the solvent from the filtrate by rotary evaporation, and passing the crude product through a silica gel column to obtain a target product; elemental analysis Structure (molecular formula C) 47 H 32 O 2 ): theoretical value C,89.78; h,5.13; test values: c,89.77; h,5.13; ESI-MS (M/z) (M +): theoretical value is 628.24, found 628.55.
Example 3: synthesis of compound 10:
in a 250mL three-necked flask, 0.01mol of starting material A-2 and 0.012mol of intermediate M-2 were dissolved in 150mL (V) of toluene and ethanol Toluene :V Ethanol =5: 1) Adding 0.0002mol of Pd (PPh) into the mixed solution after deoxygenation 3 ) 4 And 0.02mol of K 2 CO 3 Reacting at 110 ℃ for 24 hours under an inert atmosphere, cooling and filtering after the raw materials react completely, removing the solvent from the filtrate by rotary evaporation, and passing the crude product through a silica gel column to obtain a target product; elemental analysis Structure (molecular formula C) 44 H 26 O 3 ): theoretical value C,87.69; h,4.35; test values are: c,87.68; h,4.35; ESI-MS (M/z) (M +): theoretical value is 602.19, found 602.77.
Example 4: synthesis of compound 19:
compound 19 was prepared as in example 2, except that starting material A-1 was replaced with starting material A-2 and intermediate M-3 was used in the replacementAn intermediate M-1. Elemental analysis Structure (molecular formula C) 44 H 26 O 3 ): theoretical value C,87.69; h,4.35; test values are: c,87.70; h,4.35.ESI-MS (M/z) (M) + ): theoretical value is 602.19, found 602.61.
Example 5: synthesis of compound 20:
compound 20 was prepared as in example 2, except that starting material A-1 was replaced with starting material A-3 and intermediate M-1 was replaced with intermediate M-3. Elemental analysis Structure (molecular formula C) 44 H 26 O 3 ): theoretical value C,87.69; h,4.35; test values: c,87.69; h,4.35.ESI-MS (M/z) (M) + ): theoretical value is 602.19, found 602.74.
Example 6: synthesis of compound 28:
weighing 0.01mol of raw material A-2 in a 250mL three-neck flask in a nitrogen atmosphere, dissolving in 100mL tetrahydrofuran, adding 0.012mol of raw material B-1 and 0.0002mol of tetrakis (triphenylphosphine) palladium, stirring the mixture, adding 0.02mol of potassium carbonate aqueous solution, and heating and refluxing the mixed solution of the reactants at a reaction temperature of 90 ℃ for 20 hours; after the reaction is finished, cooling and adding water, extracting the mixture by using dichloromethane, drying the extract by using anhydrous sodium sulfate, filtering and concentrating under reduced pressure, and purifying the obtained residue by using a silica gel column to obtain the target compound; elemental analysis Structure (molecular formula C) 38 H 22 O 3 ): theoretical value C,86.67; h,4.21; test values are: c,86.66; h,4.21.ESI-MS (M/z) (M) + ): theoretical value is 526.16, found 526.74.
Example 7: synthesis of compound 39:
compound 39 is prepared as in example 2, except that intermediate M-4 is substituted for intermediate M-1. Elemental analysis Structure (molecular formula C) 47 H 32 O 2 ): theoretical value C,89.78; h,5.13; test values are: c,89.79; h,5.13.ESI-MS (M/z) (M) + ): theoretical value is 628.24, found 628.53.
Example 8: synthesis of compound 50:
compound 50 was prepared as in example 2, except that starting material A-1 was replaced with starting material A-4 and intermediate M-1 was replaced with intermediate M-5. Elemental analysis Structure (molecular formula C) 44 H 26 O 3 ): theoretical value C,87.69; h,4.35; test values are: c,87.68; h,4.35.ESI-MS (M/z) (M) + ): theoretical value is 602.19, found 602.49.
Example 9: synthesis of compound 61:
compound 61 can be prepared as in example 2, except that starting material A-1 is replaced with starting material A-5 and intermediate M-1 is replaced with intermediate M-6. Elemental analysis Structure (molecular formula C) 44 H 26 O 3 ): theoretical value C,87.69; h,4.35; test values: c,87.69; h,4.34.ESI-MS (M/z) (M) + ): theoretical value is 602.19, found 602.82.
Example 10: synthesis of compound 69:
in a 250mL three-necked flask, 0.01mol of the raw material A-6 was weighed out and dissolved in 100mL of tetrahydrofuran under a nitrogen atmosphere, and 0.01mol of the solution was added2mol of raw material B-2 and 0.0002mol of tetrakis (triphenylphosphine) palladium are added, the mixture is stirred, 0.02mol of potassium carbonate aqueous solution is added, and the mixed solution of the reactants is heated and refluxed for 20 hours at the reaction temperature of 90 ℃; after the reaction is finished, cooling and adding water, extracting the mixture by using dichloromethane, drying the extract by using anhydrous sodium sulfate, filtering and concentrating under reduced pressure, and purifying the obtained residue by using a silica gel column to obtain the target compound; elemental analysis Structure (molecular formula C) 41 H 28 O 2 ): theoretical value C,89.10; h,5.11; test values are: c,89.10; h,5.12.ESI-MS (M/z) (M) + ): theoretical value is 552.21, found 552.54.
Example 11: synthesis of compound 73:
compound 73 was prepared as in example 2, except that starting material A-1 was replaced with starting material A-2 and intermediate M-1 was replaced with intermediate M-7. Elemental analysis Structure (molecular formula C) 50 H 30 O 3 ): theoretical value C,88.47; h,4.46; test values are: c,88.47; h,4.47.ESI-MS (M/z) (M) + ): theoretical value is 678.22, found 678.74.
Example 12: synthesis of compound 83:
compound 83 is prepared as in example 2, except that starting material A-1 is replaced with starting material A-3 and intermediate M-1 is replaced with intermediate M-8. Elemental analysis Structure (molecular formula C) 50 H 30 O 3 ): theoretical value C,88.47; h,4.46; test values are: c,88.46; h,4.46.ESI-MS (M/z) (M) + ): theoretical value is 678.22, found 678.81.
Example 13: synthesis of compound 96:
compound 96 is prepared as in example 2, except that starting material A-6 is substituted for starting material A-1 and intermediate M-9 is substituted for intermediate M-1. Elemental analysis Structure (molecular formula C) 53 H 36 O 2 ): theoretical value C,90.31; h,5.15; test values are: c,90.31; h,5.14.ESI-MS (M/z) (M) + ): theoretical value is 704.27, found 704.91.
Example 14: synthesis of compound 115:
compound 115 was prepared as in example 2, except that starting material A-1 was replaced with starting material A-5 and intermediate M-1 was replaced with intermediate M-10. Elemental analysis Structure (molecular formula C) 50 H 30 O 3 ): theoretical value C,88.47; h,4.46; test values: c,88.47; h,4.47.ESI-MS (M/z) (M) + ): theoretical value is 678.22, found 678.88.
Example 15: synthesis of compound 128:
compound 128 was prepared as in example 2, except that starting material A-1 was replaced with starting material A-3 and intermediate M-1 was replaced with intermediate M-11. Elemental analysis Structure (molecular formula C) 50 H 30 O 3 ): theoretical value C,88.47; h,4.46; test values are: c,88.46; h,4.46.ESI-MS (M/z) (M) + ): theoretical value is 678.22, found 678.76.
Example 16: synthesis of compound 144:
compound 144 was prepared as in example 2, exceptThe method is characterized in that a raw material A-4 is used for replacing a raw material A-1, and an intermediate M-12 is used for replacing an intermediate M-1. Elemental analysis Structure (molecular formula C) 53 H 36 O 2 ): theoretical value C,90.31; h,5.15; test values are: c,90.30; h,5.15.ESI-MS (M/z) (M) + ): theoretical value is 704.27, found 704.74.
Example 17: synthesis of compound 155:
compound 155 can be prepared as in example 2, except that starting material A-1 is replaced with starting material A-3 and intermediate M-1 is replaced with intermediate M-13. Elemental analysis Structure (molecular formula C) 50 H 30 O 3 ): theoretical value C,88.47; h,4.46; test values are: c,88.46; h,4.46.ESI-MS (M/z) (M) + ): theoretical value is 678.22, found 678.84.
Example 18: synthesis of compound 163:
compound 163 was prepared as in example 2, except that starting material A-1 was replaced with starting material A-2 and intermediate M-1 was replaced with intermediate M-14. Elemental analysis Structure (molecular formula C) 50 H 30 O 3 ): theoretical value C,88.47; h,4.46; test values are: c,88.46; h,4.46.ESI-MS (M/z) (M) + ): theoretical value is 678.22, found 678.46.
Example 19: synthesis of compound 177:
compound 177 is prepared as in example 2, except that starting material A-6 is substituted for starting material A-1 and intermediate M-15 is substituted for intermediate M-1. Elemental analysis Structure (molecular formula C) 53 H 36 O 2 ): theoretical valueC,90.31; h,5.15; test values are: c,90.31; h,5.15.ESI-MS (M/z) (M) + ): theoretical value is 704.27, found 704.89.
Example 20: synthesis of compound 196:
compound 196 is prepared as in example 2, except starting material A-5 is substituted for starting material A-1 and intermediate M-16 is substituted for intermediate M-1. Elemental analysis Structure (molecular formula C) 50 H 30 O 3 ): theoretical value C,88.47; h,4.46; test values are: c,88.47; h,4.45.ESI-MS (M/z) (M) + ): theoretical value is 678.22, found 678.86.
Example 21: synthesis of compound 218:
compound 218 is prepared as in example 2, except that starting material A-1 is replaced with starting material A-3 and intermediate M-1 is replaced with intermediate M-17. Elemental analysis Structure (molecular formula C) 50 H 30 O 3 ): theoretical value C,88.47; h,4.46; test values are: c,88.46; h,4.46.ESI-MS (M/z) (M) + ): theoretical value is 678.22, found 678.59.
Example 22: synthesis of compound 231:
compound 231 was prepared as in example 2, except that starting material A-6 was used in place of starting material A-1 and intermediate M-18 was used in place of intermediate M-1. Elemental analysis Structure (molecular formula C) 53 H 36 O 2 ): theoretical value C,90.31; h,5.15; test values are: c,90.30; h,5.15.ESI-MS (M/z) (M) + ): theoretical value is 704.27, found 704.95.
Example 23: synthesis of compound 242:
compound 242 was prepared as in example 6, except that starting material B-1 was replaced with starting material C-1 and starting material A-1 was replaced with starting material A-4. Elemental analysis Structure (molecular formula C) 41 H 28 O 2 ): theoretical value C,89.10; h,5.11; test values are: c,89.11; h,5.11.ESI-MS (M/z) (M) + ): theoretical value is 552.21, found 552.74.
Example 24: synthesis of compound 261:
compound 261 can be prepared by the same method as in example 6, except that starting material B-1 is replaced with starting material D-1 and starting material A-1 is replaced with starting material A-6. Elemental analysis Structure (molecular formula C) 54 H 38 O): theoretical value C,92.27; h,5.45; test values are: c,92.26; h,5.45.ESI-MS (M/z) (M) + ): theoretical value is 702.29, found 702.66.
The organic compound is used in a light-emitting device, has high Tg (glass transition temperature) temperature and triplet state energy level (T1), and suitable HOMO and LUMO energy levels, can be used as a hole blocking/electron transporting material, and can also be used as a light-emitting layer material. The compound of the present invention and the existing material were tested for thermal properties, T1 level and HOMO level, respectively, and the results are shown in table 2.
TABLE 2
Note: three-wireThe state energy level T1 is tested by an F4600 fluorescence spectrometer of Hitachi, and the test condition of the material is 2X 10 -5 A toluene solution of (4); the glass transition temperature Tg is measured by differential scanning calorimetry (DSC, DSC204F1 differential scanning calorimeter of Germany Tissian corporation), and the heating rate is 10 ℃/min; the thermogravimetric temperature Td is a temperature at which 1% of the weight loss is observed in a nitrogen atmosphere, and is measured on a TGA-50H thermogravimetric analyzer of Shimadzu corporation, japan, and the nitrogen flow rate is 20mL/min; the highest occupied molecular orbital HOMO energy level was tested by the ionization energy test system (IPS 3) in an atmospheric environment.
As can be seen from the data in the table above, compared with the CBP and TPBi materials applied at present, the organic compound of the invention has high glass transition temperature, can improve the phase stability of the material film, and further improves the service life of the device; the material has high triplet state energy level, and can block energy loss of a light-emitting layer, so that the light-emitting efficiency of the device is improved. Meanwhile, the material and the application material have similar HOMO energy levels. Therefore, after the organic material containing ketone is applied to different functional layers of an OLED device, the luminous efficiency of the device can be effectively improved, and the service life of the device can be effectively prolonged.
The application effect of the synthesized OLED material in the device is described in detail by device examples 1-23 and device comparative example 1. Compared with the device embodiment 1, the device embodiments 2 to 23 and the device comparative example 1 of the present invention have the same manufacturing process, and adopt the same substrate material and electrode material, and the film thickness of the electrode material is also kept consistent, except that the device embodiments 2 to 15 change the material of the light emitting layer in the device; device examples 16-23 were prepared by changing the hole blocking/electron transporting layer materials of the devices, and the results of the performance tests of the devices obtained in each example are shown in table 3.
Device example 1:
as shown in fig. 1, an electroluminescent device is prepared by the steps of: a) Cleaning the ITO anode layer 2 on the transparent substrate layer 1, respectively ultrasonically cleaning the ITO anode layer 2 for 15 minutes by using deionized water, acetone and ethanol, and then treating the ITO anode layer 2 in a plasma cleaner for 2 minutes; b) Evaporating hole injection layer material HAT-CN on ITO anode layer 2 by vacuum evaporation with thickness of 10nm, this layer serves as the hole injection layer 3; c) Evaporating a hole transport material NPB (N-propyl-N-boron) on the hole injection layer 3 in a vacuum evaporation mode, wherein the thickness of the hole transport material NPB is 80nm, and the hole transport layer/electron blocking layer 4 is formed; d) A luminescent layer 5 is evaporated on the hole transport/electron blocking layer 4, the host material is the compound 10 and the compound GH prepared in the embodiment of the invention, and the doping material is Ir (ppy) 3 Compound 10, GH and Ir (ppy) 3 The mass ratio of the three components is 50; e) An electron transport material TPBI is evaporated on the light-emitting layer 5 in a vacuum evaporation mode, the thickness of the TPBI is 40nm, and the organic material of the TPBI layer is used as a hole blocking/electron transport layer 6; f) Vacuum evaporating an electron injection layer LiF with the thickness of 1nm on the hole blocking/electron transport layer 6, wherein the layer is an electron injection layer 7; g) Vacuum evaporating cathode Al (100 nm) on the electron injection layer 7, which is a cathode reflection electrode layer 8; after the electroluminescent device was fabricated according to the above procedure, the driving voltage and current efficiency of the device were measured, and the results are shown in table 3. The molecular structural formula of the related material is shown as follows:
device example 2: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: compound 19, GH and Ir (ppy) prepared in the examples of the present invention 3 The composition of the mixture of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 3: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compound 28, GH and Ir (ppy) prepared in the example of the present invention 3 50/10 in a weight ratio of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm)。
Device example 4: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compound 50, GH and Ir (ppy) prepared in the examples of the present invention 3 50/10 in a weight ratio of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 5: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compound 61, GH and Ir (ppy) prepared in the example of the present invention 3 50/10 in a weight ratio of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 6: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compound 69, GH and Ir (ppy) prepared in the examples of the present invention 3 The composition of the mixture of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 7: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compound 73, GH and Ir (ppy) prepared in the examples of the present invention 3 50/10 in a weight ratio of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 8: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compound 96, GH and I prepared in the examples of the present inventionr(ppy) 3 The composition of the mixture of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 9: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compound 115, GH and Ir (ppy) prepared in the example of the present invention 3 50/10 in a weight ratio of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 10: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compound 144, GH and Ir (ppy) prepared in the examples of the present invention 3 50/10 in a weight ratio of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 11: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compound 163, GH and Ir (ppy) prepared in the example of the present invention 3 The composition of the mixture of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 12: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compounds 177 prepared according to the examples of the present invention, GH and Ir (ppy) 3 50/10 in a weight ratio of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 13: ITO anode layer 2 (thickness: 15)0 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: compounds 196, GH and Ir (ppy) prepared in the examples of the invention 3 50/10 in a weight ratio of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 14: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compounds 231, GH and Ir (ppy) prepared in the examples of the present invention 3 50/10 in a weight ratio of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 15: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light emitting layer 5 (thickness: 40nm, material: compounds 261, GH, and Ir (ppy) prepared according to the example of the present invention 3 50/10 in a weight ratio of 50: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 16: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: CBP and Ir (ppy) 3 A mixed composition of 90: 35nm, material: compound 3)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 17: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: CBP and Ir (ppy) 3 A mixed composition of 90: 35nm, material: examples of the inventionCompound 20)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 18: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: CBP and Ir (ppy) 3 A mixed composition of 90: 35nm, material: compound 39)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 19: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: CBP and Ir (ppy) 3 A mixed composition of 90: 35nm, material: compound 83 prepared in the present example)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 20: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: CBP and Ir (ppy) 3 A mixed composition of 90: 35nm, material: compound 128)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 21: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: CBP and Ir (ppy) 3 A mixed composition of 90: 35nm, material: compound 155)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 22: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: NPB)/light-emitting layer: CBP and Ir (ppy) 3 A mixed composition of 90: 35nm, material: compound 218)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device example 23: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: CBP and Ir (ppy) 3 A mixed composition of 90: 35nm, material: compound 242)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm).
Device comparative example 1: ITO anode layer 2 (thickness: 150 nm)/hole injection layer 3 (thickness: 10nm, material: HAT-CN)/hole transport layer 4 (thickness: 80nm, material: NPB)/light-emitting layer 5 (thickness: 40nm, material: CBP and Ir (ppy) 3 A mixed composition of 90: 35nm, material: TPBI)/electron injection layer 7 (thickness: 1nm, material: liF)/Al (thickness: 100 nm). The inspection data of the obtained electroluminescent device are shown in Table 3.
TABLE 3
From the results in table 3, it can be seen that the organic compound of the present invention can be applied to the fabrication of OLED light emitting devices, and compared with the comparative examples, the efficiency and lifetime of the organic compound are greatly improved compared with those of the known OLED materials, especially the lifetime of the organic compound is greatly prolonged.
Further, the efficiency of the OLED device prepared by the material of the invention is stable when the OLED device works at low temperature, and the results of the efficiency tests of the device examples 4, 12 and 21 and the device comparative example 1 at the temperature range of-10-80 ℃ are shown in the table 4 and the figure 2.
TABLE 4
As can be seen from the data in table 4 and fig. 2, device examples 4, 12, and 21 are device structures in which the material of the present invention is combined with a known material, and compared with device comparative example 1, the efficiency is not only high at low temperature, but also steadily increases during the temperature increase.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.