CN109585699B - OLED display panel, manufacturing method thereof and display device - Google Patents
OLED display panel, manufacturing method thereof and display device Download PDFInfo
- Publication number
- CN109585699B CN109585699B CN201811482237.2A CN201811482237A CN109585699B CN 109585699 B CN109585699 B CN 109585699B CN 201811482237 A CN201811482237 A CN 201811482237A CN 109585699 B CN109585699 B CN 109585699B
- Authority
- CN
- China
- Prior art keywords
- layer
- substrate
- organic light
- transparent insulating
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/814—Anodes combined with auxiliary electrodes, e.g. ITO layer combined with metal lines
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
- H10K50/824—Cathodes combined with auxiliary electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The invention discloses an OLED display panel, a manufacturing method thereof and a display device, and belongs to the technical field of display. The method comprises the following steps: an organic light emitting layer, a first electrode layer, a transparent insulating layer, and an auxiliary electrode are sequentially formed on a first substrate. Because the organic light-emitting layer is formed with the auxiliary electrode firstly, the organic light-emitting layer can not be attached to the auxiliary electrode in the process of forming the organic light-emitting layer by the evaporation process, so that the electric connection between the auxiliary electrode and the first electrode layer is better, and the display effect of the OLED display panel is effectively improved.
Description
Technical Field
The invention relates to the technical field of display, in particular to an OLED display panel, a manufacturing method thereof and a display device.
Background
The current Organic Light-Emitting Diode (OLED) display panel generally includes an anode layer, an Organic Light-Emitting layer and a cathode layer, and can be divided into a bottom-Emitting OLED display panel and a top-Emitting OLED display panel according to different Light-Emitting surfaces.
The top emission type OLED display panel requires a thin and transparent cathode layer and an anode layer capable of reflecting light to increase light transmittance, and the thin and transparent cathode layer generally has a problem of high resistance value and serious voltage drop (IR drop). Generally, the voltage drop in the cathode layer becomes more significant at a position farther from the power supply point, resulting in a significant phenomenon of uneven light emission of the OLED display panel.
In order to overcome the problem of serious voltage drop in the cathode layer in the OLED display panel, it is necessary to form an auxiliary electrode before forming the organic light emitting layer and the cathode layer in the OLED display panel, the auxiliary electrode being electrically connected to the subsequently formed cathode layer, and a power supply may supply an electric signal to the auxiliary electrode, through which the voltage at each position in the cathode layer may be made the same.
Before forming a cathode layer in an OLED display panel, an organic light emitting layer needs to be formed through an evaporation process. In the process of forming the organic light emitting layer by the evaporation process, the organic light emitting layer is easily attached to the auxiliary electrode, so that the electric connection between the auxiliary electrode and the subsequently formed cathode layer is affected, and the display effect of the OLED display panel is poor.
Disclosure of Invention
The embodiment of the invention provides an OLED display panel, a manufacturing method thereof and a display device. The problem of the prior art that the OLED display panel has a poor display effect can be solved, and the technical scheme is as follows:
in a first aspect, a method for manufacturing an OLED display panel is provided, the method including:
forming an organic light emitting layer on a first substrate, the organic light emitting layer including a plurality of organic light emitting blocks;
forming a first electrode layer on the organic light emitting layer, the first electrode layer being one of a cathode layer and an anode layer;
forming a transparent insulating layer and an auxiliary electrode on the first electrode layer in sequence, the transparent insulating layer including: a plurality of transparent and insulated limiting units which are in one-to-one correspondence with the plurality of organic light-emitting blocks, wherein the orthographic projection of the transparent insulating layer on the first substrate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate;
wherein the first electrode layer is electrically connected with the auxiliary electrode, and the orthographic projection of each limiting unit on the first substrate covers the orthographic projection of the corresponding organic light-emitting block on the first substrate.
Optionally, the sequentially forming a transparent insulating layer and an auxiliary electrode on the first electrode layer includes:
forming the transparent insulating layer on the second substrate by adopting a one-step composition process;
transferring the transparent insulating layer formed on the second substrate onto the first substrate on which the first electrode layer is formed;
and forming the auxiliary electrode on the first substrate on which the transparent insulating layer is formed by adopting an ink-jet printing process.
Optionally, the material of the transparent insulating layer includes: a hydrophobic material.
Optionally, after the transparent insulating layer is formed on the second substrate by using a one-step patterning process, the method further includes:
and carrying out surface roughness modification treatment on the transparent insulating layer.
Optionally, the forming the auxiliary electrode on the first substrate on which the transparent insulating layer is formed by using an inkjet printing process includes:
forming ink containing a conductive material on the first substrate on which the transparent insulating layer is formed by using an inkjet printing process;
and carrying out curing treatment on the ink containing the conductive material to form the auxiliary electrode.
Optionally, the conductive material includes: silver particles.
In a second aspect, there is provided an OLED display panel including:
a first substrate;
the organic light emitting layer comprises a plurality of organic light emitting blocks, the first electrode layer is arranged on one side, far away from the first substrate, of the organic light emitting layer, and the first electrode layer is one of a cathode layer and an anode layer;
and a transparent insulating layer and an auxiliary electrode provided on the first electrode layer, the transparent insulating layer including: a plurality of transparent and insulated limiting units which are in one-to-one correspondence with the plurality of organic light-emitting blocks, wherein the orthographic projection of the transparent insulating layer on the first substrate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate;
wherein the first electrode layer is electrically connected with the auxiliary electrode, and the orthographic projection of each limiting unit on the first substrate covers the orthographic projection of the corresponding organic light-emitting block on the first substrate.
Optionally, the material of the transparent insulating layer includes: a hydrophobic material.
Optionally, a plurality of thin film transistors are disposed in the first substrate.
In a third aspect, a display device is provided, which includes: the OLED display panel of any one of the second aspects.
The technical scheme provided by the embodiment of the invention has the beneficial effects that at least:
because the organic light-emitting layer is formed with the auxiliary electrode firstly, the organic light-emitting layer can not be attached to the auxiliary electrode in the process of forming the organic light-emitting layer by the evaporation process, so that the electric connection between the auxiliary electrode and the first electrode layer is better, and the display effect of the OLED display panel is effectively improved. And a transparent insulating layer is further formed on the first electrode layer, the orthographic projection of the transparent insulating layer on the first substrate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate, the transparent insulating layer comprises a plurality of limiting units, the organic light-emitting layer comprises a plurality of organic light-emitting blocks which are in one-to-one correspondence with the limiting units, the orthographic projection of each limiting unit on the first substrate covers the orthographic projection of the corresponding organic light-emitting block on the first substrate, so that the orthographic projection of the auxiliary electrode on the first substrate is not overlapped with the orthographic projection of the organic light-emitting layer on the first substrate, the auxiliary electrode does not shield light emitted by the organic light-emitting layer, and the display effect of the OLED display panel is further improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a flowchart of a method for manufacturing an OLED display panel according to an embodiment of the present invention;
FIG. 2 is a flow chart of another method for manufacturing an OLED display panel according to an embodiment of the present invention;
fig. 3 is a schematic view illustrating a second electrode layer and a pixel defining layer formed on a first substrate in sequence according to an embodiment of the present invention;
fig. 4 is a schematic view illustrating an organic light emitting layer formed on a first substrate on which a pixel defining layer is formed according to an embodiment of the present invention;
fig. 5 is a schematic view illustrating a first electrode layer formed on a first substrate on which an organic light emitting layer is formed according to an embodiment of the present invention;
FIG. 6 is a schematic view of the preparation of an auxiliary electrode directly on the first electrode layer;
fig. 7 is a schematic diagram of forming a transparent insulating layer on a second substrate according to an embodiment of the invention;
fig. 8 is a schematic view illustrating a transparent insulating layer formed on a first substrate on which a first electrode layer is formed according to an embodiment of the present invention;
FIG. 9 is a top view of the structure shown in FIG. 8;
fig. 10 is a schematic view illustrating an auxiliary electrode formed on a first substrate on which a transparent insulating layer is formed according to an embodiment of the present invention;
fig. 11 is a view illustrating a method of forming an ink containing a conductive material on a first substrate on which a transparent insulating layer is formed according to an embodiment of the present invention;
fig. 12 is a schematic diagram of forming an auxiliary electrode according to an embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
In the related art, the OLED display panel includes: an anode layer, a pixel defining layer, an auxiliary electrode, an organic light emitting layer, and a cathode layer. The auxiliary electrode is electrically connected with the cathode layer, the pixel defining layer and the auxiliary electrode can define a plurality of sub-pixel areas arranged in an array, and the organic light emitting layer comprises: and the hole injection layer, the hole transport layer, the organic light-emitting block, the electron transport layer and the electron injection layer are sequentially overlapped in each sub-pixel region. The hole injection layer arranged in each sub-pixel region is connected with the anode layer, and the electron injection layer arranged in each sub-pixel region is connected with the cathode layer. It should be noted that the hole injection layer, the hole transport layer, the organic light emitting block, the electron transport layer, and the electron injection layer in each sub-pixel region are all organic materials, and their conductivity is poor.
In the preparation of the OLED display panel, an anode layer, a pixel defining layer, and an auxiliary electrode may be sequentially formed on a substrate. And then sequentially forming a hole injection layer, a hole transport layer, an organic light-emitting block, an electron transport layer and an electron injection layer in each sub-pixel region by adopting an evaporation process. And finally forming a cathode layer.
However, in the process of the evaporation process, the evaporated organic material is easily attached to the auxiliary electrode, which causes the electrical connection between the auxiliary electrode and the subsequently formed cathode layer to be affected, and further causes the display effect of the OLED display panel to be poor. In order to ensure that the electrical connection between the auxiliary electrode and the cathode layer is good, the laser is needed to evaporate the organic material on the auxiliary electrode, but the process is very prone to dust, the dust is easily attached to the sub-pixel area in the OLED display panel again, and the display effect of the OLED display panel is poor.
Referring to fig. 1, fig. 1 is a flowchart illustrating a method for manufacturing an OLED display panel according to an embodiment of the invention. The method can comprise the following steps:
The first electrode layer is electrically connected with the auxiliary electrode, and the orthographic projection of each limiting unit on the first substrate covers the orthographic projection of the corresponding organic light-emitting block on the first substrate.
In summary, the method for manufacturing an OLED display panel provided in the embodiments of the present invention includes: an organic light emitting layer, a first electrode layer, a transparent insulating layer, and an auxiliary electrode are sequentially formed on a first substrate. Because the organic light-emitting layer is formed with the auxiliary electrode firstly, the organic light-emitting layer can not be attached to the auxiliary electrode in the process of forming the organic light-emitting layer by the evaporation process, so that the electric connection between the auxiliary electrode and the first electrode layer is better, and the display effect of the OLED display panel is effectively improved. And a transparent insulating layer is further formed on the first electrode layer, the orthographic projection of the transparent insulating layer on the first substrate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate, the transparent insulating layer comprises a plurality of limiting units, the organic light-emitting layer comprises a plurality of organic light-emitting blocks which are in one-to-one correspondence with the limiting units, the orthographic projection of each limiting unit on the first substrate covers the orthographic projection of the corresponding organic light-emitting block on the first substrate, so that the orthographic projection of the auxiliary electrode on the first substrate is not overlapped with the orthographic projection of the organic light-emitting layer on the first substrate, the auxiliary electrode does not shield light emitted by the organic light-emitting layer, and the display effect of the OLED display panel is further improved.
Referring to fig. 2, fig. 2 is a flowchart of another method for manufacturing an OLED display panel according to an embodiment of the invention. The method can comprise the following steps:
In an embodiment of the present invention, the first substrate may be a substrate provided with a plurality of Thin Film Transistors (TFTs). Optionally, the TFT may be a top gate TFT or a bottom gate TFT, which is not limited in this embodiment of the present invention.
Alternatively, the second electrode layer and the first electrode layer formed subsequently are respectively one of a cathode layer and an anode layer, and the following embodiment is schematically illustrated by taking the second electrode layer as the anode layer. The material of the second electrode layer may include a metal material with a high reflectivity, for example, the material of the second electrode layer may be metal silver (Ag), metal titanium (Ti), metal copper (Cu), metal aluminum (Al), or an alloy material.
Alternatively, the material of the pixel defining layer may be an organic material, such as fluorinated polyimide, fluorinated polymethyl methacrylate, or polysiloxane.
For example, as shown in fig. 3, fig. 3 is a schematic diagram of sequentially forming a second electrode layer and a pixel defining layer on a first substrate according to an embodiment of the present invention. A second electrode thin film is formed on the first substrate 10 by any one of various means such as deposition, coating, and sputtering, and then a second electrode layer 20 is formed on the second electrode thin film by a one-time patterning process, which may include: photoresist coating, exposure, development, etching and photoresist stripping. Forming a pixel defining layer thin film on the first substrate 10 on which the second electrode layer 20 is formed by any one of a plurality of methods such as deposition, coating, and sputtering, and then forming a pixel defining layer 30 on the pixel defining layer thin film by a one-step patterning process, which may include: photoresist coating, exposure, development, etching and photoresist stripping.
It should be noted that the pixel defining layer 30 can divide the first substrate 10 into a plurality of sub-pixel regions 10a arranged in an array, the second electrode layer 20 includes an electrode block 21 disposed in each sub-pixel region 10a, each sub-pixel region 10a corresponds to at least one TFT, and the electrode block 21 disposed in each sub-pixel region 10a needs to be electrically connected to a source or a drain of a corresponding TFT.
Optionally, the organic light emitting layer includes: and the organic light-emitting blocks correspond to the sub-pixel regions one by one, and each organic light-emitting layer block needs to be arranged in the corresponding sub-pixel region. The organic light emitting layer further includes: a hole injection layer, a hole transport layer, an electron transport layer, and an electron injection layer disposed within each sub-pixel region. The hole injection layer, the hole transport layer, the organic light-emitting block, the electron transport layer and the electron injection layer are sequentially stacked along the direction far away from the first substrate.
Illustratively, as shown in fig. 4, fig. 4 is a schematic diagram of forming an organic light emitting layer on a first substrate on which a pixel defining layer is formed according to an embodiment of the present invention. A hole injection layer 40a, a hole transport layer 40b, an organic light emitting block 41, an electron transport layer 40c, and an electron injection layer 40d may be sequentially formed in each sub-pixel region 10a to form an organic light emitting layer 40 on the first substrate 10 on which the pixel defining layer 30 is formed.
Wherein, the hole injection layer 40a, the hole transport layer 40b, the organic light emitting block 41 and the electron transport layer 40c may be formed by an inkjet printing process or an evaporation process; the electron injection layer 40d needs to be formed by an evaporation process.
Alternatively, the first electrode layer is one of a cathode layer and an anode layer, and the following embodiment is schematically illustrated by taking the first electrode layer as the cathode layer. The material of the first electrode layer may include a transparent conductive material, for example, Indium Tin Oxide (ITO) or Indium Zinc Oxide (IZO).
Illustratively, as shown in fig. 5, fig. 5 is a schematic diagram of forming a first electrode layer on a first substrate on which an organic light emitting layer is formed according to an embodiment of the present invention. The first electrode layer 50 may be formed on the first substrate 10 on which the organic light emitting layer 40 is formed by any of various means such as deposition, coating, and sputtering.
In the embodiment of the invention, since the organic light-emitting blocks in the organic light-emitting layer may be aged and failed after the exposure treatment and the development treatment, the subsequent film structure cannot be prepared by the patterning process after the preparation of the organic light-emitting layer is completed.
In an optional implementation manner, the auxiliary electrode may be prepared by an inkjet printing process, the auxiliary electrode is composed of a plurality of transversely arranged electrode wires and a plurality of longitudinally arranged electrode wires, and any two adjacent transversely arranged electrode wires and any two adjacent longitudinally arranged electrode wires can enclose a sub-pixel region.
If the auxiliary electrode is directly prepared on the first electrode layer through an inkjet printing process, as shown in fig. 6, fig. 6 is a schematic diagram of directly preparing the auxiliary electrode on the first electrode layer, a minimum width d1 of each electrode line is 220um (micrometer), and a distance d2 between two adjacent sub-pixel regions is only 35 to 40um, so that when the auxiliary electrode is directly prepared on the first electrode layer through the inkjet printing process, the auxiliary electrode may block light emitted from the sub-pixel regions, resulting in poor display effect of the OLED display panel.
Therefore, in the embodiment of the invention, the transparent insulating layer can be formed on the first electrode layer by a transfer printing process, and then the auxiliary electrode is formed by an ink-jet printing process, so that the width of the electrode wire in the auxiliary electrode is ensured to be 10-30 um, the auxiliary electrode can not shield light rays emitted from the sub-pixel region of the sub-pixel, and the display effect of the OLED display panel is improved.
Illustratively, the step 204 may include the following sub-steps:
substep 2041, a transparent insulating layer is formed on the second substrate using a one-step patterning process.
Alternatively, the second substrate may be a Polyethylene Terephthalate (PET) substrate.
In an embodiment of the present invention, the material of the transparent insulating layer includes: the hydrophobic material, for example, may be: polyimide (abbreviated as PI) containing fluorine.
Illustratively, as shown in fig. 7, fig. 7 is a schematic diagram of forming a transparent insulating layer on a second substrate according to an embodiment of the present invention. The transparent insulating film 60a may be formed on the second substrate 00a by any one of various means such as deposition, coating, and sputtering, and then the transparent insulating film 60a is formed by a one-step patterning process using the mask 00b, and the one-step patterning process may include: photoresist coating, exposure, development, etching and photoresist stripping. The transparent insulating layer 60 may include: a plurality of transparent and insulating limiting units 61 corresponding to the plurality of sub-pixel regions one to one.
In fig. 7, the material of the transparent insulating film 60a may include only a hydrophobic material, or may include both a hydrophobic material and a non-hydrophobic material. When the material of the transparent insulating film 60a includes a hydrophobic material and a non-hydrophobic material, in forming the transparent insulating film 60a, it is necessary to form a layer of the hydrophobic material on the second substrate 00a first and then form a layer of the non-hydrophobic material on the hydrophobic material, so that the transparent insulating film 60a can be formed on the second substrate 00 a.
Substep 2042, a surface roughness modifying process is performed on the transparent insulating layer formed on the second substrate.
In the embodiment of the invention, in order to facilitate the subsequent better transfer printing of the transparent insulating layer onto the first substrate on which the first electrode layer is formed, the surface roughness modification treatment may be performed on the transparent insulating layer first, so that the surface roughness of the transparent insulating layer is increased, thereby increasing the surface viscosity of the transparent insulating layer, and facilitating better adhesion with the first electrode layer after the subsequent transfer printing.
For example, the transparent insulating layer may be subjected to a surface roughness modification treatment by plasma bombardment.
Substep 2043 is to transfer the transparent insulating layer after the surface roughness modification treatment onto the first substrate on which the first electrode layer is formed.
Illustratively, as shown in fig. 8 and 9, fig. 8 is a schematic diagram of forming a transparent insulating layer on a first substrate on which a first electrode layer is formed according to an embodiment of the present invention, and fig. 9 is a top view of the structure shown in fig. 8. The transparent insulating layer 60 after the surface roughness modification treatment may be transferred onto the first substrate 10 on which the first electrode layer 50 is formed. After the transfer is completed, it is necessary to ensure that the orthographic projection of each limiting unit 61 on the first substrate 10 covers the corresponding sub-pixel region 10a, so that the orthographic projection of each limiting unit 61 on the first substrate 10 can cover the organic light-emitting block 41 disposed in the corresponding sub-pixel region 10 a.
Alternatively, the area S1 of the orthographic projection of the limiting unit 61 on the first substrate 10 needs to be larger than the area S2 of the orthographic projection of the corresponding sub-pixel region 10a on the first substrate 10. For example, the relationship between S2 and S1 satisfies: s1 ═ (1+ 20%) × S2.
Optionally, the gap d0 between any two adjacent limiting units 61 is 10-30 um.
And a substep 2044 of forming an auxiliary electrode on the first substrate on which the transparent insulating layer is formed by using an inkjet printing process.
Illustratively, as shown in fig. 10, fig. 10 is a schematic diagram of forming an auxiliary electrode on a first substrate on which a transparent insulating layer is formed according to an embodiment of the present invention. The auxiliary electrode 70 may be formed on the first substrate 10 on which the transparent insulating layer 60 is formed using an inkjet printing process. The auxiliary electrode 70 is electrically connected to the first electrode layer 50.
For example, the sub-step 2044 may include the following steps:
and step A, forming ink containing a conductive material on the first substrate on which the transparent insulating layer is formed by adopting an ink-jet printing process.
Alternatively, the first substrate on which the transparent insulating layer is formed may be subjected to inkjet printing using an inkjet print head of model 1pl to form an ink containing a conductive material. The ink has a viscosity of 5 to 10cp (centipoise) and a density of 1.1 to 1.3g/ml (g/ml). The conductive material may include: silver particles, the diameter of which needs to be less than 30nm (nanometers).
Exemplarily, as shown in fig. 11, fig. 11 is a method for forming an ink containing a conductive material on a first substrate on which a transparent insulating layer is formed according to an embodiment of the present invention. The ink 70a containing a conductive material may be formed on the first substrate 10 on which the transparent insulating layer 60 is formed using an inkjet printing process.
Note that, the material of the transparent insulating layer 60 includes: the hydrophobic material, and thus the ink 70a does not stay on the transparent insulating layer 60 during the inkjet printing, but remains entirely in an area except for an area where an orthogonal projection of the transparent insulating layer 60 on the first substrate 10 is located.
And B, curing the ink containing the conductive material to form the auxiliary electrode.
Optionally, the curing temperature of the ink containing the conductive material during curing needs to be less than 120 ℃ (centigrade), so that the phenomenon that the organic light-emitting layer is aged again due to overhigh temperature is effectively avoided.
Illustratively, as shown in fig. 12, fig. 12 is a schematic diagram of forming an auxiliary electrode according to an embodiment of the present invention. The ink containing the conductive material may be subjected to a curing process in an environment at an ambient temperature of less than 120 c to form the auxiliary electrode 70.
It should be noted that, since the gap between any two adjacent limiting units 61 is 10 to 30um, the width of the electrode line in the formed auxiliary electrode 70 is also 10 to 30 um.
In summary, the method for manufacturing an OLED display panel provided in the embodiments of the present invention includes: an organic light emitting layer, a first electrode layer, a transparent insulating layer, and an auxiliary electrode are sequentially formed on a first substrate. Because the organic light-emitting layer is formed with the auxiliary electrode firstly, the organic light-emitting layer can not be attached to the auxiliary electrode in the process of forming the organic light-emitting layer by the evaporation process, so that the electric connection between the auxiliary electrode and the first electrode layer is better, and the display effect of the OLED display panel is effectively improved. And a transparent insulating layer is further formed on the first electrode layer, the orthographic projection of the transparent insulating layer on the first substrate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate, the transparent insulating layer comprises a plurality of limiting units, the organic light-emitting layer comprises a plurality of organic light-emitting blocks which are in one-to-one correspondence with the limiting units, the orthographic projection of each limiting unit on the first substrate covers the orthographic projection of the corresponding organic light-emitting block on the first substrate, so that the orthographic projection of the auxiliary electrode on the first substrate is not overlapped with the orthographic projection of the organic light-emitting layer on the first substrate, the auxiliary electrode does not shield light emitted by the organic light-emitting layer, and the display effect of the OLED display panel is further improved.
An embodiment of the present invention further provides an OLED display panel, as shown in fig. 10, the OLED display panel may include:
a first substrate 10.
A first electrode layer 50 and an organic light emitting layer 40 disposed on the first substrate 10, the organic light emitting layer 40 including a plurality of organic light emitting blocks 41, the first electrode layer 50 being disposed on a side of the organic light emitting layer 40 away from the first substrate 10, the first electrode layer 50 being one of a cathode layer and an anode layer.
And a transparent insulating layer 60 and an auxiliary electrode 70 provided on the first electrode layer 50, the transparent insulating layer 60 including: a plurality of transparent and insulating restriction units 61 corresponding one-to-one to the plurality of organic light emitting blocks 41. The orthographic projection of the transparent insulating layer 60 on the first substrate 10 is not coincident with the orthographic projection of the auxiliary electrode 70 on the first substrate 10.
Wherein the first electrode layer 50 is electrically connected to the auxiliary electrode 70, and the orthographic projection of each restriction unit 61 on the first substrate 10 covers the orthographic projection of the corresponding organic light emitting block 41 on the first substrate 10.
Optionally, the material of the transparent insulating layer 60 includes: a hydrophobic material. For example, the hydrophobic material includes: PI containing fluorine element.
Optionally, the OLED display panel may further include: a second electrode layer 20 and a pixel defining layer 30. The second electrode layer 20 and the first electrode layer 50 are respectively one of a cathode layer and an anode layer, and the first electrode layer 50 is the cathode layer and the second electrode layer 20 is the anode layer in the embodiment of the present invention.
The pixel defining layer 30 is used to divide the first substrate 10 into a plurality of sub-pixel regions 10a, and the plurality of sub-pixel regions 10a correspond to the plurality of organic light emitting blocks 41 one to one.
Alternatively, a plurality of TFTs are provided in the first substrate 10. The second electrode layer 20 includes an electrode block 21 disposed in each sub-pixel region 10a, each sub-pixel region 10a corresponds to at least one TFT, and the electrode block 21 disposed in each sub-pixel region 10a needs to be electrically connected to a source or a drain of a corresponding one of the TFTs.
Alternatively, the organic light emitting layer 40 may include: a hole injection layer 40a, a hole transport layer 40b, an organic light emitting block 41, an electron transport layer 40c, and an electron injection layer 40d are sequentially stacked in each sub-pixel region 10 a. The hole injection layer 40a is electrically connected to the second electrode layer 20, and the electron injection layer 40d is electrically connected to the first electrode layer 50.
In summary, the OLED display panel provided in the embodiments of the present invention includes: the organic light emitting diode comprises a first substrate, and an organic light emitting layer, a first electrode layer, a transparent insulating layer and an auxiliary electrode which are sequentially stacked on the first substrate. Because the organic light-emitting layer is formed with the auxiliary electrode firstly, the organic light-emitting layer can not be attached to the auxiliary electrode in the process of forming the organic light-emitting layer by the evaporation process, so that the electric connection between the auxiliary electrode and the first electrode layer is better, and the display effect of the OLED display panel is effectively improved. And a transparent insulating layer is further formed on the first electrode layer, the orthographic projection of the transparent insulating layer on the first substrate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate, the transparent insulating layer comprises a plurality of limiting units, the organic light-emitting layer comprises a plurality of organic light-emitting blocks which are in one-to-one correspondence with the limiting units, the orthographic projection of each limiting unit on the first substrate covers the orthographic projection of the corresponding organic light-emitting block on the first substrate, so that the orthographic projection of the auxiliary electrode on the first substrate is not overlapped with the orthographic projection of the organic light-emitting layer on the first substrate, the auxiliary electrode does not shield light emitted by the organic light-emitting layer, and the display effect of the OLED display panel is further improved.
It can be clearly understood by those skilled in the art that, for convenience and brevity of description, the above-described principle of the OLED display panel may refer to the corresponding description in the embodiment of the manufacturing method of the display panel, and will not be described herein again.
Embodiments also provide a display device, which may include the OLED display panel shown in fig. 10. The display device may be: any product or component with a display function, such as electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like.
The above description is only exemplary of the present invention and should not be taken as limiting, and any modifications, equivalents, improvements and the like that are within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (9)
1. A method of manufacturing an OLED display panel, the method comprising:
forming an organic light emitting layer on a first substrate, the organic light emitting layer including a plurality of organic light emitting blocks;
forming a first electrode layer on the organic light emitting layer, the first electrode layer being one of a cathode layer and an anode layer;
forming a transparent insulating layer and an auxiliary electrode on the first electrode layer in sequence, the transparent insulating layer including: a plurality of transparent and insulated limiting units which are in one-to-one correspondence with the plurality of organic light-emitting blocks, wherein the orthographic projection of the transparent insulating layer on the first substrate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate;
wherein the first electrode layer is electrically connected with the auxiliary electrode, and the orthographic projection of each limiting unit on the first substrate covers the orthographic projection of the corresponding organic light-emitting block on the first substrate;
wherein, form transparent insulating layer and auxiliary electrode in proper order on the first electrode layer, include:
forming the transparent insulating layer on the second substrate by adopting a one-step composition process;
transferring the transparent insulating layer formed on the second substrate onto the first substrate on which the first electrode layer is formed;
and forming the auxiliary electrode on the first substrate on which the transparent insulating layer is formed by adopting an ink-jet printing process.
2. The method of claim 1,
the material of the transparent insulating layer comprises: a hydrophobic material.
3. The method according to claim 1, wherein after the transparent insulating layer is formed on the second substrate by using a one-time patterning process, the method further comprises:
and carrying out surface roughness modification treatment on the transparent insulating layer.
4. The method according to claim 1, wherein the forming the auxiliary electrode on the first substrate on which the transparent insulating layer is formed by using an inkjet printing process comprises:
forming ink containing a conductive material on the first substrate on which the transparent insulating layer is formed by using an inkjet printing process;
and carrying out curing treatment on the ink containing the conductive material to form the auxiliary electrode.
5. The method of claim 4,
the conductive material includes: silver particles.
6. An OLED display panel manufactured by the method of manufacturing an OLED display panel according to any one of claims 1 to 5, the OLED display panel comprising:
a first substrate;
the organic light emitting layer comprises a plurality of organic light emitting blocks, the first electrode layer is arranged on one side, far away from the first substrate, of the organic light emitting layer, and the first electrode layer is one of a cathode layer and an anode layer;
and a transparent insulating layer and an auxiliary electrode provided on the first electrode layer, the transparent insulating layer including: a plurality of transparent and insulated limiting units which are in one-to-one correspondence with the plurality of organic light-emitting blocks, wherein the orthographic projection of the transparent insulating layer on the first substrate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate;
wherein the first electrode layer is electrically connected with the auxiliary electrode, and the orthographic projection of each limiting unit on the first substrate covers the orthographic projection of the corresponding organic light-emitting block on the first substrate.
7. The OLED display panel of claim 6,
the material of the transparent insulating layer comprises: a hydrophobic material.
8. The OLED display panel of claim 6,
a plurality of thin film transistors are arranged in the first substrate.
9. A display device, comprising: the OLED display panel of any one of claims 6 to 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811482237.2A CN109585699B (en) | 2018-12-05 | 2018-12-05 | OLED display panel, manufacturing method thereof and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811482237.2A CN109585699B (en) | 2018-12-05 | 2018-12-05 | OLED display panel, manufacturing method thereof and display device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109585699A CN109585699A (en) | 2019-04-05 |
| CN109585699B true CN109585699B (en) | 2020-12-29 |
Family
ID=65926450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811482237.2A Active CN109585699B (en) | 2018-12-05 | 2018-12-05 | OLED display panel, manufacturing method thereof and display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109585699B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110518035A (en) * | 2019-08-09 | 2019-11-29 | 深圳市华星光电半导体显示技术有限公司 | Organic LED display panel |
| CN112750863A (en) * | 2019-10-31 | 2021-05-04 | 京东方科技集团股份有限公司 | Display back plate, mask plate assembly and display device |
| CN113078270A (en) * | 2020-01-06 | 2021-07-06 | 京东方科技集团股份有限公司 | Organic electroluminescent structure, manufacturing method thereof and display device |
| CN113078269B (en) | 2020-01-06 | 2022-07-29 | 京东方科技集团股份有限公司 | Organic electroluminescent structure, manufacturing method thereof and display device |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20070054799A (en) * | 2005-11-24 | 2007-05-30 | 삼성전자주식회사 | Display device and method of manufacturing the same |
| JP2013016671A (en) * | 2011-07-05 | 2013-01-24 | Fujifilm Corp | Transparent conductive film, method for producing the same, and organic thin-film solar cell |
| KR101888174B1 (en) * | 2011-12-09 | 2018-08-13 | 주성엔지니어링(주) | Light emitting device |
| JP2016207452A (en) * | 2015-04-22 | 2016-12-08 | ソニー株式会社 | Manufacturing method of display device, display device, and electronic equipment |
| KR102144865B1 (en) * | 2015-08-13 | 2020-08-18 | 한국전자통신연구원 | A organic light emitting device and a method of manufacturing thereof |
| CN105679795B (en) * | 2015-12-31 | 2018-11-09 | 上海天马有机发光显示技术有限公司 | Display panel and display device |
| CN105648502B (en) * | 2016-03-28 | 2018-04-10 | 桂林理工大学 | A kind of Mg alloy surface hydrophobic composite membrane layer and preparation method thereof |
| CN106449722B (en) * | 2016-11-21 | 2020-04-21 | 深圳市Tcl高新技术开发有限公司 | Printed top-emitting electroluminescent display and method for manufacturing the same |
| CN106654047B (en) * | 2016-12-22 | 2019-02-01 | 武汉华星光电技术有限公司 | OLED display panel and preparation method thereof |
| CN108666343B (en) * | 2017-03-31 | 2019-08-30 | 京东方科技集团股份有限公司 | Display base plate and display panel |
| CN107528010A (en) * | 2017-08-21 | 2017-12-29 | 武汉华星光电半导体显示技术有限公司 | A kind of preparation method of OLED |
| CN108321309A (en) * | 2018-01-19 | 2018-07-24 | 云谷（固安）科技有限公司 | Separable substrat structure and preparation method thereof |
| CN108878688B (en) * | 2018-07-04 | 2020-04-03 | 京东方科技集团股份有限公司 | Organic light-emitting diode, preparation method thereof and display device |
-
2018
- 2018-12-05 CN CN201811482237.2A patent/CN109585699B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN109585699A (en) | 2019-04-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10186562B2 (en) | Thin film transistor and manufacturing method thereof, array substrate and organic light emitting display panel | |
| CN106910765B (en) | Electroluminescent display panel, manufacturing method thereof and display device | |
| US10002847B2 (en) | OLED pixel unit, transparent display device, method for fabricating the same, display apparatus | |
| CN109585699B (en) | OLED display panel, manufacturing method thereof and display device | |
| US9088003B2 (en) | Reducing sheet resistance for common electrode in top emission organic light emitting diode display | |
| EP2139041B1 (en) | Luminescence display panel and method for fabricating the same | |
| CN110890406B (en) | Organic light-emitting display back plate, manufacturing method thereof and display device | |
| US10964772B2 (en) | OLED plate, display panel and display device using the same | |
| CN108231847B (en) | Display panel, manufacturing method thereof and display device | |
| CN109950290B (en) | AMOLED display screen, display equipment and mobile terminal | |
| US11296235B2 (en) | Thin film transistor having a wire grid on a channel region and manufacturing method thereof, array substrate and manufacturing method thereof, and display panel | |
| US20220376007A1 (en) | Display substrate, method for forming the same and display device | |
| US20220013612A1 (en) | Display Substrate, Manufacturing Method Thereof, and Display Apparatus | |
| CN109065764B (en) | Display panel manufacturing method and display panel | |
| TWI591829B (en) | Organic light emitting display device and method for manufacturing the same | |
| CN106997893B (en) | Organic light emitting display device and method of manufacturing the same | |
| CN113097259B (en) | Display panel, display panel manufacturing method and display device | |
| CN108878688B (en) | Organic light-emitting diode, preparation method thereof and display device | |
| CN112420784A (en) | Array substrate, preparation method thereof and display panel | |
| US12041828B2 (en) | Display baseplate and manufacturing method thereof, and display device | |
| US20230032598A1 (en) | Display panel, display apparatus, and manufacturing method for display panel | |
| US10403694B2 (en) | OLED substrate comprising corresponding pixel definition layer patterns, manufacturing method thereof, and display device | |
| JP5927602B2 (en) | Manufacturing method of display device | |
| EP3506379B1 (en) | Oled device and manufacturing method therefor, display panel, and display apparatus | |
| CN107302061A (en) | Oled display substrate and preparation method thereof, display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |