CN109538432B - Spiral wave plasma propulsion device without neutralizer - Google Patents
Spiral wave plasma propulsion device without neutralizer Download PDFInfo
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- CN109538432B CN109538432B CN201910068739.9A CN201910068739A CN109538432B CN 109538432 B CN109538432 B CN 109538432B CN 201910068739 A CN201910068739 A CN 201910068739A CN 109538432 B CN109538432 B CN 109538432B
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- plasma
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- spiral wave
- excitation antenna
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- 230000001133 acceleration Effects 0.000 claims abstract description 18
- 230000005284 excitation Effects 0.000 claims abstract description 18
- 239000003990 capacitor Substances 0.000 claims abstract description 14
- 239000000919 ceramic Substances 0.000 claims abstract description 12
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 claims description 9
- 238000002679 ablation Methods 0.000 abstract description 3
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 150000002500 ions Chemical class 0.000 description 19
- 230000005684 electric field Effects 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H1/00—Using plasma to produce a reactive propulsive thrust
- F03H1/0006—Details applicable to different types of plasma thrusters
- F03H1/0018—Arrangements or adaptations of power supply systems
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H1/00—Using plasma to produce a reactive propulsive thrust
- F03H1/0081—Electromagnetic plasma thrusters
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Plasma Technology (AREA)
Abstract
The application discloses a spiral wave plasma propulsion device without a neutralizer, which comprises a working medium supply unit and a spiral wave plasma source, wherein the spiral wave plasma source comprises a discharge chamber, an electromagnetic coil, a ceramic sleeve and a spiral wave excitation antenna, the spiral wave excitation antenna is connected with a radio frequency power source and sleeved outside the front part of the discharge chamber, the spiral wave excitation antenna and the discharge chamber at the position of the spiral wave excitation antenna are positioned inside the ceramic sleeve, and the electromagnetic coil is sleeved outside the ceramic sleeve; the front end of the discharge chamber is provided with a gas inlet communicated with the working medium supply unit, the rear end of the discharge chamber is sequentially provided with an acceleration grid and a deceleration grid, and the acceleration grid is connected with a radio frequency power supply in series through a capacitor. The beneficial effects of the application are as follows: the plasma generation and acceleration do not have electrode ablation, and meanwhile, the advantage of high plasma ionization degree is taken into account, and compared with a traditional magnetic jet type thruster, the magnetic jet type thruster has the advantages of higher specific impulse, larger thrust and better performance.
Description
Technical Field
The invention relates to a helicon wave plasma propulsion device without a neutralizer, and belongs to the technical field of spacecraft propulsion.
Background
The traditional spacecraft attitude adjustment of the satellite platform and other types mainly uses chemical propulsion, so that the chemical propulsion has a plurality of problems in application, and the electric propulsion is mainly developed in the field at present, and has the main advantages of high specific impulse, high thrust precision and the like compared with the chemical propulsion; in the current plasma thruster, most of the plasma thrusters generate thrust in a positive ion acceleration mode, a neutralizer is required to be installed to emit electrons to neutralize the ejected positive ions, otherwise, the spacecraft is self-charged to damage communication and electronic devices, and the neutralizer performance of the plasma thruster with the structure becomes an important factor for limiting the working state and service life of the electric thruster, so that a plasma propulsion device without the neutralizer is required.
Disclosure of Invention
In order to overcome the defects, the invention provides a spiral wave plasma propulsion device without a neutralizer.
In order to achieve the above purpose, the technical scheme of the invention is as follows: the spiral wave plasma propulsion device without the neutralizer comprises a working medium supply unit and a spiral wave plasma source, wherein the spiral wave plasma source comprises a discharge chamber, an electromagnetic coil, a ceramic sleeve and a spiral wave excitation antenna, the spiral wave excitation antenna is connected with a radio frequency power source and sleeved on the outer side of the front part of the discharge chamber, the spiral wave excitation antenna and the discharge chamber at the position of the spiral wave excitation antenna are positioned in the ceramic sleeve, and the electromagnetic coil is sleeved outside the ceramic sleeve; the front end of the discharge chamber is provided with a gas inlet communicated with the working medium supply unit, the rear end of the discharge chamber is sequentially provided with an acceleration grid and a deceleration grid, and grid holes are formed in the acceleration grid and the deceleration grid; the accelerating grid is connected with the radio frequency power supply in series through a capacitor, and the radio frequency power supply and the decelerating grid are grounded.
Preferably, the frequency of the radio frequency power supply is between the electron plasma frequency and the ion plasma frequency.
The working principle of the application is as follows: the working medium supply unit (generally, an argon gas storage tank) conveys gas into the discharge chamber through the gas inlet, plasma containing electrons and ions is formed in the discharge chamber through excitation of the spiral wave excitation antenna, and the plasma is extracted and accelerated to the outside of the discharge chamber to form a plasma beam. The accelerating grid of the application adopts a series capacitor and a radio frequency power supply, and ions and electrons are extracted from plasma by utilizing the self-bias effect in a double-grid extraction system and accelerated to a very high speed. When a radio frequency voltage is applied only between two gates in close contact with the plasma, the equivalent circuit is similar to that of axisymmetric capacitive discharge.
The ions and electrons respond differently to the oscillating electric field for different times, thereby creating a self-biasing effect. Therefore, ions of large mass are accelerated. In the hole in front of the deceleration grid plate there is a positive potential difference and leaves the propulsion device at high speed, thus generating thrust. At the same time, the lighter electrons, in a short pulse train, respond to the nearly simultaneous electric field while being extracted from the plasma. When the oscillating plasma potential approaches zero, no direct current exists in the system, so that the total quantity of the extracted ions and electrons is equal on average, and the ions and the pulse electron beam current which are continuously accelerated can be well compensated.
The beneficial effects of the application are as follows: a plasma propulsion device without a neutralizer is provided, wherein a helicon wave plasma source adopted for generating plasma has the advantages of electrodeless ablation, high plasma density and high ionization rate. And the beam current sprayed by the device is quasi-neutral beam current formed by electrons and ions. The self-electrification of the spacecraft can be avoided, the reliability of the thruster is improved, and the service life of the spacecraft can be prolonged. The plasma generation and acceleration do not have electrode ablation, and the advantages of high plasma ionization degree are simultaneously considered, and compared with the traditional magnetic jet pipe type thruster, the magnetic jet pipe type thruster has the advantages of higher specific impulse, larger thrust and better performance
Experiments prove that the technical scheme of the application has the same efficiency as the traditional direct current acceleration. But under acceleration of the radio frequency voltage, electrons are extracted directionally. The floating potential of the beam is lower than that of the dc accelerating grid using the neutralizer.
Drawings
Fig. 1 is a schematic structural view of the present invention.
Fig. 2 is an equivalent rf circuit of the accelerating grid of the present invention.
Fig. 3 is a schematic diagram of the structure of the acceleration grid and the deceleration grid of the present invention.
Fig. 4 is a waveform diagram of plasma potential of the present invention.
Detailed Description
The following description of the present invention will be made clearly and fully, and it is apparent that the embodiments described are some, but not all, of the embodiments of the present invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The spiral wave plasma propulsion device without the neutralizer as shown in fig. 1-4 comprises a working medium supply unit 4 and a spiral wave plasma source, wherein the spiral wave plasma source comprises a discharge chamber 100, an electromagnetic coil 1, a ceramic sleeve 2 and a spiral wave excitation antenna 3, the spiral wave excitation antenna 3 is connected with a radio frequency power source and sleeved outside the front part of the discharge chamber 100, the spiral wave excitation antenna 3 and the discharge chamber 100 at the position of the spiral wave excitation antenna are positioned inside the ceramic sleeve 2, and the electromagnetic coil 1 is sleeved outside the ceramic sleeve 2; the front end of the discharge chamber 100 is provided with a gas inlet communicated with the working medium supply unit 4, the rear end of the discharge chamber 100 is sequentially provided with an acceleration grid 51 and a deceleration grid 54, and grid holes are formed in the acceleration grid 51 and the deceleration grid 54; the accelerating grid 51 is connected in series with the radio frequency power source 52 through a capacitor 53, and the radio frequency power source 52 and the decelerating grid 54 are grounded 55. For certain cases, the reference potential may be ground. But for other cases, such as in the space domain, the reference potential may be a satellite and detector of interest;
The frequency of the signal provided by the radio frequency power supply RF52 is between the electron plasma frequency and the ion plasma frequency, at several MHz and several hundred MHz.
In fig. 2, a capacitor 53 is connected to a radio frequency power source 52 and ground 55. The letter P denotes plasma.
C int denotes the capacitance between the acceleration gate 51 and the deceleration gate 54.
B 1 represents the sheath formed between the plasma and the accelerating grid 51, which may be represented by a diode parallel to the capacitance, and B 2 represents the sheath formed between the plasma and the decelerating grid 54, which may be represented by a diode parallel to the capacitance.
The diode exists because ions cannot follow a continuous change in the electric field of the signal provided by the applied rf power supply 52 between the gates, while electrons may follow a continuous change in the electric field. This is because the mass of electrons is small compared to the mass of ions and the frequency of the applied rf power supply 52 is between the electron plasma frequency and the ion plasma frequency, so that the capacitor 53 charges when the rf power supply 52 is active.
The charging of capacitor 53 creates a direct current voltage (DC) at the end of the capacitor. Finally, a voltage V RF +DC is obtained, which is connected in series with the capacitor at the end of the device formed by the RF source 52.
The fixed component DC of the voltage V RF + DC causes an electric field to exist between the gates 51 and 54. The average value of signal V RF is 0. The value of DC is thus used to extract and accelerate positive ions between the gates 51 and 54.
At the same time, the capacitance sum is different because of the different layout of the gates 51,54 in the device. Indeed, from the point of view of positive ions and electrons in the plasma, the grid 54, downstream of the grid 51, has an effective surface area, with respect to the direction of the beam 60, that is smaller than the effective surface area of the acceleration grid 51, since the deceleration grid 54,
When the rf voltage V RF is applied through the rf power supply 52, the terminal voltage of the device formed by the rf power supply 52 in series with the capacitor 53 is indicative of the potential difference formed between the plasma and the second sheath, because it is indicative of the potential difference formed between the plasma and the accelerating grid 51.
The accelerating grid 51 is coupled to the plasma by a capacitor 53, and interacts with the plasma, in addition to the rf signal provided by an rf power supply 52. The plasma potential is the potential V RF + DC of the accelerating grid.
For the deceleration grid 54, it also interacts with the plasma, but only for a short time interval. During this interval, electrons and positive ions are extracted, i.e. when V RF + DC is below a threshold potential phicr, the sheath disappears.
Fig. 4 shows an example of the development of a plasma potential over time, connected to an applied rf voltage 52 via a capacitor 53 on the accelerating gate 51.
The dashed line represents a fixed DC component, here 550V, here related to the presence of the capacitor 53. This component defines the energy of positive ions in the plasma extracted and accelerated by the acceleration grid 51, the deceleration grid 54.
The plasma potential varies at a maximum (+1050V; 50V) around a fixed component (550V) because this is the RF signal provided by the RF power supply 52.
After the plasma potential attains a critical potential that can cause the sheath to disappear, electrons and positive ions are extracted and accelerated from the acceleration grid 51 and the deceleration grid 54. Here the threshold potential Φcr=200v. The frequency of the plasma was 13.56MHz.
The technical scheme of the invention is not limited to the specific embodiment, and all technical modifications made according to the technical scheme of the invention fall within the protection scope of the invention.
Claims (1)
1. A helicon wave plasma propulsion device without neutralizer is characterized in that: the device comprises a working medium supply unit and a helicon wave plasma source, wherein the helicon wave plasma source comprises a discharge chamber, an electromagnetic coil, a ceramic sleeve and a helicon wave excitation antenna, the helicon wave excitation antenna is connected with a radio frequency power source and sleeved on the outer side of the front part of the discharge chamber, the helicon wave excitation antenna and the discharge chamber at the position of the helicon wave excitation antenna are positioned in the ceramic sleeve, and the electromagnetic coil is sleeved on the outer part of the ceramic sleeve; the front end of the discharge chamber is provided with a gas inlet communicated with the working medium supply unit, the rear end of the discharge chamber is sequentially provided with an acceleration grid and a deceleration grid, and grid holes are formed in the acceleration grid and the deceleration grid; the accelerating grid is connected with a radio frequency power supply in series through a capacitor, the radio frequency power supply and the decelerating grid are grounded, and the frequency of the radio frequency power supply is between the frequency of electron plasma and the frequency of ion plasma; the fixed component of the plasma potential V RF + DC is DC550V, and the frequency of the plasma is 13.56MHz.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201910068739.9A CN109538432B (en) | 2019-01-24 | 2019-01-24 | Spiral wave plasma propulsion device without neutralizer |
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| CN201910068739.9A CN109538432B (en) | 2019-01-24 | 2019-01-24 | Spiral wave plasma propulsion device without neutralizer |
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| CN109538432A CN109538432A (en) | 2019-03-29 |
| CN109538432B true CN109538432B (en) | 2024-06-14 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110545612B (en) * | 2019-09-04 | 2021-12-28 | 北京航空航天大学 | Multi-stage ionization rotating magnetic field acceleration helicon plasma source |
| CN111322213B (en) * | 2020-02-11 | 2021-03-30 | 哈尔滨工业大学 | Piezoelectric grid with variable spacing |
| CN111526654A (en) * | 2020-05-09 | 2020-08-11 | 航宇动力技术(深圳)有限公司 | Quasi-neutral plasma beam extraction device |
| CN111520301B (en) * | 2020-05-09 | 2022-08-05 | 航宇动力技术(深圳)有限公司 | No neutralizer space electric propulsion device |
| CN111622911A (en) * | 2020-05-20 | 2020-09-04 | 大连理工大学 | Helical wave opening system electrostatic ion thruster |
| CN113301706A (en) * | 2021-05-24 | 2021-08-24 | 东华理工大学 | External simple radio frequency discharge strong current proton source device for cyclotron |
| CN114135457B (en) * | 2021-11-30 | 2023-03-14 | 中国工程物理研究院电子工程研究所 | Ion propeller |
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| JP2524461B2 (en) * | 1992-03-18 | 1996-08-14 | インターナショナル・ビジネス・マシーンズ・コーポレイション | High density plasma processing equipment |
| US5418431A (en) * | 1993-08-27 | 1995-05-23 | Hughes Aircraft Company | RF plasma source and antenna therefor |
| CN100530510C (en) * | 2007-05-15 | 2009-08-19 | 西安交通大学 | An electrodeless RF induction coupled plasma dischargable atomic source |
| US7863582B2 (en) * | 2008-01-25 | 2011-01-04 | Valery Godyak | Ion-beam source |
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| CN203260550U (en) * | 2013-05-24 | 2013-10-30 | 无锡启晖光电科技有限公司 | Dual-frequency ion source |
| RU2014127357A (en) * | 2014-01-09 | 2016-05-10 | Геннадий Александрович ОЛЕЙНОВ | HYDRODYNAMIC DEVICE |
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| CN108915969B (en) * | 2018-07-18 | 2020-09-22 | 北京理工大学 | Multi-mode helical wave ion thruster |
| CN109162882A (en) * | 2018-10-09 | 2019-01-08 | 西安交通大学 | A kind of ion thruster based on radio frequency automatic bias principle |
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