CN109491212A - A kind of device and its application method of laser linear multi mechanical scanning imaging - Google Patents
A kind of device and its application method of laser linear multi mechanical scanning imaging Download PDFInfo
- Publication number
- CN109491212A CN109491212A CN201811303507.9A CN201811303507A CN109491212A CN 109491212 A CN109491212 A CN 109491212A CN 201811303507 A CN201811303507 A CN 201811303507A CN 109491212 A CN109491212 A CN 109491212A
- Authority
- CN
- China
- Prior art keywords
- laser
- crossbeam
- mechanical
- photoresists
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention discloses the devices and its application method of a kind of laser linear multi mechanical scanning imaging, including exposure desk, crossbeam and photoresists plummer are installed, crossbeam is equipped with the laser of array distribution, and cooperation crossbeam is equipped with driving motor and rack gear sliding rail on exposure desk on the exposure desk；On exposure desk, laser and crossbeam can use driving motor and rack gear sliding rail along X to doing mechanical reciprocating scanning and Y-direction does mechanical reciprocating scanning；Final image, which can be portrayed, to be equipped on the photoresists plummer coated with photosensitive colloid；After computer analyzing image, according to specific image, the on and off of laser is controlled, completes the scan exposure to photoresists；Unexposed colloid is rinsed out, final image is obtained.The device and its application method of a kind of laser linear multi mechanical scanning imaging proposed through the invention, save time and cost, and the precision of images is high, and exposure breadth can be widened, and the breadth of design can be expanded to more application places.
Description
Technical field
The present invention relates to the device and its application method of a kind of mechanical scanning imaging, specifically a kind of laser linear multis
The device and its application method of mechanical scanning imaging.
Background technique
The digitized processing of image is generally attributed to the processing of pixel, quality and the close phase of pixel of image restoring technology
Close: the pixel of unit area is more, and image is more clear；Pixel is stronger by the black expressive force to white centre, the grayscale of image
Level is abundanter, shows more plentiful；By rgb pixel point according to suitable ratio, bright and colourful image can be restored.
In field of industrial production, with the laser of special wave band, exposed photosensitive material, the application of image required for being formed
It is seen everywhere.Such as cloth stamp, PCB manufacture, glass printing, ceramic tile stamp etc..
At present when exposed photosensitive glue is imaged, realized by following two technology:
Traditional film exposure mask chip technology.This technology first produces the film exposure mask piece of image with film setter, is needing to make figure
Photosensitive material is coated on the object of picture, exposes the photosensitive plastic coating covered by film exposure mask piece with UV lamp on exposure desk, is rinsed
Fall unexposed part, obtains required image.This exposure image technology needs first to make film exposure mask piece, final to expose
When imaging, it is also necessary to position to just, the operation such as light filling.
The micro- mirror techniques of DMD.On exposure desk, the micro- vibrating mirror array luminous point group exposed photosensitive glue of DMD, scanning imagery is rinsed
Fall unexposed part, obtains required image.This exposure image technology, the micro- galvanometer of DMD is the projection theory used, mechanical
Part is considerably complicated, luminous point group's power limited of formation, so the photosensitive material thinner thickness that can be exposed, and it is inefficient.
Summary of the invention
The device and its application method being imaged the purpose of the present invention is to provide a kind of laser linear multi mechanical scanning,
To solve the problems mentioned in the above background technology.
To achieve the above object, the invention provides the following technical scheme:
A kind of device of laser linear multi mechanical scanning imaging, including exposure desk, being equipped on the exposure desk can edge
X, crossbeam and photoresists plummer that Y-direction moves back and forth, crossbeam are equipped with the laser of array distribution, cooperate on exposure desk horizontal
Beam is equipped with driving motor and rack gear sliding rail.
As a further solution of the present invention: the driving motor is externally provided with power supply line.
As further scheme of the invention: the photoresists plummer is arranged on the exposure desk of crossbeam side.
As further scheme of the invention: the photoresists carrier-table surface is coated with one layer of colloid.
As further scheme of the invention: controller is connected on the laser, controller connects driving motor,
Controller connects on computer.
As a kind of making for the device being imaged it is a further object to provide laser linear multi mechanical scanning
With method, comprising the following steps:
Step 1, on exposure desk, laser and crossbeam can use driving motor and rack gear sliding rail and sweep along X to mechanical reciprocating is done
It retouches and does mechanical reciprocating scanning with Y-direction；
Step 2, laser and crossbeam X are to doing mechanical reciprocating scanning and after Y-direction does mechanical reciprocating scanning, final image can be carved
It is drawn in and is equipped on the photoresists plummer coated with photosensitive colloid；
Step 3, after computer analyzing image, drive control device controls laser and crossbeam along X to being mechanical reciprocating scanning and Y
To mechanical reciprocating scanning is done, according to specific image, the on and off of laser is controlled, the scanning to photoresists is completed and exposes
Light；
Step 4 rinses out unexposed colloid, obtains final image.
Compared with prior art, the beneficial effects of the present invention are:
The device and its application method, computer of a kind of laser linear multi mechanical scanning imaging proposed through the invention are straight
Connect parsing image, no exposure mask directly exposes photosensitive material, saves time and cost, and the precision of images is high, as X is to moving distance
Lengthening, exposure breadth can lengthen, the increase of Y-direction number of lasers, exposure breadth can widen, the breadth of design can be expanded to
More application places, Direct exposure imaging is at low cost, high-efficient.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of the device of laser linear multi mechanical scanning imaging.
Fig. 2 is a kind of structural schematic diagram of the device middle cross beam of laser linear multi mechanical scanning imaging.
Wherein: exposure desk 1, crossbeam 2, photoresists plummer 3, computer 4, controller 5, laser 6.
Specific embodiment
Technical solution of the present invention is described in more detail With reference to embodiment.
In the description of the present invention, it is to be understood that, term " center ", " longitudinal direction ", " transverse direction ", "upper", "lower",
The orientation or positional relationship of the instructions such as "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outside" is
It is based on the orientation or positional relationship shown in the drawings, is merely for convenience of description of the present invention and simplification of the description, rather than instruction or dark
Show that signified device or element must have a particular orientation, be constructed and operated in a specific orientation, therefore should not be understood as pair
Limitation of the invention.In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " peace
Dress ", " connected ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integrally
Connection；It can be mechanical connection, be also possible to be electrically connected；Can be directly connected, can also indirectly connected through an intermediary,
It can be the connection inside two elements.For the ordinary skill in the art, on being understood by concrete condition
State the concrete meaning of term in the present invention.
Embodiment 1
Please refer to Fig. 1 and Fig. 2, in the embodiment of the present invention, a kind of device of laser linear multi mechanical scanning imaging, including expose
Light table 1 is equipped with the crossbeam 2 and photoresists plummer 3 that can be moved back and forth along X, Y-direction on the exposure desk 1, in order to complete
To the scan exposure of photoresists, crossbeam 2 is equipped with the laser 6 of array distribution, in order to which laser 6 and crossbeam 2 can be X to machine
Tool shuttle-scanning moves and Y-direction feed motion, and cooperation crossbeam 2 is equipped with driving motor and rack gear sliding rail, driving electricity on exposure desk 1
Machine is externally provided with power supply line.
Further, the photoresists plummer 3 is arranged on the exposure desk 1 of 2 side of crossbeam, 3 table of photoresists plummer
Face is coated with one layer of colloid.
Embodiment 2
Fig. 1 and Fig. 2 are please referred to, a kind of device of laser linear multi mechanical scanning imaging, the embodiment of the present invention is to implement
On the basis of example 1, further, controller 5 is connected on the laser 6, controller 5 connects driving motor, and controller 5 connects
It connects on computer 4.
A kind of application method of the device of laser linear multi mechanical scanning imaging of the present invention, comprising the following steps:
Step 1, on exposure desk 1, it is mechanical past to doing along X that laser 6 and crossbeam 2 can use driving motor and rack gear sliding rail
Multiple scanning and Y-direction do mechanical reciprocating scanning；
Step 2, laser 6 and crossbeam 2X are to doing mechanical reciprocating scanning and after Y-direction does mechanical reciprocating scanning, final image meeting
It portrays and is being equipped on the photoresists plummer 3 coated with photosensitive colloid；
Step 3, after computer 4 parses image, drive control device 5, controls laser 6 and crossbeam 2 is swept along X to mechanical reciprocating is done
It retouches and does mechanical reciprocating scanning with Y-direction, according to specific image, control the on and off of laser 6, photoresists are swept in completion
Retouch exposure；
Step 4 rinses out unexposed colloid, obtains final image.
Better embodiment of the invention is explained in detail above, but the present invention is not limited to above-mentioned embodiment party
Formula within the knowledge of one of ordinary skill in the art can also be without departing from the purpose of the present invention
Various changes can be made.
Claims (6)
1. a kind of device of laser linear multi mechanical scanning imaging, including exposure desk (1), which is characterized in that the exposure
The crossbeam (2) and photoresists plummer (3) that can be moved back and forth along X, Y-direction are installed, crossbeam (2) is equipped with battle array on platform (1)
The laser (6) of column distribution, cooperation crossbeam (2) is equipped with driving motor and rack gear sliding rail on exposure desk (1).
2. a kind of device of laser linear multi mechanical scanning imaging according to claim 1, which is characterized in that described
Driving motor is externally provided with power supply line.
3. a kind of device of laser linear multi mechanical scanning imaging according to claim 1, which is characterized in that described
Photoresists plummer (3) is arranged on the exposure desk (1) of crossbeam (2) side.
4. a kind of device of laser linear multi mechanical scanning imaging according to claim 1, which is characterized in that described
Photoresists plummer (3) surface is coated with one layer of colloid.
5. a kind of device of laser linear multi mechanical scanning imaging according to claim 1, which is characterized in that described
It is connected on laser (6) controller (5), controller (5) connects driving motor, and controller (5) connects on computer (4).
6. a kind of user of the device of -5 any laser linear multi mechanical scanning imagings according to claim 1
Method, which comprises the following steps:
Step 1, on exposure desk (1), laser (6) and crossbeam (2) can use driving motor and rack gear sliding rail along X to doing
Mechanical reciprocating scanning and Y-direction do mechanical reciprocating scanning；
Step 2, laser (6) and crossbeam (2) X are to doing mechanical reciprocating scanning and after Y-direction does mechanical reciprocating scanning, final figure
It is being equipped on the photoresists plummer (3) coated with photosensitive colloid as that can portray；
Step 3, after computer (4) parses image, drive control device (5) controls laser (6) and crossbeam (2) along X to making machine
Tool shuttle-scanning and Y-direction do mechanical reciprocating scanning, according to specific image, control the on and off of laser (6), completion pair
The scan exposure of photoresists；
Step 4 rinses out unexposed colloid, obtains final image.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811303507.9A CN109491212A (en) | 2018-11-02 | 2018-11-02 | A kind of device and its application method of laser linear multi mechanical scanning imaging |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811303507.9A CN109491212A (en) | 2018-11-02 | 2018-11-02 | A kind of device and its application method of laser linear multi mechanical scanning imaging |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109491212A true CN109491212A (en) | 2019-03-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811303507.9A Pending CN109491212A (en) | 2018-11-02 | 2018-11-02 | A kind of device and its application method of laser linear multi mechanical scanning imaging |
Country Status (1)
| Country | Link |
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| CN (1) | CN109491212A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112051711A (en) * | 2020-08-20 | 2020-12-08 | 江苏迪盛智能科技有限公司 | Exposure equipment |
| CN113687580A (en) * | 2021-08-24 | 2021-11-23 | 深圳市先地图像科技有限公司 | Laser imaging equipment |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080316454A1 (en) * | 2006-02-22 | 2008-12-25 | Kleo Maschinenbau Ag | Exposure system |
| CN204347441U (en) * | 2015-01-13 | 2015-05-20 | 苏州微影光电科技有限公司 | Write-through lithographic equipment |
| CN106502056A (en) * | 2015-09-03 | 2017-03-15 | 旭东机械工业股份有限公司 | laser direct exposure apparatus and method |
| CN108255020A (en) * | 2016-12-29 | 2018-07-06 | 旭东机械工业股份有限公司 | Penetration type laser direct imaging system |
| CN108351510A (en) * | 2015-11-03 | 2018-07-31 | 奥博泰克有限公司 | For the patterned Sutureless direct imaging of high-resolution electronics |
-
2018
- 2018-11-02 CN CN201811303507.9A patent/CN109491212A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080316454A1 (en) * | 2006-02-22 | 2008-12-25 | Kleo Maschinenbau Ag | Exposure system |
| CN204347441U (en) * | 2015-01-13 | 2015-05-20 | 苏州微影光电科技有限公司 | Write-through lithographic equipment |
| CN106502056A (en) * | 2015-09-03 | 2017-03-15 | 旭东机械工业股份有限公司 | laser direct exposure apparatus and method |
| CN108351510A (en) * | 2015-11-03 | 2018-07-31 | 奥博泰克有限公司 | For the patterned Sutureless direct imaging of high-resolution electronics |
| CN108255020A (en) * | 2016-12-29 | 2018-07-06 | 旭东机械工业股份有限公司 | Penetration type laser direct imaging system |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112051711A (en) * | 2020-08-20 | 2020-12-08 | 江苏迪盛智能科技有限公司 | Exposure equipment |
| CN113687580A (en) * | 2021-08-24 | 2021-11-23 | 深圳市先地图像科技有限公司 | Laser imaging equipment |
| CN113687580B (en) * | 2021-08-24 | 2024-04-23 | 深圳市先地图像科技有限公司 | Laser imaging equipment |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190319 |
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| RJ01 | Rejection of invention patent application after publication |