CN109402587A - A kind of vacuum coater - Google Patents
A kind of vacuum coater Download PDFInfo
- Publication number
- CN109402587A CN109402587A CN201811579807.XA CN201811579807A CN109402587A CN 109402587 A CN109402587 A CN 109402587A CN 201811579807 A CN201811579807 A CN 201811579807A CN 109402587 A CN109402587 A CN 109402587A
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- CN
- China
- Prior art keywords
- target
- block
- cavity
- knob
- vacuum coater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000001771 vacuum deposition Methods 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 9
- 239000010959 steel Substances 0.000 claims abstract description 9
- 230000001788 irregular Effects 0.000 claims description 2
- 239000012528 membrane Substances 0.000 abstract description 8
- 238000010276 construction Methods 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000011521 glass Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- 230000001568 sexual effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides a kind of uniform vacuum coater of thicknesses of layers, cavity including vacuum coating, magnet steel, target, target cover and substrate, the cavity constructions go out a cubic space, the target, target cover and substrate are all set in the cubic space, the magnet steel is set on the outer wall of the cavity, the target is set on the inner wall of the cavity, the target, which is provide with, is placed in institute's target top and side, form a gate, the target is covered in the target cover, an opening is equipped in the top of target cover simultaneously, the opening is consistent with projection of the target on cavity, the substrate is set to above the target in the range of 50-100mm.Block is provided on target cover, the block is externally connected to a knob, and the knob is equipped with leader, and the handle is located at vacuum coating containment portion.Under vacuum coating operating condition, stop block structure inside vacuum coater can be adjusted flexibly, and then meet membrane uniformity requirement.
Description
Technical field
The invention belongs to field of vacuum coating more particularly to a kind of vacuum coaters of film thickness uniformity.
Background technique
Vacuum coating is the mainstream technology of FPD transparent conducting glass preparation, interacts work by magnetic field and electric field
With, secondary electron is strapped in target surface specific region to enhance the ionizing efficiency of inertia process gas, increase ion concentration and
Energy, generated ion bombard the sputtering that target surface realizes target under electric field action, to realize the height of target on substrate
Rate film forming is widely used in preparing the spatter film forming preparation of the multiple materials such as metal, semiconductor, insulator.
With the development of FPD industry and the raising of human living standard, people are to display technology and show product
It is required that being also continuously improved, flat-panel display device and related spare part also constantly develop to directions such as light, thin, energy saving, high-precisions, right
Flat panel display devices and related spare part production equipment, the precision of product and performance requirement are also higher and higher, therefore to application
In the precision and performance requirement of the transparent conducting glass of flat-panel display device be also higher and higher, the precision controlling of film thickness uniformity
It is exactly a wherein important index.
It is bad for the film thickness uniformity of transparent conducting glass, it is mainly reflected in following aspect: the (1) film thickness of monolithic product
Confonnality deviations, i.e., the uniform film thickness sexual deviation on monolithic glass surface；(2) with the uniform film thickness sexual deviation of a collection of product；⑶
Same specification product, the uniform film thickness sexual deviation of different batches of product.Uniform film thickness sexual deviation not only results in FPD mould
The difference of etching and processing time in group production process, or even etched film can be caused not clean or over etching, to generate lead
The short circuit or open defect of electrode, cause defective products.For low-resistance transparent conducting glass product, due to the film of film
Thickness has arrived certain degree, and the uniform sex differernce of film thickness shows different reflection light colors, i.e. visual color, this will cause flat
The display difference of plate display module background color, this is not allow to occur.
In the production process of transparent conducting glass, due to the difference of target service life, the pattern of target material surface can be produced
Raw biggish variation；Due to the specification of production product it is different caused by, target splashing in the longitudinal direction different using the power of power supply
Firing rate rate difference, above-mentioned reason can cause the variation of film thickness uniformity.Variation for film thickness uniformity, such as Fig. 1 institute
Show, is typically realized by the way that the fixed adjustment of uniformity block 6 is arranged at the opening 11 of target cover 1, but this adjustment can only
It carries out, i.e., can only be carried out under shutdown status under atmospheric condition.Once just cannot achieve tune into vacuum coating production status
It is whole, and the fixed shape of block 6, after having adjusted block 6 sometimes, then carries out vacuum coating and there is also membrane uniformity problem,
Just it needs to continue shutdown adjustment block 6.For the low resistance product of transparent conducting glass, often there is uniform film thickness sexual deviation
Greatly, cause visual color deviation big, will lead to normally to produce, and can only shut down and be adjusted, and seriously increase labour cost, shadow
Ring production efficiency.
For the above problem present in above-mentioned production, it is particularly applied to low resistance, high-quality ITO or metal targets
Plated film film formation process in, membrane uniformity require it is very high.It is necessary to a kind of vacuum coater be designed, in non-stop-machine feelings
It under condition, realizes and vacuum coating uniformity is adjusted under atmospheric condition, guarantee that the film thickness of transparent conducting glass coated product is equal
Even property reduces labour cost, improves production efficiency.
Summary of the invention
Under the conditions of solving vacuum coating, even film layer sexual deviation can not be adjusted under the conditions of vacuum work
Problem, the present invention are provided under a kind of vacuum coating operating condition, and stop block structure inside vacuum coater can be adjusted flexibly, into
And meet the vacuum coater of membrane uniformity requirement.
The present invention proposes a kind of vacuum coater, cavity, magnet steel, target, target cover and substrate including vacuum coating, institute
It states cavity constructions and goes out a cubic space, the target, target cover and substrate are all set in the cubic space, the magnet steel
It is set on the outer wall of the cavity, the target is set on the inner wall of the cavity, and the target, which is provide with, to be placed on institute's target
Side and side form a gate, the target are covered in the target cover, while being equipped with an opening, institute in the top of target cover
It is consistent with projection of the target on cavity to state opening, the substrate is set to above the target in the range of 50-100mm.
The target cover may make the vacuum coater in plated film work, and magnetic field only passes through the target atom on target
The opening spatter film forming of target cover is formed on substrate, avoids that film will be prevented except the bombardment spatter film forming of the other materials in addition to target
Layer impurity, guarantees the degree of purity of film layer.
In order to solve film thickness uniformity offset issue obtained by vacuum coating, vacuum coater of the invention is in target cover
On be also equipped with block, the block of the block and conventional vacuum coating apparatus the difference is that, block of the present invention
It is externally connected to a knob, the knob is equipped with leader, and the handle is located at the containment portion.In non-stop-machine situation
Under, the handle of the containment portion by rotating the knob drives block to move back and forth on the horizontal plane for be parallel to target surface, into
And open or shield portions opening is, it can be achieved that the vacuum coating uniformity to inside cavity is adjusted, guarantee electrically conducting transparent
The film thickness uniformity of coating film on glass product meets production and processing and requires.
Vacuum coater provided by the invention is provided with block on target cover, and the block is externally connected to a knob,
The knob is equipped with leader, and the handle is located at vacuum coating containment portion.Under vacuum coating operating condition, Ke Yiling
Stop block structure inside adjustment vacuum coater living, and then meet membrane uniformity requirement, production cost is saved, production effect is improved
Rate.
Detailed description of the invention
Fig. 1 is the planar structure schematic diagram of existing target cover；
Fig. 2 is the schematic cross-section of vacuum coater of the invention；
Fig. 3 is the first planar structure schematic diagram of target cover of the invention；
Fig. 4 is the first structure diagram of knob of the invention；
Fig. 5 is the structural schematic diagram of block of the invention；
Fig. 6 is the second structural schematic diagram of knob of the invention；
Fig. 7 is the second planar structure schematic diagram of target cover of the invention.
Appended drawing reference
1- target cover, 2- target, 3- magnet steel, 4- cavity, 5- substrate, 6- block, 7- knob；
11- opening, 61- through-hole, 62- rack gear, 63- groove, 71- handle, 72- cylinder, 73- plectrum,
74- gear.
Specific embodiment
For a better understanding of the present invention, below in conjunction with attached drawing with examples illustrate the present invention, specific embodiment party
Formula is as follows.
As shown in Figure 2,3, the present invention proposes a kind of vacuum coater, cavity 4, magnet steel 3, target including vacuum coating
2, target cover 1 and substrate 5, the cavity 4 construct a cubic space, and the target 2, target cover 1 and substrate 5 are all set in described
In cubic space, the magnet steel 3 is set on the outer wall of the cavity 4, and the target 2 is set to the inner wall of the cavity 4
On, the target cover 1 is set to 2 top of institute's target and side, and a gate is formed, the target 2 is covered in the target cover 1,
An opening 11,11, the substrates consistent with projection of the target 2 on cavity 4 of the opening are equipped in the top of target cover 1 simultaneously
5 are set in the range of the 2 top 50-100mm of target.
As shown in figure 4, vacuum coater of the present invention is provided with block 6 on target cover 1, connect outside the block 6
It is connected to a knob 7, the knob 7 is equipped with leader 71, and the handle 71 is located at the outside of the cavity 4, on the knob 7
It is additionally provided with one and allots mechanism, the mechanism of alloting is in contact with block 6.In non-stop-machine situation, by rotating the knob 7
Cavity 4 outside handle 71, allot mechanism kinematic described in drive, it is described allot mechanism and allot block 6 be parallel to target surface
Arrow direction moves back and forth as illustrated on horizontal plane, and then opening or shield portions opening 11, realizes inside to cavity 4
Vacuum coating membrane uniformity is adjusted, and guarantees the film thickness uniformity of transparent conducting glass coated product, meets production and processing
It is required that.The mechanism of alloting can be a plectrum 73.
In preferred technical solution, as shown in Figure 5,6, the mechanism of alloting is a gear 74, specifically, the knob 7
Including handle 71, cylinder 72 and gear 74, the handle 71 are connect with gear 74 by cylinder 72, and the block 6 is equipped with one
Through-hole 61 and rack gear 62.The cylinder 72 of the knob 7 runs through the through-hole 61, and the gear 74 of the knob 7 is placed in the gear
It is engaged in block 6 with the rack gear 62 on block 6, the handle 71 stays in outside the cavity 4.Described in outside rotation cavity 4
Handle 71, so that the gear 74 moves in a circle, since gear 74 and rack gear 62 are in meshing state, gear 74 will drive tooth
Item 62 does transverse movement, drives the block 6 on the horizontal plane for be parallel to target surface by the transverse movement of rack gear 62 to move back
It is dynamic.The gear 74 common plectrum 73 compared with operation is alloted in the engagement of rack gear 62 is more compact effectively, is also more convenient for adjust back
Whole block 6.
In preferred technical solution, it is additionally provided with 2 transverse concave grooves 63 up and down on the block 6, is set on the target cover 1
2 positioning pins (being not shown on figure) corresponding with the groove 63 are equipped with, by the snapping relationship of groove 63 and positioning pin, are made
It obtains the block 6 and is only capable of the transverse movement limited in groove 63, improve the controllability of 6 motion profile of block.
In preferred technical solution, the block 6 has 2 pieces, i.e., is respectively arranged with 1 piece of block 6 in the two sides of target cover 1,
The block 6 is connected with knob 7 as described above, can optionally carry out rotation knob 7 simultaneously and 2 pieces of blocks 6 is driven to move, can also
Only to adjust one piece therein.The adjustable membrane uniformity region of block 6 under this scheme is bigger.
In preferred technical solution, the two sides of the target cover 1 are respectively equipped with 3-5 block block 6, and the block 6 is connected with
Knob 7 as described above can optionally carry out rotation knob 7 simultaneously and muti-piece block 6 is driven to move, can also only adjustment is wherein
One piece.The adjustable membrane uniformity region of block 6 under this scheme is bigger and more flexible.
Since in coating process, when the substrate 5 forms a film, since effect is collected in both ends magnetic field, sputtering yield is high, often
Two end regions on substrate 5 are formed by film layer thickness of the film layer compared with the central region of the corresponding substrate in middle part of target 2, such as
Shown in Fig. 7, in preferred technical solution, it is not provided with block 6 in the medium position close to target 2, the block 6 moves back and forth
The opening 11 close to 2 medium position of target cannot be blocked.
In other technical solutions, the block 6 is not limited to rectangular parallelepiped structure, can also for sphere, cylindrical body or
Other irregular cubes.
It is preferred embodiment the above are the mobile vacuum coating apparatus that the present invention mentions, can not be interpreted as weighing the present invention
The limitation of sharp protection scope, those skilled in the art will be appreciated that, without departing from the inventive concept of the premise, can also do a variety of
It improves or replaces, all improvement or replacement all should be in the scope of the present invention, i.e., rights protection model of the invention
Enclosing should be subject to the claims.In the absence of conflict, the feature in embodiment and embodiment herein-above set forth can be mutual
In conjunction with.
Claims (9)
1. a kind of vacuum coater, comprising: cavity (4), magnet steel (3), target (2), target cover (1) and base including vacuum coating
Piece (5), the cavity (4) construct a cubic space, and the target (2), target cover (1) are all set in described with substrate (5)
In cubic space, the magnet steel (3) is set on the outer wall of the cavity (4), and the target (2) is set to the cavity
(4) on inner wall, the target cover (1) is set to above institute's target (2) and side, forms a gate, and the target (2) are covered
It is equipped with an opening (11) in the target cover (1), while in the top of target cover (1), the opening (11) and target (2) are in cavity
(4) projection on is consistent, and the substrate (5) is set to above the target (2) in the range of 50-100mm；
It is characterized in that, the vacuum coater is provided with block (6) on target cover (1), the block (6) is externally connected to
One knob (7), the knob (7) are equipped with leader (71), and the handle (71) is located at the outside of the cavity (4), described
One, which is additionally provided with, on knob (7) allots mechanism, the external handle (71) of the cavity (4) by rotating the knob (7), described in drive
Allot mechanism kinematic, it is described allot mechanism and allot block (6) move back and forth on the horizontal plane for be parallel to target surface, and then open or
Person's shield portions are open (11).
2. vacuum coater according to claim 1, which is characterized in that the block (6) has 2 pieces, in target cover (1)
Two sides are respectively arranged with 1 piece of block (6), and the block (6) is connected with the knob (7).
3. vacuum coater according to claim 1, which is characterized in that the two sides of the target cover (1) are respectively equipped with 3-5
Block block (6), the block (6) are connected with knob as described above (7).
4. according to vacuum coater described in claim 2-3, which is characterized in that the position in the middle part of close target (2) is not
It is arranged block (6), the block (6) moves back and forth the opening (11) that cannot be blocked close to target (2) medium position.
5. vacuum coater according to claim 1, the block (6) be rectangular parallelepiped structure or sphere or cylindrical body or
Other irregular cube of body mechanism of person.
6. vacuum coater according to claim 1, which is characterized in that the mechanism of alloting is a plectrum (73).
7. vacuum coater according to claim 1, which is characterized in that the block (6) is equipped with a through-hole (61)
With rack gear (62).
8. vacuum coater according to claim 7, which is characterized in that the mechanism of alloting is a gear (74), institute
Stating knob (7) includes handle (71), and cylinder (72) and gear (74), the handle (71) and gear (74) are connected by cylinder (72)
It connects, the block (6) is equipped with a through-hole (61) and rack gear (62), and the cylinder (72) of the knob (7) runs through the through-hole
(61), the gear (74) of the knob (7) is placed in the block (6) and is engaged with the rack gear (62) on block (6), described
Hand (71) is located at the cavity (4) outside.
9. vacuum coater according to claim 8, which is characterized in that be additionally provided with 2 up and down on the block (6)
Transverse concave groove (63) is provided with 2 positioning pins corresponding with the groove (63) on the target cover (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811579807.XA CN109402587A (en) | 2018-12-24 | 2018-12-24 | A kind of vacuum coater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811579807.XA CN109402587A (en) | 2018-12-24 | 2018-12-24 | A kind of vacuum coater |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109402587A true CN109402587A (en) | 2019-03-01 |
Family
ID=65460656
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811579807.XA Pending CN109402587A (en) | 2018-12-24 | 2018-12-24 | A kind of vacuum coater |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109402587A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6217714B1 (en) * | 1995-06-29 | 2001-04-17 | Matsushita Electric Industrial Co., Ltd. | Sputtering apparatus |
| CN106011765A (en) * | 2016-07-12 | 2016-10-12 | 广东振华科技股份有限公司 | Magnetron sputtering vacuum coating equipment |
| CN107313020A (en) * | 2017-08-18 | 2017-11-03 | 深圳市华星光电半导体显示技术有限公司 | A kind of magnetic control sputtering film plating device |
| CN210012892U (en) * | 2018-12-24 | 2020-02-04 | 浙江莱宝科技有限公司 | Vacuum coating device |
-
2018
- 2018-12-24 CN CN201811579807.XA patent/CN109402587A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6217714B1 (en) * | 1995-06-29 | 2001-04-17 | Matsushita Electric Industrial Co., Ltd. | Sputtering apparatus |
| CN106011765A (en) * | 2016-07-12 | 2016-10-12 | 广东振华科技股份有限公司 | Magnetron sputtering vacuum coating equipment |
| CN107313020A (en) * | 2017-08-18 | 2017-11-03 | 深圳市华星光电半导体显示技术有限公司 | A kind of magnetic control sputtering film plating device |
| CN210012892U (en) * | 2018-12-24 | 2020-02-04 | 浙江莱宝科技有限公司 | Vacuum coating device |
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