CN109280343B - Reflective film for scintillation crystal and preparation process thereof - Google Patents
Reflective film for scintillation crystal and preparation process thereof Download PDFInfo
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- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
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- C08K2003/2241—Titanium dioxide
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Abstract
The invention discloses a reflective film for a scintillation crystal and a preparation process thereof, relates to the technical field of reflective material processing and preparation, and solves the problem that the reflective film is easy to deform or crack in the later processing and production process due to poor toughness. The reflective film for the scintillation crystal is characterized by comprising the following components in parts by weight: 35-42 parts of titanium dioxide powder; 10-12 parts of magnesium oxide powder; 4-6 parts of aluminum oxide powder; 20-39 parts of optical epoxy resin A glue; 4-5.5 parts of optical epoxy resin B adhesive; 4-10 parts of a mixing accelerator; 0.8-1.5 parts of antistatic agent; 1.2-4 parts of a whitening agent. The reflective film for the scintillator has good toughness, is not easy to deform or crack when being processed to be thinner, and has good processing performance.
Description
Technical Field
The invention relates to the technical field of reflective material processing and preparation, in particular to a reflective film for a scintillation crystal and a preparation process thereof.
Background
The scintillation crystal is a crystal which can convert the kinetic energy of high-energy particles into light energy to emit flash under the impact of high-energy particles such as X-rays and radioactive rays, and the reflecting film is used for increasing the specular reflectivity and is commonly used for manufacturing reflecting, refracting and resonant cavity devices.
Chinese patent publication No. CN1632614A discloses a scintillation detector filled with functional light-reflecting material and a method for manufacturing the same, wherein a gap between a crystal and a crystal chamber is filled with a high-reflectivity functional diffuse-reflecting material, and the composition of the material includes: ultrafine powders of magnesium oxide and titanium oxide, a forming agent and a light coupling agent; the mass ratio of the magnesium oxide to the titanium oxide is 1: 0.8-1.2; the mass ratio of the magnesium oxide and the titanium oxide ultrafine powder to the forming agent and the optical coupling agent is as follows: 1:10. In the process of manufacturing the diffuse reflection material, firstly, MgO and TiO are mixed2Drying the superfine powder, proportioning according to 1: 0.8-1.2, sieving for later use, and mixing the mixed MgO and TiO2Pouring into forming agent and optical coupling agent, stirring to remove bubbles, and allowing to standAnd the required diffuse reflection material is prepared.
In the above patent, the diffuse reflection material prepared from titanium oxide, magnesium oxide, a forming agent and a light coupling agent has a general reflection effect, and the toughness of the diffuse reflection material after curing and forming is poor, which easily causes deformation and fracture in the subsequent processing process, so a new scheme needs to be proposed to solve the above problems.
Disclosure of Invention
Aiming at the problem that the reflecting film is easy to deform or crack in the later processing and production process due to poor toughness of the reflecting film in the prior art, the invention aims to provide the reflecting film for the scintillation crystal and the preparation process thereof.
In order to achieve the first purpose, the invention provides the following technical scheme that the reflecting film for the scintillator comprises the following components in parts by weight:
35-42 parts of titanium dioxide powder;
10-12 parts of magnesium oxide powder;
4-6 parts of aluminum oxide powder;
20-39 parts of optical epoxy resin A glue;
4-5.5 parts of optical epoxy resin B adhesive;
4-10 parts of a mixing accelerator;
0.8-1.5 parts of antistatic agent;
1.2-4 parts of a whitening agent.
By adopting the technical scheme, the titanium dioxide powder and the magnesium oxide powder are good reflection powder, the optical epoxy resin A adhesive is a good filling material, and the optical epoxy resin B adhesive has a good curing effect and can improve the physical properties of the cured mixed material. The optical epoxy resin A glue and the optical epoxy resin B glue have good combination effect, can ensure that titanium dioxide powder and magnesium oxide powder are uniformly distributed in the formed mixed material, can be cured at low temperature or normal temperature, has high curing speed and has good high-temperature resistance.
The aluminum oxide powder is good reflection powder, the reflection effect of the reflection film for the scintillation crystal can be improved, the surface hardness of the reflection film for the scintillation crystal, which is prepared by adding the aluminum oxide powder, is greatly improved, the reflection film is not easy to deform or crack in the processing process, and the reflection film has good structural strength.
The antistatic agent and the brightening agent can improve the overall stability and antistatic property of the reflective film for the scintillation crystal, the mixing accelerant is favorable for reducing the viscosity during mixing glue, promotes the mixing glue to be carried out, can be volatilized finally, does not enter the reflective film, and has good appearance, so that the overall toughness of the reflective film for the scintillation crystal is ensured to have good processing performance.
More preferably, the reflective film for a scintillator further contains 0.8 to 2 parts by weight of diethylenetriamine.
By adopting the technical scheme, the diethylenetriamine is an excellent solvent and plays a good role in promoting the curing of the mixed material, thereby being beneficial to the titanium dioxide powder in the mixed material. The aluminum oxide powder and the magnesium oxide powder are uniformly fixed in the epoxy resin A glue and the optical epoxy resin B glue, so that the curing effect of the mixed materials is improved, and the reflective film for the scintillation crystal obtained after the mixed materials are cured has good structural strength and good processing performance.
More preferably, 4-6 parts by weight of styrene is also added into the reflecting film for the scintillation crystal.
By adopting the technical scheme, the styrene has a good diluting effect on mixed materials, and particularly when the external environment temperature is low, the viscosity of the mixed materials obtained in the mixing process is prevented from being high, so that the titanium dioxide powder and the magnesium oxide powder are uniformly distributed in the mixed materials, and the prepared reflective film for the scintillation crystal has good reflective performance.
More preferably, 0.5-1.2 parts by weight of polydimethylsiloxane is also added into the reflecting film for the scintillation crystal.
Through adopting above-mentioned technical scheme, polydimethylsiloxane is favorable to reducing the bubble in the compounding, makes titanium dioxide powder and magnesium oxide powder evenly distributed in the compounding, and avoids having the bubble in leading to scintillation crystal to use reflective membrane because of having more bubble in the compounding, makes scintillation crystal uses reflective membrane to have good reflectance properties, and inside is more closely knit, and its whole has good structural strength.
More preferably, the mixing accelerator is acetone, alcohol or ethanol.
By adopting the technical scheme, the ketone, the alcohol or the ethanol are beneficial to reducing the viscosity during glue mixing and promoting the glue mixing, but the acetone, the alcohol or the ethanol is volatile and can be finally volatilized without entering the reflecting film, so that the components in the reflecting film for the obtained scintillation crystal are uniformly distributed, and the integral quality of the scintillation crystal is improved.
More preferably, the antistatic agent is a special antistatic agent for HS-4090 epoxy resin.
By adopting the technical scheme, the special antistatic agent for the HS-4090 epoxy resin is beneficial to reducing the static electricity accumulation on the surface of the reflecting film for the scintillation crystal, and avoids the damage of the reflecting film for the scintillation crystal caused by the static electricity accumulation on the surface of the reflecting film for the scintillation crystal, so that the reflecting film for the scintillation crystal has good stability in practical application.
More preferably, the whitening agent is RQT-C-3 whitening agent.
By adopting the technical scheme, the RQT-C-3 brightener converts invisible ultraviolet radiation absorbed by the reflecting film of the scintillation crystal into bluish fluorescent radiation, and the bluish fluorescent radiation and the original yellow fluorescent radiation are complementary to each other to form white light, so that the whiteness of the product under sunlight is improved. The quality of the reflecting film for the scintillation crystal is greatly improved.
The second purpose of the invention is to provide a preparation method of a reflecting film for a scintillation crystal, the reflecting film for the scintillation crystal prepared by the method has good toughness, is not easy to deform or crack when being processed to a thinner thickness, and has good processing performance. In order to achieve the second purpose, the invention provides the following technical scheme, which comprises the following steps:
fully mixing titanium dioxide powder, magnesium oxide powder and aluminum oxide powder in corresponding weight parts in a stirring tank, wherein the stirring speed is 60-100 rpm, and the stirring time is 30-40 min to obtain a mixture;
pouring the optical epoxy resin A glue, the mixing accelerant and the mixture into a mixing barrel together in parts by weight, wherein the rotating speed of the mixing barrel is 60-100 rpm, the stirring time is 24-40 h, and the temperature is maintained at 40-90 ℃ to obtain a mixed glue material;
adding the optical epoxy resin B glue, the antistatic agent and the whitening agent in corresponding parts by weight into a mixed glue material, quickly stirring uniformly, defoaming in vacuum, wherein the rotating speed is 90-110 rpm, the stirring time is 20-28 h, and the temperature is maintained at 35-45 ℃ to obtain a mixed material;
step four, calendering and molding, namely placing the mixed material on a film pressing plate, adjusting positioning strips, and extruding the mixed material for multiple times by using a roller, wherein the rotating speed of the roller is 20-39 rpm, and the temperature of the roller is 30-40 ℃ to obtain a rough blank of the reflecting film;
step five, naturally curing, namely standing the rough blank of the reflection film subjected to calendaring molding at normal temperature for 8-20 h to obtain the reflection film for the scintillation crystal;
step six, polishing the two sides of the scintillation crystal on a grinding machine by using a reflecting film, and polishing by using a diamond grinding wheel until the surface of the scintillation crystal for the reflecting film is flat and smooth, wherein the rotating speed of the diamond grinding wheel is set to be 800-900 rpm;
and step seven, cutting the polished reflecting film for the scintillation crystal by using an inner circle cutting machine to form reflecting films for the scintillation crystals with different specifications, and storing the reflecting films for standby.
Through adopting above-mentioned technical scheme, be favorable to making titanium dioxide powder and magnesium oxide powder evenly distributed in the compounding, calendering shaping is favorable to making the compounding extend and the scintillation crystal that the natural curing obtained with the reflectance coating have, and the diamond grinding wheel is favorable to polishing the scintillation crystal with the reflectance coating to required thickness, makes avoiding of scintillation crystal with the reflectance coating keep smooth level and smooth simultaneously, and has good emission performance. The polished cutting is beneficial to cutting off the part with uneven surface of the reflecting film for the scintillation crystal, and the reflecting film for the scintillation crystal is cut into different specifications to be stored for standby.
In summary, compared with the prior art, the invention has the following beneficial effects:
(1) the optical epoxy resin A glue is added to mix the components, so that the titanium dioxide powder and the magnesium oxide powder are uniformly dispersed, the aluminum oxide powder is good reflection powder, the reflection effect and the surface hardness of the reflection film for the scintillation crystal can be improved, the prepared reflection film for the scintillation crystal has a good reflection effect, and the optical epoxy resin B glue is added, so that the physical property of the mixed material after solidification is improved, and the prepared reflection film for the scintillation crystal has good toughness and good processing performance;
(2) the addition of the styrene and the polydimethylsiloxane is beneficial to mixing of all components in the mixed material, and has a better remarkable protruding effect in a low-temperature environment, the polydimethylsiloxane is beneficial to reducing bubbles in the mixed material, the integral structural strength of the reflecting film for the scintillation crystal is improved, and meanwhile, the reflecting film has good reflecting performance;
(3) the addition of diethylenetriamine is advantageous for the titanium dioxide powder in the mixed material. The aluminum oxide powder and the magnesium oxide powder are uniformly fixed in the epoxy resin A glue and the optical epoxy resin B glue, so that the curing effect of the mixed materials is improved, and the reflective film for the scintillation crystal has good processing performance.
Detailed Description
The present invention will be described in detail with reference to examples.
Example 1: the reflective film for the scintillation crystal comprises the following components in parts by weight as shown in Table 1, and is prepared by the following steps:
fully mixing titanium dioxide powder, magnesium oxide powder and aluminum oxide powder in corresponding weight parts in a stirring tank, wherein the stirring speed is 100rpm, and the stirring time is 40min to obtain a mixture;
pouring the optical epoxy resin A glue, the acetone and the mixture in corresponding parts by weight into a mixing barrel, wherein the rotating speed of the mixing barrel is 100rpm, the stirring time is 40 hours, and the temperature is maintained at 90 ℃ to obtain a mixed glue material;
adding the optical epoxy resin B glue, the HS-4090 epoxy resin special antistatic agent and the RQT-C-3 whitening agent in corresponding parts by weight into the mixed glue stock, quickly stirring uniformly, defoaming in vacuum, wherein the rotating speed is 110rpm, the stirring time is 28h, and the temperature is maintained at 45 ℃ to obtain a mixed material;
step four, calendering and molding, namely placing the mixed material on a film pressing plate, adjusting positioning strips, and extruding the mixed material for multiple times by using a roller, wherein the rotating speed of the roller is 50rpm, and the temperature of the roller is 40 ℃ to obtain a rough blank of the reflecting film;
step five, naturally curing, and standing the rough blank of the reflection film subjected to calendaring molding at normal temperature for 20 hours to obtain the reflection film for the scintillation crystal;
step six, polishing the two sides of the scintillation crystal on a grinding machine by using a reflecting film, and polishing by using a diamond grinding wheel until the surface of the scintillation crystal for the reflecting film is flat and smooth, and the rotating speed of the diamond grinding wheel is set to 900 rpm;
and step seven, cutting the polished reflecting film for the scintillation crystal by using an inner circle cutting machine to form reflecting films for the scintillation crystals with different specifications, and storing the reflecting films for standby.
Examples 2 to 8: a reflective film for a scintillator crystal, which is different from example 1 in that each component and the corresponding parts by weight thereof are shown in Table 1.
TABLE 1 Components and parts by weight of examples 1-8
Example 9: a reflective film for a scintillator crystal, which is different from embodiment 1 in that the third step is specifically configured as follows: adding 4 parts by weight of optical epoxy resin B glue, 0.8 part by weight of HS-4090 epoxy resin special antistatic agent, 1.2 parts by weight of RQT-C-3 whitening agent and 0.8 part by weight of diethylenetriamine into the mixed glue stock, quickly and uniformly stirring, and defoaming in vacuum at the rotating speed of 110rpm for 28h at the temperature of 45 ℃ to obtain a mixed material.
Example 10: a reflective film for a scintillator crystal, which is different from example 9 in that the weight part of diethylenetriamine is 1.4 parts.
Example 11: a reflective film for a scintillator crystal, which is different from example 9 in that 2 parts by weight of diethylenetriamine is used.
Example 12: a reflective film for a scintillator crystal, which is different from embodiment 1 in that the third step is specifically configured as follows: adding 4 parts by weight of optical epoxy resin B glue, 0.8 part by weight of HS-4090 epoxy resin special antistatic agent, 1.2 parts by weight of RQT-C-3 whitening agent, 0.8 part by weight of diethylenetriamine and 0.6 part by weight of styrene into a mixed glue stock, quickly and uniformly stirring, defoaming in vacuum, wherein the rotating speed is 110rpm, the stirring time is 28 hours, and the temperature is maintained at 45 ℃ to obtain a mixed material.
Example 13: a reflective film for a scintillator crystal, which is different from example 12 in that styrene is present in an amount of 0.9 parts by weight.
Example 14: a reflective film for a scintillator crystal, which is different from example 12 in that styrene is present in an amount of 1.2 parts by weight.
Example 15: a reflective film for a scintillator crystal, which is different from embodiment 1 in that the third step is specifically configured as follows: adding 4 parts of optical epoxy resin B glue, 0.8 part of HS-4090 epoxy resin special antistatic agent, 1.2 parts of RQT-C-3 whitening agent, 0.8 part of diethylenetriamine, 0.6 part of styrene and 0.5 part of polydimethylsiloxane into the mixed glue stock, quickly stirring uniformly, defoaming in vacuum, wherein the rotating speed is 110rpm, the stirring time is 28h, and the temperature is maintained at 45 ℃ to obtain a mixed material.
Example 16: a reflective film for a scintillator crystal, which is different from example 15 in that the part by weight of polydimethylsiloxane is 0.9 part.
Example 17: a reflective film for a scintillator crystal, which is different from example 15 in that the part by weight of polydimethylsiloxane is 1.2 parts.
Example 18: a reflective film for a scintillator crystal, which is different from example 17 in that alcohol is used as the compounding accelerator.
Example 19: a reflective film for a scintillation crystal, which differs from example 17 in that the compounding accelerator is ethanol.
Comparative example 1: a difference from example 1 is that the raw material does not contain alumina powder.
Comparative example 2: a reflective film for a scintillator crystal, which is different from example 1 in that a compounding accelerator is not contained in the raw material.
Comparative example 3: the polyvinyl chloride modified plastic is obtained by adopting the embodiment I in the Chinese invention patent with the publication number of CN 103018804A.
Test-grinding thickness test
Test samples: the reflective films for scintillator crystals obtained in examples 1 to 19 were used as test samples 1 to 19, and the reflective films for scintillator crystals obtained in comparative examples 1 to 3 were used as control samples 1 to 3.
The test method comprises the following steps: ten pieces of reflective films for scintillation crystals with the same size are selected from the test samples 1 to 19 and the reference samples 1 to 3, the reflective films are placed on a grinding machine for grinding until the reflective films for scintillation crystals are broken, the thickness of the broken reflective films for scintillation crystals is measured, the maximum value and the minimum value of the thicknesses measured when the reflective films for scintillation crystals in the test samples 1 to 19 and the reference samples 1 to 3 are broken are discarded, and the remaining average values are taken.
And (3) test results: the test results of the test samples 1 to 19 and the control samples 1 to 3 are shown in Table 2.
TABLE 2 test results of test samples 1-19 and control samples 1-3
As can be seen from table 2, the comparison between the test samples 1 to 8 and the comparison samples 1 to 3 shows that the reflective film for a scintillator has good toughness, is not easily deformed or chipped even when processed to a thin thickness, and has good processability. The test sample 9-11 can be obtained, the aluminum oxide powder is beneficial to improving the structural strength of the reflective film for the scintillation crystal, the aluminum oxide powder can be obtained by being compared with the test sample 12-19, the aluminum oxide powder can be polished to a smaller thickness to be broken, the styrene is beneficial to uniformly mixing the mixed materials, the polydimethylsiloxane is beneficial to removing bubbles, and the processability of the reflective film for the scintillation crystal is improved.
Test of Secondary reflectance
Test samples: the reflective films for scintillator crystals obtained in examples 1 to 19 were used as test samples 1 to 19, and the reflective films for scintillator crystals obtained in comparative examples 1 to 3 were used as control samples 1 to 3.
The test method comprises the following steps: ten pieces of reflecting films for the scintillation crystals with the same size are respectively selected from the test samples 1-19 and the reference samples 1-3, the reflectivity of the reflecting film for the scintillation crystals is measured by selecting a chemical industry standard HG/T4915-2016 (determination method for reflectivity of white reflecting film), the maximum value and the minimum value of the reflectivity of the reflecting film for the scintillation crystals in each test sample and each reference sample are abandoned, and the rest are averaged.
And (3) test results: the test results of the test samples 1 to 19 and the control samples 1 to 3 are shown in Table 3.
TABLE 3 test results of test samples 1-19 and control samples 1-3
As shown in Table 3, the reflective film for a scintillator prepared according to the present invention has a higher reflectivity and a better reflective property than the reflective film of the prior art, as compared with the comparative samples 1 to 3, which are obtained by comparing the test samples 1 to 8 with the comparative samples 1 to 3. The analysis of the data of the test samples 9-11 shows that the aluminum oxide powder is a good reflective powder and can improve the reflective performance of the reflective film for the scintillation crystal. The data analysis of the test samples 11-19 shows that the addition of styrene is favorable for uniformly distributing the aluminum oxide powder, the titanium dioxide powder and the magnesium oxide powder in the formed mixed material, and the polydimethylsiloxane is favorable for removing air bubbles in the reflective film for the scintillation crystal, so that the reflective film for the scintillation crystal has good reflective performance.
The above description is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments, and all technical solutions belonging to the idea of the present invention belong to the protection scope of the present invention. It should be noted that modifications and embellishments within the scope of the invention may occur to those skilled in the art without departing from the principle of the invention, and are considered to be within the scope of the invention.
Claims (7)
1. The reflective film for the scintillation crystal is characterized by comprising the following components in parts by weight:
35-42 parts of titanium dioxide powder;
10-12 parts of magnesium oxide powder;
4-6 parts of aluminum oxide powder;
20-39 parts of optical epoxy resin A glue;
4-5.5 parts of optical epoxy resin B adhesive;
4-10 parts of a mixing accelerator;
0.8-1.5 parts of antistatic agent;
1.2-4 parts of a whitening agent;
the mixing accelerator is acetone or ethanol.
2. The reflective film for a scintillator crystal according to claim 1, wherein 0.8 to 2 parts by weight of diethylenetriamine is further added to the reflective film for a scintillator crystal.
3. The reflective film for a scintillator crystal according to claim 1, wherein 0.6 to 1.2 parts by weight of styrene is further added to the reflective film for a scintillator crystal.
4. The reflective film for a scintillator crystal according to claim 1, wherein 0.5 to 1.2 parts by weight of polydimethylsiloxane is further added to the reflective film for a scintillator crystal.
5. The reflective film for a scintillator crystal as claimed in claim 1, wherein said antistatic agent is an antistatic agent specific to HS-4090 epoxy resin.
6. The reflective film for a scintillator crystal as claimed in claim 1, wherein said whitening agent is RQT-C-3 whitening agent.
7. A process for preparing a reflective film for a scintillation crystal according to any one of claims 1 to 6, comprising the steps of:
fully mixing titanium dioxide powder, magnesium oxide powder and aluminum oxide powder in corresponding weight parts in a stirring tank, wherein the stirring speed is 60-100 rpm, and the stirring time is 30-40 min to obtain a mixture;
pouring the optical epoxy resin A glue, the mixing accelerant and the mixture into a mixing barrel together in parts by weight, wherein the rotating speed of the mixing barrel is 60-100 rpm, the stirring time is 24-40 h, and the temperature is maintained at 40-90 ℃ to obtain a mixed glue material;
adding the optical epoxy resin B glue, the antistatic agent and the whitening agent in corresponding parts by weight into a mixed glue material, quickly stirring uniformly, defoaming in vacuum, wherein the rotating speed is 90-110 rpm, the stirring time is 20-28 h, and the temperature is maintained at 35-45 ℃ to obtain a mixed material;
step four, calendering and molding, namely placing the mixed material on a film pressing plate, adjusting positioning strips, and extruding the mixed material for multiple times by using a roller, wherein the rotating speed of the roller is 20-39 rpm, and the temperature of the roller is 30-40 ℃ to obtain a rough blank of the reflecting film;
step five, naturally curing, namely standing the rough blank of the reflection film subjected to calendaring molding at normal temperature for 8-20 h to obtain the reflection film for the scintillation crystal;
step six, polishing the two sides of the scintillation crystal on a grinding machine by using a reflecting film, and polishing by using a diamond grinding wheel until the surface of the scintillation crystal for the reflecting film is flat and smooth, wherein the rotating speed of the diamond grinding wheel is set to be 800-900 rpm;
and step seven, cutting the polished reflecting film for the scintillation crystal by using an inner circle cutting machine to form reflecting films for the scintillation crystals with different specifications, and storing the reflecting films for standby.
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| CN110670831A (en) * | 2019-10-16 | 2020-01-10 | 墙煌新材料股份有限公司 | High-film-thickness diffuse reflection coating aluminum plate and manufacturing process thereof |
| CN111411397A (en) * | 2020-03-30 | 2020-07-14 | 湖州中芯半导体科技有限公司 | Nitrogen-doped CVD diamond laser crystal and preparation method thereof |
| CN117777890B (en) * | 2023-11-29 | 2024-11-05 | 奕瑞新材料科技（太仓）有限公司 | Anti-crosstalk reflective filler, anti-crosstalk pouring sealant and medical CT scintillator ceramic area array |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4658141A (en) * | 1984-04-03 | 1987-04-14 | Harshaw/Filtrol Partnership | Inorganic scintillator crystal having a highly reflective surface |
| CN101809088A (en) * | 2007-09-25 | 2010-08-18 | 日立化成工业株式会社 | Thermosetting resin composition for light reflection, substrate made therefrom for photosemiconductor element mounting, process for producing the same, and photosemiconductor device |
| KR20130142313A (en) * | 2012-06-19 | 2013-12-30 | 주식회사 케이씨씨 | Thermosetting resin composition suitable for manufacturing reflector for surface-mount type photosemiconductor devices |
-
2018
- 2018-10-18 CN CN201811216660.8A patent/CN109280343B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4658141A (en) * | 1984-04-03 | 1987-04-14 | Harshaw/Filtrol Partnership | Inorganic scintillator crystal having a highly reflective surface |
| CN101809088A (en) * | 2007-09-25 | 2010-08-18 | 日立化成工业株式会社 | Thermosetting resin composition for light reflection, substrate made therefrom for photosemiconductor element mounting, process for producing the same, and photosemiconductor device |
| KR20130142313A (en) * | 2012-06-19 | 2013-12-30 | 주식회사 케이씨씨 | Thermosetting resin composition suitable for manufacturing reflector for surface-mount type photosemiconductor devices |
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