CN109148073A - Coil block, plasma producing apparatus and plasma apparatus - Google Patents
Coil block, plasma producing apparatus and plasma apparatus Download PDFInfo
- Publication number
- CN109148073A CN109148073A CN201710457176.3A CN201710457176A CN109148073A CN 109148073 A CN109148073 A CN 109148073A CN 201710457176 A CN201710457176 A CN 201710457176A CN 109148073 A CN109148073 A CN 109148073A
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- coil
- induction
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- block
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F5/00—Coils
- H01F5/02—Coils wound on non-magnetic supports, e.g. formers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F38/00—Adaptations of transformers or inductances for specific applications or functions
- H01F38/14—Inductive couplings
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F5/00—Coils
- H01F5/02—Coils wound on non-magnetic supports, e.g. formers
- H01F2005/027—Coils wound on non-magnetic supports, e.g. formers wound on formers for receiving several coils with perpendicular winding axes, e.g. for antennae or inductive power transfer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F38/00—Adaptations of transformers or inductances for specific applications or functions
- H01F38/14—Inductive couplings
- H01F2038/146—Inductive couplings in combination with capacitive coupling
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Abstract
The present invention provides a kind of coil block, wherein the coil block includes multiple groups induction coil, and the input terminal of induction coil described in multiple groups is electrically connected, and the output end of induction coil described in multiple groups is circumferentially uniformly distributed along the coil block.The present invention also provides a kind of plasma producing apparatus and a kind of plasma apparatus.The induction coil can form uniform plasma in process cavity, and capacitive coupling is small in the inductively coupled plasma generating device, adjust convenient for accurate.
Description
Technical field
The present invention relates to semiconductor processing equipment fields, and in particular, to a kind of coil block, it is a kind of include the coil group
The plasma producing apparatus of part and a kind of plasma apparatus including the plasma producing apparatus.
Background technique
In recent years, along with the development of semi-conductor industry, plasma treatment technique is not only applicable to semiconductor field,
The fields such as optics, MEMS, biological detection are also widely used.
The plasma apparatus for carrying out plasma treatment technique includes plasma producing apparatus and process cavity, and common
Plasma producing apparatus include capacitively coupled plasma generating device, inductively coupled plasma generating device and microwave
Plasma producing apparatus.
Wherein, adjustable, at low cost etc. with plasma density and energy due to inductively coupled plasma generating device
Advantage is widely used in dry carving technology.
With the continuous development of manufacturing process, requirement of the plasma in the distributing homogeneity of wafer surface to be etched
It is higher and higher.In order to adapt to different technique, need that inductively coupled plasma generating device is adjusted.Due to incuding coupling
There are capacitive couplings between the coil of conjunction plasma producing apparatus, to affect degree of regulation.
Therefore, the even density of the plasma of inductively coupled plasma generating device generation how is further increased
Property and improve the degree of regulation of inductively coupled plasma generating device and become this field technical problem urgently to be resolved.
Summary of the invention
The purpose of the present invention is to provide a kind of coil blocks, a kind of plasma producing apparatus including the coil block
With a kind of plasma apparatus including the plasma producing apparatus.The induction coil can at least solve above-mentioned technology and ask
One of topic.
To achieve the goals above, as one aspect of the present invention, a kind of coil block is provided, which is characterized in that institute
Stating coil block includes multiple groups induction coil, the input terminal electrical connection of induction coil described in multiple groups, and induction coil described in multiple groups
Output end be circumferentially uniformly distributed along the coil block.
Preferably, the coil block includes three groups of induction coils；Alternatively, the coil block includes four groups of lines of induction
Circle.
Preferably, the length of induction coil described in every group is all satisfied following formula:
The λ of 0.01 λ≤L≤0.2,
Wherein, L is the length of every group of induction coil；
λ is the wavelength of the electromagnetic wave of the radio-frequency power supply output for powering for the coil block.
Preferably, induction coil described in every group in addition to being located at the coil block inner most one group of induction coil
The distance between input terminal and output end are all in 10mm between 25mm.
Preferably, the difference between the length of any two groups of induction coils is not more than the length of any one group of induction coil
10%.
Be preferably located at the inner most one group of induction coil of the coil block length and any other one group of line of induction
Difference between the length of circle is not more than the 10% of the length of any one group of induction coil.
Being preferably located at the inner most one group of induction coil of the coil block includes first coil and the second coil, institute
The inner ring that first coil is located at second coil, the first coil and second coil series connection are stated, and is located at the line
The input terminal of the inner most one group of induction coil of coil assembly is arranged in the first coil, is located at the coil block penetralia
One group of induction coil output end be arranged on second coil.
Preferably, the length of every group of induction coil is 230mm between 480mm.
Preferably, the distance between both ends of the first coil in 10mm between 25mm, and second coil
The distance between both ends are in 10mm between 25mm.
As the second aspect of the invention, a kind of plasma producing apparatus, the plasma producing apparatus are provided
Including sequentially connected radio frequency source, adaptation and coil block, wherein the coil block is above-mentioned line provided by the present invention
Coil assembly, the output end of the adaptation are electrically connected with the input terminal of coil described in each group in the coil block.
As the third aspect of the invention, provide a kind of plasma apparatus, the plasma apparatus include it is equal from
Daughter generating device and process cavity, are provided with medium window in the process cavity, the plasma producing apparatus setting it is described
Outside process cavity, wherein the plasma producing apparatus is above-mentioned plasma producing apparatus provided by the present invention, described
Coil block is arranged above the medium window.
Preferably, the plasma apparatus further includes stitch-adjusting control, and the stitch-adjusting control is for adjusting institute
State the distance between each group induction coil and the medium window on coil block.
In coil block provided by the present invention, since the position of the output end of two adjacent groups induction coil is different, because
This, the phase difference between the output electric current of two adjacent groups induction coil is not equal to 180 °, it follows that the coil block is powered
Afterwards, the capacitive coupling between two adjacent groups induction coil can avoid highest point, so as to improve coil block to gas point
The regulating power of the dissociation degree of son, improves the order of accuarcy for the figure that dry carving technology obtains, and reduces process costs.
Detailed description of the invention
The drawings are intended to provide a further understanding of the invention, and constitutes part of specification, with following tool
Body embodiment is used to explain the present invention together, but is not construed as limiting the invention.In the accompanying drawings:
Fig. 1 is a kind of schematic diagram of embodiment of plasma producing apparatus provided by the present invention；
Fig. 2 is the schematic diagram of the another embodiment of plasma producing apparatus provided by the present invention；
Fig. 3 is the structural schematic diagram of plasma apparatus provided by the present invention.
Description of symbols
101: radio-frequency power supply 201: adaptation
300: coil block 311: first coil
321: the second coils
301,302,303,304: induction coil
400: process cavity 401: medium window
402: chamber wall 403: chip bench
Specific embodiment
Below in conjunction with attached drawing, detailed description of the preferred embodiments.It should be understood that this place is retouched
The specific embodiment stated is merely to illustrate and explain the present invention, and is not intended to restrict the invention.
As one aspect of the present invention, a kind of coil block is provided, as depicted in figs. 1 and 2, the coil block 300 packet
Multiple groups induction coil is included, the input terminal of induction coil described in multiple groups is electrically connected, and along the output end of induction coil described in multiple groups
The circumferential direction of coil assembly 300 is uniformly distributed.
As depicted in figs. 1 and 2, the radio-frequency power supply 101 and adaptation in coil block 300 and plasma producing apparatus
201 are used cooperatively.Specifically, output end of the input terminal of each group induction coil with adaptation 200 is electrically connected in coil block 300
It connects, the output end of each coil block 300 is electrically connected with the reference voltage end (for example, ground terminal) being located at different location.
As mentioned above it is possible, the input terminal of each group induction coil is electrically connected, and output end position due in coil block 300
Set between the phase of the different electric currents for making each group induction coil that there are phase differences.That is, two groups of induction coils of arbitrary neighborhood is defeated
It between current phase is not out 180 ° there are phase difference.It follows that after the coil block is powered, the two adjacent groups line of induction
Capacitive coupling between circle can pass through capacitive coupling enhancing effect caused by avoiding the electric current acted in 180 ° of phases from reversely offsetting
It answers, so as to improve coil block 300 to the regulating power of the dissociation degree of gas molecule, improves the figure that dry carving technology obtains
The order of accuarcy of shape, and reduce process costs.
Other than capacitive coupling is low, coil block provided by the present invention can also with include the coil block from
The uniform plasma of Density Distribution is formed in the process cavity that daughter generating device is used cooperatively.Specifically, adaptation 201 is defeated
Outlet is electrically connected with the input terminal of each induction coil in coil block 300, the output of each induction coil in coil block 300
End is grounded at different locations, forms the structure that the multiple groups line of induction is mutually in parallel, therefore, the coil block only includes one
Common input end (that is, the common input end formed after the input terminal electrical connection of the different lines of induction) and a common output end
(that is, ground terminal).Since the output end of each group induction coil is uniformly distributed within the scope of 360 °, each group induction coil
Phase difference between output is also uniformly, so as to ensure to form the plasma of even density in process cavity.
In addition to this, multiple groups induction coil, which is mutually in parallel, reduces the inductance of the coil block, further improves line
The current value of coil assembly, and improve the power coupling efficiency of coil block.
In the present invention, the group number of induction coil in coil block 300 is not particularly limited.It can be according to dry etching
Required power density determines the group number of induction coil in coil block 300 in technique.Specifically, power density is bigger,
Then the group number of induction coil is more.Inductively coupled plasma generating device provided by the present invention is shown in FIG. 1 to implement
In mode, coil block 300 includes four groups of induction coils, from the inside to the outside respectively induction coil 301, induction coil 302, induction
Coil 303 and induction coil 304.
The line in the center of circle of the output end and coil block of induction coil 301 and the output end and coil of induction coil 302
Angle between the line in the center of circle of component is 90 °.Electricity is provided to coil block 300 when passing through radio frequency source 101, adaptation 201
Phase difference when stream, between the phase of the output electric current of the phase directional and induction coil 302 of the output electric current of induction coil 301
It is 90 °.
The line in the center of circle of the output end and coil block of induction coil 302 and the output end and coil of induction coil 303
Angle between the line in the center of circle of component is 90 °.Electricity is provided to coil block 300 when passing through radio frequency source 101, adaptation 201
Phase difference when stream, between the phase of the output electric current of the phase directional and induction coil 303 of the output electric current of induction coil 302
It is 90 °.
The line in the center of circle of the output end and coil block of induction coil 303 and the output end and coil of induction coil 304
Angle between the line in the center of circle of component is 90 °.Electricity is provided to coil block 300 when passing through radio frequency source 101, adaptation 201
Phase difference when stream, between the phase of the output electric current of the phase directional and induction coil 304 of the output electric current of induction coil 303
It is 90 °.
It is shown in Fig. 2 be another embodiment party of inductively coupled plasma generating device provided by the present invention
Formula is followed successively by induction coil 301, induction coil 302 as shown, coil block 300 includes three groups of induction coils from the inside to the outside
With induction coil 303.It is separated by 120 ° between the output end of the two adjacent groups line of induction.
The line in the center of circle of the output end and coil block of induction coil 301 and the output end and coil of induction coil 302
Angle between the line in the center of circle of component is 120 °.Electricity is provided to coil block 300 when passing through radio frequency source 101, adaptation 201
Phase difference when stream, between the phase of the output electric current of the phase directional and induction coil 302 of the output electric current of induction coil 301
It is 120 °.
The line in the center of circle of the output end and coil block of induction coil 302 and the output end and coil of induction coil 303
Angle between the line in the center of circle of component is 120 °.Electricity is provided to coil block 300 when passing through radio frequency source 101, adaptation 201
Phase difference when stream, between the phase of the output electric current of the phase directional and induction coil 303 of the output electric current of induction coil 302
It is 120 °.
Those skilled in the art can the power density according to required for plasma-treating technology determine induction coil
Group number.
In the present invention, special regulation is not done yet to the length of every group of induction coil in coil block 300.Preferably,
The length of induction coil described in every group is all satisfied following formula (1):
0.01λ≤L≤0.2λ (1)
Wherein, L is the length of every group of induction coil；
λ is the wavelength of the electromagnetic wave of the radio-frequency power supply output for powering for the coil block.
When the length of every group of induction coil is all satisfied above-mentioned formula (1), can to avoid standing wave effect so that
The plasma that the coil block generates is more uniform.
In the present invention, the wavelength X of the electromagnetic wave of radio frequency source output can be calculated according to formula (2):
λ=c/f (2)
Wherein, c is the transmission speed of electromagnetic wave, usually light beam, and f is the frequency of radio-frequency power supply.
For example, for frequency is the radio-frequency power supply of 13.56MHz, the length of every group of induction coil can 230mm extremely
Between 480mm.
In order to enable the inductance value between induction coil is almost the same, it is preferable that the length of any group induction coil it
Between difference shall not be more than any one group of induction coil length 10%.
It will be readily appreciated by those skilled in the art that the radius closer to inner ring induction coil is smaller, feel closer to outer ring
Answer the radius of coil bigger.Therefore, in order to preferably avoid standing wave effect, it is preferable that it is inner most to be located at the coil block
The difference of the length of the length and any other one group of induction coil of one group of induction coil is not more than the length of any one group of induction coil
The 10% of degree.
In order to ensure being located at the length and any other one group of induction of the inner most one group of induction coil of the coil block
Difference between the length of coil shall not be more than the 10% of the length of any one group of induction coil, it is preferable that be located at described
The inner most induction coil of coil block includes first coil and the second coil, and the first coil is located at second coil
Inner ring, the first coil and second coil series connection, and it is located at the inner most one group of induction coil of the coil block
Input terminal is arranged in the first coil, and the output end setting positioned at the inner most one group of induction coil of the coil block exists
On second coil.
Specifically, one end of the first coil is formed as the input positioned at the inner most induction coil of the coil block
End, the other end of the first coil are electrically connected with one end of second coil, and the other end of second coil is formed as
Positioned at the output end of the inner most induction coil of the coil block.
In specific embodiment shown in fig. 1 and 2, it is located at the inner most one group of induction coil 301 of coil block
Including first coil 311 and the second coil 321.As mentioned above it is possible, first coil 311 and the series connection of the second coil 321.
As mentioned above it is possible, in the present invention, the frequency of radio-frequency power supply can be 13.56MHz, calculated using formula (1)
The length of available every line of induction is 230mm between 480mm.
In the present invention, since every group of induction coil is both provided with input terminal and output end, every group of induction coil is all
It is not closed, opening is formed between input terminal and output end.Preferably, except positioned at the coil block penetralia
Induction coil except every group described in induction coil input terminal and the distance between output end in 10mm between 25mm.It will
The setting of the distance between input terminal and output end of each group induction coil the above range the advantages of there are two: 1, can be to avoid defeated
Enter the too close caused arc discharge of distance between end and output end risk on fire；2, it can minimize due to input terminal and defeated
The excessive influence to the opening uniform electromagnetic field formed between input terminal and output end of the distance between outlet.
It is further preferred that the distance between both ends of the first coil in 10mm between 25mm, and described second
The distance between both ends of coil are in 10mm between 25mm.
As the second aspect of the invention, a kind of plasma producing apparatus is provided, it is as depicted in figs. 1 and 2, described etc.
Ion body device includes sequentially connected radio frequency source 101, adaptation 201 and coil block 300, wherein coil block is this hair
Above-mentioned coil block provided by bright.
As shown in Figures 1 and 2, the output end of radio-frequency power supply 201 is electrically connected with the input terminal of adaptation 201, matching 201
The output end of device is electrically connected with the input terminal of each group induction coil in coil block 300.
As mentioned above it is possible, since the position of the output end of two lines of induction of arbitrary neighborhood is different, adjacent two senses
Answer the phase difference between line not equal to 180 °, it follows that after the coil block is powered, between two adjacent groups induction coil
Capacitive coupling can by avoiding the electric current acted in 180 ° of phases from reversely offsetting caused capacitive coupling enhancement effect, so as to
To improve coil block 300 to the regulating power of the dissociation degree of gas molecule, the accurate of the figure that dry carving technology obtains is improved
Degree, and reduce process costs.
As the third aspect of the invention, a kind of plasma apparatus is provided, as shown in figure 3, the plasma is set
Standby includes gas ions generating device and process cavity 400.Medium window 401 is provided in process cavity 400, the plasma fills
Outside the process cavity 400 installed, wherein the plasma producing apparatus is provided by the present invention above-mentioned inductively sends out
Generating apparatus, coil block 300 are arranged above medium window 401.
It should be pointed out that " top " described herein is the description carried out on the basis of the orientation in Fig. 3.
As mentioned above it is possible, it is more equal to generate density in process cavity 400 using the plasma producing apparatus
Even plasma.
In order to further increase the density of the plasma in process cavity 400, it is preferable that the plasma apparatus also wraps
Stitch-adjusting control is included, the stitch-adjusting control is for adjusting each group induction coil and medium window 401 on the coil block
The distance between.
As shown in Figure 3, technique can change by the distance between induction coil and the medium window 401 that adjust innermost circle
Plasma distribution in chamber 400.
As the distance between the induction coil of innermost circle and medium window 401 g=g1,400 plasma of process cavity
Density Distribution is as shown in curve G1, that is, intermediate density is low, both sides density is high；When innermost circle induction coil and medium window 401 it
Between distance g=g2 when, the Density Distribution of 400 plasma of process cavity is as shown in curve G2, that is, density is substantially equal everywhere
It is even consistent；As the distance between the induction coil of innermost circle and medium window 401 g=g3,400 plasma of process cavity it is close
Degree distribution is as shown in curve G3, that is, intermediate density is high, both sides density is high.Wherein, g1 > g2 > g3.
In the present invention, the specific structure of stitch-adjusting control is not particularly limited.For example, stitch-adjusting control
It may include stepper motor, the distance between each line of induction and medium window 401 adjusted by stepper motor.
Certainly, the present invention is not limited thereto.As another embodiment, the stitch-adjusting control may include length
Different multiple adjusting rods, the adjusting rod are supported between each line of induction of coil block 300 and medium window 400.It can be with
The adjusting rod with different length is replaced according to the density of the plasma in process cavity, until plasma is close in process cavity
Until degree is uniform.
In the present invention, to the specific structure of process cavity also not special limitation.As shown in figure 3, process cavity 400 includes
Medium window 401, chamber wall 402 and the chip bench 403 being arranged in inside process cavity.When carrying out dry etching, into process cavity 400
In be passed through process gas, export electric current to coil block 300 using radio frequency source, each group induction coil of coil block 300 formed
Magnetic field forms plasma so as to ionize to the process gas in process cavity 400, to setting on chip bench 403
Substrate carry out dry etching.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, however the present invention is not limited thereto.For those skilled in the art, essence of the invention is not being departed from
In the case where mind and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (12)
1. a kind of coil block, which is characterized in that the coil block includes multiple groups induction coil, induction coil described in multiple groups
Input terminal electrical connection, and the output end of induction coil described in multiple groups is circumferentially uniformly distributed along the coil block.
2. coil block according to claim 1, which is characterized in that the coil block includes three groups of induction coils；Or
Person, the coil block include four groups of induction coils.
3. coil block according to claim 1, which is characterized in that the length of induction coil described in every group is all satisfied following
Formula:
The λ of 0.01 λ≤L≤0.2,
Wherein, L is the length of every group of induction coil；
λ is the wavelength of the electromagnetic wave of the radio-frequency power supply output for powering for the coil block.
4. coil block as claimed in any of claims 1 to 3, which is characterized in that except positioned at the coil block
The distance between input terminal and output end of induction coil described in every group except inner most one group of induction coil are all in 10mm
To between 25mm.
5. coil block as claimed in any of claims 1 to 3, which is characterized in that any two groups of induction coils
Difference between length is not more than the 10% of the length of any one group of induction coil.
6. coil block as claimed in any of claims 1 to 3, which is characterized in that be located at the coil block most
Difference between the internal length of one group of induction coil and the length of any other one group of induction coil is not more than any one group
The 10% of the length of induction coil.
7. coil block as claimed in any of claims 1 to 3, which is characterized in that be located at the coil block most
One group of internal induction coil includes first coil and the second coil, and the first coil is located at the inner ring of second coil,
The first coil and second coil series connection, and it is located at the input terminal of the inner most one group of induction coil of the coil block
It is arranged in the first coil, the output end setting positioned at the inner most one group of induction coil of the coil block is described the
On two coil.
8. coil block as claimed in any of claims 1 to 3, which is characterized in that the length of every group of induction coil
It is 230mm between 480mm.
9. coil block according to claim 7, which is characterized in that the distance between both ends of the first coil exist
10mm between 25mm, and the distance between both ends of second coil in 10mm between 25mm.
10. a kind of plasma producing apparatus, the plasma producing apparatus include sequentially connected radio frequency source, adaptation and
Coil block, which is characterized in that the coil block is coil block described in any one of claim 1 to 9, described
The output end of orchestration is electrically connected with the input terminal of coil described in each group in the coil block.
11. a kind of plasma apparatus, the plasma apparatus includes plasma producing apparatus and process cavity, the technique
Medium window is provided on chamber, outside the process cavity of the plasma producing apparatus setting, which is characterized in that it is described it is equal from
Daughter generating device is plasma producing apparatus described in any one of claim 10, and the coil block is arranged on the medium window
Side.
12. plasma apparatus according to claim 11, which is characterized in that the plasma apparatus further includes coil
Regulating device, the stitch-adjusting control is for adjusting on the coil block between each group induction coil and the medium window
Distance.
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| CN201710457176.3A CN109148073B (en) | 2017-06-16 | 2017-06-16 | Coil assembly, plasma generating device and plasma equipment |
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| CN201710457176.3A CN109148073B (en) | 2017-06-16 | 2017-06-16 | Coil assembly, plasma generating device and plasma equipment |
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| CN109148073A true CN109148073A (en) | 2019-01-04 |
| CN109148073B CN109148073B (en) | 2022-10-21 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111146067A (en) * | 2019-12-24 | 2020-05-12 | 北京北方华创微电子装备有限公司 | Coil assembly and semiconductor device |
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| JP2010118324A (en) * | 2008-11-14 | 2010-05-27 | Semes Co Ltd | Plasma antenna, and plasma processing device including the same |
| CN102548180A (en) * | 2010-12-27 | 2012-07-04 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Medium window, inductive coupling coil assembly, and plasma processing equipment |
| CN104862671A (en) * | 2014-02-24 | 2015-08-26 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Reaction chamber and plasma processing device |
| CN107333378A (en) * | 2016-04-29 | 2017-11-07 | 中微半导体设备(上海)有限公司 | A kind of device for inductively coupled plasma processing and its control method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111146067A (en) * | 2019-12-24 | 2020-05-12 | 北京北方华创微电子装备有限公司 | Coil assembly and semiconductor device |
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