CN109023238B - Mask plate and evaporation device - Google Patents
Mask plate and evaporation device Download PDFInfo
- Publication number
- CN109023238B CN109023238B CN201811002302.7A CN201811002302A CN109023238B CN 109023238 B CN109023238 B CN 109023238B CN 201811002302 A CN201811002302 A CN 201811002302A CN 109023238 B CN109023238 B CN 109023238B
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- China
- Prior art keywords
- mask plate
- opening
- mask
- frame
- evaporation
- Prior art date
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- 238000001704 evaporation Methods 0.000 title claims abstract description 28
- 230000008020 evaporation Effects 0.000 title claims abstract description 27
- 239000011521 glass Substances 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims description 45
- 229910052751 metal Inorganic materials 0.000 claims description 45
- 239000000463 material Substances 0.000 claims description 7
- 230000000873 masking effect Effects 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 238000010030 laminating Methods 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 description 12
- 238000002156 mixing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000009834 vaporization Methods 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to the technical field of display equipment and discloses a mask plate and an evaporation device, wherein the mask plate comprises a frame with an opening and a mask plate body which covers the opening and is fixed on a first side surface of the frame in a stretching manner, wherein the inner side surface of the opening surrounded by the frame is connected with the first side surface through an inclined surface which gradually inclines towards the opening along the first side surface; and a concave area is formed on the surface of the mask plate body opposite to the opening. This mask plate can make mask plate body and glass substrate laminate gently at frame opening edge to can make the laminating of mask plate body and glass substrate more level and smooth, and then, make the laminating of mask plate body and glass substrate inseparable, when the evaporation coating subpixel, make subpixel position precision high, the pixel profile is clear, can not take place the colour mixture bad.
Description
Technical Field
The invention relates to the technical field of display equipment, in particular to a mask plate and an evaporation device.
Background
An organic evaporation display technology for organic light-emitting diode (OLED) is characterized in that a glass substrate is placed in a vacuum chamber, wherein the glass substrate comprises an anode, organic materials are evaporated at high temperature through the vacuum chamber, a light-emitting layer and a cathode are sequentially formed on the surface of the substrate, and the cathode and the anode act to enable the light-emitting layer to emit light. Wherein the light emitting layer includes: electron injection layer, electron transport layer, electroluminescent layer, hole transport layer, hole injection layer, and the like. Wherein, the luminescent layer is deposited on the glass substrate by high-temperature evaporation in the vacuum chamber. The sub-pixels with different colors and different luminescent layer materials need to be respectively evaporated in different evaporation chambers and at different pixel positions, wherein the jig with the limiting function is a high-precision metal mask (FMM). The metal mask plate comprises effective pixel openings, so that the luminescent layer evaporation materials are evaporated to the positions of the sub-pixels corresponding to the backboard glass through the openings of the metal mask plate. And holes are formed at different positions to form sub-pixels with different colors. The light-emitting layer emits light under the drive of the position of the substrate corresponding to the anode.
At present, along with the resolution ratio of display products is continuously improved, the size of sub-pixels is continuously reduced, the arrangement structure of the sub-pixels is dense, the distance of the same pixels is reduced, and meanwhile, the number of products required to be arranged on the same metal mask plate is increased for the appearance of APP small-size and special-shaped products such as watches, bracelets and the like. For the high-precision metal mask, the difficulty of ensuring the opening position precision of the metal mask is increased due to the fact that the high-precision metal mask is manufactured through a stretching welding process and limited by material characteristics. Affecting the production yield of the product.
For example, as shown in fig. 1, the metal mask plate includes a frame 01 and metal mask stripes 02, and the metal mask stripes 02 are provided with effective opening regions for evaporation. The metal mask stripes 02 are welded to the frame in a drooping shape as shown in fig. 2. During evaporation, the glass substrate is placed on the surface of the metal mask plate, and the metal mask strips 02 are inclined in the edge area, so that the glass back plate cannot be tightly attached to the metal mask strips 02 when the metal mask strips are attached to the glass back plate, gaps exist, sub-pixel position deviation after evaporation is caused, the pixel outline is not clear, poor color mixing can occur, and the product yield is reduced.
Disclosure of Invention
The invention provides a mask plate and an evaporation device, wherein the mask plate can ensure that the position precision of sub-pixels is high, the pixel outline is clear, and poor color mixing cannot occur.
In order to achieve the purpose, the invention provides the following technical scheme:
a mask plate comprises a frame with an opening and a mask plate body covering the opening and fixed on a first side surface of the frame in a stretching way,
the inner side surface of the opening surrounded by the frame is connected with the first side surface through an inclined surface gradually inclining towards the opening along the first side surface;
and a concave area is formed on the surface of the mask plate body opposite to the opening.
In the mask plate, the inner side surface of the opening surrounded by the frame is connected with the first side surface through the inclined surface gradually inclining towards the opening along the first side surface, namely the inclined surface is arranged between the first side surface and the inner side surface of the frame, so that the glass substrate can be smoothly attached to the edge of the opening of the frame when being pressed onto the surface of the mask plate body from the top in the evaporation process; the concave area is formed on the surface of the mask plate body opposite to the opening, so that the thickness of the mask plate body in the area corresponding to the opening can be reduced, the strength of the mask plate body is reduced, and the mask plate body can be more smoothly attached to the glass substrate; furthermore, the mask plate body is tightly attached to the glass substrate, so that when sub-pixels are evaporated, the sub-pixel position precision is high, the pixel outline is clear, and poor color mixing cannot occur.
Preferably, an included angle between the inclined surface and the extension surface of the first side surface is greater than 0 degree and less than or equal to 20 degrees.
Preferably, the mask plate body is including covering opening and tensile being fixed in the mask plate that shelters from of first side and being located it deviates from to shelter from the mask plate frame one side and tensile being fixed in many metal mask strips of first side, it treats a plurality of coating by vaporization openings that the coating by vaporization region corresponds with glass substrate to be formed with on the mask plate to shelter from, be formed with the inside effective opening area that has the figure that corresponds with the coating by vaporization pattern on the metal mask strip.
Preferably, the projection of each effective opening area on the shielding mask plate at least covers one evaporation coating opening.
Preferably, the shape of the effective opening area is a rectangle or a square along the stretching direction of the metal mask strip, and the shape of the evaporation opening is a circle.
Preferably, the surface of the shadow mask opposite to the opening is formed with the recessed region.
Preferably, the depth of the recess region is 1/2 to 2/3 of the thickness of the shadow mask.
Preferably, the recessed region is spaced 1mm from the inner side of the frame.
Preferably, the frame, the shadow mask and the metal mask strip are made of the same material.
The invention also provides an evaporation device which comprises any one mask plate provided in the technical scheme.
Drawings
FIG. 1 is a schematic structural diagram of a metal mask in the prior art;
FIG. 2 is a schematic diagram of a metal mask strip according to the prior art;
fig. 3 is a schematic structural diagram of a mask according to an embodiment of the present invention;
fig. 4 is a schematic view of a use state of a mask provided in an embodiment of the present invention;
fig. 5 is a schematic structural diagram of a mask blank according to an embodiment of the present invention;
fig. 6 is a schematic structural diagram of a metal mask stripe provided in an embodiment of the present invention.
Icon:
01-a frame; 02-metal mask stripes; 021-effective open area;
1-a frame; 11-inclined plane; 2, shielding a mask plate; 21-vapor deposition opening; 22-a recessed region; 3-metal mask stripes; 31-effective open area; 4-glass substrate.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 3 and 4, the present invention provides a mask, including a frame 1 having an opening and a mask body covering the opening and fixed to a first side of the frame 1 by stretching,
the inner side surface of the opening enclosed by the frame 1 is connected with the first side surface through a slope 11 gradually inclining towards the opening along the first side surface;
the mask body has a recessed region 22 formed on a surface thereof opposite to the opening.
In the mask provided by the embodiment of the invention, because the inner side surface of the opening surrounded by the frame 1 is connected with the first side surface through the inclined surface 11 which gradually inclines towards the opening along the first side surface, namely the inclined surface 11 is arranged between the first side surface and the inner side surface of the frame 1, when the glass substrate 4 is pressed on the surface of the mask body from the upper side in the vapor deposition process, the glass substrate can be smoothly attached to the edge of the opening of the frame 1; moreover, as the concave region 22 is formed on the surface of the mask plate body opposite to the opening, the thickness of the mask plate body in the region corresponding to the opening can be reduced, the strength of the mask plate body is further reduced, and the mask plate body and the glass substrate 4 can be more smoothly jointed; furthermore, the mask plate body is tightly attached to the glass substrate 4, so that when sub-pixels are evaporated, the sub-pixel position precision is high, the pixel outline is clear, and poor color mixing cannot occur.
In the embodiment of the present invention, the included angle between the inclined surface 11 and the extension surface of the first side surface is preferably greater than 0 degree and less than or equal to 20 degrees, so that the glass substrate 4 can be smoothly attached to the opening edge of the frame 1 when being pressed onto the surface of the mask plate body. In practical applications, the angle between the inclined surface 11 and the extension surface of the first side surface is determined according to practical situations and is not limited herein.
In the mask plate provided in the embodiment of the present invention, specifically, the size of the frame 1 may be 800mm x 900mm (22-23) mm. The maximum distance between the inclined plane 11 and the extension surface of the first side surface is preferably 0.2mm to 0.4mm, and the maximum distance between the inclined plane 11 and the inner side surface is preferably 2mm to 4 mm. The specific dimensions of the frame 1 in the application may be determined according to the actual circumstances and are not limited herein.
In the embodiment of the invention, as shown in fig. 3 and 4, the mask plate body specifically includes a mask plate 2 covering the opening and fixed to the first side surface in a stretching manner, and a plurality of metal mask strips 3 located on one side of the mask plate 2 away from the frame 1 and fixed to the first side surface in a stretching manner; as shown in fig. 5 and 6, the mask plate 2 is formed with a plurality of vapor deposition openings 21 corresponding to the regions of the glass substrate 4 to be vapor deposited, and the metal mask stripes 3 are formed with effective opening regions 31 having patterns corresponding to vapor deposition patterns inside. Wherein, the shielding mask plate 2 positioned below the metal mask strip 3 can support and limit the metal mask strip 3, so that the metal mask strip 3 can be prevented from sagging to cause the deformation of the effective opening area 31, and the metal mask strip 3 can be tightly attached to the glass backboard. The plurality of vapor deposition openings 21 formed on the shielding mask plate 2 can limit the formation of vapor deposition areas on the glass substrate 4 during vapor deposition, and during vapor deposition, the vapor deposition openings 21 on the shielding mask plate 2 are matched with the patterns in the effective opening areas 31 on the metal mask strips 3 to form vapor deposition patterns on the glass backboard. Therefore, when the mask plate body in the technical scheme is used for evaporating the sub-pixels, the sub-pixel position precision is high, the pixel outline is clear, and poor color mixing cannot occur.
In the embodiment of the present invention, specifically, the projection of each effective opening region 31 on the mask plate 2 covers at least one evaporation opening 21. Preferably, as shown in fig. 3, the projection of each effective opening area 31 on the mask plate 2 can cover a plurality of evaporation openings 21, the number of effective opening areas 31 of the metal mask strip 3 can be reduced, the structure is simple, the sub-pixel position accuracy can be high, the pixel outline is clear, and color mixing failure does not occur.
In the above-described embodiment of the invention, as shown in fig. 6, the shape of the effective opening area 31 is a rectangle or a square along the stretching direction of the metal mask stripes 3, so that deformation of the effective opening area 31 during stretch welding can be avoided, and alternatively, the shape of the vapor deposition openings 21 may be a circle. In practical applications, the shape of the vapor deposition opening 21 is determined according to the shape of a predetermined vapor deposition region, such as a watch or a bracelet, and is not limited herein.
In the embodiment of the present invention, as shown in fig. 3, in a specific implementation, a recessed region 22 is formed on a surface of the mask body, which covers the mask 2 and is opposite to the opening. And recessed area 22 is located and shelters from the whole surface that mask plate 2 and opening are relative, makes the whole thickness that shelters from mask plate 2 reduce, and then makes the self intensity that shelters from mask plate 2 reduce, when glass substrate 4 from the higher authority pressfitting to metal mask strip 3, makes metal mask strip 3 and coating by vaporization glass's laminating more level and more smooth.
In the embodiment of the present invention, specifically, the depth of the concave region 22 is 1/2 to 2/3 of the thickness of the mask 2, so that the strength of shielding the mask 2 can be reduced.
In the embodiment of the present invention, specifically, the distance between the recessed region 22 and the inner side surface of the frame 1 is 1mm, so that the recessed region 22 is uniformly formed on the whole surface of the mask plate opposite to the opening, the whole thickness of the mask plate 2 is reduced, the strength of the mask plate 2 is reduced, and the bonding between the metal mask strip 3 and the evaporation glass is smoother.
In the embodiment of the present invention, the process of manufacturing the mask plate specifically includes:
firstly, stretching and welding a shielding mask plate 2 on the surface of a frame 1, wherein the thickness of the shielding mask plate 2 is 100-150 μm, and the drooping amount after stretching is 80-120 μm;
then, performing half etching on the surface of the mask plate 2 opposite to the opening to form a concave region 22, wherein the half etching depth is 1/2-2/3 of the thickness of the mask plate 2;
finally, the metal mask strips 3 are welded on the side of the shielding mask plate 2, which is far away from the frame 1, in a stretching way, the thickness of the metal mask strips 3 is 20-40 μm, and the sagging amount after stretching is 150-250 μm.
In the embodiment of the invention, preferably, the frame 1, the shielding mask plate 2 and the metal mask strips 3 are made of the same material, so that the frame 1, the shielding mask plate 2 and the metal mask strips 3 are conveniently welded and connected. For example, the material of the frame 1, the masking mask 2 and the metal masking strips 3 is nickel-iron alloy, or other metal materials, which is not limited herein.
The embodiment of the invention also provides an evaporation device which comprises any mask plate provided in the technical scheme.
It will be apparent to those skilled in the art that various changes and modifications may be made in the embodiments of the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (8)
1. A mask plate is characterized by comprising a frame with an opening and a mask plate body which covers the opening and is fixed on a first side surface of the frame in a stretching way,
the inner side surface of the opening surrounded by the frame is connected with the first side surface through an inclined surface gradually inclining towards the opening along the first side surface;
a concave area is formed on the surface of the mask plate body opposite to the opening; wherein,
the mask plate body is including covering opening and tensile being fixed in the mask plate that shelters from of first side, shelter from the mask plate with the opening is relative is formed with on the surface sunken region, sunken region's degree of depth does shelter from 1/2 to 2/3 of mask plate thickness.
2. A mask according to claim 1, wherein the included angle between the inclined plane and the extension plane of the first side surface is greater than 0 degree and less than or equal to 20 degrees.
3. A mask plate according to claim 1, wherein the mask plate body further comprises a plurality of metal mask strips which are located on one side of the shielding mask plate, are deviated from the frame, and are fixed on the first side surface in a stretching manner, a plurality of evaporation openings corresponding to a glass substrate evaporation area are formed on the shielding mask plate, and effective opening areas with patterns corresponding to evaporation patterns are formed inside the metal mask strips.
4. A mask according to claim 3, wherein the projection of each effective opening area on the mask covers at least one evaporation opening.
5. A mask according to claim 4, wherein the shape of the effective opening area is rectangular or square along the stretching direction of the metal mask strip, and the shape of the evaporation opening is circular.
6. A mask according to claim 1, wherein the distance of the recessed region from the inner side surface of the frame is 1 mm.
7. A mask according to any one of claims 3-5, wherein the material of the frame, the masking plate and the metal mask strips are the same.
8. An evaporation device, which is characterized by comprising the mask plate according to any one of claims 1 to 7.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201811002302.7A CN109023238B (en) | 2018-08-30 | 2018-08-30 | Mask plate and evaporation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201811002302.7A CN109023238B (en) | 2018-08-30 | 2018-08-30 | Mask plate and evaporation device |
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CN109023238A CN109023238A (en) | 2018-12-18 |
CN109023238B true CN109023238B (en) | 2021-01-22 |
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CN201811002302.7A Active CN109023238B (en) | 2018-08-30 | 2018-08-30 | Mask plate and evaporation device |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111074204B (en) * | 2020-01-03 | 2022-01-14 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof |
CN111676446B (en) * | 2020-06-24 | 2022-10-28 | 京东方科技集团股份有限公司 | Mask plate, mask plate structure and mask plate manufacturing method |
CN112662995A (en) * | 2020-12-24 | 2021-04-16 | 京东方科技集团股份有限公司 | Mask plate and mask plate manufacturing method |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2012052155A (en) * | 2010-08-31 | 2012-03-15 | Canon Inc | Mask unit for vacuum film deposition and vacuum film deposition apparatus with the same |
KR102002494B1 (en) * | 2012-11-30 | 2019-07-23 | 삼성디스플레이 주식회사 | Mask frame assembly for thin film deposition |
CN205803576U (en) * | 2016-06-28 | 2016-12-14 | 鄂尔多斯市源盛光电有限责任公司 | Mask plate |
CN106884138A (en) * | 2017-02-15 | 2017-06-23 | 武汉华星光电技术有限公司 | The repeated using method of mask assembly and mask assembly |
CN107653435A (en) * | 2017-10-25 | 2018-02-02 | 信利(惠州)智能显示有限公司 | Mask device and its mask assembly, mask plate |
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