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CN108981754B - Method for zero alignment of mounting angles of photoelectric platform and carrier - Google Patents

Method for zero alignment of mounting angles of photoelectric platform and carrier Download PDF

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Publication number
CN108981754B
CN108981754B CN201811140289.1A CN201811140289A CN108981754B CN 108981754 B CN108981754 B CN 108981754B CN 201811140289 A CN201811140289 A CN 201811140289A CN 108981754 B CN108981754 B CN 108981754B
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angle
carrier
theodolite
auto
azimuth
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CN108981754A (en
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郎小龙
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Changchun Institute of Optics Fine Mechanics and Physics of CAS
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Changchun Institute of Optics Fine Mechanics and Physics of CAS
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    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C25/00Manufacturing, calibrating, cleaning, or repairing instruments or devices referred to in the other groups of this subclass

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Abstract

The embodiment of the invention discloses a method for zero alignment of an installation angle of a photoelectric platform and an aerial carrier. The method includes the steps that the position of an autocollimation theodolite is adjusted through two plumb lines and a linear guide rail on a longitudinal axis of a carrier, the autocollimation theodolite is fixed on an extension line of the longitudinal axis of the carrier, and a first direction and a first pitching angle of the autocollimation theodolite are recorded; pointing the visual axis of the auto-collimation theodolite to the optical axis of the photoelectric platform, and recording a second direction and a second pitching angle of the auto-collimation theodolite when the center of a cross wire of the photoelectric platform is superposed with a reticle of the auto-collimation theodolite; obtaining an azimuth included angle between a first azimuth angle and a second azimuth angle, and a pitching included angle between a first pitching angle and a second pitching angle; the azimuth angle of the photoelectric platform is modified into the azimuth angle by debugging computer software, and the pitch angle of the photoelectric platform is modified into the pitch angle, so that the zero position of the azimuth axis of the photoelectric platform is effectively ensured to be parallel to the longitudinal axis of the carrier, and the zero position of the pitch axis of the photoelectric platform is ensured to be parallel to the pitch axis of the carrier.

Description

Method for zero alignment of mounting angles of photoelectric platform and carrier
Technical Field
The invention relates to the technical field of aviation tests, in particular to a zero alignment method for an airborne photoelectric platform and an airborne installation angle.
Background
The longitude, the latitude and the geodetic height of the target under a geodetic coordinate system are calculated by positioning the target for aerial reconnaissance through the azimuth angle and the pitch angle of the photoelectric platform pointing to the target and the distance between the target and the photoelectric platform given by the laser range finder and combining the position information and the attitude angle of the carrier. The object positioning is essentially the coordinate conversion relation among a photoelectric platform coordinate system, an aircraft geographic coordinate system, a geodetic rectangular coordinate system and a geodetic coordinate system for several times. The final result of the target positioning is closely related to the accuracy of each coordinate value and the accuracy of the conversion between coordinate systems. The photoelectric platform is generally installed in front of and below the carrier, and the spatial position of the coordinate origin of the photoelectric platform is different from the spatial position of the coordinate origin of the carrier, so that the coordinate system of the photoelectric platform and the coordinate system of the carrier can generate translation and possibly rotation. Because the measured target is far away from the carrier, the coordinate translation has little influence on target positioning, and can be ignored in engineering, but the rotation of the two coordinate systems, namely the parallelism error of the corresponding coordinate axes between the photoelectric platform coordinate system and the carrier coordinate system, has great influence on positioning accuracy, and accurate measurement and correction need to be carried out in the mounting process of the photoelectric platform. The photoelectric platform installation zero position calibration is to adopt an optical method to measure and adjust to ensure that the azimuth axis zero position of the photoelectric platform is parallel to the longitudinal axis of the carrier, and the pitch axis zero position of the photoelectric platform is parallel to the pitch axis of the carrier.
Therefore, in order to solve the problem of inaccurate positioning accuracy caused by rotation between the coordinate system of the photoelectric platform and the coordinate system of the carrier, it is necessary to provide a method for ensuring that the zero position of the azimuth axis of the photoelectric platform is parallel to the longitudinal axis of the carrier, and the zero position of the installation angle of the photoelectric platform and the carrier, where the zero position of the pitch axis of the photoelectric platform is parallel to the pitch axis of the carrier, is aligned.
Disclosure of Invention
Aiming at the problem of inaccurate positioning precision caused by rotation between a photoelectric platform coordinate system and a carrier coordinate system, a method for ensuring zero position of an azimuth axis of a photoelectric platform to be parallel to a longitudinal axis of the carrier and zero position alignment of a photoelectric platform and a carrier installation angle, wherein the zero position of a pitching axis of the photoelectric platform is parallel to the pitching axis of the carrier, is needed. The method for zero alignment of the mounting angles of the photoelectric platform and the carrier, provided by the embodiment of the invention, can ensure that the azimuth axis zero position of the photoelectric platform is parallel to the longitudinal axis of the carrier, and the pitch axis zero position of the photoelectric platform is parallel to the pitch axis of the carrier, so that the target positioning precision is improved.
The specific scheme of the method for zero alignment of the mounting angle of the photoelectric platform and the aerial carrier is as follows: a method for zero alignment of an installation angle of an optoelectronic platform and an aerial carrier comprises the following steps: step S1: leveling the carrier so that the longitudinal axis of the carrier is parallel to the ground level, and then forming a first plumb line and a second plumb line on two longitudinal axis mark points of the carrier respectively; step S2: arranging a linear guide rail on the ground of the extension line of the longitudinal axis of the carrier, wherein the motion direction of the linear guide rail is perpendicular to the longitudinal axis of the carrier; step S3: fixing an auto-collimation theodolite on the linear guide rail, and leveling the auto-collimation theodolite; step S4: will the pitch direction of autocollimation theodolite is on a parallel with the ground horizontal plane to search along the azimuth direction, until aim first plumb line, and the azimuth angle A of the autocollimation theodolite at this moment of record0(ii) a Step S5: change the internal focusing of auto-collimation theodolite, and will the pitch direction of auto-collimation theodolite is on a parallel with the ground horizontal plane, searches along the azimuth direction, until aiming the second plumb line, the azimuth angle A of the auto-collimation theodolite at this moment of record1(ii) a Step S6: judging thatA0And A1Whether the error value is within the preset error range or not, if not, repeating the step S4 and the step S5 until the A is within the preset error range0And A1Within the error range; step S7: recording the pitch angle E of the autocollimation theodolite1(ii) a Step S8: starting an illumination light source of the auto-collimation theodolite reticle, rotating the auto-collimation theodolite and the photoelectric platform along the azimuth direction and the pitching direction respectively, and searching a reticle image of the auto-collimation theodolite by using a visible light visual axis of the photoelectric platform until the center of an electric cross wire of the photoelectric platform is coincided with the center of a cross wire image of the auto-collimation theodolite reticle; record the azimuth A of the autocollimation theodolite at this time2And a pitch angle E2And S9, debugging computer software to modify the azimuth angle of the photoelectric platform from α to delta A and modify the pitch angle of the photoelectric platform from β to delta E.
Preferably, the specific process of forming the first and second plumb lines in step S1 is to bind the first and second plumb lines at the positions of the two marking points, respectively, and the lower ends of the first and second plumb lines are fastened with plumbs, respectively.
Preferably, the preset error range of step S6 is a0And A1A difference range of (A) to0And A1The difference of (a) is in the range of-2 "to 2".
Preferably, the included angle of orientation Δ a ═ a1-A2
Preferably, the pitch angle Δ E ═ E1-E2
Preferably, the zero position calibration azimuth error of the zero position alignment method of the photoelectric platform and the installation angle of the carrier is
Figure GDA0002580793000000031
Wherein σA1Error of self-collimation theodolite center from longitudinal axis of carrier, sigmaA2In order to self-collimate the azimuth sighting error of the theodolite,σA3for self-collimating theodolite internal focusing errors, sigmaA6Aiming error of visible light visual axis orientation of the photoelectric platform.
Preferably, the zero calibration pitch error of the method for zero alignment of the mounting angle of the photoelectric platform and the aerial carrier is
Figure GDA0002580793000000032
Wherein σE2For auto-collimation theodolite pitch sighting error, sigmaE4For auto-collimation theodolite levelling errors, sigmaE5For auto-collimation theodolite zero error, σE6The pitching aiming error of the visual axis of the visible light of the photoelectric platform is obtained.
According to the technical scheme, the embodiment of the invention has the following advantages:
the method for zero alignment of the mounting angle of the photoelectric platform and the aerial carrier comprises a plumb line setting step, a linear guide rail adjusting step, an auto-collimation theodolite aiming step, a photoelectric platform aiming step and a debugging computer correcting step, ensures that the azimuth axis zero position of the photoelectric platform is parallel to the longitudinal axis of the aerial carrier, and the pitch axis zero position of the photoelectric platform is parallel to the pitch axis of the aerial carrier, thereby improving the precision of target positioning. The method for zero alignment of the mounting angle of the photoelectric platform and the aerial carrier provided by the embodiment of the invention utilizes the characteristics that the visual axis of the auto-collimation theodolite can not only receive target information, but also can send self visual axis information, the visual axis of the auto-collimation theodolite is used for respectively simulating the longitudinal axis of the aerial carrier and the visual axis of the photoelectric platform, the azimuth angle value and the pitching angle value of the auto-collimation theodolite are recorded, the azimuth angle difference delta A and the pitching angle difference delta E when the auto-collimation theodolite respectively aims at the longitudinal axis of the aerial carrier and the visual axis of the photoelectric platform are obtained, and the angle of the photoelectric platform is modified by a debugging computer, so that the azimuth axis and the pitching axis of a coordinate system of the photoelectric platform are parallel to the azimuth axis and the pitching.
Drawings
Fig. 1 is a schematic flowchart of a method for zero alignment of an installation angle of an optoelectronic platform and an aerial carrier according to an embodiment of the present invention;
FIG. 2 is a schematic top view of a calibration system corresponding to the method for zero-position alignment of mounting angles of an optoelectronic platform and a carrier according to an embodiment of the present invention;
fig. 3 is a schematic side view of a calibration system corresponding to the method for zero-position alignment of the mounting angles of the optoelectronic platform and the carrier provided in the embodiment of the present invention.
Reference numerals in the drawings indicate:
100. calibration system 1, loader 2 and photoelectric platform
3. Linear guide 4, autocollimation theodolite 5, first axis
6. Second axis 7, third axis 8, fourth axis
9. First plumb line 10, second plumb line
Detailed Description
In order to make the technical solutions of the present invention better understood, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The terms "first," "second," "third," "fourth," and the like in the description and in the claims, as well as in the drawings, if any, are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It will be appreciated that the data so used may be interchanged under appropriate circumstances such that the embodiments described herein may be practiced otherwise than as specifically illustrated or described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
As shown in fig. 1, a flow chart of a method for zero alignment of an installation angle of an optoelectronic platform and an aircraft according to an embodiment of the present invention is schematically shown. In this embodiment, the method for zero alignment of the mounting angle of the photoelectric platform and the carrier includes a plumb line setting step, a linear guide rail adjusting step, an auto-collimation theodolite aiming step, a photoelectric platform aiming step, and a debugging computer correcting step, and the general steps can be specifically described as nine steps, and the specific process is as follows.
As shown in fig. 2 and 3, the photoelectric platform installation zero position calibration (i.e., calibration system 100) includes a carrier 1, a photoelectric platform 2, an autocollimation theodolite 4, a first plumb line 9, a second plumb line 10, a linear guide rail 3, a photoelectric platform display system (not shown in the figure), a debugging computer (not shown in the figure), and other devices.
Step S1: the carrier 1 is leveled so that the longitudinal axis of the carrier 1 is parallel to the ground level, and a first plumb line 9 and a second plumb line 10 are formed in the two longitudinal axis marking points of the carrier, respectively. The longitudinal axis here is the first axis 5 shown in fig. 2. The underside of the belly of the carrier 1 has two marked points, the line between which is the longitudinal axis of the carrier 1 (i.e. the first axis 5). The first axis 5 represents the zero position of the azimuth axis of the carrier 1, and after the carrier 1 is leveled, a connecting line of two points of the same height of the first axis 5 and a horizontal plane represents the zero position of the pitching axis of the carrier. The specific process of forming the first and second plumb lines 9 and 10 is to bind the first and second plumb lines 9 and 10 at the positions of the two marking points, respectively, and to fasten a plumb bob at the lower ends of the first and second plumb lines 9 and 10, respectively.
Step S2: a linear guide 3 is arranged on the ground in extension of the longitudinal axis of the carrier 1 (i.e. the first axis 5), the direction of movement of the linear guide 3 being perpendicular to the longitudinal axis of the carrier 1 (i.e. the first axis 5).
Step S3: and fixing the auto-collimation theodolite 4 on the linear guide rail 3, and leveling the auto-collimation theodolite 4.
Step S4: the pitching direction of the autocollimation theodolite 4 is parallel to the ground horizontal plane, and the autocollimation theodolite is searched along the azimuth direction until the autocollimation theodolite is aimed at the first plumb line 9, and the autocollimation longitude at the moment are recordedAzimuth angle A of weft gauge 40. Will be at an azimuth angle A0Defined as the initial azimuth angle.
Step S5: changing the internal focusing of the autocollimation theodolite 4, enabling the pitching direction of the autocollimation theodolite 4 to be parallel to the ground horizontal plane, searching along the azimuth direction until aiming at the second plumb line 10, and recording the azimuth angle A of the autocollimation theodolite 4 at the moment1. Will be at an azimuth angle A1Is defined as a first azimuth angle.
Step S6: judging the A0And A1Whether the error is within a preset error range or not, if not, repeating the step S4 and the step S5 until the error is within the error range; otherwise, the process proceeds to step S7. In this embodiment, the predetermined error range is a0And A1A difference range of (A) to0And A1The difference of (a) is in the range of-2 "to 2". When A is0And whether a1 is within a predetermined tolerance, indicates that the self-aligning theodolite 4 is centered on the extension of the longitudinal axis (i.e., the first axis 5) of the vehicle 1.
Step S7: the pitch angle E1 of the autocollimator theodolite 4 is recorded. At this time, the visual axis of the autocollimation theodolite 4 is parallel to the longitudinal axis of the carrier 1 and is also parallel to the ground level. The pitch angle E1 is defined as a first pitch angle.
Step S8: the lighting source of the auto-collimation theodolite 4 reticle is started, and the auto-collimation theodolite 4 and the photoelectric platform 2 are respectively rotated along the azimuth direction and the pitching direction, the reticle image of the auto-collimation theodolite 4 is searched by the visible light visual axis of the photoelectric platform 2 until the center of the electric cross wire of the photoelectric platform 2 coincides with the center of the cross wire image of the auto-collimation theodolite 4 reticle. The center of the electric cross wire of the photoelectric platform 2 coincides with the center of the cross wire image of the dividing plate of the auto-collimation theodolite 4, which indicates that the visual axis of the visible light of the photoelectric platform 2 is parallel to the visual axis of the auto-collimation theodolite 4. Record the azimuth A of the autocollimator theodolite 4 at this time2And a pitch angle E2Recording the azimuth α and the pitch β of the photoelectric platform 2 at the moment to obtain the azimuth angle delta A and the pitch angle delta E between the autocollimator 4 and the photoelectric platform 22Defined as a second azimuth angle, and a pitch angle E2Defined as a second pitch angle. The specific expression of the included angle Δ a is shown in equation 1:
ΔA=A1-A2(formula 1)
The specific expression of the included pitch angle Δ E is shown in equation 2:
ΔE=E1-E2(formula 2)
Step S9: and debugging computer software to modify the azimuth angle of the photoelectric platform 2 from alpha to delta A and modify the pitch angle of the photoelectric platform from beta to-delta E.
With continued reference to fig. 2 and fig. 3, the principle of the zero alignment method for the mounting angle of the optoelectronic platform and the carrier proposed in the embodiment of the present invention is specifically described. In general, the spatial position of the coordinate origin of the photoelectric platform 2 is different from the spatial position of the coordinate origin of the carrier 1, and the center of the coordinate system of the photoelectric platform is deviated from the longitudinal axis of the carrier. The first axis 5 is the longitudinal axis of the carrier formed by two index points directly below the carrier. The second axis 6 represents the azimuthal orientation of the photovoltaic platform when the optical axis of the photovoltaic platform is parallel to the longitudinal axis. As derived from the geometrical relationship, if the azimuth angle α is Δ a, the first axis 5 is parallel to the second axis 6. Wherein alpha is the azimuth angle of the photoelectric platform when the visual axis of the photoelectric platform aims at the visual axis of the auto-collimation theodolite. And modifying the azimuth angle value of the photoelectric platform into delta A, wherein the azimuth direction of the visual axis of the photoelectric platform is parallel to the longitudinal axis of the carrier when the azimuth angle of the visual axis of the photoelectric platform is zero.
The third axis 7 is a horizontal line formed by aiming the autocollimation theodolite at the marker points of the longitudinal axis of the aircraft in the horizontal plane of the ground. The fourth axis 8 represents the pitch orientation of the photovoltaic platform when the visual axis of the photovoltaic platform is parallel to ground level. Derived from the geometrical relationship, the third axis 7 is parallel to the fourth axis 8 if the pitch angle β ═ Δ E. Wherein beta is the pitching angle of the photoelectric platform when the visual axis of the photoelectric platform aims at the visual axis of the auto-collimation theodolite. And modifying the pitch angle value of the photoelectric platform to be delta E, wherein the pitching direction of the visual axis of the photoelectric platform is parallel to the ground level when the pitch angle of the visual axis of the photoelectric platform is zero.
Further, the zero calibration error analysis of the zero alignment method for the mounting angles of the photoelectric platform and the aerial carrier proposed in the embodiments of the present invention is specifically described as follows. The photoelectric platform installation zero position calibration relates to the plumb line setting, the linear guide rail adjustment, the auto-collimation theodolite aiming, the photoelectric platform aiming, the debugging computer correction and other working processes, wherein the plumb line setting error is extremely small, and the debugging computer correction has no error and can be ignored; the contribution of the single error of other working processes to the zero calibration total error is analyzed as follows:
(1) self-collimation theodolite center deviation carrier longitudinal axis error sigmaA1Taking σA12 ", obey a normal distribution.
(2) Self-collimation theodolite azimuth aiming error sigmaA2Taking σA22 ", obey a normal distribution; pitching aiming error sigmaE2Taking σE2And 6 ", obey a normal distribution.
(3) Auto-collimation theodolite internal focusing error sigmaA3Taking σA3And 6 ", obey a normal distribution.
(4) Auto-collimation theodolite leveling error sigmaE4Taking σE4Obey an equal probability distribution, 12 ".
(5) Auto-collimation theodolite zero error sigmaE5Taking σE52 ", obey a normal distribution.
(6) Visible light visual axis azimuth aiming error sigma of photoelectric platformA6Taking σA620 ", obey a normal distribution; pitching aiming error sigmaE6Taking σE620 ", obey a normal distribution.
In summary, the zero position calibration method for the zero position alignment of the mounting angles of the photoelectric platform and the carrier provided by the embodiments of the present invention has the following steps:
Figure GDA0002580793000000071
the embodiment of the invention provides a zero position calibration pitch error of a zero position alignment method of a photoelectric platform and an aerial carrier installation angle, which comprises the following steps:
Figure GDA0002580793000000072
the method for zero alignment of the mounting angle of the photoelectric platform and the aerial carrier comprises a plumb line setting step, a linear guide rail adjusting step, an auto-collimation theodolite aiming step, a photoelectric platform aiming step and a debugging computer correcting step, ensures that the azimuth axis zero position of the photoelectric platform is parallel to the longitudinal axis of the aerial carrier, and the pitch axis zero position of the photoelectric platform is parallel to the pitch axis of the aerial carrier, thereby improving the precision of target positioning.
The method for zero alignment of the mounting angle of the photoelectric platform and the aerial carrier provided by the embodiment of the invention utilizes the characteristics that the visual axis of the auto-collimation theodolite can not only receive target information, but also can send self visual axis information, the visual axis of the auto-collimation theodolite is used for respectively simulating the longitudinal axis of the aerial carrier and the visual axis of the photoelectric platform, the azimuth angle value and the pitching angle value of the auto-collimation theodolite are recorded, the azimuth angle difference delta A and the pitching angle difference delta E when the auto-collimation theodolite respectively aims at the longitudinal axis of the aerial carrier and the visual axis of the photoelectric platform are obtained, and the angle of the photoelectric platform is modified by a debugging computer, so that the azimuth axis and the pitching axis of a coordinate system of the photoelectric platform are parallel to the azimuth axis and the pitching.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made to the above embodiments by those of ordinary skill in the art within the scope of the present invention.

Claims (7)

1. A method for zero alignment of an opto-electronic platform with an onboard installation angle, the method comprising the steps of:
step S1: leveling the carrier so that the longitudinal axis of the carrier is parallel to the ground level, and then forming a first plumb line and a second plumb line on two longitudinal axis mark points of the carrier respectively;
step S2: arranging a linear guide rail on the ground of the extension line of the longitudinal axis of the carrier, wherein the motion direction of the linear guide rail is perpendicular to the longitudinal axis of the carrier;
step S3: fixing an auto-collimation theodolite on the linear guide rail, and leveling the auto-collimation theodolite;
step S4: will the pitch direction of autocollimation theodolite is on a parallel with the ground horizontal plane to search along the azimuth direction, until aim first plumb line, and the azimuth angle A of the autocollimation theodolite at this moment of record0
Step S5: change the internal focusing of auto-collimation theodolite, and will the pitch direction of auto-collimation theodolite is on a parallel with the ground horizontal plane, searches along the azimuth direction, until aiming the second plumb line, the azimuth angle A of the auto-collimation theodolite at this moment of record1
Step S6: judging the A0And A1Whether the error value is within the preset error range or not, if not, repeating the step S4 and the step S5 until the A is within the preset error range0And A1Within the error range;
step S7: recording the pitch angle E of the autocollimation theodolite1
Step S8: starting an illumination light source of the auto-collimation theodolite reticle, rotating the auto-collimation theodolite and the photoelectric platform along the azimuth direction and the pitching direction respectively, and searching a reticle image of the auto-collimation theodolite by using a visible light visual axis of the photoelectric platform until the center of an electric cross wire of the photoelectric platform is coincided with the center of a cross wire image of the auto-collimation theodolite reticle; record the azimuth A of the autocollimation theodolite at this time2And a pitch angle E2Recording the azimuth angle α and the pitch angle β of the photoelectric platform at the moment to obtain an azimuth included angle delta A and a pitch included angle delta E between the autocollimator and the photoelectric platform;
step S9: and debugging computer software to modify the azimuth angle of the photoelectric platform from alpha to delta A and modify the pitch angle of the photoelectric platform from beta to-delta E.
2. The method of claim 1, wherein the step of forming the first and second plumb lines in step S1 is performed by binding the first and second plumb lines at the two marked points, respectively, and attaching a weight to the lower ends of the first and second plumb lines.
3. The method for zero alignment of an angle of installation between an optoelectronic platform and a carrier as claimed in claim 1, wherein the predetermined error range of step S6 is a0And A1A difference range of (A) to0And A1The difference of (a) is in the range of-2 "to 2".
4. The method of claim 1, wherein the included angle Δ a ═ a is used to null-align the mounting angles of the photovoltaic platform and the carrier1-A2
5. The method of claim 1, wherein the included angle Δ E-E is E1-E2
6. The method of claim 1, wherein the zero calibration of the method for zero alignment of an opto-electronic platform with an angle of installation of an aircraft has an azimuth error of
Figure FDA0002580792990000021
Wherein σA1Error of self-collimation theodolite center from longitudinal axis of carrier, sigmaA2For auto-collimation theodolite azimuth aiming error, sigmaA3For self-collimating theodolite internal focusing errors, sigmaA6Aiming error of visible light visual axis orientation of the photoelectric platform.
7. The method of claim 1, wherein the zero calibration pitch error of the method for zero alignment of an opto-electronic platform with an aircraft installation angle is
Figure FDA0002580792990000022
Wherein σE2For auto-collimation theodolite pitch sighting error, sigmaE4For auto-collimation theodolite levelling errors, sigmaE5For auto-collimation theodolite zero error, σE6The pitching aiming error of the visual axis of the visible light of the photoelectric platform is obtained.
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