CN108818321A - Self-cleaning type nano colloid jet polishing device - Google Patents
Self-cleaning type nano colloid jet polishing device Download PDFInfo
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- CN108818321A CN108818321A CN201810711262.7A CN201810711262A CN108818321A CN 108818321 A CN108818321 A CN 108818321A CN 201810711262 A CN201810711262 A CN 201810711262A CN 108818321 A CN108818321 A CN 108818321A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B24C1/08—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for polishing surfaces, e.g. smoothing a surface by making use of liquid-borne abrasives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C5/00—Devices or accessories for generating abrasive blasts
- B24C5/02—Blast guns, e.g. for generating high velocity abrasive fluid jets for cutting materials
- B24C5/04—Nozzles therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C7/00—Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C9/00—Appurtenances of abrasive blasting machines or devices, e.g. working chambers, arrangements for handling used abrasive material
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
A self-cleaning nano colloid jet polishing device is disclosed, wherein a plunger pump (4) is arranged on a first pipeline and a second pipeline (1, 5), a nano colloid container (1) is connected with the first pipeline and a fifth pipeline (1, 21), a cleaning device (23) is connected with a sixth pipeline and a seventh pipeline (22, 27), a pressurizing energy accumulator (8) is arranged on the third pipeline and the fourth pipeline (7, 9), a cavitation jet nozzle (14) is arranged at the tail end of the fourth pipeline (9), and a laser sensor (29) is respectively arranged at the third pipeline, the fifth pipeline and the nozzle and is arranged in a non-contact way. The invention solves the problems of easy sedimentation and pollution of nano colloid, discontinuous nano colloid liquid flow injection, complex cleaning and maintenance of the device, low optical element jet polishing efficiency and the like in the common nano colloid jet device, and realizes the closed circulation of nano colloid solution.
Description
Technical field
The invention belongs to optical element super smooth surface processing fields, more particularly to a kind of flow shooting and polishing device.
Background technique
Nano colloid flow shooting polishing is a kind of novel optical element polishing side being derived from the polishing of micro- abradant jet
Method is acted on by chemical bonding effect and fluid shearing, and the atom level removal of optical element surface material may be implemented.It removed
The Cheng Zhong ,-OH in nano-colloid make the atom activation of element surface in conjunction with the atom of element surface, in nano-sized colloidal solution
Nano particle is combined with-the OH in nano-colloid, and nano-colloid particle passes through the conversion of itself kinetic energy and member after nozzle sprays
Part surface atom is firmly combined by chemical bond, under the action of nano-colloid hydrodynamic shear, element surface atom and other
Chemical bond rupture between atom is brought away from element surface with nano-colloid particle, to realize the removal of material.
Nano colloid flow shooting polishing is to realize optical element surface former material by chemical bonding effect and fluid shearing effect
The removal of material, but in conventional fluidic polishing process, nano-colloid is easily in conjunction with other external substances or by self pump
Body greasy dirt is polluted, and after the completion of polishing, the nano particle in nano-sized colloidal solution is easy to be deposited on inside pipeline and burnishing device,
Device is blocked, polishing efficiency and the service life of device are influenced.
Traditional Jet Polishing, due to the limitation of technique and device, process low efficiency；Due to plunger in polishing process
Pump stroke limits, and liquid stream cannot be guaranteed that continuously, the energy of device is also not easily susceptible to control in jet process, the optics member after processing
The fluctuation of part surface quality is larger；The device of polishing process and cleaning process discontinuously and after polishing cleans complicated, nano-colloid
Grain is easy deposition, influences processing of the follow up device to optical element.Therefore how guarantee polishing process in nano-sized colloidal solution
It is not contaminated, how after a polish effective cleaning and polishing device, how how to guarantee the continuity of liquid stream in polishing process
The efficiency for improving polishing process is the nano colloid flow shooting polishing technical issues that need to address.
Summary of the invention
The purpose of the present invention is to solve nano-sized colloidal solutions present in conventional fluidic polishing to be easy contaminated, jet stream
Liquid stream is discontinuous in the process, equipment not easy cleaning and cleaning process and polishing process is discontinuous, processing optical is first after the completion of polishing
The problems such as efficiency is low when part provides a kind of self-cleaning type nano colloid flow shooting and polishing device.
The technical scheme is that a kind of self-cleaning type nano colloid flow shooting and polishing device, it includes that nano-colloid holds
Device, the first pipeline, the first two-bit triplet control valve, metering-type plunger pump, the second pipeline, pressure gauge, third pipeline, pressurization accumulation of energy
Device, the 4th pipeline, bracket, fixed device, first axis guide rail, portal frame, nozzle, polishing trough, polished element, fixture, dragon
Door lathe base, the second axial guidance, workbench, the 5th pipeline, the 6th pipeline, cleaning device, the first converter valve, the second two
Three-way control valve, the second converter valve, the 7th pipeline, lifting apparatus, laser sensor, valve control device, polishing trough outlet and
Third axial guidance；Nano-colloid container tool is there are two seal, and one of first pipeline and nano-colloid container
Seal connection, seal diameter are greater than the pipeline diameter being attached thereto；The cleaning device is through the 7th piping connection to setting
The first two-bit triplet control valve on the first pipeline；The other end of first pipeline is successively through the second pipeline, third pipeline, the 4th
Pipeline is connect with the nozzle being arranged in above polishing trough；5th pipeline is connected with another seal of nano-colloid container,
Seal diameter is greater than pipeline diameter；The other end of 5th pipeline and the polishing trough of polishing trough are exported and are connected；Described 6th
The connection of the seal of pipeline and cleaning device；The connection of another seal of 7th pipeline and cleaning device；6th pipe
The other end on road is set the second two-bit triplet control valve and the 5th piping connection on the 5th pipeline；The metering-type plunger
Pump is arranged on the access between the first pipeline and the second pipeline；The pressure gauge is arranged between the second pipeline and third pipeline
Access on；The supercharging accumulator is arranged on the access between third pipeline and the 4th pipeline, for eliminating metering-type column
Influence of the plug pump to liquid stream, stablizes liquid stream, keeps liquid stream continuous, while promoting the pressure of spray liquid flow；The nozzle passes through fixation
Device is fixed on bracket, and the bracket is fixedly connected with removable third axial guidance, the third axial guidance and first
Axial guidance is flexibly connected, and the first axis guide rail is fixedly connected with portal frame, to realize that nozzle can be with third axial guidance
It moves up and down；The fixture bottom end is fixedly connected through polishing trough with workbench, and fixture upper end is located in polishing trough, polishing trough bottom
Portion and fixture interface use rubber seal, the workbench and removable second axial guidance being mounted on portal frame pedestal
It is fixedly connected, to realize that polishing trough can be mobile with the second axial guidance；First converter valve is mounted on the 6th pipeline；It is described
Second converter valve is mounted on the 7th pipeline；The connecting pin of first pipeline and nano-colloid container, the 7th pipeline and cleaning
The connecting pin of device is equipped with lifting apparatus, for promoting connecting pin and the 7th pipe of the first pipeline and nano-colloid container
The connecting pin on road and cleaning device；The first two-bit triplet control valve, the second two-bit triplet control valve, the first converter valve,
It is equipped with valve control device in two converter valves, to control the liquid flow direction by valve, the converter valve, two-bit triplet control
Valve is used to convert liquid stream；
The laser sensor is mounted at third pipeline, the 5th pipeline and nozzle.
Further, apparatus of the present invention further include computer control system, and the computer control system is respectively with first
Axial guidance, the second axial guidance, third axial guidance, lifting apparatus, laser sensor are connected with valve control device, are used for
Control first axis guide rail, the second axial guidance, third axial guidance, the movement of lifting apparatus and valve control device and right
The data that laser sensor is collected are for statistical analysis, to realize automatic control and data analysis.
Further, above-mentioned nano-colloid container is ultrasonic cleaning instrument, or the closed container to be connected with ticker.
Further, the material of above-mentioned ultrasonic cleaning instrument is stainless steel or PE plastics, is cleaned by ultrasonic the capacity 6L of instrument, function
Rate 180W, supersonic frequency 40KHz.
Further, said nozzle is the Cavitation jet nozzle of jet port diameter 0.5mm.
It further, include guide vane wheel in above-mentioned Cavitation jet nozzle contraction section.
Further, above-mentioned first pipeline, the second pipeline, third pipeline, the 4th pipeline, the 5th pipeline, the 6th pipeline,
Seven pipelines are rubber material, and the metering-type plunger pump, pressure gauge, supercharging accumulator and nozzle pass through reducing pipe coupling and pipe
Road is connected, and interface is sealed using raw material band；The converter valve and line connection and the two-bit triplet control valve and pipeline
Junction is all made of raw material band sealing.
Further, above-mentioned laser sensor is installed as non-contact installation at third pipeline, the 5th pipeline and nozzle,
Away from nozzle and pipeline about 0.5-1.5cm, for measuring the internal diameter of third pipeline and the 5th pipeline and nozzle.
Further, above-mentioned lifting apparatus includes motor, receiver, controller and metal arm, the motor respectively with
Controller is connected with metal arm, for the lower driving metal arm movement of controller control；The receiver respectively with computer control
System (30) processed is connected with controller, for receiving the signal of computer control system (30) and transmitting a signal to control
Device.
Further, above-mentioned cleaning device is PE plastic barrel.
Compared with prior art, self-cleaning type nano colloid flow shooting and polishing device of the invention has the advantage that：
1, hydraulic pump is replaced using metering-type plunger pump, avoids nano-colloid polishing fluid with high pressure and transmits connecing for hydraulic oil
Touching prevents nano-sized colloidal solution contaminated, and the application of metering-type plunger pump and pressure gauge is so that pressure energy is pressed during the polishing process
It is required that being controlled；
2, the application of supercharging accumulator makes the liquid stream of nano-colloid spray continuous and energy-controllable, ensure that in polishing process
The continuity of middle liquid stream, the optical element after polishing can obtain preferable surface quality；
3, Cavitation jet nozzle can generate a large amount of microvesicle in jet process, and microvesicle is in uphill process due to air pressure
Reduction leads to its rupture, and microbubble ruptures generate TRANSIENT HIGH TEMPERATURE high pressure, this increases-the OH in colloidal solution, the moment of liquid stream
Flow velocity also up to 1000m/s, enhances the contact of colloidal solution with element surface material, thus during increasing Jet Polishing
Polishing efficiency；
4, after polishing process, the automatic signal piping internal diameter thickness of laser sensor, computer analyzes inside pipe wall nanometer
Colloid residual quantity, control lifting apparatus operation, lift line, to be cleaned to entire burnishing device, polishing process and clear
Cheng Lianxu is washed, avoiding colloidal solid and stopping for a long time in equipment and pipeline causes particle to deposit, and influence makes next time
With having substantially carried out automation so that polishing process and cleaning process are continuous；
5, the use for being cleaned by ultrasonic instrument avoids the deposition of nano-colloid particle in polishing process；
6, the design of immersion polishing avoids nano-sized colloidal solution in polishing process and splashes；
7, in entire polishing process, whole device is in the state of relative closure, avoids nano-sized colloidal solution with outer
The contact of portion's environment, polishing process and cleaning process are manipulated by computer control system, and polishing need to be only inputted before polishing
Time and scavenging period.
Nano colloid flow shooting and polishing device structure of the invention is simple, high reliablity, it is high in machining efficiency, polish and cleaned
Cheng Jiben, which is realized, to be automated, is easily controllable, can be applied to the ultra-smooth with monocrystalline silicon, fused quartz etc. for the optical element of material
Surface processing.
Detailed description of the invention
From the detailed description with reference to the accompanying drawing to the embodiment of the present invention, these and/or other aspects of the invention and
Advantage will become clearer and be easier to understand, wherein：
Fig. 1 Fig. 1 is nano colloid flow shooting and polishing device structural schematic diagram in the embodiment of the present invention；
Wherein：1- nano-colloid container, the first pipeline of 2-, the first two-bit triplet of 3- control valve, 4- metering-type plunger pump, 5-
Second pipeline, 6- pressure gauge, 7- third pipeline, 8- supercharging accumulator, the 4th pipeline of 9-, 10- bracket, 11- fixed device, 12-
First axis guide rail, 13- portal frame, 14- nozzle, 15- polishing trough, the polished element of 16-, 17- fixture, 18- Longmen machine tool bottom
Seat, the second axial guidance of 19-, 20- workbench, the 5th pipeline of 21-, the 6th pipeline of 22-, 23- cleaning device, first change of current of 24-
Valve, the second two-bit triplet of 25- control valve, the second converter valve of 26-, the 7th pipeline of 27-, 28- lifting apparatus, 29- laser sensor,
30- computer control system, 31- valve control device, the outlet of 32- polishing trough, 33- third axial guidance；
Fig. 2 is cavitation of embodiment of the present invention fluidic nozzle configurations schematic diagram；
Fig. 3 is the shape and structure schematic diagram for the guide vane wheel being arranged in nozzle in the embodiment of the present invention.
Specific embodiment
In order to make those skilled in the art more fully understand the present invention, with reference to the accompanying drawings and detailed description to this hair
It is bright to be described in further detail.
A kind of self-cleaning type nano colloid flow shooting and polishing device, as shown in Fig. 1, it includes nano-colloid container 1, first
Pipeline 2, the first two-bit triplet control valve 3, metering-type plunger pump 4, the second pipeline 5, pressure gauge 6, third pipeline 7, pressurization accumulation of energy
Device 8, the 4th pipeline 9, bracket 10, fixed device 11, first axis guide rail 12, portal frame 13, nozzle 14, polishing trough 15, wait throw
Optical element 16, fixture 17, Longmen machine tool pedestal 18, the second axial guidance 19, workbench 20, the 5th pipeline 21, the 6th pipeline 22,
Cleaning device 23, the first converter valve 24, the second two-bit triplet control valve 25, the second converter valve 26, the 7th pipeline 27, lifting apparatus
28, laser sensor 29, computer control system 30, valve control device 31, polishing trough outlet 32 and third axial guidance 33；
The connection relationship and function of each section described below：
The nano-colloid container 1 is ultrasonic cleaning instrument, or the closed container to be connected with ticker, when it is ultrasound
When cleaning device, the material for being cleaned by ultrasonic instrument is stainless steel, capacity 6L, power 180W, supersonic frequency 40KHz, nano-colloid appearance
There are two seals for device 1；
First pipeline 2 is connect with a seal of nano-colloid container 1, and seal diameter is greater than pipeline diameter；
The cleaning device 23 is connected to the first two-bit triplet control valve 3 being arranged on the first pipeline 2, cleaning dress through the 7th pipeline 27
23 are set as PE plastic barrel, built-in cleaning solution is the NaOH solution of 0.1mol/L；The other end of first pipeline 2 is successively through the second pipeline
5, third pipeline 7, the 4th pipeline 9 are connect with the nozzle 14 that 15 top of polishing trough is arranged in, and the nozzle 14 is for spraying liquid
It is mapped on polished element 16, the shape and structure of nozzle 14 is as shown in Fig. 2, the sky of the preferred jet port diameter 0.5mm of nozzle 14
Change jet nozzle, include guide vane wheel in Cavitation jet nozzle contraction section as shown in Fig. 3, flowed to for changing injection liquid,
It avoids vertically being splashed to from the liquid that nozzle 14 ejects on polished element 16；Polishing trough 15 is opposite with the position of nozzle 14
It answers, nozzle 14 is immersed in the nano-sized colloidal solution in polishing trough 15 when polishing, and polishing trough is in polishing, liquid level of solution in slot
Higher than polished workpiece, and liquid level is away from polished workpiece surface about 3-5cm；
5th pipeline 21 is connected with another seal of nano-colloid container 1, and seal diameter is greater than pipeline diameter；
The other end of 5th pipeline 21 is connect with the polishing trough of polishing trough 15 outlet 32；6th pipeline 22 and cleaning device 23
Seal connection；7th pipeline 27 is connect with another seal of cleaning device 23；6th pipeline 22 it is another
The second two-bit triplet control valve 25 being set on the 5th pipeline 21 is held to connect with the 5th pipeline 21；
The metering-type plunger pump 4 is arranged on the access between the first pipeline 2 and the second pipeline 5；
The pressure gauge 6 is arranged on the access between the second pipeline 5 and third pipeline 7；
The supercharging accumulator 8 is arranged on the access between third pipeline 7 and the 4th pipeline 9, for eliminating metering-type
Influence of the plunger pump 4 to liquid stream stablizes liquid stream, keeps liquid stream continuous, while promoting the pressure of spray liquid flow；
The nozzle 14 is affixed over the mount 10 by fixed device 11, the bracket 10 and removable third axial guidance
33 are fixedly connected, and the third axial guidance 33 is flexibly connected with first axis guide rail 12, the first axis guide rail 12 and dragon
Door frame 13 is fixedly connected, to realize that nozzle 14 can be moved up and down with third axial guidance 33；
17 bottom end of fixture is fixedly connected through polishing trough 15 with workbench 20, and 17 upper end of fixture is located at polishing trough 15
In, 15 bottom of polishing trough and 17 interface of fixture use rubber seal, the workbench 20 be mounted on portal frame pedestal 18
Removable second axial guidance 19 be fixedly connected, to realize that polishing trough 15 can be mobile with the second axial guidance 19；
First converter valve 24 is mounted on the 6th pipeline 22；Second converter valve 26 is mounted on the 7th pipeline 27
On；
The connecting pin of first pipeline 2 and nano-colloid container 1, the connecting pin of the 7th pipeline 27 and cleaning device 23 are equal
Equipped with lifting apparatus 28, lifting apparatus 28 includes motor, receiver, controller and metal arm, for promoting the first pipeline 2 and receiving
The connecting pin of rice gel container 1 and the connecting pin of the 7th pipeline 27 and cleaning device 23；
Above-mentioned first pipeline 1, the second pipeline 5, third pipeline 7, the 4th pipeline 9, the 5th pipeline 21, the 6th pipeline 22,
Seven pipelines 27 are rubber material, and the metering-type plunger pump 4, pressure gauge 6, supercharging accumulator 8 and nozzle 14 pass through reducing
Pipe collar is connected with pipeline, and interface is sealed using raw material band；The converter valve 24,26 and line connection and the two-bit triplet
Control valve 3,25 and line connection are all made of raw material band sealing；
The first two-bit triplet control valve 3, the second two-bit triplet control valve 25, the first converter valve 24, the second converter valve
Valve control device 31 is equipped in 26, to control the liquid flow direction by valve, the converter valve 24,26, two-bit triplet control
Valve 3,25 processed is used to convert liquid stream；
The laser sensor 29 is mounted at third pipeline 7, the 5th pipeline 21 and nozzle 14；It is in third pipeline 9,
When being installed at five pipelines 21 and nozzle 14, does not contact with the pipeline and nozzle, away from nozzle and pipeline about 0.5-1.5cm, be used for
The internal diameter of third pipeline 7 and the 5th pipeline 21 and the internal diameter of nozzle 14 are measured, whether inner wall is judged according to the variation of internal diameter
There is residue；
The computer control system 30 respectively with first axis guide rail 12, the second axial guidance 19, third axial guidance
33, lifting apparatus 28, laser sensor 29 are connected with valve control device 31, for controlling first axis guide rail 12, the second axis
Direction guiding rail 19, third axial guidance, the movement of lifting apparatus 28 and valve control device 31 and laser sensor 29 is collected
Data it is for statistical analysis, thus realize automatic control and data analysis.
The course of work for illustrating nano colloid flow shooting and polishing device of the present invention below with reference to Fig. 1 and Fig. 2, generally comprise with
Lower step：
1, polished element 16 is mounted on fixture 17, first axle is adjusted by the computer control system of numerically-controlled machine tool
Direction guiding rail 12 and third axial guidance 33 make nozzle 14 make nozzle 14 in water in vertical direction movement, the second axial guidance 19 of adjusting
Square to movement, so that nozzle 14 is moved to suitable position；
2, nano-sized colloidal solution is injected into nano-colloid container 1 and polishing trough 15, until liquid level is by polished element 16
It is totally submerged with nozzle 14, when injecting nano-sized colloidal solution to polishing trough 15, liquid level closes nanometer away from element surface about 3-5cm
The liquid injection port of gel container 1 and polishing trough 15；
3, manipulation 30 control valve control device 31 of computer control system opens the first two-bit triplet control valve 3 and second
Two-bit triplet control valve 25 is closed the first converter valve 24 and the second converter valve 26, is made between nano-colloid container 1 and polishing trough 15
Fluid passage open, the fluid passage between cleaning device 23 and other devices and pipeline is closed, open pressurization accumulation of energy manually
Device 8 opens metering-type plunger pump 4 manually after stablizing, observe 6 registration of pressure gauge, adjusts 4 flow of metering-type plunger pump to pipe internal pressure
Power meets processing request；
4, into computer control system 31 input running track and polishing time instruction, make nozzle 14 and workbench 20 by
It is run according to the track being pre-designed and determines the time；
5, after polishing, the lifting apparatus 28 that computer control system 30 automatically controls 2 position of the first pipeline promotes the
The arrival end of one pipeline 2 recycles the nanometer in polishing trough 15 and pipeline and component by polishing trough outlet 32 and the 5th pipeline 21
Colloidal solution is into nano-colloid container 1；
6, it keeps metering-type plunger pump 4 and supercharging accumulator 8 to run, polished element 16 is taken out from polishing trough 15, is taken
The time of element can voluntarily input according to actual needs to computer control system 30 and instruct out；
7,29 signal piping inner wall nano-colloid of laser sensor remains, 30 autocontrol valve of computer control system gate
Device 31 processed, which adjusts the first two-bit triplet control valve 3 and the second two-bit triplet control valve 25, makes the 6th pipeline 22, the 7th pipeline 27
It is communicated with connecting line, opens the first converter valve 24 and the second converter valve 26, keep cleaning device 23 and polishing trough 15 and fluid logical
Road opens, closes the fluid passage of nano gel container 1 and other devices, cleans package unit by the determining time；
8, after cleaning, computer control system 31 controls the lifting apparatus 28 at 27 position of the 7th pipeline and promotes the 7th
27 arrival end of pipeline exports the 32, the 5th pipeline 21 and the 6th pipeline 22 by polishing trough, recycles polishing trough 15 and pipeline and component
In waste liquid into cleaning device 23；
9, supercharging accumulator 8 and metering-type plunger pump 4 is turned off manually, it is axial to manually adjust first axis guide rail 12, second
Guide rail 19 and third axial guidance 33 make nozzle 14 and workbench 20 be placed in suitable position, and control system of shutting down computer 31 is opened
It closes.
The installation of the present invention pipeline and valve in the actual operation process can be adjusted as the case may be.
Various embodiments of the present invention are described above, above description is exemplary, and non-exclusive, and
It is not limited to disclosed each embodiment.Without departing from the scope and spirit of illustrated each embodiment, for this skill
Many modifications and changes are obvious for the those of ordinary skill in art field.Therefore, protection scope of the present invention is answered
This is subject to the protection scope in claims.
Claims (10)
1. a kind of self-cleaning type nano colloid flow shooting and polishing device, which is characterized in that it includes nano-colloid container (1), first
Pipeline (2), the first two-bit triplet control valve (3), metering-type plunger pump (4), the second pipeline (5), pressure gauge (6), third pipeline
(7), supercharging accumulator (8), the 4th pipeline (9), bracket (10), fixed device (11), first axis guide rail (12), portal frame
(13), nozzle (14), polishing trough (15), polished element (16), fixture (17), Longmen machine tool pedestal (18), second are axially led
Rail (19), workbench (20), the 5th pipeline (21), the 6th pipeline (22), cleaning device (23), the first converter valve (24), second
Two-bit triplet control valve (25), the second converter valve (26), the 7th pipeline (27), lifting apparatus (28), laser sensor (29), valve
Controlling device for doors (31), polishing trough outlet (32) and third axial guidance (33)；
The nano-colloid container (1) tool is there are two seal, and one of first pipeline (2) and nano-colloid container (1)
Seal connection, the seal diameter are greater than the first pipeline (2) diameter；The cleaning device (23) connects through the 7th pipeline (27)
It is connected to the first two-bit triplet control valve (3) being arranged on the first pipeline (2)；The other end of first pipeline (2) is successively through second
Pipeline (5), third pipeline (7), the 4th pipeline (9) are connect with the nozzle (14) being arranged above polishing trough (15)；Described 5th
Pipeline (21) is connected with another seal of nano-colloid container (1), and seal diameter is greater than pipeline diameter；5th pipeline
(21) the other end is connect with the polishing trough of polishing trough (15) outlet (32)；6th pipeline (22) and cleaning device (23)
Seal connection；7th pipeline (27) connect with another seal of cleaning device (23)；6th pipeline (22)
The other end is set the second two-bit triplet control valve (25) on the 5th pipeline (21) and connect with the 5th pipeline (21)；
On the access that the metering-type plunger pump (4) is arranged between the first pipeline (2) and the second pipeline (5)；
On the access that the pressure gauge (6) is arranged between the second pipeline (5) and third pipeline (7)；
On the access that the supercharging accumulator (8) is arranged between third pipeline (7) and the 4th pipeline (9), for eliminating metering
Influence of the formula plunger pump (4) to liquid stream stablizes liquid stream, keeps liquid stream continuous, while promoting the pressure of spray liquid flow；
The nozzle (14) passes through fixed device (11) and is fixed on bracket (10), and the bracket (10) and removable third are axial
Guide rail (33) is fixedly connected, and the third axial guidance (33) is flexibly connected with first axis guide rail (12), the first axis
Guide rail (12) is fixedly connected with portal frame (13), to realize that nozzle (14) can be moved up and down with third axial guidance (33)；
Fixture (17) bottom end is fixedly connected through polishing trough (15) with workbench (20), and fixture (17) upper end is located at polishing trough
(15) in, polishing trough (15) bottom and fixture (17) interface use rubber seal, the workbench (20) and are mounted on gantry
Removable second axial guidance (19) on frame pedestal (18) are fixedly connected, to realize that polishing trough (15) can be with the second axial guidance
(19) mobile；
First converter valve (24) is mounted on the 6th pipeline (22)；Second converter valve (26) is mounted on the 7th pipeline
(27) on；
The connection of the connecting pin, the 7th pipeline (27) and cleaning device (23) of first pipeline (2) and nano-colloid container (1)
End is equipped with lifting apparatus (28), for promoting connecting pin and the 7th pipe of the first pipeline (2) and nano-colloid container (1)
The connecting pin on road (27) and cleaning device (23)；
The first two-bit triplet control valve (3), the second two-bit triplet control valve (25), the first converter valve (24), second change of current
Valve control device (31) are equipped in valve (26), to control the liquid flow direction by valve, the converter valve (24,26), two
Position three-way control valve (3,25) is used to convert liquid stream；
The laser sensor (29) respectively third pipeline (7), the 5th pipeline (21) pipeline on the outside of and nozzle (14) at pacify
Dress, for measuring the internal diameter of third pipeline (7) and the 5th pipeline (21) and nozzle (14).
2. self-cleaning type nano colloid flow shooting and polishing device according to claim 1, which is characterized in that further include computer
Control system (30), the computer control system (30) respectively with first axis guide rail (12), the second axial guidance (19),
Three axial guidances (33), lifting apparatus (28), laser sensor (29) are connected with valve control device (31), for controlling first
Axial guidance (12), the second axial guidance (19), third axial guidance (33), lifting apparatus (28) and valve control device (31)
Movement and to laser sensor (29) collect data it is for statistical analysis, thus realize automatic control and data analysis.
3. self-cleaning type nano colloid flow shooting and polishing device according to claim 1, it is characterised in that：The nano-colloid
Container (1) is ultrasonic cleaning instrument, or the closed container to be connected with ticker.
4. self-cleaning type nano colloid flow shooting and polishing device according to claim 1, it is characterised in that：The nozzle (14)
For the Cavitation jet nozzle of jet port diameter 0.5mm.
5. a kind of self-cleaning type nano colloid flow shooting and polishing device according to claim 4, it is characterised in that：The cavitation
It include guide vane wheel in jet nozzle contraction section.
6. a kind of self-cleaning type nano colloid flow shooting and polishing device according to claim 1, it is characterised in that：Described first
Pipeline (1), the second pipeline (5), third pipeline (7), the 4th pipeline (9), the 5th pipeline (21), the 6th pipeline (22), the 7th pipe
Road (27) is rubber material, and the metering-type plunger pump (4), pressure gauge (6), supercharging accumulator (8) and nozzle (14) are logical
It crosses reducing pipe coupling to be connected with pipeline, interface is sealed using raw material band；The converter valve (24,26) and line connection and described
Two-bit triplet control valve (3,25) and line connection are all made of raw material band sealing.
7. a kind of self-cleaning type nano colloid flow shooting and polishing device according to claim 1, it is characterised in that：The laser
Sensor is installed as non-contact installation at third pipeline (9), the 5th pipeline (21) and nozzle (14), away from the pipeline (9,
And nozzle (14) about 0.5-1.5cm 21).
8. a kind of self-cleaning type nano colloid flow shooting and polishing device according to claim 1, it is characterised in that：The lift
Rising device (28) includes motor, receiver, controller and metal arm, and the motor is connected with controller and metal arm respectively,
Lower driving metal arm movement is controlled for controller；The receiver is connected with computer control system (30) and controller respectively
It connects, for receiving the signal of computer control system (30) and transmitting a signal to controller.
9. self-cleaning type nano colloid flow shooting and polishing device according to claim 1, it is characterised in that：The cleaning device
It (23) is PE plastic barrel.
10. self-cleaning type nano colloid flow shooting and polishing device according to claim 3, which is characterized in that the ultrasound is clear
The material for washing instrument is stainless steel or PE plastics, is cleaned by ultrasonic the capacity 6L of instrument, power 180W, supersonic frequency 40KHz.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109773662A (en) * | 2019-02-21 | 2019-05-21 | 上海理工大学 | Using the inner hole of workpiece burnishing device of abrasive water-jet |
| CN111421472A (en) * | 2020-03-04 | 2020-07-17 | 兰州理工大学 | Method for processing ultra-smooth surface by coupling photoelectric synergistic catalysis with colloid jet |
| CN115814981A (en) * | 2022-12-27 | 2023-03-21 | 北京科技大学 | Surface treatment device and surface treatment method |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101462256A (en) * | 2009-01-15 | 2009-06-24 | 哈尔滨工业大学 | Method for polishing element surface using nano colloid jet flow |
| JP2010110889A (en) * | 2000-12-21 | 2010-05-20 | Qed Technologies Internatl Inc | Finishing device for substrate surface with jet |
| CN103286694A (en) * | 2012-03-03 | 2013-09-11 | 兰州理工大学 | Method for ultra-smooth surface processing through ultraviolet-light-induced nano-particle colloid jet flow |
| CN104946871A (en) * | 2014-03-26 | 2015-09-30 | 南京遂诺纳米科技有限公司 | Nano-crystallization device for centrifugal accelerating injection bombardment of metal surfaces |
| CN104999380A (en) * | 2015-07-23 | 2015-10-28 | 长春理工大学 | Abrasive flow polishing device for mold processing |
| JP2016034640A (en) * | 2015-10-02 | 2016-03-17 | 株式会社新光化学工業所 | Composite metal nanoparticle colloid, composite metal nanoparticle, production method of composite metal nanoparticle colloid, production method of composite metal nanoparticle, and apparatus for producing composite metal nanoparticle colloid |
| CN107159542A (en) * | 2017-06-29 | 2017-09-15 | 常州市新创复合材料有限公司 | A kind of sheet metal high-energy shot carbon fiber spraying method |
-
2018
- 2018-07-03 CN CN201810711262.7A patent/CN108818321B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010110889A (en) * | 2000-12-21 | 2010-05-20 | Qed Technologies Internatl Inc | Finishing device for substrate surface with jet |
| CN101462256A (en) * | 2009-01-15 | 2009-06-24 | 哈尔滨工业大学 | Method for polishing element surface using nano colloid jet flow |
| CN103286694A (en) * | 2012-03-03 | 2013-09-11 | 兰州理工大学 | Method for ultra-smooth surface processing through ultraviolet-light-induced nano-particle colloid jet flow |
| CN104946871A (en) * | 2014-03-26 | 2015-09-30 | 南京遂诺纳米科技有限公司 | Nano-crystallization device for centrifugal accelerating injection bombardment of metal surfaces |
| CN104999380A (en) * | 2015-07-23 | 2015-10-28 | 长春理工大学 | Abrasive flow polishing device for mold processing |
| JP2016034640A (en) * | 2015-10-02 | 2016-03-17 | 株式会社新光化学工業所 | Composite metal nanoparticle colloid, composite metal nanoparticle, production method of composite metal nanoparticle colloid, production method of composite metal nanoparticle, and apparatus for producing composite metal nanoparticle colloid |
| CN107159542A (en) * | 2017-06-29 | 2017-09-15 | 常州市新创复合材料有限公司 | A kind of sheet metal high-energy shot carbon fiber spraying method |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109773662A (en) * | 2019-02-21 | 2019-05-21 | 上海理工大学 | Using the inner hole of workpiece burnishing device of abrasive water-jet |
| CN111421472A (en) * | 2020-03-04 | 2020-07-17 | 兰州理工大学 | Method for processing ultra-smooth surface by coupling photoelectric synergistic catalysis with colloid jet |
| CN115814981A (en) * | 2022-12-27 | 2023-03-21 | 北京科技大学 | Surface treatment device and surface treatment method |
| CN115814981B (en) * | 2022-12-27 | 2024-01-19 | 北京科技大学 | Surface treatment device and surface treatment method |
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| CN108818321B (en) | 2019-05-24 |
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