CN108152940B - Catadioptric optical system, illumination optical system, and exposure apparatus

Info

Abstract

Description

Claims

CN108152940B

Publication number: CN108152940B
Application number: CN201711263241.5A
Authority: CN
Inventors: 大阪昇
Original assignee: Canon Inc
Current assignee: Canon Inc
Priority date: 2016-12-05
Filing date: 2017-12-05
Publication date: 2021-04-27
Anticipated expiration: 2037-12-05
Also published as: CN108152940A

The invention relates to a catadioptric optical system, an illumination optical system, and an exposure apparatus. The catadioptric optical system, which is telecentric at the object plane and the image plane, includes: a 1 st reflecting surface, a 2 nd reflecting surface, a 3 rd reflecting surface and a 4 th reflecting surface; and a refracting surface having a positive refractive power, the refracting surface being disposed between the object surface and the 1 st reflecting surface, and light emitted from the object surface sequentially reaching the image surface via the refracting surface, the 1 st reflecting surface, the refracting surface, the 2 nd reflecting surface, the refracting surface, the 3 rd reflecting surface, and the 4 th reflecting surface.

Catadioptric optical system, illumination optical system, and exposure apparatus

Technical Field

The invention relates to a catadioptric optical system, an illumination optical system, an exposure apparatus, and an article manufacturing method.

Background

An exposure apparatus is an apparatus that transfers a pattern of an original plate to a photosensitive substrate (a substrate on which a photoresist layer is formed on a surface) via a projection optical system in a lithography process for manufacturing articles such as semiconductor devices and display devices. For example, as an exposure apparatus for manufacturing a display device, a performance capable of transferring a pattern to a substrate having a larger area with high resolution is required. In order to meet such a demand, a scanning exposure apparatus capable of obtaining a high resolution and exposing a large screen is useful. The scanning exposure apparatus exposes the substrate with light shaped into an arc shape while scanning the original plate and the substrate. At this time, the original plate is illuminated with the light shaped into the arc shape, and the pattern of the original plate is projected onto the substrate by the light shaped into the arc shape.

Patent document 1 describes an illumination optical system that illuminates an original plate with light shaped into an arc shape. However, in order to illuminate an object with uniform energy in accordance with a desired shape, an imaging optical system that images an opening of a field stop provided in the illumination optical system on the object is required. In general, such an imaging optical system is called a mask imaging system. In the case of illuminating a large screen, in order to reduce the size of the optical elements around the field stop as much as possible, the mask imaging system is preferably constituted by a mirror system having a magnification.

Patent document 2 describes an imaging optical system in which aberrations are favorably suppressed. The imaging optical system described in patent document 2 is called an olferone (offner) optical system, and images by bending light with 3 curvature mirrors. The olfero optical system is an equal magnification system for 1-time imaging, but as described in patent document 3, it is possible to make the magnification ratio according to the position of 3 curvature mirrors. As described in patent document 4, there is also an optical system that corrects aberration by multiple imaging.

Documents of the prior art

Patent document

Patent document 1: japanese examined patent publication (Kokoku) No. 04-078002

Patent document 2: japanese patent laid-open publication No. 2010-20017

Patent document 3: japanese laid-open patent publication No. H07-146442

Patent document 4: japanese patent laid-open publication No. 61-203419

Disclosure of Invention

However, since the imaging optical systems described in

patent documents

2 and 3 are long in the retrofocus, for example, when the imaging optical systems are mounted on an exposure apparatus, the exposure apparatus is increased in size. In addition, the optical system described in patent document 4 forms images a plurality of times, and therefore, the overall length thereof becomes long, resulting in an increase in the size of the apparatus.

An object of the present invention is to provide a catadioptric optical system that is small and has a structure advantageous for reduction of aberrations, and an apparatus including the same.

The 1 st aspect of the present invention relates to a catadioptric optical system having an object plane and an image plane as telecentric optical paths, comprising: a 1 st reflecting surface, a 2 nd reflecting surface, a 3 rd reflecting surface and a 4 th reflecting surface; and a refracting surface having a positive refractive power, the refracting surface being disposed between the object surface and the 1 st reflecting surface, and the light exiting from the object surface reaching the image surface via the refracting surface, the 1 st reflecting surface, the refracting surface, the 2 nd reflecting surface, the refracting surface, the 3 rd reflecting surface, and the 4 th reflecting surface in this order.

The 2 nd aspect of the present invention relates to an illumination optical system including the catadioptric optical system according to the 1 st aspect.

The 3 rd aspect of the present invention relates to an exposure apparatus having the catadioptric optical system according to the 1 st aspect.

The 4 th aspect of the invention relates to an article manufacturing method including: exposing a substrate by the exposure apparatus according to claim 3; and a step of developing the substrate to produce an article from the substrate.

According to the present invention, a catadioptric optical system that is small and has a structure advantageous for reduction of aberrations, and an apparatus including the same are provided.

Drawings

Fig. 1 is a diagram showing a configuration of an illumination optical system according to 1 embodiment of the present invention.

Fig. 2 is a diagram showing a schematic configuration of a fly eye optical system.

Fig. 3 is a view showing a schematic configuration of the field stop.

Fig. 4A is a diagram showing the structure of the catadioptric optical system of design example 1.

Fig. 4B is an expanded view of the catadioptric optical system of design example 1.

Fig. 4C is a diagram showing the degree of contribution of the petz valve sum in the catadioptric optical system of design example 1.

Fig. 4D is a diagram illustrating the illumination light shaped into a circular arc shape.

Fig. 5A is a diagram showing the structure of the catadioptric optical system of design example 2.

Fig. 5B is an expanded view of the catadioptric optical system of design example 2.

Fig. 5C is a diagram showing the degree of contribution of the petz valve sum in the catadioptric optical system of design example 2.

Fig. 6A is a diagram showing the structure of the catadioptric optical system of design example 3.

Fig. 6B is an expanded view of the catadioptric optical system of design example 3.

Fig. 6C is a diagram showing the degree of contribution of the petz valve sum in the catadioptric optical system of design example 3.

Fig. 7A is a diagram showing the structure of a catadioptric optical system of design example 4.

Fig. 7B is an expanded view of the catadioptric optical system of design example 4.

Fig. 7C is a diagram showing the degree of contribution of the petz valve sum in the catadioptric optical system of design example 4.

Fig. 8A is a diagram showing the structure of a catadioptric optical system of design example 5.

Fig. 8B is an expanded view of the catadioptric optical system of design example 5.

Fig. 8C is a diagram showing the degree of contribution of the petz valve sums in the catadioptric optical system of design example 5.

Fig. 9A is a diagram showing the structure of a catadioptric optical system of design example 6.

Fig. 9B is an expanded view of the catadioptric optical system of design example 6.

Fig. 9C is a diagram showing the degree of contribution of the petz valve sums in the catadioptric optical system of design example 6.

Fig. 10 is a diagram showing the structure of an exposure apparatus according to 1 embodiment of the present invention.

Fig. 11 is a diagram illustrating illuminance measurement.

Fig. 12A and 12B are diagrams illustrating illuminance unevenness correction.

Fig. 13A is a diagram showing the structure of a catadioptric optical system of design example 7.

Fig. 13B is an expanded view of the catadioptric optical system of design example 7.

Fig. 13C is a diagram showing the degree of contribution of the petz valve sums in the catadioptric optical system of design example 7.

Fig. 14A is a diagram showing an effective area of a light beam.

Fig. 14B is a diagram showing a region where optical film design example 1 or 2 is mounted.

Fig. 14C is a diagram showing the regions where optical film designs 3 and 4 were mounted.

Fig. 15A is a diagram showing optical characteristics of optical film design example 1.

Fig. 15B is a diagram showing optical characteristics of optical film design example 2.

Fig. 15C is a diagram showing optical characteristics of optical film design example 3.

Fig. 15D is a diagram showing optical characteristics of optical film design example 4.

Description of the reference numerals

160: a catadioptric optical system; and (3) OBJ: an object surface; IMG: an image plane; l1, L2: a lens; M1-M4: a mirror.

Detailed Description

The present invention will be described below with reference to exemplary embodiments thereof with reference to the accompanying drawings.

The configuration of a catadioptric optical system according to 1 embodiment of the present invention will be described with reference to fig. 1, 2, and 3. The catadioptric optical system can be embedded in the illumination optical system 100 of the exposure apparatus, for example. Fig. 1 shows a configuration example of the illumination optical system 100. The illumination optical system 100 may include a light source unit 120, a wavelength filter 104, a 1 st optical system 105, a deflection mirror 107, a 2 nd optical system 140, a fly-eye optical system 109, an aperture stop 110, a 3 rd optical system 150, a field stop 111, and a 4 th optical system 160. The illumination optical system 100 is configured to illuminate the original plate M on the illuminated surface. The light source section 120 can include a light source 101 and an elliptical reflector 102.

The light source 101 can be, for example, a high-pressure mercury lamp, a xenon lamp, or an excimer laser. The elliptical reflector 102 is a condensing optical system for condensing light emitted from the light source 101, and has a shape using a part of an elliptical shape. The light source 101 may be disposed at one of two focal points (1 st focal point) of the elliptical reflector 102.

The light emitted from the light source 101 and reflected by the elliptical reflector 102 is collected by a wavelength filter 104 disposed near the other focal point (2 nd focal point) of the elliptical reflector 102. The wavelength filter 104 changes the spectral distribution of light. The light passed through the wavelength filter 104 is guided to the deflecting mirror 107 by the 1 st optical system 105, and is reflected by the deflecting mirror 107. In the example shown in fig. 1, two light source units 120 are provided, but the number of the light source units 120 may be 1, or 3 or more.

The 1 st optical system 105 is configured such that the surface 108 is substantially fourier-transformed with respect to the light coming out from the 2 nd focal point of the elliptical reflector 102. The light from the fourier transform surface 108 is guided to the fly-eye optical system 109 by the 2 nd optical system 140. The 2 nd optical system 140 is configured such that the incidence surface of the fly eye optical system 109 is substantially at a fourier transform position with respect to the surface 108.

In fig. 2, a fly-eye optical system 109 is shown. As shown in fig. 2, the fly-eye optical system 109 can include two

lens groups

131, 132. Each lens group can be configured by arranging a plurality of plano-convex lenses on a plane. The plano-convex lens constituting the lens group 132 is disposed at a focal position of the plano-convex lens constituting the lens group 131. The convex surface of the plano-convex lens constituting the lens group 131 and the convex surface of the plano-convex lens constituting the lens group 132 are arranged to face each other. A secondary light source distribution (effective light source distribution) is formed on the emission surface side of the fly eye optical system 109.

The light flux emitted from the exit surface of the fly-eye optical system 109 is guided to the field stop 111 by the 3 rd optical system 150 via the aperture stop 110. The aperture stop 110 determines the incident angle distribution shape (effective light source) of the illuminated surface according to the aperture shape. The 3 rd optical system 150 is configured such that the position of the field stop 111 becomes substantially a fourier transform plane with respect to the aperture stop 110. Since the secondary light source distribution is formed on the emission surface side of the fly-eye optical system 109, the light intensity distribution becomes uniform at the field stop 111.

Fig. 3 illustrates the shape of the field stop 111. The field stop 111 blocks light other than the arc-shaped transmission portion 23. The light shaped into the circular arc shape by the field stop 111 uniformly illuminates the original plate M via the 4 th optical system 160. The shape of the opening of the field stop 111 is not limited to the circular arc shape, and may be other shapes. The aperture of the field stop 111 may have a rectangular shape inscribed in an arc shape, for example. The 4 th optical system 160 is a catadioptric optical system. Hereinafter, the 4 th optical system 160 will be described as a catadioptric optical system 160.

Next, referring to fig. 4A, 5A, 6A, 7A, 8A, and 9A, catadioptric optical system 160 according to an exemplary embodiment of the present invention will be described. Catadioptric optical system 160 is telecentric at object plane OBJ and image plane IMG. The catadioptric optical system 160 can include a 1 st mirror (1 st reflecting surface) M1, a 2 nd mirror (2 nd reflecting surface) M2, a 3 rd mirror (3 rd reflecting surface) M3, and a 4 th mirror (4 th reflecting surface) M4. Further, the catadioptric optical system 160 may include a refractive surface having a positive refractive power disposed between the object surface OBJ and the 1 st mirror M1. The refractive surface can be formed by a lens L1. The light from the object plane OBJ reaches the image plane IMG via the refraction surface, the 1 st mirror M1, the refraction surface, the 2 nd mirror M2, the refraction surface, the 3 rd mirror M3, and the 4 th mirror M4 in this order.

The refractive surface may be formed by 1 lens L1, or may be formed by at least two lenses. In the latter case, the respective faces of at least two lenses can form mutually different regions in the refraction surface. Lens L1 can have two refractive surfaces. The refractive surface can have an aspherical shape. The refractive surface can be configured to satisfy | P (sum) | < | P (L1) | when the 3-degree petz valve term is P (L1), and the 3-degree petz valve sum of the entire catadioptric optical system is P (sum).

At least 1 mirror of the 1 st mirror M1, the 2 nd mirror M2, the 3 rd mirror M3, and the 4 th mirror M4 can have an aspherical shape.

The catadioptric optical system 160 may be configured to have no image plane between the object plane OBJ and the image plane IMG. In other words, the catadioptric optical system 160 can be an optical system having only 1-time imaging with an imaging plane at the image plane IMG.

The catadioptric optical system 160 can be configured to satisfy S1/TT >0.1 where TT is an entire length of the catadioptric optical system 160, and S1 is a distance between the object plane OBJ and a power plane closest to the object plane OBJ. The catadioptric optical system 160 can be configured to satisfy Sk/S1<3.0 when a distance from the object plane OBJ to the power plane closest to the object plane OBJ is S1 and a distance from the final power plane to the image plane IMG is Sk.

Catadioptric optical system 160 can be configured such that the traveling direction of light exiting object plane OBJ is the same as the traveling direction of light incident on image plane IMG. The catadioptric optical system 160 can be configured such that the pupil position of the catadioptric optical system 160 is located between the 1 st mirror M1 and the 2 nd mirror M2. The catadioptric optical system 160 may include an aspherical lens for correcting telecentricity in at least one of the vicinity of the object plane OBJ and the vicinity of the image plane IMG.

Hereinafter, a design example of the catadioptric optical system 160 will be described.

(design example 1)

Table 1A shows the optical specifications of design example 1.

[ TABLE 1A ]

The wavelength of light is 365nm to 435nm, and NAil is a numerical aperture at the image plane IMG of the catadioptric optical system 160, and is 0.09 in design example 1. The exposure width, slit width, and arc R are parameters that define the shape of the illumination light at the image plane IMG of the 4 th optical system 160, and are shown in fig. 4D. The magnification is the imaging magnification of the catadioptric optical system 160.

Table 1B shows the structure of catadioptric optical system 160 of design example 1.

[ TABLE 1B ]

Noodle numbering	r	d	n
				OBJ		199.67207	1
1	-108472.270	57.5	SiO2
				2	-917.221	410	1
3	-901.547	-410	-1
				4	-917.221	-57.5	SiO2
5	-108472.270	-58.95021	1
				6	-1088.406	58.95021	-1
7	-108472.270	57.5	SiO2
				8	-917.221	154.88871	1
9	1897.102	-220.41599	-1
				10	1089.102	660.52728	-1
11	∞	15	SiO2
				IMG

r (mm) is the radius of curvature of the face, d (mm) is the face separation, and n is the glass material. Here, the surface that has a refractive index of air of 1 and becomes-1 represents a reflection surface. SiO 2₂Synthetic quartz is shown. Further, the centers of curvature of the respective faces are located on the optical axis.

Fig. 4A shows a cross-sectional view of catadioptric optical system 160 of design example 1. Here, the object plane OBJ of the catadioptric optical system 160 has a circular arc shape, and fig. 4A shows light coming out from the center of the circular arc shape and light coming out from the end. Fig. 4A shows a cross section through the center of the circular arc shape. Therefore, in fig. 4A, it appears that light coming out from the end of the circular arc shape does not strike the reflection surface, but the light strikes the reflection surface at a cross section offset from fig. 4A. This is the same in fig. 5A, 6A, 7A, 8A, and 9A.

In fig. 4A, OBJ denotes an object plane and IMG denotes an image plane. L1 is a lens with positive refractive power having two refractive surfaces. The sum of the refractive powers of the two refractive surfaces has a positive refractive power. Thus, at least 1 refractive surface has positive optical power. M1 is the 1 st mirror (the 1 st reflecting surface), M2 is the 2 nd mirror (the 2 nd reflecting surface), M3 is the 3 rd mirror (the 3 rd reflecting surface), and M4 is the 4 th mirror (the 4 th reflecting surface). M1 and M4 are mirrors (reflective surfaces) having positive refractive power, and M2 and M3 are mirrors (reflective surfaces) having negative refractive power.

The light flux coming out from the object plane OBJ at a predetermined NA passes through L1 (plane numbers 1 and 2), M1 (plane number 3), L1 (plane numbers 4 and 5), M2 (plane number 6), L1 (plane numbers 7 and 8), M3 (plane number 9), and M4 (plane number 10) in this order from OBJ and is imaged in the IMG. The pupil of catadioptric optical system 160 may also be located between M1 and L1 with an open stop at the pupil location.

Fig. 4B shows an expanded view of catadioptric optical system 160 of design example 1. The full length TT of catadioptric optical system 160 is defined as shown in fig. 4B along with S1, Sk. The expanded view is a reference view for making the optical power configuration of the whole of the catadioptric optical system 160 easy to understand, and the actual catadioptric optical system 160 has mirrors. In fig. 4B, the reflecting mirror is represented by a thin lens equivalent thereto. This is the same in fig. 5B, 6B, 7B, 8B, and 9B.

FIG. 4C shows the 3-degree petz valve terms of L1, M1, M2, M3, M4, and the 3-degree petz valve SUM (SUM) for the entirety of the catadioptric optical system 160. Here, the petzval term is a value obtained by dividing refractive power of the lens L1 and the mirrors M1, M2, M3, and M4 by refractive index. The petz valve SUM (SUM) is the SUM of the 3 petz valve terms L1, M1, M2, M3, M4.

Table 1C shows the total lengths TT, S1, Sk of the catadioptric optical system 160 of design example 1.

[ TABLE 1C ]

The total length TT of the catadioptric optical system 160 is a simple sum of intervals of a plurality of planes from the object plane OBJ to the image plane IMG of the catadioptric optical system 160. That is, the full length TT is a value obtained by integrating the absolute values of d in table 1B. S1 is the distance from the object plane OBJ to the 1 st power plane (the power plane closest to the object plane OBJ, i.e., the plane numbered 1), and Sk is the distance from the final power plane (the power plane closest to the image plane IMG, i.e., the plane numbered 10) to the image plane IMG.

S1/TT is the ratio of S1 to TT, and if this value is large, for example, a plurality of field diaphragms can be arranged in the vicinity of the object plane OBJ, and the degree of freedom in design can be increased. Sk/S1 is a ratio of Sk to S1, and when the catadioptric optical system 160 is an amplification system, it can be said that the smaller the value, the more compact the optical system is.

Table 1D shows the optical performance of the catadioptric optical system 160 of design example 1.

[ TABLE 1D ]

P (SUM) denotes the petz valve SUM (SUM) of the catadioptric optical system 160, and P (L1) denotes the petz valve term of L1. The light spot RMS represents the worst value of the RMS light spot diameter in the effective region, dist represents distortion, and the telecentricity (range) represents the variation of telecentricity in the slit width direction.

As in design example 1, the light flux coming out of the object plane OBJ passes through the lens L1 3 times. If the region where the light beam passes through the lens L1 for the 1 st time does not overlap with the region where the light beam passes through the lens L1 for the 2 nd time, the same lens L1 is not necessarily used. However, when the separation of the regions through which the light beams are difficult to pass is performed, such as when the NA of the image plane IMG is large or when the magnification is small, the same lens L1 needs to be used.

(design example 2)

Table 2A shows the optical specifications of design example 2.

[ TABLE 2A ]

The wavelength of light is 365 nm-435 nm, NAil is 0.09. Tables 2B1 and 2B2 show the structure of the catadioptric optical system 160 of design example 2.

[ TABLE 2B1 ]

Noodle numbering		r	d	n
					0BJ		60	1
1	ASP	-6697.3063	15	SiO2
					2	∞	114.50143	1
3		∞	37.5	SiO2
					4	-1055.6256	410	1
5		-825.90428	-410	-1
					6	-1055.6256	-57.5	SiO2
7		∞	-38.3257	1
					8	-938.14879	38.3257	-1
9		∞	57.5	SiO2
					10	-1055.6256	154.88871	1
11		1962.84981	-225.25576	-1
					12	1020.23538	660.36706	-1
13		∞	20	SiO2
					IMG

[ TABLE 2B2 ]

ASP on surface number 1 represents an aspherical surface, and the shape thereof is expressed as a function of h as expression (1) using the numerical values described in table 2B 2. In the formula (1), h is a distance from the optical axis, and Z is a position in the optical axis direction.

[ number 1 ]

Fig. 5A shows a cross-sectional view of catadioptric optical system 160 of design example 2. OBJ denotes the object plane and IMG the image plane. L2 is an aspherical lens having negative refractive power. L1 is a lens with positive power having two refractive surfaces. The sum of the refractive powers of the two refractive surfaces has a positive refractive power. Thus, at least 1 refractive surface has positive optical power. M1 is the 1 st mirror (1 st reflecting surface), M2 is the 2 nd mirror (2 nd reflecting surface),

m3 denotes the 3 rd mirror (the 3 rd reflecting surface), and M4 denotes the 4 th mirror (the 4 th reflecting surface). M1 and M4 are mirrors (reflective surfaces) having positive refractive power, and M2 and M3 are mirrors (reflective surfaces) having negative refractive power.

The light flux coming out from the object plane OBJ at a predetermined NA passes through L2 (plane numbers 1 and 2), L1 (plane numbers 3 and 4), M1 (plane number 5), L1 (plane numbers 6 and 7), M2 (plane number 8), L1 (plane numbers 9 and 10), M3 (plane number 11), and M4 (plane number 12) in this order from the OBJ. The beam is then imaged onto the IMG. The pupil of catadioptric optical system 160 may also be located between M1 and L1 with an open stop at the pupil location.

Fig. 5B shows an expanded view of catadioptric optical system 160 of design example 2. FIG. 5C shows the 3-degree petz valve terms of L1, L2, M1, M2, M3, M4 and the overall 3-degree petz valve SUM (SUM) of the catadioptric optical system 160.

Table 2C shows the total lengths TT, S1, Sk, S1/TT, Sk/S1 of the catadioptric optical system 160 of design example 2.

[ TABLE 2C ]

Table 2D shows the optical performance of catadioptric optical system 160 of design example 2.

[ TABLE 2D ]

The catadioptric optical system 160 of design example 2 has a smaller value of telecentricity (range) than the catadioptric optical system 160 of design example 1. This is because telecentricity (range) is corrected with the aspherical lens L2 having a negative refractive power.

In design example 2, although the aspherical lens L2 is disposed in the vicinity of the object plane OBJ, the aspherical lens L2 may be disposed in the vicinity of the image plane IMG. That is, the aspherical lens can be disposed in at least one of the vicinity of the object plane OBJ and the vicinity of the image plane IMG. In the case of the magnifying system, the effective diameter of the optical element in the vicinity of the image plane IMG is increased, and therefore, it is preferable to dispose the optical element in the vicinity of the object plane OBJ if possible.

(design example 3)

Table 3A shows the optical specifications of design example 3.

[ TABLE 3A ]

The wavelength of light is 335 nm-405 nm, NAil is 0.126. Tables 3B1 and 3B2 show the structure of the catadioptric optical system 160 of design example 3.

[ TABLE 3B1 ]

Noodle	typ	R	D	n
					0BJ			174.29342	1
1		∞	33.33	SiO2
					2	ASP	-600.57706	200.96483	1
3		-476.56344	-200.96483	-1
					4	ASP	-600.57706	-33.33	SiO2
5		∞	-3.333	1
					6		-407.6975	3.333	-1
7		∞	33.33	SiO2
					8	ASP	-600.57706	126.22469	1
9		∞	-173.064	-1
					10		758.10285	355.5011	-1
11		∞	15	SiO2
					IMG

[ TABLE 3B2 ]

Noodle numbering	k	o	b	c	d	e	f	g
										2	0	4.67655E-09	3.68927E-14	1.01627E-19	-3.70155E-24	0	0	0
4	0	4.67655E-09	3.68927E-14	1.01627E-19	-3.70155E-24	0	0	0
									8	0	4.67655E-09	3.68927E-14	1.01627E-19	-3.70155E-24	0	0	0

ASP of

surface numbers

2, 4, 8 represents an aspherical surface, and the shape thereof is defined by the aforementioned formula (1). Fig. 6A shows a cross-sectional view of catadioptric optical system 160 of design example 3. OBJ denotes the object plane and IMG the image plane. L1 is a lens with positive power having two refractive surfaces. The sum of the refractive powers of the two refractive surfaces has a positive refractive power. Thus, at least 1 refractive surface has positive optical power. M1 is the 1 st mirror (the 1 st reflecting surface), M2 is the 2 nd mirror (the 2 nd reflecting surface), M3 is the 3 rd mirror (the 3 rd reflecting surface), and M4 is the 4 th mirror (the 4 th reflecting surface). M1 and M4 are mirrors (reflective surfaces) having positive refractive power, M2 is a mirror (reflective surface) having negative refractive power, and M3 is a plane mirror.

The light flux coming out from the object plane OBJ at a predetermined NA passes through L1 (plane numbers 1 and 2), M1 (plane number 3), L1 (plane numbers 4 and 5), M2 (plane number 6), L1 (plane numbers 7 and 8), M3 (plane number 9), and M4 (plane number 10) in this order from OBJ and is imaged in the IMG. The pupil of catadioptric optical system 160 may also be located near M2 with an open stop at the pupil location.

Fig. 6B shows an expanded view of catadioptric optical system 160 of design example 3. FIG. 6C shows the 3-degree petz valve terms of L1, M1, M2, M3, M4 and the 3-degree petz valve SUM (SUM) for the entirety of the catadioptric optical system 160.

Table 3C shows the total lengths TT, S1, Sk, S1/TT, Sk/S1 of the catadioptric optical system 160 of design example 3.

[ TABLE 3C ]

Table 3D shows the optical performance of the catadioptric optical system 160 of design example 3.

[ TABLE 3D ]

The catadioptric optical system 160 of design example 3 has a larger value of S1/TT than the catadioptric optical systems 160 of design examples 1 and 2. By correcting the aberration and the telecentricity of the optical system satisfactorily with the aspherical lens L2, it is possible to perform the optical power arrangement such that S1 becomes large.

(design example 4)

Table 4A shows the optical specifications of design example 4.

[ TABLE 4A ]

The wavelength of light is 365 nm-435 nm, NAil is 0.09. Tables 4B1 and 4B2 show the structures of the catadioptric optical system 160 of design example 4.

[ TABLE 481 ]

Noodle	typ	R	D	n
					OBJ			155	1
1		2000	50	SiO2
					2	ASP	-1553.89283	205.3	1
3		-587.50766	-205.3	-1
					4	ASP	-1553.89283	-50	SiO2
5		2000	-5	1
					6		-560.57916	5	-1
7		2000	50	SiO2
					8	ASP	-1553.89283	200.4	1
9	ASP	-2098.19187	-400.3	-1
					10		1477.03615	774.4	-1
11		∞	20	SiO2
					IMG

[ TABLE 4B2 ]

Noodle

k

a

b

c

d

e

f

g

2

0

1.75744E-09

1.20660E-14

-1.89024E-22

-3.30179E-27

-7.25895E-32

0

4

0

1.75744E-09

1.20660E-14

-1.89024E-22

-3.30179E-27

-7.25895E-32

0

8

0

1.75744E-09

1.20660E-14

-1.89024E-22

-3.30179E-27

-7.25895E-32

0

9

0

4.30333E-10

-4.78650E-16

-2.96640E-23

1.54127E-29

0

ASP of

surface numbers

2, 4, 8, 9 represents an aspherical surface, and the shape thereof is defined by the aforementioned formula (1). Fig. 7A shows a cross-sectional view of catadioptric optical system 160 of design example 4. OBJ denotes the object plane and IMG the image plane. L1 is a lens with positive power having two refractive surfaces. The sum of the refractive powers of the two refractive surfaces has a positive refractive power. Thus, at least 1 refractive surface has positive optical power. M1 is the 1 st mirror (the 1 st reflecting surface), M2 is the 2 nd mirror (the 2 nd reflecting surface), M3 is the 3 rd mirror (the 3 rd reflecting surface), and M4 is the 4 th mirror (the 4 th reflecting surface). M1, M3, and M4 are mirrors (reflective surfaces) having positive refractive power, and M2 is a mirror (reflective surface) having negative refractive power.

The light flux coming out from the object plane OBJ at a predetermined NA passes through L1 (plane numbers 1 and 2), M1 (plane number 3), L1 (plane numbers 4 and 5), M2 (plane number 6), L1 (plane numbers 7 and 8), M3 (plane number 9), and M4 (plane number 10) in this order from the OBJ. The beam is then subsequently imaged onto the IMG. The pupil of catadioptric optical system 160 may also be located near L1 with an open stop at the pupil location.

Fig. 7B shows an expanded view of catadioptric optical system 160 of design example 4. FIG. 7C shows the 3-degree petz valve terms of L1, M1, M2, M3, M4, and the 3-degree petz valve SUM (SUM) for the entirety of the catadioptric optical system 160. Table 4C shows the total lengths TT, S1, Sk, S1/TT, Sk/S1 of the catadioptric optical system 160 of design example 4.

[ TABLE 4C ]

Table 4D shows the optical performance of catadioptric optical system 160 of design example 4.

[ TABLE 4D ]

The total length TT of the catadioptric optical system 160 of design example 4 is shorter than that of the catadioptric optical system 160 of design example 1. The aberration and the telecentricity of the catadioptric optical system 160 are corrected well by the aspherical lens L1 and the aspherical mirror M3, whereby a compact optical power arrangement can be achieved as a whole.

(design example 5)

Table 5A shows the optical specifications of design example 5.

[ TABLE 5A ]

The wavelength of light is 335 nm-405 nm, NAil is 0.108. Tables 5B1 and 5B2 show the structures of catadioptric optical system 160 of design example 5.

[ TABLE 5B1 ]

Noodle	typ	R	D	n
					OBJ			183.6	1
1		∞	50	SiO2
					2	ASP	-739.70823	207.7	1
3		-544.37166	-207.7	-1
					4	ASP	-739.70823	-50	SiO2
5		∞	-5	1
					6		-667.34739	5	-1
7		∞	50	SiO2
					8	ASP	-739.70823	176.6	1
9	ASP	2476.59779	-192.3	-1
					10		853.05678	417.9	-1
11		∞	20	SiO2
					IMG

[ TABLE 5B2 ]

Noodle

k

a

b

c

d

e

f

g

2

0

-2.23404E-10

8.90172E-14

-7.13365E-19

-3.39191E-24

1.16141E-28

8.93782E-34

-1.59573E-38

4

0

-2.23404E-10

8.90172E-14

-7.13365E-19

-3.39191E-24

1.16141E-28

8.93782E-34

-1.59573E-38

8

0

-2.23404E-10

8.90172E-14

-7.13365E-19

-3.39191E-24

1.16141E-28

8.93782E-34

-1.59573E-38

9

0

-6.37287E-10

6.31814E-15

6.71838E-20

-1.22096E-24

3.45242E-30

2.35166E-35

-1.15500E-40

ASP of

surface numbers

2, 4, 8, 9 represents an aspherical surface, and the shape thereof is defined by the aforementioned formula (1). Fig. 8A shows a cross-sectional view of catadioptric optical system 160 of design example 5. A cross-sectional view of the optical system is shown. OBJ denotes the object plane and IMG the image plane. L1 is a lens with positive power having two refractive surfaces. The sum of the refractive powers of the two refractive surfaces has a positive refractive power. Thus, at least 1 refractive surface has positive optical power. M1 is the 1 st mirror (the 1 st reflecting surface), M2 is the 2 nd mirror (the 2 nd reflecting surface), M3 is the 3 rd mirror (the 3 rd reflecting surface), and M4 is the 4 th mirror (the 4 th reflecting surface). M1 and M4 are mirrors (reflective surfaces) having positive refractive power, and M2 and M3 are mirrors (reflective surfaces) having negative refractive power.

The light flux coming out from the object plane OBJ at a predetermined NA passes through L1 (plane numbers 1 and 2), M1 (plane number 3), L1 (plane numbers 4 and 5), M2 (plane number 6), L1 (plane numbers 7 and 8), M3 (plane number 9), and M4 (plane number 10) in this order from OBJ and is imaged in the IMG. The pupil of catadioptric optical system 160 may also be located near L1 with an open stop at the pupil location.

Fig. 8B shows an expanded view of catadioptric optical system 160 of design example 5. FIG. 8C shows the 3-degree petz valve terms of L1, M1, M2, M3, M4 and the 3-degree petz valve SUM (SUM) for the entirety of the catadioptric optical system 160. Fig. 8B shows an expanded view of catadioptric optical system 160 of design example 5. FIG. 8C shows the 3-degree petz valve terms of L1, M1, M2, M3, M4, and the 3-degree petz valve SUM (SUM) for the entirety of the catadioptric optical system 160.

Table 5C shows the total lengths TT, S1, Sk, S1/TT, Sk/S1 of the catadioptric optical system 160 of design example 5.

[ TABLE 5C ]

Table 5D shows the optical performance of the catadioptric optical system 160 of design example 5.

[ TABLE 5D ]

The catadioptric optical system 160 of design example 5 has a smaller value of Sk/S1 than the catadioptric optical system 160 of design example 4. This is because, since NAil has a larger value than design example 4, M4 is moved to the image plane IMG side in order to separate the light reflected by M3 from the light directed from M4 to the image plane IMG.

(design example 6)

Table 6A shows the optical specifications of design example 6.

[ TABLE 6A ]

The light wavelength is 335 nm-405 nm, NAil is 0.126. Tables 6B1 and 6B2 show the structures of catadioptric optical system 160 of design example 6.

[ TABLE 6B1 ]

Noodle	typ	R	D	n
					OBJ			115.19739	1
1		∞	33.33	SiO2
					2	ASP	-490.17339	137.52353	1
3		-353.51049	-137.52353	-1
					4	ASP	-490.17339	-33.33	SiO2
5		∞	-3.333	1
					6		-425.28929	3.333	-1
7		∞	33.33	SiO2
					8	ASP	-490.17339	125.87854	1
9	ASP	∞	-141.2866	-1
					10		671.25491	240.66053	-1
11		∞	15	SiO2
					IMG

[ TABLE 6B2 ]

Noodle

k

a

b

c

d

e

f

g

2

0

9.82544E-10

4.44382E-13

-1.29665E-17

2.29940E-22

9.09303E-27

-3.35412E-32

-4.50930E-36

4

0

9.82544E-10

4.44382E-13

-1.29665E-17

2.29940E-22

9.09303E-27

-3.35412E-32

-4.50930E-36

8

0

9.82544E-10

4.44382E-13

-1.29665E-17

2.29940E-22

9.09303E-27

-3.35412E-32

-4.50930E-36

9

0

-2.18722E-09

4.17035E-14

1.37265E-18

-3.91572E-23

1.21585E-28

4.34299E-33

-3.46322E-38

ASP of

surface numbers

2, 4, 8, 9 represents an aspherical surface, and the shape thereof is defined by the aforementioned formula (1). Fig. 9A shows a cross-sectional view of catadioptric optical system 160 of design example 6. OBJ denotes the object plane and IMG the image plane. L1 is a lens with positive power having two refractive surfaces. The sum of the refractive powers of the two refractive surfaces has a positive refractive power. Thus, at least 1 refractive surface has positive optical power. M1 is the 1 st mirror (the 1 st reflecting surface), M2 is the 2 nd mirror (the 2 nd reflecting surface), M3 is the 3 rd mirror (the 3 rd reflecting surface), and M4 is the 4 th mirror (the 4 th reflecting surface). M1 and M4 are mirrors (reflective surfaces) having positive refractive power, and M2 and M3 are mirrors (reflective surfaces) having negative refractive power.

Fig. 9B shows an expanded view of catadioptric optical system 160 of design example 6. FIG. 9C shows the 3-degree petz valve terms of L1, M1, M2, M3, M4 and the 3-degree petz valve SUM (SUM) for the entirety of the catadioptric optical system 160.

Table 6C shows the total lengths TT, S1, Sk, S1/TT, Sk/S1 of the catadioptric optical system 160 of design example 6.

[ TABLE 6C ]

Table 6D shows the optical performance of catadioptric optical system 160 of design example 6.

[ TABLE 6D ]

The catadioptric optical system 160 of design example 6 has a smaller value of Sk/S1 than the catadioptric optical system 160 of design example 4. This is because, since NAil has a larger value than in design example 4, M4 is located closer to the image plane in order to separate the light reflected at M3 from the light directed from M4 to the image plane IMG.

(Exposure apparatus)

Fig. 10 shows the structure of an exposure apparatus 400 according to 1 embodiment of the present invention. The exposure apparatus 400 includes an illumination optical system 100, and performs scanning exposure on a substrate by using slit light from the illumination optical system 100. The illumination optical system 100 includes a slit mechanism 181 capable of adjusting the shape of the opening.

The exposure apparatus 400 includes a master stage 300 for holding a master, a substrate stage 302 for holding a substrate, and a projection optical system 301 for projecting a pattern of the master onto the substrate. The projection optical system 301 is, for example, a projection optical system in which a 1 st concave reflecting surface 71, a convex reflecting surface 72, and a 2 nd concave reflecting surface 73 are arranged in this order in an optical path from an object plane to an image plane.

The exposure apparatus 400 may further include a measurement unit 304, and the measurement unit 304 may measure illuminance unevenness in an exposure region of the substrate by measuring an illuminance distribution of light reaching the substrate mounting table 302. Further, the slit plate 303 is positioned between the substrate mounting table 302 and the measurement unit 304. The slit plate 303 can be scan-driven in the exposure width direction of fig. 4D by a driving unit (not shown) under the control of a control unit (not shown).

As shown in fig. 10, the measurement unit 304 may include a sensor 305 and an optical system for guiding light passing through the slit plate 303 to the sensor 305. The operation of the measuring unit 304 is roughly as follows.

As shown in fig. 11, the slit plate 303 is scanned in the X direction with respect to a region 401 of light imaged on the substrate mounting table 302. At this time, only the light focused on the opening 306 of the slit plate 303 among the light focused on the region 401 is incident on the measurement unit 304. Light incident into the measurement unit 304 is guided to the sensor 305 via an optical system. The illuminance at each position in the region 401 is measured by reading the energy of light reaching the sensor 305 while scanning the slit plate 303 in the X direction. This enables uneven illuminance to be calculated.

As described above, uneven illuminance can be reduced by adjusting the opening width of the slit mechanism 181 included in the illumination optical system 100. For example, the illuminance unevenness shown in fig. 12A is measured by the measurement unit 304. In this case, the width of the slit mechanism 181 in the portion where the illuminance is decreased is locally increased, and the width of the slit mechanism 181 in the portion where the illuminance is increased is locally decreased, whereby the illuminance distribution can be made uniform as shown in fig. 12B.

The method for manufacturing an article according to 1 embodiment of the present invention may include an exposure step of exposing a substrate by the exposure apparatus 400 and a development step of developing the substrate. The substrate exposed in the exposure step has a photoresist on the surface, and in the exposure step, a latent image of the original pattern can be formed on the photoresist. In the developing step, the latent image can be developed to form a resist pattern. After the developing step, the substrate may be etched through the resist pattern or may be implanted with ions, for example. Examples of the article that can be formed in this manner include a display device (display panel), a semiconductor device (semiconductor chip), and the like. (design example 7)

Table 7A shows the optical specifications of design example 7.

[ TABLE 7A ]

The light wavelength is 335 nm-405 nm, NAil is 0.09. Table 7B shows the structure of catadioptric optical system 160 of design example 7.

[ TABLE 7B ]

Noodle numbering	r	d	n
				OBJ		175.4332	1
1	-2210.615	57.5	SiO2
				2	-649.807	430.97578	1
3	-887.577	-410.22676	-1
				4	-887.157	-57.5	SiO2
5	-23480.432	-57.18638	1
				6	-1138.936	57.18638	-1
7	-23480.432	57.5	SiO2
				8	-887.157	152.91037	1
9	1937.089	-212.4938	-1
				10	1103.352	606.7433	-1
11	∞	15	SiO2
				IMG

Fig. 13A shows a cross-sectional view of catadioptric optical system 160 of design example 7. OBJ denotes the object plane and IMG the image plane. L1 and L2 are lenses having positive refractive power, and each has two refractive surfaces. The sum of the refractive powers of the two refractive surfaces has a positive refractive power. Thus, at least 1 refractive surface has positive optical power. M1 is the 1 st mirror (the 1 st reflecting surface), M2 is the 2 nd mirror (the 2 nd reflecting surface), M3 is the 3 rd mirror (the 3 rd reflecting surface), and M4 is the 4 th mirror (the 4 th reflecting surface). M1 and M4 are mirrors (reflective surfaces) having positive refractive power, and M2 and M3 are mirrors (reflective surfaces) having negative refractive power.

The light flux coming out from the object plane OBJ at a predetermined NA passes through L1 (plane numbers 1 and 2), M1 (plane number 3), L2 (plane numbers 4 and 5), M2 (plane number 6), L2 (plane numbers 7 and 8), M3 (plane number 9), and M4 (plane number 10) in this order from OBJ and is imaged in the IMG. The pupil of catadioptric optical system 160 may also be located near L2 with an open stop at the pupil location.

Fig. 13B shows an expanded view of catadioptric optical system 160 of design example 6. FIG. 13C shows the 3-degree petz valve terms of L1, L2, M1, M2, M3, M4 and the overall 3-degree petz valve SUM (SUM) of the catadioptric optical system 160.

L1 and L2 of design example 7 are examples, and are not limited to the present example as long as they are lenses having positive refractive powers.

Table 7C shows the total lengths TT, S1, Sk, S1/TT, Sk/S1 of the catadioptric optical system 160 of design example 7.

[ TABLE 7C ]

Table 7D shows the optical performance of catadioptric optical system 160 of design example 7.

[ TABLE 7D ]

(anti-reflection film 1)

The antireflection film of the lens L1 configured in the catadioptric optical system 160 of design example 4 will be described.

As shown in fig. 7A, the light flux coming out of the object plane OBJ at a predetermined NA passes through L1 (plane numbers 1 and 2), M1 (plane number 3), L1 (plane numbers 4 and 5), M2 (plane number 6), L1 (plane numbers 7 and 8), M3 (plane number 9), and M4 (plane number 10) in this order from the OBJ. The beam is then subsequently imaged onto the IMG.

Fig. 14A is a view of the R1 surface (surface close to the OBJ side) of the lens L1 viewed from the OBJ side. A region 500 surrounded by a dotted line in fig. 14A is an effective region when the light beam coming out of the OBJ first enters R1 of L1, and corresponds to surface 1 of table 4B 1. The plane incidence angle of light passing through the region 500 is 5 to 20 °. The region 501 surrounded by a chain line in fig. 14A is an effective region when the 2 nd incident light is incident on R1 of L1, and corresponds to surface 5 of table 4B 1. The plane incidence angle of light passing through the region 501 is 35 ° to 50 °. A region 502 surrounded by a two-dot chain line shown in fig. 14A is an effective region when the 3 rd incident light enters the R1 face of the lens L1. Corresponding to face 7 of table 4B 1. The plane incidence angle of light passing through the region 502 is 35 ° to 50 °. A region 503 surrounded by a solid line of fig. 14B is a region including the

regions

500, 501, and 502. The optical film of optical film design example 1 as shown in table 8A can be provided in the region 503.

[ TABLE 8A ]

Optical film design example 1 is an antireflection film having a 3-layer structure using a dielectric material. In SiO as a substrate layer₂On which Al is stacked in order₂O₅，ZrO₂，MgF₂Of (2) a thin layer. The film thickness of each layer was set to the value described in the table. Wherein the physical property of the film is defined by the refractive index n corresponding to the type of the filmThe product nd of the thickness d.

Fig. 15A shows reflectance characteristics of optical film design example 1. Has a characteristic that the reflectance is 2% or less at wavelengths of 350 to 450nm, incident angles of 5 to 20 DEG and 35 to 50 deg.

(anti-reflection film 2)

The optical film of optical film design example 2 shown in table 8B may be provided in the region 503.

[ TABLE 8B ]

	Name of the Material	Film thickness no [ nm ]]
			The uppermost layer	air		0
7	MgF2	110.33
			6	ZrO2	227.18
5	Al2O5	57.07
			4	ZrO2	69.35
3	Al2O5	25.01
			2	ZrO2	295.33
1	Al2O5	107.36
			Substrate layer	SiO2		0

Optical film design example 2 is an antireflection film having a 7-layer structure using a dielectric material. Fig. 15B shows the reflectance characteristics of optical film design example 2. Has a characteristic that the reflectance is 1% or less at wavelengths of 350 to 450nm, incident angles of 5 to 20 DEG and 35 to 50 deg. Optical film design example 2 has the effect of increasing the number of layers of the film, and thus suppresses the reflectance as compared with optical film design example 1 having a 3-layer structure.

(antireflection films 3 and 4)

A region 505 surrounded by a solid line shown in fig. 14C is a region including the region 500. In addition, a region 506 surrounded by a solid line in fig. 14C is a region including the region 501 and the region 502. Optical film design example 3 as shown in table 8C1 was attached to region 505, and optical film design example 4 as shown in table 8C2 was attached to region 505.

[ TABLE 8C1 ]

[ TABLE 8C2 ]

Optical film design examples 3 and 4 are antireflection films having a 3-layer structure using a dielectric material. Fig. 15C1 shows the reflectance characteristics of optical film design example 3, and fig. 15C2 shows the reflectance characteristics of optical film design example 4.

Optical film design example 3 has an incident angle of 5 at a wavelength of 350nm to 450nm^°～20^°The reflectance is 1% or less. In addition, optical film design example 4 had a wavelength of 350nm to 450nm and an incident angle of 35^°～50^°The reflectance is 1% or less.

In this way, optical films of different types are mounted on the R1 surface of the lens L1, depending on the region. The antireflection films 1 to 4 are examples, and the material, the number of layers, the film thickness, and the like of the film are not limited to these examples.

The antireflection film described in the present specification has been described in the case where the R1 surface of the lens L1 is irradiated with a light spot, but the antireflection film should be originally applied to the incident surface or the emission surface of the optical element. Therefore, when there are a plurality of optical elements, it is desirable to optimize the structure of the film so that desired optical characteristics are satisfied on each surface. In addition, as for the optical reflection member, it is preferable to constitute a reflection film (such as a film having a high reflectance at a desired wavelength) instead of the antireflection film.

Name of the Material

Film thickness no [ nm ]]

The uppermost layer

Substrate layer

1. A catadioptric optical system in which an object plane and an image plane are telecentric optical paths, comprising:

a 1 st reflecting surface, a 2 nd reflecting surface, a 3 rd reflecting surface and a 4 th reflecting surface; and

a refracting surface having a positive refracting power, the refracting surface being disposed between the object surface and the 1 st reflecting surface,

the catadioptric optical system is an optical system having only 1 imaging of an imaging plane at the image plane,

the light coming out of the object plane reaches the image plane through the refraction plane, the 1 st reflection plane, the refraction plane, the 2 nd reflection plane, the refraction plane, the 3 rd reflection plane and the 4 th reflection plane in sequence.

2. The catadioptric optical system of claim 1,

the refracting surface is composed of 1 lens.

3. The catadioptric optical system of claim 1,

the refracting surface is formed by at least two lenses.

4. The catadioptric optical system of claim 1,

two refraction surfaces including the refraction surface are arranged between the object surface and the 1 st reflection surface.

5. The catadioptric optical system of claim 1,

there is no imaging plane between the object plane and the image plane in the optical path of light reaching the image plane from the object plane.

6. The catadioptric optical system of claim 1,

the refractive surface having the positive refractive power has an aspherical shape.

7. The catadioptric optical system of claim 1,

at least 1 of the 1 st, 2 nd, 3 rd, and 4 th reflective surfaces has an aspherical shape.

8. The catadioptric optical system of claim 1,

the traveling direction of light emitted from the object plane is the same as the traveling direction of light incident on the image plane.

9. The catadioptric optical system of claim 1,

the pupil position of the catadioptric optical system is located between the 1 st and 2 nd reflective surfaces.

10. The catadioptric optical system of claim 1,

the catadioptric optical system further includes an aspherical lens for correcting a telecentricity in at least one of a vicinity of the object plane and a vicinity of the image plane.

11. The catadioptric optical system of claim 1,

the type of the optical film formed on the refraction surface disposed between the object surface and the 1 st reflection surface and the type of the optical film formed on the refraction surface disposed between the 2 nd reflection surface and the 3 rd reflection surface are different from each other.

12. A catadioptric optical system in which an object plane and an image plane are telecentric optical paths, comprising:

the light coming out of the object plane reaches the image plane through the refraction plane, the 1 st reflection plane, the refraction plane, the 2 nd reflection plane, the refraction plane, the 3 rd reflection plane and the 4 th reflection plane in sequence,

with respect to the refractive surface having positive refractive power, when the 3-degree petzval term is P (L1) and the 3-degree petzval sum of the entire catadioptric optical system is P (sum), the following requirements are satisfied

|P(sum)|<|P(L1)|。

13. A catadioptric optical system in which an object plane and an image plane are telecentric optical paths, comprising:

TT represents the total length of the catadioptric optical system, and S1 represents the distance between the object plane and the power plane closest to the object plane

S1/TT>0.1。

14. A catadioptric optical system in which an object plane and an image plane are telecentric optical paths, comprising:

when the distance from the object plane to the power plane closest to the object plane is S1 and the distance from the final power plane to the image plane is Sk, the method satisfies the following conditions

Sk/S1<3.0。

15. A catadioptric optical system that directs light from an object plane to an image plane, comprising:

a 1 st refractive surface and a 2 nd refractive surface having positive refractive power, which are disposed between the object surface and the 1 st reflective surface,

the light coming out of the object plane reaches the image plane through the 1 st refraction surface, the 1 st reflection surface, the 2 nd refraction surface, the 2 nd reflection surface, the 2 nd refraction surface, the 3 rd reflection surface and the 4 th reflection surface in sequence.

16. An illumination optical system characterized in that,

having a catadioptric optical system according to any one of claims 1 to 15.

17. An exposure apparatus, characterized in that,

having a catadioptric optical system according to any one of claims 1 to 15.

18. A method of manufacturing an article, comprising:

exposing a substrate by using the exposure apparatus according to claim 17; and

a step of developing the substrate,

an article is manufactured from the substrate.