CN107688258B - Display panel and manufacturing method thereof - Google Patents
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- CN107688258B CN107688258B CN201710814176.4A CN201710814176A CN107688258B CN 107688258 B CN107688258 B CN 107688258B CN 201710814176 A CN201710814176 A CN 201710814176A CN 107688258 B CN107688258 B CN 107688258B
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 63
- 238000005192 partition Methods 0.000 claims abstract description 50
- 239000011159 matrix material Substances 0.000 claims abstract description 31
- 239000004020 conductor Substances 0.000 claims abstract description 22
- 230000000903 blocking effect Effects 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 23
- 230000008569 process Effects 0.000 claims description 21
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- 238000001259 photo etching Methods 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 2
- RGOVYLWUIBMPGK-UHFFFAOYSA-N nonivamide Chemical compound CCCCCCCCC(=O)NCC1=CC=C(O)C(OC)=C1 RGOVYLWUIBMPGK-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 23
- 239000004973 liquid crystal related substance Substances 0.000 description 14
- 238000000206 photolithography Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Optical Filters (AREA)
Abstract
The invention provides a display panel, which comprises an array substrate and a color filter substrate: the color filter substrate comprises a color resistor and a black matrix, an extension area is arranged between the periphery of the color resistor and the black matrix, and a first partition electrode made of a conductive material is arranged in the extension area; the array substrate comprises pixel electrodes which correspond to the color resistors one by one, a circle of second partition electrodes which are opposite to the first partition electrodes are arranged on the periphery of each pixel electrode, and the second partition electrodes are not in contact with the pixel electrodes; the voltages applied by the first partition electrode and the second partition electrode are the same. The invention also provides a manufacturing method of the display panel. Compared with the prior art, the invention reduces the appearance of alignment dark stripes at the edge position of the pixel electrode.
Description
Technical Field
The invention relates to a liquid crystal display panel technology, in particular to a display panel and a manufacturing method thereof.
Background
At present, a liquid crystal display panel generally includes a color filter substrate (CF substrate), an array substrate (TFT substrate), and a Liquid Crystal (LC) filled between the color filter substrate and the array substrate to form a liquid crystal cell, wherein a PSVA (polymer Stabilized vertical alignment) display mode is used as a PSA technology, has the advantages of high contrast, wide viewing angle, fast response, and low power consumption, and is one of the display modes currently used in the mainstream liquid crystal display panel; the principle is that firstly, a power supply is adopted to deflect liquid crystal molecules, and then anchoring is carried out through ultraviolet light (UV) to complete liquid crystal alignment. In the process of manufacturing the PSVA, because the overlapped part exists between the color resistance edge of the pixel and the black matrix and the overlapped part is positioned in each pixel electrode, the liquid crystal molecules positioned at the overlapped part cannot be stably aligned, and the burr phenomenon is generated at the edge of the pixel point when the picture is displayed.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention provides a display panel and a manufacturing method thereof, so that the occurrence of dark stripes in the edge alignment of a pixel electrode is reduced.
The invention provides a display panel, which comprises an array substrate and a color filter substrate:
the color filter substrate comprises a color resistor and a black matrix, an extension area is arranged between the periphery of the color resistor and the black matrix, and a first partition electrode made of a conductive material is arranged in the extension area;
the array substrate comprises pixel electrodes which correspond to the color resistors one by one, a circle of second partition electrodes which are opposite to the first partition electrodes are arranged on the periphery of each pixel electrode, and the second partition electrodes are not in contact with the pixel electrodes;
the voltages applied by the first partition electrode and the second partition electrode are the same.
Further, the first partition electrode is electrically connected with a common electrode in the color filter; the second partition electrode is connected with a common electrode in the array substrate; the common electrode in the color filter substrate and the common electrode in the array substrate are applied with the same voltage.
Further, the width of the extension region is not less than 2 um.
Further, the line width of the black matrix is not less than 2um and not more than the distance between the extending regions of the two color resistances.
Further, the shapes of the first partition electrode and the second partition electrode are matched.
Further, the first partition electrode and the second partition electrode are made of the same conductive material.
Further, the display panel is in a PSVA display mode.
The invention also provides a manufacturing method of the display panel, which comprises the following steps of manufacturing the array substrate and the color filter substrate:
in the manufacturing of the color filter substrate, after the color resistor is manufactured, a via hole is manufactured in an extension area between the color resistor and the black matrix through a photoetching process, and a first partition electrode is manufactured in the via hole;
in the manufacturing of the array substrate, after the pixel electrode is manufactured, a second partition electrode is manufactured on the periphery of the pixel electrode, wherein the second partition electrode is opposite to the first partition electrode in position in a circle, and the second partition electrode is not in contact with the pixel electrode.
Further, the step of manufacturing the first blocking electrode in the via hole includes coating a layer of conductive material, and etching away the conductive material outside the via hole through a photolithography process, so as to form the first blocking electrode.
Furthermore, the step of manufacturing a second partition electrode with a circle opposite to the first partition electrode on the periphery of the pixel electrode includes coating a layer of conductive material, and forming the second partition electrode through a photolithography process.
Compared with the prior art, the invention reduces the line width of the black matrix by adding the extension area around the color resistor, thereby ensuring that the overlapped area is not in the pixel electrode and the size of the pixel electrode is not changed; the first isolation electrode is arranged in the extension area, the second isolation electrode corresponding to the first isolation electrode is arranged on the periphery of the pixel electrode, the same voltage is applied to achieve the shielding effect, so that liquid crystal molecules positioned at the edge of the pixel electrode are not interfered by the overlapping part to influence the alignment, and the occurrence of alignment dark stripes at the edge position of the pixel electrode is reduced.
Drawings
FIG. 1 is a schematic diagram of a black matrix formed on a color filter substrate according to the present invention;
FIG. 2 is a schematic diagram of a first blocking electrode formed on a color filter substrate according to the present invention;
FIG. 3 is a schematic diagram of an ITO conductive film formed on a color filter substrate according to the present invention;
FIG. 4 is a schematic diagram of fabricating a second blocking electrode in the array substrate according to the present invention;
fig. 5 is a schematic view of the invention assembled into a box.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples.
The figures 1-5 show only the film or electrode structures relevant to the present invention, wherein the thicknesses and dimensions of layers and regions are omitted or exaggerated, but it is noted that the schematic drawings and embodiments shown in the figures are taken in conjunction with the purpose of explaining the principles of the present invention and its practical application so that others skilled in the art can understand various embodiments of the present invention and various modifications suitable for a particular intended application.
As shown in fig. 5, a display panel of the present invention, where the display mode of the display panel is a PSVA display mode, the display panel includes an array substrate 1 and a color filter substrate 2, and a liquid crystal 3 is disposed between the array substrate 1 and the color filter substrate 2, wherein the conventional structure of the array substrate 1 is the same as that of a TFT (thin film transistor) array substrate in the prior art, and the conventional structure of the color filter substrate 2 is also the same as that of a color filter substrate for the PSVA display mode in the prior art; the present invention is improved by the addition of only the first spaced electrode 24 and the second spaced electrode 12.
The array substrate mainly comprises a substrate, a grid electrode insulating layer, an active layer, a source drain electrode, an interlayer insulating layer, a flat layer, a common electrode, a passivation layer and a pixel electrode, wherein the specific arrangement form or position of the components can be changed according to the requirement;
the color filter substrate 2 comprises a color resistor 21 and a black matrix 22, an extension area 23 is arranged between the periphery of the color resistor 21 and the black matrix 22, the extension area 23 is positioned outside the edge of the pixel electrode 11, so that the line width of the black matrix 22 is reduced, the overlapped part of the color resistor 21 and the black matrix 22 is positioned outside the area of each pixel electrode, and a first partition electrode 24 made of a conductive material is arranged in the extension area 23;
the pixel electrodes 11 of the array substrate 1 are arranged in one-to-one correspondence with the color resistors 21, a circle of second partition electrodes 12 opposite to the first partition electrodes 24 are arranged on the periphery of the pixel electrodes 11, the second partition electrodes 12 are not in contact with the pixel electrodes 11, and crosstalk cannot be generated between the second partition electrodes 12 and the pixel electrodes 11;
the voltages applied by the first blocking electrode 24 and the second blocking electrode 12 are the same, but the invention is not limited thereto, and the first blocking electrode 24 may be electrically connected to the common electrode in the color filter 2; the second isolating electrode 12 is connected with a common electrode in the array substrate 1; the common electrode in the color filter substrate 2 and the common electrode in the array substrate 1 are applied with the same voltage. The power supply circuit is electrically connected with the common electrode, so that the problem that a power supply circuit needs to be additionally arranged can be solved. The first and second blocking electrodes 24 and 12 may be powered by fabricating corresponding lines on corresponding layers, for example, the same layer, through a photolithography process, which is not particularly limited herein.
By the above manner, the extension portion 23 is kept completely black to replace part of the functions of the existing black matrix 22, so that on the premise that the size of the pixel electrode is not changed, the edge of the pixel electrode does not exist in the overlapping portion of the color resistor 21 and the black matrix 22, that is, the overlapping portion is arranged outside the edge of each pixel electrode, so that the liquid crystal molecules are not interfered by the overlapping portion in the edge area of the pixel electrode to influence the alignment, and the occurrence of alignment dark stripes at the edge of the pixel electrode is reduced.
In the invention, the width of the extension area 23 is not less than 2um, the line width of the black matrix 22 is not less than 2um and not more than the distance between the extension areas 23 of the two color resistors 21, and here the width between the extension areas 23 of the two color resistors 21 can be adjusted as required, only by ensuring that the line width of the black matrix 22 is not less than 2 um.
The first blocking electrode 24 and the second blocking electrode 12 are adapted in shape, such as rectangular, circular, etc., and are not limited in detail.
The first blocking electrode 24 and the second blocking electrode 12 are made of the same conductive material, preferably ITO (indium tin oxide) conductive material.
The invention relates to a manufacturing method of a display panel, which comprises the steps of manufacturing an array substrate and manufacturing a color filter substrate;
the manufacturing method of the array substrate adopts the manufacturing process of the prior art to manufacture; for example, the gate electrode, the gate insulating layer, the active layer, the source/drain electrodes, the interlayer insulating layer, the planarization layer, the common electrode, the passivation layer, and the pixel electrode are all fabricated by the processes of the prior art, which are not described in detail herein; the specific arrangement form or position of the components can be changed according to the requirement;
in the manufacturing of the array substrate, after the pixel electrode 11 is manufactured, a second blocking electrode 12 is manufactured on the periphery of the pixel electrode 11, the second blocking electrode 12 is opposite to the first blocking electrode 24 in position in a circle, the second blocking electrode 12 is not in contact with the pixel electrode 11, specifically, a layer of conductive material is coated, and the conductive material is subjected to a photolithography process to form the second blocking electrode 12. However, the present invention is not limited thereto, and the second blocking electrode 12 (shown in fig. 4) may be formed at the same time as the pixel electrode 11 is formed by a photolithography process when the pixel electrode 11 is manufactured.
The method of manufacturing the color filter substrate is as follows, and the following description will be made only for a part of the manufacturing process for designing the improvement of the present invention, but the present invention is not limited thereto:
as shown in fig. 1, a black photoresist material is coated on a substrate 100, and a photolithography process is performed on the black photonic material to form a black matrix 22, wherein a line width of the black matrix 22 is smaller than that of the prior art;
as shown in fig. 2, the color resist 21 is manufactured, and the color resist 21 such as R, G, B is manufactured by a photolithography process, and at this time, since the line width of the black matrix 22 is reduced, the extension region 23 is formed around the color resist 21;
forming a via hole in the extension region 23 by a photolithography process, and forming a first blocking electrode 24 in the via hole; specifically, a layer of conductive material is coated, and the conductive material outside the via hole is etched away through a photolithography process, so that the first blocking electrode 24 is formed in the via hole, wherein the photolithography process may be a yellow light process, and is not specifically limited herein; the coating of a layer of conductive material is specifically to coat a layer of conductive material on the color resistors and the black matrix.
Coating a layer of ITO material to form an ITO conductive layer 25 (shown in fig. 4), specifically, coating a layer of ITO material on the black matrix, the color resistor and the first blocking electrode 24 to form the ITO conductive layer 25;
finally, the array substrate and the color filter substrate are subjected to a process of alignment film (PI) and ODF (liquid crystal dropping process and box-forming) (shown in fig. 5), and then processes such as PSVA, laser cutting, attaching of a polarizer and COF substrate are performed.
In the above manufacturing method, the first blocking electrode 24 and the second blocking electrode 12 may be independently powered by using a form of separate wiring, or may be in contact with the common electrode through a via hole to realize power supply, which is not limited specifically herein. The independent wiring mode can be realized by forming corresponding wires through a photoetching process.
The width of extension region 23 is not less than 2um, and the linewidth of black matrix 22 is not less than 2um, and is not more than the width between the extension region 23 of two colour resistances 21, and the width between the extension region 23 of two colour resistances 21 here can be adjusted as required, only need to guarantee that the linewidth of black matrix 22 is not less than 2um can.
The first blocking electrode 24 and the second blocking electrode 12 are adapted in shape, such as rectangular, circular, etc., and are not limited in detail.
The first blocking electrode 24 and the second blocking electrode 12 are made of the same conductive material, preferably ITO conductive material.
The invention reduces the line width of the black matrix of the color filter substrate, adds the extension area and the first partition electrode around the color resistor, correspondingly manufactures the second partition electrode corresponding to the first partition electrode outside the pixel electrode of the array substrate, and inputs the same voltage to keep the voltage of the first partition electrode and the second partition electrode consistent, thereby keeping the partial function of replacing the black matrix by the full black of the extension area, simultaneously keeping the size of the pixel electrode unchanged and the edge of the pixel electrode not having the overlapped part of the color resistor and the black matrix, and ensuring that the liquid crystal molecules are not interfered by the overlapped part of the focus in the edge area of the pixel electrode to influence the alignment, thereby reducing the occurrence of the alignment dark stripes at the edge of the pixel electrode.
While the invention has been shown and described with reference to certain embodiments, those skilled in the art will understand that: various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims and their equivalents.
Claims (10)
1. A display panel comprising an array substrate (1) and a color filter substrate (2), characterized in that:
the color filter substrate (2) comprises a color resistor (21) and a black matrix (22), an extension area (23) is arranged between the periphery of the color resistor (21) and the black matrix (22), a through hole is formed in the extension area (23), and a first partition electrode (24) made of a conductive material is arranged in the through hole;
the array substrate (1) comprises pixel electrodes (11) which correspond to the color resistors (21) one by one, a second partition electrode (12) which is opposite to the first partition electrode (24) in position in a circle is arranged on the periphery of each pixel electrode (11), and the second partition electrodes (12) and the pixel electrodes (11) are arranged at intervals and are located on the same layer;
the first blocking electrode (24) and the second blocking electrode (12) are applied with the same voltage, so that the extension region (23) is completely black.
2. The display panel according to claim 1, characterized in that: the first partition electrode (24) is electrically connected with a common electrode in the color filter substrate (2); the second isolating electrode (12) is connected with a common electrode in the array substrate (1); the common electrode in the color filter substrate (2) and the common electrode in the array substrate (1) are applied with the same voltage.
3. The display panel according to claim 1, characterized in that: the width of the extension region (23) is not less than 2 um.
4. The display panel according to claim 1, characterized in that: the line width of the black matrix (22) is not less than 2um and not more than the distance between the extension regions (23) of the two color resistors (21).
5. The display panel according to claim 1, characterized in that: the first isolated electrode (24) and the second isolated electrode (12) are matched in shape.
6. The display panel according to claim 1, characterized in that: the first isolating electrode (24) and the second isolating electrode (12) are made of the same conductive material.
7. The display panel according to claim 1, characterized in that: the display panel is in a PSVA display mode.
8. A manufacturing method of a display panel comprises the manufacturing of an array substrate and the manufacturing of a color filter substrate, and is characterized in that:
in the manufacturing of the color filter substrate, after the color resistor (21) is manufactured, a via hole is manufactured in an extension area (23) between the color resistor (21) and the black matrix (22) through a photoetching process, and a first partition electrode (24) is manufactured in the via hole;
in the manufacturing of the array substrate, after the pixel electrode (11) is manufactured, a second partition electrode (12) which is opposite to the first partition electrode (24) in position is manufactured on the periphery of the pixel electrode (11) in a circle, and the second partition electrode (12) is not in contact with the pixel electrode (11).
9. The method for manufacturing a display panel according to claim 8, wherein: and the step of manufacturing the first partition electrode (24) in the through hole comprises the steps of coating a layer of conductive material, and etching away the conductive material outside the through hole through a photoetching process so as to form the first partition electrode.
10. The method for manufacturing a display panel according to claim 8, wherein: and manufacturing a second partition electrode (12) with a circle opposite to the first partition electrode (24) on the periphery of the pixel electrode (11), coating a layer of conductive material, and forming the second partition electrode (12) by a photoetching process.
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| CN201710814176.4A CN107688258B (en) | 2017-09-11 | 2017-09-11 | Display panel and manufacturing method thereof |
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| CN201710814176.4A CN107688258B (en) | 2017-09-11 | 2017-09-11 | Display panel and manufacturing method thereof |
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| CN107688258B true CN107688258B (en) | 2020-11-13 |
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| CN110456575B (en) * | 2019-08-20 | 2021-07-06 | 成都中电熊猫显示科技有限公司 | Liquid crystal display panel |
| CN112068377A (en) * | 2020-09-28 | 2020-12-11 | 成都中电熊猫显示科技有限公司 | Array substrate and liquid crystal panel |
| CN112526782B (en) * | 2020-12-07 | 2023-05-30 | 成都京东方显示科技有限公司 | Liquid crystal display panel and manufacturing method thereof |
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| KR20120053408A (en) * | 2010-11-17 | 2012-05-25 | 엘지디스플레이 주식회사 | Array panel, liquid crystal panel comprising the same and liquid crystal display device comprising the same |
| CN202583650U (en) * | 2012-05-25 | 2012-12-05 | 京东方科技集团股份有限公司 | Color film substrate and liquid crystal display panel |
| CN204143133U (en) * | 2014-09-29 | 2015-02-04 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal indicator |
| CN104808384A (en) * | 2015-05-22 | 2015-07-29 | 京东方科技集团股份有限公司 | Color film substrate and production method, display panel and display device of color film substrate |
| CN106886108A (en) * | 2017-04-28 | 2017-06-23 | 京东方科技集团股份有限公司 | A kind of display panel and preparation method thereof, display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR20120053408A (en) * | 2010-11-17 | 2012-05-25 | 엘지디스플레이 주식회사 | Array panel, liquid crystal panel comprising the same and liquid crystal display device comprising the same |
| CN202583650U (en) * | 2012-05-25 | 2012-12-05 | 京东方科技集团股份有限公司 | Color film substrate and liquid crystal display panel |
| CN204143133U (en) * | 2014-09-29 | 2015-02-04 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal indicator |
| CN104808384A (en) * | 2015-05-22 | 2015-07-29 | 京东方科技集团股份有限公司 | Color film substrate and production method, display panel and display device of color film substrate |
| CN106886108A (en) * | 2017-04-28 | 2017-06-23 | 京东方科技集团股份有限公司 | A kind of display panel and preparation method thereof, display device |
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| CN107688258A (en) | 2018-02-13 |
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