CN107664809B - A kind of projection objective - Google Patents
A kind of projection objective Download PDFInfo
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- CN107664809B CN107664809B CN201610608624.0A CN201610608624A CN107664809B CN 107664809 B CN107664809 B CN 107664809B CN 201610608624 A CN201610608624 A CN 201610608624A CN 107664809 B CN107664809 B CN 107664809B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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Abstract
The present invention provides a kind of projection objective, the projection objective is at least made of 23 lens, the projection objective successively includes: the first lens group, the second lens group and the third lens group from object plane to image planes, the object plane of the effective focal length f1 of the projection objective and the projection objective meets 0.1 to image planes distance L < | L/f1 | < 0.75, the object space telecentricity angle, θ of the projection objective meets 5mrad < θ < 7mrad.Projection objective provided by the invention is at least made of 23 lens, meet 0.1 by the object plane of the effective focal length f1 of the projection objective and the projection objective to image planes distance L < | L/f1 | < 0.75 and the object space telecentricity angle of the projection objective be 5mrad < θ < 7mrad, both this system can have been reduced for the susceptibility of the irregularity degree generated on mirror surface due to processing, sensitivity of the object plane to distortion is improved again, to have the function of that independent adjust is distorted, to improve the compensation effect of image quality, the projection objective reduces the quantity of lens while improving image quality, to reduce the cost that projection objective uses lens.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors more particularly to a kind of projection objectives.
Background technique
By semicentennial high speed development, the semiconductor technology of integrated circuit (IC) is relied on to human society
Development produces revolutionary impact.Wherein, required pattern can be applied to workpiece as essential equipment by lithographic equipment
On target part on.Lithographic equipment can be used for the manufacture of such as integrated circuit.In general, the range of lithographic equipment include but
It is not limited to: IC manufacturing lithographic equipment, panel display board lithographic equipment, MEMS/MOEMS lithographic equipment, Advanced Packaging
Lithographic equipment, printed circuit board lithographic equipment, printed circuit board processing unit (plant) and printing circuit board element mounting device etc..
At present on lithographic equipment, the projection objective lens optical system demand of micrometer resolution, high yield increasingly increases, such as
Authorization Notice No. is that the patent of invention of CN103364928B discloses a kind of projection objective lens optical system, as shown in Figure 1, entire throw
Shadow object lens include 29 optical lenses altogether, are arranged successively along the light direction of propagation, are segmented into according to the distribution situation of focal power
Five groups, be the first lens group S1, the second lens group S2, the third lens group S3, the 4th lens group S4 and the 5th lens group S5 respectively.
However the patent disadvantage is: it is bad to the compensation effect of image quality, cause during machine debugging, needs many compensating glass
Piece could compensate, and increase product cost.How to improve the compensation effect of image quality and reduces cost as those skilled in the art
A technical problem urgently to be resolved.
Summary of the invention
The purpose of the present invention is to provide a kind of projection objectives, to solve the compensation effect of the image quality of existing projection objective
Not high and at high cost problem.
In order to solve the above technical problems, the present invention provides a kind of projection objective, the projection objective is at least by 23 lens
Composition, the projection objective successively include: the first lens group, the second lens group and the third lens group from object plane to image planes, described
The focal power of first lens group is positive, and the focal power of second lens group is negative, and the focal power of the third lens group is positive,
The object plane of the effective focal length f1 of the projection objective and the projection objective meets 0.1 to image planes distance L < | L/f1 | < 0.75,
The object space telecentricity angle, θ of the projection objective meets 5mrad < θ < 7mrad.
Preferably, in the projection objective, first lens group is at least made of four lens, first lens
The second lens that the first lens and at least one focal power that at least one focal power of group is positive are negative, first lens
Afocal system is formed with second lens.
Preferably, in the projection objective, the material of four lens of first lens group is following three kinds of situations
One of, the first situation: the material of four lens covers the low Abbe number of high-index material, Abbe number in high-index material
With low-index material high Abbe number three classes；Second situation: the material of four lens covers the low Abbe of high-index material
Two class of Abbe number in several and high-index material；The third situation: the material of four lens cover high-index material low Ah
Shellfish number and two class of low-index material high Abbe number；Wherein, the low Abbe number of high-index material refers to that the I line refractive index of material is big
In 1.56 and Abbe number less than 54, in high-index material Abbe number refer to material I line refractive index be greater than 1.56 and Abbe number
Greater than 54 less than 64, low-index material high Abbe number refers to the I line refractive index of material less than 1.54 and Abbe number is greater than 64.
Preferably, in the projection objective, the material of four lens of first lens group includes at least 2 or more
High-index material in Abbe number or low-index material high Abbe number.
Preferably, in the projection objective, four power of lens of first lens group be followed successively by it is negative, positive,
Just and just.
Preferably, in the projection objective, the focal length f of first lens groupG1Meet 150mm < fG1<350mm。
Preferably, in the projection objective, the angle of incidence of light of first lens is less than 15 degree and/or described
The beam projecting angle of first lens is less than 15 degree.
Preferably, in the projection objective, the focal length f2 of first lens is greater than 420mm.
Preferably, in the projection objective, second lens group is at least made of nine lens, second lens
Group includes at least the adjacent combination of the lens being negative by two panels focal power.
Preferably, in the projection objective, the material of nine lens of second lens group includes at least 6 or more
Low-index material high Abbe number, low-index material high Abbe number refer to the I line refractive index of material less than 1.54 and Abbe number
Greater than 64.
Preferably, in the projection objective, nine power of lens of second lens group are successively negative, bear,
It is negative, negative, positive, positive and negative, negative and negative.
Preferably, in the projection objective, the focal length f of second lens groupG2Satisfaction -200mm < fG2<0mm。
Preferably, in the projection objective, second lens group is divided into the first sub-lens group, the second sub-lens
Group and third sub-lens group, the first sub-lens group include at least one as the third lens of meniscus lens.
Preferably, in the projection objective, the angle of incidence of light of the third lens is less than 10 degree and/or described
The beam projecting angle of the third lens is less than 30 degree.
Preferably, in the projection objective, the front surface radius of curvature R 1 and rear surface curvature half of the third lens
Diameter R2 meets R1=R2+d, and wherein d is the center thickness of the third lens.
Preferably, in the projection objective, the focal length f of the first sub-lens groupG21Satisfaction -100mm < fG21< 0mm,
And 0.63 < | fG2/fG21|<0.8。
Preferably, in the projection objective, lens that the second sub-lens group at least two panels focal power is positive
Adjacent combination and the adjacent combination of meniscus lens that is negative of an at least two panels focal power.
Preferably, in the projection objective, the focal length f of the second sub-lens groupG22Meet 0mm < fG22<350mm。
Preferably, in the projection objective, the third sub-lens group includes at least pair that a two panels focal power is negative
The adjacent combination of concavees lens.
Preferably, in the projection objective, the focal length f of the third sub-lens groupG23Satisfaction -100mm < fG23< 0mm,
And 0.63 < | fG2/fG23|<0.8。
Preferably, in the projection objective, the second lens group focal length fG2Meet fG2<fG23+50mm。
Preferably, in the projection objective, the third lens group is at least made of 10 lens, the third lens
Group at least 4 meniscus lens and at least 1 biconcave lens.
Preferably, in the projection objective, the focal length of the third lens group is 100mm < fG3<300mm。
Preferably, in the projection objective, diaphragm is located in the third lens group.
Preferably, in the projection objective, the material for the lens that the focal power before the diaphragm is positive is at least
There is one for Abbe number in high-index material, Abbe number refers to that the I line refractive index of material is greater than 1.56 in high-index material
And Abbe number is greater than 54 less than 64.
Preferably, in the projection objective, at least 2 focal powers are positive behind the diaphragm lens.
Preferably, in the projection objective, at least one positive and negative positive power lens group, described before the diaphragm
Positive and negative positive power lens group includes that 3 focal powers are followed successively by positive and negative and positive lens, the positive and negative positive power lens group
Focal length fG31Greater than 450mm.
Preferably, in the projection objective, the projection objective also includes that the first plate, third plate and third are flat
Plate, first plate are located at before first lens group, and second plate is located at behind the diaphragm, and the third is flat
Plate is located at behind the third lens group.
Preferably, in the projection objective, the focal length f of the positive and negative positive power lens groupG31Meet 450mm < fG31<
750mm, and 3 < | fG3/fG31|<5.3。
Preferably, in the projection objective, the material of the lens of the positive and negative positive power lens group includes 2 or more
Low-index material high Abbe number, low-index material high Abbe number refer to the I line refractive index of material less than 1.54 and Abbe number
Greater than 64.
Projection objective provided by the invention is at least made of 23 lens, by the effective focal length f1 of the projection objective with
The object plane of the projection objective to image planes distance L meet 0.1 < | L/f1 | < 0.75 and the projection objective object space telecentricity
Angle is 5mrad < θ < 7mrad, can not only reduce this system for the susceptibility of the irregularity degree generated on mirror surface due to processing, but also
Sensitivity of the object plane to distortion is improved, to have the function of that independent adjust is distorted, to improve the compensation effect of image quality, is being mentioned
The projection objective reduces the quantity of lens while high image quality, to reduce the cost that projection objective uses lens.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the projection objective of the prior art；
Fig. 2 is the structural schematic diagram of the projection objective of the embodiment of the present invention one；
Fig. 3 is the astigmatism and distortion schematic diagram after the scheme of the embodiment of the present invention one is implemented；
Fig. 4 is the aberration curve schematic diagram after the scheme of the embodiment of the present invention one is implemented；
Fig. 5 is the structural schematic diagram of the projection objective of the embodiment of the present invention two.
Specific embodiment
In order to keep objects, features and advantages of the present invention more obvious and easy to understand, attached drawing is please referred to.It should be clear that this explanation
Book structure depicted in this specification institute accompanying drawings, ratio, size etc., only to cooperate the revealed content of specification, for being familiar with this
The personage of technology understands and reads, and is not intended to limit the invention enforceable qualifications, therefore does not have technical essence meaning
Justice, the modification of any structure, the change of proportionate relationship or the adjustment of size are not influencing the effect of present invention can be generated and institute
Under the purpose that can reach, should all still it fall in the range of disclosed technology contents obtain and can cover.
It will be appreciated by those skilled in the art that toward the direction of object plane be on ordinary meaning before, be toward the directions of image planes
Behind on ordinary meaning, in the present embodiment, about it is preceding with after be all based on this.
Since the distortion sensitivity and telecentricity angle of projection objective are in a linear relationship, it is limited to the Adjustment precision of mirror surface, this
In the scheme of invention, the chief ray of each visual field on object plane is incident on the first optical element with angle 5mrad < θ < 7mrad, both
This system can be reduced for the susceptibility of the irregularity degree generated on mirror surface due to processing, and improve object plane to the sensitive of distortion
Degree, to have the function of that independent adjust is distorted.
As shown in Fig. 2, the present invention provides a kind of projection objective, the projection objective is at least made of 23 lens, described
Projection objective successively includes: the first lens group G1, the second lens group G2 and the third lens group G3 from object plane to image planes, and described first
The focal power of lens group G1 is positive, and the focal power of the second lens group G2 is negative, and the focal power of the third lens group G3 is
Just, the object plane of the effective focal length f1 of the projection objective and the projection objective meet 0.1 to image planes distance L < | L/f1 | <
0.75, the object space telecentricity angle, θ of the projection objective meets 5mrad < θ < 7mrad.
Embodiment one
With continued reference to Fig. 2, the first lens group G1 is at least made of four lens, and the first lens group G1 is at least
The lens that the first lens and at least one focal power that one focal power is positive are negative, first lens are saturating with described second
Microscope group realizes the function of separately adjustable multiplying power at afocal system, the afocal system, in the particular embodiment both includes lens
2, lens 3, lens 4 and lens 5.
Preferably, the material of four lens of the first lens group G1 is one of following three kinds of situations, the first situation:
The material of four lens covers the low Abbe number of high-index material, Abbe number and low-index material are high in high-index material
Abbe number three classes；Second situation: the material of four lens covers the low Abbe number of high-index material and high-index material
Middle two class of Abbe number；The third situation: the material of four lens covers the low Abbe number of high-index material and low-refraction material
Expect two class of high Abbe number；Wherein, the low Abbe number of high-index material refers to that the I line refractive index of material is greater than 1.56 and Abbe number is small
Abbe number refers to that the I line refractive index of material is greater than 1.56 and Abbe number is greater than 54 less than 64, low folding in 54, high-index material
Penetrate rate material high Abbe number refer to the I line refractive index of material less than 1.54 and Abbe number be greater than 64.Preferably, first lens
The material of four lens of group G1 is including at least Abbe number or the high Abbe of low-index material in 2 or more high-index materials
Number.
In the present embodiment, four power of lens of the first lens group G1 are respectively negative, positive, just and just, most
After form total focal power and be positive.Preferably, the focal length f of the first lens group G1G1Meet 150mm < fG1<350mm(1)。
Preferably, the angle of incidence of light of first lens is less than 15 degree and/or the beam projecting of first lens
Degree is less than 15 degree.Preferably, the focal length f2 of first lens is greater than 420mm.There is the first lens group G1 only to again
Rate has sensitivity, and very low to the sensitivity of other image qualities, so that the first lens group G1 be made to have compensation overriding.
With continued reference to shown in Fig. 2, the second lens group G2 is at least made of nine lens, and the second lens group G2 is extremely
Less comprising one by two panels negative-power lenses adjacent combination, in the particular embodiment both include lens 6, lens 7, lens 8,
Lens 9, lens 10, lens 11, lens 12, lens 13 and lens 14.
Preferably, it is high to include at least 6 or more low-index materials for the material of nine lens of the second lens group G2
Abbe number, low-index material high Abbe number refers to the I line refractive index of material less than 1.54 and Abbe number is greater than 64.
In the present embodiment, nine power of lens of the second lens G2 be successively negative, bear, is negative, positive, just, just,
It is negative, negative, negative, it finally forms total focal power and is negative.Preferably, the focal length f of the second lens group G2G2Satisfaction -200mm < fG2<
0mm(2)。
In the present embodiment, the second lens group G2 is divided into the first sub-lens group G21, the second sub-lens group G22
One is included at least for the third lens of meniscus lens, specific with third sub-lens group G23, the first sub-lens group G21
I.e. the first sub-lens group G21 includes lens 6, lens 7 and lens 8 in embodiment, and the second sub-lens group G22 includes saturating
Mirror 9, lens 10, lens 11 and lens 12, the third sub-lens group G23 includes lens 13 and lens 14.
Preferably, the angle of incidence of light of the third lens is less than 10 degree and/or the beam projecting of the third lens
Angle is less than 30 degree.Preferably, the front surface radius of curvature R 1 of the third lens and rear surface radius of curvature R 2 meet R1=
R2+d, wherein d is the center thickness of the meniscus lens G211, and the front surface of the third lens refers to one towards object plane
Face, the rear surface of the third lens refer to the one side towards image planes.By the third lens can optical axis direction generate one compared with
For the apparent second order curvature of field, and other aberrations will not be generated.Preferably, the focal length f of the first sub-lens group G21G21It is full
Foot -100mm < fG21< 0mm (3), and 0.63 < | fG2/fG21|<0.8(4)。
In the present embodiment, the adjacent sets for the lens that the second sub-lens group G22 at least two panels focal power is positive
The adjacent combination for the meniscus lens that conjunction and an at least two panels focal power are negative.Preferably, the second sub-lens group G22
Focal length fG22Meet 0mm < fG22<350mm(5)。
In the present embodiment, the third sub-lens group G23 includes at least the biconcave lens that a two panels focal power is negative
Adjacent combination.Preferably, the focal length f of the third sub-lens group G23G23Satisfaction -100mm < fG23< 0mm (6), and 0.63 < |
fG2/fG23|<0.8(7).Preferably, the second lens group G2 focal length fG2Meet fG2<fG23+50mm(8)。
With continued reference to shown in Fig. 2, the third lens group G3 is at least made of 10 lens, and the third lens group G3 is extremely
Rare 4 meniscus lens and at least 1 biconcave lens both include lens 15, lens 16, lens in the particular embodiment
18, lens 19, lens 20, lens 21, lens 22, lens 23, lens 24 and lens 25.
Preferably, the focal length f of the third lens group G3G3Meet 100mm < fG3<300mm(9).Preferably, diaphragm is located at
In the third lens group G3.Preferably, the material for the lens that the focal power before the diaphragm is positive at least one
For Abbe number in high-index material, Abbe number refers to that the I line refractive index of material is greater than 1.56 and Abbe in high-index material
Number is greater than 54 less than 64, and the direction from the diaphragm toward object plane is referred to before diaphragm.
Preferably, the lens that at least 2 focal powers are positive behind the diaphragm.Preferably, before the diaphragm at least
There is a positive and negative positive power lens group, the positive and negative positive power lens group is followed successively by positive and negative and positive comprising 3 focal powers
Lens, the focal length f of the positive and negative positive power lens groupG31Greater than 450mm.
With continued reference to Fig. 2, in the present embodiment, the projection objective also includes the first plate 1, third plate 17 and third
Plate 26, first plate 1 are located at before the first lens group G1, and second plate 17 is located at behind the diaphragm, described
Third plate 26 is located at behind the third lens group G3, wherein the first plate 1 and third plate 26 avoid interior as protection glass
Portion's optical lens is interfered by ambient systems, and second plate 17 supports the diaphragm for fixed.
Preferably, the focal length f of the positive and negative positive power lens groupG31Meet 450mm < fG31< 750mm, and 3 < | fG3/
fG31|<5.3.Preferably, the material of the lens of the positive and negative positive power lens group include 2 or more low-index materials high Ah
Shellfish number, low-index material high Abbe number refers to the I line refractive index of material less than 1.54 and Abbe number is greater than 64.
Numerical aperture of projection objective maximum of the invention can achieve 0.65 or more, be suitable for ultraviolet spectral range, especially
It is I-line wave band, maximum spectral width can achieve 5nm.Each visual field with doubly telecentric effect, i.e., in object space and object plane
Chief ray be parallel to optical axis and be incident on the first optical element；In image space, the chief ray of each visual field point is quasi-parallel to be gone out in optical axis
It penetrates, is imaged in image planes, angle < 5mrad with optical axis can achieve 3mrad in some cases hereinafter, the system curvature of field can be with
Reach 30nm or less.Therefore, projection objective of the invention is applied can reduce loss of the curvature of field to depth of focus in Optical Coatings for Photolithography,
Spherical aberration wave aberration is improved simultaneously, reduces the loss of the image quality of exposure figure caused by wave aberration deteriorates.Projection of the invention
Object lens can be widely used for can be particularly used in the technology of 280nm node in the technology of 220nm node.
Table 1 gives the specific design value of the projection objective of this example one, and positive radius value indicates the center of curvature in table
The right in face, negative radius value represent the center of curvature between the left side on surface, optic thickness or two optical elements
Interval is to distance on the axis on next surface, and all dimensional units are all millimeters, and Ap_STO refers to diaphragm.
Table 1
Fig. 3 is the astigmatism and distortion schematic diagram after the scheme of the present embodiment one is implemented, and shows the picture of the scheme of embodiment one
It dissipates good and distorts smaller.Fig. 4 is the aberration curve schematic diagram after the scheme of the present embodiment one is implemented, by high in different visual fields
The lower aberration curve of degree and pupil statistics indicate that the image quality of this programme to correct situation preferable, realize good in the +/- 5nm of I line
As matter.
Embodiment two
As shown in figure 5, the projection objective of the present embodiment two is made of 23 lens and 3 plates, it is divided into 3 lens groups,
First lens group G1 is made of 12 lens, and total focal power is positive, and the second lens group G2 is made of 3 lens, focal power according to
It is secondary to be positive, is negative, positive, it finally forms total focal power and is positive, the third lens group G3 is similar with the third lens group of implementation column one.
Similarly, must have a positive light coke eyeglass in the first lens group G1, effect be with described first thoroughly
Negative power lenses in microscope group G1 form afocal system, and afocal system has the function of separately adjustable multiplying power.To make described the
One lens group G1 has and only has sensitivity to multiplying power, and very low to the sensitivity of other image qualities, finally makes the projection objective
With compensation overriding.
The focal length f of the first lens group G1G1With the focal length f of the second lens group G2G2Meet following feature:
400mm<fG1<650mm (21)
400mm<fG2<550mm (22)
1.1<fG1/fG2<1.5 (23)
Table 2 gives the specific design value of the projection objective of this example two.
Table 2
Projection objective provided by the invention is at least made of 23 lens, by the effective focal length f1 of the projection objective with
The object plane of the projection objective to image planes distance L meet 0.1 < | L/f1 | < 0.75 and the projection objective object space telecentricity
Angle is 5mrad < θ < 7mrad, can not only reduce this system for the susceptibility of the irregularity degree generated on mirror surface due to processing, but also
Sensitivity of the object plane to distortion is improved, to have the function of that independent adjust is distorted, to improve the compensation effect of image quality, is being mentioned
The projection objective reduces the quantity of lens while high image quality, to reduce the cost that projection objective uses lens.
Foregoing description is only the description to present pre-ferred embodiments, not to any restriction of the scope of the invention, this hair
Any change, the modification that the those of ordinary skill in bright field does according to the disclosure above content, belong to the protection of claims
Range.
Claims (27)
1. a kind of projection objective, which is characterized in that the projection objective is at least made of 23 lens, and the projection objective is from object
Face is successively made of the first lens group, the second lens group and the third lens group to image planes, and the focal power of first lens group is
Just, the focal power of second lens group is negative, and the focal power of the third lens group is positive, effective coke of the projection objective
Object plane away from f1 and the projection objective meets 0.1 to image planes distance L < | L/f1 | < 0.75, the object space of the projection objective is remote
Heart angle, θ meets 5mrad < θ < 7mrad；
First lens group is at least made of four lens, described at least one focal power of first lens group be positive first
The second lens that lens and at least one focal power are negative, first lens and second lens form afocal system.
2. projection objective as described in claim 1, which is characterized in that the material of four lens of first lens group is such as
One of lower three kinds of situations, the first situation: the material of four lens covers the low Abbe number of high-index material, high refractive index material
Abbe number and low-index material high Abbe number three classes in material；Second situation: the material of four lens covers high refractive index
Two class of Abbe number in the low Abbe number of material and high-index material；The third situation: the material of four lens covers high refraction
The low Abbe number of rate material and two class of low-index material high Abbe number；Wherein, the low Abbe number of high-index material refers to the I of material
Line refractive index is greater than 1.56 and Abbe number is less than 54, and Abbe number refers to that the I line refractive index of material is greater than in high-index material
1.56 and Abbe number be greater than 54 less than 64, low-index material high Abbe number refer to the I line refractive index of material less than 1.54 and Ah
Shellfish number is greater than 64.
3. projection objective as claimed in claim 2, which is characterized in that the material of four lens of first lens group be with
One of lower three kinds of situations: the first situation, Abbe number and 1 or more low-index material in 1 or more high-index material
High Abbe number；Second situation, including at least Abbe number in 2 or more high-index materials；The third situation, includes at least
2 or more low-index material high Abbe numbers.
4. projection objective as described in claim 1, which is characterized in that four power of lens of first lens group according to
Secondary is negative, positive, just and just.
5. projection objective as described in claim 1, which is characterized in that the focal length f of first lens groupG1Meet 150mm <
fG1<350mm。
6. projection objective as described in claim 1, which is characterized in that the angle of incidence of light of first lens is less than 15
The beam projecting angle of degree and/or first lens is less than 15 degree.
7. projection objective as described in claim 1, which is characterized in that the focal length f2 of first lens is greater than 420mm.
8. projection objective as described in claim 1, which is characterized in that second lens group is at least made of nine lens,
Second lens group includes at least the adjacent combination of the lens being negative by two panels focal power.
9. projection objective as claimed in claim 8, which is characterized in that the material of nine lens of second lens group is at least
Comprising 6 or more low-index material high Abbe numbers, low-index material high Abbe number refers to that the I line refractive index of material is less than
1.54 and Abbe number be greater than 64.
10. projection objective as claimed in claim 8, which is characterized in that nine power of lens of second lens group
Successively be negative, bear, is negative, positive, just, it is positive and negative, negative and negative.
11. projection objective as claimed in claim 10, which is characterized in that the focal length f of second lens groupG2Satisfaction -200mm
< fG2< 0mm。
12. projection objective as claimed in claim 11, which is characterized in that second lens group is divided into the first sub-lens
Group, the second sub-lens group and third sub-lens group, the first sub-lens group include at least one as the third lens of meniscus lens.
13. projection objective as claimed in claim 12, which is characterized in that the angle of incidence of light of the third lens is less than 10
The beam projecting angle of degree and/or the third lens is less than 30 degree.
14. the projection objective as described in any one of claim 12, which is characterized in that the focal length of the first sub-lens group
fG21Satisfaction -100mm < fG21< 0mm, and 0.63 < | fG2/ fG21|<0.8。
15. projection objective as claimed in claim 12, which is characterized in that the focal length f of the second sub-lens groupG22Meet 0mm
< fG22< 350mm。
16. projection objective as claimed in claim 12, which is characterized in that the third sub-lens group includes at least a two panels light
The adjacent combination for the biconcave lens that focal power is negative.
17. projection objective as claimed in claim 12, which is characterized in that the focal length f of the third sub-lens groupG23Meet-
100mm< fG23< 0mm, and 0.63 < | fG2/ fG23|<0.8。
18. projection objective as claimed in claim 17, which is characterized in that the second lens group focal length fG2Meet fG2< fG23+
50mm。
19. projection objective as described in claim 1, which is characterized in that the third lens group is at least made of 10 lens,
The third lens group at least 4 meniscus lens and at least 1 biconcave lens.
20. projection objective as claimed in claim 19, which is characterized in that the focal length f of the third lens groupG3Meet 100mm <
fG3<300mm。
21. projection objective as claimed in claim 20, which is characterized in that diaphragm is located in the third lens group.
22. projection objective as claimed in claim 21, which is characterized in that the focal power before the diaphragm is positive saturating
At least one is Abbe number in high-index material to the material of mirror, and Abbe number refers to the I line folding of material in high-index material
Rate is penetrated greater than 1.56 and Abbe number is greater than 54 less than 64.
23. projection objective as claimed in claim 21, which is characterized in that at least 2 focal powers are positive behind the diaphragm
Lens.
24. projection objective as claimed in claim 21, which is characterized in that at least one positive negative and positive light focus behind the diaphragm
Lens group is spent, the positive and negative positive power lens group includes that 3 focal powers are followed successively by positive and negative and positive lens, the positive negative and positive
The focal length f of power lenses groupG31Greater than 450mm.
25. projection objective as claimed in claim 21, which is characterized in that the projection objective also includes the first plate, second
Plate and third plate, first plate is located at before first lens group, after second plate is located at the diaphragm
Face, the third plate are located at behind the third lens group.
26. projection objective as claimed in claim 24, which is characterized in that the focal length f of the positive and negative positive power lens groupG31
Meet 450mm < fG31< 750mm, and 3 < | fG3/ fG31|< 5.3。
27. projection objective as claimed in claim 24, which is characterized in that the material of the lens of the positive and negative positive power lens group
Material includes 2 or more low-index material high Abbe numbers, and low-index material high Abbe number refers to that the I line refractive index of material is less than
1.54 and Abbe number be greater than 64.
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| CN201610608624.0A CN107664809B (en) | 2016-07-29 | 2016-07-29 | A kind of projection objective |
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|---|---|---|---|
| CN201610608624.0A CN107664809B (en) | 2016-07-29 | 2016-07-29 | A kind of projection objective |
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| CN107664809A CN107664809A (en) | 2018-02-06 |
| CN107664809B true CN107664809B (en) | 2019-11-26 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114563866B (en) * | 2022-03-14 | 2024-02-20 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Projection objective system |
Citations (5)
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|---|---|---|---|---|
| EP0717299A1 (en) * | 1994-12-14 | 1996-06-19 | Nikon Corporation | Exposure apparatus |
| CN1417610A (en) * | 2001-11-05 | 2003-05-14 | 尼康株式会社 | Projection optical system, explosure device and making process of equipment |
| CN101950065A (en) * | 2010-09-10 | 2011-01-19 | 北京理工大学 | Fully-spherical deep ultraviolet lithography objective |
| CN103364928A (en) * | 2012-03-31 | 2013-10-23 | 上海微电子装备有限公司 | Projection objective lens optical system |
| CN103499876A (en) * | 2013-10-10 | 2014-01-08 | 中国科学院光电技术研究所 | Pure refraction type projection optical system with large numerical aperture |
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2016
- 2016-07-29 CN CN201610608624.0A patent/CN107664809B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0717299A1 (en) * | 1994-12-14 | 1996-06-19 | Nikon Corporation | Exposure apparatus |
| CN1417610A (en) * | 2001-11-05 | 2003-05-14 | 尼康株式会社 | Projection optical system, explosure device and making process of equipment |
| CN101950065A (en) * | 2010-09-10 | 2011-01-19 | 北京理工大学 | Fully-spherical deep ultraviolet lithography objective |
| CN103364928A (en) * | 2012-03-31 | 2013-10-23 | 上海微电子装备有限公司 | Projection objective lens optical system |
| CN103499876A (en) * | 2013-10-10 | 2014-01-08 | 中国科学院光电技术研究所 | Pure refraction type projection optical system with large numerical aperture |
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