CN107492503B

CN107492503B - Method and system for adjusting thickness value of photoresist layer

Info

Publication number: CN107492503B
Application number: CN201610407448.4A
Authority: CN
Inventors: 刘洋
Original assignee: Semiconductor Manufacturing International Shanghai Corp; Semiconductor Manufacturing International Beijing Corp
Current assignee: Semiconductor Manufacturing International Shanghai Corp; Semiconductor Manufacturing International Beijing Corp
Priority date: 2016-06-12
Filing date: 2016-06-12
Publication date: 2020-03-10
Anticipated expiration: 2036-06-12
Also published as: CN107492503A

Abstract

A method and system for adjusting a photoresist layer thickness value, the method comprising: obtaining different thickness values of various photoresist layers and photoresist coating machine rotating speed values corresponding to the thickness values; dividing each thickness value of the various photoresist layers into a plurality of thickness intervals, obtaining a relational expression of the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine, and obtaining a calculation formula of a relational expression coefficient according to the relational expression; forming a coefficient table corresponding to the photoresist type and the thickness interval; and when the photoresist layer is coated, obtaining a corresponding relational expression coefficient from the coefficient table according to the type of the photoresist layer and the target thickness value, and calculating an adjusting rotating speed value corresponding to the target thickness value. According to the invention, by forming the coefficient table, when the photoresist layer is coated, the coefficient and the relational expression corresponding to the corresponding thickness interval can be selected according to the type of the photoresist layer and the target thickness value, the adjusting rotating speed value corresponding to the target thickness value is calculated, and the accuracy of adjusting the thickness value of the photoresist layer is higher.

Description

Method and system for adjusting thickness value of photoresist layer

Technical Field

The invention relates to the field of semiconductors, in particular to a method and a system for adjusting a thickness value of a photoresist layer.

Background

With the continuous development of ultra-large integrated circuits, circuit designs are more and more complex, feature sizes are smaller and smaller, and the influence of the feature sizes of the circuits on the performance of devices is larger and larger. Among them, photolithography is an important process in a semiconductor manufacturing process, and is a process of transferring a pattern on a mask to a wafer through exposure.

In the photolithography process, a photoresist layer is one of indispensable materials for defining a pattern in an ion implantation process or an etching process to protect a non-etching region or a non-ion implantation region, and the accuracy of the thickness value of the photoresist layer is a prerequisite for ensuring the accuracy of Critical Dimension (CD) of the pattern. In order to meet the critical dimension requirements, the thickness control of the photoresist layer is increasingly required.

However, the control accuracy of the photoresist layer thickness value in the prior art needs to be improved.

Disclosure of Invention

The invention aims to provide a method and a system for adjusting the thickness value of a photoresist layer, and improve the control accuracy of the thickness value of the photoresist layer.

In order to solve the above problems, the present invention provides a method for adjusting the thickness of a photoresist layer, which is used to adjust the thickness of a photoresist layer when a plurality of photoresist layers are coated by a photoresist coater. The method comprises the following steps: obtaining different thickness values of various photoresist layers and photoresist coating machine rotating speed values corresponding to the thickness values; dividing each thickness value of the various photoresist layers into a plurality of thickness intervals, obtaining a relational expression of the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine, and obtaining a calculation formula of a relational expression coefficient according to the relational expression; obtaining a relational coefficient of the photoresist layer thickness value and the photoresist coating machine table rotating speed value according to the relational expression, and forming a coefficient table corresponding to the photoresist type and the photoresist thickness interval; when a plurality of photoresist layers are coated by a photoresist coating machine, obtaining corresponding relational expression coefficients from the coefficient table according to the types of the photoresist layers and the target thickness values, obtaining a relational expression according to the relational expression coefficients, calculating an adjusting rotating speed value corresponding to the target thickness value, and coating the photoresist layers according to the adjusting rotating speed value; measuring the thickness value of the photoresist layer in the process of coating the photoresist layer by adjusting the rotating speed value, and judging whether the thickness of the photoresist layer meets the design specification; when the thickness value of the photoresist layer meets the design specification, continuing coating the photoresist layer; and stopping coating the photoresist layer when the thickness value of the photoresist layer does not meet the design specification, measuring the thickness value and the rotating speed value of the photoresist coating machine again, and obtaining the relational coefficient again through the calculation formula of the relational coefficient so as to update the relational coefficient table.

Correspondingly, the invention also provides a system for adjusting the thickness value of the photoresist layer, which is used for adjusting the thickness when a plurality of photoresist layers are coated by a photoresist coating machine, and comprises the following steps: the modeling module is used for obtaining different thickness values of various photoresist layers and photoresist coating machine table rotating speed values corresponding to the thickness values; the photoresist coating machine is also used for dividing each thickness value of the photoresist layers into a plurality of thickness intervals and obtaining a relational expression between the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine; the classification module is used for obtaining a relational coefficient of the photoresist layer thickness value and the photoresist coating machine table rotating speed value according to the relational expression, forming a coefficient table corresponding to the photoresist type and the photoresist thickness interval, and obtaining a calculation formula of the relational coefficient according to the relational expression; the adjusting module is used for obtaining corresponding relational expression coefficients from the coefficient table according to the type of the photoresist layer and the target thickness when a plurality of photoresist layers are coated by the photoresist coating machine, obtaining a relational expression according to the relational expression coefficients, calculating an adjusting rotating speed value corresponding to the target thickness value, and coating the photoresist layer according to the adjusting rotating speed value; the device is also used for measuring the thickness of the photoresist layer in the process of coating the photoresist layer by adjusting the rotating speed value and judging whether the thickness of the photoresist layer meets the design specification or not; when the thickness of the photoresist layer meets the design specification, continuing coating the photoresist layer; and stopping coating the photoresist layer when the thickness of the photoresist layer does not meet the design specification, measuring the thickness value and the rotating speed value of the photoresist coating machine again, and obtaining the relational coefficient again through the calculation formula of the relational coefficient so as to update the relational coefficient table.

Compared with the prior art, the technical scheme of the invention has the following advantages:

according to the method, the coefficient table corresponding to the photoresist type and the photoresist thickness interval is formed, when the photoresist layer is coated through the photoresist coating machine, the relational coefficient and the relational expression corresponding to the corresponding thickness interval can be selected according to the type of the photoresist layer and the target thickness value, the relational expression is obtained according to the relational coefficient, the adjusting rotating speed value corresponding to the target thickness value is calculated, and compared with the method that manual adjustment is carried out only through manpower, the method is higher in accuracy in adjusting the photoresist layer thickness value.

In the alternative, in the process of coating the photoresist layer by adjusting the rotating speed value, the thickness value of the photoresist layer is measured, the coating of the photoresist layer is stopped when the thickness value of the photoresist layer does not meet the design specification, the thickness value and the rotating speed value of a photoresist coating machine are measured again, and the relational coefficient is obtained again through the calculation formula of the relational coefficient to update the relational coefficient table, so that the relational coefficient can be continuously corrected along with the increase of data, and correspondingly, the accuracy is higher and higher.

Drawings

FIGS. 1 to 4 are schematic flow charts illustrating an embodiment of a method for adjusting a thickness of a photoresist layer according to the present invention;

FIGS. 5-7 are functional block diagrams of a system for adjusting a photoresist layer thickness according to an embodiment of the present invention.

Detailed Description

Generally, spin coating of a photoresist layer of the prior art mainly comprises the following steps: step 1: dripping, namely dripping the photoresist onto the wafer when the wafer is static or the rotating speed is slow; step 2: spreading the wafer in a rotating way, and increasing the rotating speed of the wafer to a fixed rotating speed value to enable the photoresist to extend to the surface of the whole wafer; and step 3: spin photoresist throwing, throwing off redundant photoresist, and obtaining a uniform photoresist layer on the wafer; and 4, step 4: and volatilizing the solvent, and continuously rotating the wafer coated with the photoresist layer at the fixed rotating speed value until the solvent is volatilized and the photoresist layer is dried. The wafer is accelerated from a static state to a fixed rotating speed value during rotary gluing, the fixed rotating speed value approximately determines the thickness value of the photoresist layer, and the fixed rotating speed value is an adjusting rotating speed value of a photoresist coating machine.

With the increasing of product types and the complex trend of the process, the types of the photoresist required in the production are also complex and various, and the requirements of the thickness values of the photoresist layers are also different. Due to different viscosities of different photoresists, the relationship curves of the thickness values of different photoresist layers and the rotating speed value of a photoresist coating machine are different; even for the same photoresist, the relationship curve between the photoresist layer thickness value and the photoresist coating machine adjusting rotating speed value in different thickness value intervals is different. Therefore, the difficulty of precisely adjusting the thickness value of the photoresist layer is increased.

In addition, in the face of different thickness value demands or different types of photoresist layers and a large number of photoresist coating machines, the thickness value is manually adjusted by manpower, and the thickness value precision and the product quality of the photoresist layer are difficult to guarantee.

In order to solve the technical problem, the invention provides a method for adjusting the thickness value of a photoresist layer, which is used for adjusting the thickness when a plurality of photoresist layers are coated by a photoresist coating machine. The method comprises the following steps: obtaining different thickness values of various photoresist layers and photoresist coating machine rotating speed values corresponding to the thickness values; dividing each thickness value of the various photoresist layers into a plurality of thickness intervals, obtaining a relational expression of the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine, and obtaining a calculation formula of a relational expression coefficient according to the relational expression; obtaining a relational coefficient of the photoresist layer thickness value and the photoresist coating machine table rotating speed value according to the relational expression, and forming a coefficient table corresponding to the photoresist type and the photoresist thickness interval; when a plurality of photoresist layers are coated by a photoresist coating machine, obtaining corresponding relational expression coefficients from the coefficient table according to the types of the photoresist layers and the target thickness values, obtaining a relational expression according to the relational expression coefficients, calculating an adjusting rotating speed value corresponding to the target thickness value, and coating the photoresist layers according to the adjusting rotating speed value; measuring the thickness value of the photoresist layer in the process of coating the photoresist layer by adjusting the rotating speed value, and judging whether the thickness of the photoresist layer meets the design specification; when the thickness value of the photoresist layer meets the design specification, continuing coating the photoresist layer; and stopping coating the photoresist layer when the thickness value of the photoresist layer does not meet the design specification, measuring the thickness value and the rotating speed value of the photoresist coating machine again, and obtaining the relational coefficient again through the calculation formula of the relational coefficient so as to update the relational coefficient table.

In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.

Fig. 1 to 4 are schematic flow charts illustrating a method for adjusting a thickness of a photoresist layer according to an embodiment of the present invention.

In this embodiment, the method for adjusting the thickness value of the photoresist layer is used for adjusting the thickness when a plurality of photoresist layers are coated by the photoresist coating machine.

Referring to fig. 1 and fig. 2 in combination, first, different thickness values of a plurality of photoresist layers and a photoresist coating machine rotation speed value corresponding to the thickness values are obtained; dividing each thickness value of the various photoresist layers into a plurality of thickness intervals, obtaining a relational expression of the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine, and obtaining a calculation formula of a relational expression coefficient according to the relational expression.

The above steps will be described in detail with reference to the accompanying drawings.

As shown In fig. 1, first, step S001 is performed to select a plurality of photoresist layers In a Work In Process (WIP); and selecting different photoresist coating machine rotating speed values for each photoresist layer, and respectively coating the photoresist layers to form the photoresist layers with different thickness values, namely, obtaining different thickness values of various photoresist layers and the photoresist coating machine rotating speed value corresponding to the thickness value through the product.

Specifically, the thickness of the photoresist layer can be measured by a measuring machine, and different thickness values of the various photoresist layers and the rotating speed value of the photoresist coating machine corresponding to the thickness values are stored in a machine system.

Then, step S002 is performed to distinguish the photoresist layer, for example, into: first photoresist layer, second photoresist layer … … nth photoresist layer. The data of the same photoresist layer comprise different thickness values and photoresist coating machine rotating speed values corresponding to the thickness values.

And then, executing step S003, and dividing the thickness values of the various photoresist layers into a plurality of thickness intervals for the same photoresist layer according to the thickness values of the photoresist layers. For example: dividing the thickness value of the first photoresist layer into a first thickness interval and a second thickness interval … … nth thickness interval, and dividing the thickness value of the nth photoresist layer into a first thickness interval and a second thickness interval … … nth thickness interval.

And finally, executing step S004 to obtain a relational expression of the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine, and obtaining a calculation formula of a relational expression coefficient according to the relational expression.

It should be noted that, for the same photoresist layer, the relationship between the thickness values of different thickness intervals and the rotation speed value of the photoresist coating machine is different. For example: for a first photoresist layer, the first photoresist layer has a first thickness interval and a second thickness interval … … nth thickness interval, and correspondingly, the first thickness interval of the first photoresist layer has a first relation, the second thickness interval of the first photoresist layer has a second relation … …, and the nth thickness interval of the first photoresist layer has an nth relation; for the nth photoresist layer, the first thickness interval and the second thickness interval … … of the nth photoresist layer are provided, correspondingly, the first thickness interval of the nth photoresist layer has a first relation, the second thickness interval of the nth photoresist layer has a second relation … …, and the nth thickness interval of the nth photoresist layer has an nth relation.

Correspondingly, for the first photoresist layer, the coefficient K of the first relational expression of the first photoresist layer is obtained according to the first relational expression of the first photoresist layer₁₁The calculation formula of (2); obtaining a second relational expression coefficient K of the first photoresist layer according to the second relational expression of the first photoresist layer₁₂According to the nth relation of the first photoresist layer, the calculation formula … … obtains the coefficient K of the nth relation of the first photoresist layer_1nThe calculation formula of (2).

For the nth photoresist layer, according to the first switch of the nth photoresist layerObtaining a first relation coefficient K of the nth photoresist layer_n1The calculation formula of (2); obtaining a second relational expression coefficient K of the nth photoresist layer according to the second relational expression of the nth photoresist layer_n2According to the nth relational expression of the nth photoresist layer, the calculation formula … … obtains the coefficient K of the nth relational expression of the nth photoresist layer_nnThe calculation formula of (2).

As shown in fig. 2, a graph of the rotation rate variation value versus the target photoresist layer thickness value is shown. In this embodiment, the division of the thickness value of the photoresist layer into a first thickness interval i and a second thickness interval ii is taken as an example for explanation, the X axis represents a rotation speed variation value, and the Y axis represents a target thickness value of the photoresist layer. The curve 101 is used for representing the relationship between the photoresist layer thickness value and the rotating speed value of the photoresist coating machine in the first thickness interval I; the curve 102 is used to represent the relationship between the photoresist layer thickness value and the rotation speed value of the photoresist coating machine in the second thickness interval ii.

Through the curve 101 and the curve 102, a relational expression of the photoresist layer thickness value and the photoresist coating machine rotating speed value in the first thickness interval I can be obtained as a first relational expression, and a relational expression of the photoresist layer thickness value and the photoresist coating machine rotating speed value in the second thickness interval II can be obtained as a second relational expression; and respectively obtaining a calculation formula of a first relational coefficient of the first thickness interval I and a calculation formula of a second relational coefficient of the second thickness interval II according to the first relational expression and the second relational expression.

In this embodiment, the relationship graph is used to characterize the first photoresist layer as an example.

Specifically, the step of obtaining the relational expression between the thickness value corresponding to each thickness interval and the rotation speed value of the photoresist coating machine comprises: respectively defining first reference rotating speed values in different thickness intervals, coating a photoresist layer according to the first reference rotating speed values, and taking the thickness of the coated photoresist layer as a first reference thickness value corresponding to the first reference rotating speed values; the relational expression of the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine is V₂＝(T₁-T₂)÷K+V₁Wherein T is₁Is a first reference thickness value, T₂Target thickness value, V₁A first reference rotation speed value, V, corresponding to said first reference thickness value₂And K is a relation coefficient, and the value is an adjusting rotating speed value corresponding to the target thickness value.

With reference to fig. 2, it should be noted that the X axis represents the rotation speed variation value, i.e. the regulated rotation speed value V₂And the first reference rotating speed value V₁The difference of (a).

Specifically, in the step of obtaining a calculation formula of the relational coefficient, the calculation formula of the relational coefficient is K | (T)₃-T₁)/(V₃-V1)|，T₁Is a first reference thickness value, V₁A first reference rotation speed value, T, corresponding to the first reference thickness value₃Is a second reference thickness value, V₃Is a second reference rotation speed value corresponding to the second reference thickness value, wherein the second reference rotation speed value V₃The second reference thickness value T is the current actual rotating speed value of the photoresist coating machine table₃And coating the photoresist layer through the existing actual rotating speed value to obtain the actual thickness value of the photoresist layer.

It should be noted that the aforementioned regulation rotational speed value V may be used₂Set as the current actual rotating speed value V of the photoresist coating machine table₃By regulating the value of the rotational speed V₂Coating the photoresist layer to obtain target thickness value T of the photoresist layer₂Set as the actual thickness value T₃. That is, the formula for calculating the coefficient of the relationship is transformed from the relationship between the thickness value corresponding to each thickness interval and the rotation speed value of the photoresist coating machine.

And then obtaining a relational coefficient of the photoresist layer thickness value and the photoresist coating machine table rotating speed value according to the relational expression, and forming a coefficient table corresponding to the photoresist type and the photoresist thickness interval. Referring to table 1, a table of coefficients corresponding to photoresist type and thickness intervals is shown.

TABLE 1

Referring to fig. 2, taking the example of dividing the thickness value of the first photoresist layer into a first thickness interval i and a second thickness interval ii, the slope of the curve 101 is the first relation coefficient K of the first thickness interval i₁₁The slope of the curve 102 is a second relation coefficient K of a second thickness interval II₁₂。

Specifically, after a relational coefficient K of the photoresist layer thickness value and the photoresist coating machine table rotating speed value is obtained according to the relational expression, all the relational coefficients K are collected and are arranged into a coefficient table corresponding to the photoresist type and the photoresist thickness interval.

Taking the first photoresist layer as an example, the first thickness interval has a first relation coefficient K₁₁The second thickness interval has a second relation coefficient K₁₂… … n-th thickness interval has n-th relational coefficient K_1n。

It should be noted that the relational coefficient value has a design specification. The design specification comprises a coefficient lower limit value and a coefficient upper limit value, the ratio of the difference value of the relational coefficient value and the coefficient lower limit value to the relational coefficient value is 3%, and the ratio of the difference value of the coefficient upper limit value and the relational coefficient value to the relational coefficient value is 3%.

Taking the first photoresist layer as an example, the first relation coefficient K₁₁Having a first lower coefficient limit value LCL₁₁Sum coefficient upper limit value UCL₁₁The coefficient of the second relation K₁₂With a second lower limit value of coefficient LCL₁₂Sum coefficient upper limit value UCL₁₂… … coefficient of n-th relation_1nHaving a lower limit value LCL of the nth coefficient_1nSum coefficient upper limit value UCL_1n。

Specifically, the relational coefficient value satisfies a design specification when the relational coefficient value is between the coefficient lower limit value and the coefficient upper limit value; and when the relational coefficient value is smaller than the coefficient lower limit value or the relational coefficient is larger than the coefficient upper limit value, judging that the relational coefficient value does not meet the design specification.

It should be noted that in the step of forming the coefficient table corresponding to the photoresist type and thickness interval, each machine station establishes an independent coefficient table.

It should be further noted that, in the step of obtaining the relational coefficient between the thickness value of the photoresist layer and the rotation speed value of the photoresist coating machine, when the photoresist layer, the photoresist layer of the newly added thickness value, or the newly added photoresist coating machine is put into use, the relational coefficient corresponding to the approximate target thickness value is selected from the existing coefficient table (as shown in table 1) as the initial value K of the relational coefficient₀。

In this embodiment, the standard of the approximate target thickness values is selected as follows: target thickness value T of photoresist layer₂The absolute value of the difference from the selected thickness value is less than or equal to 500 angstroms.

Note that, the initial value K of the relational coefficient is obtained₀Then, the initial value K of the relational coefficient is required₀And correcting to obtain a correct relational coefficient K corresponding to the photoresist layer with the newly increased thickness value, the photoresist layer with the newly increased type or the newly increased photoresist coating machine.

Referring to fig. 3, a flow chart corresponding to the step of obtaining the correct relation coefficient K when the new photoresist layer with the new thickness value, the new type of photoresist layer, or the new photoresist coating machine is put into use is shown.

First, step S100 is executed to define a first reference rotation speed value and a first reference thickness value.

In this embodiment, in the step of obtaining the relational expression between the thickness value corresponding to each thickness interval and the rotation speed value of the photoresist coating machine, first reference rotation speed values are defined in different thickness intervals, the photoresist layer is coated according to the first reference rotation speed values, and the thickness of the coated photoresist layer is used as the first reference thickness value corresponding to the first reference rotation speed value.

Then, step S110 is executed to select the adjusted rotation speed value corresponding to the approximate target thickness value as the second reference rotation speed value V₃. That is, willThe current actual rotating speed value of the photoresist coating machine table is set to be V₃。

Then, step S120 is executed, according to the second reference rotation speed value V₃And coating a photoresist layer.

Then, step S130 is performed to measure the formed photoresist layer, and the obtained photoresist layer thickness value is used as a second reference thickness value T₃That is, the actual thickness value of the obtained photoresist layer is T₃。

Specifically, the thickness of the photoresist layer may be measured by a measuring machine, and the second reference thickness value T of the photoresist layer is measured₃And a second reference rotation speed value V₃Storing the data in the machine system.

Then, step S140 is executed to compare the second reference thickness value T₃With a target thickness value T₂Judging whether the second reference thickness value meets the target thickness value T or not₂The design specification of (1).

The target thickness value T₂The design specification of (a) includes a lower thickness limit value and an upper thickness limit value, the lower thickness limit value is smaller than the upper thickness limit value, and the design specification further includes a range of discrete thickness values. In this embodiment, the thickness variation range value is 0 to 0.25.

In particular, said second reference thickness value T is judged₃The steps of whether the design specification is met include: when said second reference thickness value T₃When the thickness value is between the lower limit value and the upper limit value and is within the range of thickness discrete values, the second reference thickness value T is judged₃The design specification is met; when said second reference thickness value T₃Less than said lower thickness limit value, or said second reference thickness value T₃When the thickness is larger than the upper limit value of the thickness or exceeds the range value of the discrete value of the thickness, the second reference thickness value T is judged₃Does not meet the design specification.

When determining the second reference thickness value T₃Does not satisfy the target thickness value T₂According to the design specification, step S142 is performed, wherein the second reference thickness value T is used₃With a target thickness value T₂For said second reference rotation speed value V₃Fine adjustment is carried out, wherein the thicker the photoresist layer is, the smaller the rotating speed value is; then returning to step S120, the second reference rotating speed value V after fine adjustment is adopted₃Coating a photoresist layer, and repeating the steps until the second reference rotating speed value V is obtained₃Adjusted to the corresponding second reference thickness value T₃And the design specification is met.

When determining the second reference thickness value T₃Satisfies the target thickness value T₂According to the design specification, step S141 is executed, wherein the second reference thickness value T is used₃And a second reference rotational speed value V₃Calculating a target thickness value T₂Corresponding relation coefficient K, and recording the second reference rotation speed value V₃And a relational coefficient K, constituting a set of data.

It should be noted that the second reference rotation speed value V is recorded₃And a relational coefficient K, the method further comprising, after forming a set of data sets: executing step S150, and counting the number of the data groups; then, step S160 is executed to determine whether the number of data sets reaches a set number.

In this embodiment, the set number of the data sets is at least 5 sets. In one embodiment, the set number of data sets is 10 sets.

When the number of the data sets is judged not to reach the set number, the step S142 is returned to, and the second reference rotating speed value V is compared₃Fine adjustment is carried out; then returning to step S120, the second reference rotating speed value V after fine adjustment is adopted₃And coating a photoresist layer, and repeating the steps.

When it is determined that the number of the data sets reaches the set number, step S161 is executed to calculate the plurality of second reference rotation speed values V₃As the target thickness value T, or the median of₂Corresponding regulated speed value V₂The average value or the median of the plurality of relational coefficients K is taken as the target thickness value T₂The corresponding relation coefficient K.

Referring to table 2, the set number of the data sets is 10 sets as an exampleAnd (6) explaining. It should be noted that, as the data increases, the target thickness value T is satisfied₂Has a plurality of second reference rotation speed values V₃And said plurality of second reference rotation speed values V₃Corresponding multiple relational coefficients K form multiple data sets; that is, as the data increases, the data sets are updated until the set number of data sets is reached, i.e., there are 10 sets of the second reference rotational speed value V₃And data of the corresponding relational coefficient K.

Wherein the second reference rotation speed value V₃Including a second reference speed value V₃₀A second reference rotation speed value V₃₁… … second reference speed value V₃₉(ii) a The coefficient of relation K includes a value related to the second reference rotation speed value V₃₀Corresponding coefficient of relation K₁And the second reference rotating speed value V₃₁Corresponding coefficient of relation K₂… … and the second reference rotation speed value V₃₉Corresponding coefficient of relation K₁₀. Accordingly, V₃＝(V₃₀+V₃₁+……+V₃₉)/10，K＝(K₁+K₂+……+K₁₀)/10。

Data set numbering	Second reference rotation speed value	Coefficient of relation
			1	Second reference rotational speed value V₃₀	Coefficient of the relation K₁
2	Second reference rotationVelocity value V₃₁	Coefficient of the relation K₂
			3	Second reference rotational speed value V₃₂	Coefficient of the relation K₃
4	Second reference rotational speed value V₃₃	Coefficient of the relation K₄
			5	Second reference rotational speed value V₃₄	Coefficient of the relation K₅
6	Second reference rotational speed value V₃₅	Coefficient of the relation K₆
			7	Second reference rotational speed value V₃₆	Coefficient of the relation K₇
8	Second reference rotational speed value V₃₇	Coefficient of the relation K₈
			9	Second reference rotational speed value V₃₈	Coefficient of the relation K₉
10	Second reference rotational speed value V₃₉	Coefficient of the relation K₁₀

TABLE 2

Forming and expanding a coefficient table corresponding to the photoresist type and the thickness range through the existing data or the newly added photoresist layer with the thickness value, the newly added photoresist layer with the type or the newly added photoresist coating machine, so that when the photoresist layer is coated by the subsequent photoresist coating machine, the coefficient table can be formed according to the type of the photoresist layer and the target thickness value T₂Selecting a relational expression coefficient K and a relational expression corresponding to the corresponding thickness interval, obtaining the relational expression according to the relational expression coefficient K and calculating a target thickness value T₂Corresponding regulated speed value V₂Compared with manual adjustment by manpower alone, the method has higher precision in adjusting the thickness value of the photoresist layer.

Referring to fig. 4, when a plurality of photoresist layers are coated by the photoresist coating machine, the target thickness T is determined according to the types of the photoresist layers₂Obtaining corresponding relation coefficient K from the coefficient table (shown in Table 1), obtaining relation according to the relation coefficient K and calculating the target thickness value T₂Corresponding regulated speed value V₂According to said regulated speed value V₂Coating a photoresist layer; by regulating the value of the rotation speed V₂Measuring the thickness value of the photoresist layer in the process of coating the photoresist layer, and judging whether the thickness of the photoresist layer meets the target thickness value T₂The design specification of (1).

Specifically, the target thickness value T is satisfied at the photoresist layer thickness value₂When the design specification is above, the photoresist layer coating is continued; when the thickness value of the photoresist layer does not meet the target thickness value T₂And stopping coating the photoresist layer, measuring the thickness value and the rotating speed value of the photoresist coating machine again, and obtaining the relational coefficient K again through the calculation formula of the relational coefficient K so as to update the relational coefficient table.

The value V according to said regulation will be described in the following with reference to FIG. 4₂The steps performed after the photoresist layer coating are performed will be described in detail.

Firstly, step S200 is executed, according to the regulated rotating speed value V₂And measuring the thickness of the formed photoresist layer after coating the photoresist layer to obtain the thickness value of the photoresist layer.

Specifically, the thickness of the photoresist layer can be measured by a measuring machine, and the thickness value of the photoresist layer and the adjusting rotating speed value V corresponding to the thickness value are measured₂Storing the data in the machine system.

Then, step S210 is performed to determine whether the thickness value of the photoresist layer meets the design specification.

Specifically, the step of determining whether the thickness value of the photoresist layer meets the design specification includes: when the photoresist layer thickness value is between the lower thickness limit value and the upper thickness limit value and is within the range of the discrete thickness value, judging that the photoresist layer thickness value meets the design specification; and when the thickness value of the photoresist layer is smaller than the lower thickness limit value, or the thickness value of the photoresist layer is larger than the upper thickness limit value, or exceeds the range value of the discrete thickness value, judging that the thickness value of the photoresist layer does not meet the design specification.

Judging that the thickness value of the photoresist layer meets a target thickness value T₂Step S211 is executed to continue the photoresist coating, i.e. normal production.

Judging that the photoresist layer thickness value does not meet the target thickness value T₂When the design specification is satisfied, step S212 is executed to stop the coating of the photoresist layer; then, step S220 is executed to obtain the relational coefficient K again through the calculation formula of the relational coefficient K.

Specifically, theThe formula for calculating the coefficient of the relation is K | (T)₃-T₁)/(V₃-V₁)|，T₁Is a first reference thickness value, V₁A first reference rotation speed value, T, corresponding to the first reference thickness value₃Is a second reference thickness value, V₃Is a second reference rotation speed value corresponding to the second reference thickness value, wherein the second reference rotation speed value V₃The second reference thickness value T is the current actual rotating speed value of the photoresist coating machine table₃And coating the photoresist layer through the existing actual rotating speed value to obtain the actual thickness value of the photoresist layer.

The photoresist layer thickness value is based on the regulating rotating speed value V₂After the photoresist layer is coated, the thickness value of the formed photoresist layer and the second reference rotating speed value V are obtained₃Adjusting the rotation speed value V for forming the photoresist layer which does not meet the design specification₂The actual rotating speed value is the current actual rotating speed value of the photoresist coating machine, and the thickness value of the photoresist layer which does not meet the design specification is a second reference thickness value T₃And the actual thickness value corresponding to the current actual rotating speed value of the photoresist coating machine is obtained.

It should be noted that, after the relational coefficient K is obtained again through the calculation formula of the relational coefficient K, the method further includes: step S230 is executed to determine whether the retrieved relational coefficient K satisfies the design specification.

In this embodiment, the design specification of the relational coefficient K includes a lower coefficient limit value and an upper coefficient limit value, a ratio of a difference between the relational coefficient value and the lower coefficient limit value to the relational coefficient value is 3%, and a ratio of a difference between the upper coefficient limit value and the relational coefficient value to the relational coefficient value is 3%.

Specifically, when the value of the relational coefficient K is between the coefficient lower limit value and the coefficient upper limit value, it is determined that the relational coefficient K satisfies the design specification; and when the value of the relational coefficient K is smaller than the coefficient lower limit value or the value of the relational coefficient K is larger than the coefficient upper limit value, judging that the relational coefficient K does not meet the design specification.

In this embodiment, when it is determined that the retrieved relational coefficient K satisfies the design specification, step S231 is executed to calculate the target thickness value T from the retrieved relational coefficient K₂Corresponding new regulating speed value V₂Then step S240 is executed to adjust the rotation speed value V by the new value₂The photoresist layer is recoated, the process returns to step S200, the thickness value of the reformed photoresist layer is measured, and step S210 is executed again to determine whether the thickness value of the reformed photoresist layer meets the design specification.

When it is determined that the retrieved coefficient K does not satisfy the design specification, step S232 is executed to determine whether the external factors such as the machine or the temperature are abnormal and whether the design specification is reasonable.

Wherein, when the external factors such as the machine or the temperature are judged to be abnormal and the design specification is reasonable, the step S250 is executed after the external factors such as the machine or the temperature are solved, and the original relational coefficient K and the regulation rotating speed value V are adopted₂According to said regulated speed value V₂Coating a photoresist layer, returning to the step S200, measuring the thickness value of the photoresist layer, executing the step S210, and judging whether the thickness value of the photoresist layer meets the design specification; when it is determined that there is no abnormality in the external factors such as the machine or the temperature and the design specification is not reasonable, step S252 is performed to reset the design specification, i.e., to modify the lower limit value of the coefficient and the upper limit value of the coefficient, and step S231 is performed to calculate the target thickness value T using the retrieved relational coefficient K₂Corresponding regulated speed value V₂Then step S240 is executed to adjust the rotation speed value V by the new value₂The photoresist layer is recoated and then returns to step S200.

In the process of coating the photoresist layer by adjusting the rotating speed value, measuring the thickness value of the photoresist layer, stopping coating the photoresist layer when the thickness value of the photoresist layer does not meet the design specification, measuring the thickness value and the rotating speed value of a photoresist coating machine, and obtaining the relational coefficient K again through the calculation formula of the relational coefficient K to update the relational coefficient table, so that the relational coefficient K and the design specification thereof can be continuously corrected along with the increase of data, and correspondingly, the accuracy is higher and higher.

Referring to fig. 5-7, there are shown corresponding functional block diagrams of an embodiment of the system for adjusting a photoresist layer thickness value of the present invention.

In this embodiment, the system for adjusting the thickness value of the photoresist layer is used for adjusting the thickness when a plurality of photoresist layers are coated by the photoresist coating machine.

As shown in fig. 5, the system for adjusting the photoresist layer thickness value comprises:

the modeling module 100 is used for obtaining different thickness values of various photoresist layers and photoresist coating machine rotating speed values corresponding to the thickness values; and the device is also used for dividing each thickness value of the various photoresist layers into a plurality of thickness intervals and obtaining a relational expression between the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine.

The modeling module 100 selects various photoresist layers In a Work In Process (WIP) first; and selecting different photoresist coating machine rotating speed values for each photoresist layer, and respectively coating the photoresist layers to form the photoresist layers with different thickness values, namely, obtaining different thickness values of various photoresist layers and the photoresist coating machine rotating speed value corresponding to the thickness value through the product.

Then, the photoresist layer is differentiated, for example, into: first photoresist layer, second photoresist layer … … nth photoresist layer. The data of the same photoresist layer comprise different thickness values and photoresist coating machine rotating speed values corresponding to the thickness values.

And then, dividing the thickness values of the various photoresist layers into a plurality of thickness intervals for the same photoresist layer according to the thickness values of the photoresist layers. For example: dividing the thickness value of the first photoresist layer into a first thickness interval and a second thickness interval … … nth thickness interval, and dividing the thickness value of the nth photoresist layer into a first thickness interval and a second thickness interval … … nth thickness interval.

And finally, obtaining a relational expression of the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine, and obtaining a calculation formula of a relational expression coefficient according to the relational expression.

In this embodiment, the modeling module 100 is further configured to respectively define a first reference rotation speed value of different thickness intervals, and a first reference thickness value corresponding to the first reference rotation speed value; correspondingly, the relation between the thickness value corresponding to each thickness interval and the rotation speed value of the photoresist coating machine is V₂＝(T₁-T₂)÷K+V₁Wherein T is₁Is a first reference thickness value, T₂Target thickness value, V₁A first reference rotation speed value, V, corresponding to said first reference thickness value₂And K is a relation coefficient, and the value is an adjusting rotating speed value corresponding to the target thickness value.

And the classification module 200 is connected with the modeling module 100, and is configured to obtain a relational coefficient K between the photoresist layer thickness value and the photoresist coating machine rotation speed value according to the relational expression, form a coefficient table corresponding to the photoresist type and the photoresist thickness interval, and obtain a calculation formula of the relational coefficient K according to the relational expression.

In this embodiment, the modeling module 100 obtains a relational expression between the thickness value corresponding to each thickness interval and the rotation speed value of the photoresist coating machine, that is, the different thickness intervals have corresponding relational expressions, and accordingly, the classification module 200 can obtain a calculation formula of the coefficient K of the relational expression corresponding to the photoresist type and the thickness interval.

For example: for a first photoresist layer, obtaining a first relational expression coefficient K of the first photoresist layer according to a first relational expression of the first photoresist layer₁₁The calculation formula of (2); obtaining a second relational expression coefficient K of the first photoresist layer according to the second relational expression of the first photoresist layer₁₂According to the nth relation of the first photoresist layer, the calculation formula … … obtains the coefficient K of the nth relation of the first photoresist layer_1nThe calculation formula of (2); for the nth photoresist layer, obtaining a first relational expression coefficient K of the nth photoresist layer according to the first relational expression of the nth photoresist layer_n1The calculation formula of (2); obtaining a second relational expression coefficient K of the nth photoresist layer according to the second relational expression of the nth photoresist layer_n2According to the nth relational expression of the nth photoresist layer, the calculation formula … … obtains the coefficient K of the nth relational expression of the nth photoresist layer_nnThe calculation formula of (2).

In this embodiment, the first photoresist layer is taken as an example for explanation.

In this embodiment, the formula for calculating the relational coefficient K is K ═ l (T)₃-T₁)/(V₃-V₁) L, where T₁Is a first reference thickness value, V₁A first reference rotation speed value, T, corresponding to the first reference thickness value₃Is a second reference thickness value, V₃Is said second reference thickness value T₃Corresponding second reference rotation speed value, wherein the second reference rotation speed value V₃The second reference thickness value T is the current actual rotating speed value of the photoresist coating machine table₃And coating the photoresist layer through the existing actual rotating speed value to obtain the actual thickness value of the photoresist layer.

It should be noted that the aforementioned regulation rotational speed value V may be used₂Set as the current actual rotating speed value V of the photoresist coating machine table₃By regulating the value of the rotational speed V₂Coating the photoresist layer to obtain target thickness value T of the photoresist layer₂Set as the actual thickness value T₃. That is, the calculation formula of the relational coefficient K is transformed from the relational expression between the thickness value corresponding to each thickness interval and the rotation speed value of the photoresist coating machine, that is, the relational coefficient K between the thickness value of the photoresist layer and the rotation speed value of the photoresist coating machine is obtained according to the relational expression.

In this embodiment, the coefficient table corresponds to the photoresist type and thickness interval, and each machine establishes an independent coefficient table.

Specifically, when the value of the relational coefficient is between the coefficient lower limit value and the coefficient upper limit value, the relational coefficient value satisfies a design specification; and when the value of the relational coefficient is smaller than the coefficient lower limit value or the value of the relational coefficient is larger than the coefficient upper limit value, judging that the value of the relational coefficient does not meet the design specification.

In this embodiment, the classification module 200 is further configured to obtain a relational coefficient between the thickness value of the photoresist layer and the rotation speed value of the photoresist coating machine when the photoresist layer, the photoresist layer of the newly added thickness value, or the newly added photoresist coating machine is put into use, and select a relational coefficient corresponding to a near target thickness value from the existing coefficient table as an initial value K of the relational coefficient₀。

Referring to fig. 6, a functional block diagram of the classification module 200 depicted in fig. 5 is shown.

The classification module 200 comprises a first setting unit 201 for selecting a near target thickness value T from an existing coefficient table₂Corresponding relation coefficient K is used as relation coefficient initial value K₀Selecting a relatively close target thickness value T from the existing coefficient table₂Corresponding regulating rotational speed value T₂As a second reference rotational speed value V₃Namely, the current actual rotating speed value of the photoresist coating machine is set as V₃。

A first coating unit 202 connected to the first setting unit 201 for adopting the second reference rotation speed value V₃And coating a photoresist layer.

A first measuring unit 203 connected to the first coating unit 202 for measuring the second reference rotation speed V₃Corresponding second reference thickness value T₃That is, the actual thickness value of the obtained photoresist layer is T₃。

In particular, the amount ofThe measuring machine measures the thickness of the photoresist layer and obtains a second reference thickness value T of the photoresist layer₃And a second reference rotation speed value V₃Storing the data in the machine system.

A first determining unit 204 and the first measuring unit 203 for determining the second reference thickness value T₃Whether a target thickness value T is satisfied₂The design specification of (1).

In this embodiment, the target thickness value T₂The design specification of (a) includes a lower thickness limit value and an upper thickness limit value, the lower thickness limit value is smaller than the upper thickness limit value, and the design specification further includes a range of discrete thickness values. In this embodiment, the thickness variation range value is 0 to 0.25.

In particular, when said second reference thickness value T is reached₃When the thickness value is between the lower limit value and the upper limit value and is within the range of thickness discrete values, the second reference thickness value T is judged₃The design specification is met; when said second reference thickness value T₃Less than said lower thickness limit value, or said second reference thickness value T₃When the thickness is larger than the upper limit value of the thickness or exceeds the range value of the discrete value of the thickness, the second reference thickness value T is judged₃Does not meet the design specification.

A first adjusting unit 214 connected to the first determining unit 204 for determining the second reference thickness value T₃Does not satisfy the target thickness value T₂According to said second reference thickness value T₃With a target thickness value T₂For said second reference rotation speed value V₃Fine tuning is performed, wherein the thicker the photoresist layer thickness value is, the smaller the rotation speed value is, and then the first setting unit 201 is returned to.

A first calculating unit 224, connected to the first determining unit 204, for determining the second reference thickness value T₃Satisfies the target thickness value T₂According to said second reference thickness value T₃And a second reference rotational speed value V₃Calculating a target thickness value T₂The corresponding relation coefficient K.

A first recording unit 225, connected to the first calculating unit 224, for recording the second reference rotation speed value V₃And a relational coefficient K, constituting a set of data.

The first counting unit 226 is connected to the first recording unit 225 and is configured to count the number of the data sets. That is, one more data set is added.

A second judging unit 227, connected to the first counting unit 226, for judging whether the number of the data sets reaches a set number; when the number of the data sets is judged not to reach the set number, the control unit returns to the first adjusting unit 214 to adjust the second reference rotating speed value V₃Fine adjustment is performed and then return to the first setting unit 201.

It should be noted that, as the data increases, the target thickness value T is satisfied₂Has a plurality of second reference rotation speed values V₃And said plurality of second reference rotation speed values V₃Corresponding multiple relational coefficients K form multiple data sets; that is, as data increases, the data sets are continually updated until a set number of data sets is reached.

A second calculating unit 228 connected to the second judging unit 227, for calculating the plurality of second reference thickness values T meeting the design specification when the number of the data sets is judged to reach the set number₃Corresponding second reference rotational speed value V₃As the target thickness value T, or the median of₂Corresponding regulated speed value V₂Calculating a plurality of second reference thickness values T satisfying the design specification₃Taking the average value or median of the coefficient K of the corresponding relation as the target thickness value T₂The corresponding relation coefficient K.

In this embodiment, the example in which the set number of data sets is 10 sets will be described. Correspondingly, 10 second reference rotational speed values are calculatedV₃As the target thickness value T, or the median of₂Corresponding regulated speed value V₂Calculating the average value or median of 10 relation coefficients K as the target thickness value T₂The corresponding relation coefficient K.

In particular, said second reference rotation speed value V₃Including a second reference speed value V₃₀A second reference rotation speed value V₃₁… … second reference speed value V₃₉(ii) a The coefficient of relation K includes a value related to the second reference rotation speed value V₃₀Corresponding coefficient of relation K₁And the second reference rotating speed value V₃₁Corresponding coefficient of relation K₂… … and the second reference rotation speed value V₃₉Corresponding coefficient of relation K₁₀. Correspondingly, to calculate the 10 second reference rotation speed values V₃Is taken as the target thickness value T₂Corresponding regulated speed value V₂For example, V₂＝(V₃₀+V₃₁+……+V₃₉) 10, calculating the average value of the 10 relational coefficients K as the target thickness value T₂The corresponding coefficient of the relation K is taken as an example, K ═ K₁+K₂+……+K₁₀)/10。

The system for adjusting the thickness value of the photoresist layer further includes an adjusting module 300 (shown in fig. 5) connected to the classifying module 200, and configured to apply a plurality of photoresist layers by using a photoresist coating machine according to the types of the photoresist layers and the target thickness value T₂Obtaining a corresponding relation coefficient K from the coefficient table, obtaining a relation according to the relation coefficient K and calculating a target thickness value T₂Corresponding regulated speed value V₂According to said regulated speed value V₂Coating a photoresist layer; and also for regulating the value of speed of rotation V₂And measuring the thickness of the photoresist layer in the photoresist layer coating process, and judging whether the thickness of the photoresist layer meets the design specification.

Specifically, when the thickness of the photoresist layer meets the design specification, the photoresist layer coating is continued; and stopping coating the photoresist layer when the thickness of the photoresist layer does not meet the design specification, measuring the thickness value and the rotating speed value of the photoresist coating machine again, and obtaining the relational coefficient K again through the calculation formula of the relational coefficient K so as to update the relational coefficient table.

Referring to fig. 7, a functional block diagram of the conditioning module 300 depicted in fig. 5 is shown.

The conditioning module 300 comprises a second setting unit 301 for setting the target thickness value T according to the type of photoresist layer₂The corresponding relational coefficient K is obtained from the coefficient table.

A third calculating unit 302, connected to the second setting unit 301, for calculating the target thickness value T according to the obtained coefficient K of the relational expression and the relational expression₂Corresponding regulated speed value V₂。

Specifically, the relation is V₂＝(T₁-T₂)÷K+V₁Wherein T is₁Is a first reference thickness value, T₂Target thickness value, V₁Is the first reference thickness value T₁Corresponding first reference rotational speed value, V₂For said target thickness value T₂And K is a relational coefficient corresponding to the adjusting rotating speed value.

A second coating unit 303 connected to the third calculating unit 302 for adjusting the rotating speed value V₂And coating a photoresist layer.

A second measuring unit 304 connected to the second coating unit 303 for adjusting the rotation speed V₂And after coating the photoresist layer, measuring the thickness value of the photoresist layer.

A third determining unit 305, connected to the second measuring unit 304 and the second coating unit 303, for determining whether the thickness value of the photoresist layer meets the design specification; and when the photoresist layer thickness value is judged to meet the design specification, returning to the second coating unit 303 for normal production.

Specifically, when the photoresist layer thickness value is between the lower thickness limit value and the upper thickness limit value and within the range of the discrete thickness value, the photoresist layer thickness value is judged to meet the design specification; and when the thickness value of the photoresist layer is smaller than the lower thickness limit value, or the thickness value of the photoresist layer is larger than the upper thickness limit value, or exceeds the range value of the discrete thickness value, judging that the thickness value of the photoresist layer does not meet the design specification.

A fourth calculating unit 325, connected to the third determining unit 305, for determining whether the photoresist layer thickness value does not meet the design specification according to the photoresist layer thickness value and the corresponding adjusting rotation speed value V₂And recalculating the relational coefficient K.

Specifically, the formula for calculating the relational coefficient K is K ═ l (T)₃-T₁)/(V₃-V1)|，T₁Is a first reference thickness value, V₁Is the first reference thickness value T₁Corresponding first reference rotational speed value, T₃Is a second reference thickness value, V₃Is said second reference thickness value T₃Corresponding second reference rotation speed value, wherein the second reference rotation speed value V₃The second reference thickness value T is the current actual rotating speed value of the photoresist coating machine table₃And coating the photoresist layer through the existing actual rotating speed value to obtain the actual thickness value of the photoresist layer.

It should be noted that the photoresist layer thickness value is adjusted according to the current rotation speed value V₂After the photoresist layer is coated, the thickness value of the formed photoresist layer and the second reference rotating speed value V are obtained₃Adjusting the rotating speed value V corresponding to the photoresist layer which does not meet the design specification₂That is, the current actual rotation speed value of the photoresist coating machine station and the thickness of the photoresist layer which does not meet the design specificationValue of the second reference thickness value T₃And the actual thickness value corresponding to the current actual rotating speed value of the photoresist coating machine is obtained.

A fourth judging unit 326, connected to the fourth calculating unit 325 and the third calculating unit 302, for judging whether the retrieved relational coefficient K satisfies the design specification; when it is determined that the retrieved relational coefficient K satisfies the design specification, returning to the third calculation unit 302, calculating the target thickness value T using the retrieved relational coefficient K and the relational expression₂Corresponding regulated speed value V₂。

A fifth determining unit 336, connected to the fourth determining unit 326, the second coating unit 303 and the third calculating unit 302, for determining whether the obtained relational coefficient K does not meet the design specification, and whether the obtained external factors such as the machine or the temperature are abnormal and the design specification is reasonable.

Specifically, when the external factors such as the machine or the temperature are judged to be abnormal and the design specification is reasonable, the original relational coefficient K and the regulated rotating speed value V are adopted after the external factors such as the machine or the temperature are solved₂And returns to the second coating unit 303; when it is determined that there is no abnormality in the external factors such as the machine, the temperature, etc. and the design specification is not reasonable, the obtained coefficient K is adopted after the design specification is reset, and the result is returned to the third calculation unit 302.

With reference to fig. 5, it should be noted that the system further includes an interaction module 400, which is connected to the modeling module 100, the classification module 200, and the adjustment module 300, and is used for implementing data communication between the modules.

The interactive module 400 is used for realizing the communication of the system, so that the thickness condition of the photoresist layer can be obtained in time, and an optimal processing method suitable for production is provided according to the thickness condition.

Through the system for adjusting the thickness value of the photoresist layer, a coefficient table corresponding to the photoresist type and the thickness interval can be formed and expanded, so that when the photoresist layer is coated by a photoresist coating machine station in the subsequent process, the type of the photoresist layer and the target thickness value T can be determined according to the type of the photoresist layer and the target thickness value T₂Selecting a relational expression coefficient K and a relational expression corresponding to the corresponding thickness interval, obtaining the relational expression according to the relational expression coefficient K and calculating a target thickness value T₂Corresponding regulated speed value V₂Compared with manual adjustment by manpower alone, the system for adjusting the thickness value of the photoresist layer can improve the accuracy of adjusting the thickness value of the photoresist layer.

In addition, in the process of coating the photoresist layer by adjusting the rotating speed value, the thickness value of the photoresist layer is measured, the coating of the photoresist layer is stopped when the thickness value of the photoresist layer does not meet the design specification, the thickness value and the rotating speed value of a photoresist coating machine are measured again, and the relational coefficient is obtained again through the calculation formula of the relational coefficient to update the relational coefficient table, so that the relational coefficient can be continuously corrected along with the increase of data, and correspondingly, the accuracy is higher and higher.

Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.

Claims

1. A method for adjusting the thickness value of a photoresist layer is used for adjusting the thickness when a plurality of photoresist layers are coated by a photoresist coating machine station, and is characterized by comprising the following steps:

obtaining different thickness values of various photoresist layers and photoresist coating machine rotating speed values corresponding to the thickness values; dividing each thickness value of the various photoresist layers into a plurality of thickness intervals, obtaining a relational expression of the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine, and obtaining a calculation formula of a relational expression coefficient according to the relational expression;

obtaining a relational coefficient of the photoresist layer thickness value and the photoresist coating machine table rotating speed value according to the relational expression, and forming a coefficient table corresponding to the photoresist type and the photoresist thickness interval;

when a plurality of photoresist layers are coated by a photoresist coating machine, obtaining corresponding relational expression coefficients from the coefficient table according to the types of the photoresist layers and the target thickness values, obtaining a relational expression according to the relational expression coefficients, calculating an adjusting rotating speed value corresponding to the target thickness value, and coating the photoresist layers according to the adjusting rotating speed value;

measuring the thickness value of the photoresist layer in the process of coating the photoresist layer by adjusting the rotating speed value, and judging whether the thickness of the photoresist layer meets the design specification;

when the thickness value of the photoresist layer meets the design specification, continuing coating the photoresist layer; and stopping coating the photoresist layer when the thickness value of the photoresist layer does not meet the design specification, measuring the thickness value and the rotating speed value of the photoresist coating machine again, and obtaining the relational coefficient again through the calculation formula of the relational coefficient so as to update the relational coefficient table.

2. The method of claim 1, wherein in the step of forming the coefficient table corresponding to the photoresist type and thickness range, each tool creates a separate coefficient table.

3. The method of claim 1, wherein obtaining the relationship between the thickness values corresponding to the thickness intervals and the rotation speed of the photoresist coating machine comprises: respectively defining first reference rotating speed values in different thickness intervals, coating a photoresist layer according to the first reference rotating speed values, and taking the thickness of the coated photoresist layer as a first reference thickness value corresponding to the first reference rotating speed values;

the relational expression of the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine is V₂＝(T₁-T₂)÷K+V₁Wherein T is₁Is a first reference thickness value, T₂Target thickness value, V₁A first reference rotation speed value, V, corresponding to said first reference thickness value₂The adjustment rotating speed value corresponding to the target thickness value is obtained, and K is a relational coefficient;

in the step of obtaining a calculation formula of the relational coefficient, the calculation formula of the relational coefficient is K ═ l (T)₃-T₁)/(V₃-V₁)|，T₁Is a first reference thickness value, V₁A first reference rotation speed value, T, corresponding to the first reference thickness value₃Is a second reference thickness value, V₃And the second reference thickness value is a second reference rotating speed value corresponding to the second reference thickness value, wherein the second reference rotating speed value is an existing actual rotating speed value of the photoresist coating machine, and the second reference thickness value is an actual thickness value of the photoresist layer obtained by coating the photoresist layer through the existing actual rotating speed value.

4. The method according to claim 1, wherein in the step of obtaining the coefficient of the relationship between the thickness of the photoresist layer and the rotation speed of the photoresist coater, when the new photoresist layer, the new type of photoresist layer, or the new photoresist coater is put into use, the coefficient of the relationship corresponding to the target thickness is selected from the existing coefficient table as the initial value of the coefficient of the relationship.

5. The method of adjusting a photoresist layer thickness value according to claim 4, wherein different thickness intervals respectively define a first reference rotation speed value, and photoresist layer coating is performed according to the first reference rotation speed value, and the thickness of the coated photoresist layer is used as a first reference thickness value corresponding to the first reference rotation speed value;

when the photoresist layer with the newly increased thickness value, the photoresist layer with the newly increased type or the newly increased photoresist coating machine is put into use, the step of obtaining the relation coefficient comprises the following steps: selecting an adjusting rotating speed value corresponding to a target thickness value from an existing coefficient table, taking the adjusting rotating speed value as a second reference rotating speed value, coating the photoresist layer by adopting the second reference rotating speed value, taking the obtained photoresist layer thickness value as a second reference thickness value, and obtaining a relational coefficient corresponding to the second reference thickness value according to a calculation formula of the relational coefficient;

comparing the second reference thickness value with a target thickness value, and judging whether the second reference thickness value meets the design specification of the target thickness value;

when the second reference thickness value meets the design specification of the target thickness value, calculating a relational expression coefficient corresponding to the target thickness value according to the second reference thickness value and a second reference rotating speed value, and recording the second reference rotating speed value and the relational expression coefficient to form a group of data groups;

when the second reference thickness value does not meet the design specification of the target thickness value, fine-tuning the second reference rotating speed value according to the difference value between the second reference thickness value and the target thickness value, wherein the thicker the thickness value of the photoresist layer is, the smaller the rotating speed value is;

repeating the steps until the second reference rotating speed value is adjusted to the value that the corresponding second reference thickness value meets the design specification, recording the second reference rotating speed values and the relational coefficient corresponding to a plurality of second reference thickness values meeting the design specification, and updating the data set;

when the number of the data sets reaches a set number, calculating the average value or the median of the second reference rotating speed values corresponding to the plurality of second reference thickness values meeting the design specification as the adjusting rotating speed value corresponding to the target thickness value, and calculating the average value or the median of the relational coefficients corresponding to the plurality of second reference thickness values meeting the design specification as the relational coefficients corresponding to the target thickness value.

6. The method of adjusting a thickness value of a photoresist layer of claim 1, wherein the design specification for the thickness value of the photoresist layer includes a lower thickness limit and an upper thickness limit, the lower thickness limit being less than the upper thickness limit, the design specification further including a range of discrete thickness values;

the step of judging whether the thickness of the photoresist layer meets the design specification comprises the following steps:

when the photoresist layer thickness value is between the lower thickness limit value and the upper thickness limit value and is within the range of the discrete thickness value, judging that the photoresist layer thickness value meets the design specification;

and when the thickness value of the photoresist layer is smaller than the lower thickness limit value, or the thickness value of the photoresist layer is larger than the upper thickness limit value, or exceeds the range value of the discrete thickness value, judging that the thickness value of the photoresist layer does not meet the design specification.

7. The method of adjusting a photoresist layer thickness value of claim 6, wherein the discrete value range of thickness values is from 0 to 0.25.

8. The method of adjusting a photoresist layer thickness value according to claim 1, wherein after the relational coefficient is retrieved through the calculation formula of the relational coefficient when the photoresist layer thickness value does not satisfy the design specification, the method further comprises: and judging whether the obtained relational coefficient meets the design specification or not.

9. The method of adjusting a photoresist layer thickness value according to claim 8, wherein the design specification of the relational coefficient value comprises a lower coefficient value and an upper coefficient value, the ratio of the difference between the relational coefficient and the lower coefficient value to the relational coefficient is 3%, and the ratio of the difference between the upper coefficient value and the relational coefficient to the relational coefficient is 3%;

when the relational coefficient value is between the coefficient lower limit value and the coefficient upper limit value, determining that the relational coefficient value meets the design specification;

and when the relational coefficient value is smaller than the coefficient lower limit value or the relational coefficient is larger than the coefficient upper limit value, judging that the relational coefficient value does not meet the design specification.

10. The method of adjusting a photoresist layer thickness value according to claim 8, wherein when it is determined that the retrieved relational coefficient satisfies the design specification, calculating an adjustment rotation value corresponding to the target thickness value using the retrieved relational coefficient, recoating the photoresist layer by the adjustment rotation value, and judging again whether the photoresist layer thickness value satisfies the design specification;

judging whether the obtained relational coefficient does not meet the design specification, judging whether the obtained relational coefficient is abnormal by external factors such as a machine table or temperature and whether the design specification is reasonable, wherein when the obtained relational coefficient is abnormal by external factors such as the machine table or the temperature and the design specification is reasonable, after solving the external factors such as the machine table or the temperature, coating the photoresist layer according to the adjusted rotating speed value by adopting the original relational coefficient and the adjusted rotating speed value, measuring the thickness value of the photoresist layer, and judging whether the thickness value of the photoresist layer meets the design specification; when the external factors such as the machine table, the temperature and the like are judged to be abnormal and the design specification is unreasonable, after the design specification is reset, the adjustment rotating speed value corresponding to the target thickness value is calculated by adopting the obtained relation coefficient, the photoresist layer is coated again through the adjustment rotating speed value, and whether the thickness value of the photoresist layer meets the design specification is judged again.

11. A system for adjusting photoresist layer thickness values for thickness adjustment while coating multiple photoresist layers with a photoresist coater station, comprising:

the modeling module is used for obtaining different thickness values of various photoresist layers and photoresist coating machine table rotating speed values corresponding to the thickness values; the photoresist coating machine is also used for dividing each thickness value of the photoresist layers into a plurality of thickness intervals and obtaining a relational expression between the thickness value corresponding to each thickness interval and the rotating speed value of the photoresist coating machine;

the classification module is used for obtaining a relational coefficient of the photoresist layer thickness value and the photoresist coating machine table rotating speed value according to the relational expression, forming a coefficient table corresponding to the photoresist type and the photoresist thickness interval, and obtaining a calculation formula of the relational coefficient according to the relational expression;

the adjusting module is used for obtaining corresponding relational expression coefficients from the coefficient table according to the type of the photoresist layer and the target thickness when a plurality of photoresist layers are coated by the photoresist coating machine, obtaining a relational expression according to the relational expression coefficients, calculating an adjusting rotating speed value corresponding to the target thickness value, and coating the photoresist layer according to the adjusting rotating speed value; the device is also used for measuring the thickness of the photoresist layer in the process of coating the photoresist layer by adjusting the rotating speed value and judging whether the thickness of the photoresist layer meets the design specification or not; when the thickness of the photoresist layer meets the design specification, continuing coating the photoresist layer; and stopping coating the photoresist layer when the thickness of the photoresist layer does not meet the design specification, measuring the thickness value and the rotating speed value of the photoresist coating machine again, and obtaining the relational coefficient again through the calculation formula of the relational coefficient so as to update the relational coefficient table.

12. The system for adjusting a photoresist layer thickness value of claim 11, wherein each tool has a separate table of coefficients.

13. The system for adjusting a thickness value of a photoresist layer according to claim 11, wherein the modeling module is further configured to define a first reference rotation speed value for different thickness intervals and a first reference thickness value corresponding to the first reference rotation speed value, respectively;

the relation between the thickness value corresponding to each thickness interval and the rotation speed value of the photoresist coating machine is V₂＝(T₁-T₂)÷K+V₁Wherein T is₁Is a first reference thickness value, T₂Target thickness value, V₁A first reference rotation speed value, V, corresponding to said first reference thickness value₂Corresponding to said target thickness valueAdjusting the rotating speed value, wherein K is a relational coefficient;

the formula for calculating the coefficient of the relational expression is K | (T |)₃-T₁)/(V₃-V₁) L, where T₁Is a first reference thickness value, V₁A first reference rotation speed value, T, corresponding to the first reference thickness value₃Is a second reference thickness value, V₃And the second reference thickness value is a second reference rotating speed value corresponding to the second reference thickness value, wherein the second reference rotating speed value is an existing actual rotating speed value of the photoresist coating machine, and the second reference thickness value is an actual thickness value of the photoresist layer obtained by coating the photoresist layer through the existing actual rotating speed value.

14. The system for adjusting a photoresist layer thickness value according to claim 11, wherein the classification module is further configured to obtain a coefficient of a relationship between the photoresist layer thickness value and a rotational speed value of a photoresist coating machine when a photoresist layer with a new thickness value, a new type of photoresist layer, or a new photoresist coating machine is put into use.

15. The system for adjusting a thickness of a photoresist layer of claim 14, wherein the modeling module is further configured to define a first reference rotation speed value for different thickness intervals, and a first reference thickness value corresponding to the first reference rotation speed value, respectively;

the classification module comprises:

the first setting unit is used for selecting a relational coefficient corresponding to the approximate target thickness value from the existing coefficient table as an initial value of the relational coefficient, and selecting an adjusting rotating speed value corresponding to the approximate target thickness value from the existing coefficient table as a second reference rotating speed value;

the first coating unit is connected with the first setting unit and is used for coating the photoresist layer by adopting the second reference rotating speed value;

a first measuring unit connected with the first coating unit for measuring a second reference thickness value corresponding to the second reference rotation speed value,

the first judging unit and the first measuring unit are used for judging whether the second reference thickness value meets the design specification;

the first adjusting unit is connected with the first judging unit and used for finely adjusting the second reference rotating speed value according to the difference value between the second reference thickness value and the target thickness value when the second reference thickness value is judged not to meet the design specification, wherein the thicker the thickness value of the photoresist layer is, the smaller the rotating speed value is, and then the photoresist layer returns to the first setting unit;

the first calculating unit is connected with the first judging unit and used for calculating a relational expression coefficient corresponding to the target thickness value according to the second reference thickness value and the second reference rotating speed value when the second reference thickness value is judged to meet the design specification;

the first recording unit is connected with the first calculating unit and is used for recording the second reference rotating speed value and the relational coefficient to form a group of data groups;

the first counting unit is connected with the first recording unit and used for counting the number of the data groups;

the second judging unit is connected with the first counting unit and used for judging whether the number of the data groups reaches a set number or not, and when the number of the data groups does not reach the set number, the second judging unit returns to the first adjusting unit;

and the second calculating unit is connected with the first counting unit and used for calculating the average value or the median of a plurality of second reference rotating speed values corresponding to the second reference thickness values meeting the design specification when the number of the data sets reaches the set number, taking the average value or the median as an adjusting rotating speed value corresponding to the target thickness value, and calculating the average value or the median of a plurality of relational coefficients corresponding to the second reference thickness values meeting the design specification as the relational coefficients corresponding to the target thickness value.

16. The system for adjusting a thickness value of a photoresist layer of claim 11, wherein the design specification for the thickness value of the photoresist layer includes a lower thickness limit and an upper thickness limit, the lower thickness limit being less than the upper thickness limit, the design specification further including a range of discrete thickness values;

17. The system for adjusting a photoresist layer thickness value of claim 16, wherein the discrete value range of thickness values is from 0 to 0.25.

18. The system for adjusting a photoresist layer thickness value of claim 11, wherein the adjustment module further comprises:

the second setting unit is used for obtaining a corresponding relational expression coefficient from the coefficient table according to the type of the photoresist layer and the target thickness value;

the third calculation unit is connected with the second setting unit and used for calculating an adjusting rotating speed value corresponding to the target thickness value according to the obtained relational expression coefficient and the relational expression;

the second coating unit is connected with the third calculating unit and is used for coating the photoresist layer according to the adjusting rotating speed value;

the second measuring unit is connected with the second coating unit and used for measuring the thickness value of the photoresist layer after the photoresist layer is coated by adjusting the rotating speed value;

a third judging unit, connected to the second measuring unit and the second coating unit, for judging whether the thickness value of the photoresist layer meets the design specification, and returning to the second coating unit 303 for normal production when the thickness value of the photoresist layer meets the design specification;

the fourth calculation unit is connected with the third judgment unit and used for recalculating the relational coefficient according to the photoresist layer thickness value and the regulating rotating speed value when the photoresist layer thickness value is judged not to meet the design specification;

a fourth judging unit, connected to the fourth calculating unit and the third calculating unit, for judging whether the obtained relation coefficient satisfies the design specification, and when the obtained relation coefficient satisfies the design specification, returning to the third calculating unit, and calculating an adjustment rotation speed value corresponding to the target thickness value by using the obtained relation coefficient and the relation;

and the fifth judging unit is connected with the second coating unit and the third calculating unit and is used for judging whether the obtained relation coefficients are abnormal or not and whether the design specifications are reasonable or not when judging that the obtained relation coefficients do not meet the design specifications, adopting the original relation coefficients and the adjusted rotating speed value after solving the external factors such as the machine or the temperature when judging that the external factors such as the machine or the temperature are abnormal and the design specifications are reasonable, returning to the second coating unit, and adopting the obtained relation coefficients after resetting the design specifications and returning to the third calculating unit when judging that the external factors such as the machine or the temperature are not abnormal and the design specifications are unreasonable.

19. The system for adjusting a photoresist layer thickness value of claim 18, wherein the design specification for the coefficient of the relationship comprises a lower coefficient value and an upper coefficient value, the ratio of the difference between the coefficient of the relationship and the lower coefficient value to the coefficient of the relationship is 3%, and the ratio of the difference between the coefficient of the relationship and the upper coefficient value to the coefficient of the relationship is 3%;

20. The system for adjusting a photoresist layer thickness value of claim 11, further comprising an interaction module coupled to the modeling module, the classification module, and the adjustment module for enabling data communication between the modules.