CN107413174A - A kind of small-sized plasma generator with VHF source power - Google Patents
A kind of small-sized plasma generator with VHF source power Download PDFInfo
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- CN107413174A CN107413174A CN201710609788.XA CN201710609788A CN107413174A CN 107413174 A CN107413174 A CN 107413174A CN 201710609788 A CN201710609788 A CN 201710609788A CN 107413174 A CN107413174 A CN 107413174A
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- negative electrode
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/708—Volatile organic compounds V.O.C.'s
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- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention discloses a kind of small-sized plasma generator with VHF source power, its drip irrigation device is：Including being square, framework is set, it is parallel to each other in the framework to be provided with some electrodes, the electrode is connected with VHF source power, the electrode jacket is provided with quartz ampoule, the electrode includes positive electrode and negative electrode, the positive electrode is arranged on the side of negative electrode and the positive electrode is arranged at intervals with negative electrode, and the positive electrode is fixed on the top of framework, and the negative electrode is fixed on the bottom of framework.Because positive electrode and negative electrode are staggered, therefore, on same framework, the lateral separation of positive electrode and negative electrode can reduce, so, on the framework of commensurateiy wide, more positive electrodes and negative electrode can be installed, the generation efficiency of plasma is improved, and then the clean-up effect of air can be improved.
Description
Technical field
The present invention relates to a kind of VOC cleaning equipments, more specifically, it relates to a kind of small-sized etc. with VHF source power
Ion generator.
Background technology
In modern industrial production, some poisonous and hazardous waste gas, this waste gas can be produced unavoidably along with production process
It is directly discharged in air, air quality is polluted, serious harm is produced to health.The relevant laws and regulations of country
And professional standard all has strict restriction to the discharge standard of gas, it is the pass for improving environmental quality that dusty gas, which administer,
Key.
Notification number is provided at a kind of matrix form dielectric barrier discharge plasma for CN101934190B patent of invention
Gas with foreign flavor device is managed, very good clean-up effect can be played to the waste gas of big flux.
Dielectric barrier discharge device of the prior art, mainly it is arranged on including framework, the linear array of electrode in framework,
But in actual use, to facilitate installation, the limited width of framework, the electrode that can be set in framework is densely arranged, peace
Dress and maintenance greatly inconvenience, the clean-up effect of air gradually reduce over time.
The content of the invention
In view of the shortcomings of the prior art, it is an object of the invention to provide a kind of small-sized plasma hair with VHF source power
Raw device, under the framework of commensurateiy wide, can install more electrodes, improve the clean-up effect of air.
The present invention above-mentioned technical purpose technical scheme is that：It is a kind of with VHF source power
Small-sized plasma generator, including processing tube, processing tube is interior provided with the low-temperature plasma purifying device purified to air, low
Warm plasma purifier includes the framework of setting of being square, parallel to each other in the framework to be provided with some electrodes, the electrode
It is connected with VHF source power, the electrode jacket is provided with quartz ampoule, and the electrode includes positive electrode and negative electrode, the positive electricity
Pole is arranged at intervals with negative electrode, and negative electrode is arranged on the side of adjacent two positive electrodes line, and the positive electrode is fixed on framework
Top, the negative electrode are fixed on the bottom of framework.
By using above-mentioned technical proposal：Because positive electrode and negative electrode are staggered, therefore, in same frame
On frame, the lateral separation of positive electrode and negative electrode can reduce, and so, on the framework of commensurateiy wide, can install more just
Electrode and negative electrode, the generation efficiency of plasma is improved, and then the clean-up effect of air can be improved.Modular construction side
Just safeguard and manufacture, multiple block combiners flexibly use, and can be directed to different purification of air and require configuration, make equipment cost performance big
Amplitude improves, and distributed arrangement can also reduce the risk that system simultaneous faults can not be run.
Preferably, on the framework along quartz ampoule length direction be provided with abut bar and driving abut bar all the time with stone
The first elastic component that the end face of English pipe abuts, the abutting bar are provided with movable contact, are correspondingly provided with the framework with movable contact
Stationary contact, the movable contact and stationary contact are connected with warning circuit.
By using above-mentioned technical proposal：Because during normal work, low-temperature plasma purifying device is mounted in processing tube
Interior, outside is hardly visible the situation of quartz ampoule.After damage, which occurs, in quartz ampoule to be crushed, quartz ampoule no longer plays branch to abutting bar
Support acts on, and the first elastic component driving in stored energy state originally abuts bar and moved down, and the stationary contact abutted on bar connects with movable contact
Touch, warning circuit is connected, and prompts operating personnel to change quartz ampoule.
Preferably, the distance between the positive electrode and adjacent negative electrode are 5-20mm
By using above-mentioned technical proposal：Positive electrode and negative electrode in the spacing, VHF source power only need to provide
15kv-20kv voltage, you can make air produce ionization phenomena, not only the requirement to VHF source power is small, and can be very
Stable generation low-temperature plasma, good purification
Preferably, the distance between the positive electrode and negative electrode are 5mm.
By using above-mentioned technical proposal：Positive electrode and negative electrode in the spacing, VHF source power only need to carry
For 15kv-20kv voltage, you can air is produced ionization phenomena, not only the requirement to VHF source power is very small, and energy consumption is low,
And can be very good with sufficiently stable generation low-temperature plasma, clean-up effect.
Preferably, the both ends of the processing tube are respectively equipped with air inlet pipe and escape pipe, it is located in the processing tube low
Warm plasma purifier is provided with dust removing units and photocatalysis unit close to one end of air inlet pipe.
By using above-mentioned technical proposal：Due to being mounted with above-mentioned low-temperature plasma purifying device, can install more
Positive electrode and negative electrode, the generation efficiency of plasma is improved, and then the clean-up effect of air can be improved.During purification, remove
Dirt unit can get rid of bulky grain thing in air, carry out preliminary purification, and photocatalysis unit can refine residual impurity, most
Post plasma purifier is smashed remaining impurity completely, and three works in coordination, and air can be purified successively,
Serve very good clean-up effect.Because when air reaches low-temperature plasma clean unit, the impurity in air is
Very tiny, low-temperature plasma clean unit very can be smashed rapidly, greatly improve purification efficiency.
Preferably, length direction sliding of the framework along conducting rod is arranged in processing tube, set in the processing tube
There is the opening skidded off for framework.
By using above-mentioned technical proposal：When wanting to change low-temperature plasma purifying device, sliding is set
The framework put, very it can realize the dismounting of low-temperature plasma purifying device in labour-saving.Repair very convenient.
Preferably, being provided with chute along the glide direction of framework on the end face at the framework both ends, set in the processing tube
There are some rollers coordinated with chute.
By using above-mentioned technical proposal：Roller and chute are set, you can realize that the sliding of framework and processing tube connects,
It is simple in construction, reliable operation, chute is set on the end face of framework, framework can be avoided to occur sliding up and down, can also be to frame
Position-limiting action is erected, improves the connection effect between framework and processing tube.
Preferably, the low-temperature plasma purifying device is two.
By using above-mentioned technical proposal：Two low-temperature plasma purifying devices are set, can after one of damage
To enable another low-temperature plasma purifying device, the not shutdown maintenance of low-temperature plasma purifying device can be so realized,
It ensure that the stability of low-temperature plasma purifying device.
In summary, the invention has the advantages that：
1st, stability is very high；
2nd, it is easy to maintenance.
Brief description of the drawings
Fig. 1 is the overall assembling schematic diagram of the small-sized plasma generator with VHF source power of the present embodiment；
Fig. 2 is the internal structure schematic diagram in Fig. 1；
Fig. 3 is Fig. 2 front view；
Fig. 4 is A portions enlarged drawing in Fig. 3；
Fig. 5 is the low-temperature plasma purifying device overall structure diagram of the present embodiment；
Fig. 6 is the framework sectional view of the present embodiment；
Fig. 7 is B portions enlarged drawing in Fig. 7.
In figure：1st, air inlet pipe；2nd, processing tube；21st, dust removing units；22nd, photocatalysis unit；23rd, low-temperature plasma purification dress
Put；3rd, escape pipe；4th, framework；41st, chute；42nd, electrode；421st, quartz ampoule；43rd, stationary contact；44th, it is open；5th, roller；6th, abut
Bar；61st, movable contact；62nd, spring.
Embodiment
The present invention is described in further detail below in conjunction with accompanying drawing 1-7.
A kind of small-sized plasma generator with VHF source power, reference picture 1, including air inlet pipe 1, processing tube 2 and go out
Tracheae 3, dust removing units 21, photocatalysis unit 22 and low-temperature plasma purifying device 23 are sequentially provided with processing tube 2.
Reference picture 2, two low-temperature plasma purifying devices 23, two low-temperature plasma purification dresses are provided with processing tube 2
Put 23 to be disposed in parallel relation to one another, during work, a normality is opened, and purifies waste gas, and another normality is closed, as standby
With.When the low-temperature plasma purifying device 23 of normal work damages, standby low-temperature plasma purification dress is connected
23 are put, the low-temperature plasma purifying device 23 of damage can now be changed, ensure that low-temperature plasma purifying device 23
Normal use.
Reference picture 3 and Fig. 4, the low-temperature plasma purifying device 23 of damage is changed for convenience, the sliding of framework 4 is set
In processing tube 2, the opening 44 skidded off for framework 4 is provided with the side of processing tube 2, in order to stable framework 4 of realizing
Slide, be provided with chute 41 along the glide direction of framework 4 on framework 4, chute 41 is symmetricly set on the end of the rear and front end of framework 4
On face, array is provided with some rollers 5 that can be rotated in chute 41 in processing tube 2.
Reference picture 3, when low-temperature plasma purifying device 23 damages, it is desirable to change the low-temperature plasma purification dress of damage
When putting 23, the framework 4 of damage being extracted out, connecting another low-temperature plasma purifying device, off-gas cleaning equipment can be normal
Work.
The framework 4 of reference picture 6 and Fig. 7, low-temperature plasma purifying device, including the setting that is square, in framework 4 mutually
Parallel to be provided with some electrodes 42, positive electrode 42 is connected with negative electrode 42 with VHF source power, and in the present embodiment, electrode 42 is a gold medal
Category pipe, the both ends of metal tube can be abutted with the medial surface of framework 4, and electrode 42 is made up of positive electrode and negative electrode, positive electrode
Positive power supply is connected, negative electrode connection negative sense power supply, is provided with quartz ampoule 421 in the outer cover of positive electrode and negative electrode 42, quartz
The both ends of pipe 421 can abut with the medial surface of framework 4.
Reference picture 5 and Fig. 6, positive electrode and negative electrode are disposed in parallel relation to one another, and positive electrode is arranged at intervals with negative electrode,
Negative electrode is arranged on the side of the line of adjacent two positive electrode, and during vertical view, negative electrode and positive electrode are arranged in some V-arrangements, this
Sample, on the framework 4 of commensurateiy wide, more positive electrodes and negative electrode can be installed, improve the generation efficiency of plasma,
And then the clean-up effect of air can be improved.Electrode 42 is connected with VHF source power, by between positive electrode and negative electrode away from
Show from for 5-20mm, experiment, when the distance between positive electrode and negative electrode are 5mm, the requirement to VHF source power
Minimum, work are also most stable.
Reference picture 6 and Fig. 7, it is provided with framework 4 along the length direction sliding of electrode 42 and abuts bar 6, abutted bar 6 and set
In the surface of quartz ampoule 421, abutting the bottom of bar 6 can abut with the end face of quartz ampoule 421, be set on the top for abutting bar 6
There is movable contact 61, movable contact 61 is fixedly connected with abutting bar 6, and framework 4 is provided with the stationary contact 43 coordinated with movable contact 61, is moved and is touched
Point 61 is connected with warning circuit with stationary contact 43.After quartz ampoule 421 damages, quartz ampoule 421 is with abutting between bar 6
Stress balance can be broken, and abutting bar 6 can sink, and after movable contact 61 contacts with stationary contact 43, warning circuit is connected, and is prompted
Staff changes quartz ampoule 421.
Reference picture 7, in order to ensure after quartz ampoule 421 damages, corresponding action can be made by abutting bar 6, abut bar 6
It is provided with driving and abuts the first elastic component that bar 6 moves towards quartz ampoule 421, the first elastic component is spring 62, and spring 62 is arranged
On bar 6 is abutted, the both ends of spring 62 abut with abutting movable contact 61 on bar 6 and framework 4 respectively.
The course of work is summarized：After quartz ampoule 421 damages, under the driving of spring, the movable contact on bar 6 is abutted
61 can slide towards stationary contact 43, after movable contact 61 contacts with stationary contact 43, warning circuit conducting, prompt staff couple
Quartz ampoule 421 is changed.
Described above is only the preferred embodiment of the present invention, and protection scope of the present invention is not limited merely to above-mentioned implementation
Example, all technical schemes belonged under thinking of the present invention belong to protection scope of the present invention.It should be pointed out that for the art
Those of ordinary skill for, some improvements and modifications without departing from the principles of the present invention, these improvements and modifications
It should be regarded as protection scope of the present invention.
Claims (8)
1. a kind of small-sized plasma generator with VHF source power, including processing tube（2）, processing tube（2）It is interior to be provided with to sky
The low-temperature plasma purifying device that gas is purified, low-temperature plasma purifying device includes the framework (4) for the setting that is square, described
Parallel to each other in framework (4) to be provided with some electrodes (42), the electrode (42) is connected with VHF source power, and the electrode (42) is outside
Quartz ampoule (421) is arranged with, the electrode (42) includes positive electrode (42) and negative electrode (42), it is characterised in that：It is described just
Electrode (42) is arranged at intervals with negative electrode (42), and negative electrode (42) is arranged on the side of adjacent two positive electrode (42) line, described
Positive electrode (42) is fixed on the top of framework (4), and the negative electrode (42) is fixed on the bottom of framework (4).
2. the small-sized plasma generator according to claim 1 with VHF source power, it is characterised in that：The framework
(4) on along quartz ampoule (421) length direction be provided with abut bar (5) and driving abut bar (5) all the time with quartz ampoule (421)
The first elastic component that end face abuts, the abutting bar (5) are provided with movable contact (51), on the framework (4) with movable contact (51)
Stationary contact (43) is correspondingly provided with, the movable contact (51) and stationary contact (43) are connected with warning circuit.
3. the small-sized plasma generator according to claim 2 with VHF source power, it is characterised in that：The positive electricity
The distance between pole (42) and adjacent negative electrode (42) are 5-20mm.
4. the small-sized plasma generator according to claim 3 with VHF source power, it is characterised in that：The positive electricity
The distance between pole (42) and negative electrode (42) are 5mm.
5. the small-sized plasma generator according to claim 1 with VHF source power, it is characterised in that：The processing
The both ends of pipe (2) are respectively equipped with air inlet pipe (1) and escape pipe (3), the processing tube（2）It is interior to be filled positioned at low-temperature plasma purification
Put (23) front end and be provided with dust removing units (21) and photocatalysis unit (22).
6. the small-sized plasma generator according to claim 5 with VHF source power, it is characterised in that：The framework
(4) along processing tube（2）Width sliding be arranged on processing tube（2）It is interior, the processing tube（2）Interior be provided with is slided for framework (4)
The opening (44) gone out.
7. the small-sized plasma generator according to claim 6 with VHF source power, it is characterised in that：The framework
(4) chute (41), the processing tube are provided with along the glide direction of framework (4) on the end face at both ends（2）It is interior to be provided with some and chute
(41) roller (5) coordinated.
8. the small-sized plasma generator according to claim 6 with VHF source power, it is characterised in that：The low temperature
Plasma purifier (23) is two.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710609788.XA CN107413174B (en) | 2017-07-25 | 2017-07-25 | A kind of small-sized plasma generator with VHF source power |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710609788.XA CN107413174B (en) | 2017-07-25 | 2017-07-25 | A kind of small-sized plasma generator with VHF source power |
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| Publication Number | Publication Date |
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| CN107413174A true CN107413174A (en) | 2017-12-01 |
| CN107413174B CN107413174B (en) | 2019-07-12 |
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| CN201710609788.XA Active CN107413174B (en) | 2017-07-25 | 2017-07-25 | A kind of small-sized plasma generator with VHF source power |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111514710A (en) * | 2020-04-21 | 2020-08-11 | 山东康德莱净化工程有限公司 | Purification unit capable of improving purification efficiency |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204469510U (en) * | 2015-01-30 | 2015-07-15 | 湖州太源绿能科技有限公司 | A kind of low-temperature plasma emission-control equipment |
| CN105817124A (en) * | 2016-04-01 | 2016-08-03 | 赵凤明 | High-yield low-temperature plasma generator for waste gas treatment |
| CN106861389A (en) * | 2017-04-08 | 2017-06-20 | 苏州鱼翔环境工程有限公司 | A kind of VOC off-gas cleaning equipments and purification method |
-
2017
- 2017-07-25 CN CN201710609788.XA patent/CN107413174B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204469510U (en) * | 2015-01-30 | 2015-07-15 | 湖州太源绿能科技有限公司 | A kind of low-temperature plasma emission-control equipment |
| CN105817124A (en) * | 2016-04-01 | 2016-08-03 | 赵凤明 | High-yield low-temperature plasma generator for waste gas treatment |
| CN106861389A (en) * | 2017-04-08 | 2017-06-20 | 苏州鱼翔环境工程有限公司 | A kind of VOC off-gas cleaning equipments and purification method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111514710A (en) * | 2020-04-21 | 2020-08-11 | 山东康德莱净化工程有限公司 | Purification unit capable of improving purification efficiency |
| CN111514710B (en) * | 2020-04-21 | 2022-04-08 | 山东康德莱净化工程有限公司 | Purification unit capable of improving purification efficiency |
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| Publication number | Publication date |
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| CN107413174B (en) | 2019-07-12 |
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