CN107385372B - A kind of preparation method of nanostructured transition metal thin film - Google Patents
A kind of preparation method of nanostructured transition metal thin film Download PDFInfo
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- CN107385372B CN107385372B CN201710653264.0A CN201710653264A CN107385372B CN 107385372 B CN107385372 B CN 107385372B CN 201710653264 A CN201710653264 A CN 201710653264A CN 107385372 B CN107385372 B CN 107385372B
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- 229910052723 transition metal Inorganic materials 0.000 title claims abstract description 68
- 150000003624 transition metals Chemical class 0.000 title claims abstract description 67
- 238000002360 preparation method Methods 0.000 title claims abstract description 33
- 239000010409 thin film Substances 0.000 title 1
- 239000011888 foil Substances 0.000 claims abstract description 47
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 45
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 45
- 239000002994 raw material Substances 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 239000002086 nanomaterial Substances 0.000 claims abstract description 16
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 14
- 238000000137 annealing Methods 0.000 claims abstract description 9
- 229910001338 liquidmetal Inorganic materials 0.000 claims abstract description 9
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 8
- 229910052737 gold Inorganic materials 0.000 claims abstract description 7
- 239000007788 liquid Substances 0.000 claims abstract description 6
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 6
- 229910052802 copper Inorganic materials 0.000 claims abstract description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 5
- 229910052762 osmium Inorganic materials 0.000 claims abstract description 5
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 5
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 5
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 4
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 4
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 4
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 4
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 4
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 4
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 16
- 238000005275 alloying Methods 0.000 claims description 14
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 7
- 239000008367 deionised water Substances 0.000 claims description 6
- 229910021641 deionized water Inorganic materials 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 2
- 230000009471 action Effects 0.000 claims description 2
- 239000012298 atmosphere Substances 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 229910000765 intermetallic Inorganic materials 0.000 claims description 2
- 239000012528 membrane Substances 0.000 claims description 2
- 230000007704 transition Effects 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 claims 1
- 239000011148 porous material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 14
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract description 10
- 239000000446 fuel Substances 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 9
- 239000002253 acid Substances 0.000 abstract description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract description 5
- 239000003054 catalyst Substances 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 230000008569 process Effects 0.000 abstract description 5
- 238000006555 catalytic reaction Methods 0.000 abstract description 4
- 238000010923 batch production Methods 0.000 abstract description 2
- 239000001569 carbon dioxide Substances 0.000 abstract description 2
- 229910052742 iron Inorganic materials 0.000 abstract description 2
- 238000007146 photocatalysis Methods 0.000 abstract description 2
- 230000001699 photocatalysis Effects 0.000 abstract description 2
- 229910000807 Ga alloy Inorganic materials 0.000 abstract 1
- 239000002131 composite material Substances 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 description 31
- 230000007797 corrosion Effects 0.000 description 31
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 21
- 238000002791 soaking Methods 0.000 description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 11
- 210000003041 ligament Anatomy 0.000 description 11
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 11
- 239000010937 tungsten Substances 0.000 description 11
- 238000002604 ultrasonography Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 5
- 238000011049 filling Methods 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 239000010949 copper Substances 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 239000010948 rhodium Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000005431 greenhouse gas Substances 0.000 description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 2
- 238000000713 high-energy ball milling Methods 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 235000011149 sulphuric acid Nutrition 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000011089 mechanical engineering Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002707 nanocrystalline material Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/26—After-treatment
- C23C2/28—Thermal after-treatment, e.g. treatment in oil bath
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Composite Materials (AREA)
- Thermal Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Manufacturing & Machinery (AREA)
- Catalysts (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
The invention belongs to nanostructured metal technical fields, are related to a kind of preparation method of nano-structural transition metal film.It include: selection gallium and transition metal foil, by gallium heating and melting at liquid；Liquid metal gallium is uniformly coated on transition metal foil, then by annealing, forms the alloy of gallium and transition metal on transition metal foil surface；By composite insulating foil in alkalinity or acid solution selective removal gallium therein, the film of nanostructure is formed on transition metal foil surface.The transition metal is any one in Ti, V, Cr, Fe, Co, Ni, Cu, Zr, Nb, Ru, Os, Ir, Rh, Mo, Pd, Ag, Hf, Ta, W, Pt, Au.Raw material of the present invention is simple, at low cost, and process repeatability is strong, and equipment requirement is lower, batch production easy to accomplish, and products obtained therefrom is a kind of potential fuel cell catalyst materials and photocatalysis and carbon dioxide gas phase catalysis material.
Description
Technical field
The invention belongs to nanostructured metal technical fields, are related to a kind of preparation side of nano-structural transition metal film
Method.
Background technique
In vigorous 21 century, information, biotechnology, the energy, environment, advanced manufacturing technology and national defence high speed hair
Exhibition will necessarily put forward higher requirements metal material.The intelligence of component, miniaturization, highly integrated, high density store and surpass
Fast transmission etc. requires the size of material smaller and smaller.Nano metal material is undoubtedly most rich work in current new material research field
Power, the research object for having particularly significant influence on the future economy and social development.Nano metal has nano-grade size
Material, nanoscale crystal grain make it have higher specific surface area and other unique physics, chemistry and mechanical properties.Example
Such as unique electromagnetic performance, higher chemical activity, higher intensity.Therefore, nano metal material has huge answer
Use potentiality.The application study carried out at present mainly has catalysis, electro-catalysis, sensing, Surface enhanced Raman scattering etc..
With the development of electronic industry, finding has high-energy-density, fast charging and discharging ability, high security and low cost
Electrochemical power source becomes the mainstream of research.In numerous electrochemical power sources, fuel cell is had many advantages.Fuel cell is not
We usually said " battery ", but a kind of electrochemical generating unit, the chemical energy of fuel and oxygen is passed through electrochemistry by it
It reacts rather than burns and be transformed into electric energy, thus have higher efficiency, lower disposal of pollutants；Fuel cell can be used for institute
The occasion of electric power in need.Since fuel cell in 1839 comes out, people always diligent ground Improvement it, and
Many applications.Since fuel cell is born, related fuel-cell catalyst is mainly based on powder, and self-supporting is urged
Agent is a kind of very promising fuel cell catalyst materials.
In addition, mankind's activity increases the greenhouse gas concentration that the heat absorptivities such as CO2 are strong in atmosphere, greenhouse effects are exacerbated,
Cause global warming.In numerous greenhouse gases, CO2 is to account about 60% one of the main reason for leading to greenhouse effects.Cause
This, reducing discharge is to control the important way of greenhouse effects.And the nano materials such as Cu, Ag of self-supporting of this method production are one
The very promising CO2 reducing catalyst of kind.
Currently, the preparation about nano metal mainly have sol-gal process (Wang letter, land route moral nano-metal-oxide
Preparation and application study several progress [J] Chinese Journal of Inorganic Chemistry, 2000,16 (2): 213-217.), sputtering method (Zhao Xiqin
Application [J] electric mechanical engineering of sputter coating technology, 1999,79 (3): 58-61.), high-energy ball milling method (Dong Yuanda, hippology
Ring Nano-crystalline Materials Formed By High Energy Ball Milling [J] Materials Science and Engineering, 1993,11 (1): 50-54.), selection electrodeposition process
(Schwarzacher W,Kasyutich OI,Evans P R,et al.Metal nanostructures prepared by
template electrodeposition[J].Journal of Magnetism and Magnetic Materials,
1999,198:185-190.) etc..Although above method can prepare the metal of nanoscale, complicated for operation, the amount of being not easy
It produces, and composition proportion not easy to control, is unfavorable for industrial popularization and application.
Summary of the invention
The purpose of the present invention is in view of the above shortcomings of the prior art, provide a kind of system of nano-structural transition metal film
Preparation Method, this method simple process, ingredient are controllable, product pattern is good, may be implemented to produce in batches.
The present invention is achieved in the following ways:
A kind of preparation method of nano-structural transition metal film, it is characterized in that the following steps are included:
(1) transition metal foil acetone is cleaned by ultrasonic 10min, is then cleaned by ultrasonic 10min, drying with alcohol, incited somebody to action
It crosses in metal foil tiling to warm table；
(2) gallium is melted, dips liquid metal gallium with coated tool, is then applied to the surface of transition metal foil,
It is brushed repeatedly so that the gallium coating of transiting metal surface is uniform；
(3) the transition metal foil that will coat gallium, anneals under the conditions of 50~500 DEG C, makes gallium and transition metal alloy,
The intermetallic compound of transition metal and gallium is formed on transition metal foil surface；
(4) the transition metal foil after gained alloying is put into alkalinity or acid solution (H2SO4, HCl, NaOH), choosing
Selecting property removes the gallium in alloying layer, after further using deionized water, washes of absolute alcohol, drying, on transition metal foil surface
Form the transiting metal film of nanostructure.
In above-mentioned steps (1), the transition metal be Ti, V, Cr, Fe, Co, Ni, Cu, Zr, Nb, Ru, Os, Ir, Rh, Mo,
Any one in Pd, Ag, Hf, Ta, W, Pt, Au.
In above-mentioned steps (1), transition metal foil acetone is cleaned by ultrasonic at room temperature, degreases, then clear with alcohol
Remaining acetone on transition metal foil is removed in washout, dries transition metal foil.
In above-mentioned steps (2), gallium is first heated to above 10-30 DEG C of fusing point, melts gallium, to use coating
Tool dips liquid metal gallium.
In above-mentioned steps (2), liquid metal gallium is dipped with coated tool, is brushed repeatedly on transition metal foil surface, so as to
So that gallium is stronger and uniform in conjunction with transition metal foil.
In above-mentioned steps (3), annealing temperature is 50~500 DEG C, and annealing time is 3~15h, is carried out under an argon atmosphere.
In above-mentioned steps (4), the concentration of alkalinity used or acid solution is 0.1~5mol/L, 1~12h of etching time, corruption
Losing temperature is 20~80 DEG C.Concentration is too low, and required time is too long, and concentration is too high, and particle is very big.According to the above method of the present invention,
Continuous nano structure membrane is formed on transition metal foil surface, scale is 3~500 nanometers.
Specific alloy product is made through over cleaning-coating-annealing method by reasonable binary alloy phase diagram in the present invention,
The transiting metal film of nanostructure is obtained using corrosion treatment, has the advantage that (1) passes through cleaning-coating-annealing method
Gallium-transition metal precursor alloy is prepared, it is simple controllable, it may be implemented to produce in batches.(2) the transition gold for the painting gallium that annealing obtains
Belong to foil, arbitrary area and arbitrary shape can be made.(3) by the prepared alloy of annealing, gallium can be reacted with acid or alkali, therefore
Complete corrosion can be realized with the acid of general concentration or alkali.(4) have not by what any collocation of transition metal and gallium obtained
With nano-structural transition metal film, at low cost, simple process, repeatability are strong, and equipment requirement is lower, and are easily achieved batch
Production.(5) gained have the transiting metal film product of nanostructure be a kind of potential fuel cell catalyst materials and
Photocatalysis and carbon dioxide gas phase catalysis material.
Detailed description of the invention
Fig. 1 is gained metal nickel surface photomacrograph after the embodiment of the present invention 1 is corroded.
Fig. 2 is the X ray diffracting spectrum of gained metallic nickel product after 1 alloying of the embodiment of the present invention.
Fig. 3 is the X ray diffracting spectrum of gained metallic nickel product after the embodiment of the present invention 1 is corroded.
Fig. 4 is the stereoscan photograph of gained nanostructured metal nickel after the embodiment of the present invention 1 is corroded.
Specific embodiment
To further appreciate that summary of the invention and feature of the invention, 20 most preferred embodiments of the invention are given below, but
Institute's protection scope of the present invention is without being limited thereto.
Embodiment 1
A kind of preparation method of nano-structural transition metal film:
(1) a certain size nickel foil is cut；
(2) nickel foil cut is put into the beaker for filling acetone, is put into ultrasonic vibration instrument, ultrasound 10 minutes；
Then nickel foil taking-up is put into and is contained in spirituous beaker, ultrasound 10 minutes is drawn off being dried up with hair dryer.Then by nickel
In foil tiling to warm table.
(3) heating instrument is set to 60 DEG C, solid metallic gallium is put on warm table, it is made to be melted into liquid.
(4) liquid metal gallium is dipped with coated tool, is smoothly coated to nickel foil surface, brushes repeatedly, make nickel foil surface
Gallium coating it is uniform.
(5) nickel foil for coating gallium is put into tube furnace, is passed through argon gas, exclude the air in tube furnace；50 DEG C are heated to,
8h is kept the temperature, its alloying is made；It is drawn off when tubular type furnace temperature is cooled to room temperature.
(6) nickel foil of surface alloying is corroded in the NaOH solution of 0.1mol/L, 50 DEG C of corrosion temperature, soaking time
6h.Then the nickel foil after corrosion is taken out, further with after deionized water, washes of absolute alcohol, drying, obtains the corruption containing only Ni
Lose product；The nickel of nanostructure can be obtained, granular size is 300~500nm.
Fig. 1 is the photomacrograph of gained sample, it can be seen that sample is continuous, self-supporting film.
Fig. 3 is the XRD diagram of products obtained therefrom, and as can be seen from the figure products obtained therefrom is uniform nickel phase.
Fig. 4 is the scanning electron microscope (SEM) photograph of products obtained therefrom, and as can be seen from the figure gained sample is uniform nano particle, particle
Size is 300~500nm.
Embodiment 2
A kind of preparation method of nano-structural transition metal film:
(1) a certain size goldleaf is cut；
(2) goldleaf cut is put into the beaker for filling acetone, is put into ultrasonic vibration instrument, ultrasound 10 minutes；
Then goldleaf taking-up is put into and is contained in spirituous beaker, ultrasound 10 minutes is drawn off being dried up with hair dryer.It then will be golden
In foil tiling to warm table.
(3) heating instrument is set to 50 DEG C, solid metallic gallium is put on warm table, it is made to be melted into liquid.
(4) liquid metal gallium is dipped with coated tool, is smoothly coated to goldleaf surface, brushes repeatedly, make goldleaf surface
Gallium coating it is uniform.
(5) goldleaf for coating gallium is put into tube furnace, is passed through argon gas, exclude the air in tube furnace；It is heated to 250
DEG C, 3h is kept the temperature, its alloying is made；It is drawn off when tubular type furnace temperature is cooled to room temperature.
(6) goldleaf of surface alloying is corroded in the H2SO4 solution of 5mol/L, 20 DEG C of corrosion temperature, soaking time
12h.Then the goldleaf after corrosion is taken out, further with after deionized water, washes of absolute alcohol, drying, is obtained containing only gold
Corrosion product；The gold of nano-porous structure can be obtained, ligament is having a size of 10~60nm.
Embodiment 3
A kind of preparation method of nano-structural transition metal film:
(1) a certain size titanium foil is cut；
(2) titanium foil cut is put into the beaker for filling acetone, is put into ultrasonic vibration instrument, ultrasound 10 minutes；
Then titanium foil taking-up is put into and is contained in spirituous beaker, ultrasound 10 minutes is drawn off being dried up with hair dryer.Then by titanium
In foil tiling to warm table.
(3) heating instrument is set to 40 DEG C, solid metallic gallium is put on warm table, it is made to be melted into liquid.
(4) liquid metal gallium is dipped with coated tool, is smoothly coated to titanium foil surface, brushes repeatedly, make titanium foil surface
Gallium coating it is uniform.
(5) titanium foil for coating gallium is put into tube furnace, is passed through argon gas, exclude the air in tube furnace；It is heated to 350
DEG C, 7h is kept the temperature, its alloying is made；It is drawn off when tubular type furnace temperature is cooled to room temperature.
(6) titanium foil of surface alloying is corroded in the NaOH solution of 2mol/L, 60 DEG C of corrosion temperature, soaking time
8h.Then the titanium foil after corrosion is taken out, further with after deionized water, washes of absolute alcohol, drying, obtains the corruption containing only titanium
Lose product；The titanium of nanometer chip architecture can be obtained, with a thickness of 20~60nm.
Embodiment 4
A kind of preparation method of nano-structural transition metal film:
(1) a certain size tungsten foil is cut；
(2) the tungsten foil cut is put into the beaker for filling acetone, is put into ultrasonic vibration instrument, ultrasound 10 minutes；
Then the taking-up of tungsten foil is put into and is contained in spirituous beaker, ultrasound 10 minutes is drawn off being dried up with hair dryer.Then by tungsten
In foil tiling to warm table.
(3) heating instrument is set to 60 DEG C, solid metallic gallium is put on warm table, it is made to be melted into liquid.
(4) liquid metal gallium is dipped with coated tool, is smoothly coated to tungsten foil surface, brushes repeatedly, make tungsten foil surface
Gallium coating it is uniform.
(5) the tungsten foil for coating gallium is put into tube furnace, is passed through argon gas, exclude the air in tube furnace；It is heated to 500
DEG C, 12h is kept the temperature, its alloying is made；It is drawn off when tubular type furnace temperature is cooled to room temperature.
(6) the tungsten foil of surface alloying is corroded in the NaOH solution of 2mol/L, 80 DEG C of corrosion temperature, soaking time
1h.Then the tungsten foil after corrosion is taken out, further with after deionized water, washes of absolute alcohol, drying, obtains the corruption containing only tungsten
Lose product；The tungsten of nanostructure, granular size 200-500nm can be obtained.
Embodiment 5
A kind of preparation method of nano-structural transition metal film, compared with Example 1, except raw material uses cobalt foil；Step
(6) gained corrosion product is the cobalt of nano-porous structure in, other than ligament is having a size of 5~15nm；Remaining and embodiment 1 are identical.
Embodiment 6
A kind of preparation method of nano-structural transition metal film, compared with Example 1, except raw material uses copper foil；Step
(6) NaOH concentration is 1mol/L in, and gained corrosion product is the copper of nano-porous structure, other than ligament is having a size of 50~200nm；
Remaining and embodiment 1 are identical.
Embodiment 7
A kind of preparation method of nano-structural transition metal film, compared with Example 2, except raw material uses platinum foil；Step
(6) gained corrosion product is the platinum of nano-porous structure in, other than ligament is having a size of 3~10nm；Remaining and embodiment 2 are identical.
Embodiment 8
A kind of preparation method of nano-structural transition metal film, compared with Example 2, except raw material uses palladium foil；Step
(6) gained corrosion product is the palladium of nano-porous structure in, other than ligament is having a size of 3~15nm；Remaining and embodiment 2 are identical.
Embodiment 9
A kind of preparation method of nano-structural transition metal film, compared with Example 2, except raw material uses silver foil；Step
(5) holding temperature is 150 DEG C in；Etchant solution is 2mol/LNaOH in step (6), and gained corrosion product is nano-porous structure
Rod-shaped silver, diameter be 200~500nm except；Remaining and embodiment 2 are identical.
Embodiment 10
A kind of preparation method of nano-structural transition metal film, compared with Example 3, except raw material uses vanadium foil；Step
(6) gained corrosion product is the vanadium of nano-porous structure in, except ligament is having a size of 300~500nm；Remaining and 3 phase of embodiment
Together.
Embodiment 11
A kind of preparation method of nano-structural transition metal film, compared with Example 3, except raw material uses lead foil；Step
(6) etchant solution is HCl in, and gained corrosion product is the chromium of nanostructure, except 100~500nm of granular size, remaining and it is real
It is identical to apply example 3.
Embodiment 12
A kind of preparation method of nano-structural transition metal film, compared with Example 4, except raw material uses molybdenum foil；Step
(6) gained corrosion product is the molybdenum of nano-porous structure in, except ligament is having a size of 20~200nm；Remaining and 4 phase of embodiment
Together.
Embodiment 13
A kind of preparation method of nano-structural transition metal film, compared with Example 4, except raw material uses zirconium foil；Step
(5) soaking time is 10h in；Soaking time is 5h in step (6), and gained corrosion product is the zirconium of nano-porous structure, ligament
Other than 50~200nm；Remaining and embodiment 4 are identical.
Embodiment 14
A kind of preparation method of nano-structural transition metal film, compared with Example 4, except raw material uses hafnium foil；Step
(5) soaking time is 10h in；Soaking time is 5h in step (6), and gained corrosion product is the hafnium of nano-porous structure, ligament
Except 30~300nm；Remaining and embodiment 4 are identical.
Embodiment 15
A kind of preparation method of nano-structural transition metal film, compared with Example 4, except raw material uses tantalum foil；Step
(6) etchant solution is 2mol/LH2SO4 in, and 30 DEG C of corrosion temperature, soaking time 6h, gained corrosion product is nanostructure
Tantalum, granular size are except 20~150nm；Remaining and embodiment 4 are identical.
Embodiment 16
A kind of preparation method of nano-structural transition metal film, compared with Example 4, except raw material uses niobium foil；Step
(6) etchant solution is 2mol/LH2SO4 in, and 30 DEG C of corrosion temperature, soaking time 6h, gained corrosion product is nanostructure
Niobium, granular size are except 50~300nm；Remaining and embodiment 4 are identical.
Embodiment 17
A kind of preparation method of nano-structural transition metal film, compared with Example 4, except raw material uses ruthenium foil；Step
(6) gained corrosion product is the ruthenium of nano-porous structure in, except ligament is having a size of 50~200nm；Remaining and 4 phase of embodiment
Together.
Embodiment 18
A kind of preparation method of nano-structural transition metal film, compared with Example 4, except raw material uses osmium foil；Step
(6) gained corrosion product is the osmium of nano-porous structure in, except ligament is having a size of 100~300nm；Remaining and 4 phase of embodiment
Together.
Embodiment 19
A kind of preparation method of nano-structural transition metal film, compared with Example 4, except raw material uses rhodium foil；Step
(6) etchant solution is 2mol/LHCl in, and 50 DEG C of corrosion temperature, soaking time 6h, gained corrosion product is nanostructure
Rhodium, granular size are except 20~200nm；Remaining and embodiment 4 are identical.
Embodiment 20
A kind of preparation method of nano-structural transition metal film, compared with Example 4, except raw material uses iridium foil；Step
(6) etchant solution is 2mol/LHCl in, and 50 DEG C of corrosion temperature, soaking time 6h, gained corrosion product is nanostructure
Iridium, granular size are except 50~300nm；Remaining and embodiment 4 are identical.
Claims (5)
1. a kind of preparation method of nano-structural transition metal film, it is characterized in that the following steps are included:
(1) gallium and transition metal are selected, cuts each pure transition metal foil as raw material according to following principle: transition metal and
Gallium can pass through diffusion annealing alloying；
(2) transition metal foil acetone is cleaned by ultrasonic 10min, is then cleaned by ultrasonic 10min with alcohol, then dries, incited somebody to action
It crosses in metal foil tiling to warm table；
(3) gallium is melted, dips liquid metal gallium with coated tool, is then applied to the surface of transition metal foil, repeatedly
It brushes so that the gallium coating of transiting metal surface is uniform；
(4) the transition metal foil that will coat gallium, anneals under the conditions of 50~500 DEG C, makes gallium and transition metal alloy, in mistake
Cross the intermetallic compound that metal foil surface forms transition metal and gallium；
(5) the transition metal foil after gained alloying is put into H2SO4, in HCl or NaOH solution, selective removal alloying layer
In gallium, further with deionized water, washes of absolute alcohol, it is dry after, form the mistake of nanostructure on transition metal foil surface
Cross metallic film.
2. the preparation method of a kind of nano-structural transition metal film according to claim 1, it is characterized in that: transition metal
It is one of Ti, V, Cr, Co, Ni, Cu, Zr, Nb, Ru, Os, Ir, Rh, Mo, Pd, Ag, Hf, Ta, W, Pt, Au.
3. the preparation method of a kind of nano-structural transition metal film according to claim 1 or 2, it is characterized in that: step
(2) in, transition metal foil is cleaned by ultrasonic with acetone, is then tiled with alcohol washes, drying and by transition metal foil to warm table
On carry out in air atmosphere.
4. the preparation method of a kind of nano-structural transition metal film according to claim 1 or 2, it is characterized in that: step
(3) in, gallium is melt into liquid at 30 DEG C or more；In step (4), anneal at 50~500 DEG C, annealing time 3~
15h is carried out under the protection of argon gas；In step (5), H2SO4, HCl, NaOH solution concentration be 0.1~5mol/L, temperature
Degree is 20~80 DEG C, and etching time is 1~12h, and reaction to bubble-free generates.
5. the preparation method of a kind of nano-structural transition metal film according to claim 1, it is characterized in that: in transition gold
Belong to foil surface and form continuous nano structure membrane, the diameter of nano-pore is 3~500 nanometers.
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