CN107238852A - The radiation protecting systems and radiation protection method monitored for photoelectronic imaging - Google Patents
The radiation protecting systems and radiation protection method monitored for photoelectronic imaging Download PDFInfo
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- CN107238852A CN107238852A CN201710294032.0A CN201710294032A CN107238852A CN 107238852 A CN107238852 A CN 107238852A CN 201710294032 A CN201710294032 A CN 201710294032A CN 107238852 A CN107238852 A CN 107238852A
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- radiation
- photoelectronic imaging
- monitoring system
- monitored
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- 230000005855 radiation Effects 0.000 title claims abstract description 89
- 238000003384 imaging method Methods 0.000 title claims abstract description 88
- 238000000034 method Methods 0.000 title claims abstract description 10
- 238000012544 monitoring process Methods 0.000 claims abstract description 60
- 238000013461 design Methods 0.000 claims abstract description 7
- 230000002285 radioactive effect Effects 0.000 claims abstract description 4
- 239000011449 brick Substances 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims 1
- 239000008358 core component Substances 0.000 abstract description 3
- 230000005251 gamma ray Effects 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 208000019155 Radiation injury Diseases 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 238000005510 radiation hardening Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F3/00—Shielding characterised by its physical form, e.g. granules, or shape of the material
- G21F3/04—Bricks; Shields made up therefrom
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- Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
The invention belongs to photoelectronic imaging monitoring technical field, and in particular to a kind of radiation protecting systems monitored for photoelectronic imaging and radiation protection method.The radiation protecting systems include imaging reflecting module and radiation shield module；It is imaged reflecting module to be located between radiation source and photoelectronic imaging monitoring system, for entering photoelectronic imaging monitoring system after the image information of radiation source is reflected through light path；Radiation shield module, which is enclosed, to be located at outside photoelectronic imaging monitoring system, the ray sent for radioactive source shielding.Light path design of the invention by using mirror-reflection, photoelectronic imaging monitoring system camera lens is set to carry out mirror image to the region to be monitored of radiation source, designated area can be monitored, it is avoided that dense ionization radiates the direct irradiation to the photosensitive core component of photoelectronic imaging monitoring system again simultaneously, the radiation proof problem of photoelectronic imaging monitoring system under dense ionization radiation environment is overcome, service life of the photoelectronic imaging monitoring system in dense ionization radiation environment is significantly improved.
Description
Technical field
The invention belongs to photoelectronic imaging monitoring technical field, and in particular to a kind of radiation protection monitored for photoelectronic imaging
System and radiation protection method.
Background technology
Electro-optical imaging sensors (such as CCD and cmos image sensor) is used as the core component of photoelectronic imaging monitoring system
With functions such as imaging, detections, it is widely used in fields such as industry, scientific research, national defence, medical science, space flight.However, photoelectric image is passed
Sensor is very sensitive to radiating, and carries out in radiation environment facing the irradiation of radiating particle or ray directly during Imaging: Monitoring.Such as Fig. 1 institutes
Show, in current practice operation, photoelectronic imaging monitoring system 2 is just to radiation source 1 to be monitored to it.The length of radiation source 1
Phase radiation will cause the performance degradation of photoelectronic imaging monitoring system 3, even disabler occur when serious.
It is not only expensive using the photoelectronic imaging monitoring system with radiation hardening ability, and core devices are main
By external import, the risk of external embargo is faced.It is domestic generally to be monitored using the photoelectronic imaging under periodic replacement radiation environment
System.Photoelectronic imaging monitoring system in such as nuclear reactor, particle collider, radioactive source radiation environment by radiation because being damaged
Wound causes annual needs to change multiple, adds personal security risk and goods and materials cost, influence industrial production and scientific research and testing.
The content of the invention
It is an object of the invention to provide a kind of radiation protecting systems monitored for photoelectronic imaging and radiation protection method, solution
Photoelectronic imaging monitoring system of having determined short technical problem of performance degradation, service life under dense ionization radiation environment.
The present invention technical solution be：A kind of radiation protecting systems monitored for photoelectronic imaging, its special character
It is：Including imaging reflecting module and radiation shield module；The imaging reflecting module is located at radiation source and photoelectronic imaging is monitored
Between system, for entering photoelectronic imaging monitoring system after the image information of radiation source is reflected through light path；The radiation shield
Module, which is enclosed, to be located at outside photoelectronic imaging monitoring system, the ray sent for radioactive source shielding.
Further, above-mentioned imaging reflecting module includes one or more groups of speculums.
Further, above-mentioned speculum is plane mirror or convex reflecting mirror.
Further, above-mentioned radiation shield module includes the radiation shield wall being centered around around photoelectronic imaging monitoring system.
Further, above-mentioned radiation shield wall is made up of the combined material of lead brick, aluminium flake or lead brick and aluminium flake.Such as forceful electric power
It is gamma ray from radiation, then barrier shield is formed by lead brick；It is proton beam as dense ionization is radiated, then passes through aluminium flake formation and shield
Cover wall.Under the combined radiation environment that existing gamma ray has proton beam again, then lead brick and aluminium flake combination are used simultaneously
Form barrier shield.
Further, above-mentioned radiation shield module also includes the anti-spoke being located on photoelectronic imaging monitoring system camera lens photosurface
Penetrate glass.
The present invention also provides a kind of radiation protection method monitored for photoelectronic imaging, and it is characterized in that, including with
Lower step：
1) radiation source is reconnoitred, the Imaging: Monitoring region of photoelectronic imaging monitoring system is determined；
2) reflected light path determined according to design is installed and is adjusted to as reflecting module；
3) be adjusted to as reflecting module so that the radiation source images after imaged reflecting module reflection can enter photoelectricity into
As the camera lens of monitoring system；
4) radiation shield module is installed in photoelectronic imaging monitoring system periphery.
Further, above-mentioned radiation protection method is further comprising the steps of：
5) by behind radiation source liter source, the image quality of photoelectronic imaging monitoring system is observed；
If 6) image quality is poor, source is dropped into radiation source, and be adjusted to as reflecting module and radiation shield module；
7) step 5 is repeated) to step 6), until photoelectronic imaging detecting system obtains good image quality.
The beneficial effects of the present invention are：
(1) present invention is by for the photoelectronic imaging monitoring system region to be monitored under dense ionization radiation environment, using
The light path design of mirror-reflection, makes photoelectronic imaging monitoring system camera lens carry out mirror image to the region to be monitored of radiation source, both
Designated area can be monitored, while being avoided that direct spoke of the dense ionization radiation to the photosensitive core component of photoelectronic imaging monitoring system again
According to, overcome the radiation proof problem of photoelectronic imaging monitoring system under dense ionization radiation environment, significantly improve photoelectronic imaging prison
Service life of the examining system in dense ionization radiation environment.
(2) present invention sets radiation shield module in the periphery of photoelectronic imaging monitoring system, reduces dense ionization radiation environment
Induce the radiation injury influence that photoelectronic imaging monitoring system is produced.
(3) according to the concrete condition to the photoelectronic imaging monitoring system region to be monitored, mirror-reflection can be according to need
Select plane mirror or selection convex reflecting mirror to increase visual field, the form of multigroup minute surface combination can also be taken, made
Photoelectronic imaging monitoring system can monitor designated area, and factors for radiation shielding can be effectively carried out again.
Brief description of the drawings
Fig. 1 is the view that traditional photoelectronic imaging monitoring system is monitored to radiation source.
Fig. 2 be present pre-ferred embodiments in carry out radiation proof light path design schematic diagram.
Fig. 3 is the principle schematic of progress radiation shield in present pre-ferred embodiments.
Wherein, reference is as follows：1- radiation sources, 2- photoelectronic imaging monitoring systems, 3- speculums, 4- barrier shields.
Embodiment
Referring to Fig. 2 and Fig. 3, present embodiments provide and Imaging: Monitoring is carried out to radiation source 1 for photoelectronic imaging monitoring system 2
Radiation protection method, wherein radiation source 1 selects60Co gamma ray projectors.
The course of work of the present embodiment comprises the following steps：
(1) it is right60Co gamma-rays source chambers are reconnoitred, and are determined the Imaging: Monitoring region of photoelectronic imaging monitoring system, are such as set
It is fixed60The radiation exit region of Co gamma ray projectors is Imaging: Monitoring region；
(2) light path design is carried out to mirror-reflection, determines the installation site of speculum 3, enable photoelectronic imaging monitoring system 2
Imaging: Monitoring is carried out to designated area (being imaged monitored area)；
(3) speculum 3 is installed, existed by adjusting speculum 360Position in Co gamma ray projectors room, realizes mirror-reflection
Light path design；
(4) speculum 3 is adjusted, making the camera lens of photoelectronic imaging monitoring system 2 need not face directly60Co gamma ray projectors, ensure simultaneously
It can be imaged by mirror-reflection, can carry out radiation shield to the periphery of the camera lens of photoelectronic imaging monitoring system in addition to photosurface again
Protection；
(5) to photoelectronic imaging monitoring system imaging debug, make photoelectronic imaging monitoring system camera lens to mirror image i.e.
Designated area can be monitored；
(6) periphery carried out to photoelectronic imaging monitoring system in addition to camera lens photosurface carries out factors for radiation shielding, passes through lead
Brick pair60Co gamma-rays is shielded；
(7) will60Behind Co gamma ray projector liters source, photoelectronic imaging monitoring system image quality is observed in measuring chamber, radiation is checked
Whether shielding is good.
(8) if photoelectronic imaging monitoring system image quality is poor, such as there are some bright snows, then show radiation shield
Protection needs to improve, Ying Jiang60Behind Co gamma ray projector drops source, photoelectronic imaging monitoring system factors for radiation shielding is carried out into source chamber
It is perfect, until monitoring image quality is good.
Above description is only example of the present invention, does not constitute any limitation of the invention, is understanding this hair
After bright content and principle, the various amendments in form and details may be all carried out without departing from the principles of the invention and are changed
Become, but these modifications and variations based on inventive concept are still in the claims of the present invention.
Claims (8)
1. a kind of radiation protecting systems monitored for photoelectronic imaging, it is characterised in that：Including imaging reflecting module and radiation shield
Cover module；The imaging reflecting module is located between radiation source and photoelectronic imaging monitoring system, for the image of radiation source to be believed
Breath enters photoelectronic imaging monitoring system after being reflected through light path；The radiation shield module, which is enclosed, to be located at outside photoelectronic imaging monitoring system
Portion, the ray sent for radioactive source shielding.
2. the radiation protecting systems according to claim 1 monitored for photoelectronic imaging, it is characterised in that：The imaging is anti-
Penetrating module includes one or more groups of speculums.
3. the radiation protecting systems according to claim 2 monitored for photoelectronic imaging, it is characterised in that：The speculum
For plane mirror or convex reflecting mirror.
4. the radiation protecting systems according to claim 1 monitored for photoelectronic imaging, it is characterised in that：The radiation shield
Cover the radiation shield wall that module includes being centered around around photoelectronic imaging monitoring system.
5. the radiation protecting systems according to claim 4 monitored for photoelectronic imaging, it is characterised in that：The radiation shield
Wall is covered to be made up of the combined material of lead brick, aluminium flake or lead brick and aluminium flake.
6. it is used for the radiation protecting systems that photoelectronic imaging is monitored according to claim 4 or 5, it is characterised in that：The spoke
Penetrate the non-browning glass that shroud module also includes being located on photoelectronic imaging monitoring system camera lens photosurface.
7. a kind of radiation protection method monitored for photoelectronic imaging, it is characterised in that comprise the following steps：
1) radiation source is reconnoitred, the Imaging: Monitoring region of photoelectronic imaging monitoring system is determined；
2) reflected light path determined according to design is installed and is adjusted to as reflecting module；
3) it is adjusted to as reflecting module so that the radiation source images after imaged reflecting module reflection can enter photoelectronic imaging prison
The camera lens of examining system；
4) radiation shield module is installed in photoelectronic imaging monitoring system periphery.
8. the radiation protection method according to claim 7 monitored for photoelectronic imaging, it is characterised in that also including following
Step：
5) by behind radiation source liter source, the image quality of photoelectronic imaging monitoring system is observed；
If 6) image quality is poor, source is dropped into radiation source, and be adjusted to as reflecting module and radiation shield module；
7) step 5 is repeated) to step 6), until photoelectronic imaging detecting system obtains good image quality.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710294032.0A CN107238852A (en) | 2017-04-28 | 2017-04-28 | The radiation protecting systems and radiation protection method monitored for photoelectronic imaging |
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| CN201710294032.0A CN107238852A (en) | 2017-04-28 | 2017-04-28 | The radiation protecting systems and radiation protection method monitored for photoelectronic imaging |
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| Publication Number | Publication Date |
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| CN107238852A true CN107238852A (en) | 2017-10-10 |
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| CN201710294032.0A Pending CN107238852A (en) | 2017-04-28 | 2017-04-28 | The radiation protecting systems and radiation protection method monitored for photoelectronic imaging |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090196400A1 (en) * | 2008-02-06 | 2009-08-06 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Apparatus and method for detecting an image |
| CN105652431A (en) * | 2016-03-30 | 2016-06-08 | 中国科学院合肥物质科学研究院 | Radiation-resistant and radiation-protective combined periscope type light path structure |
| CN105676451A (en) * | 2016-03-30 | 2016-06-15 | 中国科学院合肥物质科学研究院 | Radiation resistance and radiation prevention combined imaging light path structure |
| CN206907500U (en) * | 2017-04-28 | 2018-01-19 | 西北核技术研究所 | Photoelectronic imaging monitoring radiation protecting systems under dense ionization radiation environment |
-
2017
- 2017-04-28 CN CN201710294032.0A patent/CN107238852A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090196400A1 (en) * | 2008-02-06 | 2009-08-06 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Apparatus and method for detecting an image |
| CN105652431A (en) * | 2016-03-30 | 2016-06-08 | 中国科学院合肥物质科学研究院 | Radiation-resistant and radiation-protective combined periscope type light path structure |
| CN105676451A (en) * | 2016-03-30 | 2016-06-15 | 中国科学院合肥物质科学研究院 | Radiation resistance and radiation prevention combined imaging light path structure |
| CN206907500U (en) * | 2017-04-28 | 2018-01-19 | 西北核技术研究所 | Photoelectronic imaging monitoring radiation protecting systems under dense ionization radiation environment |
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Application publication date: 20171010 |
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