CN107123467A - A kind of flexible conductive film and its application - Google Patents
A kind of flexible conductive film and its application Download PDFInfo
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- CN107123467A CN107123467A CN201710287356.1A CN201710287356A CN107123467A CN 107123467 A CN107123467 A CN 107123467A CN 201710287356 A CN201710287356 A CN 201710287356A CN 107123467 A CN107123467 A CN 107123467A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
- C09D167/06—Unsaturated polyesters having carbon-to-carbon unsaturation
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Abstract
The invention provides a kind of flexible conductive film and application, it is described lead flexible electrolemma its include substrate layer, refractive index matching layers and conductive layer, the substrate layer has the first optical surface and the second optical surface, the refractive index matching layers are that ranges of indices of refraction is 1.4 1.52, and the thickness range of the refractive index matching layers (121) is 1.0 2.0 μm.The shadow effect that disappears of present invention collection glass baseplate, transmitance and the pliability of conventional polymer base material are integrated, meet the demand of market flexible display screen, carrying out matching from rational structure sheaf, rational thickness and suitable refraction materials, to realize traditional organic substrate shadow effect that disappears poor, the technical problem of transmitance difference, while being applied in touch-screen field.
Description
Technical field:
The present invention relates to optical film, and in particular to flexible conductive film and its application.
Background technology:
ITO conducting films be mainly used in the touch-screen production of field of mobile communication, the transparency electrode of thin-film solar cells,
The fields such as electrode material, the thin film switch of electrochromic device, logical production is obtained using the method production of coating plus magnetron sputtering.
Touch-screen has an increasing application in mobile phone and tablet personal computer etc., and touch-screen is as a kind of new defeated
Go out that equipment is all the fashion and universal, therefore also more come also big as the essential nesa coating demand of touch-screen.ITO
Electropane, i.e. tin indium oxide (Indium-TinOxide) transparent conducting film glass, is produced by ITO electropanes more
Line, in the power house environment of high purification, using plane magnetic control technology, sputters the plating of tin indium oxide conductive film on ultra-thin glass
Layer and the high-tech product obtained through the high temperature anneal.Product be widely used for liquid crystal display (LCD), solar cell,
Microelectronics ITO electropanes, photoelectron and various optical fields.
Ito film space-consuming by organic substrate of glass is big;It is difficult transport;It is frangible;Although good with the shadow effect that disappears, thoroughly
Cross the advantages of rate is high but can not bend, it is impossible to meet the requirement of market flexible display screen.
Although the ito film of traditional PET and COC organic substrates can be bent, shrinkage factor is big;Water absorption rate is big;Disappear shadow effect
It is not so good as glass with transmitance effect.
The content of the invention:
The purpose of the present invention is disappear shadow effect, transmitance and the conventional polymer that have devised conducting film collection glass baseplate
The pliability of organic substrate is integrated, and meets the demand of market flexible display screen, from rational structure sheaf, rational thickness
And suitable refraction materials carry out matching poor, the poor technical problem of transmitance that realizes traditional organic substrate shadow effect that disappears.
To achieve the above object, the technical scheme is that:
A kind of flexible conductive film, it includes COP substrate layers, refractive index matching layers and conductive layer, and the substrate layer has
First optical surface and the second optical surface, the ranges of indices of refraction of the refractive index matching layers is 1.4-1.52, the index matching
The thickness range of layer (121) is 1.0-2.0 μm.
Further, the refractive index matching layers include low-index layer and the first hardened layer, it is characterised in that described low
The ranges of indices of refraction of index layer is 1.4-1.49, and the ranges of indices of refraction of first hardened layer is 1.50-1.52.
Further, the main component of first hardened layer includes polyester acrylate 15-20%, propane diols first
It is confused 30%-50%, MMB 5%-10%, initiator, 0.1%-1%, auxiliary agent 1%-5%, the group
The purpose divided is the hardening bath for synthesizing 1.50-1.52 refractive indexes, while meeting the adhesive force of hardened layer and base material;And hardened layer
5B requirement can be reached according to " ASTM standard " with the adhesive force of low-index layer.Further, the first hardened layer is comprising poly-
Ester acrylate, the polyester acrylate is selected from epoxide modified aliphatic polyester acrylate.
Further, the acrylate is selected from polyester acrylate, and the polyester acrylate is selected from epoxide modified
Aliphatic polyester acrylate.
Further, it is pentaerythrite, (first that the aliphatic polyester acrylate, which is selected from (methyl) acrylate monomer,
Base) acrylate, (methyl) acrylic acid methylol propyl ester, (methyl) glycerol acrylate, (methyl) acrylic acid (2- ethoxys)
Isocyanates or (methyl) acrylic acid (2- ethoxys) isocyanuric acid ester one or more and butanedioic acid, 1,2,3- third carboxylic acid,
Glutaric acid, lactones orReaction is made, wherein, R2 is C2~C10 support group.
Further, described light trigger be 1- hydroxyls phenylcyclohexyl ketone, 2,2- dimethoxy -2- phenyl acetophenones,
2,2- dimethoxy -2- phenyl acetophenones, xanthone, Fluorenone, anthraquinone, triphenylamine, carbazole, 3- methyl acetophenones, 4- chlorodiphenyls
Ketone, 4,4- dimethoxy-benzophenones, 4,4- diaminobenzophenones, Michler's keton, benzoin ethyl ether, benzyl dimethyl ketal contracting
Alcohol, 1- (4- isopropyl phenyls) -2- hydroxy-2-methyl propyl- 1- ketone, 2- hydroxy-2-methyl -1- phenyl propyl- 1- ketone, thioxanthones,
Diethyl thioxanthone, ITX, CTX, 2,4,6- trimethylbenzoyls diphenyl phosphine oxide, it is double-(2,
6- dimethoxybenzoyls) more than one or both of -2,4,4- trimethylpentylphosphine oxides mixture.
Further, on the first optical surface of the substrate layer successively fold provided with the first hardened layer, low-index layer and
Conductive layer.
Further, folded successively on the first optical surface of the substrate layer and be provided with hardened layer, the first hardened layer, low-refraction
Layer and conductive layer.
Further, it is provided with the second hardened layer on the second optical surface of the substrate layer.
Further, on the second optical surface of the substrate layer successively fold provided with the first hardened layer, low-index layer and
Conductive layer.
Further, the thickness of the substrate layer is 30-180 μm.
Further, the thickness range of the low-index layer is 20-50nm.
Further, the thickness range of first hardened layer is 1.0-1.5 μm.
Further, the thickness range of the conductive layer is 20-30nm, and the ranges of indices of refraction of the conductive layer is 2.0-
2.5。
Further, the conductive layer is ITO.
A kind of touch-screen, includes flexible conductive film described above.
Beneficial effect:
The present invention is the shadow effect that disappears, transmitance and the conventional polymer organic group that have devised conducting film collection glass baseplate
The pliability of material is integrated, and meets the demand of market flexible display screen, from rational structure sheaf, rational thickness and conjunction
Suitable refraction materials carry out matching poor, the poor technical problem of transmitance that realizes traditional organic substrate shadow effect that disappears.
Brief description of the drawings:
With reference to structural representation and embodiment, the present invention is further described.
Fig. 1 shows a kind of flexible conductive film structural representation that a kind of typical embodiment 1 of the present invention is provided.
Fig. 2 shows a kind of flexible conductive film structural representation that a kind of typical embodiment 2 of the present invention is provided.
Embodiment:
In order to make the purpose , technical scheme and advantage of the present invention be clearer, it is right below in conjunction with drawings and Examples
Invention is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, not
For limiting the present invention.
The matching relationship of interlayer structure in the application, the thickness of each layer, and refractive index causes the application has higher
Combination property.Said structure thickness degree carries out rational refractive index collocation and ensure that total overcomes the skill for the shadow effect difference that disappears
High transmittance is ensure that while art problem.
Embodiment 1
A kind of flexible conductive film 100 shown in schematic diagram 1, in first optical surface of the thickness for 50 μm of COP base materials 10
Sided corona treatment is first carried out with the second optical surface, the first optics table of the COP base materials 10 crossed by coating process in sided corona treatment
The first hardened layer 11 that thickness is 2 μm is formed after the glue curing that face coating refractive index is 1.50.Second light of the base material 10
It is 1.50 hardened glues to learn surface coating refractive index, and the second hardened layer 15 that thickness is 2 μm is formed after solidification, hard described first
It is 30nm to change the surface of layer 11 sputtering thickness, and refractive index forms low-refraction matching layer 12 for 1.40 silica.In the folding
It is 25nm to penetrate the surface of rate matching layer 12 sputtering thickness, and refractive index is 2.3 ITO layer 13.Flexible conductive film 1, test result is made
The overall mist degree of film is 0.25%, not demoulding (hundred lattice of boiling water bath 30min ITO layers 13:5B);Acid-proof alkaline is excellent:15g/L
Not demoulding (hundred lattice of 55 DEG C/10min of NaOH ITO layers 13:5B), 1mol/L HCl/5min ITO layers not demoulding (hundred lattice:5B),
Resistance is up to 150 Ω, reflectivity < 2%, transmitance > 95% characteristic, the shadow effect that disappears b*<1.5.
Embodiment 2
A kind of flexible conductive film 100 shown in schematic diagram 1, in first optical surface of the thickness for 50 μm of COP base materials 10
Sided corona treatment is first carried out with the second optical surface, the first optics table of the COP base materials 10 crossed by coating process in sided corona treatment
The first hardened layer 11 that thickness is 2 μm is formed after the glue curing that face coating refractive index is 1.52.Second light of the base material 10
It is 1.52 hardened glues to learn surface coating refractive index, and the second hardened layer 15 that thickness is 2 μm is formed after solidification, hard described first
It is 20nm to change the surface of layer 11 sputtering thickness, and refractive index forms low-refraction matching layer 12 for 1.40 silica.In the folding
It is 25nm to penetrate the surface of rate matching layer 12 sputtering thickness, and refractive index is 2.3 ITO layer 13.Flexible conductive film 2, test result is made
The overall mist degree of film is 0.25%, not demoulding (hundred lattice of boiling water bath 30min ITO layers 13:5B);Acid-proof alkaline is excellent:15g/L
Not demoulding (hundred lattice of 55 DEG C/10min of NaOH ITO layers 13:5B), 1mol/L HCl/5min ITO layers not demoulding (hundred lattice:5B),
Resistance is up to 150 Ω, reflectivity < 1%, transmitance > 97% characteristic, the shadow effect that disappears b*<1.2.
Embodiment 3
A kind of flexible conductive film 100 shown in schematic diagram 1, in first optical surface of the thickness for 50 μm of COP base materials 10
Sided corona treatment is first carried out with the second optical surface, the first optics table of the COP base materials crossed by coating process in sided corona treatment
The first hardened layer 11 that thickness is 2 μm is formed after the glue curing that face coating refractive index is 1.50, the second of the base material 10
Optical surface coating refractive index is 1.52 hardened glues, the second hardened layer 15 that thickness is 2 μm is formed after solidification, described first
The surface of hardened layer 11 sputtering thickness is 50nm, and refractive index forms low-index layer 12 for 1.49 silica.In low-refraction
Sputtering thickness in 12 surface of layer is 25nm, and refractive index is 2.3 ITO layer 13.Flexible conductive film 3, the entirety of test result film is made
Mist degree is 0.25%, not demoulding (hundred lattice of boiling water bath 30min ITO layers 13:5B);Acid-proof alkaline is excellent:15g/L NaOH 55
DEG C/not demoulding (hundred lattice of 10min ITO layers 13:5B), 1mol/L HCl/5min ITO layers not demoulding (hundred lattice:5B), resistance reaches
150 Ω, reflectivity 6%, transmitance > 91% characteristic, the shadow effect that disappears b*<2.5.
Embodiment 4
A kind of flexible conductive film 100 shown in schematic diagram 1, in first optical surface of the thickness for 50 μm of COP base materials 10
Sided corona treatment is first carried out with the second optical surface, the first optics table of the COP base materials crossed by coating process in sided corona treatment
The first hardened layer 11 that thickness is 2 μm is formed after the glue curing that face coating refractive index is 1.50, the second of the base material 10
Optical surface coating refractive index is 1.50 hardened glues, the second hardened layer 15 that thickness is 2 μm is formed after solidification, described first
The surface of hardened layer 11 sputtering thickness is 50nm, and refractive index forms low-index layer 12 for 1.49 silica.In low-refraction
Sputtering thickness in 12 surface of layer is 25nm, and refractive index is 2.3 ITO layer 13.Flexible conductive film 4, the entirety of test result film is made
Mist degree is 0.25%, not demoulding (hundred lattice of boiling water bath 30min ITO layers 13:5B);Acid-proof alkaline is excellent:15g/L NaOH 55
DEG C/not demoulding (hundred lattice of 10min ITO layers 13:5B), 1mol/L HCl/5min ITO layers not demoulding (hundred lattice:5B), resistance reaches
150 Ω, reflectivity 6%, transmitance > 91% characteristic, the shadow effect that disappears b*<4.
Embodiment 5
A kind of flexible conductive film 100 shown in schematic diagram 2, in first optical surface of the thickness for 50 μm of COP base materials 10
Sided corona treatment is first carried out with the second optical surface, the first optics table of the COP base materials 10 crossed by coating process in sided corona treatment
The first hardened layer 11 that thickness is 2 μm is formed after the glue curing that face coating refractive index is 1.52, in first hardened layer 11
Surface sputtering thickness is 30nm, and refractive index forms low-index layer 12 for 1.40 silica.In the low-index layer 12
Surface sputtering thickness is 25nm, and refractive index is 2.3 ITO layer 13, is the first optics table on the second optical surface of COP base materials
Face mirror image, its preparation method and structure are consistent with the first optical surface.Flexible conductive film 5 is made, test result film
Overall mist degree is 0.25%, not demoulding (hundred lattice of boiling water bath 30min ITO layers 13:5B);Acid-proof alkaline is excellent:15g/L NaOH
Not demoulding (hundred lattice of 55 DEG C/10min ITO layers 13:5B), 1mol/L HCl/5min ITO layers not demoulding (hundred lattice:5B), resistance reaches
150 Ω, reflectivity < 2%, transmitance > 95% characteristic, the shadow effect that disappears b*<1.5..
Embodiment 6
A kind of flexible conductive film 100 shown in schematic diagram 2, in first optical surface of the thickness for 50 μm of COP base materials 10
Sided corona treatment is first carried out with the second optical surface, the first optics table of the COP base materials 10 crossed by coating process in sided corona treatment
The first hardened layer 11 that thickness is 2 μm is formed after the glue curing that face coating refractive index is 1.50, in first hardened layer 11
Surface sputtering thickness is 30nm, and refractive index forms low-index layer 12 for 1.49 silica.On the surface of low-index layer 12
Sputtering thickness is 25nm, and refractive index is 2.3 ITO layer 13.It is the first optics table on the second optical surface of the base material 10
Face mirror image, its preparation method and structure are consistent with the first optical surface.Flexible conductive film 6 is made, test result film
Overall mist degree is 0.25%, not demoulding (hundred lattice of boiling water bath 30min ITO layers 13:5B);Acid-proof alkaline is excellent:15g/L NaOH
Not demoulding (hundred lattice of 55 DEG C/10min ITO layers 13:5B), 1mol/L HCl/5min ITO layers not demoulding (hundred lattice:5B), resistance reaches
150 Ω, reflectivity < 8%, transmitance > 90% characteristic, the shadow effect that disappears b*<2.5.
By embodiment 1,2,3,4,5 and 6 understand refractive index matching layers from Rational Thickness and reasonable refractive index with rationally
Conductive layer is sputtered again after the substrate layer collocation of thickness, and the conducting film reflectivity of acquisition is low, transmitance is high, thereby is achieved perfect
Disappear shadow effect, and is flexible from base material, therefore meets the demand of flexible screen.
The foregoing is only the preferred embodiment of invention, be not intended to limit the present invention, it is all the spirit and principles in the present invention it
Interior made modifications, equivalent substitutions and improvements etc., should be included in the scope of the protection.Attempt according to this to the present invention
Make any formal limitation, therefore all have any modification or change for making the relevant present invention under identical spirit,
It should all be included in that the invention is intended to the category protected.
Claims (14)
1. a kind of flexible conductive film (100), it includes COP substrate layers (10), refractive index matching layers (121) and conductive layer
(13), the substrate layer (10) has the first optical surface and the second optical surface, it is characterised in that the refractive index matching layers
(121) it is that ranges of indices of refraction is 1.4-1.52, the thickness range of the refractive index matching layers (121) is 1.0-2.0 μm.
2. flexible conductive film (100) according to claim 1, it is characterised in that the refractive index matching layers (121) include
Low-index layer (12) and the first hardened layer (11), it is characterised in that the ranges of indices of refraction of the low-index layer (12) is
1.4-1.49, the ranges of indices of refraction of first hardened layer (11) is 1.50-1.52.
3. flexible conductive film (100) according to claim 2, it is characterised in that the Main Ingredients and Appearance of first hardened layer
Comprising polyester acrylate 15-20%, propane diols first fan 30%-50%, MMB 5%-10%, draw
Send out agent 0.1%-1%, levelling agent 1%-5%.
4. flexible conductive film (100) according to claim 2, it is characterised in that the first hardened layer includes polyester acrylic
Ester, the polyester acrylate is selected from epoxide modified aliphatic polyester acrylate.
5. flexible conductive film (100) according to claim 4, it is characterised in that the polyester acrylate is selected from (first
Base) acrylate monomer be pentaerythrite, (methyl) acrylate, (methyl) acrylic acid methylol propyl ester, (methyl) acrylic acid
Glyceride, (methyl) acrylic acid (2- ethoxys) isocyanates or (methyl) acrylic acid (2- ethoxys) isocyanuric acid ester it is a kind of or
Person is a variety of and butanedioic acid, 1,2,3- third carboxylic acid, glutaric acid, lactones orIn one or more kinds of reactions be made, its
In, R2 is C2~C10 support group.
6. flexible conductive film (100) according to claim 3, it is characterised in that described light trigger is 1- hydroxyl hexamethylenes
Base Benzophenone, 2,2- dimethoxy -2- phenyl acetophenones, 2,2- dimethoxy -2- phenyl acetophenones, xanthone, Fluorenone, anthracene
Quinone, triphenylamine, carbazole, 3- methyl acetophenones, 4- chlorobenzophenones, 4,4- dimethoxy-benzophenones, 4,4- diaminourea hexichol
Ketone, Michler's keton, benzoin ethyl ether, benzyl dimethyl ketal, 1- (4- isopropyl phenyls) -2- hydroxy-2-methyl propyl-s 1-
Ketone, 2- hydroxy-2-methyl -1- phenyl propyl- 1- ketone, thioxanthones, diethyl thioxanthone, ITX, CTX,
2,4,6- trimethylbenzoyls diphenyl phosphine oxide, double-(2,6- dimethoxybenzoyls) -2,4,4- trimethylpentylphosphine oxides
One or both of more than mixture.
7. flexible conductive film (100) according to claim 2, it is characterised in that the first optics of the substrate layer (10)
Folded successively on face and be provided with the first hardened layer (11), low-index layer (12) and conductive layer (13).
8. flexible conductive film (100) according to claim 1, it is characterised in that the second optics of the substrate layer (10)
The second hardened layer (15) is provided with face.
9. flexible conductive film (100) according to claim 2, it is characterised in that the second optics of the substrate layer (10)
Folded successively on face and be provided with the first hardened layer (11), low-index layer (12) and conductive layer (13).
10. flexible conductive film (100) according to claim 1, it is characterised in that the thickness of the substrate layer (10) is
30-180μm。
11. flexible conductive film (100) according to claim 1, it is characterised in that flexibility according to claim 1
Conducting film (100), it is characterised in that the thickness range of first hardened layer (11) is 1.0-1.5 μm.
12. flexible conductive film (100) according to claim 1, it is characterised in that the thickness range of the conductive layer (13)
For 20-30nm, the ranges of indices of refraction of the conductive layer (13) is 2.0-2.5.
13. flexible conductive film (100) according to claim 2, it is characterised in that the thickness of the low-index layer (12)
For 20-50nm.
14. a kind of touch-screen, it is characterised in that include the flexible conductive film described in any one of claim 1-13 claim
(100)。
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CN111028683A (en) * | 2019-11-29 | 2020-04-17 | 湖南中天碧水膜科技有限公司 | Flexible cover plate |
CN111063480A (en) * | 2020-01-03 | 2020-04-24 | 湖南中天碧水膜科技有限公司 | Flexible low-resistance conductive film and preparation method thereof |
CN115390171A (en) * | 2022-08-17 | 2022-11-25 | 鹤山市嘉米基光电科技有限公司 | Color-changeable high-reflection reflector and preparation method thereof |
CN111063480B (en) * | 2020-01-03 | 2024-11-15 | 江阴通利光电科技有限公司 | Flexible low-resistance conductive film and preparation method thereof |
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CN115390171A (en) * | 2022-08-17 | 2022-11-25 | 鹤山市嘉米基光电科技有限公司 | Color-changeable high-reflection reflector and preparation method thereof |
CN115390171B (en) * | 2022-08-17 | 2023-10-13 | 鹤山市嘉米基光电科技有限公司 | Variable-color high-reflection reflector and preparation method thereof |
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